JP3341462B2 - Curable composition - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a curable composition used for forming a buffer coat for semiconductors, an interlayer insulating film, a passivation film, etc., and more particularly, to protection of a transparent substrate or a color filter in a liquid crystal device. The present invention relates to a curable composition suitable for forming a film.

[0002]

2. Description of the Related Art In recent years, many color liquid crystal display devices in which a liquid crystal device is combined with a color filter for color separation have been proposed. As a configuration of a general color filter, a pixel is formed on a transparent substrate such as glass, a protective film layer is provided, and then an ITO transparent electrode is provided.
This protective film layer has an adhesive property with the pixels constituting the lower layer, the glass, and chrome used as a black matrix component provided in the gap between the pixels, and an I layer constituting the upper layer.
Adhesion with TO, adhesion with an epoxy sealant for forming a liquid crystal cell, interception with pixel impurity components, smoothness,
A wide range of properties are required, such as light resistance, heat and moisture resistance, solvent resistance, chemical resistance, toughness, and transparency, and heat resistance to heat treatment required in a post-process for forming a liquid crystal cell. Similar characteristics are required for a protective film on a glass substrate.

[0003] As a thermosetting composition for forming such a protective film, siloxane polymer precursors, silicone polyimide precursors, and the like have been proposed, particularly from the viewpoint of heat resistance. Examples of the polyalkylsilsesquioxane precursor which is one of the siloxane polymer precursors include, for example, JP-A-63-241076 and JP-A-3-126612.
And Japanese Patent Application Laid-Open Nos. 3-188179 / 1991, and JP-A-61-103927 and JP-A-63-291922 disclose a method for producing a silicone polyimide precursor. ing. Further, Japanese Patent Application Laid-Open No. 63-291924 proposes a curable composition comprising a siloxane polymer precursor and a silicone polyimide precursor, mainly for the purpose of forming a protective film for a color filter.

However, Japanese Patent Application Laid-Open No. 63-291924 discloses
The curable composition proposed in Japanese Patent Laid-Open Publication No. H10-18498 provides an overall excellent color filter protective film, but has an applicability as a coating liquid composition, an adhesive property with upper and lower layer components, and a color filter protective film formation. Problems remain in the preservability and the like as a coating liquid composition for use, and improvement thereof has been desired.

[0005]

SUMMARY OF THE INVENTION An object of the present invention is to form a protective film such as a transparent substrate or a color filter in a liquid crystal device, and particularly to a protective film having good coatability and improved adhesion. An object of the present invention is to provide a curable composition which gives a film and has excellent storage stability.

[0006]

SUMMARY OF THE INVENTION The object of the present invention is as follows.
The following components A and B are each in a solid content ratio at the time of curing of 80 to 80%.
This is achieved by a curable composition characterized by containing 99% by weight and 0.1 to 20% by weight .

A: alkoxysilane having no amino group
Containing alkoxysilane having amino group and amino group
Polio obtained by hydrolysis and condensation of xysilane mixture
Reaction product of luganosiloxane and tetracarboxylic dianhydride
Amic acid having a silanol group or an alkoxysilyl group at the molecular terminal or side chain, which is : B: aluminum chelate compound, titanium chelate compound
Or zirconium chelate compounds
At least one metal chelate compound

That is, by disposing a metal chelate compound in a curable composition comprising a silicone polyimide precursor having good heat resistance and suitable for forming a protective film such as a transparent substrate or a color filter in a liquid crystal element, The present inventors have found that the adhesion to components constituting the upper and lower layers of the color filter protective film is greatly improved, and have reached the present invention.

The configuration of the present invention will be described below in order.

The amic acid having a silanol group or an alkoxysilyl group at a molecular terminal or a side chain, which is the component A of the present invention, is not particularly limited as long as it has such a structure. A hydrolyzate of the alkoxysilane, a hydrolyzed condensate of the alkoxysilane, or a compound obtained by hydrolytic cocondensation of the alkoxysilane and an alkoxysilane having no amino group, with tetracarboxylic dianhydride. Amic acid obtained by the reaction is typical.

