JP3392034B2 - Illumination device and projection exposure apparatus using the same - Google Patents

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an illuminator and a projection exposure apparatus using the same, for example, IC, LSI, CC.
In a so-called stepper, which is an apparatus for manufacturing various devices such as D, liquid crystal panels, and magnetic heads,
The circuit pattern on the original plate (hereinafter referred to as "reticle") such as a photomask or reticle uniformly illuminated with exposure light in the ultraviolet ray, far ultraviolet ray region or vacuum ultraviolet ray region is projected and transferred onto the wafer surface coated with the photosensitizer to transfer the device. It is suitable for manufacturing.

[0002]

The projection exposure apparatus for manufacture of semiconductor devices, a reticle formed with an electronic circuit pattern, with a light beam from the lighting device and light irradiation, and the projection exposure onto a wafer surface the electronic circuit pattern under the projection optical system ing. At this time, the illuminance distribution is set to the illumination range of the reticle surface or the wafer surface in order to achieve high resolution.
Illumination should be uniform.

[0003] Examples example, in a projection exposure apparatus called a preceding stepper, using a lighting device having a <br/> the optical integrator and the collimator lens having an array of micro lenses several at a predetermined pitch, the illuminated light surface Reticle surface
The exposure light is uniformly applied to the wafer surface .

[0004] illuminating device, by using such an optical integrator to form a plurality of secondary light sources which only corresponds to the number of microlenses, in the light flux from the respective secondary light sources, the illuminated surface, from a plurality of directions, irradiation <br/> and bright superimposed manner, thereby achieving a uniform illuminance distribution.

[0005] Also, an inner surface reflection type integrator, Hitoshi illuminance distribution by using the above-mentioned integrator amplitude division type
A lighting device having improved uniformity is disclosed in, for example, JP-A-64-1.
No. 93 and Japanese Patent Laid-Open Nos. 1-295216 and 1
It is proposed in Japanese Patent Laid-Open No. 2771718 and Japanese Patent Laid-Open No. 2-48627.

[0006] Figure 9 is a partial schematic view of a lighting apparatus using the integrator internal reflection type and amplitude division type by the present applicant proposed in JP Gantaira 9-69671.

In the figure, the laser light emitted from the laser light source 101 is once converged by the lens system 107 just before the light incident surface of the light pipe 110 which is an internal reflection type integrator, and then diverges to the light pipe 110. , Is incident on the inner reflection surface at a predetermined divergence angle.

Since the divergent laser light incident on the light pipe 110 propagates while being reflected on the inner surface of the light pipe 110, the light pipe 110 is a plane perpendicular to the optical axis, for example, plane 1.
A plurality of virtual images of the laser light source 101 are formed on 13.

At the light exit surface 110 'of the light pipe 110,
A plurality of virtual images, that is, a plurality of laser light fluxes that appear as if they were emitted from a plurality of apparent light sources are superposed. Therefore, a surface light source having a uniform intensity distribution is formed on the light exit surface 110 ′ of the light pipe 110.

Condenser lens 105 and aperture stop 111
The optical system having the field lens 112 and the light exit surface 110 ′ of the light pipe 110 and the light incident surface 106 of the fly-eye lens 114, which is an amplitude division type integrator, are in an optically conjugate relationship. As a result, a surface light source having a uniform intensity distribution on the light exit surface 110 ′ is imaged on the light incident surface 106 of the fly-eye lens 114, and light having a uniform cross-sectional intensity distribution is formed on the light incident surface 106 of the fly-eye lens 114. Is incident. The fly-eye lens 114 forms a plurality of light sources (secondary light sources) on its light exit surface, and a condenser lens system (not shown) superimposes light fluxes from the plurality of light sources on a reticle (not shown) to form a pattern of the reticle. The whole is illuminated with a uniform light intensity. The LF in FIG. 9 is an optical system.
(105, 111, 112) shows the image forming light flux, and NA is
The numerical aperture on the light emission side of this optical system is shown.

