JP3347929B2 - Processing liquid supply device - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a developing solution and a photoresist on the surface of various substrates such as an object to be processed, for example, a semiconductor wafer, a glass substrate for a liquid crystal display (LCD), a glass substrate for a photomask, and a substrate for an optical disk. The present invention relates to a processing liquid supply device that supplies a processing liquid such as a cleaning liquid such as a liquid or pure water.

[0002]

2. Description of the Related Art For example, when a substrate such as a semiconductor wafer or an LCD glass substrate is held in a horizontal position and rotated around a vertical axis, a photoresist film deposited on the surface of the substrate is developed. The developing solution is supplied from a developing solution supply source to a discharge nozzle through a liquid supply pipe in which a filter or the like is inserted, and is supplied from a discharge port of the discharge nozzle to the surface of the substrate. Then, the developing solution is controlled so as to be uniformly supplied over the entire surface of the substrate so as not to cause uneven development.

However, air may bite into the liquid supply pipe or gas may be dissolved in the developer flowing in the liquid supply pipe. If this developer is supplied from the discharge nozzle to the surface of the substrate as it is, Then, the gas in the developing solution adheres as bubbles to the surface of the photoresist film on the substrate. As a result, the developing process at the portion where the bubbles are attached is hindered, resulting in poor development. A similar problem occurs not only in the development processing but also in various processing steps.
In the photoresist liquid coating step, if gas is dissolved in the photoresist liquid, it causes uneven coating.

[0004] In order to eliminate processing defects caused by air biting into the liquid feeding pipe or gas being dissolved in the processing liquid, as shown in FIG.
A degassing module 2 is provided in the middle of a liquid sending pipe 1 from a processing liquid supply source to a processing liquid discharge port, and removes gas in the processing liquid when the processing liquid passes through the degassing module 2. And
The processing liquid in a state where the gas is not dissolved is supplied from the discharge port onto the substrate. The degassing module 2 whose schematic cross-sectional view is shown in FIG. 2 includes an inlet-side joint 3 and an outlet-side joint 4 that are respectively connected to the liquid-feeding pipe 1, a non-corrosive material, for example, a tetrafluoroethylene resin. And a liquid flow path 5 composed of a number of small tubes arranged in parallel with each other and having both ends communicating with the joints 3 and 4 respectively. Is housed inside and a vacuum chamber 6 whose periphery is hermetically sealed. Then, a degassing pipe 7 is connected to the degassing module 2 so as to communicate with the sealed space in the vacuum chamber 6, and the degassing pipe 7 is connected to a vacuum suction source such as a vacuum pump or a vacuum line in a factory. Connected. A pressure regulating valve 8 for adjusting the vacuum pressure for vacuum suction in the vacuum chamber 6 to a predetermined value for connection is provided in the degassing pipe 7 as necessary.

When a processing liquid such as a developing solution, a photoresist solution, and pure water for cleaning supplied from a processing liquid supply source through a liquid supply pipe 1 flows into the degassing module 2, a gas permeable film material is formed. A gas such as air dissolved in the processing liquid passes through the gas permeable membrane material of the thin tube while the processing liquid flows through the liquid flow path 5 composed of a number of small tubes formed by the vacuum chamber 6 held under vacuum. It is effectively removed to the enclosed space inside. As described above, the processing liquid is quickly degassed while being continuously passed through the degassing module 2, and the degassed processing liquid is discharged from the outlet of the degassing module 2 and is supplied to the liquid supply pipe 1. Sent out inside.

[0006]

By the way, while using the processing liquid supply apparatus as shown in FIG. 2, the gas permeable membrane material constituting the liquid flow path 5 of the deaeration module 2 is formed. If the thin tube is damaged due to aging,
Even when the processing liquid flows through the degassing module 2, the gas in the processing liquid is not removed, and the processing liquid without being degassed is supplied from the discharge nozzle at the tip of the liquid sending pipe 1 to the surface of the substrate. This causes poor development and uneven coating. If such a state is maintained, the yield will be significantly reduced.