Among these, a primary amino group and a secondary amino group in a molecule obtained by hydrolyzing and condensing an alkoxysilane mixture containing an alkoxysilane having no amino group and an alkoxysilane having an amino group are particularly preferred. A reaction product of a polyorganosiloxane (siloxane-type polymer precursor) having at least one group selected from secondary amino groups, a silanol group, and tetracarboxylic dianhydride is preferable.

As the alkoxysilane having no amino group, there can be mentioned a compound represented by the following general formula (1). [R _X Si (OR ′) _4-X ] (1) (where R and R ′ may be the same or different and each is a group selected from hydrogen, an alkyl group, an aryl group, an allyl group, and a fluoroalkyl group) And x
Is an integer of 0 to 3. )

Specifically, tetrahydroxysilane, tetramethoxysilane, tetraethoxysilane, methyltrimethoxysilane, methyltriethoxysilane, vinyltrimethoxysilane, vinyltriethoxysilanephenyltrimethoxysilane, phenyltriethoxysilane,
Phenyltrimethoxysilane, dimethyldimethoxysilane, dimethyldiethoxysilane, diphenyldimethoxysilane, diphenyldiethoxysilane, trifluoromethylmethoxysilane, trifluoroethyltrimethoxysilane, γ-methacryloxypropyltrimethoxysilane, γ-methacryl Oxypropyltriethoxysilane and the like can be mentioned, but not limited thereto. Here, it is particularly useful to use a phenyltrialkoxysilane such as phenyltriethoxysilane or phenyltrimethoxysilane as at least a part of the alkoxysilane compound in order to obtain a curable composition solution having good storage stability. is there.

Examples of the alkoxysilane having an amino group include compounds represented by the following general formula (2). [R ¹ _n Si (OR ² ) _4-n ] (2) (where R ¹ represents an organic group, and at least one of R ¹ is an organic group having a ^primary to tertiary amino group; R ² is a group selected from an alkyl group, an aryl group, an allyl group, and a fluoroalkyl group, and R ² may be the same or different and each represents hydrogen, an alkyl group, an aryl group,
It is a group selected from an allyl group and a fluoroalkyl group.
N is an integer of 1 to 3. )

Among the compounds represented by the general formula (2),
It is preferable that the group having a ^primary to tertiary amino group that is at least one of R ¹ is a group selected from an aminoalkyl group, an N-alkyl-aminoalkyl group, and an aminoaryl group.

Specifically, γ-aminopropyltriethoxysilane, γ-aminopropylmethyldiethoxysilane, N-β (aminoethyl) γ-aminopropylmethyldimethoxysilane, N-β (aminoethyl) γ-amino Propyltrimethoxysilane, γ-aminopropyltrimethoxysilane, γ-aminopropylmethyldimethoxysilane, 2-aminoethylaminomethyltrimethylsilane, 2-aminoethylaminomethyltrimethoxysilane, 3-aminopropyldimethylethoxysilane, 2-
(2-aminoethylthioethyl) triethoxysilane,
p-aminophenyltrimethoxysilane, γ- (N-phenyl) aminopropyltriethoxysilane, γ- (N
-Phenyl) aminopropylmethyldiethoxysilane,
γ- (N-phenyl) aminopropyltrimethoxysilane, γ- (N-phenyl) aminopropylmethyldimethoxysilane and the like can be mentioned, but are not limited thereto.

The proportion of the alkoxysilane having no amino group represented by the general formula (1) and the alkoxysilane having an amino group represented by the general formula (2) are not particularly limited, and are as described above. It is also possible to use only an alkoxysilane having an amino group alone. However, a preferable usage ratio is such that the ratio of the alkoxysilane having an amino group in all the alkoxysilanes is 5 to 95% by weight, more preferably 30 to 80% by weight.

