JP3400271B2 - Processing liquid heating device for substrate processing equipment - Google Patents

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a substrate processing apparatus for processing a substrate such as a semiconductor wafer, a glass substrate for a liquid crystal display panel, or a mask substrate for a semiconductor manufacturing apparatus, and more particularly, a processing liquid for processing the substrate. The present invention relates to a treatment liquid heating device for heating a liquid.

[0002]

2. Description of the Related Art In a substrate processing apparatus of this type, a processing solution heated to a temperature of, for example, about a hundred and several tens of degrees is pressure-fed by a pump so that a processing solution tank or a substrate for processing the processing solution is obtained. It has adopted a configuration that supplies itself.

As a processing liquid heating apparatus used in such a substrate processing apparatus, for example, as described in Japanese Utility Model Publication No. 6-60094, the processing liquid is circulated in a housing made of a fluororesin containing a heater. It is known that the treatment liquid is heated by doing so.

[0004]

In a treatment liquid heating apparatus having such a fluororesin housing, the treatment liquid may leak due to internal pressure or thermal expansion of the treatment liquid. is there. Further, there is a possibility that the housing and the heater may come into contact with each other due to the deformation of the housing and the housing made of fluororesin may be melted to cause liquid leakage.

At this time, when a liquid such as an organic solvent which produces an inflammable or explosive atmosphere is used as the processing liquid, the above-mentioned liquid leakage becomes a particular problem.

The present invention has been made to solve the above problems, and an object of the present invention is to provide a processing liquid heating apparatus for a substrate processing apparatus capable of reliably preventing the processing liquid from leaking.

[0007]

According to a first aspect of the present invention, there is provided a processing liquid heating apparatus for a substrate processing apparatus for heating a processing liquid for processing a substrate, the one end of which is closed by a bottom wall. A housing including a tubular body having an opening formed at an end thereof and a flange arranged on the outer circumference of the opening of the tubular body, and its peripheral portion being connected to the flange of the housing in an airtight state. A lid-like body that closes the opening of the housing, a heater that is attached to the lid-like body, and is housed in the housing when the lid-like body closes the opening of the housing; Processing liquid introducing portion disposed on either the bottom wall of the housing or the lid-like body, and a processing liquid outlet portion disposed on the bottom wall of the housing or on the opposite side of the processing liquid introducing portion on the lid-like body. Specially equipped with To.

According to a second aspect of the present invention, in the first aspect of the invention, the portions of the housing and the lid-like body that come into contact with the processing liquid are coated with a chemical resistant resin.

According to a third aspect of the present invention, in the first or second aspect of the invention, a terminal block connected to a current supply line for supplying a current to the heater is the heater in the lid-shaped body. Is installed in a terminal block cover arranged on the opposite surface, and an inert gas supply pipe for supplying an inert gas into the terminal block cover is connected to the terminal block cover. .

[0010]

BEST MODE FOR CARRYING OUT THE INVENTION Embodiments of the present invention will be described below with reference to the drawings. FIG. 1 is a schematic diagram of a substrate processing apparatus to which a processing liquid heating apparatus according to the present invention is applied.

This substrate processing apparatus has a processing liquid of 1 degree Celsius.
A treatment liquid tank 1 for storing a treatment liquid, which is a device that uses a peeling liquid containing an organic solvent heated to 20 ° C. and dips a substrate in the treatment liquid to perform the peeling treatment, and a treatment according to the present invention. The liquid heating device 2, an overflow portion 3 arranged on the outer periphery of the treatment liquid tank 1 for temporarily storing the treatment liquid overflowing from the upper end of the treatment liquid tank 1, the overflow portion 3, and the treatment liquid heating device 2 A flow path 5a that connects the processing liquid heating device 2 and the processing liquid tank 1, and a processing liquid that is disposed in the flow path 5a and temporarily stored in the overflow portion 3. A pump 4 for pressure-feeding the treatment liquid to the treatment liquid heating device 2 and a filter 8 disposed in the flow path 5b for filtering out impurities in the treatment liquid passing therethrough.

Two sensors 6 and 7 for detecting whether or not the processing liquid is passing therethrough are disposed in the flow path 5b. Further, in the treatment liquid heating device 2, as will be described later in detail, a terminal block cover 10 connected to the nitrogen gas supply source 9 and three temperature sensors 11a, 11b, 11c.
And are provided.

