JP3374647B2 - Method for manufacturing electrode for solar cell - Google Patents
Method for manufacturing electrode for solar cellInfo
- Publication number
- JP3374647B2 JP3374647B2 JP08250396A JP8250396A JP3374647B2 JP 3374647 B2 JP3374647 B2 JP 3374647B2 JP 08250396 A JP08250396 A JP 08250396A JP 8250396 A JP8250396 A JP 8250396A JP 3374647 B2 JP3374647 B2 JP 3374647B2
- Authority
- JP
- Japan
- Prior art keywords
- electrode
- solar cell
- glass frit
- coupling agent
- mixture
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、太陽電池用電極の
製造方法に関するものである。TECHNICAL FIELD The present invention relates to a method for manufacturing a solar cell electrode.
【０００２】[0002]
【従来の技術】従来より、太陽電池のシリコンウェハー
の受光面に形成されるライン電極は、その受光面積を大
きくするためにできるだけライン電極を微細にすること
が要求されており、現在は導電性ペーストをシリコンウ
ェハーの表面にスクリーン印刷により塗布し、焼き付け
て幅１００μｍ程度のライン電極に形成して実用化され
ている。2. Description of the Related Art Conventionally, line electrodes formed on the light receiving surface of a silicon wafer of a solar cell have been required to be as fine as possible in order to increase the light receiving area. The paste is applied to the surface of a silicon wafer by screen printing and baked to form a line electrode having a width of about 100 μm, which is put into practical use.
【０００３】また、ウェハーの受光面は表面積を大きく
するために、テクスチャー処理と呼ばれる表面粗化が行
われており、その表面粗さは比較的大きく、約１０μｍ
にも達している。In order to increase the surface area of the light receiving surface of the wafer, surface roughening called texture treatment is performed. The surface roughness is relatively large, about 10 μm.
Has also reached.
【０００４】[0004]
【発明が解決しようとする課題】ところで、従来の方法
では、次のような問題があった。
（１）ライン電極の幅をさらに微細に、例えば１００μ
ｍ以下にする場合、スクリーン印刷を行うと、ウェハー
の受光面の表面粗化による凹凸のためにライン電極にに
じみ、かすれ等の形状劣化が生じてしまう。However, the conventional method has the following problems. (1) The width of the line electrode is made finer, for example, 100 μ
In the case of m or less, when screen printing is performed, the line electrode is bleeding due to the unevenness due to the surface roughening of the light receiving surface of the wafer, and the shape deterioration such as blurring occurs.
【０００５】（２）また、電極ペーストを塗布する際
に、電極ペーストが凹部の底まで達しないので、ウェハ
ーとの接触が不十分となり、効率の劣化が生じてしま
う。(2) Further, when the electrode paste is applied, the electrode paste does not reach the bottom of the recess, so that the contact with the wafer becomes insufficient and the efficiency deteriorates.
【０００６】[0006]
【０００７】本発明の目的は、太陽電池の受光面に対
し、微細で良好な形状を有するとともに、ウェハーとの
接触強度が良好な電極を形成することが可能な太陽電池
用電極の製造方法を提供することにある。An object of the present invention is to provide a method of manufacturing an electrode for a solar cell capable of forming an electrode having a fine and good shape on a light receiving surface of the solar cell and having a good contact strength with a wafer. To provide.
【０００８】[0008]
【課題を解決するための手段】本発明の太陽電池用電極
の製造方法は、（１）銀粉末と、ガラスフリットと、感
光性樹脂と、カップリング剤とを有機溶剤中に混合する
工程と、（２）前記混合物を、凹凸を有する太陽電池用
ウェハーの受光面上に塗布し乾燥させる工程と、（３）
フォトリソグラフィーを用いて露光および現像を行い、
組成物を電極形状に形成する工程と、（４）前記組成物
を焼き付けて前記受光面上に電極を形成する工程と、を
備えていることを特徴とする。MEANS FOR SOLVING THE PROBLEMS Electrode for Solar Cell of the Present Invention
The manufacturing method of (1) silver powder, glass frit,
Mixing a light-sensitive resin and a coupling agent in an organic solvent
And (2) the mixture for a solar cell having irregularities
Coating and drying on the light-receiving surface of the wafer, and (3)
Exposure and development using photolithography,
Forming the composition into an electrode shape, and (4) the composition
And baking to form an electrode on the light receiving surface .