In order to obtain a polyorganosiloxane by hydrolyzing and condensing such an alkoxysilane or a mixture thereof, an acid or amine component is hydrolyzed and condensed, if necessary, in the absence of a solvent or in the presence of an organic solvent. It can be easily performed by adding a necessary amount of water and stirring the mixture at 0 to 130 ° C. The amount of water used for the hydrolysis is preferably at least 1/2 equivalent relative to the alkoxysilane of the raw material component or the alkoxy group of the mixture thereof, but it is not particularly limited, and the amount used is not more than 1/2 equivalent. When a small amount of water is used, a polyorganosiloxane having an alkoxy group remaining can be obtained.

The organic solvent used for the preparation of the component A is not particularly limited, but the solvent main component preferably used for obtaining a coating composition having good coatability is at least one in the molecule. A liquid having a boiling point of 100 to 300 ° C. containing one hydroxyl group and / or a boiling point of 100 containing at least one ether bond in the molecule.
Liquids of ~ 300 ° C. Such organic solvent components include, for example, 3-methyl-3-methoxybutanol, 3-methyl-3-methoxybutyl acetate, propylene glycol-mono-methyl ether, propylene glycol-mono-methyl ether acetate, dipropylene glycol- Mono-methyl ether, tripropylene glycol-mono-methyl ether, propylene glycol-mono-tert-butyl ether, isobutyl alcohol, isoamyl alcohol, ethyl cellosolve,
Examples include, but are not limited to, ethyl cellosolve acetate, butyl cellosolve, butyl cellosolve acetate, methyl carbitol, methyl carbitol acetate, ethyl carbitol, ethyl carbitol acetate, and the like. Particularly, since the preparation of the component A involves formation of an amide acid bond, it is desirable to use a polar solvent such as N-methylpyrrolidone, γ-butyrolactone, N, N-dimethylacetamide in combination.

The conditions for hydrolysis and condensation of the alkoxysilane or a mixture thereof are determined according to the constitution of the reaction system, and are not particularly limited, but the reaction concentration is preferably 5 to 80% by weight, more preferably Is 10-50
%, And the hydrolysis temperature and time are from 0 to 70 ° C.
Condensation preferably proceeds for 1 to 5 hours at 30 to 150 ° C. for 1 to 10 hours. In particular, in order to obtain a polyorganosiloxane having good storage stability and high molecular weight, hydrolysis of alkoxysilane or a mixture thereof is carried out. Thereafter, it is preferable to proceed the condensation at 40 to 150 ° C. while distilling off by-produced alcohol and water under normal pressure or reduced pressure. By thus distilling off alcohol and water, a curable composition having particularly excellent coatability and storage stability can be obtained.

The reaction between the thus obtained polyorganosiloxane and tetracarboxylic dianhydride is usually carried out by adding an equivalent of tetracarboxylic dianhydride to the amino group of the compound having an amino group in the presence of an organic solvent. The reaction can be easily carried out by reacting at a concentration of 5 to 40% by weight at 0 to 130 ° C. It can be said that the amic acid thus obtained is a polyorganosiloxane having an amic acid bond.

As the tetracarboxylic dianhydride used in the synthesis of the amic acid, all known tetracarboxylic dianhydrides can be used, but pyromellitic dianhydride, 3, 3 ', 4, and 4 are preferably used. 4'-benzophenonetetracarboxylic dianhydride, 3,3 ', 4,4'-biphenyltetracarboxylic dianhydride, 3,3', 4,4
'-Diphenyl ether tetracarboxylic dianhydride,
Examples thereof include 1,2,3,4-cyclobutanetetracarboxylic dianhydride, 1,2,3,4-butanetetracarboxylic dianhydride or a mixture thereof.

