JP3323098B2 - Magnetoresistance effect multilayer film - Google Patents

Magnetoresistance effect multilayer film

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Publication number
JP3323098B2
JP3323098B2 JP09256697A JP9256697A JP3323098B2 JP 3323098 B2 JP3323098 B2 JP 3323098B2 JP 09256697 A JP09256697 A JP 09256697A JP 9256697 A JP9256697 A JP 9256697A JP 3323098 B2 JP3323098 B2 JP 3323098B2
Authority
JP
Japan
Prior art keywords
layer
magnetic layer
soft magnetic
multilayer film
ferromagnetic layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP09256697A
Other languages
Japanese (ja)
Other versions
JPH10284769A (en
Inventor
英治 梅津
直也 長谷川
彰宏 牧野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Alps Alpine Co Ltd
Original Assignee
Alps Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Alps Electric Co Ltd filed Critical Alps Electric Co Ltd
Priority to JP09256697A priority Critical patent/JP3323098B2/en
Publication of JPH10284769A publication Critical patent/JPH10284769A/en
Application granted granted Critical
Publication of JP3323098B2 publication Critical patent/JP3323098B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y25/00Nanomagnetism, e.g. magnetoimpedance, anisotropic magnetoresistance, giant magnetoresistance or tunneling magnetoresistance
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F10/00Thin magnetic films, e.g. of one-domain structure
    • H01F10/32Spin-exchange-coupled multilayers, e.g. nanostructured superlattices
    • H01F10/324Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer
    • H01F10/3268Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer the exchange coupling being asymmetric, e.g. by use of additional pinning, by using antiferromagnetic or ferromagnetic coupling interface, i.e. so-called spin-valve [SV] structure, e.g. NiFe/Cu/NiFe/FeMn

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、磁気ヘッド、位置
センサ、回転センサ等に適用される磁気抵抗効果素子を
構成する磁気抵抗効果多層膜に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a magneto-resistance effect multilayer film constituting a magneto-resistance effect element applied to a magnetic head, a position sensor, a rotation sensor and the like.

【0002】[0002]

【従来の技術】従来、磁気抵抗効果型読み取りヘッド
(MRヘッド)として、異方性磁気抵抗効果現象を用い
たAMR(Anisotropic Magnetoresistance)ヘッド
と、伝導電子のスピン依存散乱現象を用いたGMR(Gi
ant Magnetoresistance:巨大磁気抵抗効果)ヘッドと
が知られており、GMRヘッドの1つの具体例として、
低外部磁界で高磁気抵抗効果を示すスピンバルブ(Spin
-Valve)ヘッドが米国特許第5159513号明細書に
示されている。
2. Description of the Related Art Conventionally, an AMR (Anisotropic Magnetoresistance) head using an anisotropic magnetoresistance effect phenomenon and a GMR (Gi) using a spin-dependent scattering phenomenon of conduction electrons have been known as a magnetoresistive read head (MR head).
ant Magnetoresistance: a giant magnetoresistive effect) head is known, and as a specific example of a GMR head,
Spin valve (Spin) that shows high magnetoresistance effect in low external magnetic field
-Valve) head is shown in U.S. Pat. No. 5,159,513.

【0003】図4は従来知られているスピンバルブ構造
の一例を示すもので、この例の構造は、フリー強磁性層
1と非磁性中間層2とピン止め強磁性層3と反強磁性層
4を基板上に積層し、この積層体の両側に積層体を挟む
ようにCo-Pt等からなる磁石層5、5を設け、その
上に電極層6、6を設けて構成されている。また、図4
に示す従来構造においてピン止め強磁性層3の磁化方向
を図4のZ方向に固定させるためには、比較的大きなバ
イアス磁界が必要であり、このバイアス磁界は大きけれ
ば大きいほど良いことになる。図4のZ方向の反磁界に
打ち勝ち、磁気媒体からの磁束により磁化方向が揺れな
いためには、少なくとも100 Oeのバイアス磁界が
必要である。このバイアス磁界を得るために図4に示す
従来構造にあっては、ピン止め強磁性層3に反強磁性層
4を接触させて設けることにより生じる交換異方性磁界
を利用している。
FIG. 4 shows an example of a conventionally known spin valve structure, which has a free ferromagnetic layer 1, a nonmagnetic intermediate layer 2, a pinned ferromagnetic layer 3, and an antiferromagnetic layer. 4 are laminated on a substrate, magnet layers 5 and 5 made of Co-Pt or the like are provided on both sides of the laminate so as to sandwich the laminate, and electrode layers 6 and 6 are provided thereon. FIG.
In order to fix the magnetization direction of the pinned ferromagnetic layer 3 to the Z direction in FIG. 4 in the conventional structure shown in FIG. 1, a relatively large bias magnetic field is required, and the larger the bias magnetic field, the better. In order to overcome the demagnetizing field in the Z direction in FIG. 4 and prevent the magnetization direction from fluctuating due to the magnetic flux from the magnetic medium, a bias magnetic field of at least 100 Oe is required. In order to obtain this bias magnetic field, the conventional structure shown in FIG. 4 utilizes an exchange anisotropic magnetic field generated by providing the antiferromagnetic layer 4 in contact with the pinned ferromagnetic layer 3.

【0004】図4に示す構造であると、フリー強磁性層
1には磁石層5、5によって膜面に対して平行(図4の
X方向:トラック方向)の縦バイアスを印加し単磁区化
した状態でトラック方向に磁化を向けさせるとともに、
ピン止め強磁性層3の磁化方向を図4中のZ方向、即
ち、フリー強磁性層1の磁化方向と直交する方向にバイ
アスを印加して単磁区化した状態で図中Z方向に向けさ
せておく必要がある。前記の縦バイアス印加の目的はフ
リー強磁性層1が多数の磁区を形成することによって生
じるバルクハウゼンノイズを抑制すること、即ち、磁気
媒体からこの磁束に対してノイズの少ないスムーズな抵
抗変化にするためである。また、磁気媒体からの磁束
(図4のZ方向)により、前記ピン止め強磁性層3の磁
化方向は変化してはならず、フリー強磁性層1の方向が
ピン止め強磁性層3の磁化方向に対して90±θ゜の範
囲で変化することにより磁気抵抗効果の線形応答性が得
られる。以上のように、スピンバルブヘッドの際のピン
止め強磁性層のバイアス、フリー強磁性層の縦バイアス
に反強磁性層との接触界面で生じる交換異方性磁界を利
用することにより、線形応答性が良く、バルクハウゼン
ノイズを抑制した磁気抵抗効果型ヘッドが実現される。
In the structure shown in FIG. 4, a vertical bias in the direction parallel to the film surface (X direction: track direction in FIG. 4) is applied to the free ferromagnetic layer 1 by the magnet layers 5 and 5 to form a single magnetic domain. In the track direction in the state of
The magnetization direction of the pinned ferromagnetic layer 3 is directed in the Z direction in FIG. 4, that is, in the direction perpendicular to the magnetization direction of the free ferromagnetic layer 1, in a single magnetic domain state with a bias applied. Need to be kept. The purpose of the application of the longitudinal bias is to suppress Barkhausen noise caused by the formation of a large number of magnetic domains in the free ferromagnetic layer 1, that is, to achieve a smooth resistance change from the magnetic medium to the magnetic flux with little noise. That's why. Further, the magnetization direction of the pinned ferromagnetic layer 3 must not be changed by the magnetic flux (Z direction in FIG. 4) from the magnetic medium, and the direction of the free ferromagnetic layer 1 is changed to the magnetization direction of the pinned ferromagnetic layer 3. A linear response of the magnetoresistive effect can be obtained by changing the direction within the range of 90 ± θ °. As described above, the linear response is achieved by using the exchange anisotropic magnetic field generated at the contact interface with the antiferromagnetic layer for the bias of the pinned ferromagnetic layer and the longitudinal bias of the free ferromagnetic layer in the spin valve head. Thus, a magnetoresistive head with good performance and reduced Barkhausen noise is realized.

