JP3325675B2 - Trap for gas phase reactor - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a trap device for a gas phase reactor.

[0002]

2. Description of the Related Art For example, in a gas phase reaction apparatus such as a CVD apparatus for forming a CVD film on a semiconductor wafer in a semiconductor device manufacturing process, a reaction gas is contained in an exhaust gas. Therefore, in order to trap such a reaction gas and reduce the amount of the reaction gas introduced into a vacuum pump for evacuation, various trapping apparatuses for a gas phase reaction apparatus have been conventionally used.

As a conventional trap device for a gas phase reactor, for example, as shown in Japanese Patent Publication No. Sho 62-20841, a cooling mechanism is provided in an airtight container, and a baffle plate and the like are arranged in series in the airtight container. In many cases, the length of the gas flow path is increased and the cooling efficiency is improved to improve the collection efficiency.

[0004]

However, the trapping efficiency of the conventional trapping apparatus for a gas phase reactor as described above is not sufficient, and the trapping efficiency is high.
There has been a demand for the development of a trap device for a gas phase reaction device which can extend the life of the device and reduce the frequency of maintenance, thereby improving the productivity.

The present invention has been made in view of such conventional circumstances, and has a higher collection efficiency than the conventional one, and realizes an improvement in productivity by prolonging the life of the apparatus and reducing maintenance frequency. It is an object of the present invention to provide a trapping apparatus for a gas phase reaction apparatus that can perform the above.

Namely, the gas-phase reactor trap apparatus of the present invention as SEQ laminating provided an outer shell container made in airtight, the plate-like body of a large number of annular gap serving as gas flow path In the outer shell container, a laminated structure arranged so as to partition the inside of the outer shell container into an inner portion and an outer portion of the annular plate-like body, and the inside of the outer shell container, A gas introduction unit for introducing gas into the outside of the plate-like body, and a gas lead-out unit for leading gas from the inside of the plate-like body in the outer shell container are provided. The trap device for a gas phase reaction device according to claim 2 is configured by arranging an airtight outer shell container and a number of annular plate-like members so as to be stacked with a gap serving as a gas flow path, A laminated structure disposed inside an outer shell container so as to partition the inside of the outer shell container into an inner portion and an outer portion of the annular plate-like body, and an inner side of the plate-like body inside the outer shell container. A gas introduction section for introducing gas into the section, and a gas deriving section for extracting gas from an outer portion of the plate-like body in the outer shell container. According to a third aspect of the present invention, there is provided the trap device for a gas phase reactor, wherein a cooling mechanism is provided in the outer shell container. In the trap device for a gas phase reactor according to claim 4 , the gap between the plate-like bodies is 0.1 to 1 mm.
mm. The trap device for a gas phase reaction device according to claim 5 , wherein a convex portion is provided on a plate surface of the plate-like body, and the convex portion is brought into contact with a plate surface of the adjacent plate-like body, whereby It is characterized in that it is configured to maintain the interval between the plate-like bodies. According to a sixth aspect of the present invention, the convex portion formed on the plate surface of the plate-like body is formed by press working. A trap device for a gas phase reaction device according to a seventh aspect is characterized in that a plate having a large number of through holes is provided between the laminated structure and the gas introduction part. 9. The gas-phase reactor according to claim 8 , wherein a reaction tube in which the object to be treated is disposed, a heater provided so as to surround the reaction tube, and an introduction for introducing a predetermined reaction gas into the reaction tube. A pipe, an exhaust pipe for exhausting the inside of the reaction tube, an airtight outer shell container, and a large number of annular plate-like bodies are arranged so as to be stacked with a gap serving as a gas flow path. , in the outer shell container, the inner portion and outer the outer shell vessel said annular plate body
A laminated structure disposed so as to partition the plate-like body, a gas introduction unit for introducing gas into an outer portion of the plate-like body in the outer shell container, and a plate-like body in the outer shell container. A gas deriving part for deriving a gas from an inner part, and a trap device inserted into the exhaust pipe. Claim
Item 9 is the gas phase reactor in which the object to be treated is disposed inside.
A reaction tube and a heater provided to surround the reaction tube
And a guide for introducing a predetermined reaction gas into the reaction tube.
An inlet pipe, an exhaust pipe for exhausting the inside of the reaction pipe,
Gas flow through the outer shell container and a number of annular plates
It is arranged and arranged so as to laminate with a gap that becomes a path,
In the outer shell container, the inside of the outer shell container is
Laminated structure arranged to partition into inner and outer parts
Gas to the inside of the plate-like body in the outer shell container.
A gas introduction portion to enter, and the plate-like body in the outer shell container.
A gas deriving portion for deriving gas from an outer portion;
And a trap device inserted into the trachea.
And A gas phase reaction device according to a tenth aspect is characterized in that a cooling mechanism is provided in the outer shell container of the trap device. An eleventh aspect of the present invention is characterized in that the gap between the plate-like bodies of the trap device is 0.1 to 1 mm .

