JP3381657B2 - Electrolytic foil having tunnel-like pits of uniform depth, electrolytic capacitor using the same as an electrode, and method for producing the foil - Google Patents

Electrolytic foil having tunnel-like pits of uniform depth, electrolytic capacitor using the same as an electrode, and method for producing the foil

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Publication number
JP3381657B2
JP3381657B2 JP08688699A JP8688699A JP3381657B2 JP 3381657 B2 JP3381657 B2 JP 3381657B2 JP 08688699 A JP08688699 A JP 08688699A JP 8688699 A JP8688699 A JP 8688699A JP 3381657 B2 JP3381657 B2 JP 3381657B2
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JP
Japan
Prior art keywords
foil
electrolytic
thickness
pits
pit
Prior art date
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Expired - Fee Related
Application number
JP08688699A
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Japanese (ja)
Other versions
JP2000282299A (en
Inventor
秀則 内
隆嗣 得能
浩規 杉山
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Nippon Chemi Con Corp
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Nippon Chemi Con Corp
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Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】この発明は、電解コンデンサ
ーの電極箔等として利用されるアルミニウム電解箔、そ
の製造方法及びその箔を電極箔とする電解コンデンサー
に関する。より詳細にはアルミニウム箔の両表面に均一
深さのトンネル状ピットを持ち中心部に非貫通層を有す
るアルミニウム電解箔、それを水溶液中における直流電
解により製造する方法及び電極箔とする電解コンデンサ
ーに関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an aluminum electrolytic foil used as an electrode foil of an electrolytic capacitor, a method for producing the same, and an electrolytic capacitor having the foil as an electrode foil. More specifically, the present invention relates to an aluminum electrolytic foil having tunnel-shaped pits of uniform depth on both surfaces of an aluminum foil and a non-penetrating layer at the center, a method for producing the same by direct current electrolysis in an aqueous solution, and an electrolytic capacitor used as an electrode foil. .

【0002】[0002]

【従来の技術】アルミ電解コンデンサーは、近年の電子
機器の小型化に伴いますますサイズの小さいものが求め
られている。このアルミ電解コンデンサーには、アルミ
ニウムの電解箔が電極箔として従来より使用されてお
り、中高圧用電解コンデンサー用の電解箔の製造では、
単位面積当たりの静電容量を大きくするために高密度の
立方晶組織を有するアルミニウム原箔を塩素イオンを含
む酸性電解液等の水溶液で直流電解によってエッチング
して、結晶方位の(100)方向にトンネル状のピット
を形成している。
2. Description of the Related Art With the recent miniaturization of electronic devices, aluminum electrolytic capacitors are required to have smaller sizes. In this aluminum electrolytic capacitor, aluminum electrolytic foil has been conventionally used as an electrode foil, and in the production of electrolytic foil for medium and high voltage electrolytic capacitors,
In order to increase the capacitance per unit area, the aluminum original foil having a high-density cubic crystal structure is etched by an aqueous solution such as an acidic electrolyte solution containing chlorine ions by direct current electrolysis to obtain a crystal orientation in the (100) direction. It forms a tunnel-shaped pit.

【0003】このトンネル状ピットの形成においては、
腐蝕開始点のピット数は、そこに印加される電流密度の
大きさに関係すると共に箔の溶解量は電気量にほぼ比例
するものであり、その結果アルミニウム箔の静電容量を
大きくするためには、電解電流密度を大きく設定して高
密度にトンネル状ピットを形成し、かつ印加する電気量
を増大させることにより溶解量を増加させ、箔の表面積
の拡大を図っていた。
In the formation of this tunnel-shaped pit,
The number of pits at the starting point of corrosion is related to the magnitude of the current density applied to it, and the amount of dissolved foil is almost proportional to the amount of electricity, and as a result, in order to increase the capacitance of the aluminum foil, Was designed to increase the surface area of the foil by setting the electrolytic current density to a high level to form tunnel-shaped pits with high density and increasing the amount of electricity applied to increase the amount of dissolution.