Incidentally, there is no conventional method for reliably detecting a decrease in the degassing ability of the degassing module 2. A dissolved nitrogen meter is used to place the liquid sending pipe 1 downstream of the degassing module 2. A method of measuring the amount of nitrogen gas dissolved in the treatment liquid is conceivable, but the method also lacks reliability.

The vacuum chamber 6 of the degassing module 2
A very small amount of liquid may ooze out of the sealed space in the vacuum chamber 6 into the degassing pipe 7 connected to the pipe, and the oozed liquid conventionally passes through the degassing pipe 7 as it is. Thus, it flows into a vacuum suction source, for example, a vacuum line facility in a factory. In a normal state, the amount of the liquid exuding is extremely small, so that there is no particular problem. However, in the case of an abnormality such as a case where the thin tube made of the gas permeable membrane material constituting the liquid flow path 5 of the degassing module 2 is broken due to aging, a large amount of the processing liquid passes through the degassing pipe 7 and vacuum equipment. Will flow to the side. As a result, the equipment is greatly damaged. Also,
In order to protect the vacuum equipment, it is conceivable to use a relatively inexpensive ejector as a vacuum suction source, but in that case, a large amount of gas-liquid mixed flow will be generated at the time of the above-mentioned abnormality. For this reason, there is a problem that drain recovery becomes difficult or a complicated system is required for that.

SUMMARY OF THE INVENTION The present invention has been made in view of the above circumstances, and when the liquid flow path of the degassing module is broken, the abnormality is reliably detected and the degassing module is used. A first object is to provide a processing liquid supply device capable of avoiding inconvenience caused by a decrease in degassing ability.

Further, according to the present invention, when the liquid flow path of the degassing module is broken, a large amount of the processing liquid flows from the degassing module to the vacuum equipment side as a vacuum suction source through the degassing pipe. It is a second object of the present invention to provide a processing liquid supply device that prevents the flow of the processing liquid and does not damage the equipment.

[0011]

The invention according to claim 1 is
A liquid supply pipe for supplying the processing liquid, and a liquid flow path which is interposed in the middle of the liquid supply pipe and is formed of a gas-permeable membrane material and communicates an inlet and an outlet; In a processing liquid supply device including a degassing module hermetically sealed with a vacuum chamber around the periphery thereof, and a degassing pipe connecting a sealed space in the vacuum chamber of the degassing module to a vacuum suction source, Detecting means for detecting the inflow of the processing liquid from inside the vacuum chamber of the degassing module is provided in the degassing pipe, and processing into the degassing pipe is performed based on a detection signal output from the detecting means. A notifying means for notifying the inflow of the liquid is provided.

[0012] The invention according to claim 2, in the process liquid supply apparatus according to claim 1, in piping degassing, or the liquid feed pipe, upstream of the degassing module, the normally open detection means An emergency shutoff valve closed by a detection signal is provided.

According to a third aspect of the present invention, there is provided a liquid supply pipe for supplying a processing liquid, and a liquid interposed between the liquid supply pipe and formed of a gas permeable film material to communicate an inlet and an outlet. A deaeration module having a flow path and hermetically sealing the periphery of the liquid flow path in a vacuum chamber, and a deaeration pipe for connecting a closed space in the vacuum chamber of the deaeration module to a vacuum suction source In the processing liquid supply device, the processing liquid flowing into the degassing pipe from inside the vacuum chamber of the degassing module is separated and stored from the gas in the middle of the degassing pipe, and a vacuum suction source is provided. A liquid reservoir for preventing the processing liquid from flowing toward the other side is provided.

According to a fourth aspect of the present invention, in the processing liquid supply device according to the third aspect, the liquid storage section includes a storage amount detecting means for detecting that the processing liquid stored therein has reached a predetermined amount. And a storage amount notifying unit for notifying that a predetermined amount of the processing liquid has been stored in the liquid storage unit based on a detection signal output from the storage amount detecting unit.

