JP3353315B2 - Frit sealing method - Google Patents

Frit sealing method

Info

Publication number
JP3353315B2
JP3353315B2 JP32746691A JP32746691A JP3353315B2 JP 3353315 B2 JP3353315 B2 JP 3353315B2 JP 32746691 A JP32746691 A JP 32746691A JP 32746691 A JP32746691 A JP 32746691A JP 3353315 B2 JP3353315 B2 JP 3353315B2
Authority
JP
Japan
Prior art keywords
temperature
frit
sealing method
cathode ray
ray tube
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP32746691A
Other languages
Japanese (ja)
Other versions
JPH05166461A (en
Inventor
清孝 丹波
隆生 中野
和男 鳥山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sony Corp
Original Assignee
Sony Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sony Corp filed Critical Sony Corp
Priority to JP32746691A priority Critical patent/JP3353315B2/en
Publication of JPH05166461A publication Critical patent/JPH05166461A/en
Application granted granted Critical
Publication of JP3353315B2 publication Critical patent/JP3353315B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、フリットシール方法に
係り、特に陰極線管(CRT)を製造する一つの工程で
あるフリットシール方法に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a frit sealing method, and more particularly to a frit sealing method which is one of the steps for manufacturing a cathode ray tube (CRT).

【0002】[0002]

【従来の技術】陰極線管(CRT)を構成するパネルと
ファンネルとをフリットガラスを用いて炉内で溶着シー
ル(フリットシール方法)する際に、パネルの蛍光面に
前工程で塗布したアクリル系樹脂等の中間膜を熱により
分解し、ガスとしてCRTの外部に放出している。この
中間膜分解工程の際に酸素不足であれば不完全燃焼が起
こり、そのために炭化水素ガス(CH4等)が発生し、
それが原因でアルミ浮きやフリットの黒化等の接着強度
を弱める不具合が生じる。酸素不足を避けるため、従来
のフリットシール方法では、ジェットノズルより炉内で
のみ常温のエアーを常時陰極線管内に供給していた。
2. Description of the Related Art When a panel constituting a cathode ray tube (CRT) and a funnel are welded and sealed (frit sealing method) in a furnace using frit glass, an acrylic resin applied to a phosphor screen of the panel in a previous step. Is decomposed by heat and released as a gas to the outside of the CRT. If oxygen is insufficient during the intermediate film decomposition step, incomplete combustion occurs, and as a result, hydrocarbon gas (such as CH 4 ) is generated,
As a result, there arises a problem that the adhesive strength is weakened such as floating of aluminum or blackening of frit. In order to avoid oxygen shortage, in the conventional frit sealing method, air at room temperature was always supplied into the cathode ray tube only in the furnace from the jet nozzle.

【0003】[0003]

【発明が解決しようとする課題】しかしながら、この従
来のフリットシール方法は、常温のエアーを供給するた
め、ガラス(パネルとファンネル)の内外の温度差のた
め、供給したエアーと蛍光面に塗布した中間膜との反応
に時間がかかり、中間膜分解領域(260〜380℃)
では、図3に示すように炉の内部の温度上昇率を下げ
(昇温曲線をゆるやかにして)エアーの供給を行ってい
た。そのために中間膜分解に時間がかかり、全体として
フリットシール処理の生産性低下の原因となっていた。
However, in this conventional frit sealing method, since the air at room temperature is supplied, due to the temperature difference between the inside and outside of the glass (panel and funnel), the applied air and the phosphor are coated on the fluorescent screen. It takes time to react with the interlayer, and the interlayer decomposition area (260-380 ° C)
In this example, as shown in FIG. 3, air was supplied at a reduced rate of temperature increase inside the furnace (with a gentle temperature rise curve). As a result, it takes a long time to decompose the intermediate film, and as a whole, the productivity of the frit sealing process is reduced.

【0004】また、図3に示した熱処理曲線の降温過程
において、炉内のダストがCRT内部に付着し、その為
CRTの耐電圧不良の原因となっていた。
[0004] Further, in the course of the temperature reduction of the heat treatment curve shown in FIG. 3, dust in the furnace adheres to the inside of the CRT, thereby causing a withstand voltage failure of the CRT.