【0004】そして、そのトンネル状ピットの形成過程
については、該ピットの形成は高密度のピットがアルミ
ニウム箔の全面にわたって同時に進行するのではなく、
当初はピットが箔に粗く発生して成長し、その成長が停
止すると別のピットの成長が始まり次第に箔の全面に密
にトンネル状のピットが形成されることが観察されてい
る。
Regarding the process of forming the tunnel-shaped pits, the formation of the pits does not occur at a high density of pits simultaneously over the entire surface of the aluminum foil.
Initially, it has been observed that pits are coarsely generated in the foil and grow, and when the growth stops, another pit starts to grow and gradually tunnel-like pits are formed on the entire surface of the foil.

【0005】この電解箔については、所定の強度を有す
ると共により大きな静電容量を有するものが高性能で望
ましいものであり、そのためには中央部に強度を保持さ
せる可能な限り薄い未エッチング部分を残存させ、しか
もトンネル状ピットについては高密度でかつ深く形成す
ることが必要であると従来考えられていた。そのトンネ
ル状ピットの形成については、従来法では箔に対する直
流電流の印加は図1(a)に図示するように時間に対し
一定電流密度の条件でなされていた。
For this electrolytic foil, one having a predetermined strength and a larger capacitance is desirable because of its high performance, and for that purpose, the thinnest possible unetched portion for keeping the strength in the central portion is required. It has been conventionally thought that it is necessary to leave the tunnel-shaped pits and to form the tunnel-shaped pits with high density and deeply. Regarding the formation of the tunnel-shaped pits, in the conventional method, a direct current was applied to the foil under the condition of a constant current density with respect to time as shown in FIG. 1 (a).

【0006】[0006]

【発明が解決しようとする課題】この従来法によって、
より静電容量の大きな電解箔を得ようとすると、印加電
気量を可能な限り増大しようとするあまりエッチングに
よる腐蝕が過度になる。その結果箔の機械的強度の低下
した電解箔が形成されることになり、それを回避するこ
とは困難であった。また、これを改善する電解箔の製造
技術も提案されており、それには例えば図1(b)及び
(c)に図示するように電解電流密度を最大値から漸次
減少させる方法(特開平7−249550号公報)があ
る。この方法においては、最大電流密度は1000mA
/cm2未満であり、電流印加時間は前記従来法と同様
に80秒程度となっている。
According to this conventional method,
When trying to obtain an electrolytic foil having a larger electrostatic capacity, corrosion due to etching becomes excessive so as to increase the amount of applied electricity as much as possible. As a result, an electrolytic foil having a reduced mechanical strength of the foil is formed, which is difficult to avoid. Further, a technique for manufacturing an electrolytic foil has been proposed to improve this, for example, a method of gradually decreasing the electrolytic current density from the maximum value as shown in FIGS. 249550). In this method, the maximum current density is 1000 mA
/ Cm 2 and the current application time is about 80 seconds as in the conventional method.

【0007】この方法によっても静電容量の大きなもの
を得ようとすると前記した従来法と同様の短所が発現
し、それを完全に回避することは困難であり、その強度
の低下した箔の断面を切断して電子顕微鏡で観察すると
図2(b)のようになっており、この図から、強度の低
下した電解箔のトンネル状ピットは、深さが不揃いで内
側端部はジグザクになっており、所々で両端面から延び
るトンネル状ピットが内通してアルミニウム箔を貫通し
中央部に非貫通層が存在しないことがわかる。
Even if this method is used to obtain a material having a large electrostatic capacity, the same disadvantages as those of the conventional method described above are exhibited, and it is difficult to avoid it completely. Fig. 2 (b) shows the result of cutting with a microscope and observing it with an electron microscope. From this figure, the tunnel-shaped pits of the electrolytic foil with reduced strength have uneven depths and zigzags on the inner end. It can be seen that in some places tunnel-shaped pits extending from both end faces penetrate the aluminum foil and there is no non-penetrating layer in the central portion.