According to a fifth aspect of the present invention, in the processing liquid supply apparatus according to the third or fourth aspect, a drain discharge pipe for discharging the liquid collected in the liquid reservoir is provided at the bottom of the liquid reservoir. It is characterized in that an on-off valve is interposed in the drain discharge pipe.

If the gas permeable membrane material forming the liquid flow path of the degassing module is damaged, the processing liquid flows from the vacuum chamber of the degassing module into the degassing pipe. come. In the processing liquid supply apparatus according to the first aspect of the present invention, the detection means detects that the processing liquid has flowed into the deaeration pipe, and the inflow of the processing liquid into the deaeration pipe is notified. Informs workers. Therefore,
By stopping the supply of the processing liquid to the object to be processed, it is possible to avoid the inconvenience that the processing liquid that is not degassed is supplied onto the object to be processed, resulting in poor development and uneven coating. Will be possible.

In the processing liquid supply apparatus according to the second aspect of the present invention, when the detection means detects the inflow of the processing liquid into the degassing distribution pipe, the degassing pipe and / or the liquid feeding pipe are connected to each other.
The emergency shutoff valve disposed upstream of the degassing module is closed. This prevents the processing liquid flowing into the degassing distribution pipe from flowing toward the vacuum suction source, and / or prevents the processing liquid from flowing from the processing liquid supply source through the liquid supply pipe into the degassing module. And the flow of the processing liquid from the degassing module into the degassing pipe is stopped.

In the processing liquid supply apparatus according to the third aspect of the present invention, the gas permeable membrane material forming the liquid flow path of the degassing module is damaged, and the vacuum chamber of the degassing module is moved into the degassing pipe. When the processing liquid flows, the processing liquid flows into a liquid storage part provided in the middle of the degassing pipe, and is separated from the gas and stored in the liquid storage part. For this reason, the processing liquid that has flowed into the degassing pipe from the degassing module is prevented from flowing directly toward the vacuum suction source.

In the processing liquid supply apparatus according to the present invention, when the processing liquid flowing into the degassing pipe from the degassing module and stored in the liquid reservoir reaches a predetermined amount, the processing is performed. Is detected by the storage amount detection means and is notified to the worker by the storage amount notification means. Thereby, the operator knows that an abnormality has occurred in the degassing module, and stops supplying the processing liquid to the processing target, whereby the processing liquid without being degassed is supplied onto the processing target. It is possible to avoid inconveniences such as poor development and uneven coating.

Even in a normal state, a very small amount of liquid may ooze out of the vacuum chamber of the degassing module into the degassing pipe, and dew may be formed in the degassing pipe. Although the amount of the liquid is extremely small, the liquid gradually accumulates in the liquid reservoir over a long period of time.
In the processing liquid supply device according to the fifth aspect of the present invention, the liquid accumulated in the liquid reservoir is drained by opening an on-off valve interposed in the drain discharge pipe connected to the bottom of the liquid reservoir. Is discharged through. In particular, in the case where the storage amount detecting means is provided in the liquid storage portion, by periodically discharging the liquid stored in the liquid storage portion, the storage of the liquid in the liquid storage portion in a steady state is performed. Thus, the storage amount detecting means does not malfunction, and it is possible to reliably detect only the inflow of the processing liquid into the liquid storage section at the time of abnormality.

[0021]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS The best embodiment of the present invention will be described below with reference to FIG.

FIG. 1 is a schematic configuration diagram of a processing liquid supply device showing an example of an embodiment of the present invention. In this apparatus, a degassing module 2 is inserted in the middle of a liquid feeding pipe 1 from a processing liquid supply source to a processing liquid discharge port. The configuration of the degassing module 2 is the same as that of the processing liquid supply device described above with reference to FIG. 2, and the degassing action of the processing liquid is performed in the same manner. A degassing pipe 10 is connected to the vacuum chamber of the degassing module 2 so as to communicate with the sealed space, and the degassing pipe 10 is connected to a vacuum suction source, for example, a vacuum line or a vacuum pump in a factory. It is connected. The configuration of the degassing module is not limited to the above-described one, and any configuration may be used as long as a similar degassing action can be obtained.