【0005】本発明は、CRTパネルの蛍光面に塗布さ
れた中間膜の分解領域で昇温速度を下げることなく、良
好なフリットシール溶着、CRTの耐電圧を保証するこ
とができるフリットシール方法を提供することを目的と
する。
The present invention provides a frit seal method capable of guaranteeing good frit seal welding and withstand voltage of a CRT without lowering a heating rate in a decomposition region of an intermediate film applied to a phosphor screen of a CRT panel. The purpose is to provide.

【0006】[0006]

【課題を解決するための手段】上記課題は本発明によれ
ば、所定の昇温過程及び降温過程を有する熱処理曲線で
温度管理された炉内で、陰極線管を構成するパネルとフ
ァンネルとをフリットガラスを用いて加熱接合するフリ
ットシール方法において、前記昇温過程における中間膜
分解領域において、前記陰極線管内に高温のエアーを直
接供給して所定の温度上昇率を保持し中間膜分解を促進
すると共に、前記降温過程において、複数回にわたり前
記陰極線管内に高温のエアーを直接供給してダストの陰
極線管への流入を防止することを特徴とするフリットシ
ール方法によって解決される。
SUMMARY OF THE INVENTION According to the present invention, there is provided a heat treatment curve having a predetermined temperature increasing process and a predetermined temperature decreasing process.
In a temperature-controlled furnace, the panels and tubes that make up the cathode ray tube
And heat bonding using frit glass.
The heat sealing process, wherein
In the decomposition area, high-temperature air is directly injected into the cathode ray tube.
Directly supplied to maintain a predetermined temperature rise rate and promote interlayer film decomposition
And a plurality of times during the cooling process.
High-temperature air is directly supplied into the cathode ray tube to prevent dust
The problem is solved by a frit sealing method characterized by preventing inflow into a pole tube .

【0007】[0007]

【作用】本発明によれば、炉外から高温のエアーを図1
に示した陰極線管(CRT)1内に直接供給するため
に、図2に示すように熱処理曲線の昇温過程における中
間膜分解領域(260〜380℃)において、炉の内部
の温度上昇率を保持した状態で、酸素不足に陥ることな
く蛍光面に塗布した中間膜の分解を完了させることがで
きる。更に続いて炉内の温度を440℃まで上昇させる
ことにより、パネルとファンネルのフリットシールが完
了する。
According to the present invention, high-temperature air is supplied from outside the furnace in FIG.
In order to supply directly into the cathode ray tube (CRT) 1 shown in FIG. 2, in the intermediate film decomposition region (260 to 380 ° C.) in the process of increasing the temperature of the heat treatment curve, as shown in FIG. In the held state, decomposition of the intermediate film applied to the phosphor screen can be completed without falling short of oxygen. Subsequently, by raising the temperature in the furnace to 440 ° C., frit sealing between the panel and the funnel is completed.

【0008】しかも、炉内の温度を下げる降温過程にお
いて、数回同様に炉外からエアーを供給することにより
CRT内部のダストがクリーンなエアーとの置換により
放出され、ダストのCRT内への流入が避けられる。
In addition, in the temperature lowering process of lowering the temperature inside the furnace, dust is discharged from the inside of the CRT by replacing it with clean air by supplying air from outside the furnace several times in the same manner, and the dust flows into the CRT. Can be avoided.

【0009】結局、中間膜分解領域で初めの昇温速度を
保持した分だけ、従来と比べ反応速が速まり、生産性の
向上に寄与する。
As a result, the reaction rate is increased as compared with the conventional one by the amount of maintaining the initial temperature rising rate in the intermediate film decomposition region, which contributes to an improvement in productivity.

【0010】[0010]

【実施例】以下、本発明の実施例を図面に基づいて説明
する。
Embodiments of the present invention will be described below with reference to the drawings.