In the figure, reference numeral 12 is a flow path for air bleeding in the treatment liquid heating apparatus 2, and reference numerals 13 and 14 are solenoid valves arranged in the flow paths 5b and 12, respectively.

In this substrate processing apparatus, the processing liquid tank 1
The processing liquid overflowing from the upper end of the above and flowing down into the overflow portion 3 is pressure-fed to the processing liquid heating device 2 by the pump 4 through the flow path 5a, and heated to a predetermined temperature by the processing liquid heating device 2, The temperature is controlled by being supplied again to the processing liquid tank 1 via the flow path 5b.

Next, the structure of the treatment liquid heating apparatus 2 according to the present invention will be described. 2 is a plan view showing a part of the treatment liquid heating device 2 in section, FIG. 3 is a left side view thereof, and FIG. 4 is a right side view thereof.

The processing liquid heating device 2 has a cylindrical side wall 22.
And a housing 25 made of stainless steel including a bottom wall 23 and a flange 24, and a disk-shaped lid 26 made of stainless steel similar to the housing 25. Lid 26
The peripheral portion of the housing 25 and the flange 24 of the housing 25 are operated by the action of the eight sets of screws 27 and nuts 30.
Nos. 5 and 5 are in airtight contact with each other so as to close the opening. Therefore, the housing 25 and the lid-like body 26 form an airtight chamber for heating the processing liquid.

For example, fluorine may be present in the portions of the housing 25 and the lid-like body 26 that come into contact with the processing liquid, that is, the inside portions of the side wall 22 and the bottom wall 23 and the inside portion of the lid-like body 26 in the housing 25 that form the airtight chamber. It is coated with a chemical resistant resin such as resin.

As shown in FIGS. 2 and 4, the lid-like body 26 is provided with three heaters 28. The heater 28 has a pair of base end portions so that the heater 28 is housed in an airtight chamber formed by the lid-shaped body 26 and the housing 25 when the lid-shaped body 26 and the flange 24 are in contact with each other. It has a curved shape fixed to 26. This heater 28
The base end portion of the is penetrated through the lid-like body 26 and is connected to the terminal block 29 arranged on the outer surface of the lid-like body 26. Further, a pair of current supply lines 32 for supplying a current to the heater 28 are connected to the terminal block 29.

As shown in FIG. 2, the terminal block 29 is covered with the terminal block cover 10 fixed to the lid-shaped body 26. Further, the terminal block cover 10 is provided with a nitrogen gas supply pipe 33 for purging the inside of the terminal block cover 10 with nitrogen gas. The nitrogen gas supply pipe 33 is connected to the nitrogen gas supply source 9 shown in FIG. As described above, by covering the terminal block 29 with the terminal block cover 10 and purging the inside of the terminal block cover 10 with the nitrogen gas, the ignition and explosive gas generated from the processing liquid containing the organic solvent should be avoided. Even if a spark is generated in the terminal block 29 in the leaked state, it is possible to prevent ignition of the spark to the gas.

Further, as shown in FIG. 4, the lid-like body 26 is provided with a treatment liquid introducing portion 35 for introducing the treatment liquid into an airtight chamber formed by the lid-like body 26 and the housing 25. ing. As shown in FIG. 5, the treatment liquid introducing section 35 connects the overflow portion 3 and the treatment liquid heating device 2 with the flow path 5.
The joint 36 made of resin connected to the downstream end of a and the screw 37 screwed into the lid 26 urges the joint 36 in the direction of the introduction port 39 formed in the lid 26. And a metal holding plate 38. The reference numeral 42 indicates the lid-shaped body 2.
It is an O-ring arranged between 6 and the joint 36.

On the other hand, on the bottom wall 23 of the housing 25, as shown in FIG. 2 and FIG.
There is provided a processing liquid outflow portion 45 for causing the processing liquid to flow out from the airtight chamber formed by 5. The treatment liquid outflow portion 35 has the same configuration as the treatment liquid introduction portion 35 shown in FIG. 5, and as shown in FIG. 6, a flow passage 5b connecting the treatment liquid heating device 2 and the treatment liquid tank 1 to each other. Of the resin-made joint 46 connected to the upstream end of the bottom wall 23 of the housing 25 and the screw 47 screwed into the bottom wall 23 of the housing 25.
3 is provided with a metal pressing plate 48 that urges toward the outlet 49. Reference numeral 52 is an O-ring arranged between the bottom wall 23 and the joint 46.