[0007]

The present inventors have conducted a close examination and found that, for example, in the collection of reaction products in the exhaust gas of a CVD apparatus, the reaction gas flows into the trap apparatus. It has been found that the reaction product adheres to the contacted portion due to the diffusion effect and is collected, and that cooling is not always an effective collecting means.

Therefore, in the trap apparatus for a gas phase reaction apparatus according to the present invention, a laminated structure constituted by arranging a large number of plate-like bodies so as to be laminated with a gap therebetween is arranged in an outer shell container.
By circulating the exhaust gas through the gap between the laminated structures, the effect of collision and diffusion of the exhaust gas is effectively used to attach a reaction product to the surface of the plate-like body and collect the reaction gas. Thereby, the collection efficiency can be improved as compared with the related art.

It is preferable that the plate-like members are formed in a ring shape, for example, and are arranged so that the gap between the plate-like members is 0.1 to 1 mm, for example.
Alternatively, a configuration is adopted in which gas flows from the inside to the outside. The interval between the plate-like bodies is configured such that a convex part is provided on the plate surface of the plate-like body by, for example, press working, and the convex part is held in contact with the plate surface of the adjacent plate-like body.

Further, a cooling mechanism may be provided in the outer shell container,
A plate having many through holes may be provided between the laminated structure and the gas introduction part.

[0011]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the trap apparatus for a gas phase reaction apparatus according to the present invention will be described below with reference to the drawings.

As shown in FIG. 1, a trap device 1 for a gas phase reaction apparatus according to the present embodiment is provided with a hollow cylindrical outer shell 2 which can be hermetically closed. A cover plate 4 that is detachable via an O-ring 3 for hermetic sealing is fixed to the bottom of the outer shell container 2 with screws 5.

In the outer shell container 2, a thin disk-shaped small-diameter disk (for example, having an outer diameter of 57 mm and an inner diameter of 52 mm in this embodiment) having a thickness of, for example, 0.1 to 1.0 mm is formed.
In addition, a large-diameter disk (outer diameter 110 mm, inner diameter 94 mm in this embodiment) 7 having a diameter larger than the small-diameter disk 6 is laminated via a spacer 8 and a spacer 9, respectively, thereby forming a double cylindrical laminated structure. A body 10 is disposed, and an inlet opening 11 is provided in a side wall of the outer shell container 2 so as to introduce gas to an outer portion of the laminated structure 10.
However, an outlet opening 12 is provided in the ceiling of the outer shell container 2 so as to take out gas from the inside of the laminated structure 10.

As shown in FIG. 2, the laminated structure 10 has a plurality of, for example, three rods 13 in which small-diameter disks 6 and spacers 8 having a predetermined thickness are alternately passed. Between the spacers 8
And a cylindrical body in which a large-diameter disk 7 and a spacer 9 are similarly laminated by using a rod 13 as a support, and are concentrically arranged. Things.