Further, the shape of the light pipe 110 is determined in consideration of the divergence angle of the laser light by the lens system 107 and the length and width of the light pipe 110, and each light source advances to each point on the light incident surface 106. The optical path length difference of the laser light is set to be equal to or longer than the coherent lens length of the laser light. By lowering the temporal coherence lens than this, generation of speckles (interference fringes) on the light incident surface 106 is suppressed.

[0012]

In the recent manufacture of highly integrated semiconductor devices such as VLSIs, it is required that the uniformity of the illuminance distribution required when printing a circuit pattern is extremely high. ing. Increase the transmittance of the entire optical system
There is also a demand for reducing the decrease in the amount of exposure light.
It

However , in the illumination device shown in FIG. 9, in order to form a uniform surface light source on the exit surface of the light pipe, it is preferable that the number of internal reflections of the divergent light beam is large. For that purpose, the diameter may be fixed and the length of the light pipe may be lengthened, but if it is lengthened, the transmittance decreases due to absorption. For this reason, the length cannot be increased beyond a certain level.

That is, if the uniformity of the illuminance distribution is prioritized , the light is transmitted.
Rate is reduced, it is not possible to obtain a surface light source with the desired amount of light,
If priority is given to the transmittance, the length becomes insufficient, and as a result it becomes difficult to obtain a uniform surface light source.

[0015]

The present invention reduces the transmittance of the optical system too much.
Without forming a light pattern with a uniform light intensity distribution in the cross section of the light flux.
It is an object of the present invention to provide a lighting device and a projection device.

[0017]

According to another aspect of the present invention, there is provided an illuminating device comprising: a light source; an exit angle preserving optical element for ejecting a light beam from the light source at a constant divergence angle; and an exit angle preserving optical element. A condensing optical system for condensing a light beam, and a diffractive optical element for forming a light pattern of a desired shape having a uniform light intensity distribution on a predetermined surface by using the light beam from the condensing optical system, or A diffractive optical element and a relay optical system, a zoom optical system for projecting the illuminance distribution on the predetermined surface onto the incident surface of the multi-beam generation means at a desired magnification, and an irradiation surface of the light flux from the exit surface of the multi-beam generation means. It is characterized in that it has an illuminating means for irradiating it on top of it. According to a second aspect of the invention, in the first aspect of the invention, the divergence angle is different based on the change of the projection magnification when the light flux from the predetermined surface is projected onto the incident surface of the multiple light flux generating means by the zoom optical system. It is characterized in that the numerical aperture of incident light flux to the multi-beam generation means is adjusted by switching to the exit angle preservation optical element. According to a third aspect of the present invention, in the first aspect of the present invention, a plurality of the diffractive optical elements are provided, and the plurality of diffractive optical elements form light patterns having different shapes. One of them is selectively arranged in the optical path to change the illuminance distribution on the incident surface of the multi-beam generation means. According to a fourth aspect of the present invention, in the first aspect of the invention, the emission angle preserving optical element is a fly-eye lens in which a plurality of minute lenses are two-dimensionally arranged. The invention of claim 5 is characterized in that, in the invention of claim 1, the diffractive optical element comprises a phase type or amplitude type computer generated hologram. According to a sixth aspect of the present invention, in the first aspect of the present invention, the multi-beam generation means includes a fly-eye lens in which a plurality of minute lenses are two-dimensionally arranged, and the incident light beam is divided into multiple light beams and emitted. It is characterized by that.

According to another aspect of the illumination device of the present invention, the light from the light source is incident on the multi-beam generation means and the multi-beam generation means is used.
Ri a first optical system for forming a plurality of secondary light sources, in the illumination device and a second optical system for irradiating superimposed on the illumination surface the light beams from each of the plurality of secondary light sources, the first 1
The optical system of (1) uses a relay optical system to generate a light pattern having a shape corresponding to the plurality of secondary light sources and a uniform light intensity distribution.
And a diffractive optical element formed on a predetermined plane
The multi-beam generation means for forming the light pattern formed on the
And an optical system for projecting the light incident surface of the optical system magnification
It is characterized in that it is provided with an imaging optical system whose rate is variable .