Further, on the bottom wall 23 of the housing 25, as shown in FIGS. 2 and 3, the lid-like body 26 and the housing 2 are provided.
The temperature detectors 55a, 55b, 55c are provided with three temperature detectors 55a, 55b, 55c for detecting the temperature of the treatment liquid in the airtight chamber formed by 5 and 5.
Is, as shown in FIG. 7, the temperature sensors 11a, 1 described above.
A joint 56 made of resin for supporting the joints 1b and 11c and a metal holding plate 58 for urging the joint 56 toward the bottom wall 23 by the action of a screw 57 screwed into the bottom wall 23 of the housing 25 are provided. Reference numeral 62 is an O-ring arranged between the bottom wall 23 and the joint 56.

The central temperature sensor 11b among the temperature sensors 11a, 11b, 11c is a temperature sensor for controlling the temperature of the processing liquid, and is a heater for maintaining the processing liquid at a set temperature of 120 degrees Celsius. It is used for the purpose of controlling 28. Further, the temperature sensors 11a, 11b,
The temperature sensors 11a and 11c on both sides of 11c are temperature sensors for preventing the treatment liquid from being excessively heated, and stop heating by the heater 28 when the temperature of the treatment liquid reaches 140 degrees Celsius. Used for purposes. In addition,
The plurality of temperature sensors 11a and 11c are used to prevent the treatment liquid from being excessively heated, because the treatment liquid is excessively heated due to damage or malfunction of the temperature sensors 11a, 11b and 11c. This is for sure prevention.

When the processing liquid is heated by the processing liquid heating device 2 as described above, the processing liquid pumped by the pump 4 is hermetically sealed by the processing liquid introducing portion 35 and the lid-like body 26 and the housing 25. The treatment liquid is introduced into the chamber and discharged from the treatment liquid outlet 45, and the treatment liquid is supplied to the heater 2.
Heat by 8.

At this time, the housing 25 and the lid-like body 26 are made of stainless steel, and a flange structure for connecting the peripheral portion of the lid-like body 26 and the flange 24 of the housing 25 with a screw 27 and a nut 30. Therefore, the airtight chamber formed by the housing 25 and the lid-like body 26 is not deformed by the internal pressure or thermal expansion of the processing liquid. In particular, since the side wall 22 of the housing 25 has a tubular shape, even when the pressure of the processing liquid increases due to pulsation of the pump 4 or the like, the amount of deformation can be minimized.

Further, the processing liquid introducing section 35 and the processing liquid outflow section 4
5 and the temperature detectors 55a, 55b, 55c have a configuration in which the joints 36, 46, 56 are urged by the screws 37, 47, 57 and the metal holding plates 38, 48, 58, respectively, so that the pump Even when the pressure of the processing liquid increases due to the pulsation of 4 or the like, the processing liquid introducing portion 35, the processing liquid outlet portion 45, and the temperature detecting portions 55a, 55b, 55c.
Therefore, it is possible to reliably prevent the processing liquid from leaking.

Further, the housing 25 and the lid 26
In the portion contacting with the processing liquid, that is, inside portions of the side wall 22 and the bottom wall 23 and the inside portion of the lid-like body 26 in the housing 25 forming the airtight chamber, coating with a chemical resistant resin such as fluororesin is performed. Since the treatment is performed, it is possible to effectively prevent the treatment liquid from being contaminated. It should be noted that this processing liquid heating device 2 includes a housing 2
Since it has a flange structure in which 5 and the lid-like body 26 are connected by the screw 27 and the nut 30, it is possible to form the airtight chamber by connecting the housing 25 and the lid-like body 26 after coating with fluororesin or the like. For this reason, since it is not necessary to perform work such as welding after coating the fluororesin or the like, the fluororesin coating does not melt.

The processing liquid heating device 2 has a flange structure for connecting the housing 25 and the lid-like body 26 with the screw 27 and the nut 30, and also has a heater 28.
Since the lid 28 is attached to the lid 26, when the heater 28 is replaced, the heater 28 can be replaced with the lid 26 by loosening the screw 27 and the nut 30.

In the above-described embodiment, the case where the processing liquid heating device 2 is arranged in the processing liquid circulation path has been described. However, the processing liquid heating device 2 is a processing liquid flow passage in the substrate processing device. Inside, it can be installed at various positions.

