JP3390285B2 - Irrigation equipment in plant cultivation facilities - Google Patents
Irrigation equipment in plant cultivation facilitiesInfo
- Publication number
- JP3390285B2 JP3390285B2 JP08519195A JP8519195A JP3390285B2 JP 3390285 B2 JP3390285 B2 JP 3390285B2 JP 08519195 A JP08519195 A JP 08519195A JP 8519195 A JP8519195 A JP 8519195A JP 3390285 B2 JP3390285 B2 JP 3390285B2
- Authority
- JP
- Japan
- Prior art keywords
- water
- ion concentration
- hydrogen ion
- cultivation bed
- liquid fertilizer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- Y02P60/216—
Description
【発明の詳細な説明】
【０００１】
【産業上の利用分野】本発明は、給水源から栽培ベッド
に常時または適時間ごとに給水して栽培ベッドで栽培中
の植物に灌水する植物栽培施設において、栽培する植物
の種類や生育状態等に応じて、栽培ベッドに供給する水
の水素イオン濃度または液肥の濃度を的確に管理するこ
とができる植物栽培施設における灌水装置に関する。
【０００２】
【従来の技術】従来、植物栽培施設においては、栽培ベ
ッドに常時または適時間ごとに灌水することが行われて
おり、また、栽培ベッドに給水する水に水素イオン濃度
調整溶液を混合してその値を植物の生育に適するように
調整したり、さらに、栽培ベッドに給水する水に液肥を
施すことが行われている。
【０００３】
【発明が解決しようとする課題】ところで、従来の植物
栽培施設において行われている灌水の水素イオン濃度の
調整は、給水タンク、給水ライン上あるいは栽培ベッド
上等で水の水素イオン濃度を計り、その測定値に基づい
て水素イオン濃度調整溶液の量を決め、その量の水素イ
オン濃度調整溶液を給水源または給水ライン上で混合す
るだけであったから、栽培施設の規模が大きい場合や給
水源と栽培ベッドとの間で水を循環させて使用する場合
等にあっては、栽培ベッドに供給される水の水素イオン
濃度を場所や時間にかかわらず適正値に管理することが
困難であった。
【０００４】また、従来の植物栽培施設においては、植
物の生育に必要な肥料分を、給水源または給水ライン上
で液肥を混合することにより施すことも行われている
が、給水源または給水ライン上で単に予め決めた量の液
肥を混合することでは、灌水中の肥料分を常時適正に保
つことは困難であった。
【０００５】そこで、本発明は、このような従来の植物
栽培施設における課題に対処しようとするものであっ
て、給水源から栽培ベッドに常時または適時間ごとに給
水して栽培ベッドで栽培中の植物に灌水する植物栽培施
設において、栽培ベッドに供給する水の水素イオン濃
度、および、栽培ベッドに供給する水の肥料濃度をとも
に予め設定した値に適切に管理することができる植物栽
培施設における灌水装置を提供することを目的とする。
【０００６】
【課題を解決するための手段】上記目的を達成するた
め、本発明に係る第１の構成は、給水源から栽培ベッド
に常時または適時間ごとに給水して栽培ベッドで栽培中
の植物に灌水する植物栽培施設において、給水源と栽培
ベッド間の給水ラインに、栽培ベッドに給水する水の水
素イオン濃度が予め設定した値となるように上昇または
下降調整する水素イオン濃度調整装置とこの水素イオン
濃度の調整位置より下流の水の水素イオン濃度が予め設
定した値となるように上記水素イオン濃度調整装置を制
御する制御系機構を設けるとともに、栽培ベッドに給水
する水の電気伝導度が予め設定した 値となるように液肥
を注入する液肥供給装置とこの液肥供給装置による液肥
注入位置より下流の水の電気伝導度が予め設定した値と
なるように上記液肥供給装置を制御する制御系機構を設
け、上記液肥供給装置とその制御系機構とを、水素イオ
ン濃度調整装置による水素イオン濃度の調整結果が予め
設定した値に保持される水素イオン濃度の調整位置より
下流に設けた植物栽培施設における灌水装置である。
【０００７】
【作用】本発明に係る第１の構成によれば、水素イオン
濃度調整装置による水素イオン濃度の調整結果が予め設
定した値に的確に保持されるとともに、液肥供給装置に
よる肥料濃度を予め設定した値に的確に保持される。
【０００８】
【実施例】図１には本発明に係る植物栽培装置における
灌水装置が例示されている。図１にいて、１は１次貯水
槽、２は中継タンクであって、１次貯水槽１および中継
タンク２は給水源をなしている。３は栽培ベッドであっ
て、栽培ベッド３は所要数設けられている。栽培ベッド
３は、その上に例えば花卉鉢物等を多数並べて置き、鉢
物の底面から灌水するためのウオーターベンチをなして
いる。給水源の中継タンク２から各栽培ベッド３間には
給水ライン４が設けられており、送水ポンプ５により中
継タンク２から各栽培ベッド３に適時間ごとに給水され
るようになっている。また、各栽培ベッド３と１次貯水
槽１との間には、各栽培ベッド３からの排水を戻す排水
ライン６が設けられている。図中、Ｐはポンプ、Ｆはフ
ィルターである。
【０００９】中継タンク２と栽培ベッド３との間の給水
ライン４には、水素イオン濃度（ＰＨ）調整装置７が設
けられており、その下流には液肥供給装置８が設けられ
ている。
【００１０】水素イオン濃度調整装置７は、水素イオン
濃度上昇用溶液タンク９と水素イオン濃度下降用溶液タ
ンク１０から給水ライン４にその溶液を混合するもので
あり、給水ライン４の水素イオン濃度調整装置７より上
流には、給水する水の水素イオン濃度を予め設定するＰ
Ｈ指示計１１とその指示値を表示するＰＨ計１２が設け
られている。ＰＨ計１２とＰＨ用定量ポンプ１３，１４
間には信号ライン１５が形成されている。
【００１１】また、液肥供給装置８は、植物の３大栄養
成分である窒素、リン酸、カリウムを主成分とする各液
肥の液肥タンク１６，１７，１８から給水ライン４に各
液肥を混合するものであり、液肥供給装置８より上流に
は、肥料濃度を電気伝導度（ＥＣ）で指示するＥＣ指示
計１９とその指示値を表示するＥＣ計２０が設けられて
いる。ＥＣ計２０と液肥用定量ポンプ２１，２２，２３
間には信号ライン２４が形成されている。
【００１２】給水ライン４の水素イオン濃度調整装置７
より下流には、水の水素イオン濃度を再度検出するため
の水素イオン濃度計である再チェック用ＰＨ計２５が設
けられており、この再チェック用ＰＨ計２５と前記信号
ライン１５間にも信号ラインが形成されている。再チェ
ック用ＰＨ計２５には再チェック用ＰＨ指示計２６を併
設して、再チェック用ＰＨ計２５に予め設定した水素イ
オン濃度を指示するようにしている。図２には、給水源
と栽培ベッド３との間の給水ライン４において水の水素
イオン濃度を調整する制御態様がフローチャートで示し
ている。
【００１３】給水ライン４の液肥供給装置８による液肥
注入位置より下流には、水の電気伝導度を検出するため
の電気伝導度計である再チェック用ＥＣ計２７が設けら
れており、この再チェック用ＥＣ計２７と前記信号ライ