According to another aspect of the illumination device of the present invention, the light from the light source is made incident on the multi-beam generation means, and the multi-beam generation means is caused.
Ri a first optical system for forming a plurality of secondary light sources, in the illumination device and a second optical system for irradiating superimposed on the illumination surface the light beams from each of the plurality of secondary light sources, the first 1
The optical system of (1) uses a relay optical system to generate a light pattern having a shape corresponding to the plurality of secondary light sources and a uniform light intensity distribution.
And a hologram to be formed on a predetermined plane
The formed light pattern of the multi-beam generation means
An optical system for projecting on a light incident surface , wherein the optical system has a magnification
Is provided with a variable imaging optical system .

According to a ninth aspect of the invention, in the seventh aspect of the invention, the first optical system is such that the shapes of the light patterns are mutually different.
A plurality of different diffractive optical elements,
One of the folding optical elements is selectively in the optical path of the light from the light source.
It is characterized by being placed in . The invention of claim 10 is
In the invention of claim 8 , the first optical system is the optical path.
Having multiple holograms with different turn shapes
And one of the plurality of holograms is selectively the light source.
It is characterized in that it is arranged in the optical path of light from .

The projection exposure apparatus according to the invention of claim 11 is a claim
In the luminous flux from the lighting device according to any one of items 1 to 10,
Therefore, the illuminated reticle pattern is projected onto the substrate to be exposed.
Characterized by the shadow.

According to a twelfth aspect of the present invention, a device manufacturing method illuminates a device pattern of a reticle with a light beam from the illumination device according to any one of the first to tenth aspects, and exposes the device pattern on a wafer. The device is manufactured using a process of developing the wafer after exposure.

[0023]

[0024]

[0025]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS FIG. 1 is a schematic view of a main part of a first embodiment of a lighting device of the present invention. This drawing shows the case where the illumination apparatus is applied to a reduction type projection exposure apparatus for manufacturing semiconductor elements (device), which is called a stepper, as an example.

[0026] In the figure, 1 is Ru Oh <br/> a light source an ultra-high pressure mercury lamp or excimer laser having a high luminance which emit ultraviolet rays and far ultraviolet rays and the like.

Reference numeral 2 denotes an exit angle preserving optical element, which emits an incident light beam with a constant exit angle. A condensing optical system 3 condenses the light flux emitted from the emission angle preserving optical element 2 at a desired emission angle 2a and guides it to the diffractive optical element 4.

A relay optical system 41 guides the light flux from the diffractive optical element 4 to an aperture 42 which is a field stop . This Ru light pattern with a desired shape as described later on the aperture 42 is formed in a desired illuminance distribution <br/>. Incidentally, in guiding the light beam to direct the aperture 42 from the diffractive optical element 4 without using a relay optical system 41, it may be formed a light pattern of the illuminance distribution of the desired shape on the surface.

A zoom optical system 5 has an aperture 42.
, With a light beam from Ru can imaged projected at various magnifications light pattern on the light incident surface 7a of the multi-light beam generating means 7 such as a fly-eye lens on the aperture 42. The multi- beam generation means 7 forms an image of the above-mentioned light pattern having a uniform illuminance distribution on its light exit surface 7b.
A light source image 6 having a corresponding shape is formed. Denoted at 8 is an irradiation means including a condenser lens, etc.
The light flux from the light source is condensed to illuminate the irradiation surface 9 such as a mask or a reticle (hereinafter referred to as "reticle"). Collection
Each element from the optical optical system 3 to the multi-beam generation means 7 has a first
The condenser lens 8 constitutes a second optical system.
Are configured.

The pattern drawn disposed the reticle illuminated surface 9 Ru is reduced and projected onto <br/> upper blade which is a photosensitive substrate by the projection optical system (not shown).

[0031]

Next, the configuration of each element shown in FIG. 1 will be described.