Further, in the above-described embodiment, the side wall 22 of the housing 25 has a cylindrical shape with a circular cross section, but the side wall 22 may have a substantially circular cross section. The tubular shape described in this specification includes such a shape.

Further, although the housing 25 and the lid 26 are made of stainless steel in the above-mentioned embodiment,
Titanium, which has corrosion resistance like stainless steel, may be used.

[0032]

According to the invention as set forth in claim 1, a cylindrical body having one end closed by a bottom wall and an opening formed at the other end, and the cylindrical body is disposed on the outer periphery of the opening. In the case where internal pressure or thermal expansion due to the treatment liquid occurs, it has a structure in which a housing composed of a flange and a peripheral portion of the housing, which is in contact with the flange of the housing in an airtight state, are connected in an airtight state. Also, it is possible to prevent the processing liquid from leaking due to the deformation of the housing and the like.

According to the second aspect of the present invention, since the portions of the housing and the lid-like body which come into contact with the processing liquid are coated with the chemical resistant resin, the processing liquid is effectively prevented from being contaminated. can do. At this time,
Since the housing and the lid-like body are connected by the flange structure, it is possible to easily apply the coating of the chemical resistant resin to the contact portion with the processing liquid.

According to a third aspect of the present invention, the terminal block connected to the current supply line for supplying a current to the heater is provided in the terminal block cover provided on the surface of the lid-shaped body opposite to the heater. It is installed and the terminal block cover is connected to an inert gas supply pipe for supplying an inert gas into the terminal block cover, so ignition and explosive gas generated from the processing liquid leaks. Even if a spark is generated in the terminal block in this state, it is possible to prevent ignition of the spark from the gas.

[Brief description of drawings]

FIG. 1 is a schematic diagram of a substrate processing apparatus to which a processing liquid heating apparatus according to the present invention is applied.

FIG. 2 is a plan view showing a cross section of a part of the treatment liquid heating device 2.

FIG. 3 is a left side view of FIG.

FIG. 4 is a right side view of FIG.

FIG. 5 is a side cross-sectional view of a processing liquid introducing part 35.

FIG. 6 is a side sectional view of a processing liquid outflow portion 45.

FIG. 7 is a side sectional view of temperature detectors 55a, 55b, 55c.

[Explanation of symbols]

1 processing liquid tank 2 Treatment liquid heating device 9 Nitrogen gas supply source 10 terminal block cover 22 Side wall 23 Bottom wall 24 flange 25 housing 26 Lid 27 screws 28 heater 29 terminal block 30 nuts 32 power supply line 33 Nitrogen gas supply pipe 35 Processing liquid introduction part 45 Processing liquid outflow section 55a, 55b, 55c Temperature detector

─────────────────────────────────────────────────── ─── Continuation of the front page (56) References JP-A-5-228465 (JP, A) JP-A-9-52081 (JP, A) (58) Fields investigated (Int.Cl. ⁷ , DB name) C02F 1/02 B01J 19/00

Claims (3)

(57) [Claims] 1. A processing liquid heating device for a substrate processing device for heating a processing liquid for processing a substrate, comprising: a tubular body having one end closed by a bottom wall and an opening formed at the other end; A housing including a flange arranged on the outer periphery of the opening of the tubular body, and a lid-like body that closes the opening of the housing by connecting the peripheral portion to the flange of the housing in an airtight state. A heater that is attached to the lid-like body and is housed in the housing in a state where the lid-like body closes the opening of the housing; and a heater disposed on either the bottom wall of the housing or the lid-like body. A substrate processing apparatus, comprising: a processing liquid introduction part provided; and a processing liquid outflow part arranged on a bottom wall of the housing or on a side of the lid opposite to the processing liquid introduction part. Treatment liquid heating equipment Place 2. The processing liquid heating apparatus for a substrate processing apparatus according to claim 1, wherein the portions of the housing and the lid-like body that come into contact with the processing liquid are coated with a chemical resistant resin. Treatment liquid heating device. 3. The processing liquid heating apparatus of the substrate processing apparatus according to claim 1, wherein a terminal block connected to a current supply line for supplying a current to the heater is the heater in the lid-shaped body. Is installed in a terminal block cover arranged on the opposite surface, and an inert gas supply pipe for supplying an inert gas into the terminal block cover is connected to the terminal block cover. Processing liquid heating device for substrate processing equipment.