ン２４間にも信号ラインが形成されている。再チェック
用ＥＣ計２７には再チェック用ＥＣ指示計２８を併設し
て、再チェック用ＥＣ計２７に予め設定した電気伝導度
を指示するようにしている。図３には、給水源と栽培ベ
ッド３との間の給水ライン４において液肥の混合と肥料
濃度の制御態様がフローチャートで示している。
【００１４】以上のように構成されたものにおいて、水
素イオン濃度調整装置７による水素イオン濃度の調整位
置より下流の水の水素イオン濃度が再チェック用ＰＨ計
２５で検出され、予め設定した値となるように水素イオ
ン濃度調整装置７が制御されるので、水素イオン濃度調
整装置７による水素イオン濃度の調整結果が予め設定し
た値に的確に保持される。通常、花卉の栽培において
は、灌水の水素イオン濃度ＰＨが５．５〜８が適当であ
るが、実施例に係る装置によれば、その管理を的確に行
うことができる。
【００１５】さらに、液肥供給装置８による液肥注入位
置より下流の水の電気伝導度が再チェック用ＥＣ計２７
により検出され、液肥供給装置８による液肥注入位置よ
り下流の水の肥料濃度が電気伝導度により敏速にしかも
高精度で検出できるうえ、液肥供給装置８による肥料濃
度が予め設定した値に的確に保持される。通常、地下水
の電気伝導度は０．２〜０．３ｍ／ｓ程度であるが、花
卉の栽培においては、灌水の電気伝導度は１〜２ｍ／ｓ
程度の肥料濃度が適当であるので、地下水を給水源とす
る場合は液肥を注入して上記値に調整する必要がある。
実施例に係る装置によれば、その管理を的確に行うこと
ができる。
【００１６】このため、栽培ベッド３に給水される水
は、栽培する植物の種類や生育状態等に応じて予め設定
した最適な水素イオン濃度および肥料濃度に的確に管理
できるので、栽培中の植物に適切な灌水と施肥等を行う
ことができて、植物の生育促進と品質の向上を図ること
ができる。
【００１７】
【発明の効果】本発明によれば、給水源から栽培ベッド
に常時または適時間ごとに給水して栽培ベッドで栽培中
の植物に灌水する植物栽培施設において、栽培ベッドに
供給する水の水素イオン濃度、および、栽培ベッドに供
給する水の肥料濃度をともに予め設定した値に適切に管
理することができる。Description: BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a plant cultivation facility for supplying water to a cultivation bed from a water supply source constantly or at appropriate time intervals to irrigate plants cultivated in the cultivation bed. The present invention also relates to a watering device in a plant cultivation facility capable of accurately managing the hydrogen ion concentration or the liquid fertilizer concentration of water supplied to a cultivation bed according to the type of plant to be cultivated, the growth state, and the like. [0002] Conventionally, in plant cultivation facilities, a cultivation bed is constantly or periodically watered, and a hydrogen ion concentration adjusting solution is mixed with water supplied to the cultivation bed. Then, the value is adjusted so as to be suitable for the growth of plants, and further, liquid fertilizer is applied to water supplied to a cultivation bed. [0003] Incidentally, the adjustment of the hydrogen ion concentration of irrigation performed in a conventional plant cultivation facility is performed by adjusting the hydrogen ion concentration of water in a water supply tank, a water supply line, a cultivation bed, or the like. Was measured, the amount of the hydrogen ion concentration adjusting solution was determined based on the measured value, and the amount of the hydrogen ion concentration adjusting solution was merely mixed on the water supply source or the water supply line. When water is circulated between the water supply source and the cultivation bed, it is difficult to control the hydrogen ion concentration of the water supplied to the cultivation bed to an appropriate value regardless of the place or time. there were. In a conventional plant cultivation facility, a fertilizer necessary for plant growth is also applied by mixing liquid fertilizer on a water supply source or a water supply line. It was difficult to always maintain a proper amount of fertilizer in irrigation by simply mixing a predetermined amount of liquid fertilizer. Therefore, the present invention is intended to address such a problem in a conventional plant cultivation facility, in which water is supplied from a water supply source to a cultivation bed at all times or at appropriate time intervals. in plant cultivation facilities watering a plant, the