Examples of the metal chelate compound of the component B of the present invention include an aluminum chelate compound, a titanium chelate compound and a zirconium chelate compound. Specifically, aluminum trialcooxide,
Metal chelate compounds obtained by reacting titanium tetraalkoxide, zirconium tetraalkoxide with a β-diketone compound or β-ketoester are preferably used. Specific examples include aluminum tris (ethylacetoacetate) and dipropoxytitanium bis (ethylacetate). Acetate), dibutoxyzirconium bis (ethylacetoacetate), zirconium tetra (ethylacetoacetate), titanium tetra (ethylacetoacetate), aluminum tris (acetylacetonate), dipropoxytitanium bis (acetylacetonate), dibutoxyzirconium bis (Acetylacetonate), zirconium tetra (acetylacetonate), titanium tetra (acetylacetonate) and the like.

These metal chelate compounds are preferably used as an organic solvent solution having a metal oxide concentration of 0.1 to 30% by weight, and the organic solvent is not particularly limited. Similar solvent components can be used.

The curable composition of the present invention can be obtained by mixing the above components A and B.
The mixing is performed at 50 ° C. with stirring, and the mixing ratio is 80 to 99% by weight of the solid component at the time of curing and 0.1 to 0.2 wt% of the component B.
-20% by weight, preferably A component: 90-97% by weight,
Component B: 1 to 10% by weight. When the concentration of the component A is less than 80% by weight, cracks are easily generated in the obtained film, and when the concentration of the component B is less than 0.1% by weight, the adhesiveness of the obtained film is insufficient and the effect of adding the component B is hardly exhibited. Become.

The curable composition of the present invention is usually used in the form of a solution as a coating composition. The solvent composition is such that γ-butyrolactone or N-methylpyrrolidone is 5 to 50% by weight, Methyl-3-methoxybutanol or its acetate or propylene glycol monomethyl ether is preferably from 30 to 90% by weight from the viewpoint of applicability.

When the curable composition of the present invention is used as a coating composition, it may be cured usually by heating after coating the substrate, and may be used for forming a protective film or a flattening film for a color filter of a liquid crystal display device. Although useful as a curable composition, it can also be used as a protective film for a semiconductor element, an interlayer insulating film, a material for forming a waveguide, a material for a phase shifter, and a protective film for various electronic components.

For example, when used as a protective film for a color filter, the curable composition of the present invention is coated on a colored layer on a transparent substrate such as glass and, if necessary, a light-shielding layer provided in the gap between the colored layers. The composition is applied and cured to form a transparent protective film.

[0029]

Next, the present invention will be described in more detail with reference to examples.

Preparation Example 1 4.08 g (0.03 mol) of methyltrimethoxysilane and 5.94 g (0.03 g) of phenyltrimethoxysilane
3 mol), and 28.8 g (0.15 mol) of γ-aminopropylmethyldiethoxysilane were added to γ-butyrolactone 10
0.0 g, 3-methyl-3-methoxybutanol 169
Then, 8.64 g of distilled water was added while stirring at 30 ° C., and the mixture was heated and stirred at 50 ° C. for 2 hours,
After the condensation, stirring was performed under reduced pressure of 20 mmHg to distill off the produced alcohol and water.

While stirring the solution at 50 ° C.,
24.17 g (0.075 mol) of ', 4,4'-benzophenonetetracarboxylic dianhydride was added to obtain an amic acid-based polyorganosiloxane solution. The concentration of the solution thus obtained was 15.5% by weight, and the viscosity was 22.1 centipoise (25 ° C.).