【０００９】また、本発明の太陽電池用電極の製造方法
においては、前記銀粉末と前記ガラスフリットとの混合
物と前記感光性樹脂との合計１００ｗｔ％のうち、前記
混合物は６５〜８５ｗｔ％、前記感光性樹脂は１５〜３
５ｗｔ％の範囲内であることが好ましい。 Further, the method for producing the solar cell electrode of the present invention
In, mixing the silver powder with the glass frit
Of the total of 100 wt% of the product and the photosensitive resin,
The mixture is 65-85 wt% and the photosensitive resin is 15-3.
It is preferably within the range of 5 wt%.
【００１０】また、本発明の太陽電池用電極の製造方法
においては、前記カップリング剤は、前記銀粉末と前記
ガラスフリットとの合計１００重量部に対して、０．０
１〜１０重量部含有することが好ましい。 Further, the method for producing the solar cell electrode of the present invention
In the above, the coupling agent is the silver powder and the coupling agent.
0.0 for a total of 100 parts by weight with the glass frit
It is preferable to contain 1 to 10 parts by weight.
【００１１】[0011]
【発明の実施の形態】以下、本発明の実施の形態につい
て説明する。本発明の太陽電池用導電性組成物は、銀粉
末と、ガラスフリットと、感光性樹脂と、カップリング
剤とを有機溶剤中に混合してなるものである。このよう
な成分を有することによって、電極形成にフォトリソグ
ラフィーを用いて太陽電池の電極を形成することが可能
となる。BEST MODE FOR CARRYING OUT THE INVENTION Embodiments of the present invention will be described below. The conductive composition for a solar cell of the present invention is a mixture of silver powder, glass frit, a photosensitive resin, and a coupling agent in an organic solvent. By having such a component, it becomes possible to form an electrode of a solar cell by using photolithography for electrode formation.
【００１２】ここで、導電粉末については、特に限定さ
れるものではなく、種々の導電粉末を用いることが可能
であるが、Ａｇ粉末を用いた場合には、空気中で焼成で
きて、比抵抗が低いという面で有効である。また、平均
粒径は５μｍ以下が好ましい。平均粒径が５μｍを越え
る場合には、露光時に紫外線の散乱が生じて解像度が劣
化するので好ましくない。なお、より好ましくは２μｍ
以下である。Here, the conductive powder is not particularly limited, and various conductive powders can be used. However, when Ag powder is used, it can be fired in air and has a specific resistance. Is effective in that it is low. The average particle size is preferably 5 μm or less. When the average particle size exceeds 5 μm, ultraviolet rays are scattered during exposure and the resolution is deteriorated, which is not preferable. In addition, more preferably 2 μm
It is the following.
【００１３】ガラスフリットについては、組成は特に限
定されないが、例えば、硼珪酸鉛系ガラス、硼珪酸亜鉛
系ガラスなどが使用できる。平均粒径は５μｍ以下が好
ましい。平均粒径が５μｍを越える場合には、上記と同
様に露光時に紫外線の散乱が生じて解像度が劣化するの
で好ましくない。The composition of the glass frit is not particularly limited, but lead borosilicate glass, zinc borosilicate glass, etc. can be used. The average particle size is preferably 5 μm or less. When the average particle size exceeds 5 μm, ultraviolet rays are scattered during exposure and the resolution is deteriorated as in the above case, which is not preferable.