【0008】以上のとおりであるから、本発明は、この
ような問題のない電解箔、その製造方法及びその箔を使
用したアルミニウム電解コンデンサーの発明を提供する
ものである。すなわち、アルミニウム電解箔の機械的強
度を低減させる貫通トンネル状ピットは存在させること
なく、かつ静電容量を可能な限りより大きくすることの
できるトンネル状ピットを形成した電解箔、その製造方
法及びその箔を電極箔とする電解コンデンサーの各発明
を提供することを解決すべき課題とするものであり、目
的とするものである。
As described above, the present invention provides an invention of an electrolytic foil, a method for producing the same, and an aluminum electrolytic capacitor using the foil, which does not have such a problem. That is, an electrolytic foil formed with tunnel-like pits capable of increasing the capacitance as much as possible without the presence of through-tunnel-like pits for reducing the mechanical strength of the aluminum electrolytic foil, its manufacturing method, and the same. It is an object of the invention to provide each invention of an electrolytic capacitor using a foil as an electrode foil, and it is an object.

【0009】[0009]

【課題を解決するための手段】本発明が上記目的を達成
するために採用した手段は、アルミニウム直流電解箔、
その製造方法およびその箔を電極箔とする電解コンデン
サーの各発明であり、その内のアルミニウム直流電解箔
は、アルミニウム箔の両表面に深さが箔厚の30%以上
であるピットが全ピット数の80%以上である深さの揃
った、すなわち均一深さのトンネル状ピットを持ち、か
つその中心部に層厚が箔厚の5〜25%であるピット非
貫通層を有する箔の厚さが70〜150μmであるとす
るものである。また電解コンデンサーは該アルミニウム
直流電解箔を電極箔とするものである。
The means adopted by the present invention to achieve the above object are aluminum direct current electrolytic foil,
Each of the inventions is a method for producing the same and an electrolytic capacitor using the foil as an electrode foil. Among them, the aluminum direct current electrolytic foil has a total number of pits having a depth of 30% or more on both surfaces of the aluminum foil. Of a foil having a uniform depth, that is, a tunnel pit having a uniform depth, and having a pit non-penetrating layer having a layer thickness of 5 to 25% of the foil thickness in the center thereof. Is 70 to 150 μm. The electrolytic capacitor uses the aluminum direct current electrolytic foil as an electrode foil.

【0010】そして、アルミニウム電解箔を製造する方
法は、初期電流密度を1500mA/cm2以上の最大
電流密度とし、その後急激に100mA/cm2以下ま
で低下させる水溶液中における直流電解により、箔厚7
0〜150μmのアルミニウム箔の両表面に均一深さの
トンネル状ピットを持ち、その中心部に層厚が箔厚の5
〜25%であるピット非貫通層を有するとするものであ
る。
The method for producing an aluminum electrolytic foil is such that the initial current density is set to a maximum current density of 1500 mA / cm 2 or more, and then rapidly reduced to 100 mA / cm 2 or less by direct current electrolysis in an aqueous solution to obtain a foil thickness of 7
There is a tunnel-shaped pit with a uniform depth on both surfaces of the aluminum foil of 0 to 150 μm, and the layer thickness is 5 at the center of the pit.
It is assumed to have a pit non-penetrating layer of ˜25%.

【0011】[0011]

【発明の実施の形態】本発明では、前記した手段、特に
製造方法を採用することにより、直流電解時のエッチン
グ時間を従来法に比し極端に短縮すると同時に、初期電
流密度を過大な最大電流密度とし、そこから急激に10
0mA/cm2以下まで低下させ、それによって優れた
特性を発現する新規な構造の電解箔を提供するものであ
る。その結果得られる新規な構造の電解箔は、図2
(a)(実施例1の電解箔)に図示するように深さが揃
った、すなわち均一深さのトンネル状ピットを有し、箔
の厚さ方向の中心部にトンネル状ピットが存在しない非
貫通層を持つ構造となっている。
BEST MODE FOR CARRYING OUT THE INVENTION According to the present invention, by adopting the above-mentioned means, particularly the manufacturing method, the etching time during DC electrolysis is extremely shortened as compared with the conventional method, and at the same time, the initial current density is excessively large. Density, and suddenly 10
It is intended to provide an electrolytic foil having a novel structure in which it is reduced to 0 mA / cm 2 or less, thereby exhibiting excellent characteristics. The resulting electrolytic foil with a novel structure is shown in FIG.
As shown in (a) (electrolytic foil of Example 1), it has tunnel-shaped pits having a uniform depth, that is, a uniform depth, and there is no tunnel-shaped pit at the center of the foil in the thickness direction. It has a structure with a penetration layer.