In this processing liquid supply apparatus, the deaeration pipe 10
Is provided with a trap tank 12 for separating gas and liquid and storing the liquid. Further, an emergency shutoff valve 14 which is normally opened and closed when an abnormality occurs is provided in the degassing pipe 10 on the vacuum suction source side with respect to the trap tank 12. An emergency shut-off valve 16 that is always opened and closed in the event of an abnormality is also provided in the liquid sending pipe 1.
0 or only one of the liquid feeding pipes 1 may be provided.

At the bottom of the trap tank 12, a drain discharge pipe 18 for discharging the liquid accumulated in the tank is provided.
Are connected to each other, and an on-off valve 20 is interposed in the drain discharge pipe 18. An atmosphere communication pipe 22 communicating with the atmosphere is connected to the upper part of the trap tank 12, and an atmosphere release valve 24 is interposed in the atmosphere communication pipe 22. A cutoff valve 30 is interposed between the trap tank 12 and the vacuum chamber of the degassing module 2 in the degassing pipe 10.

The trap tank 12 is provided with a storage amount detection sensor 32 for detecting that the processing liquid stored in the tank has reached a predetermined amount. As the storage amount detection sensor 32, any appropriate one of a float switch system, a photoelectric system, a capacitance system, and the like may be used. The detection signal output from the storage amount detection sensor 32 is sent to the CPU 34.
The CPU 34 controls opening and closing of the emergency shutoff valves 14 and 16, the on-off valve 20, the atmosphere release valve 24, and the cutoff valve 30, respectively. Further, the CPU 34 stores the trap tank 1 based on a detection signal from the storage amount detection sensor 32.
Alarm 2 for notifying that a predetermined amount of the processing liquid has been stored in 2
6 are connected.

Next, the operation of the processing liquid supply apparatus shown in FIG. 1 in the case where the thin tube made of the gas permeable membrane material constituting the liquid flow path of the degassing module 2 is broken will be described.

Normally, the emergency shutoff valves 14, 16 and the cutoff valve 30 are each open, and the on-off valve 20 and the atmosphere release valve 24 are each closed. Degassing module 2
When the thin tube of the liquid flow path is damaged, the processing liquid flows out from the damaged portion, and the processing liquid flows from the vacuum chamber of the degassing module 2 into the degassing pipe 10. Degassing piping 10
The processing liquid flowing into the inside flows into the trap tank 12 and is separated from the gas in the trap tank 12 and stored. Therefore, only the gas is sucked by the vacuum suction source, and the processing liquid flowing into the degassing pipe 10 from the degassing module 2 does not flow directly toward the vacuum suction source. When the processing liquid flowing from the deaeration module 2 into the deaeration pipe 10 and stored in the trap tank 12 reaches a predetermined amount, the processing liquid is detected by the storage amount detection sensor 32, and a detection signal is sent to the CPU 34. Can be And
A signal is sent from the CPU 34 to the alarm 36, and the alarm 3
6 is activated to notify the operator of the occurrence of the abnormal situation.
At the same time, a control signal is sent from the CPU 34 to the emergency shutoff valves 14 and 16, and the emergency shutoff valves 14 and 16 are closed. Thereby, the communication between the vacuum suction source and the inside of the vacuum chamber of the degassing module 2 is cut off, and the flow of the processing liquid from the processing liquid supply source through the liquid supply pipe 1 into the degassing module 2 is stopped. Then, the flow of the processing liquid from the degassing module 2 into the degassing pipe 10 is stopped. And
The operator receives the alarm from the alarm 36 and completely stops the operation of the processing liquid supply device.