【００１４】銀粉末とガラスフリットとの配合比につい
ては、銀粉末とガラスフリットとの合計１００ｗｔ％の
うち、銀粉末が９０〜９９．５ｗｔ％、ガラスフリット
が０．５〜１０ｗｔ％の範囲内とするのが好ましい。ガ
ラスフリットの添加量が０．５ｗｔ％未満になると、電
極とウエハーとの接合強度が低下してしまうため好まし
くない。一方、添加量が１０ｗｔ％を越えると、配線抵
抗が大きくなるため好ましくない。The blending ratio of the silver powder and the glass frit is within the range of 90 to 99.5 wt% of the silver powder and 0.5 to 10 wt% of the glass frit in the total 100 wt% of the silver powder and the glass frit. Is preferred. If the amount of glass frit added is less than 0.5 wt%, the bonding strength between the electrode and the wafer will be reduced, which is not preferable. On the other hand, if the addition amount exceeds 10 wt%, the wiring resistance increases, which is not preferable.
【００１５】感光性樹脂の具体例としては、光重合開始
剤とモノマーと必要に応じて光重合開始助剤とを混合し
たものなどが挙げられる。光重合開始剤としては、芳香
族カルボニル化合物、光重合開始助剤としては、脂肪
族、芳香族アミンの単独あるいはその混合物、モノマー
としては、エチルアクリレート、ブチルアクリレート等
のアクリレートモノマーや、アクリル酸、メタクリル酸
等の官能性アクリルモノマーや、スチレン、アクリルア
ミド、マイレン酸、イタコン酸酢酸ビニルなどの共重合
可能なビニルモノマー等の光重合多官能モノマーの単独
あるいはその混合物などが挙げられる。Specific examples of the photosensitive resin include those obtained by mixing a photopolymerization initiator, a monomer and, if necessary, a photopolymerization initiation aid. As a photopolymerization initiator, an aromatic carbonyl compound, as a photopolymerization initiation aid, an aliphatic or aromatic amine alone or a mixture thereof, as a monomer, an acrylate monomer such as ethyl acrylate or butyl acrylate, or acrylic acid, Examples thereof include functional acrylic monomers such as methacrylic acid and photopolymerizable polyfunctional monomers such as copolymerizable vinyl monomers such as styrene, acrylamide, maleic acid, vinyl itaconate and the like, or a mixture thereof.
【００１６】また、感光性樹脂の配合量については、銀
粉末とガラスフリットとの混合物と感光性樹脂との合計
１００ｗｔ％のうち、混合物が６５〜８５ｗｔ％、感光
性樹脂が１５〜３５ｗｔ％の範囲内とするのが好まし
い。感光性樹脂の配合量が１５ｗｔ％未満になると、粘
度が高くなるのでウエハー上で均一な塗膜が得られにく
いので好ましくない。一方、添加量が３５ｗｔ％を越え
ると、粘度が低下し塗膜が薄くなるため、ウエハーとの
充分な接着強度が得られないので好ましくない。Regarding the blending amount of the photosensitive resin, 65 to 85 wt% of the mixture and 15 to 35 wt% of the photosensitive resin are contained in the total 100 wt% of the mixture of silver powder and glass frit and the photosensitive resin. It is preferably within the range. When the blending amount of the photosensitive resin is less than 15 wt%, the viscosity becomes high and it is difficult to obtain a uniform coating film on the wafer, which is not preferable. On the other hand, if the addition amount exceeds 35 wt%, the viscosity decreases and the coating film becomes thin, so that sufficient adhesive strength with the wafer cannot be obtained, which is not preferable.
【００１７】カップリング剤については、無機質と化学
結合する反応基、例えばメトキシ基、エトキシ基、シラ
ノール基等と、有機質と化学結合する反応基、例えばビ
ニル基、エポキシ基、メタクリル基、アミノ基、メルカ
プト基等とを有するシランカップリング剤や、アセトア
ルコキシアルミニウムジイソプロピレート等のアルミニ
ウム系カップリング剤や、イソプロピルトリイソステア
ロイルチタネート等のチタネート系カップリング剤や、
ジルコアルミネート系カップリング剤を用いることがで
きる。Regarding the coupling agent, a reactive group that chemically bonds to an inorganic substance, such as a methoxy group, an ethoxy group, a silanol group, and a reactive group that chemically bonds to an organic substance, such as a vinyl group, an epoxy group, a methacryl group, an amino group, A silane coupling agent having a mercapto group or the like, an aluminum coupling agent such as acetoalkoxyaluminum diisopropylate, or a titanate coupling agent such as isopropyltriisostearoyl titanate,
A zircoaluminate coupling agent can be used.