【0012】使用するアルミニウム箔については従前の
電解箔材料と同様でよく、その純度は99.9%以上の
ものが好ましく使用できる。またその箔の厚さについて
も従前の電解箔と同様でよく、それは70〜150μm
であり、好ましくは80〜120μmがよい。そして製
造された電解箔の非貫通層の層厚は箔厚の5〜25%で
あることが必要であり、好ましくは5〜15%がよい。
またその非貫通層の厚さは具体的には5〜25μmが必
要であり、好ましくは5〜15μmがよい。この電解箔
をエッチングする際に用いる水溶液としては、塩酸、又
は塩素イオンを含む硫酸、硝酸もしくはリン酸等が単独
あるいは混合して使用でき、従前のものが制限されるこ
となく使用できる。
The aluminum foil used may be the same as the conventional electrolytic foil material, and the purity thereof is preferably 99.9% or more. The thickness of the foil may be the same as that of the conventional electrolytic foil, which is 70 to 150 μm.
And preferably 80 to 120 μm. And the layer thickness of the non-penetrating layer of the produced electrolytic foil needs to be 5 to 25% of the foil thickness, and preferably 5 to 15%.
Further, the thickness of the non-penetrating layer is specifically required to be 5 to 25 μm, preferably 5 to 15 μm. As the aqueous solution used for etching this electrolytic foil, hydrochloric acid, sulfuric acid containing chlorine ions, nitric acid, phosphoric acid, or the like can be used alone or in combination, and conventional ones can be used without limitation.

【0013】エッチングの際の電流密度については、前
記したとおり初期電流密度を最大電流密度とし、その後
急激に100mA/cm2まで低減させることが必要で
ある。その際には前記の優れた性質を有する新規な構造
の電解箔を得るには初期電流密度は1500〜7000
mA/cm2とすることが必要であり、好ましくは30
00〜6000mA/cm2とするのがよい。この初期
電流密度を7000mA/cm2以下とするのは、それ
を超えると箔の腐蝕表面の脱落が生じるので、それを避
けるためである。また初期電流密度が1500mA以下
であるとピット数の不足を招き、静電容量が極端に低下
するためである。なお、ここにおける初期電流密度と
は、エッチング槽内で原箔に電流を印加し電解が開始す
る時点での電流密度である
Regarding the current density at the time of etching, it is necessary to make the initial current density the maximum current density as described above, and then rapidly reduce it to 100 mA / cm 2 . In that case, in order to obtain an electrolytic foil having a novel structure having the above excellent properties, the initial current density is 1500 to 7000.
mA / cm 2 is necessary, and preferably 30
It is preferable to set it to 00 to 6000 mA / cm 2 . The initial current density is set to 7,000 mA / cm 2 or less in order to prevent the corrosion surface of the foil from falling off if the initial current density is exceeded. Further, if the initial current density is 1500 mA or less, the number of pits will be insufficient and the capacitance will be extremely reduced. The initial current density here is the current density at the time when electrolysis is started by applying a current to the original foil in the etching tank.

【0014】そして、急激に100mA/cm2以下ま
でに低減させるに要する時間は10〜30秒がよく、好
ましくは15〜20秒がよい。このようにエッチング終
了時に電流密度を急激に100mA/cm2以下とする
のは、このようにしないと短いピットが形成されやすい
ためである。また電解時間を先の範囲とするのは、それ
が30秒を超えると貫通孔を形成する長いピットが形成
されやすく、電解箔の機械的強度が低下するためであ
る。
The time required to drastically reduce it to 100 mA / cm 2 or less is 10 to 30 seconds, preferably 15 to 20 seconds. The reason why the current density is drastically reduced to 100 mA / cm 2 or less at the end of etching is that short pits are easily formed unless this is done. The reason for setting the electrolysis time to the above range is that if it exceeds 30 seconds, long pits that form the through holes are likely to be formed, and the mechanical strength of the electrolytic foil decreases.