The exit angle preserving optical element 2 is composed of an aperture 21 and a lens system 22 as shown in FIG. The incident light beam is, for example, the light beam 27 even with very small displacement of the direction perpendicular to (the optical axis 27aa) light beam 28 (the optical axis 28a) to the optical axis incident and exit angles 29a of the light flux emitted from the element 2 It has constant optical properties that do not change .

Further, the exit angle preservation optical element 2 is shown in FIG.
As shown in (B), a fly-eye lens including a plurality of minute lenses 23 may be used. In this case, the emission angle 29b of the light beam is determined by the shape of the fly-eye lens 23. Also in this case, the optical axis of the incident light beam slightly changes and the light beam 27
From the (optical axis 27a) to the state of the light beam 28 (optical axis 28a)
Even if the light beam changes and is incident, the emission angle 29b of the emitted light beam does not change and is always constant.

The diffractive optical element 4 is designed in advance so as to generate an incident light beam through the relay optical system 41 at the position of the aperture 42 to form a light pattern having a desired illuminance distribution such as a circle or an annular zone. It consists of computer generated holograms and uses amplitude distribution type and phase distribution type kinoforms.

3A and 3B show diffractive optical element 4 respectively.
FIG. The diffractive optical element shown in FIG. 3A is a phase-generated computer hologram (Computer Generated Hologram , C
This is an example using GH), and the phase distribution is expressed as a grayscale distribution. The computer generated hologram is a hologram created by calculating an interference fringe pattern, which is obtained by the interference between the object light and the reference light, and directly outputting the result by a drawing device. The interference fringe shape for obtaining a desired illuminance distribution as reproduction light can be easily obtained by optimizing it by iterative calculation by a computer. The diffractive optical element shown in FIG. 3B is an example using a phase type CGH,
The example of the cross-sectional shape is typically shown. As described above, the semiconductor element manufacturing technique can be applied to the fabrication of the stepwise cross section, and the fabrication of the element having fine pitch irregularities is relatively easily realized.

The rear Pacha 4'm here in the diffractive optical element 4
The desired light pattern of the illuminance distribution for antibody originating in two positions
Putter, called for example circular shape illustrated in FIG. 4 (A), or annular shown in FIG. 4 (B), or a quadrupole shown in FIG. 4 (C)
Emissions, etc., including a good optimal distribution exposure using various reticle.
These Ru is projected in a desired size on the incident surface 7a of the multi-light beam generating optical system 7 by the zoom optical system 5 described below. Further, a plurality of diffractive optical elements that form these different light pattern, the apparatus of Figure 1, by switching to leave with taking the switching means of the turret or the like (not shown)
It is changed with a variety of lighting conditions.

The light beam incident on the diffractive optical element 4 undergoes a predetermined amplitude modulation or phase modulation to be diffracted, and is patterned at the position of the aperture 42 via the relay optical system 41. Light of desired shape, as shown in Figure 4, with uniform intensity within
Form a pattern . Here, the positions of the diffractive optical element 4 and the aperture 42 are arranged so that they have a Fourier transform plane relationship with each other.

Next, a change in magnification of the zoom optical system 5 will be described. The light pattern 4a having a uniform light intensity fraction <br/> distribution formed by the diffractive optical element 4, uniform to the multi-light beam generating optical system 7 of the light incident surface 7a on the desired magnification by the zoom optical system 5
The image is projected as the light source image 6 of the illuminance distribution . The desired magnification here is a magnification for setting the uniform light source image 6 of a size such that the incident angle 19 of the irradiation light beam on the irradiation surface 9 becomes an optimum value for exposure.

Now, for the desired magnification m, the zoom optical system 5
NA 'is the incident side numerical aperture determined by the incident angle 15
Letting NA ″ be the exit side numerical aperture determined by the exit angle 16, NA ′ = m · NA ″ (1) holds. Wherein the size of the exit angle 16 is in a range that does not exceed the entrance side numerical aperture of the multibeam generation unit 7, it is desirable from the viewpoint of the illumination efficiency is as closely as possible,
The value of the emission angle 16 is set to the optimum angle depending on the multi-beam generation means 7. Therefore, as shown by the equation (1), when the optimum magnification for exposure under a certain condition is determined, the optimum angle of the exit angle 15 from the aperture 42 is also determined.