【００１８】また、カップリング剤の配合量について
は、銀粉末とガラスフリットとの合計１００重量部に対
して、０．０１〜１０重量部含有することが好ましい。
配合量が０．０１重量部未満の場合には、露光後の電極
の密着強度が十分に得られないので好ましくない。一
方、配合量が１０重量部を越える場合には、密着強度が
高くなりすぎて剥離が充分に行われないことにより解像
度が低下してしまうため好ましくない。The amount of the coupling agent blended is preferably 0.01 to 10 parts by weight based on 100 parts by weight of the total of the silver powder and the glass frit.
If the blending amount is less than 0.01 part by weight, the adhesion strength of the electrode after exposure cannot be sufficiently obtained, which is not preferable. On the other hand, if the blending amount exceeds 10 parts by weight, the adhesion strength becomes too high and the peeling is not performed sufficiently, resulting in a decrease in resolution, which is not preferable.
【００１９】また、本発明の太陽電池用電極の製造方法
は、（１）銀粉末と、ガラスフリットと、感光性樹脂
と、カップリング剤とを有機溶剤中に混合する工程と、
（２）前記混合物を太陽電池用ウェハーの受光面上に塗
布し乾燥させる工程と、（３）フォトリソグラフィーを
用いて露光および現像を行い、組成物を電極形状に形成
する工程と、（４）前記組成物を焼き付けて前記受光面
上に電極を形成する工程とを備えている。このような工
程を有することによって、太陽電池の受光面に対し、微
細で良好な形状を有するとともに、ウエハーとの接触強
度が良好な電極を形成することが可能となる。特に、ラ
イン状の電極、いわゆるライン電極に有効である。The method for producing a solar cell electrode of the present invention comprises (1) a step of mixing silver powder, glass frit, a photosensitive resin, and a coupling agent in an organic solvent,
(2) A step of applying the mixture onto a light receiving surface of a solar cell wafer and drying it, (3) a step of exposing and developing using photolithography to form the composition into an electrode shape, and (4) Baking the composition to form an electrode on the light-receiving surface. By having such a step, it becomes possible to form an electrode having a fine and good shape and a good contact strength with the wafer on the light receiving surface of the solar cell. In particular, it is effective for a line electrode, a so-called line electrode.
【００２０】すなわち、上記（１）の工程で作製される
導電性組成物は、次工程でフォトリソグラフィーを用い
て微細配線を形成するために、スクリーン印刷を用いる
場合に比べて粘度を低下させることができる。よって、
表面粗化された太陽電池用ウエハーの受光面上であって
も、その凹凸に沿って塗布形成することができる。従っ
て、ウエハーの凹凸によって生じていたライン電極の電
極劣化や、ウエハーとの接触不良といった問題が解消さ
れている。That is, the conductive composition produced in the above step (1) has a viscosity lower than that in the case of using screen printing in order to form fine wiring using photolithography in the next step. You can Therefore,
Even on the light-receiving surface of the surface-roughened solar cell wafer, coating can be performed along the irregularities. Therefore, the problems such as the electrode deterioration of the line electrode and the poor contact with the wafer caused by the unevenness of the wafer are solved.
【００２１】また、本発明の太陽電池用電極の製造方法
を用いれば、ライン電極は、良好なライン形状と良好な
接触を保ちつつ、１００μｍ以下のライン幅にすること
が可能である。また、本発明の形成方法を用いれば、ラ
イン幅を５０μｍ以下にすることも可能である。Further, by using the method for manufacturing a solar cell electrode of the present invention, the line electrode can have a line width of 100 μm or less while maintaining a good line shape and a good contact. Further, the line width can be set to 50 μm or less by using the forming method of the present invention.