【0015】さらに、印加する電流密度の減衰形態につ
いては、初期の最大電流密度から急激に100mA/c
2以下まで低減する形態であれば特に制約はない。な
お従前の電解箔製造用のエッチングにおいて印加する電
流密度の形態は、図1(a)に示す一定電流密度となっ
ており、本発明で印加するそれとは非常に異なったもの
となっている。またその際のエッチングに要する時間は
80秒程度であり、本発明と比較するとはるかに長い時
間を要するものとなっている。
Further, regarding the form of attenuation of the applied current density, the maximum current density at the initial stage is suddenly increased to 100 mA / c.
There is no particular limitation as long as it is reduced to m 2 or less. The form of the current density applied in the conventional etching for producing the electrolytic foil is the constant current density shown in FIG. 1A, which is very different from that applied in the present invention. Further, the time required for etching at that time is about 80 seconds, which is much longer than that of the present invention.

【0016】本発明の電解箔製造における電流印加時間
の調節については、箔のエッチングが水溶液中で対向す
る電極間を通過する間に行われるものであるから、その
電極の長さあるいは箔の通過速度等を調節することによ
り10〜30秒以内とすることが可能である。また電流
密度の調節については、対向する電極間に箔が存在する
間にエッチングが実施されることから、対向する電極の
表面積や距離を調節することによって行うことが可能で
ある。電極の表面積を調節する方法としては、各種の手
段が採用でき特に制限されることはなく、例えば電極の
一部を打ち抜き対向する電極の表面積を変化させる構造
や電極表面形状を変える方法等がある。
The adjustment of the current application time in the production of the electrolytic foil of the present invention is carried out while the foil is etched in an aqueous solution while passing between opposing electrodes. Therefore, the length of the electrode or the passage of the foil is passed. It is possible to set the time within 10 to 30 seconds by adjusting the speed and the like. Further, the current density can be adjusted by adjusting the surface area and distance of the facing electrodes, since the etching is performed while the foil is present between the facing electrodes. There are no particular restrictions on the method for adjusting the surface area of the electrode, and various methods can be adopted, and for example, there is a method of punching out a part of the electrode to change the surface area of the opposing electrode or changing the electrode surface shape. .

【0017】[0017]

【実施例】以下に、本発明の実施例及び比較例を記載
し、本発明の特徴点及び卓越した効果を具体的に示す
が、本発明は、この実施例に限定されるものではなく特
許請求の範囲の記載に基づいて把握されるものであるこ
とはいうまでもない。
EXAMPLES Examples and comparative examples of the present invention will be described below to specifically show the characteristic points and outstanding effects of the present invention. However, the present invention is not limited to these examples and patents Needless to say, it is understood based on the description of the claims.

【0018】(実施例1及び従来例)純度99.98%
及び厚さ106μmのアルミニウム原箔を、塩酸濃度1
mol/L、硫酸濃度3mol/Lの溶液中で表1に示
す条件によってエッチングを行った。すなわち、本発明
に該当する実施例1では初期電流密度4000mA/c
2、最終電流密度100mA/cm2、エッチング時間
20秒で電解を行った。また従来技術に該当する従来例
では初期電流密度350mA/cm2一定、エッチング
時間80秒で電解を行った。
(Example 1 and conventional example) Purity 99.98%
And 106 μm thick aluminum foil with hydrochloric acid concentration of 1
Etching was performed in a solution having a mol / L and a sulfuric acid concentration of 3 mol / L under the conditions shown in Table 1. That is, in Example 1 corresponding to the present invention, the initial current density was 4000 mA / c.
Electrolysis was performed at m 2 , final current density of 100 mA / cm 2 , and etching time of 20 seconds. In the conventional example corresponding to the conventional technique, electrolysis was performed at an initial current density of 350 mA / cm 2 and an etching time of 80 seconds.

