JP3330001B2 - Glass substrate cleaning equipment - Google Patents
Glass substrate cleaning equipmentInfo
- Publication number
- JP3330001B2 JP3330001B2 JP30617895A JP30617895A JP3330001B2 JP 3330001 B2 JP3330001 B2 JP 3330001B2 JP 30617895 A JP30617895 A JP 30617895A JP 30617895 A JP30617895 A JP 30617895A JP 3330001 B2 JP3330001 B2 JP 3330001B2
- Authority
- JP
- Japan
- Prior art keywords
- glass substrate
- cleaning
- substrate
- film
- supporting
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000000758 substrate Substances 0.000 title claims description 83
- 239000011521 glass Substances 0.000 title claims description 63
- 238000004140 cleaning Methods 0.000 title claims description 38
- 238000003825 pressing Methods 0.000 claims description 3
- 238000005498 polishing Methods 0.000 description 17
- 230000032258 transport Effects 0.000 description 16
- 238000000034 method Methods 0.000 description 7
- CETPSERCERDGAM-UHFFFAOYSA-N ceric oxide Chemical compound O=[Ce]=O CETPSERCERDGAM-UHFFFAOYSA-N 0.000 description 5
- 229910000422 cerium(IV) oxide Inorganic materials 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 239000005357 flat glass Substances 0.000 description 3
- 229910052736 halogen Inorganic materials 0.000 description 3
- 150000002367 halogens Chemical class 0.000 description 3
- 239000004973 liquid crystal related substance Substances 0.000 description 3
- 230000005856 abnormality Effects 0.000 description 2
- 239000000356 contaminant Substances 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 239000003082 abrasive agent Substances 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 239000003599 detergent Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- PWYVVBKROXXHEB-UHFFFAOYSA-M trimethyl-[3-(1-methyl-2,3,4,5-tetraphenylsilol-1-yl)propyl]azanium;iodide Chemical compound [I-].C[N+](C)(C)CCC[Si]1(C)C(C=2C=CC=CC=2)=C(C=2C=CC=CC=2)C(C=2C=CC=CC=2)=C1C1=CC=CC=C1 PWYVVBKROXXHEB-UHFFFAOYSA-M 0.000 description 1
- 238000004506 ultrasonic cleaning Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Landscapes
- Cleaning In General (AREA)
- Cleaning By Liquid Or Steam (AREA)
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、エレクトロクロミ
ック調光窓ガラス、プラズマディスプレイ用ガラス基
板、液晶ディスプレイ用ガラス基板などの高度な洗浄を
必要とするガラス基板の洗浄装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an apparatus for cleaning glass substrates requiring advanced cleaning such as electrochromic dimming window glass, glass substrates for plasma displays, and glass substrates for liquid crystal displays.
【０００２】[0002]
【従来の技術】従来、ガラス基板の洗浄は、ガラス基板
を直接搬送ローラーなどに載せて搬送しながら洗浄する
方法が一般的であり、その他特開昭６１−２７９８５７
号などにおいて、基板の端面部を両方から垂直方向に挟
持して、垂直方向に移動させてブラシ洗浄槽内で洗浄す
る装置が提案されている。2. Description of the Related Art Conventionally, a method of cleaning a glass substrate is generally carried out by directly transporting the glass substrate on a transport roller or the like while transporting the glass substrate.
For example, in Japanese Patent Application Laid-Open No. H10-157, an apparatus has been proposed in which an end face portion of a substrate is vertically sandwiched from both sides and moved in a vertical direction to perform cleaning in a brush cleaning tank.
【０００３】[0003]
【発明が解決しようとする課題】しかしながら、前者の
方法ではベルトコンベアなどの搬送手段からスポンジロ
ールに汚れが付着し、洗浄不良が発生したり、基板ガラ
スの裏面（下側）にロール跡やベルトコンベア跡が付着
し、後の工程でこの汚れが表面に回り込み洗浄不良を引
き起こしており、通常の蛍光灯では勿論、光の強度の強
いハロゲンランプで観察して成膜面に異常がない状態に
まで洗浄可能であるが、特にエレクトロクロミック用、
液晶用の基板などでは色むらなどが発生して不良品とな
る恐れがあった。However, in the former method, dirt adheres to the sponge roll from a conveying means such as a belt conveyor, and cleaning failure occurs, and roll marks or belts are formed on the back (lower side) of the substrate glass. Contaminant traces adhered, and in the later process, this dirt wrapped around the surface and caused cleaning failure.When observed with a normal fluorescent lamp as well as a halogen lamp with a strong light intensity, there was no abnormality on the film deposition surface. Can be washed up to, but especially for electrochromic,
In the case of a substrate for a liquid crystal or the like, there is a possibility that color unevenness or the like may occur, resulting in a defective product.