【0005】[0005]

【発明が解決しようとする課題】図4に示すスピンバル
ブ構造において、左右の磁石層5、5によって縦バイア
スが印加されたフリー強磁性層1にあっては、磁石層
5、5に近接するトラックエンド部(図4に符号7で示
す領域)の磁化の向きが容易に変化しない不感領域とな
りやすく、磁気媒体の記録密度の向上に伴う更なる狭ト
ラック化が進められた場合に問題を生じるおそれがあっ
た。
In the spin valve structure shown in FIG. 4, the free ferromagnetic layer 1 to which the longitudinal bias is applied by the left and right magnet layers 5, 5 is close to the magnet layers 5, 5. The track end portion (the region denoted by reference numeral 7 in FIG. 4) tends to be a dead region in which the direction of magnetization does not easily change, and a problem arises when the track is further narrowed in accordance with the improvement of the recording density of the magnetic medium. There was a fear.

【0006】そこで本願発明者らは先に、図5に示すよ
うに、フリー強磁性層1と非磁性中間層2とピン止め強
磁性層3と反強磁性層4からなる積層体Sをその両側か
ら挟むようにNi-Feなどからなる強磁性層8を設
け、該強磁性体8の上に反強磁性層9と電極層10を積
層した構造を提案している。この構造によれば、反強磁
性層9の一方向異方性により、強磁性層8を単磁区化す
ることで、積層体に接触している強磁性層8の延出部8
a側からフリー強磁性層1側に磁束を作用させることが
でき、これによる交換相互作用で磁気的にフリー強磁性
層1に縦バイアスを印加することができる。
Therefore, the inventors of the present invention first formed a laminate S comprising a free ferromagnetic layer 1, a nonmagnetic intermediate layer 2, a pinned ferromagnetic layer 3, and an antiferromagnetic layer 4, as shown in FIG. There has been proposed a structure in which a ferromagnetic layer 8 made of Ni—Fe or the like is provided so as to be sandwiched from both sides, and an antiferromagnetic layer 9 and an electrode layer 10 are stacked on the ferromagnetic body 8. According to this structure, the ferromagnetic layer 8 is formed into a single magnetic domain by the unidirectional anisotropy of the antiferromagnetic layer 9, so that the extension 8 of the ferromagnetic layer 8 in contact with the stacked body is formed.
A magnetic flux can be applied to the free ferromagnetic layer 1 from the a side, and a longitudinal bias can be magnetically applied to the free ferromagnetic layer 1 by the exchange interaction.

【0007】しかしながら、図5に示す積層構造を製造
するには、フリー強磁性層1と非磁性中間層2とピン止
め強磁性層3と反強磁性層4を積層した後に、積層体S
とするべき部分のみにマスクを被せてその他の不要部分
をイオンミリングにより除去するフォトリソグラフィ技
術による加工を行い、トラック幅に相当する幅を有する
積層体Sを製造するので、得られた積層体Sの周縁部分
にはイオンミリング時に不要元素の再付着が起こるおそ
れが高く、強磁性層8の延出部8aと積層体Sとが接触
する部分で磁束を作用させる重要な部分に不要元素が混
入して所望の縦バイアスによる効果を得られなくなるお
それがあった。
However, in order to manufacture the stacked structure shown in FIG. 5, after stacking the free ferromagnetic layer 1, the nonmagnetic intermediate layer 2, the pinned ferromagnetic layer 3, and the antiferromagnetic layer 4, the stacked structure S
Is processed by a photolithography technique in which a mask is placed only on the portion to be removed and other unnecessary portions are removed by ion milling, and a laminate S having a width corresponding to the track width is manufactured. There is a high possibility that unnecessary elements are reattached to the peripheral portion of the ferromagnetic layer 8 during ion milling, and the unnecessary elements are mixed in an important portion where a magnetic flux acts at a portion where the extended portion 8a of the ferromagnetic layer 8 and the laminated body S contact. As a result, there is a possibility that the desired effect due to the vertical bias cannot be obtained.

【0008】本発明は前記事情に鑑みてなされたもの
で、フリー強磁性層に縦バイアスを印加するための層を
フリー強磁性層の側部側ではなくフリー強磁性層に積層
する形に設けることにより、フリー強磁性層に縦バイア
スを印加するための層とフリー強磁性層との境界部分へ
の不要元素混入のおそれをなくして縦バイアスによる効
果を充分に得ることができるとともに、線形応答性に優
れ、バルクハウゼンノイズを抑制した磁気抵抗効果型セ
ンサを提供することを目的とする。
The present invention has been made in view of the above circumstances, and a layer for applying a longitudinal bias to a free ferromagnetic layer is provided not on the side of the free ferromagnetic layer but on the free ferromagnetic layer. As a result, the effect of the longitudinal bias can be sufficiently obtained by eliminating the risk of mixing unnecessary elements at the boundary between the layer for applying the longitudinal bias to the free ferromagnetic layer and the free ferromagnetic layer, and the linear response can be obtained. It is an object of the present invention to provide a magnetoresistive sensor having excellent characteristics and suppressing Barkhausen noise.

【0009】[0009]

【課題を解決するための手段】本発明は前記課題を解決
するために、磁化反転がピン止めされたピン止め強磁性
層と磁化反転が自由にされたフリー強磁性層を非磁性層
を介し積層してなる積層体が具備された磁気抵抗効果多
層膜であり、前記フリー磁性層の非磁性層に接している
面と反対側の面に、これを覆って軟磁性層が形成され、
前記軟磁性層のフリー磁性層に接している面と反対側の
面に反強磁性層が形成されるとともに、前記積層体のト
ラック幅に相当する部分よりも両側に延出された状態で
前記軟磁性層と反強磁性層が積層されてなることを特徴
とする。次に本発明においては、磁化反転がピン止めさ
れたピン止め強磁性層と磁化反転が自由にされたフリー
強磁性層が非磁性層を介して積層され、前記フリー磁性
層の非磁性層に接している面と反対側の面にこれを覆っ
て軟磁性層が形成され、前記軟磁性層のフリー磁性層に
接している面と反対側の面に反強磁性層が積層されてな
る積層体が具備されたことを特徴とする。更に本発明に
おいて、前記軟磁性層が、bccFeを主成分とする結
晶相と、Ti、Zr、Hf、V、Nb、Ta、Wのうち
の1種又は2種以上の元素M'との炭化物、窒化物から
なる結晶相からなり、平均結晶粒径が30nm以下の微
細結晶粒が主体とされてなることを特徴とする。
According to the present invention, a pinned ferromagnetic layer in which magnetization reversal is pinned and a free ferromagnetic layer in which magnetization reversal is free are interposed via a nonmagnetic layer. Magnetoresistance effect multi-layered body provided
A layer film, which is in contact with the non-magnetic layer of the free magnetic layer
On the surface opposite to the surface, a soft magnetic layer is formed to cover this,
The opposite side of the soft magnetic layer from the surface in contact with the free magnetic layer
An antiferromagnetic layer is formed on the surface and
With both sides extended beyond the part corresponding to the rack width
The soft magnetic layer and the antiferromagnetic layer are stacked . Next, in the present invention, the magnetization reversal is pinned.
Pinned ferromagnetic layer and free magnetization reversal
A ferromagnetic layer is laminated via a non-magnetic layer,
Cover the surface of the layer opposite to the surface in contact with the non-magnetic layer.
Forming a soft magnetic layer, and forming a soft magnetic layer on the soft magnetic layer.
The antiferromagnetic layer must not be laminated on the surface opposite to the surface in contact.
Characterized by being provided with a laminate . Further, in the present invention, the soft magnetic layer of the crystalline phase mainly composed of bccFe, Ti, Zr, Hf, V, Nb, Ta, and one or more elemental M 'of the W It is characterized by being mainly composed of fine crystal grains having a crystal phase composed of carbide and nitride and having an average crystal grain size of 30 nm or less.