【0019】そして、得られた電解箔の性質及び断面構
造は表1及び図2(a).(b)に示すとおりである。
この結果から、本発明においては、従来技術に比し形成
されたトンネル状ピットは深さが深く、かつ揃ってお
り、また箔の中心部に薄いピット非貫通層が形成されて
おり機械的強度も高いことがわかる。さらに静電容量も
実施例の電解箔の方が従来例の電解箔に比し優れている
ことがわかる。
The properties and sectional structure of the obtained electrolytic foil are shown in Table 1 and FIG. 2 (a). It is as shown in (b).
From these results, in the present invention, the tunnel-like pits formed as compared with the prior art have a deep and uniform depth, and a thin pit non-penetrating layer is formed in the center of the foil, which means that the mechanical strength is high. You can see that it is also expensive. Further, it can be seen that the electrolytic foil of the example is superior in capacitance to the electrolytic foil of the conventional example.

【0020】また、得られた電解箔のピットの深さの詳
細な分布状態については、表3に記載するとおりであ
り、この表から従来例ではピットの深さが0〜50μm
を越えた範囲の広範囲に分布しているのがわかる。それ
に対し、実施例1では40〜50μmの範囲に88%が
存在し、きわめて限られた範囲にほとんどが存在してお
り、そのピットのほとんどはいずれも深くて、かつ深さ
が揃ってるいることがわかる。
The detailed distribution state of the pit depth of the obtained electrolytic foil is as shown in Table 3. From this table, in the conventional example, the pit depth is 0 to 50 μm.
It can be seen that it is distributed over a wide range beyond. On the other hand, in Example 1, 88% is present in the range of 40 to 50 μm, and most is present in the extremely limited range, and most of the pits are deep and have the same depth. I understand.

【0021】なお、深さ分布の測定法については、エポ
キシ樹脂に埋め込まれた電解箔試料をウルトラマイクロ
トーム(RMC社製)で電解箔の表面を深さ方向にμm
単位でダイヤモンドナイフにより研削し、そのときの研
削面の表面をSEMに取り、それを画像解析装置(東洋
紡社製V10)にかけトンネル密度を算出する。ついで
その箔表面からの研削深さとトンネル密度との関係から
トンネル深さの分布を算出する。
Regarding the method of measuring the depth distribution, an electrolytic foil sample embedded in an epoxy resin was measured with an ultramicrotome (manufactured by RMC) on the surface of the electrolytic foil in a depth direction of μm.
Grinding with a diamond knife in units, the surface of the ground surface at that time is taken by SEM, and the tunnel density is calculated by applying it to an image analyzer (V10 manufactured by Toyobo Co., Ltd.). Then, the distribution of the tunnel depth is calculated from the relationship between the grinding depth from the foil surface and the tunnel density.

【0022】[0022]

【表1】 [Table 1]

【0023】(実施例2及び比較例)純度99.98%
及び厚さ106μmのアルミニウム原箔を、塩酸濃度1
mol/L、硫酸濃度3mol/Lの水溶液中で、初期
電流密度4000mA/cm 2、最終電流密度100m
A/cm2で、表2に示すように電解時間を変化させ
て、実施例1と同様にエッチングを行った。得られた電
解箔の特性及び断面構造は、表3及び図3、4に示すと
おりである。この結果からエッチング時間が20秒以下
で特に良好な特性を示していることがわかる。またエッ
チング時間が30秒を越えるとピット深さが深くなり、
両面からのピットがつながってしまい非貫通層がなくな
ることから電解箔の機械的強度が低下する。
(Example 2 and Comparative Example) Purity 99.98%
And 106 μm thick aluminum foil with hydrochloric acid concentration of 1
mol / L and sulfuric acid concentration 3 mol / L
Current density 4000mA / cm 2, Final current density 100m
A / cm2Then, change the electrolysis time as shown in Table 2.
Then, etching was performed in the same manner as in Example 1. Obtained electricity
The characteristics and cross-sectional structure of the unwrapping foil are shown in Table 3 and FIGS.
It is a cage. From this result, etching time is 20 seconds or less
It can be seen that particularly excellent characteristics are exhibited. See you again
If the ching time exceeds 30 seconds, the pit depth will increase,
The pits on both sides are connected and there is no non-penetrating layer
Therefore, the mechanical strength of the electrolytic foil decreases.