【０００４】また、後者の方法では、対向する２辺につ
いては全周にわたり挟持しているので、洗浄できない部
分がどうしても多くなり未洗浄部分の汚れが残ってしま
うだけでなく、後の工程にも悪影響を与えることが避け
られない。しかも洗浄槽内で洗浄するものであるから、
作業性がきわめて悪いものであった。Further, in the latter method, since two opposing sides are sandwiched over the entire circumference, a portion that cannot be cleaned is inevitably increased, so that not only the uncleaned portion remains, but also the following steps are required. The adverse effects are inevitable. Moreover, because it is washed in the washing tank,
Workability was extremely poor.
【０００５】本発明はこのような点に鑑みてなされたも
のであり、エレクトロクロミック用の基板等にも使用で
きるように完全に洗浄可能であり、しかも作業性を向上
させた洗浄装置を提供することを目的とする。The present invention has been made in view of the above points, and provides a cleaning apparatus which can be completely cleaned so that it can be used for an electrochromic substrate and the like, and has improved workability. The purpose is to:
【０００６】[0006]
【課題を解決するための手段】ガラス基板を水平方向に
搬送ローラで搬送してガラス基板を研磨し、次いでブラ
シロールを有する洗浄装置でガラス基板面を洗浄するガ
ラス基板の洗浄装置において、ガラス基板の４辺の端面
部分を支持する水平部材および該水平部材に連結される
垂直部材でなるＬ字形状の、ガラス基板の１辺当たり最
低２個の支承部材と、該支承部材を枠体の内側に突出さ
せるロッドと、該枠体の両側に配設する板状体とでガラ
ス基板保持具を構成し、該ガラス基板保持具によりガラ
ス基板を支持し、搬送ローラと押さえローラ４の間に板
状体を間挿して搬送するようにしたことを特徴とするガ
ラス基板の洗浄装置である。また、本発明の洗浄装置
は、前記洗浄装置において、基板保持具の板状体を押さ
えローラにより押さえた状態で、スポンジロールにより
ガラス基板の両面を研磨するようにしたことを特徴とす
る。ガラス基板が搬送ローラに直接接触することがな
く、しかも支承部材の水平部分とガラス基板端面部分の
接触する部分は有効長さが短く、さらに全周にわたって
接触しているのではないので僅かであり、搬送ローラに
よる影響を全く受けず、洗浄されない部分もほとんどな
く、ほぼ完全に洗浄することができる。Means for Solving the Problems A glass substrate is placed in a horizontal direction.
The glass substrate is polished by being transported by transport rollers, and then
Gas cleaning the glass substrate surface with a cleaning device having a silole
In an apparatus for cleaning a glass substrate , an L-shaped glass substrate comprising a horizontal member supporting four end portions of the glass substrate and a vertical member connected to the horizontal member has a maximum per side of the glass substrate.
Two lower supporting members, and the supporting members are protruded inside the frame.
With the rods to be mounted and the plate-shaped members disposed on both sides of the frame.
A glass substrate holder, and the glass substrate holder
Supporting the substrate and holding a plate between the transport roller and the holding roller 4.
A glass substrate cleaning apparatus characterized in that a state is inserted and transported. Further, the cleaning device of the present invention
Presses the plate-like body of the substrate holder in the cleaning device.
With the sponge roll
It is characterized in that both surfaces of a glass substrate are polished . The glass substrate does not directly contact the transport roller, and the contact portion between the horizontal portion of the support member and the end surface portion of the glass substrate has a small effective length, and is not so small that it does not contact the entire circumference. It is almost completely washed without being affected by the transport roller and with almost no unwashed portions.
