JP3358051B2 - Barrel type susceptor for vapor phase growth - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a barrel-type susceptor for vapor phase growth used for vapor phase growth of semiconductor devices on a semiconductor wafer.

[0002]

2. Description of the Related Art As shown in FIG. 4, for example, a barrel-type susceptor for vapor phase growth is formed of a plurality of trapezoidal plates made of isotropic carbon and formed in a truncated pyramid-shaped susceptor body 31.
A plurality of counterbore recesses 32 for accommodating a semiconductor wafer are provided on the outer surface of the semiconductor wafer, and the semiconductor wafer after film formation is prevented from adhering to the susceptor body 31, or a film is formed around the back surface of the semiconductor wafer. Fig. 5
As shown in the figure, a groove 33 is provided along the periphery of the bottom surface of the counterbore recess 32, and the surface of the susceptor body 31 is CV-shaped.
It is configured to be covered with a silicon carbide (SiC) coating (not shown) by the D method or the like.

[0003]

However, in the conventional barrel-type susceptor for vapor phase growth, since the groove 33 having a rectangular cross section is formed on the periphery of the bottom surface of the counterbore recess 32, impurities accumulate at the corners of the groove 33. There is a problem that the susceptor has a short life because pinholes are generated in the susceptor main body 31 from the corners. This is the SiC that covers the susceptor body 31
This is because, if a metal impurity is present, the portion is eroded non-uniformly due to the nature of the above. Accordingly, it is an object of the present invention to provide a barrel-type vapor-phase growth susceptor that can prevent metal impurities and the like from staying in a groove of a counterbore concave portion, and can greatly improve a service life.

[0004]

In order to solve the above-mentioned problems, a barrel type vapor phase growth susceptor of the present invention has a barrel type vapor phase growth having a groove along the periphery at the bottom surface of a counterbore recess for accommodating a semiconductor wafer. In the growth susceptor, at least the outer corner of the groove is formed as a slope or a concave surface.

The outer and inner corners of the loop-shaped groove may both be inclined or concave, or one of them may be inclined and the other concave.

[0006]

Embodiments of the present invention will be described below with reference to the drawings. FIG. 1 is a sectional view of a main part showing a first embodiment of a barrel-type vapor phase growth susceptor according to the present invention. This barrel type susceptor for vapor phase growth 1
A plurality of counterbore recesses 3 for accommodating a semiconductor wafer (not shown) are provided on the outer surface of a susceptor body 2 formed in a truncated pyramid shape using a plurality of trapezoidal plate members made of isotropic carbon, In addition, a groove 4 is provided along the periphery of the bottom surface of the counterbore concave portion 3, and the outer corner of the loop-shaped groove 4 is formed into an inclined surface having an angle of about 45 ° with respect to the bottom surface and the side surface. The surface of the susceptor main body 1 is covered with a SiC film formed by a CVD method or the like.

In the barrel-type vapor-phase growth susceptor having the above-described structure, when a thick epitaxial film of, for example, about 120 μm is formed on a semiconductor wafer, adhesion between the semiconductor wafer and the susceptor body 2 is prevented, and the periphery of the back surface of the semiconductor wafer is prevented. Is formed, and since the outer corner is formed in a slanted shape, the retention of impurities in the groove 4 is prevented.

FIGS. 2 and 3 are cross-sectional views of essential parts showing second and third embodiments of a barrel type vapor phase growth susceptor according to the present invention, respectively. The barrel-type vapor-phase growth susceptor 5 in FIG. 2 has a concave curved surface at the outer corner of the loop-shaped groove 6, and the barrel-type vapor-phase growth susceptor 7 in FIG.
The corners on both sides of the groove 8 having a loop shape are formed in a concave curved surface shape. Other configurations and operational effects are almost the same as those of the first embodiment. Therefore, the same constituent members and the like are denoted by the same reference numerals and description thereof is omitted.

[0010] Here, the semiconductor wafer is used by using the first embodiment (product A of the present invention), the second embodiment (product B of the present invention) and the conventional product (conventional product). Table 1 shows the service life and the reason why the service life was reached when film formation by phase growth was repeated.

[0010]

[Table 1]

From Table 1, it can be seen that the service life can be extended more than twice as long as the conventional one by forming the outer corner of the loop-shaped groove into a slope or concave surface.

In each of the embodiments described above,
The case where the outer inset corner of the loop-shaped groove has a sloped shape, the outer inset corner has a concave curved shape and the inner and outer sides have an indented curved shape, but the present invention is not limited to these. The inside or only the inside corners may be inclined, or the inside only corners may be concave, or one of the inside corners may be sloped, and the other may be concave. Almost the same operation and effect can be obtained.

[0013]

As described above, according to the susceptor for barrel-type vapor phase growth of the present invention, stagnation of metal impurities and the like in the groove on the bottom peripheral edge of the counterbore concave portion is prevented, and the generation of pinholes is prevented. Therefore, the service life can be significantly improved.

[Brief description of the drawings]

FIG. 1 is a cross-sectional view of a main part showing a first embodiment of a barrel-type vapor phase growth susceptor according to the present invention.

FIG. 2 is a sectional view of a main part showing a second embodiment of a barrel-type vapor phase growth susceptor according to the present invention.

FIG. 3 is a cross-sectional view of a main part showing a third embodiment of a barrel-type vapor phase growth susceptor according to the present invention.

FIG. 4 is a perspective view of a conventional barrel type susceptor for vapor phase growth.

FIG. 5 is a sectional view of a main part of the susceptor of FIG. 4;

[Explanation of symbols]

 2 Susceptor body 3 Counterbore recess 4 Groove 6 Groove 8 Groove

──────────────────────────────────────────────────続 き Continuing on the front page (72) Inventor Shunichi Suzuki 378 Oguni-machi, Ogunimachi, Oguni-machi, Nishiokitama-gun, Yamagata Prefecture Inside the Oguni Plant, Toshiba Ceramics Co., Ltd. 378, Toshiba Ceramics Co., Ltd. Oguni Works (56) References JP-A-7-74114 (JP, A) JP-A-10-167885 (JP, A) (58) Fields investigated (Int. Cl. ⁷ , DB name) H01L 21/205

Claims (1)

(57) [Claims] 1. A barrel-type vapor phase growth susceptor having a groove along the periphery at the bottom surface of a counterbore recess for accommodating a semiconductor wafer, wherein at least an outer corner of the groove is formed into a slope or a concave curved surface. A barrel type susceptor for vapor phase growth.