hydrogen ion concentration of the water supplied to the cultivation bed, and, watering of plant cultivation facilities can be properly managed to values both preset fertilizer concentration of water supplied to the cultivation bed It is intended to provide a device. Means for Solving the Problems In order to achieve the above object, a first configuration according to the present invention is to supply water to a cultivation bed from a water supply source at all times or at appropriate time intervals and to cultivate the cultivation bed. In a plant cultivation facility that irrigates plants, a water supply line between a water supply source and a cultivation bed, and a hydrogen ion concentration adjusting device that adjusts the hydrogen ion concentration of water supplied to the cultivation bed up or down so as to be a preset value. water Rutotomoni, the cultivation bed is provided a control system mechanism hydrogen ion concentration in the downstream of the water from the adjustment position of the hydrogen ion concentration is controlling the hydrogen ion concentration control system such that the preset value
Liquid fertilizer so that the electrical conductivity of
Liquid fertilizer supply device for injecting liquid and liquid fertilizer by this liquid fertilizer supply device
The electrical conductivity of water downstream from the injection position is
A control system mechanism to control the liquid fertilizer supply device
The liquid fertilizer supply device and its control system
The adjustment result of the hydrogen ion concentration by the
From the adjustment position of the hydrogen ion concentration maintained at the set value
It is a watering device in a plant cultivation facility provided downstream . According to the first configuration of the present invention, the result of the adjustment of the hydrogen ion concentration by the hydrogen ion concentration adjusting device is accurately held at a preset value, and the liquid fertilizer supply device
The fertilizer concentration is kept exactly at a preset value . FIG. 1 illustrates a watering device in a plant cultivation device according to the present invention. In FIG. 1, 1 is a primary water storage tank, 2 is a relay tank, and the primary water storage tank 1 and the relay tank 2 constitute a water supply source. Reference numeral 3 denotes a cultivation bed, and a required number of cultivation beds 3 are provided. The cultivation bed 3 has a water bench for arranging a large number of flower pots, for example, on the cultivation bed 3 and watering from the bottom of the pot. A water supply line 4 is provided between the relay tank 2 of the water supply source and each cultivation bed 3, and water is supplied from the relay tank 2 to each cultivation bed 3 by a water supply pump 5 at appropriate time intervals. Further, a drainage line 6 for returning drainage from each cultivation bed 3 is provided between each cultivation bed 3 and the primary water storage tank 1. In the figure, P is a pump and F is a filter. The water supply line 4 between the relay tank 2 and the cultivation bed 3 is provided with a hydrogen ion concentration (PH) adjusting device 7, and a liquid fertilizer supplying device 8 is provided downstream thereof. The hydrogen ion concentration adjusting device 7 mixes the solution from the hydrogen ion concentration increasing solution tank 9 and the hydrogen ion concentration decreasing solution tank 10 into the water supply line 4. Upstream from the device 7, P is used to preset the hydrogen ion concentration of the water to be supplied.