【0024】そして、得られた電解箔のピットの深さの
詳細な分布状態については、実施例1と同様に表3に記
載しており、実施例2ではピットの深さが20〜30μ
mと30〜40μmの範囲にそれぞれ約45%のピット
が存在し、この両範囲に合わせて約90%のピットが存
在している。それに対し、比較例では50μm以上の深
さのピットが50%以上存在し、ピットが深くなり過ぎ
ており、図4に示す非貫通層が存在しない結果と一致し
ている。
The detailed distribution state of the pit depth of the obtained electrolytic foil is shown in Table 3 as in Example 1, and in Example 2, the pit depth was 20 to 30 μm.
m and the range of 30 to 40 μm each have about 45% of pits, and about 90% of the pits exist in both ranges. On the other hand, in the comparative example, 50% or more of pits having a depth of 50 μm or more were present and the pits were too deep, which is consistent with the result shown in FIG. 4 in which the non-penetrating layer does not exist.

【0025】[0025]

【表2】 [Table 2]

【0026】[0026]

【表3】 [Table 3]

【0027】(実施例3)純度99.98%及び厚さ1
06μmのアルミニウム原箔を、塩酸濃度1mol/
l、硫酸濃度3mol/lの溶液中で、図5に図示する
各種初期電流密度で実施例1と同様にエッチングを行っ
た。得られた電解箔の385V化成時の静電容量は図5
に示すとおりであり、初期電流密度が3000〜600
0mA/cm 2の範囲で高性能の静電容量の電解箔が取
得できることがわかる。
(Example 3) Purity 99.98% and thickness 1
A raw aluminum foil having a thickness of 06 μm is formed with a hydrochloric acid concentration of 1 mol /
l in a solution with sulfuric acid concentration of 3 mol / l as illustrated in FIG.
Etching was performed in the same manner as in Example 1 with various initial current densities.
It was The capacitance of the obtained electrolytic foil during formation of 385 V is shown in FIG.
, And the initial current density is 3000 to 600.
0 mA / cm 2In the range of
It turns out that you can get it.

【0028】[0028]

【発明の効果】本発明では、電解箔におけるトンネル状
ピットは内部深くまで高密度で、かつ深さが揃ったもの
が形成されており、そのため箔の中心部にはトンネル状
ピット不存在の非貫通層を存在させることができる。そ
の結果本発明においては、機械的強度を低減させること
なく高静電容量の電解箔を提供可能とするという卓越し
た効果を奏することができる。
According to the present invention, the tunnel-like pits in the electrolytic foil are formed to have a high density even deep inside and uniform depths. Therefore, in the center of the foil, non-existence of tunnel-like pits is observed. A penetration layer can be present. As a result, in the present invention, it is possible to provide an excellent effect that an electrolytic foil having a high capacitance can be provided without reducing mechanical strength.

【図面の簡単な説明】[Brief description of drawings]

【図1】従来技術及び改良先行技術におけるエッチング
時の電流密度と印加時間との関係を示す図。
FIG. 1 is a diagram showing a relationship between a current density and an application time during etching in a conventional technique and an improved prior art.

【図2】本発明等の電解箔断面の電子顕微鏡写真であ
り、(a)は実施例1の電解箔、(b)は従来例の電解
箔である。
FIG. 2 is an electron micrograph of a cross section of an electrolytic foil according to the present invention, where (a) is the electrolytic foil of Example 1 and (b) is the electrolytic foil of the conventional example.

【図3】実施例2で得た電解箔断面の電子顕微鏡写真。FIG. 3 is an electron micrograph of a cross section of an electrolytic foil obtained in Example 2.

【図4】比較例で得た電解箔断面の電子顕微鏡写真。FIG. 4 is an electron micrograph of a cross section of an electrolytic foil obtained in a comparative example.