Preparation Example 2 4.08 g (0.03 mol) of methyltrimethoxysilane and 5.94 g (0.03 g) of phenyltrimethoxysilane
3 mol) and 28.8 g (0.15 mol) of γ-aminopropylmethyldiethoxysilane were added to γ-butyrolactone 15
6.3 g, 3-methyl-3-methoxybutanol 150
Then, 8.64 g of distilled water was added thereto while stirring at 30 ° C., and the mixture was heated and stirred at 80 ° C. for 2 hours to carry out hydrolysis and hydrolysis.
Condensation was performed. After the solution was cooled to 50 ° C., 24.17 g (0.075 mol) of 3,3 ′, 4,4′-benzophenonetetracarboxylic dianhydride was added with stirring, and an amic acid-based polyorganosiloxane solution was added. Obtained. When the concentration of the solution thus obtained was measured, it was 12.2% by weight.
And the viscosity was 15 centipoise (25 ° C.). Preparation Example 3 Methyltrimethoxysilane 40.8 g (0.3 mol),
6. Phenyltrimethoxysilane 59.4 g (0.3 mol), γ-aminopropylmethyldiethoxysilane
7 g (0.04 mol) of γ-butyrolactone 60 g, 3 g
-Methyl-3-methoxybutanol 100 g and N-
After dissolving in a mixed solution of 60 g of methylpyrrolidone, adding 33.8 g of distilled water while stirring at 30 ° C., stirring at 30 ° C. for 2 hours, performing hydrolysis / condensation,
The resulting alcohol and water were distilled off by heating and stirring at 50 ° C. under a reduced pressure of Hg. While stirring this solution,
6.4 g (0.02 mol) of 4,4'-benzophenonetetracarboxylic dianhydride was added to obtain an amic acid-based polyorganosiloxane solution. The concentration of the solution thus obtained was determined to be 21.4% by weight and the viscosity was 18%.
It was centipoise (25 ° C.).

Preparation Example 4 650 g of ethyl acetoacetate and 3-methyl-3-
383 g of tetrabutoxyzirconium was added to a mixture of 1567 g of methoxybutanol, and the mixture was stirred at 30 ° C. for 1 hour and allowed to stand for 24 hours to obtain a zirconium chelate solution of 5% by weight in terms of zirconia.

Preparation Example 5 520 g of ethyl acetoacetate and 3-methyl-3-
After adding 340 g of tetrabutoxytitanium to a mixture of 818 g of methoxybutanol and stirring at 30 ° C. for 1 hour,
The mixture was left for 4 hours to obtain a titanium chelate solution having a concentration of 5% by weight in terms of titanium oxide.

Preparation Example 6 To 520 g of ethyl acetoacetate was added 1 kg of a solution of 1 mol / kg of tri (2-ethoxyethoxy) aluminum in isopropanol, and the mixture was stirred at 30 ° C. for 1 hour. An aluminum chelate solution of 0.4% by weight was obtained.

Example 1 10 g of the amic acid-based polyorganosiloxane solution obtained in Preparation Example 1 and 1 g of the chelate solution obtained in Preparation Example 4 were mixed, and the mixture was filtered through a filter having a pore size of 0.2 μ to prepare a coating coating solution. did. This coating solution was applied on a 1 mm thick non-alkali glass plate by a spin coater, precured in a hot air drier at 80 ° C. for 10 minutes, and then cured at 280 ° C. for 1 hour to form a 1.5 μm coating film. This coating has no defects and has good flatness (± 0.1 μm or less)
It showed a light transmittance of 90% or more in the visible region of 400 to 650 nm, and the pencil scratch hardness was 3H. Adhesion to glass plate using tape peeling test (JIS K
-5400), no peeling was observed. These properties were measured in a gear oven at 220 ° C for 200
It does not decrease even if heat-treated for
The temperature did not decrease even after a heat treatment at 96 ° C., 2 atm and 100% RH for 96 hours.

Further, the epoxy resin for encapsulating a liquid crystal cell was applied to the glass plate coating film and cured to a thickness of 1 mm and a thickness of 8 μm, and the peeling force was measured. As a result, the adhesive strength was 2 kg / cm or more. 120 ° C, 2 atm, 100%
No decrease was observed even after performing the RH and wet heat treatment for 24 hours.