【0010】本発明構造において、前記軟磁性層が、b
ccFeを主成分とする平均結晶粒径30nm以下の結
晶粒を主体とする結晶相と、Oと、Ti、Zr、Hf、
V、Nb、Ta、W、希土類元素のうちの1種又は2種
以上の元素Mとの化合物からなる非晶質相からなること
を特徴とする。前記反強磁性層が、Cr-Al系合金、
Cr-Ga系合金、Cr-In系合金、NiOの1種から
なることが好ましい。また、前記軟磁性層の厚さが10
0〜300Å、フリー強磁性層の厚さが80〜90Å、
前記反強磁性層とフリー強磁性層の合計層厚が200〜
400Åとされてなることが好ましい。更に先に記載の
本発明において、前記積層体の両側に電極層が該積層体
をその両側から挟むように設けられ、前記積層体のフリ
ー磁性層の上面とその両側の電極層の上面を覆うように
前記軟磁性層が形成されたことを特徴とするものでも良
い。 先に記載の発明において、前記積層体の両側に電極
層が該積層体をその両側から挟むように、かつ、該積層
体を構成するピン止め強磁性層と非磁性層とフリー磁性
層と軟磁性層と反強磁性層に接触するように設けられた
ことを特徴とするものでも良い。 更に本発明において、
前記ピン止め強磁性層に接するようにα-Fe 2 3 、P
t-Mn、IrMn、NiOのうちのいずれかからなる
反強磁性層が積層されたことを特徴とする請求項1〜8
のいずれかに記載の磁気抵抗効果多層膜。 本発明におい
て、前記積層体が断面台形状とされ、該積層体のトラッ
ク幅方向両側の斜面に接するように電極層が形成されて
なることを特徴とするものでも良い。
[0010] In the structure of the present invention, the soft magnetic layer may include b
a crystal phase mainly composed of crystal grains having an average crystal grain size of 30 nm or less containing ccFe as a main component, O, Ti, Zr, Hf,
V, wherein Nb, Ta, W, that of amorphous phase formed of a compound with one or more elemental M of the rare earth elements. The antiferromagnetic layer is a Cr-Al alloy,
It is preferable to be composed of one of a Cr-Ga alloy, a Cr-In alloy, and NiO. Further, when the thickness of the soft magnetic layer is 10
0-300 °, the thickness of the free ferromagnetic layer is 80-90 °,
The total thickness of the antiferromagnetic layer and the free ferromagnetic layer is 200 to
Preferably, it is set to 400 °. Further described above
In the present invention, electrode layers are provided on both sides of the laminate.
Are provided so as to be sandwiched from both sides thereof.
-Cover the top surface of the magnetic layer and the top surfaces of the electrode layers on both sides.
What is characterized in that the soft magnetic layer is formed may be used.
No. In the invention described above, electrodes are provided on both sides of the laminate.
The laminate sandwiches the laminate from both sides thereof, and the laminate
Pinned ferromagnetic layer, nonmagnetic layer and free magnetism
Provided in contact with the layer, the soft magnetic layer and the antiferromagnetic layer
It may be one characterized by that. Further, in the present invention,
Α-Fe 2 O 3 , P
Consists of any of t-Mn, IrMn and NiO
9. An antiferromagnetic layer is laminated.
The magnetoresistive effect multilayer film according to any one of the above. In the present invention
Thus, the laminate has a trapezoidal cross section, and the trap of the laminate is
The electrode layer is formed so as to be in contact with the slopes on both sides in the width direction.
It may be a feature characterized by the following.

【0011】[0011]

【発明の実施の形態】以下図面を参照して本発明の一形
態について説明する。図1は本発明に係る磁気抵抗効果
多層膜の一形態を示すものであり、図示略の磁気ヘッド
等を構成する基板の上に形成されたピン止め用強磁性層
31上に、ピン止め強磁性層32と非磁性層33とフリ
ー強磁性層34が順次積層されて例えば断面台形状の積
層体35が形成され、、フリー強磁性層34の両端部側
に、トラック幅TWに相当する間隔を相互の間にあけて
積層体35をその両側から挟む電極層36、36が設け
られている。また、電極層36、36とフリー強磁性層
34とを覆って軟磁性層37が積層され、軟磁性層37
上に軟磁性層37を覆って反強磁性層38が積層されて
いる。なお、この形態の構造においては、ピン止め用強
磁性層31とピン止め強磁性層32と非磁性層33とフ
リー強磁性層34と軟磁性層37と反強磁性層38とに
よってスピンバルブ型の磁気抵抗効果多層膜T1が構成
されている。
DESCRIPTION OF THE PREFERRED EMBODIMENTS One embodiment of the present invention will be described below with reference to the drawings. FIG. 1 shows an embodiment of a magnetoresistive multilayer film according to the present invention, in which a pinned ferromagnetic layer 31 formed on a substrate constituting a magnetic head or the like (not shown) has a pinned layer. The magnetic layer 32, the nonmagnetic layer 33, and the free ferromagnetic layer 34 are sequentially stacked to form a stacked body 35 having, for example, a trapezoidal cross section, and a gap corresponding to the track width TW is provided on both ends of the free ferromagnetic layer 34. Are provided therebetween, and electrode layers 36, 36 sandwiching the laminated body 35 from both sides thereof are provided. Further, a soft magnetic layer 37 is laminated so as to cover the electrode layers 36 and 36 and the free ferromagnetic layer 34, and the soft magnetic layer 37
An antiferromagnetic layer 38 is laminated thereon so as to cover the soft magnetic layer 37. In this structure, the pinned ferromagnetic layer 31, the pinned ferromagnetic layer 32, the nonmagnetic layer 33, the free ferromagnetic layer 34, the soft magnetic layer 37, and the antiferromagnetic layer 38 form a spin valve type. magnetoresistive multilayer film T 1 of the is configured.

【0012】前記ピン止め用強磁性層31は、その上に
形成されるピン止め強磁性層32に磁気的交換結合力を
作用させて強磁性層32の保磁力を増大させ、磁化の向
きをピン止めするためのものであり、このピン止め用強
磁性層31は、反強磁性体、特に酸化物反強磁性体から
構成されることが好ましく、1つの具体例としては、α
-Fe23から形成される。このα-Fe23からなるピ
ン止め用強磁性層31であるならば、α-Fe23自体
のモーリン点が高く、ブロッキング温度が高いので、線
形応答性に優れた上で温度変化に強く、バルクハウゼン
ノイズを確実に抑制できる磁気抵抗効果多層膜を提供で
きる。なお、α-Fe23の他にPt-Mn、Ir-M
n、Fe-Mn、NiO等も使用することができる。前
記強磁性層32、34は、いずれも強磁性体の薄膜から
なるが、具体的にはNi-Fe合金、Co-Fe合金、N
i-Co合金、Co、Ni-Fe-Co合金などからな
る。また、強磁性層32をCo層から、強磁性層34を
Ni-Fe合金層から、あるいはCo層とNi-Fe合金
層の積層構造から構成することもできる。なお、Co層
とNi-Fe合金層との2層構造とする場合は、非磁性
層33側に薄いCo層を配置する構造とすることもでき
る。
The pinned ferromagnetic layer 31 increases the coercive force of the ferromagnetic layer 32 by applying a magnetic exchange coupling force to the pinned ferromagnetic layer 32 formed thereon to change the direction of magnetization. The pinning ferromagnetic layer 31 is preferably made of an antiferromagnetic material, particularly an oxide antiferromagnetic material, and as one specific example, α
Formed from -Fe 2 O 3. If a pinned ferromagnetic layer 31 consisting of the α-Fe 2 O 3, α -Fe 2 O 3 is higher Morin point itself, because of the high blocking temperature, temperature changes in terms of excellent linearity response To provide a magnetoresistive multilayer film that is resistant to noise and can surely suppress Barkhausen noise. Note that, in addition to α-Fe 2 O 3 , Pt-Mn, Ir-M
n, Fe-Mn, NiO, etc. can also be used. Each of the ferromagnetic layers 32 and 34 is formed of a ferromagnetic thin film. Specifically, a Ni—Fe alloy, a Co—Fe alloy,
It is made of i-Co alloy, Co, Ni-Fe-Co alloy or the like. Further, the ferromagnetic layer 32 may be composed of a Co layer, the ferromagnetic layer 34 may be composed of a Ni-Fe alloy layer, or may have a laminated structure of a Co layer and a Ni-Fe alloy layer. In the case of a two-layer structure of a Co layer and a Ni—Fe alloy layer, a structure in which a thin Co layer is disposed on the nonmagnetic layer 33 side may be adopted.