【０００７】さらにセリア、アルミナなどを使用した研
磨装置によって研磨し、ブラシロールを有する洗浄装置
により洗浄することにより、さらに洗浄をより完全にす
ることができる。Further, the polishing can be further completed by polishing with a polishing device using ceria, alumina, or the like, and cleaning with a cleaning device having a brush roll.
【０００８】[0008]
【発明の実施の形態】本発明の洗浄装置は、ガラス基板
の対向する端面部分を支持する水平部材と該水平部材に
連結される垂直部材からなるＬ字形状の複数の支承部材
を枠体からロッドにより突出させ、枠体の両側に板状体
を配設した基板保持具を水平方向に搬送する搬送ローラ
と該搬送ローラの途中にセリア、アルミナなどによる研
磨装置とブラシロールを有する洗浄装置を少なくとも具
備するものであり、ガラス基板を、支承部材の水平部分
により支持した状態で、基板保持具を搬送ローラ上に載
置して水平方向に搬送しながら、搬送経路中に設置され
た研磨装置で、セリア、アルミナなどの研磨材で研磨
し、その後ブラシロールを有する洗浄装置で洗浄する。DESCRIPTION OF THE PREFERRED EMBODIMENTS A cleaning apparatus according to the present invention comprises a plurality of L-shaped support members, each of which comprises a horizontal member for supporting opposite end portions of a glass substrate and a vertical member connected to the horizontal member, which are mounted on a frame. A cleaning device having a transport roller that projects horizontally by a rod and transports a substrate holder having plate-shaped members disposed on both sides of a frame body in a horizontal direction, and a polishing device and a brush roll using ceria, alumina or the like in the middle of the transport roller. A polishing apparatus installed in a transport path while placing the substrate holder on a transport roller and transporting the substrate horizontally in a state in which the glass substrate is supported by a horizontal portion of a support member. Then, the substrate is polished with an abrasive such as ceria or alumina, and then cleaned with a cleaning device having a brush roll.
【０００９】この場合に、支承部材の水平部材の有効長
さは１．５ｍｍ程度あれば基板が落下しないので、好ま
しいが、５ｍｍを超えると未洗浄部分が大きくなり洗浄
が不完全になる恐れがあるので、１．５ｍｍ〜５ｍｍの
範囲にした方がよい。In this case, if the effective length of the horizontal member of the support member is about 1.5 mm, the substrate does not fall. Therefore, it is preferable. However, if it exceeds 5 mm, the uncleaned portion becomes large and the cleaning may be incomplete. Therefore, it is better to set the range to 1.5 mm to 5 mm.
【００１０】また、支承部材は、実施例に示すように、
基板の周辺４辺を支持すると、確実に基板を保持できる
ので好ましいが、対向する２辺で支持しても勿論よい。
また、支承部材の数は１辺あたり最低２個必要であり、
１辺長さが５００ｍｍ程度までは２個でも十分保持する
ことができるが、さらに大きくなると増やした方がよ
い。[0010] Further, as shown in the embodiment,
Supporting the four sides around the substrate is preferable because the substrate can be securely held. However, it is of course possible to support the two opposite sides.
Also, the number of bearing members is required at least two per side,
Up to about 500 mm in one side length, two pieces can be sufficiently held, but it is better to increase the size when the length is further increased.
【００１１】また、実施例で述べる装置以外にも、洗浄
後工程において、超音波洗浄装置などを付加すると、さ
らに好ましい。In addition to the apparatus described in the embodiment, it is more preferable to add an ultrasonic cleaning apparatus in the post-cleaning step.
【００１２】[0012]
【実施例１】以下、図面を参照しながら、本発明を詳細
に説明する。図１は実施例における洗浄装置を示す要部
斜視図、図２は本発明の洗浄装置におけるガラス基板の
搬送経路を示す要部側面図である。Embodiment 1 Hereinafter, the present invention will be described in detail with reference to the drawings. FIG. 1 is a perspective view of a main part showing a cleaning apparatus according to an embodiment. FIG. 2 is a perspective view of a glass substrate in the cleaning apparatus of the present invention.
It is a principal part side view which shows a conveyance path .