【００２２】次に、本発明を実施例に基づき、さらに具
体的に説明するが、本発明はかかる実施例のみに限定さ
れるものではない。Next, the present invention will be described more specifically based on examples, but the present invention is not limited to such examples.
【００２３】[0023]
【実施例】以下、本発明の太陽電池用導電性組成物およ
び太陽電池用電極の製造方法の一実施例について説明す
る。まず、平均粒径１μｍのＡｇ粒子と、平均粒径２μ
ｍの硼珪酸鉛系ガラスフリットとを重量比でＡｇ９５ｗ
ｔ％、ガラスフリット５ｗｔ％の割合で混合し、さらに
その混合物と、２−ヒドロキシエチルメタクリレートお
よびメタクリル酸を主成分とする感光性樹脂（商品名：
フォトレックＲＨ−１０３、積水化学工業株式会社製）
とを重量比で混合物７０ｗｔ％、感光性樹脂２９ｗｔ
％、シランカップリング剤１ｗｔ％の割合で混合し、３
本ロールミルで混合分散させた。EXAMPLES An example of the method for producing a conductive composition for a solar cell and an electrode for a solar cell of the present invention will be described below. First, Ag particles having an average particle size of 1 μm and an average particle size of 2 μm
m lead borosilicate glass frit in a weight ratio of Ag95w
t% and 5% by weight of glass frit, and the mixture and a photosensitive resin containing 2-hydroxyethylmethacrylate and methacrylic acid as main components (trade name:
Photorec RH-103, Sekisui Chemical Co., Ltd.)
70% by weight of the mixture and 29% of photosensitive resin
%, The silane coupling agent 1 wt%, and then mixed 3
This roll mill mixed and dispersed.
【００２４】上記感光性ペーストを太陽電池の受光面全
面にスクリーン印刷で塗布し、１００℃１０分間でプリ
ペーグ（乾燥）させた。プリペーグ後のシリコンウエハ
ーを通常のフォトリソグラフィーを用い、露光、現像を
行い、ベルト炉７５０℃、１分間で焼成したところ、５
０μｍのライン幅でウェハーとの接触が良好なライン電
極を形成することができた。The above-mentioned photosensitive paste was applied on the entire light-receiving surface of the solar cell by screen printing, and pre-pegged (dried) at 100 ° C. for 10 minutes. The pre-pegged silicon wafer was exposed and developed using ordinary photolithography, and baked in a belt furnace at 750 ° C. for 1 minute.
It was possible to form a line electrode having a line width of 0 μm and having good contact with the wafer.
【００２５】[0025]
【発明の効果】本発明の太陽電池用電極の製造方法を用
いれば、太陽電池の受光面に対し、微細で良好な形状を
有するとともに、ウェハーとの接触強度が良好な電極を
形成することが可能である。従って、ライン電極の形状
劣化やウェハーとの接触不十分となることを防止し、要
求されるライン幅の極めて小さなライン電極を形成する
ことが可能である。EFFECT OF THE INVENTION By using the method for manufacturing an electrode for a solar cell of the present invention, an electrode having a fine and good shape and having a good contact strength with a wafer can be formed on the light receiving surface of the solar cell. It is possible. Therefore, it is possible to prevent the deterioration of the shape of the line electrode and the insufficient contact with the wafer, and to form the line electrode having a very small required line width.
───────────────────────────────────────────────────── フロントページの続き (58)調査した分野(Int.Cl.7，ＤＢ名) H01L 31/04 - 31/078 H01B 1/00 - 1/24 ─────────────────────────────────────────────────── ─── Continuation of the front page (58) Fields investigated (Int.Cl. 7 , DB name) H01L 31/04-31/078 H01B 1/00-1/24
Claims (3)
性樹脂と、カップリング剤とを有機溶剤中に混合する工
程と、 （２）前記混合物を、凹凸を有する太陽電池用ウェハー
の受光面上に塗布し乾燥させる工程と、 （３）フォトリソグラフィーを用いて露光および現像を
行い、組成物を電極形状に形成する工程と、 （４）前記組成物を焼き付けて前記受光面上に電極を形
成する工程と、 を備えていることを特徴とする太陽電池用電極の製造方
法。 1. A silver powder, a glass frit, and a photosensitive material.