【0013】これは、非磁性層33を強磁性層32、3
4で挟む構造の巨大磁気抵抗効果発生機構にあっては、
CoとCuの界面で伝導電子のスピン依存散乱の効果が
大きいこと、および、強磁性層32、34を同種の材料
から構成する方が、異種の材料から構成するよりも、伝
導電子のスピン依存散乱以外の因子が生じる可能性が低
く、より高い磁気抵抗効果を得られることに起因してい
る。このようなことから、強磁性層32をCoから構成
した場合は、強磁性層34の非磁性層33側を所定の厚
さでCo層に置換した構造が好ましい。また、Co層を
特に区別して設けなくとも、強磁性層34の非磁性層3
3側にCoをより多く含ませた合金状態とし、反対側に
向かうにつれて徐々にCo濃度が薄くなるような濃度勾
配層としても良い。
This is because the non-magnetic layer 33 is formed of the ferromagnetic layers 32, 3
In the giant magnetoresistance effect generating mechanism with a structure sandwiched by 4,
The effect of the spin-dependent scattering of conduction electrons at the interface between Co and Cu is large, and when the ferromagnetic layers 32 and 34 are made of the same type of material, the spin-dependent scattering of conduction electrons is made higher than when they are made of different types of materials. This is because factors other than scattering are less likely to occur and a higher magnetoresistance effect can be obtained. For this reason, when the ferromagnetic layer 32 is made of Co, a structure in which the nonmagnetic layer 33 side of the ferromagnetic layer 34 is replaced with a Co layer with a predetermined thickness is preferable. Further, even if the Co layer is not particularly provided, the nonmagnetic layer 3 of the ferromagnetic layer 34 can be used.
An alloy state in which more Co is contained on the third side may be used, and a concentration gradient layer may be used in which the Co concentration gradually decreases toward the opposite side.

【0014】前記非磁性層33は、Cu、Cr、Au、
Agなどに代表される非磁性体からなり、20〜40Å
の厚さに形成されている。ここで非磁性膜33の厚さが
20Åより薄いと、強磁性層32と強磁性層34との間
で磁気的結合が起こりやすくなる。また、非磁性層33
が40Åより厚いと磁気抵抗効果を生じる要因である非
磁性層33と強磁性層32、34の界面で散乱される伝
導電子の率が低下し、電流の分流効果により磁気抵抗効
果が低減されてしまうので好ましくない。
The non-magnetic layer 33 is made of Cu, Cr, Au,
It is made of a non-magnetic material represented by Ag or the like and has a thickness of 20 to 40 °.
It is formed in the thickness of. Here, if the thickness of the nonmagnetic film 33 is smaller than 20 °, magnetic coupling between the ferromagnetic layers 32 and 34 is likely to occur. The non-magnetic layer 33
Is larger than 40 °, the rate of conduction electrons scattered at the interface between the non-magnetic layer 33 and the ferromagnetic layers 32 and 34, which is a cause of the magnetoresistance effect, is reduced, and the magnetoresistance effect is reduced by the current shunting effect. It is not preferable.

【0015】前記軟磁性層37は、例えば以下に説明す
る軟磁性合金の膜から構成され、好ましくは厚さ100
〜300Å程度に形成される。なお、ここで用いられる
軟磁性層37は、軟磁気特性に優れ、飽和磁束密度が高
いとともに、比抵抗の大きなものを用いることが好まし
い。
The soft magnetic layer 37 is made of, for example, a soft magnetic alloy film described below, and preferably has a thickness of 100 nm.
It is formed to about 300 °. The soft magnetic layer 37 used here preferably has excellent soft magnetic properties, a high saturation magnetic flux density, and a large specific resistance.

【0016】組成例1 組成式としてFeabcで示され、Mは希土類元素
(周期表の3A族に属するSc、Y、あるいはLa、C
e、Pr、Nd、Pm、Sm、Eu、Gd、Td、D
y、Ho、Er、Tm、Yb、Luなどのランタノイ
ド)のうち少なくとも一種の元素またはそれらの混合物
を表し、組成比a、b、cは、好ましくは原子%で、5
0≦a≦70、5≦b≦30、10≦c≦30、a+b
+c=100なる関係を満足することを特徴とする軟磁
性合金を適用することができる。なお、この組成の軟磁
性合金ならば、先に本発明者らが特開平06−3167
48号明細書で開示した如く比抵抗として400〜10
00μΩ・cm程度の高比抵抗を示すので本願発明の目的
達成のために使用することができる。
Composition Example 1 The composition formula is represented by Fe a M b O c , where M is a rare earth element (Sc, Y or La, C belonging to Group 3A of the periodic table).
e, Pr, Nd, Pm, Sm, Eu, Gd, Td, D
lanthanoids such as y, Ho, Er, Tm, Yb, and Lu), or a mixture thereof, and the composition ratios a, b, and c are preferably 5% by atom%.
0 ≦ a ≦ 70, 5 ≦ b ≦ 30, 10 ≦ c ≦ 30, a + b
A soft magnetic alloy characterized by satisfying the relationship of + c = 100 can be applied. Incidentally, if the soft magnetic alloy has this composition, the present inventors first disclosed in Japanese Patent Laid-Open No. 06-3167.
No. 48, the specific resistance is 400 to 10
Since it has a high specific resistance of about 00 μΩ · cm, it can be used to achieve the object of the present invention.

【0017】組成例2 組成式としてFedM’efで示され、M’は、Ti、
Zr、Hf、V、Nb、Ta、Wの群から選ばれた少な
くとも一種の元素またはそれらの混合物を表し、組成比
d、e、fは好ましくは原子%で、45≦d≦70、5
≦e≦30、10≦f≦40、d+e+f=100なる
関係を満足することを特徴とする軟磁性合金を適用する
ことができる。なお、この組成の軟磁性合金ならば、先
に本発明者らが特開平06−316748号明細書で開
示した如く比抵抗として、400〜2.0×105μΩ・
cm程度の高比抵抗を示すので本願発明の目的達成のため
に使用することができる。
[0017] 'indicated by e O f, M' Fe d M as Composition Example 2 composition formula, Ti,
Represents at least one element selected from the group consisting of Zr, Hf, V, Nb, Ta, and W or a mixture thereof, and the composition ratios d, e, and f are preferably atomic%, and 45 ≦ d ≦ 70,
A soft magnetic alloy characterized by satisfying the relationship of ≦ e ≦ 30, 10 ≦ f ≦ 40, and d + e + f = 100 can be applied. In the case of a soft magnetic alloy having this composition, as disclosed by the present inventors in Japanese Patent Application Laid-Open No. 06-316748, the specific resistance is 400 to 2.0 × 10 5 μΩ ·.
Since it shows a high specific resistance of about cm, it can be used for achieving the object of the present invention.

【0018】組成例3 組成式として、T100-a-b-c-d−Xa−Mb−Zc−Qd
示され、TはFeとCoのいずれか又は両方、XはSi
とAlのいずれか又は両方、M’はTi、Zr、Hf、
V、Nb、Ta、Mo、Wの金属元素群から選ばれる少
なくとも1種の元素、ZはCとNのいずれか又は両方、
QはCr、Re、Ru、Rh、Ni、Pd、Pt、Au
の金属元素群から選ばれる少なくとも1種の元素を表わ
す。また、前記の組成において、下記の組成比(原子
%)を満足することが好ましい。0≦a≦25、1≦b
≦7、0.5≦c≦10、0≦d≦10。この例の組成
であるならば、1Tを越える高い飽和磁束密度を示すの
で本願発明の目的達成のために使用することができる。
Composition Example 3 The composition formula is represented by T 100-abcd -X a -M b -Z c -Q d , T is one or both of Fe and Co, and X is Si
And / or Al, M ′ is Ti, Zr, Hf,
At least one element selected from the group consisting of V, Nb, Ta, Mo, and W; Z is one or both of C and N;
Q is Cr, Re, Ru, Rh, Ni, Pd, Pt, Au
Represents at least one element selected from the group consisting of metal elements. In the above composition, it is preferable to satisfy the following composition ratio (atomic%). 0 ≦ a ≦ 25, 1 ≦ b
≦ 7, 0.5 ≦ c ≦ 10, 0 ≦ d ≦ 10. The composition of this example shows a high saturation magnetic flux density exceeding 1 T and can be used to achieve the object of the present invention.