【００１３】本発明のガラス基板洗浄装置における基板
保持具１は図１に示すように、水平部材１1と該水平部
材に連結される垂直部材１2からなるＬ字形状の複数の
支承部材を枠体１3からロッド１4により突出させ、枠体
の両側に板状体１5を連結した構成になっており、ロッ
ド１4は枠体１3に固着した中空部分にネジ溝が形成され
るリング１6に螺着し、ロッドの長さの調整ができるよ
うに形成する。[0013] substrate holder 1 in a glass substrate cleaning apparatus of the present invention as shown in FIG. 1, a plurality of bearing members of the L-shape composed of vertical members 1 2 connected to the horizontal member 1 1 and the horizontal member frame 1 3 is projected by the rod 1 4, which has a configuration obtained by connecting the plate-like body 1 5 on both sides of the frame, the rod 1 4 screw groove is formed in a hollow portion which is fixed to the frame 1 3 screwed to the ring 1 6 that is formed to allow adjustment of the length of the rod.
【００１４】図１に示すように、例えば４０ｍｍ×５０
ｍｍサイズのガラス基板２の膜面となる面を上にして、
その４辺の端面部分を基板保持具１の水平部材１1によ
り支持した状態で、搬送ローラ３と押さえローラ４の間
に枠体両側に設けた板状体を間挿して搬送し、ガラス基
板２に図示しない装置あるいは人手により水にセリア等
の研磨材を加えた研磨液を塗布し、ガラス基板２を支持
している基板保持具１の板状体１5を押さえローラ４に
より押さえた状態で、図２に示すように、上下の研磨装
置５、５’の先端にそれぞれ設けられたスポンジロール
５1、５1’がガラス基板に接触するように上側研磨装置
のスポンジロール５1を図示しない昇降装置により下降
させ、下側研磨装置のスポンジロール５1’を図示しな
い昇降装置により上昇させる。この状態で、スポンジロ
ール５1、５1’を回転させてガラス基板２の両面を研磨
する。研磨終了後スポンジロール５1、５1’は昇降装置
によりそれぞれ上昇、下降させておく。As shown in FIG. 1 , for example, 40 mm × 50
mm-sized glass substrate 2 with the film surface facing up,
While supporting the end face portions of the four sides by the horizontal members 1 1 of the substrate holder 1, and conveyed by interpolating between the plate-like body which is provided on the frame on both sides between the conveying roller 3 and the pressing roller 4, a glass substrate state by the device or manually (not shown) in 2 abrasive such as ceria polishing solution was coated by adding to the water and held down by the roller 4 presses the plate-like body 1 5 of the substrate holder 1 which supports the glass substrate 2 in, as shown in FIG. 2, illustrating the sponge roll 5 1 of the upper polishing apparatus as 'sponge roll 5 1 respectively provided on the tip of, 5 1' top and bottom polishing device 5,5 is in contact with the glass substrate The sponge roll 5 1 ′ of the lower polishing device is raised by a lifting device (not shown). In this state, the sponge rolls 5 1 and 5 1 ′ are rotated to polish both surfaces of the glass substrate 2. After the polishing, the sponge rolls 5 1 and 5 1 ′ are respectively raised and lowered by a lifting device.
【００１５】次いで、ガラス基板をブラシロール６、
６’、７、７’の位置へ搬送ローラ３と押さえローラ４
で搬送し、ガラス基板に付着している異物、研磨剤など
を、シャワーノズル８から濾過水をガラス基板の上面、
下面にかけながら、ブラシロール６，６’、７，７’で
洗い落とす。Next, the glass substrate is placed on a brush roll 6,
The transport roller 3 and the pressing roller 4 are moved to positions 6 ', 7, and 7'.
The contaminants, abrasives, etc. attached to the glass substrate are conveyed through the shower nozzle 8 and filtered water is passed through the upper surface of the glass substrate.
While being applied to the lower surface, it is washed off with brush rolls 6, 6 ', 7, 7' .
【００１６】さらに、中性洗剤をガラス基板の上面と下
面にかけ、図２の研磨装置と同様の装置（図示しない）
で研磨し、研磨後、純水、イオン交換水などをガラス基
板の上面と下面にかけながら、残りの付着物を洗い落と
す。Further, a neutral detergent is applied to the upper and lower surfaces of the glass substrate, and an apparatus (not shown) similar to the polishing apparatus of FIG. 2 is used.