【0011】図1は本発明の実施例を説明するための概
略斜視図である。図1に示すように、炉内にフリットシ
ールされるべきワーク(被処理品)としての陰極線管
(CRT)1が配設されている。CRT1はパネル2と
ファンネル3から構成され、パネル2とファンネル3間
にフリットを介在させてフリットシールするものであ
る。4がフリットシール部である。CRT1のファンネ
ル3のネック管にはエアーノズル6がはめ込まれてお
り、炉外の高温ガスの追従供給装置20から供給される
高温高圧ガスが供給管7aを介して送り込まれる。供給
管7aはメッシュテーブル8上に載置され、矢印A方向
に移動可能な搬送架台9上にセットされる。炉壁10に
は高温ガス追従供給装置20の供給管7bが搬送架台9
に追従し得るように窓13が設けられている。
FIG. 1 is a schematic perspective view for explaining an embodiment of the present invention. As shown in FIG. 1, a cathode ray tube (CRT) 1 is provided in a furnace as a work (workpiece) to be frit sealed. The CRT 1 includes a panel 2 and a funnel 3, and frit seals between the panel 2 and the funnel 3 with a frit interposed therebetween. 4 is a frit seal part. An air nozzle 6 is fitted into the neck tube of the funnel 3 of the CRT 1, and a high-temperature, high-pressure gas supplied from a high-temperature gas follow-up supply device 20 outside the furnace is fed through a supply tube 7a. The supply pipe 7a is placed on a mesh table 8 and set on a transport base 9 movable in the direction of arrow A. The supply pipe 7 b of the hot gas follow-up supply device 20 is provided on the furnace wall 10
A window 13 is provided so as to follow.

【0012】高温ガス追従供給装置20は高圧エアー供
給チューブ15および熱風発生器16が設けられ、高温
高圧エアーを供給する。
The high-temperature gas follow-up supply device 20 is provided with a high-pressure air supply tube 15 and a hot air generator 16, and supplies high-temperature high-pressure air.

【0013】本実施例のフリットシール工程は図2に示
すヒートパターン(熱処理曲線)に従って行った。すな
わち、蛍光面の中間膜の分解が開始する260℃までは
従来と同様に8℃/分の昇温速度でCRTを加熱し、上
記中間膜分解温度の260℃に達した時点で高温、高圧
のエアーをCRT1内に供給し、炉内が380℃の中間
膜分解終了温度になった時点でエアー供給を停止する。
この時の昇温速度は最初の8℃/分に保持し続ける38
0℃を経てから440℃になった時点ではフリットは融
解し、パネル2とファンネル3のフリットシールが完了
する。上記の中間膜分解領域(260℃〜380℃)で
従来法に比較して約25分短縮された。
The frit sealing step of this embodiment was performed according to the heat pattern (heat treatment curve) shown in FIG. That is, the CRT is heated at a heating rate of 8 ° C./min in the same manner as before until 260 ° C. at which the decomposition of the interlayer on the phosphor screen starts. Is supplied into the CRT 1 and the supply of air is stopped when the temperature in the furnace reaches the intermediate film decomposition end temperature of 380 ° C.
At this time, the heating rate is kept at the initial 8 ° C./min.
When the temperature reaches 440 ° C. after passing 0 ° C., the frit is melted, and the frit seal between the panel 2 and the funnel 3 is completed. In the above-mentioned interlayer decomposition region (260 ° C. to 380 ° C.), the time was reduced by about 25 minutes as compared with the conventional method.

【0014】また、従来と同様の3℃/分の降温速度に
した降温過程では、ヒートパターンに示すように、5回
にわたり昇温過程と同じ高温高圧のエアーをCRT1内
に供給する。このエアー供給により、ダストのCRT1
内への流入を防止することができた。なお、この降温過
程におけるエアーの供給回数は、1回の供給量が多けれ
ば少なくしてもよい。
In the cooling process at the same cooling rate of 3 ° C./min as in the conventional case, the same high-temperature and high-pressure air as in the heating process is supplied into the CRT 1 five times as shown in the heat pattern. With this air supply, dust CRT1
It was possible to prevent the inflow into the inside. Note that the number of times of air supply during this temperature lowering process may be reduced as long as the amount of supply at one time is large.

【0015】従来法より短縮された上記25分は、全熱
処理工程に要する時間の約15%に相当した。
The above 25 minutes, which is shorter than the conventional method, corresponded to about 15% of the time required for the entire heat treatment step.