【0019】組成例4 組成式として、T100-e-f-b-c-d−Sie−Alf−Mb
c−Qd、但し、TはFeとCoのいずれか又は両方、
MはTi、Zr、Hf、V、Nb、Ta、Mo、Wの金
属元素群から選ばれる少なくとも1種の元素、ZはCと
Nのいずれか又は両方、QはCr、Re、Ru、Rh、
Ni、Pd、Pt、Auの金属元素群から選ばれる少な
くとも1種の元素を表わす。また、下記の組成比(原子
%)を満足することが好ましい。8≦e≦15、0.5
≦f≦10、1≦b≦7、0.5≦c≦10、0≦d≦
10。この例の組成であるならば、1Tを越える高い飽
和磁束密度を示すので本願発明の目的達成のために使用
することができる。
[0019] Composition Example 4 composition formula, T 100-efbcd -Si e -Al f -M b -
Either or both of Z c -Q d, where, T is Fe and Co,
M is at least one element selected from the group consisting of metal elements Ti, Zr, Hf, V, Nb, Ta, Mo, and W; Z is one or both of C and N; and Q is Cr, Re, Ru, Rh. ,
It represents at least one element selected from the group consisting of Ni, Pd, Pt, and Au. Further, it is preferable to satisfy the following composition ratio (atomic%). 8 ≦ e ≦ 15, 0.5
≦ f ≦ 10, 1 ≦ b ≦ 7, 0.5 ≦ c ≦ 10, 0 ≦ d ≦
10. The composition of this example shows a high saturation magnetic flux density exceeding 1 T and can be used to achieve the object of the present invention.

【0020】次に、前記反強磁性層38は、ピン止め用
強磁性層31とは異なる反強磁性体、例えば、Cr-A
l、PtMn、NiO等からなることが好ましいが、中
でも高比抵抗のCr-Alが最も好ましい。
Next, the antiferromagnetic layer 38 is made of an antiferromagnetic material different from the pinning ferromagnetic layer 31, for example, Cr-A
1, PtMn, NiO and the like are preferable, and among them, high specific resistance Cr-Al is most preferable.

【0021】前記の構造においては、フリー強磁性層3
4上に軟磁性層37を設けているので、フリー強磁性層
34と軟磁性層37を強磁性結合させることができ、こ
れによりフリー強磁性層34の保磁力を下げることがで
きる。更に、軟磁性層37上に反強磁性層38を設ける
ことで、軟磁性層37を単磁区化することができるとと
もに、単磁区化した軟磁性層37によりフリー強磁性層
34にバイアスを印加することができる。また、ピン止
め強磁性層32の全面に密着させたピン止め用強磁性層
31により、ピン止め強磁性層32の磁化の向きをピン
止めして図1の紙面に垂直なb方向に磁化の向きを揃え
ることができる。以上のことから、フリー強磁性層34
の磁化の向きを図1の矢印a方向に向け、ピン止め強磁
性層32の磁化の向きを矢印b方向に向けることで両者
をほぼ90゜で直交させて揃えることができる。
In the above structure, the free ferromagnetic layer 3
Since the soft magnetic layer 37 is provided on the ferromagnetic layer 4, the free ferromagnetic layer 34 and the soft magnetic layer 37 can be ferromagnetically coupled, whereby the coercive force of the free ferromagnetic layer 34 can be reduced. Further, by providing the antiferromagnetic layer 38 on the soft magnetic layer 37, the soft magnetic layer 37 can be made into a single magnetic domain, and a bias is applied to the free ferromagnetic layer 34 by the soft magnetic layer 37 made into the single magnetic domain. can do. Further, the pinning ferromagnetic layer 31 is in close contact with the entire surface of the pinned ferromagnetic layer 32 to pin the direction of magnetization of the pinned ferromagnetic layer 32 so that the magnetization is directed in the direction b perpendicular to the plane of FIG. The orientation can be aligned. From the above, the free ferromagnetic layer 34
By directing the direction of magnetization of the pinned ferromagnetic layer 32 in the direction of arrow b and the direction of magnetization of the pinned ferromagnetic layer 32 in FIG.

【0022】図1に示す構造において定常電流は、磁気
抵抗効果多層膜T1に与えられる。図1に示す構造であ
るならば、ピン止め強磁性層32の磁化の向きがピン止
めされ、フリー強磁性層34の磁化の方向がトラック幅
TWに相当する領域において自由にされる結果、強磁性
層32と34の間に保磁力差が生じ、これに起因して巨
大磁気抵抗効果が得られる。即ち、磁化の回転が自由に
されたフリー強磁性層34の中央部のトラック幅TWに
相当する部分に、磁気記録媒体からの漏れ磁界などのよ
うな外部磁界が作用すると、フリー強磁性層34の磁化
の向きが容易に回転するので、回転に伴って磁気抵抗効
果多層膜T1に抵抗変化が生じ、この抵抗変化を測定す
ることで磁気記録媒体の磁気情報を読み取ることができ
る。また、この抵抗変化の際にフリー強磁性層34は単
磁区化された軟磁性層37に接していて、しかも縦バイ
アスが印加されているので、バルクハウゼンノイズを生
じることなく、良好な線形応答性で抵抗変化が得られ
る。
The steady-state current in the structure shown in FIG. 1 is given to a magnetoresistive multilayer film T 1. With the structure shown in FIG. 1, the direction of magnetization of the pinned ferromagnetic layer 32 is pinned, and the direction of magnetization of the free ferromagnetic layer 34 is made free in a region corresponding to the track width TW. A coercive force difference is generated between the magnetic layers 32 and 34, which results in a giant magnetoresistance effect. That is, when an external magnetic field such as a leakage magnetic field from a magnetic recording medium acts on a portion corresponding to the track width TW at the center of the free ferromagnetic layer 34 in which the rotation of the magnetization is made free, the free ferromagnetic layer 34 since the magnetization direction of rotate freely, the resistance changes in the magnetoresistive multilayer film T 1 is generated with the rotation, it is possible to read the magnetic information in the magnetic recording medium by measuring the change in resistance. In addition, during this resistance change, the free ferromagnetic layer 34 is in contact with the single-domain soft magnetic layer 37 and, since a longitudinal bias is applied thereto, does not generate Barkhausen noise and has a good linear response. A resistance change can be obtained by the property.

【0023】また、図1に示す構造において、ピン止め
用強磁性層31をα-Fe23から構成すると、α-Fe
23は元々酸化物であり、従来のスピンバルブ構造にお
いて用いられているFeMnに比べて耐食性に優れ、し
かもネール温度が高いので、温度変動に強い特徴があ
る。なお、図1に示す素子構造においてピン止め用強磁
性層31をα-Fe23から構成できると記載したが、
ピン止め用強磁性層31の構成材料はピン止め強磁性層
32に磁気的交換結合力を作用させて保磁力を高くする
ようなものであれば良いので、他の反強磁性体、酸化物
反強磁性体あるいは高保磁力磁性体等から構成しても良
いのは勿論である。
In the structure shown in FIG. 1, when the pinning ferromagnetic layer 31 is made of α-Fe 2 O 3 ,
2 O 3 is originally an oxide, and is superior in corrosion resistance to FeMn used in the conventional spin valve structure, and has a high Neel temperature, so that it is resistant to temperature fluctuation. Although it has been described that the pinning ferromagnetic layer 31 can be made of α-Fe 2 O 3 in the element structure shown in FIG.
The constituent material of the pinning ferromagnetic layer 31 may be any material that increases the coercive force by applying a magnetic exchange coupling force to the pinning ferromagnetic layer 32. Of course, it may be made of an antiferromagnetic material or a high coercive force magnetic material.