An H indicator 11 and a PH meter 12 for displaying the indicated value are provided. PH meter 12 and PH metering pumps 13, 14
A signal line 15 is formed between them. The liquid fertilizer supply device 8 mixes each liquid fertilizer from the liquid fertilizer tanks 16, 17, and 18 of the liquid fertilizers containing nitrogen, phosphoric acid, and potassium, which are the three main nutrients of the plant, to the water supply line 4. An EC indicator 19 for indicating the fertilizer concentration by electric conductivity (EC) and an EC meter 20 for displaying the indicated value are provided upstream of the liquid fertilizer supply device 8. EC meter 20 and liquid fertilizer metering pumps 21, 22, 23
A signal line 24 is formed between them. The hydrogen ion concentration adjusting device 7 for the water supply line 4
Further downstream, a recheck PH meter 25, which is a hydrogen ion concentration meter for detecting the hydrogen ion concentration of water again, is provided. A signal is also provided between the recheck PH meter 25 and the signal line 15. Lines are formed. A re-check PH indicator 26 is provided alongside the re-check PH meter 25 so as to indicate a preset hydrogen ion concentration to the re-check PH meter 25. FIG. 2 is a flowchart illustrating a control mode for adjusting the hydrogen ion concentration of water in the water supply line 4 between the water supply source and the cultivation bed 3. An EC meter 27 for recheck, which is an electric conductivity meter for detecting the electric conductivity of water, is provided downstream of the liquid fertilizer supply device 8 in the water supply line 4 from the liquid fertilizer supply device 8. A signal line is also formed between the check EC meter 27 and the signal line 24. The recheck EC meter 27 is provided with a recheck EC indicator 28 so that the recheck EC meter 27 indicates a preset electric conductivity. FIG. 3 is a flowchart showing a manner of controlling the mixing of liquid fertilizer and the concentration of fertilizer in the water supply line 4 between the water supply source and the cultivation bed 3. In the above configuration, the hydrogen ion concentration of the water downstream from the hydrogen ion concentration adjusting position by the hydrogen ion concentration adjusting device 7 is detected by the recheck PH meter 25, and the value set in advance is compared with the preset value. Since the hydrogen ion concentration adjusting device 7 is controlled in such a manner, the adjustment result of the hydrogen ion concentration by the hydrogen ion concentration adjusting device 7 is accurately held at a preset value. Usually, in the cultivation of flowers, the hydrogen ion concentration PH of the irrigation water is suitably 5.5 to 8, but according to the apparatus according to the embodiment, the management can be performed accurately. Further, the electric conductivity of the water downstream from the liquid manure injection position by the liquid manure supply device 8 is checked by the EC meter 27 for rechecking.