The space between the upper and lower ends of the laminated structure 10 and the inner wall of the outer shell 2 is airtightly closed.
As indicated by arrows in FIG. 1, gas introduced from the inlet opening 11 to the outside of the laminated structure 10 of the outer shell 2 passes through the gap between the large-diameter disks 7 and further passes through the gap between the small-diameter disks 6. Through the outlet opening 1 from the inside of the laminated structure 10
2 is derived.

The trap apparatus 1 for a gas phase reaction apparatus of this embodiment having the above-mentioned structure is provided in an exhaust system of a vertical CVD apparatus as shown in FIG. 3, for example.

In the vertical CVD apparatus, a reaction tube (process tube) 41 formed of, for example, quartz or the like in a cylindrical shape is provided.
It is arranged almost vertically, and is provided with a tubular heater 42 and a heat insulating material so as to surround the reaction tube 41.
A reaction gas introduction pipe 43 and an exhaust pipe 44 for introducing and exhausting a predetermined reaction gas are connected to the upper and lower portions of the reaction pipe 41, respectively. The device trap device 1 and the vacuum pump 45 are inserted.

Further, below the reaction tube 41, a boat elevator 46 which can be moved up and down is provided as a transport mechanism. A heat insulating cylinder 47 is provided on the boat elevator 46, and the heat insulating cylinder 47 supports a wafer boat 49 on which a large number of semiconductor wafers 48 are placed so as to be stacked at intervals. It is configured to be possible. Then, this boat elevator 46 causes the wafer boat 4
The semiconductor wafer 48 placed on the substrate 9 is loaded and unloaded into the reaction tube 41 from the lower opening of the reaction tube 41.

In the vertical heat treatment apparatus having the above structure, the heater 4
The inside of the reaction tube 41 is previously heated to a predetermined temperature, for example, about several hundred degrees by the step 2, and the boat elevator 46 is raised so that the semiconductor wafer 48 placed on the wafer boat 49 is not attached to the inner wall of the reaction tube 41. It is loaded into the reaction tube 41 by contact. Then, a predetermined reaction gas is introduced into the reaction tube 41 from the reaction gas introduction tube 43, and the reaction gas is exhausted from the exhaust tube 44 by the vacuum pump 45, so that the reaction gas flows through the reaction tube 41, A CVD film is formed.

At this time, the exhaust gas containing the unreacted reaction gas that has not reacted in the reaction tube 41 flows into the exhaust tube 44. Then, as shown in FIG. 1, the exhaust gas flows into the outer shell container 2 from the inlet opening 11 of the trap device 1 for the gas-phase reaction device, passes through the gap between the large-diameter disks 7, and further decreases in diameter. Through the gap between the disks 6, it is led from the inside of the laminated structure 10 to the outlet opening 12. In this process, when passing through the gap between the large-diameter disks 7, a reaction occurs due to the effects of the collision and diffusion described above, and the reactant adheres to the surface of the large-diameter disk 7 and further passes through the gap between the small-diameter disks 6. The reaction occurs on the small disc 6
The unreacted reactant gas in the exhaust gas adheres to the surface and is removed.

Immediately after the laminated structure 10 is mounted in the outer shell container 2 and the reactants are not attached to the large-diameter disk 7 and the small-diameter disk 6, the outside of the inlet opening 11 is removed. Exhaust gas that has flowed into the shell container 2 is mostly led out to the outlet opening 12 through a gap between the portion facing the inlet opening 11 of the laminated structure 10 as shown in FIG.

However, after a certain period of time, the reaction product gradually adheres to the exhaust gas flowing portion of the laminated structure 10, and as shown in FIG. When the gap (and the gap between the small-diameter disks 6) is closed, the exhaust gas flowing into the outer container 2 flows through the gap around the closed portion, as indicated by the arrow in the figure. become. As a result, due to the adhesion of the reactant, the exhaust gas flow portion of the laminated structure 10 gradually changes, and finally, the reactant adheres to the entire structure.
Therefore, the laminated structure 10 can be used effectively, and can be used for a period corresponding to the size (surface area) of the laminated structure 10 while keeping the trapping ability constant.

For this reason, if the size of the laminated structure 10 is set in accordance with, for example, a maintenance cycle of another portion of the vertical heat treatment apparatus, the trapping ability can be reliably maintained for a certain period.