【図5】実施例3の実験の結果等を示す図。FIG. 5 is a diagram showing the results of experiments of Example 3;

フロントページの続き (56)参考文献 特開 平7−249550(JP,A) 特開 昭61−244013(JP,A) 特開 昭55−76100(JP,A) 特開 昭57−131399(JP,A) 特開 昭57−66616(JP,A) (58)調査した分野(Int.Cl.7,DB名) H01G 9/04 304 C25F 3/00 C25F 3/04 Continuation of the front page (56) Reference JP-A-7-249550 (JP, A) JP-A-61-244013 (JP, A) JP-A-55-76100 (JP, A) JP-A-57-131399 (JP , A) JP 57-66616 (JP, A) (58) Fields investigated (Int.Cl. 7 , DB name) H01G 9/04 304 C25F 3/00 C25F 3/04

Claims (6)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 アルミニウム箔の両表面に深さが箔厚の
30%以上であるピットが全ピット数の80%以上であ
る均一深さのトンネル状ピットを持ち、かつその中心部
に層厚が箔厚の5〜25%であるピット非貫通層を有す
る箔の厚さが70〜150μmであるアルミニウム直流
電解箔。
1. A pit having a depth of 30% or more of the foil thickness on both surfaces of an aluminum foil has a tunnel-like pit having a uniform depth of 80% or more of the total number of pits, and a layer thickness at the center thereof. An aluminum direct current electrolytic foil having a pit non-penetrating layer having a thickness of 5 to 25% of the foil thickness of 70 to 150 μm.
【請求項2】 箔厚が80〜120μmであり、ピット
非貫通層の層厚が箔厚の5〜15%である請求項1記載
の直流電解箔。
2. The direct current electrolytic foil according to claim 1, wherein the foil thickness is 80 to 120 μm, and the layer thickness of the pit non-penetrating layer is 5 to 15% of the foil thickness.
【請求項3】 ピット非貫通層の層厚が5〜25μmで
ある請求項1又は2記載の電解箔。
3. The electrolytic foil according to claim 1, wherein the pit non-penetrating layer has a layer thickness of 5 to 25 μm.
【請求項4】 アルミニウム箔の両表面に深さが箔厚の
30%以上であるピットが全ピット数の80%以上であ
る均一深さのトンネル状ピットを持ち、かつその中心部
に層厚が箔厚の5〜25%であるピット非貫通層を有す
る箔の厚さが70〜150μmであるアルミニウム直流
電解箔を電極箔とする電解コンデンサー。
4. A pit having a depth of 30% or more of the foil thickness on both surfaces of the aluminum foil has a tunnel-like pit having a uniform depth of 80% or more of the total number of pits, and a layer thickness at the center thereof. Having an pit non-penetrating layer having a thickness of 5 to 25% of the foil thickness is an electrolytic capacitor having an electrode foil made of an aluminum direct current electrolytic foil having a thickness of 70 to 150 μm.
【請求項5】 箔厚が80〜120μmであり、ピット
非貫通層の層厚が箔厚の5〜15%である請求項4記載
の電解コンデンサー。
5. The electrolytic capacitor according to claim 4, wherein the foil thickness is 80 to 120 μm, and the layer thickness of the pit non-penetrating layer is 5 to 15% of the foil thickness.
【請求項6】 初期電流密度を1500mA/cm2
上の最大電流密度とし、その後10〜30秒で100m
A/cm2以下まで低下させる水溶液中における直流電
解により、箔厚70〜150μmのアルミニウム箔の両
表面に深さが箔厚の30%以上であるピットが全ピット
数の80%以上である均一深さのトンネル状ピットを持
ち、かつその中心部に層厚が箔厚の5〜25%であるピ
ット非貫通層を有するアルミニウム直流電解箔を製造す
る方法。
6. The initial current density is set to a maximum current density of 1500 mA / cm 2 or more and then 100 m in 10 to 30 seconds.
All the pits with a depth of 30% or more on both surfaces of an aluminum foil having a foil thickness of 70 to 150 μm are formed by direct current electrolysis in an aqueous solution that reduces the A / cm 2 or less.
A method for producing an aluminum direct current electrolytic foil having a tunnel-shaped pit having a uniform depth of 80% or more of the number and a pit non-penetrating layer having a layer thickness of 5 to 25% of the foil thickness in a central portion thereof.
JP08688699A 1999-03-29 1999-03-29 Electrolytic foil having tunnel-like pits of uniform depth, electrolytic capacitor using the same as an electrode, and method for producing the foil Expired - Fee Related JP3381657B2 (en)

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