And the fertilizer concentration in the water downstream from the liquid fertilizer injection position by the liquid fertilizer supply device 8 can be quickly and accurately detected by the electric conductivity, and the fertilizer concentration by the liquid fertilizer supply device 8 is accurately maintained at a preset value. Is done. Normally, the electric conductivity of groundwater is about 0.2 to 0.3 m / s, but in cultivation of flowers, the electric conductivity of irrigation water is 1 to 2 m / s.
Since the fertilizer concentration is appropriate, it is necessary to adjust the above value by injecting liquid fertilizer when using groundwater as a water supply source.
According to the device according to the embodiment, the management can be performed accurately. For this reason, the water supplied to the cultivation bed 3 can be accurately controlled to the optimum hydrogen ion concentration and fertilizer concentration preset in accordance with the type of plant to be cultivated, the growing condition, and the like. Irrigation and fertilization can be performed appropriately, and the growth of plants can be promoted and the quality can be improved. According to the present invention, water supplied to a cultivation bed is supplied to a cultivation bed in a plant cultivation facility in which water is supplied from a water supply source to a cultivation bed constantly or at appropriate time intervals to irrigate plants cultivated in the cultivation bed. Both the hydrogen ion concentration and the fertilizer concentration of the water supplied to the cultivation bed can be appropriately managed at preset values.
【図面の簡単な説明】
【図１】本発明に係る植物栽培施設における灌水装置の
構成図である。
【図２】水素イオン濃度を調整する制御態様を示すフロ
ーチャートでる。
【図３】液肥の混合による肥料濃度の制御態様を示すフ
ローチャートである。
【符号の説明】
１ １次貯水槽
２ 中継タンク
３ 栽培ベッド
４ 給水ライン
５ 送水ポンプ
６ 排水ライン
７ 水素イオン濃度（ＰＨ）調整装置
８ 液肥供給装置
９ 水素イオン濃度上昇用溶液タンク
１０ 水素イオン濃度下降用溶液タンク
１１ ＰＨ指示計
１２ ＰＨ計
１３，１４ ＰＨ用定量ポンプ
１５ 信号ライン
１６，１７，１８ 液肥タンク
１９ ＥＣ指示計
２０ ＥＣ計
２１，２２，２３ 液肥用定量ポンプ
２４ 信号ライン
２５ 再チェック用ＰＨ計
２６ 再チェック用ＰＨ指示計
２７ 再チェック用ＥＣ計
２８ 再チェック用ＥＣ指示計BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a configuration diagram of a watering device in a plant cultivation facility according to the present invention. FIG. 2 is a flowchart illustrating a control mode for adjusting a hydrogen ion concentration. FIG. 3 is a flowchart showing a control mode of a fertilizer concentration by mixing liquid fertilizer. [Description of Signs] 1 Primary water storage tank 2 Relay tank 3 Cultivation bed 4 Water supply line 5 Water supply pump 6 Drainage line 7 Hydrogen ion concentration (PH) adjusting device 8 Liquid fertilizer supply device 9 Hydrogen ion concentration increasing solution tank 10 Hydrogen ion concentration Lowering solution tank 11 PH indicator 12 PH meter 13, 14 PH metering pump 15 Signal line 16, 17, 18 Liquid fertilizer tank 19 EC indicator 20 EC meter 21, 22, 23 Liquid fertilizer metering pump 24 Signal line 25 Recheck PH meter for re-checking 26 PH indicator for re-checking 27 EC meter for re-checking 28 EC indicator for re-checking
Claims (1)
間ごとに給水して栽培ベッドで栽培中の植物に灌水する
植物栽培施設において、給水源と栽培ベッド間の給水ラ