In addition, using the vertical heat treatment apparatus having the above structure, the reaction gas SiH ₂ Cl ₂ (flow rate 100 SCCM),
The reaction gas NH ₃ (flow rate: 1000 SCCM) is flowed to actually form the SiN film, and the trap device 1 for the gas phase reaction device
When the trapping efficiency was measured, a result of 70% was obtained, and it was confirmed that a higher trapping efficiency could be obtained as compared with the conventional trap device of 50%. Further, as described above, it was also confirmed that the reaction product gradually adhered to the entire laminated structure 10 according to the use time.

On the other hand, if the gap between the large-diameter disk 7 and the small-diameter disk 6 is too small, the conductance increases, which is not preferable in terms of exhaust efficiency. On the other hand, if the gap is too wide, the collection efficiency decreases. . For this reason, when the experiment was repeated while changing the width of the gap, such a gap was preferably set to about 0.1 to 1 mm, more preferably 0.3 to 0.6 mm, so that significant conductance was obtained. A practical level of trapping effect could be obtained without incurring an increase in the water content.

Next, another embodiment will be described.

A trap device 1 for a gas phase reactor shown in FIG.
In FIG. 7A, a hollow cylindrical cooling water circulating mechanism 50 is provided inside the large-diameter disk 7 instead of the small-diameter disk 6 as a cooling mechanism capable of circulating cooling water or the like. In the case of this embodiment, the space between the upper end of the cooling water circulation mechanism 50 and the inner wall of the outer shell container 2 is airtightly closed, and the gas introduced into the outer shell container 2 from the inlet opening 11 is supplied to the large-diameter disk. 7 and once through the cooling water circulation mechanism 50
Descends along the outside of the cooling water circulation mechanism 50 and enters the inside of the cooling water circulation mechanism 50 through a space between the lower end portion of the cooling water circulation mechanism 50 and the cover plate 4, rises there, and is led out of the outlet opening 12. It is configured as follows.

Such a trap device 1 for a gas phase reaction apparatus
In a, depending on the type of the reaction product, the collection effect can be improved by cooling.

A trap device 1 for a gas phase reactor shown in FIG.
b shows an example in which the laminated structure 10 is constituted only by the large-diameter disks 7 without disposing the small-diameter disks 6. In the embodiment shown in FIG. 1, most of the reaction products adhere to the outer large-diameter disk 7, and thus, even if the laminated structure 10 is formed as a single layer, the collection efficiency is significantly reduced. In addition, the structure can be simplified, and the manufacturing cost can be reduced.

In order to increase the contact area of the laminated structure 10, as shown in FIG. 7, a disk 70 having a notch or the like formed in a peripheral portion is used, or as shown in FIG. May be used to form a laminated structure 80 or the like having a shape with irregularities in the outer peripheral shape.

FIGS. 9 and 10 show the structure of a main part of still another embodiment. This embodiment uses a disk 9 instead of the spacers 8 and 9 in each of the above-described embodiments.
A plurality of (four in the present embodiment) convex portions 91 are provided on the plate surface of the disk 90, and the convex portions 91 are used to keep the disks 90 at a predetermined interval. Is supported by four shafts 92. 9 and FIG.
Is a base, 94 is a support member for supporting the uppermost portion of the disk 90, and 95 is a nut for fixing the support member 94.

The projection 91 is formed by pressing the disk 9
If molding is performed at the same time as punching 0, it can be formed without increasing the number of steps.

In the embodiment constructed as described above, for example, it is not necessary to remove and insert the spacers 8 and 9 when the disk 90 is removed and washed or when the disk 90 is assembled again. Operation can be easily performed.

In the examples shown in FIGS. 9 and 10, the inner edge of the disk 90 is supported by four shafts 92. However, as shown in FIG.
The outer peripheral portion of the zero may be supported by a plurality of, for example, four shafts 92. In addition, as shown in FIG. 12, an opening may be provided in a portion of the convex portion 91, and as shown in FIG. 13, a portion of the outer peripheral portion of the disk 90 is bent to form a convex portion 91a. Or as shown in FIG.
The convex portion 91b may be provided by bending a part of the inner edge of the disk 90.