Process of mixing organic resin and coupling agent in organic solvent
And extent, (2) said mixture, wafers for solar cells having an uneven
Coating and drying on the light-receiving surface of (3) exposing and developing using photolithography
And (4) baking the composition to form an electrode on the light-receiving surface.
Method for manufacturing a solar cell electrode, characterized in that it comprises a step of forming, the.
合物と前記感光性樹脂との合計１００ｗｔ％のうち、前
記混合物は６５〜８５ｗｔ％、前記感光性樹脂は１５〜
３５ｗｔ％の範囲内であることを特徴とする、請求項１
に記載の太陽電池用電極の製造方法。 2. A mixture of the silver powder and the glass frit.
Of the total 100 wt% of the compound and the photosensitive resin
The mixture is 65 to 85 wt%, and the photosensitive resin is 15 to 85 wt%.
It is in the range of 35 wt%, Claim 1 characterized by the above-mentioned.
The method for manufacturing the solar cell electrode according to.
記ガラスフリットとの合計１００重量部に対して、０．
０１〜１０重量部含有することを特徴とする、請求項１
または請求項２に記載の太陽電池用電極の製造方法。 3. The silver powder and the coupling agent are used as the coupling agent.
With respect to 100 parts by weight in total with the glass frit, 0.
The amount of 01 to 10 parts by weight is contained.
Or the manufacturing method of the electrode for solar cells of Claim 2.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP08250396A JP3374647B2 (en) | 1996-04-04 | 1996-04-04 | Method for manufacturing electrode for solar cell |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP08250396A JP3374647B2 (en) | 1996-04-04 | 1996-04-04 | Method for manufacturing electrode for solar cell |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH09275221A JPH09275221A (en) | 1997-10-21 |
| JP3374647B2 true JP3374647B2 (en) | 2003-02-10 |
Family
ID=13776313
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP08250396A Expired - Fee Related JP3374647B2 (en) | 1996-04-04 | 1996-04-04 | Method for manufacturing electrode for solar cell |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3374647B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8691326B2 (en) | 2011-04-01 | 2014-04-08 | E. I. Du Pont De Nemours And Company | Method for manufacturing solar cell electrode |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007235082A (en) * | 2006-02-02 | 2007-09-13 | E I Du Pont De Nemours & Co | Paste for solar battery electrode |
| TWI443162B (en) * | 2008-09-05 | 2014-07-01 | Lg Chemical Ltd | Paste and manufacturing method of solar cell using the same |
| JP2010087251A (en) * | 2008-09-30 | 2010-04-15 | Dic Corp | Conductive paste for solar battery |
| CN102222705A (en) * | 2010-04-14 | 2011-10-19 | 上海大洲电子材料有限公司 | Lead-free environmentally-friendly silver paste and method for forming back electrode of silicon solar cell |
| KR101396444B1 (en) * | 2013-05-06 | 2014-05-22 | 한화케미칼 주식회사 | Method of preparing front electrode of solar cell and solar cell using the same |
| CN107275419A (en) * | 2017-06-30 | 2017-10-20 | 北京市合众创能光电技术有限公司 | A kind of preparation method of crystal silicon photovoltaic battery front side electrode |
| CN111702166A (en) * | 2020-06-23 | 2020-09-25 | 西安汇创贵金属新材料研究院有限公司 | Metal composite material and preparation method thereof |
-
1996
- 1996-04-04 JP JP08250396A patent/JP3374647B2/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8691326B2 (en) | 2011-04-01 | 2014-04-08 | E. I. Du Pont De Nemours And Company | Method for manufacturing solar cell electrode |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH09275221A (en) | 1997-10-21 |
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