インに、栽培ベッドに給水する水の水素イオン濃度が予
め設定した値となるように上昇または下降調整する水素
イオン濃度調整装置とこの水素イオン濃度の調整位置よ
り下流の水の水素イオン濃度が予め設定した値となるよ
うに上記水素イオン濃度調整装置を制御する制御系機構
を設けるとともに、栽培ベッドに給水する水の電気伝導
度が予め設定した値となるように液肥を注入する液肥供
給装置とこの液肥供給装置による液肥注入位置より下流
の水の電気伝導度が予め設定した値となるように上記液
肥供給装置を制御する制御系機構を設け、上記液肥供給
装置とその制御系機構とを、水素イオン濃度調整装置に
よる水素イオン濃度の調整結果が予め設定した値に保持
される水素イオン濃度の調整位置より下流に設けたこと
を特徴とする植物栽培施設における灌水装置。(57) [Claims] [Claim 1] In a plant cultivation facility in which water is supplied from a water supply source to a cultivation bed constantly or at appropriate time intervals to irrigate plants cultivated in the cultivation bed, a water supply source and a cultivation bed the water supply line of the hydrogen ion concentration in the downstream of the water from the adjustment position of the hydrogen ion concentration of the hydrogen ion concentration control apparatus Toko hydrogen ion concentration of water feed water is raised or lowered adjusted to be a preset value the cultivation bed There Rutotomoni provided a control system mechanism for controlling the hydrogen ion concentration control system such that the preset value, the electric conductivity of water for supplying water to the cultivation bed
Liquid fertilizer supply to inject liquid fertilizer so that the degree becomes a preset value
Feeder and downstream from the liquid fertilizer injection position by this liquid fertilizer feeder
Liquid so that the electrical conductivity of the water becomes a preset value.
A control system mechanism for controlling the fertilizer supply device is provided to supply the liquid fertilizer.
Device and its control system mechanism to hydrogen ion concentration adjustment device
Adjustment result of hydrogen ion concentration maintained at a preset value
An irrigation device in a plant cultivation facility, which is provided downstream of the adjusted position of the hydrogen ion concentration to be adjusted .
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP08519195A JP3390285B2 (en) | 1995-04-11 | 1995-04-11 | Irrigation equipment in plant cultivation facilities |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP08519195A JP3390285B2 (en) | 1995-04-11 | 1995-04-11 | Irrigation equipment in plant cultivation facilities |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH08280279A JPH08280279A (en) | 1996-10-29 |
| JP3390285B2 true JP3390285B2 (en) | 2003-03-24 |
Family
ID=13851770
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP08519195A Expired - Fee Related JP3390285B2 (en) | 1995-04-11 | 1995-04-11 | Irrigation equipment in plant cultivation facilities |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3390285B2 (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001017011A (en) * | 1999-07-05 | 2001-01-23 | Taiyo Kogyo Co Ltd | Method for feeding nutritious liquid for circulating type nutriculture |
| JP2018033333A (en) * | 2016-08-30 | 2018-03-08 | 株式会社最上川環境技術研究所 | Liquid supply device |
-
1995
- 1995-04-11 JP JP08519195A patent/JP3390285B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH08280279A (en) | 1996-10-29 |
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