In the present embodiment, the value of the incident angle 15 to the zoom optical system depends on the size of the irradiation area 4b of the light beam incident on the diffractive optical element 4, and the size thereof is the exit angle preserving optical element. This is achieved by changing the size of the irradiation region 4b by changing the illumination condition of the emission angle preserving optical element 2 by utilizing the fact that it depends on the emission angle 2a of 2. This will be described later with reference to FIG.

The multi- beam generation means 7 is composed of a fly-eye lens composed of a plurality of minute lenses, a fiber bundle, etc., and a surface light source composed of a plurality of point light sources (secondary light sources) on its light exit surface 7b.
6 is formed. In the present embodiment, the multi-beam generation means 7 has a plurality of optical axes, and has a small area having a finite area with each optical axis as a center, and one light beam is generated in each area. An optical element that can be specified. Fly-eye lenses are an example of this type of device.
It

Uniform on the light incident surface 7a of the multi- beam generation means 7
When the light source image 6 having a uniform light intensity distribution is projected, the illuminance distribution on the incident surface is directly transferred to the light exit surface 7b and is there.
Also Ru are the same light source (image) 6 formed. Then, each small area (for example, a lens element) of the exit surface 7b of the multi-beam generation means 7
The light rays emitted from the cement), the irradiated surface by irradiation means 8 9
By superimposing and irradiating the surface, the surface to be irradiated 9 is illuminated so as to have a uniform illuminance distribution as a whole.

The light exit surface 7b of the multi- beam generation means 7 is conjugate with the entrance pupil of a projection lens (not shown) that projects the pattern on the reticle surface placed on the illuminated surface 9 onto the wafer surface. ing.

Next, switching control of the above-mentioned exit angle preservation optical element 2 will be described in detail with reference to FIGS. 5 (A) and 5 (B). In each figure, reference numeral 12a is an emission angle conservation optical element having a small emission angle 12aa, and 12b is an emission angle conservation optical element having a large emission angle 12ba. Others are the same as those described in FIG.

Generally, in an illuminating device used in a semiconductor device manufacturing apparatus, it is required to set the incident angle of the light beam incident on the surface 9 to be illuminated to a desired angle. The exit angle preserving optical element 2 a plurality, prepared in this embodiment, is set the incident angle of the illuminated surface 9 to a desired angle by switching this by utilizing a means such as a motor Retto.

FIG. 5A shows a case where the incident angle 19a of the light beam incident on the surface 9 to be illuminated is relatively small (this is referred to as a small σ value). In order to reduce the σ value in this embodiment, the incident surface 7a of the multi-beam generation means 7 is
Above, the light pattern 4 formed on the aperture 42
It is necessary to form the image 6a of a at a small magnification. This is achieved by changing the magnification of the zoom optical system 5. As described above, the value of the emission angle 16a is set to the optimum angle depending on the multi-beam generation means 7.

Therefore, as shown by the equation (1), when the magnification for obtaining the desired σ value is determined, the diffractive optical element 4
The divergence angle 15a of the light flux from the aperture 42 is also uniquely determined based on the light pattern 4a formed by Since the divergence angle 15a is determined by the width 4ab of the light beam incident on the diffractive optical element 4, the divergence angle 15a is determined by the exit angle preservation optical element 12a.
The light flux width 14ab is controlled to be narrowed by switching to a small emission angle 12aa.

As described above, illumination is performed with high illumination efficiency and a small incident angle 19a (that is, a small σ value).