FIG. 15 shows still another embodiment. In the trap apparatus 1c for a gas phase reaction apparatus of this embodiment, a large number of through holes 100 are provided between the inlet opening 11 and the laminated structure 10. (A punching metal) 101 having In the embodiment configured as described above, first, the reaction product adheres to the plate body 101, so that the reaction product can be prevented from adhering to the laminated structure 10, and is used for a longer period of time. It is possible to reduce maintenance frequency and improve productivity.

In each of the above-described embodiments, an embodiment in which the present invention is applied to a vertical CVD apparatus has been described. However, the present invention is not limited to such an embodiment, and other CVs may be used.
It is needless to say that the present invention can be applied to the D apparatus or another gas phase reaction apparatus. In addition, for example, it is needless to say that the shape, structure, and the like of each part of the outer shell container 2 or the laminated structure 10 can be variously modified.

[0037]

As described above, according to the trapping apparatus for a gas phase reaction apparatus of the present invention, the trapping efficiency is higher than in the past, the life of the apparatus is lengthened, and the frequency of maintenance is reduced. It is possible to realize improvement of the performance.

[Brief description of the drawings]

FIG. 1 is a diagram showing a configuration of a trap device for a gas phase reaction device according to one embodiment of the present invention.

FIG. 2 is a diagram showing a configuration of a main part of a trap device for a gas phase reaction device in FIG. 1;

FIG. 3 is a diagram showing a configuration of a vertical heat treatment apparatus provided with a trap device for a gas phase reaction apparatus.

FIG. 4 is a diagram for explaining the operation of the trap device for a gas phase reaction device in FIG. 1;

FIG. 5 is a diagram showing a configuration of a trap device for a gas phase reaction device according to another embodiment.

FIG. 6 is a diagram showing a configuration of a trap device for a gas phase reaction device according to another embodiment.

FIG. 7 is a diagram showing a configuration of a disk according to another embodiment.

FIG. 8 is a diagram showing a configuration of a laminated structure according to another embodiment.

FIG. 9 is a diagram showing a configuration of a laminated structure according to another embodiment.

FIG. 10 is a diagram showing a configuration of a laminated structure according to another embodiment.

FIG. 11 is a diagram showing a configuration of a laminated structure according to another embodiment.

FIG. 12 is a diagram showing a configuration of a disk according to another embodiment.

FIG. 13 is a diagram showing a configuration of a disk according to another embodiment.

FIG. 14 is a diagram showing a configuration of a disk according to another embodiment.

FIG. 15 is a view showing a configuration of a trap device for a gas phase reaction device according to another embodiment.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 Trap apparatus for gas-phase reaction apparatus 2 Outer shell 3 O-ring 4 Cover plate 5 Screw 6 Small-diameter disk 7 Large-diameter disk 8,9 Spacer 10 Stacked structure 11 Inlet opening 12 Outlet opening 13 Rod

──────────────────────────────────────────────────続 き Continued on the front page (72) Inventor Osamu Yokokawa 1-2-1, Shiroyamacho Machiya, Tsukui-gun, Kanagawa Prefecture Inside the Sagami Plant of Tokyo Electron Tohoku Co., Ltd. (72) Inventor Yoshitaka Okada Shiroyama-machi Machiya, Tsukui-gun, Kanagawa Prefecture 1-2-1 41, Tokyo Electron Tohoku Co., Ltd. Sagami Plant (72) Inventor Ichiro Nagasaki 1-chome, Iwai-cho, Hodogaya-ku, Yokohama, Kanagawa Prefecture Inside 7 Kuno Co., Ltd. (72) Inventor Akira Hashimoto, Hodogaya, Yokohama, Kanagawa 7 Kuno Co., Ltd., 1 Iwai-cho, Ward (56) References JP-A-5-202474 (JP, A) JP-A-2-59002 (JP, A) JP-A-62-79802 (JP, A) JP-A-62-79803 (JP, A) JP-A-1-123198 (JP, A) (58) Fields investigated (Int. Cl. ⁷ , DB name) H01L 21/205 B01D 8/00