Further, the coating solution was coated at room temperature (25 ° C.).
C) for 30 days, and then the same coating and evaluation were performed.
It was confirmed that a coating film having similar characteristics was obtained.

Comparative Example 1 1 g of the chelate solution obtained in Preparation Example 4 in Example 1
When the same coating and evaluation were performed without using
In a Goban test (JIS K-5400) after a wet heat treatment at 20 ° C., 2 atm, 100% RH and 96 hours, about 30% of the coating film peeled off.

Further, this coating solution was applied at room temperature (25 ° C.).
C.) for 30 days, and the same coating and evaluation were performed. As a result, the coating property was almost unchanged.
In the Gobang test (JIS K-5400) after 96-hour moist heat treatment at 0 ° C., 2 atm, 100% RH, about 50% of the coating film peeled off, and the adhesive property deteriorated with time.

Example 2 Instead of the alkali-free glass plate having a thickness of 1 mm in Example 1, a color filter in which a pigment-dispersed RGB pixel having a black matrix of chromium deposited and polyimide as a binder component was formed on the glass plate. The same coating, pre-curing and curing were performed on this color filter using Initially, the step between the black matrix and the pixel was 1.5 μm, but the step after forming the coating film was 0.3 μm. Other characteristics are shown in Example 1.
But at 120 ° C., 2 atm, 100% R
H, Goban eye test after 96 hours of moist heat treatment (JIS K
-5400), the peeling of the coating film of the deposited chromium on the black matrix was only about 10%, which was sufficient as a practical level.

Comparative Example 2 1 g of the chelate solution obtained in Preparation Example 4 in Example 1
Was prepared in the same manner as above, and the same coating and evaluation as in Example 2 were carried out.
In a Goban test (JISK-5400) after 96-hour wet heat treatment at atmospheric pressure and 100% RH, 50% of the coating film peeled off on the black matrix of the deposited chromium.

Further, this coating liquid was applied at room temperature (25 ° C.).
C.) for 30 days, and the same coating and evaluation were performed. As a result, the coating property was almost unchanged.
In the Gobang test (JIS K-5400) after the wet heat treatment at 0 ° C., 2 atm, 100% RH and 96 hours, 100% of the coating film was peeled off, and the adhesive property deteriorated with time.

Example 3 10 g of the amic acid-based polyorganosiloxane solution obtained in Preparation Example 2 and 1.0 of the chelate solution obtained in Preparation Example 5
g were mixed and filtered through a filter having a pore size of 0.2 μ to prepare a coating liquid. This coating solution was applied on a 1 mm-thick non-alkali glass plate with a spin coater, precured in a hot air drier at 80 ° C. for 10 minutes, and then cured at 280 ° C. for 1 hour to form a 1.0 μm coating film. This coating film has good flatness without defects, and is 400 to 650 nm.
Has a light transmittance of 95% or more in the visible region, and has a pencil scratch hardness of 3H.

The adhesiveness to the glass plate was evaluated by a Gobang test (JIS K-5400) by tape peeling, but no peeling was observed. These characteristics did not deteriorate even after heat treatment in a gear oven at 220 ° C. for 200 hours, and did not deteriorate even after a wet heat treatment at 120 ° C., 2 atm, 100% RH and 96 hours.

Further, this coating solution was applied at room temperature (25 ° C.).
C) for 30 days, and then the same coating and evaluation were performed.
It was confirmed that a coating film having similar characteristics was obtained.