【0024】次に、図1に示す構造の磁気抵抗効果多層
膜T1を得るには、例えばAl23-TiC(アルチッ
ク)などの非磁性のセラミックス基板を高周波マグネト
ロンスパッタ装置あるいはイオンビームスパッタ装置の
チャンバ内に設置し、チャンバ内をArガスなどの不活
性ガス雰囲気としてから順次必要な層を成膜することに
より作成することができる。成膜に必要なターゲット
は、例えばα-Fe23ターゲット、Ni-Fe合金ター
ゲット、Cuターゲットなどである。
Next, in order to obtain the magneto-resistance effect multilayer film T 1 having the structure shown in FIG. 1, a non-magnetic ceramic substrate such as Al 2 O 3 —TiC (altic) is applied to a high-frequency magnetron sputtering apparatus or an ion beam sputtering apparatus. It can be formed by installing the device in a chamber of the apparatus, forming an atmosphere of an inert gas such as Ar gas in the chamber, and then sequentially forming necessary layers. Targets necessary for film formation include, for example, an α-Fe 2 O 3 target, a Ni—Fe alloy target, and a Cu target.

【0025】図1に示す断面構造の磁気抵抗効果多層膜
を製造するには、Arガス圧3mTorr以下などの減圧雰
囲気中において図1のZ方向に磁界を印加しながら、ス
パッタにより基板上にα-Fe23からなるピン止め用
強磁性層31を形成し、このピン止め用強磁性層31上
に、非磁性層33を挟んで2層の強磁性層32、34を
形成するとともに、フォトリソグラフィプロセスとイオ
ンミリングによりトラック幅に相当する部分を残して他
の部分を除去して積層体35とする。積層体35を形成
したならば積層体35の両側を挟むように電極層36、
36を形成し、更に積層体35の上面と電極層36の上
面を覆うように軟磁性層37と反強磁性層38を積層す
る。ここで反強磁性層38を積層する場合に例えば磁界
を印加しながら成膜する。
In order to manufacture a magnetoresistive multilayer film having a cross-sectional structure shown in FIG. 1, α is applied to a substrate by sputtering while applying a magnetic field in the Z direction of FIG. 1 in a reduced pressure atmosphere such as an Ar gas pressure of 3 mTorr or less. Forming a pinned ferromagnetic layer 31 made of -Fe 2 O 3, and forming two ferromagnetic layers 32 and 34 on the pinned ferromagnetic layer 31 with a nonmagnetic layer 33 interposed therebetween; The photolithography process and ion milling are performed to remove the remaining portion except for a portion corresponding to the track width, thereby forming a stacked body 35. When the laminate 35 is formed, the electrode layers 36 are sandwiched between both sides of the laminate 35,
The soft magnetic layer 37 and the antiferromagnetic layer 38 are stacked so as to cover the upper surface of the multilayer body 35 and the upper surface of the electrode layer 36. Here, when stacking the antiferromagnetic layer 38, the antiferromagnetic layer 38 is formed, for example, while applying a magnetic field.

【0026】次いで図1の紙面垂直方向に磁界を印加し
てピン止め用強磁性層31を着磁して磁化の向きを固定
することでピン止め強磁性層32の磁化の向きをピン止
めする。以上の処理によってピン止め強磁性層32の磁
化の向きとフリー強磁性層34の磁化の向きが90゜直
交した図3に示す構造の磁気抵抗効果型センサを得るこ
とができる。
Next, a magnetic field is applied in a direction perpendicular to the plane of FIG. 1 to magnetize the pinned ferromagnetic layer 31 and fix the magnetization direction, thereby pinning the magnetization direction of the pinned ferromagnetic layer 32. . By the above processing, a magnetoresistive sensor having a structure shown in FIG. 3 in which the magnetization direction of the pinned ferromagnetic layer 32 and the magnetization direction of the free ferromagnetic layer 34 are orthogonal to each other by 90 ° can be obtained.

【0027】ここで積層体35を形成する場合のフォト
リソグラフィプロセスにおいて、必要な膜を積層しこの
積層膜において積層体の形成予定部分を覆うマスクを被
せてから不要部分をイオンミリングにより除去して積層
体35を形成する処理を行うが、ここで積層体35の側
部側にイオンミリング時に不要物質が混入することが考
えられる。しかし、図1に示す構造であれば、フリー強
磁性層34の上に形成する軟磁性層37と反強磁性層3
8がフリー強磁性層34に縦バイアスを印加するので、
フリー強磁性層34の側部側に設けるのは電極層36の
みで良く、積層体35の側部側の不要元素混入は磁気抵
抗効果には何ら悪影響を及ぼさない。従ってイオンミリ
ング工程を行っても縦バイアス印加機構に何ら悪影響は
及ぼさない。
Here, in the photolithography process for forming the laminate 35, necessary films are laminated, and a mask covering the portion where the laminate is to be formed is put on the laminated film, and unnecessary portions are removed by ion milling. A process for forming the laminate 35 is performed. Here, it is conceivable that an unnecessary substance is mixed into the side of the laminate 35 during ion milling. However, with the structure shown in FIG. 1, the soft magnetic layer 37 formed on the free ferromagnetic layer 34 and the antiferromagnetic layer 3
8 applies a longitudinal bias to the free ferromagnetic layer 34,
Only the electrode layer 36 may be provided on the side of the free ferromagnetic layer 34, and the incorporation of unnecessary elements on the side of the stacked body 35 has no adverse effect on the magnetoresistance effect. Therefore, even if the ion milling process is performed, there is no adverse effect on the vertical bias applying mechanism.

【0028】次に図2は、本発明に係る磁気抵抗効果多
層膜の第2の形態を示すもので、この形態の磁気抵抗効
果多層膜T2は、断面台形状の積層体40をピン止め用
強磁性層31とピン止め強磁性層32と非磁性層33と
フリー強磁性層34と軟磁性層37’と反強磁性層3
8’とから構成し、積層体40の両側に被さるように電
極層36、36を設けた構造である。
[0028] Next Fig. 2 shows a second embodiment of the magnetoresistive multilayer film according to the present invention, the magnetoresistive multilayer film T 2 of the this embodiment, pin the stack 40 of trapezoidal section Ferromagnetic layer 31, pinned ferromagnetic layer 32, nonmagnetic layer 33, free ferromagnetic layer 34, soft magnetic layer 37 ', and antiferromagnetic layer 3
8 ′, and the electrode layers 36 are provided so as to cover both sides of the laminate 40.

【0029】次に図3は、本発明に係る磁気抵抗効果多
層膜の第3の形態を示すもので、この形態の磁気抵抗効
果多層膜T2は、軟磁性層37と反強磁性層38とを下
地層として基板上に形成し、その上に断面台形状になる
ようにフリー強磁性層34と非磁性層33とピン止め強
磁性層32とピン止め用強磁性層31とを積層して積層
体41を構成し、軟磁性層37上に前記積層体41の両
側に被さるように電極層36、36を設けた構造であ
る。
FIG. 3 shows a third embodiment of the magnetoresistive multilayer film according to the present invention. The magnetoresistive multilayer film T 2 of this embodiment comprises a soft magnetic layer 37 and an antiferromagnetic layer 38. Are formed on a substrate as an underlayer, and a free ferromagnetic layer 34, a nonmagnetic layer 33, a pinned ferromagnetic layer 32, and a pinning ferromagnetic layer 31 are laminated thereon so as to have a trapezoidal cross section. To form a laminated body 41, and the electrode layers 36, 36 are provided on the soft magnetic layer 37 so as to cover both sides of the laminated body 41.