When the operation of the processing liquid supply device is stopped, the cutoff valve 30 is closed, and the air release valve 24 and the open / close valve 20 are opened. Thereby, the trap tank 12
The processing liquid accumulated in the inside is discharged to the outside through a drain discharge pipe 18. Then, the damaged degassing module 2
Take necessary measures, such as replacing with a new one. After draining is completed, the on-off valve 20 and the atmosphere release valve 24 are closed again, and the cutoff valve 30 is opened again.
Then, the emergency shutoff valves 14, 16 are returned to the original state,
The operation of the processing liquid supply device is restarted.

Incidentally, even in a normal state, a very small amount of liquid leaks out of the vacuum chamber of the degassing module 2 into the degassing pipe 10 or dew condensation occurs in the degassing pipe 10. After a long period, the trap tank 12
The liquid may gradually accumulate inside. In such a case, the liquid accumulated in the trap tank 12 may be discharged through the drain discharge pipe 18 by periodically opening the atmosphere release valve 24 and the on-off valve 20. In this case, since the storage amount detection sensor 32 does not operate due to the storage of the liquid in the trap tank 12 in the steady state, only the flow of the processing liquid into the trap tank 12 at the time of abnormality is detected by the storage amount detection sensor 3.
2 will surely detect.

In the apparatus shown in FIG. 1, the trap tank 12 is interposed in the degassing pipe 10.
A part of the deaeration pipe may be bent into a U-shape, and the bent portion may be used as a trap portion. Further, the deaeration pipe 10 is branched off from the drain discharge pipe 18 on the way to separate the processing liquid from the gas, and the processing liquid is stored upstream of an on-off valve 20 provided in the drain discharge pipe 18. The processing liquid stored in the drain discharge pipe 18 may be configured to be detected by the storage amount detection sensor 32. Also,
The switching operation of the on-off valve 20, the atmosphere release valve 24, and the cutoff valve 30 may be performed manually instead of automatically. Further, without providing the emergency shut-off valves 14 and 16 which are operated by a signal from the CPU 34, the operator manually operates the opening / closing valve provided on the liquid supply pipe 1 or the deaeration pipe 10 by the alarm of the alarm 36. May be closed. The storage amount detection sensor 32 and the drain discharge pipe 18 are
If there is no particular need, it may not be provided.

In the embodiment described above, the deaeration pipe 10
A trap tank 12 is interposed to prevent the processing liquid from flowing into the vacuum suction source side. However, without providing a liquid reservoir such as a trap tank in the degassing pipe,
The degassing pipe is provided with a detection sensor that detects that the processing liquid has flowed into the pipe from the vacuum chamber of the degassing module, and only activates the alarm based on the detection signal output from the detection sensor. May be. In this case, the operator manually closes the on-off valve provided in the liquid supply pipe or the deaeration pipe by the alarm of the alarm device. Alternatively, the emergency cutoff valve provided in the liquid supply pipe or the deaeration pipe is automatically closed by a detection signal output from the detection sensor.

[0032]

According to the first aspect of the present invention, when the processing liquid supply device is used, when the liquid flow path of the deaeration module is broken, the abnormality is reliably detected and the deaeration module is removed. To prevent the disadvantage that the processing liquid which is not degassed due to a decrease in gas capacity is supplied to a processing object such as a substrate, thereby causing a defective development or uneven coating, thereby preventing a reduction in yield. Can be.

In the processing liquid supply apparatus according to the second aspect of the invention, the processing liquid flowing into the degassing distribution pipe is prevented from flowing toward the vacuum suction source, and / or the processing liquid is supplied from the processing liquid supply source. By stopping the flow of the processing liquid into the degassing module through the liquid pipe and stopping the flow of the processing liquid from the degassing module into the degassing pipe, a large amount of processing liquid is degassed. The flow from the module through the degassing pipe to the vacuum equipment, which is the vacuum suction source, is automatically stopped, so that damage to the equipment can be prevented.

With the use of the processing liquid supply device according to the third aspect of the present invention, when the liquid flow path of the degassing module is damaged, a large amount of processing liquid flows from the degassing module through the degassing pipe. Since it does not flow into the vacuum equipment side as the vacuum suction source, damage to the equipment can be prevented.