[0050] Further, FIG. 5 (B) the magnitude of the incident angle 19b
2 shows an embodiment in the case of no (that is, a large σ value ) . In this case, by switching to the emission angle storage optical element 12b having a large emission angle 12ba, the emission angle 1ba
2ba is increased, thereby increasing the width 14bb of the light beam incident on the diffractive optical element 4, and the aperture 42 is formed based on the light pattern 4a formed by the diffractive optical element 4.
The angle 15b of the light beam diverging from is increased. And light
The image 6b of the pattern 4a is generated at a large magnification by the multi- beam generation means 7
The projection angle 16b can be made substantially the same as the above-mentioned angle 16a from the relationship of the expression (1) even when the projection is performed on the screen. As described above, the illumination efficiency is high and the emission angle 19b is large (that is, the σ value is large).

At this time, the divergence angle of the light beam diverging from the diffractive optical element 4 is the angle 14 in FIG.
a and the angle 14b in FIG. 5B are the same, the size of the light pattern 4a is the same as that of the exit angle preserving optical element 2.
It does not change even if you switch. Incidentally, depending on the switching of the σ value , if necessary, the diffractive optical element 4 is also provided with a switching means (not shown) such as a turret, and the angle preserving optical element 12 is used.
You may switch simultaneously with the switching of a and b .

Further, for example, as described with reference to FIG.
Light beam from the laser light source 1, even when a minute displacement of the disturbance, the emission angle of the light beam from the exit angle preserving optical element 2 is stored in a width 4b of the light beam incident on the diffractive optical element 4 in FIG. 1 There is no fluctuation, and there is almost no fluctuation when the entire light source image in the minute lens 51 of the multi-beam generation means 7 is viewed macroscopically. Therefore, becomes negligibly small influence on the illuminance distribution on the illuminated surface 9.

This shows the advantage that the present invention is a system which is very stable against fluctuations in the luminous flux from the laser light source.

FIG. 6 is a schematic view of a main part of a second embodiment of a projection exposure apparatus for manufacturing a semiconductor device using the illumination device of the present invention. In the figure, the same elements as those shown in FIG. 1 are designated by the same reference numerals.

In the figure, reference numeral 91 denotes a light beam shaping optical system for shaping the coherent light beam from the laser light source 1 into a desired beam shape. Reference numeral 92 denotes an incoherent optical system for making a coherent laser light beam incoherent. Further, 93 is a projection optical system of the exposure apparatus, and 94 is a photosensitive substrate such as a wafer coated with a photosensitive material. Description of the same numbers as in FIG. 1 is omitted.

The light beam emitted from the laser light source 1 enters a light beam shaping optical system 91 through a light beam routing optical system (not shown) including a mirror and a relay lens. The light flux shaping optical system 91 is composed of a plurality of cylindrical lenses or a beam expander, and converts the aspect ratio of the light flux cross-sectional shape into a desired value.

The light flux shaped by the light flux shaping optical system 91 is for the purpose of preventing the light from interfering with each other on the wafer surface 94 to generate speckles.
It is incident on the beam 2, and is converted into an incoherent light beam.

As the incoherent optical system 92, for example, as disclosed in Japanese Patent Laid-Open No. 3-215930, an incident light beam is split into at least two light beams (for example, p-polarized light and s-polarized light) on a light splitting surface. After that, one of the light fluxes is given an optical path length difference of at least the coherence length of the light fluxes through an optical member, and then is re-guided to the dividing surface, and is superposed on the other light flux and emitted. Is used to form a plurality of mutually incoherent light beams.

The light beam thus made incoherent is incident on the exit angle preserving optical element 2.

By the procedure already described with reference to FIG. 1 below, the light fluxes emitted from the respective minute regions of the multi-light flux generation means 7 are irradiated onto the reticle R on the surface 9 to be irradiated by the irradiation means 8 so as to be overlapped and irradiated. The irradiation surface 9 is illuminated so as to have a uniform illuminance distribution as a whole.

[0061] The light beam having the information of the circuit pattern or the like on the reticle R surface formed on the illuminated surface 9, the circuit on the photosensitive substrate 94 in an optimal ratio to exposure by the projection optical system 93
The pattern is projected and imaged to expose the circuit pattern.