【0030】これらのいずれの構造においてもフリー強
磁性層34に軟磁性層37と反強磁性層38を積層して
いるので、縦バイアスを印加することができ、軟磁性層
37に反強磁性層38を密着配置しているので軟磁性層
37を単磁区化することができ、本願の目的を先の形態
の場合と同様に達成することができる。
In any of these structures, since the soft magnetic layer 37 and the antiferromagnetic layer 38 are laminated on the free ferromagnetic layer 34, a longitudinal bias can be applied, and the soft magnetic layer 37 Since the layer 38 is arranged in close contact, the soft magnetic layer 37 can be made into a single magnetic domain, and the object of the present invention can be achieved in the same manner as in the above embodiment.

【0031】なお、図2に示す構造であると、図1に示
す構造とは異なり、積層体40をピン止め用強磁性層3
1とピン止め強磁性層32と非磁性層33とフリー強磁
性層34と軟磁性層37’と反強磁性層38’とから構
成しているので、これらを形成するための膜を順次成膜
して積層した後でまとめてイオンミリングすることで積
層体40を形成し、電極層36、36を形成することで
製造できる。即ち、図1に示す構造の如く積層体35と
電極層36を形成後に更に軟磁性層37と反強磁性層3
8を別途積層する必要が図2に示す構造では必要ないの
で、図2に示す構造であれば図1に示す構造よりも工程
数を削減できて容易に製造できるようになる。
The structure shown in FIG. 2 is different from the structure shown in FIG.
1; a pinned ferromagnetic layer 32; a nonmagnetic layer 33; a free ferromagnetic layer 34; a soft magnetic layer 37 '; and an antiferromagnetic layer 38'. It can be manufactured by forming the layered body 40 by performing ion milling collectively after the films are laminated and forming the electrode layers 36 and 36. That is, after forming the laminate 35 and the electrode layer 36 as in the structure shown in FIG. 1, the soft magnetic layer 37 and the antiferromagnetic layer 3 are further formed.
2 is not necessary in the structure shown in FIG. 2, so that the structure shown in FIG. 2 can reduce the number of steps compared to the structure shown in FIG. 1 and can be easily manufactured.

【0032】[0032]

【発明の効果】以上説明したように本発明は、フリー強
磁性層に軟磁性層と反強磁性層を積層させて設け、反強
磁性層から軟磁性層に磁気的交換結合を生じさせて軟磁
性層を単磁区化するとともに、反強磁性層から軟磁性層
を介してフリー強磁性層に縦バイアスを印加することが
できる。そして、軟磁性層と反強磁性層はフリー強磁性
の上面を覆って積層する形で設けるので、各層を構成
する膜を積層してイオンミリング等によりパターニング
する場合であっても、軟磁性層と反強磁性層とフリー強
磁性層の積層界面に不要物質が混入するおそれはなくな
り、目的どおりの縦バイアスを印加することができる。
従って前記構造の磁気抵抗効果多層膜を磁気ヘッドに用
いるならば、磁気記録媒体からの微小な磁界に線形応答
して抵抗変化を起こし、これにより検出感度良くバルク
ハウゼンノイズの無い状態で磁気情報の読出を行い得る
磁気ヘッドを提供することができる。また、先の構成に
よれば、フリー磁性層の上に設けた軟磁性層によりバイ
アスを印加するので積層体の両側に設けるのは電極層の
みで良くなり、イオンミリングにより積層体をパターニ
ングして電極層を形成する場合であっても、積層体側部
側の不要元素混入は積層体の磁気抵抗効果には何ら影響
を及ぼさないので、目的どおりの磁気抵抗効果多層膜を
得ることができる。
As described above, in the present invention, a soft magnetic layer and an antiferromagnetic layer are laminated on a free ferromagnetic layer, and magnetic exchange coupling is generated from the antiferromagnetic layer to the soft magnetic layer. The soft magnetic layer can be made into a single magnetic domain, and a longitudinal bias can be applied from the antiferromagnetic layer to the free ferromagnetic layer via the soft magnetic layer. Since the soft magnetic layer and the antiferromagnetic layer are provided so as to be stacked so as to cover the upper surface of the free ferromagnetic layer , even when the films constituting each layer are stacked and patterned by ion milling, etc. There is no possibility that an unnecessary substance is mixed into the lamination interface between the layer, the antiferromagnetic layer, and the free ferromagnetic layer, and a desired longitudinal bias can be applied.
Therefore, if the magnetoresistive effect multilayer film having the above structure is used for a magnetic head, a change in resistance occurs in a linear response to a small magnetic field from a magnetic recording medium, whereby the magnetic information can be detected with good detection sensitivity and without Barkhausen noise. A magnetic head capable of performing reading can be provided. Also, in the previous configuration
According to the description, the soft magnetic layer provided on the free magnetic layer
Since the ground is applied, it is necessary to provide the electrode layer on both sides of the laminate.
And the laminate is patterned by ion milling.
Even if the electrode layer is formed by
Of unnecessary elements on the side has no effect on the magnetoresistance effect of the laminate
The magnetoresistive multilayer film as intended.
Obtainable.

【図面の簡単な説明】[Brief description of the drawings]

【図1】 本発明に係る磁気抵抗効果多層膜の第1の形
態を示す断面図。
FIG. 1 is a sectional view showing a first embodiment of a magnetoresistive multilayer film according to the present invention.

【図2】 本発明に係る磁気抵抗効果多層膜の第2の形
態を示す断面図。
FIG. 2 is a sectional view showing a second embodiment of the magnetoresistive effect multilayer film according to the present invention.

【図3】 本発明に係る磁気抵抗効果多層膜の第3の形
態を示す断面図。
FIG. 3 is a sectional view showing a third embodiment of the magnetoresistive effect multilayer film according to the present invention.

【図4】 従来の磁気抵抗効果型センサの第1の例を示
す断面図。
FIG. 4 is a cross-sectional view showing a first example of a conventional magnetoresistive sensor.

【図5】 従来の磁気抵抗効果型センサの第2の例を示
す断面図。
FIG. 5 is a sectional view showing a second example of a conventional magnetoresistive sensor.

【符号の説明】[Explanation of symbols]

1、T2、T3 磁気抵抗効果多層膜 31 ピン止め用強磁性層 32 ピン止め強磁性層 33 非磁性層 34 フリー強磁性層 35 積層体 36 電極層 37、37'、47 軟磁性層 38、38'、48 反強磁性層T 1 , T 2 , T 3 Magnetoresistance multilayer film 31 Pinned ferromagnetic layer 32 Pinned ferromagnetic layer 33 Nonmagnetic layer 34 Free ferromagnetic layer 35 Stack 36 Electrode layer 37, 37 ', 47 Soft magnetic layer 38, 38 ', 48 Antiferromagnetic layer

───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 平8−287426(JP,A) 特開 平9−23031(JP,A) 特開 平6−316748(JP,A) 特開 平9−92904(JP,A) 特開 平6−314617(JP,A) 特開 平8−279117(JP,A) 特開 平9−91628(JP,A) 特開 平9−16923(JP,A) (58)調査した分野(Int.Cl.7,DB名) H01L 43/08 G01R 33/09 G11B 5/39 H01F 10/32 JICSTファイル(JOIS)──────────────────────────────────────────────────続 き Continuation of the front page (56) References JP-A-8-287426 (JP, A) JP-A-9-23031 (JP, A) JP-A-6-316748 (JP, A) JP-A 9-230 92904 (JP, A) JP-A-6-314617 (JP, A) JP-A-8-279117 (JP, A) JP-A-9-91628 (JP, A) JP-A-9-16923 (JP, A) (58) Field surveyed (Int. Cl. 7 , DB name) H01L 43/08 G01R 33/09 G11B 5/39 H01F 10/32 JICST file (JOIS)