Then, while polishing, pure water, ion-exchanged water and the like are applied to the upper and lower surfaces of the glass substrate, and the remaining deposits are washed away.
【００１７】このようにして洗浄されたガラス基板の片
面（表面）に下部ＩＴＯ膜、Ｉｒ・ＳｎＯx膜、Ｔａ2Ｏ
5膜、ＷＯ3膜、上部ＩＴＯ膜などを通常のスパッタリン
グなどの方法により成膜してエレクトロクロミック調光
窓ガラスを得、下部ＩＴＯ膜を＋側、上部ＩＴＯ膜を−
側として直流１．５Ｖを通電すると約１２０秒で全面が
青色に均一に薄く着色した。さらに通電を行い、５分で
色むらもなく色濃く着した。その後、−１．５Ｖの電圧
を印加すると６０秒で消色した。On one side (surface) of the glass substrate thus cleaned, a lower ITO film, an Ir.SnO x film, a Ta 2 O
5 film, WO 3 film, upper ITO film, etc. are formed by a usual method such as sputtering to obtain an electrochromic dimming window glass, the lower ITO film is on the + side, and the upper ITO film is-.
When a direct current of 1.5 V was applied as the side, the entire surface was uniformly and thinly colored blue in about 120 seconds. Further energization was performed, and in 5 minutes, the color was worn without unevenness in color. Thereafter, when a voltage of -1.5 V was applied, the color was erased in 60 seconds.
【００１８】このような着消色を５万回繰り返し駆動し
たが色むらの発生はなく、ガラス基板が十分に洗浄され
たことがわかる。The above-mentioned color-decoloring operation was repeated 50,000 times, but no color unevenness was found, indicating that the glass substrate was sufficiently cleaned.
【００１９】[0019]
【実施例２】洗浄時に成膜される面を下にした以外は実
施例１と同じ基板を同じ装置で洗浄したものであり、同
様の着消色を行ったところ、２万回繰り替えしても色む
らの発生はなく、５万回でコーナー付近に通常では、わ
からない程度の若干の濃淡差が見られるが、実用上支障
がなく、実施例１とほぼ同等の洗浄度であることがわか
る。Example 2 The same substrate as in Example 1 was cleaned by the same apparatus except that the surface on which a film was formed during cleaning was turned down. When the same coloration was performed, 20,000 repetitions were performed. No unevenness in color was observed, and there was a slight difference in shading in the vicinity of the corner at 50,000 times, which was not obvious. However, there was no practical problem, and it was found that the cleaning degree was almost the same as in Example 1. .
【００２０】[0020]
【比較例１】実施例１と同じガラス基板を、本発明の基
板保持具を使用せず、ベルトコンベヤなどに直接載置し
て、先ず、一回目は成膜される面（表面）を上にして、
上部のみに設けた研磨装置で研磨し、その後、ステンレ
ス丸棒に幅３０ｍｍのゴムリングを２００ｍｍの間隔で
巻着した搬送ローラにより上部ならびに下部に設けたブ
ラシロールの位置まで搬送し、ガラス基板の両面をブラ
シロールにより洗浄し、２回目は成膜される面を下にし
て、同様の洗浄、すなわちガラス基板の成膜されない面
のみ研磨し、その後ガラス基板の両面をブラシロールで
洗浄した。Comparative Example 1 The same glass substrate as in Example 1 was directly placed on a belt conveyor or the like without using the substrate holder of the present invention. And then
Polishing is performed by a polishing device provided only on the upper portion, and thereafter, is transported to a position of a brush roll provided on an upper portion and a lower portion by a transport roller in which a rubber ring having a width of 30 mm is wound around a stainless steel round bar at intervals of 200 mm. Both sides were washed with a brush roll, and the same cleaning was performed with the surface on which the film was formed facing down for the second time, that is, only the surface of the glass substrate where the film was not formed was polished, and then both surfaces of the glass substrate were washed with the brush roll.