The photosensitive substrate is fixed to a photosensitive substrate stage (not shown) by vacuum suction or the like, and has a function of moving in parallel up , down, front, back, left , and right of the paper surface , and the movement is also not shown in the laser interferometer. It is controlled by a length measuring instrument such as.

Next, an embodiment of a method of manufacturing a semiconductor device using the projection exposure apparatus described above will be described.

FIG. 7 shows a semiconductor device (semiconductor chip such as IC or LSI, liquid crystal panel or CCD magnetic head ).
2 shows a flow of manufacturing.

In step 1 (circuit design), a semiconductor device circuit is designed. In step 2 (mask manufacturing), a mask having the designed circuit pattern is manufactured.

On the other hand, in step 3 (wafer manufacturing), a wafer is manufactured using a material such as silicon. Step 4
The (wafer process) is called a pre-process, and an actual circuit is formed on the wafer by lithography using the prepared mask and wafer.

The next step 5 (assembly) is called a post-process, and is a process of forming a semiconductor chip using the wafer manufactured in step 4, including an assembly process (dicing, bonding), a packaging process (chip encapsulation). Etc. are included.

In step 6 (inspection), the semiconductor device manufactured in step 5 undergoes inspections such as an operation confirmation test and a durability test. Through these steps, the semiconductor device is completed and shipped (step 7).

FIG. 8 shows a detailed flow of the wafer process. In step 11 (oxidation), the surface of the wafer is oxidized. In step 12 (CVD), an insulating film is formed on the wafer surface.

In step 13 (electrode formation), electrodes are formed on the wafer by vapor deposition. In step 14 (ion implantation), ions are implanted in the wafer. Step 15
In (resist processing), a photosensitive agent is applied to the wafer. In step 16 (exposure), the circuit pattern of the mask is printed and exposed on the wafer by the above-described exposure apparatus.

In step 17 (development), the exposed wafer is developed. In step 18 (etching), parts other than the developed resist are scraped off. In step 19 (resist stripping), the resist that is no longer needed after etching is removed. By repeating these steps, multiple circuit patterns are formed on the wafer. By using the manufacturing method of this embodiment, it is possible to easily manufacture a highly integrated semiconductor device, which has been difficult to manufacture in the past.

[0072]

According to the present invention, in Rukoto enhance the uniformity of light intensity distribution in the light beam, while achieving a uniform illuminance distribution on the illuminated surface, the semiconductor device with improved light collection efficiency It was possible to provide an illuminating device suitable for the manufacturing apparatus and a projection exposure apparatus using the same.

This is a pipe (internal reflection type integration
In place of a glass material, it has a thin glass material and a uniform light intensity distribution.
And using a diffractive optical element capable of generating a light pattern having a desired shape . Therefore, it is possible to obtain an effect that a highly efficient illumination device can be obtained even in the vacuum ultraviolet region.

[Brief description of drawings]

FIG. 1 is a schematic view of a main part of a first embodiment of a lighting device of the present invention.

FIG. 2 is an explanatory diagram of a part of the first embodiment.

FIG. 3 is an explanatory diagram of a part of the first embodiment.

4 is an explanatory diagram of an illuminance distribution on the aperture plane of FIG.

FIG. 5 is an explanatory diagram when a part of the first embodiment is replaced.

FIG. 6 is a schematic diagram of a main part of a second embodiment of a projection exposure apparatus using the illumination device of the present invention.

FIG. 7 is a flowchart of a device manufacturing method of the present invention.

FIG. 8 is a flowchart of a wafer process.