In the processing liquid supply apparatus according to the fourth aspect of the present invention, the operator is notified that an abnormality has occurred in the degassing module, so that the operator stops supplying the processing liquid to the workpiece. Due to this, the processing liquid that is not degassed is supplied onto the object to be processed, causing poor development and uneven coating.
Such inconveniences can be avoided.

In the processing liquid supply apparatus according to the fifth aspect of the present invention, the liquid accumulated in the liquid reservoir can be discharged through the drain discharge pipe. Also, by periodically discharging the liquid accumulated in the liquid reservoir, the storage amount detecting means does not operate due to the liquid being stored in the liquid reservoir during a steady state. The stored amount detection means can reliably detect only the flow of the processing liquid into the storage tank.

[Brief description of the drawings]

FIG. 1 is a schematic configuration diagram of a processing liquid supply device showing an example of an embodiment of the present invention.

FIG. 2 is a schematic configuration diagram illustrating an example of a conventional processing liquid supply device.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 Liquid supply piping 2 Deaeration module 3 Inlet side joint part 4 Outlet side joint part 5 Liquid flow path 6 Vacuum chamber 7, 10 Deaeration pipe 12 Trap tank 14, 16 Emergency shut-off valve 18 Drain discharge pipe 20 On-off valve 22 atmosphere communication pipe 24 atmosphere release valve 30 cutoff valve 32 storage amount detection sensor 34 CPU 36 alarm

────────────────────────────────────────────────── ─── Continuation of the front page (56) References JP-A-7-47352 (JP, A) (58) Fields investigated (Int. Cl. ⁷ , DB name) B01D 19/00-19/04

Claims (5)

(57) [Claims] 1. A liquid feed pipe for feeding a processing liquid, and a liquid flow path inserted in the middle of the liquid feed pipe and formed by a gas permeable membrane material to communicate an inlet and an outlet, A processing liquid comprising: a degassing module hermetically sealing the periphery of the liquid flow path in a vacuum chamber; and a degassing pipe connecting the sealed space in the vacuum chamber of the degassing module to a vacuum suction source. In the supply device, a detection unit that detects that the processing liquid has flowed from the vacuum chamber of the degassing module is provided in the degassing pipe, and the degassing is performed based on a detection signal output from the detection unit. A processing liquid supply device provided with a notifying means for notifying the inflow of the processing liquid into the piping for use. To 2. A piping degassing, or the liquid feed pipe, upstream of the degassing module, claim emergency shutoff valve which normally is closed by the detection signals of the opened detecting means is interposed 1
The processing liquid supply device according to any one of the preceding claims. 3. A liquid supply pipe for supplying a processing liquid, and a liquid flow path interposed between the liquid supply pipes and formed by a gas-permeable membrane material to communicate an inlet and an outlet, A processing liquid comprising: a degassing module hermetically sealing the periphery of the liquid flow path in a vacuum chamber; and a degassing pipe connecting the sealed space in the vacuum chamber of the degassing module to a vacuum suction source. In the supply device, the processing liquid flowing from the vacuum chamber of the degassing module into the degassing pipe is separated from the gas and stored in the middle of the degassing pipe, and the processing liquid flows toward the vacuum suction source. A processing liquid supply device, comprising a liquid reservoir for preventing the occurrence of the liquid. 4. A liquid storage part, wherein a storage amount detecting means for detecting that a processing liquid stored in the liquid storage part has reached a predetermined amount is provided, and based on a detection signal output from the storage amount detecting means. 4. The processing liquid supply device according to claim 3, further comprising a storage amount notifying unit for notifying that a predetermined amount of the processing liquid has been stored in the liquid storage unit. 5. A drain discharge pipe for discharging liquid accumulated in the liquid reservoir is connected to a bottom of the liquid reservoir, and an open / close valve is interposed in the drain discharge pipe. Item 5. A processing liquid supply device according to Item 4.