【0016】[0016]

【発明の効果】以上説明したように、本発明によれば、
フリットシール処理の生産性の向上が図れ、しかも良好
なフリットの溶着、良好な蛍光面および陰極線管(CR
T)耐電圧の保証により歩留りの向上に寄与する。
As described above, according to the present invention,
It is possible to improve the productivity of the frit sealing process, and furthermore, to have good frit welding, good fluorescent screen and cathode ray tube (CR)
T) It contributes to the improvement of the yield by guaranteeing the withstand voltage.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の実施例を説明するための装置概略斜視
図である。
FIG. 1 is a schematic perspective view of an apparatus for explaining an embodiment of the present invention.

【図2】本発明の実施例のフリットシールヒートパター
ン(熱処理曲線)を示す図である。
FIG. 2 is a diagram showing a frit seal heat pattern (heat treatment curve) according to an example of the present invention.

【図3】従来法のフリットシールヒートパターンを示す
図である。
FIG. 3 is a diagram showing a frit seal heat pattern according to a conventional method.

【符号の説明】[Explanation of symbols]

1 陰極線管(CRT) 2 パネル 3 ファンネル 4 フリットシール部 6 エアーノズル 7a,7b 供給管 8 メッシュテーブル 9 搬送架台 10 炉壁 13 窓 15 高圧エアー供給チューブ 16 熱風発生器 20 高温ガス追従供給装置 DESCRIPTION OF SYMBOLS 1 Cathode ray tube (CRT) 2 Panel 3 Funnel 4 Frit seal part 6 Air nozzle 7a, 7b Supply pipe 8 Mesh table 9 Transfer stand 10 Furnace wall 13 Window 15 High-pressure air supply tube 16 Hot air generator 20 High-temperature gas follow-up supply device

───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 平1−236543(JP,A) 特開 昭54−69376(JP,A) (58)調査した分野(Int.Cl.7,DB名) H01J 9/26 ────────────────────────────────────────────────── ─── Continuation of front page (56) References JP-A-1-236543 (JP, A) JP-A-54-69376 (JP, A) (58) Fields investigated (Int. Cl. 7 , DB name) H01J 9/26

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 所定の昇温過程及び降温過程を有する熱
処理曲線で温度管理された炉内で、陰極線管を構成する
パネルとファンネルとをフリットガラスを用いて加熱接
合するフリットシール方法において、 前記昇温過程における中間膜分解領域において、前記陰
極線管内に高温のエアーを直接供給して所定の温度上昇
率を保持し中間膜分解を促進すると共に、 前記降温過程において、複数回にわたり前記陰極線管内
に高温のエアーを直接供給してダストの陰極線管への流
入を防止する ことを特徴とするフリットシール方法。
1. Heat having a predetermined temperature rising step and a predetermined temperature falling step
Configure a cathode ray tube in a furnace whose temperature is controlled by a processing curve
The panel and funnel are heated and connected using frit glass.
In the frit sealing method, in the intermediate film decomposition region in the temperature increasing process, the shadow is formed.
Predetermined temperature rise by supplying high-temperature air directly into the pole tube
While maintaining the rate and promoting the decomposition of the interlayer , and in the process of lowering the temperature, the inside of the cathode ray tube is repeated several times.
Hot air is supplied directly to the
A frit sealing method characterized by preventing entry .
JP32746691A 1991-12-11 1991-12-11 Frit sealing method Expired - Fee Related JP3353315B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP32746691A JP3353315B2 (en) 1991-12-11 1991-12-11 Frit sealing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP32746691A JP3353315B2 (en) 1991-12-11 1991-12-11 Frit sealing method

Publications (2)

Publication Number Publication Date
JPH05166461A JPH05166461A (en) 1993-07-02
JP3353315B2 true JP3353315B2 (en) 2002-12-03

Family

ID=18199479

Family Applications (1)

Application Number Title Priority Date Filing Date
JP32746691A Expired - Fee Related JP3353315B2 (en) 1991-12-11 1991-12-11 Frit sealing method

Country Status (1)

Country Link
JP (1) JP3353315B2 (en)

Also Published As

Publication number Publication date
JPH05166461A (en) 1993-07-02

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