FIG. 9 Illumination device according to the applicant's previous proposal

[Explanation of symbols]

1: Laser light source 2: Exit angle preservation optical element 3: Condensing optical system 4: Diffractive optical element 5: Zoom optical system 7: Multi-beam generation optical system 8: Irradiation means 9: Irradiated surface 41: Relay optical system 42: Aperture

─────────────────────────────────────────────────── ─── Continuation of the front page (56) Reference JP-A-7-201697 (JP, A) JP-A-5-102010 (JP, A) JP-A-6-61121 (JP, A) JP-A-6- 310396 (JP, A) JP 7-263313 (JP, A) JP 8-328261 (JP, A) JP 97940 (JP, A) (58) Fields investigated (Int.Cl. ⁷ , DB name) H01L 21/027

Claims (12)

(57) [Claims] 1. A light source, an emission angle preserving optical element for ejecting a luminous flux from the light source at a constant divergence angle, a condensing optical system for condensing the luminous flux from the ejection angle preserving optical element, and the condensing unit. A diffractive optical element for forming a light pattern of a desired shape having a uniform light intensity distribution on a predetermined surface using a light beam from an optical system, or a diffractive optical element and a relay optical system,
A zoom optical system for projecting the illuminance distribution on the predetermined surface onto the entrance surface of the multi-beam generation means at a desired magnification, and an illuminating means for irradiating the irradiation surface with the light flux from the exit surface of the multi-beam generation means. And a lighting device. 2. Based on a change in projection magnification when the light beam from the predetermined surface is projected by the zoom optical system onto the incident surface of the multi-light beam generating means, switching to an exit angle preserving optical element having a different divergence angle is performed. The illuminating device according to claim 1, wherein the numerical aperture of an incident light beam to the multi-beam generation means is adjusted. 3. A plurality of the diffractive optical elements are provided, wherein the plurality of diffractive optical elements form light patterns having different shapes, and one of them is selectively arranged in the optical path. The illuminating device according to claim 1, wherein the illuminance distribution on the incident surface of the multi-beam generation means is changed thereby. 4. The illumination device according to claim 1, wherein the exit angle preserving optical element comprises a fly-eye lens in which a plurality of minute lenses are two-dimensionally arranged. 5. The illumination device according to claim 1, wherein the diffractive optical element is a phase type or amplitude type computer generated hologram. 6. The multi-beam generation means comprises a fly-eye lens in which a plurality of microlenses are two-dimensionally arranged, and divides an incident light beam into multiple light beams for emission. Lighting equipment. 7. A first optical system for making light from a light source incident on a multi-beam generation means and forming a plurality of secondary light sources by the multi-beam generation means , and light beams from each of the plurality of secondary light sources. And a second optical system for irradiating the surface to be illuminated with the second optical system, wherein the first optical system has a light pattern having a shape corresponding to the plurality of secondary light sources and a uniform light intensity distribution. Relay optics
A diffractive optical element formed on a predetermined plane through the system ,
The light pattern formed on the plane is converted into the multi-beam.
And an optical system for projecting the light incident surface of the generating means, said light
The lighting system is equipped with an imaging optical system whose magnification is variable . 8. A first optical system for making light from a light source incident on a multi-beam generation means and forming a plurality of secondary light sources by the multi-beam generation means, and a light beam from each of the plurality of secondary light sources. And a second optical system for irradiating the surface to be illuminated with the second optical system, wherein the first optical system has a light pattern having a shape corresponding to the plurality of secondary light sources and a uniform light intensity distribution. Relay optics
A hologram to be formed on a predetermined plane through the system, before
The multi-beam emission from the light pattern formed on the plane.
And an optical system for projecting the light incident surface of the raw device, the optical
The illumination system is characterized in that the system includes an imaging optical system with variable magnification . 9. The first optical system includes a plurality of the diffractive optical elements having different shapes of the light patterns, and one of the plurality of diffractive optical elements selectively selects an optical path of light from the light source. The lighting device according to claim 7, wherein the lighting device is arranged inside. 10. The first optical system includes a plurality of holograms having different shapes of the light pattern, and one of the plurality of holograms is selectively arranged in an optical path of light from the light source. The lighting device according to claim 8, wherein: 11. The projection exposure apparatus, wherein a pattern of the reticle illuminated by the light beam from the lighting device of any one of claims 1-10 are projected onto the exposure substrate. 12. illuminates the reticle device pattern by the light beam from the illumination device of any one of claims 1-10, the device pattern is exposed onto the wafer, developing the wafer after exposure A method for manufacturing a device, characterized in that the device is manufactured using steps.