【００２１】このようにして洗浄されたガラス基板を蛍
光灯により観察したところ、ほとんど異常を観察でき
ず、ハロゲンランプで観察するとガラス基板の進行方向
に平行に、幅が３０ｍｍ程度の搬送ローラ（ゴムリン
グ）の跡らしき細長い直線状の汚れを膜が形成される面
に確認することができた。When the glass substrate thus cleaned was observed with a fluorescent lamp, almost no abnormality was observed. When the glass substrate was observed with a halogen lamp, a transport roller (rubber rubber) having a width of about 30 mm was parallel to the traveling direction of the glass substrate. A long and thin linear stain, which is likely to be a trace of a ring, was confirmed on the surface on which the film was formed.
【００２２】このガラス基板に実施例と同様にＩＴＯ
膜、Ｉｒ・ＳｎＯX膜、Ｔａ2Ｏ5膜、ＷＯ3膜、上部ＩＴ
Ｏ膜を成膜してエレクトロクロミック調光窓ガラスを作
製して、下部ＩＴＯ膜を＋側、上部ＩＴＯ膜を−側にし
て直流１．５Ｖを通電すると、１２０秒後に表示面積の
２／３が薄青く着色したが、前述の洗浄装置のロール跡
とみられる箇所に色むらが発生した。This glass substrate is coated with ITO as in the embodiment.
Film, IrSnO X film, Ta 2 O 5 film, WO 3 film, upper IT
An O film is formed to produce an electrochromic light control window glass, and when a DC voltage of 1.5 V is applied with the lower ITO film on the + side and the upper ITO film on the-side, 2/3 of the display area after 120 seconds. Was colored pale blue, but color unevenness occurred at a portion that was considered to be the roll mark of the above-described cleaning device.
【００２３】[0023]
【比較例２】成膜される面を上にして比較例１と同様
に、上部のみに設けた研磨装置で研磨し、その後、ステ
ンレス丸棒に幅３０ｍｍのゴムリングを２００ｍｍの間
隔で巻着した搬送ローラにより上部ならびに下部に設け
たブラシロールの位置まで搬送し、ガラス基板の両面を
ブラシロールにより洗浄したものはハロゲンランプでも
異物等の観察が困難であり、成膜前に洗浄が完全に行わ
れたかどうか判定することは困難であるが、このガラス
基板に実施例１と同じ膜を成膜し、エレクトロクロミッ
ク調光窓としたものに、直流１．５Ｖを通電すると１２
０秒で全面均一に薄青く着色、５分で色むらもなく色濃
く着色したが、着消色を５０００回程度繰り返すと全面
に色むらが発生した。Comparative Example 2 Polishing was performed with a polishing device provided only on the upper side in the same manner as in Comparative Example 1 with the surface on which the film is to be formed facing up, and then a rubber ring having a width of 30 mm was wound around a stainless steel round bar at intervals of 200 mm. Transported to the position of the upper and lower brush rolls by the transport roller, and the glass substrate cleaned on both sides with the brush rolls, it is difficult to observe foreign substances etc. even with a halogen lamp. Although it is difficult to determine whether or not the process has been performed, the same film as in Example 1 was formed on this glass substrate, and when a current of 1.5 V DC was applied to the electrochromic dimming window, 12
The entire surface was uniformly colored pale blue in 0 seconds, and was darkly colored in 5 minutes without color unevenness. However, when the coloration and erasure were repeated about 5000 times, color unevenness occurred on the entire surface.
【００２４】[0024]
【発明の効果】本発明によれば、基板保持具により、ガ
ラス基板を搬送ローラなどに直接触れないように、しか
もほとんど基板と保持具の接触部分を小さくした状態で
搬送することができ、搬送ロールなどの汚れの影響を受
けず、洗浄することができ、搬送経路中に設置されたセ
リアなどを使用したスポンジロールによる研磨装置とブ
ラシロールを有する洗浄装置によって、研磨、洗浄する
ことにより、より完全に洗浄することができ、エレクト
ロクロミック用のガラス基板以外にも液晶用、プラズマ
ディスプレイ用のガラス基板などの洗浄に好適である
。According to the present invention, the glass substrate can be transported by the substrate holder so that the glass substrate does not directly contact the transport roller and the like and the contact portion between the substrate and the holder is almost reduced. It can be cleaned without being affected by dirt such as rolls, and can be cleaned and polished by a polishing device using a sponge roll using a ceria and a cleaning device having a brush roll installed in a transport path, so that it can be cleaned more. It can be completely cleaned, and is suitable for cleaning glass substrates for liquid crystals and plasma displays in addition to electrochromic glass substrates.