Claims (11)

(57) [Claims] An airtight outer shell container and a number of annular plate-like bodies are arranged so as to be stacked with a gap serving as a gas flow path, and the outer shell container is provided inside the outer shell container. A laminated structure arranged so as to partition the inside of the shell container into an inner portion and an outer portion of the annular plate-like member; and gas introduction for introducing gas into the outer portion of the plate-like member in the outer shell container. A trap device for a gas phase reaction device, comprising: a gas discharge section for drawing gas from an inner portion of the plate-like body in the outer shell container. 2. An airtight outer shell container, and a plurality of annular plate-like bodies are arranged so as to be stacked with a gap serving as a gas flow path, and the outer shell container is provided in the outer shell container. A laminated structure arranged to partition the inside of the shell container into an inner portion and an outer portion of the annular plate-like body; and a gas introduction for introducing gas into the inner portion of the plate-like body in the outer shell container. A trap device for a gas-phase reaction device, comprising: a gas discharge unit for discharging gas from an outer portion of the plate-like body in the outer shell container. 3. A gas phase reactor for trapping device according to claim 1, wherein further comprising a cooling mechanism to said shell container. 4. A gap between the plate-like bodies is 0.1 to 1 mm.
The trap device for a gas phase reactor according to any one of claims 1 to 3, wherein 5. A convex portion is provided on a plate surface of the plate-shaped member, and the convex portion is brought into contact with a plate surface of an adjacent plate-shaped member to maintain an interval between the plate-shaped members. claim 1-4 any one SL <br/> mounting gas phase reactor trap apparatus, characterized in that it is configured to. 6. The projection formed on the plate surface of the plate-like body,
The trap device for a gas phase reactor according to claim 5 , wherein the trap device is formed by press working. And wherein said multilayer structure, between the gas introducing portion, characterized in that a plate member having a number of through holes claims 1-6 set forth in any one vapor phase reaction Equipment trap device. 8. A reaction tube in which an object to be treated is disposed, a heater provided so as to surround the reaction tube, an introduction tube for introducing a predetermined reaction gas into the reaction tube, and the reaction An exhaust pipe for exhausting the inside of the pipe, an airtight outer shell container, and a plurality of annular plate-like bodies arranged in a stacked manner with a gap serving as a gas flow path , wherein the outer shell container Inside, the inside of the outer shell container is the above-mentioned annular plate shape.
A laminated structure disposed so as to partition into an inner part and an outer part of the body, a gas introduction part for introducing gas into the outer part of the plate-like body in the outer shell container, and a gas introduction part in the outer shell container. , The plate shape
A gas deriving part for deriving gas from the inside of the body, and a trap device inserted into the exhaust pipe. 9. A reaction tube in which an object to be treated is disposed, a heater provided so as to surround the reaction tube, an introduction tube for introducing a predetermined reaction gas into the reaction tube, and the reaction tube. An exhaust pipe for exhausting the inside of the pipe, an airtight outer shell container, and a plurality of annular plate-like bodies arranged in a stacked manner with a gap serving as a gas flow path, wherein the outer shell container Inside, a laminated structure arranged so as to partition the inside of the outer shell container into an inner portion and an outer portion of the annular plate-like body, and a gas inside the outer shell container, inside the plate-like body. And a trap device inserted in the exhaust pipe, having a gas introduction portion for introducing a gas, and a gas derivation portion for deriving gas from an outer portion of the plate-like body in the outer shell container. A gas phase reaction apparatus characterized by the above-mentioned. 10. The gas-phase reactor according to claim 8 , wherein a cooling mechanism is provided in the outer shell container of the trap device. 11. gap between the plate-shaped body of the trap apparatus, according to claim, characterized in that a 0.1 to 1 mm. 8 to
10. The gas-phase reactor according to any one of 10 above.