Example 4 10 g of the amic acid-based polyorganosiloxane solution obtained in Preparation Example 3 and 1 g of the chelate solution obtained in Preparation Example 4 were mixed, and the mixture was filtered through a filter having a pore size of 0.2 μ to prepare a coating liquid. did. The coating solution was applied on a 1 mm-thick non-alkali glass plate by a spin coater, precured in a hot air drier at 80 ° C. for 10 minutes, and then cured at 280 ° C. for 1 hour to form a 2.0 μm coating film. This coating has no defects and has good flatness (± 0.1 μm or less)
It showed a light transmittance of 95% or more in the visible region of 400 to 650 nm and a pencil scratch hardness of 3H. Adhesion to glass plate using tape peeling test (JIS K
-5400), no peeling was observed. These properties were measured in a gear oven at 220 ° C for 200
It does not decrease even if heat-treated for
The temperature did not decrease even after the heat treatment at 96 ° C., 2 atm and 100% RH for 96 hours.

Further, an epoxy resin for encapsulating a liquid crystal cell was applied to the glass plate coating film and cured to a thickness of 1 mm and a thickness of 8 μm, and the peeling force was measured. As a result, it showed a practical strength of 2 kg / cm or more. 120 ° C, 2 atm, 100%
No decrease was observed even after performing the RH and wet heat treatment for 24 hours.

Further, this coating liquid was applied at room temperature (25 ° C.).
C) for 30 days, and then the same coating and evaluation were performed.
It was confirmed that a coating film having similar characteristics was obtained.

Example 5 In Example 3, the chelate solution 1 obtained in Preparation Example 4 was used.
The same coating coating liquid was prepared and evaluated using 2 g of the chelating solution obtained in Preparation Example 62 in place of g, and the same excellent properties (flatness, light transmittance, pencil scratch hardness, adhesiveness) were obtained. , Heat resistance, moist heat resistance, storage stability).

[0051]

The curable composition of the present invention has excellent coating properties, adhesive properties and storage stability. In particular, it is excellently applied to a color filter protective film in a liquid crystal element, and the applied film has good adhesion to glass, pixels, chromium, and epoxy resin, and hardly deteriorates with time.

──────────────────────────────────────────────────続 き Continued on front page (58) Field surveyed (Int.Cl. ⁷ , DB name) C08L 83/06

Claims (5)

(57) [Claims] 1. A solid content ratio of the following components A and B at the time of curing.
80 to 99% by weight, 0.1 to 20% by weight respectively
A curable composition characterized by containing: A: Amino
Alkoxysilane having no group and alkyl having an amino group
The alkoxysilane mixture containing coxysilane is hydrolyzed.
Polyorganosiloxane and Tet obtained by decomposition and condensation
Amic acid having a silanol group or an alkoxysilyl group at a molecular terminal or a side chain which is a reaction product of lacarboxylic acid dianhydride B: aluminum chelate compound, titanium chelate compound
Or zirconium chelate compounds
At least one metal chelate compound Wherein the alkoxysilane having no amino group, the curable composition according to claim 1, characterized in that a compound represented by the following general formula (1). [R _X Si (OR ′) _4-X ] (1) (where R and R ′ may be the same or different and each is a group selected from hydrogen, an alkyl group, an aryl group, an allyl group, and a fluoroalkyl group) And x
Is an integer of 0 to 3. ) 3. An alkoxysilane having an amino group,
The curable composition according to claim 1, characterized in that a compound represented by the following general formula (2). [R ¹ _n Si (OR ² ) _4-n ] (2) (where R ¹ represents an organic group, and at least one of R ¹ is an organic group having a ^primary to tertiary amino group; R ² is a group selected from an alkyl group, an aryl group, an allyl group, and a fluoroalkyl group, and R ² may be the same or different and each represents hydrogen, an alkyl group, an aryl group,
It is a group selected from an allyl group and a fluoroalkyl group.
N is an integer of 1 to 3. ) 4. A group having a ^primary to tertiary amino group, which is at least one of R ¹ , is a group selected from an aminoalkyl group, an N-alkyl-aminoalkyl group, and an aminoaryl group. The curable composition according to claim 3, wherein 5. The curable composition according to claim 2, wherein at least a part of the alkoxysilane having no amino group represented by the general formula (1) is phenylalkoxysilane.