.
【図１】実施例１，２における洗浄装置を示す要部斜視
図である。FIG. 1 is a perspective view of a main part showing a cleaning apparatus according to first and second embodiments.
【図２】本発明の洗浄装置におけるガラス基板の搬送経
路を示す要部側面図である。FIG. 2 is a view showing a transfer process of a glass substrate in the cleaning apparatus of the present invention
It is a principal part side view which shows a road .
───────────────────────────────────────────────────── フロントページの続き (58)調査した分野(Int.Cl.7，ＤＢ名) B08B 1/00 - 7/04 H01L 21/304 ──────────────────────────────────────────────────続 き Continued on the front page (58) Field surveyed (Int.Cl. 7 , DB name) B08B 1/00-7/04 H01L 21/304
Claims (2)
してガラス基板を研磨し、次いでブラシロールを有する
洗浄装置でガラス基板面を洗浄するガラス基板の洗浄装
置において、ガラス基板の４辺の端面部分を支持する水
平部材および該水平部材に連結される垂直部材でなるＬ
字形状の、ガラス基板の１辺当たり最低２個の支承部材
と、該支承部材を枠体の内側に突出させるロッドと、該
枠体の両側に配設する板状体とでガラス基板保持具を構
成し、該ガラス基板保持具によりガラス基板を支持し、
搬送ローラと押さえローラの間に板状体を間挿して搬送
するようにしたことを特徴とするガラス基板の洗浄装
置。1. A glass substrate is transported horizontally by a transport roller.
Polish the glass substrate and then have a brush roll
Glass substrate cleaning equipment for cleaning the glass substrate surface with a cleaning device
In location, L comprising a vertical member coupled to the horizontal member and the horizontal member for supporting the end face portions of the four sides of the glass substrate
-Shaped, at least two bearing members per side of glass substrate
When a rod projecting the said supporting approval member inside the frame member, the
The glass substrate holder is composed of the plate-shaped members provided on both sides of the frame.
Forming, supporting the glass substrate by the glass substrate holder,
An apparatus for cleaning a glass substrate , wherein a plate-shaped body is inserted between a transfer roller and a holding roller to be transferred.
押さえた状態で、スポンジロールによりガラス基板の両
面を研磨するようにしたことを特徴とする請求項１記載
のガラス基板の洗浄装置。2. The glass substrate cleaning apparatus according to claim 1, wherein both surfaces of the glass substrate are polished by a sponge roll while the plate-like body of the substrate holder is pressed by a pressing roller.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP30617895A JP3330001B2 (en) | 1995-11-24 | 1995-11-24 | Glass substrate cleaning equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP30617895A JP3330001B2 (en) | 1995-11-24 | 1995-11-24 | Glass substrate cleaning equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH09141214A JPH09141214A (en) | 1997-06-03 |
| JP3330001B2 true JP3330001B2 (en) | 2002-09-30 |
Family
ID=17953985
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP30617895A Expired - Fee Related JP3330001B2 (en) | 1995-11-24 | 1995-11-24 | Glass substrate cleaning equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3330001B2 (en) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003103225A (en) * | 2001-09-28 | 2003-04-08 | Ebara Corp | Quadrilateral substrate washing device and washing method for quadrilateral substrate |
| CN102388335A (en) * | 2009-05-12 | 2012-03-21 | 夏普株式会社 | Substrate washing method and substrate washing apparatus |
| CN109304342B (en) * | 2018-09-21 | 2022-10-11 | 中国科学院上海光学精密机械研究所 | Laser neodymium glass component mechanized cleaning device |
| CN114054410B (en) * | 2021-11-08 | 2023-02-24 | 江西省正百科技有限公司 | Can be to sewage recovery's two-sided synchronous even belt cleaning device for organic glass |
-
1995
- 1995-11-24 JP JP30617895A patent/JP3330001B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH09141214A (en) | 1997-06-03 |
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