Claims (10)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 磁化反転がピン止めされたピン止め強磁
性層と磁化反転が自由にされたフリー強磁性層を非磁性
層を介し積層してなる積層体が具備された磁気抵抗効果
多層膜であり、前記フリー磁性層の非磁性層に接してい
る面と反対側の面に、これを覆って軟磁性層が形成さ
れ、前記軟磁性層のフリー磁性層に接している面と反対
側の面に反強磁性層が積層されるとともに、前記積層体
のトラック幅に相当する部分よりも両側に延出された状
態で前記軟磁性層と反強磁性層が積層されてなることを
特徴とする磁気抵抗効果多層膜。
1. A magnetoresistive multilayer film comprising a laminated body in which a pinned ferromagnetic layer whose magnetization reversal is pinned and a free ferromagnetic layer whose magnetization reversal is freed are laminated via a nonmagnetic layer. A soft magnetic layer is formed to cover the surface of the free magnetic layer opposite to the surface in contact with the nonmagnetic layer, and the soft magnetic layer is opposite to the surface of the soft magnetic layer in contact with the free magnetic layer. The soft magnetic layer and the antiferromagnetic layer are stacked in a state where an antiferromagnetic layer is stacked on the surface of the layer and extended to both sides from a portion corresponding to the track width of the stacked body. And a magnetoresistive effect multilayer film.
【請求項2】 磁化反転がピン止めされたピン止め強磁
性層と磁化反転が自由にされたフリー強磁性層が非磁性
層を介して積層され、前記フリー磁性層の非磁性層に接
している面と反対側の面にこれを覆って軟磁性層が形成
され、前記軟磁性層のフリー磁性層に接している面と反
対側の面に反強磁性層が積層されてなる積層体が具備さ
れたことを特徴とする磁気抵抗効果多層膜。
2. A pinned ferromagnetic layer in which magnetization reversal is pinned and a free ferromagnetic layer in which magnetization reversal is freed are laminated via a nonmagnetic layer, and are in contact with the nonmagnetic layer of the free magnetic layer. A soft magnetic layer is formed so as to cover the surface opposite to the surface where the soft magnetic layer is formed, and an antiferromagnetic layer is stacked on the surface of the soft magnetic layer opposite to the surface in contact with the free magnetic layer. A magnetoresistive effect multilayer film, comprising:
【請求項3】 前記軟磁性層が、bccFeを主成分と
する結晶相と、Ti、Zr、Hf、V、Nb、Ta、W
のうちの1種又は2種以上の元素M'との炭化物、窒化
物からなる結晶相とからなり、平均結晶粒径が30nm
以下の微細結晶粒が主体とされてなることを特徴とする
請求項1または2記載の磁気抵抗効果多層膜。
3. The soft magnetic layer according to claim 1, wherein the soft magnetic layer comprises a crystal phase mainly composed of bccFe, Ti, Zr, Hf, V, Nb, Ta, and W.
And a crystal phase composed of carbides and nitrides with one or more of the elements M ′ having an average crystal grain size of 30 nm.
3. The magnetoresistive multilayer film according to claim 1, wherein the following fine crystal grains are mainly used.
【請求項4】 前記軟磁性層が、bccFeを主成分と
する平均結晶粒径30nm以下の結晶粒を主体とする結
晶相と、Oと、Ti、Zr、Hf、V、Nb、Ta、
W、希土類元素のうちの1種又は2種以上の元素Mとの
化合物からなる非晶質相とからなることを特徴とする請
求項1または2記載の磁気抵抗効果多層膜。
4. The soft magnetic layer according to claim 1, wherein said soft magnetic layer comprises bcc Fe as a main component, a crystal phase mainly composed of crystal grains having an average crystal grain size of 30 nm or less, O, Ti, Zr, Hf, V, Nb, Ta,
3. The magnetoresistive multilayer film according to claim 1, comprising W and an amorphous phase composed of a compound with one or more of the rare earth elements M.
【請求項5】 前記反強磁性層が、Cr-Al系合金、
Cr-Ga系合金、Cr-In系合金、NiOの1種から
なることを特徴とする請求項1または2記載の磁気抵抗
効果多層膜。
5. The antiferromagnetic layer is formed of a Cr—Al alloy,
The magnetoresistive multilayer film according to claim 1, comprising one of a Cr—Ga-based alloy, a Cr—In-based alloy, and NiO.
【請求項6】 前記軟磁性層の厚さが100〜300
Å、フリー強磁性層の厚さが80〜90Å、前記反強磁
性層とフリー強磁性層の合計層厚が200〜400Åと
されてなることを特徴とする請求項1または2記載の磁
気抵抗効果多層膜。
6. The soft magnetic layer has a thickness of 100 to 300.
3. The magnetoresistive element according to claim 1, wherein the thickness of the free ferromagnetic layer is 80 to 90 degrees, and the total thickness of the antiferromagnetic layer and the free ferromagnetic layer is 200 to 400 degrees. Effect multilayer film.
【請求項7】 前記積層体の両側に電極層が該積層体を
その両側から挟むように設けられ、前記積層体のフリー
磁性層の上面とその両側の電極層の上面を覆うように前
記軟磁性層が形成されたことを特徴とする請求項1に記
載の磁気抵抗効果多層膜。
7. An electrode layer is provided on both sides of the laminate so as to sandwich the laminate from both sides, and the soft layer is formed so as to cover the upper surface of the free magnetic layer of the laminate and the upper surfaces of the electrode layers on both sides thereof. 2. The magnetoresistive multilayer film according to claim 1, wherein a magnetic layer is formed.
【請求項8】 前記積層体の両側に電極層が該積層体を
その両側から挟むように、かつ、該積層体を構成するピ
ン止め強磁性層と非磁性層とフリー磁性層と軟磁性層と
反強磁性層に接触するように設けられたことを特徴とす
る請求項2に記載の磁気抵抗効果多層膜。
8. A laminated ferromagnetic layer, a non-magnetic layer, a free magnetic layer, and a soft magnetic layer such that an electrode layer sandwiches the laminated body from both sides thereof, and which constitutes the laminated body. The magnetoresistive multilayer film according to claim 2, wherein the magnetoresistance effect multilayer film is provided so as to be in contact with the antiferromagnetic layer.
【請求項9】 前記ピン止め強磁性層に接するようにα
-Fe23、Pt-Mn、IrMn、NiOのうちのいず
れかからなる反強磁性層が積層されたことを特徴とする
請求項1〜8のいずれかに記載の磁気抵抗効果多層膜。
9. The semiconductor device according to claim 6, wherein α is in contact with said pinned ferromagnetic layer.
-Fe 2 O 3, Pt-Mn , IrMn, magnetoresistive multilayer film according to any one of claims 1 to 8 antiferromagnetic layer made of any one of NiO is characterized in that it is laminated.
【請求項10】 前記積層体が断面台形状とされ、該積
層体のトラック幅方向両側の斜面に接するように電極層
が形成されてなることを特徴とする請求項1〜9のいず
れかに記載の磁気抵抗効果多層膜。
10. The laminate according to claim 1, wherein the laminate has a trapezoidal cross section, and an electrode layer is formed so as to be in contact with slopes on both sides in the track width direction of the laminate. The magnetoresistive effect multilayer film as described in the above .
JP09256697A 1997-04-10 1997-04-10 Magnetoresistance effect multilayer film Expired - Fee Related JP3323098B2 (en)

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US6542342B1 (en) 1998-11-30 2003-04-01 Nec Corporation Magnetoresistive effect transducer having longitudinal bias layer directly connected to free layer
DE69940443D1 (en) * 1999-07-05 2009-04-02 Fujitsu Ltd SPIN VALVE MAGNETIC RESONANCE EFFECT HEAD, COMPOSED MAGNETIC HEAD COMPRISING THE SAME, AND RESISTANT MEDIUM DRIVE
JP3657487B2 (en) 2000-02-02 2005-06-08 アルプス電気株式会社 Spin valve thin film magnetic element, manufacturing method thereof, and thin film magnetic head including the spin valve thin film magnetic element
US6704176B2 (en) * 2001-11-13 2004-03-09 Seagate Technology Llc Spin valve sensor
JP3837102B2 (en) 2002-08-20 2006-10-25 Tdk株式会社 Electromagnetic transducer, thin film magnetic head, magnetic head assembly and magnetic reproducing apparatus, and method of manufacturing electromagnetic transducer
US6847072B2 (en) * 2003-04-17 2005-01-25 Infineon Technologies Aktiengessellschaft Low switching field magnetic element
WO2005101374A1 (en) 2004-04-02 2005-10-27 Tdk Corporation Stabilized spin valve head and method of manufacture
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