JP3307256B2 - Mounting method of work with bump - Google Patents

Mounting method of work with bump

Info

Publication number
JP3307256B2
JP3307256B2 JP1086697A JP1086697A JP3307256B2 JP 3307256 B2 JP3307256 B2 JP 3307256B2 JP 1086697 A JP1086697 A JP 1086697A JP 1086697 A JP1086697 A JP 1086697A JP 3307256 B2 JP3307256 B2 JP 3307256B2
Authority
JP
Japan
Prior art keywords
conductive paste
work
bumps
substrate
pad
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP1086697A
Other languages
Japanese (ja)
Other versions
JPH10209217A (en
Inventor
壽雄 西
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Corp
Panasonic Holdings Corp
Original Assignee
Panasonic Corp
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Panasonic Corp, Matsushita Electric Industrial Co Ltd filed Critical Panasonic Corp
Priority to JP1086697A priority Critical patent/JP3307256B2/en
Publication of JPH10209217A publication Critical patent/JPH10209217A/en
Application granted granted Critical
Publication of JP3307256B2 publication Critical patent/JP3307256B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • H01L2224/161Disposition
    • H01L2224/16151Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/16221Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/16225Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L2224/32Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • H01L2224/321Disposition
    • H01L2224/32151Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/32221Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/32225Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73201Location after the connecting process on the same surface
    • H01L2224/73203Bump and layer connectors
    • H01L2224/73204Bump and layer connectors the bump connector being embedded into the layer connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/151Die mounting substrate
    • H01L2924/1517Multilayer substrate
    • H01L2924/15192Resurf arrangement of the internal vias

Landscapes

  • Adhesives Or Adhesive Processes (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Wire Bonding (AREA)
  • Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、バンプ付きワーク
のバンプを基板のパッド上に固着するバンプ付きワーク
の実装方法に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for mounting a bumped work, which fixes a bump of the bumped work on a pad of a substrate.

【0002】[0002]

【従来の技術】フリップチップなどのバンプ付きワーク
を基板に実装する方法として、銀ペーストのような導電
性ペーストを用いる方法が知られている。従来の導電性
ペーストは、未硬化状態では導電性を有しておらず、加
熱処理を行って硬化させると導電性を発揮することか
ら、従来は次のようにしてバンプ付きワークを実装して
いた。
2. Description of the Related Art As a method for mounting a work with a bump such as a flip chip on a substrate, a method using a conductive paste such as a silver paste is known. Conventional conductive paste does not have conductivity in the uncured state, and exhibits conductivity when cured by heat treatment.Therefore, conventionally, a work with bumps is mounted as follows. Was.

【0003】すなわち、バンプ付きワークのバンプ若し
くは基板のパッド上に導電性ペーストを付着させた後、
バンプをパッド上に着地させてバンプ付きワークを基板
に搭載する。次に加熱処理を行って導電性ペーストを硬
化させることによりバンプをパッド上に固着する。導電
性ペーストを硬化させたことにより、導電性ペーストは
はじめて導電性を発揮することとなる。そこで基板の検
査用パッドに検査手段のプローブを接触させ、バンプ付
きワークの機能検査を行う。そして検査結果が合格であ
れば、バンプ付きワークと基板の間に必要に応じてアン
ダーフィルを注入した後、再度加熱処理を行ってアンダ
ーフィルを硬化させる。以上により実装は終了する。
That is, after a conductive paste is deposited on bumps of a work having bumps or pads of a substrate,
The bump is landed on the pad, and the work with the bump is mounted on the substrate. Next, heat treatment is performed to cure the conductive paste to fix the bumps on the pads. By hardening the conductive paste, the conductive paste will exhibit conductivity for the first time. Then, the probe of the inspection means is brought into contact with the inspection pad of the substrate, and the function inspection of the work with bumps is performed. If the inspection result is acceptable, an underfill is injected between the work with bumps and the substrate as necessary, and a heating process is performed again to cure the underfill. With the above, the implementation is completed.

【0004】[0004]

【発明が解決しようとする課題】上記検査の結果が不合
格の場合には、バンプ付きワークを基板から取りはずし
てリペアすることが行われる。ところが従来方法は、導
電性ペーストを硬化させた後でなければ上記検査を行え
なかったため、リペア作業を行うには、バンプをパッド
に固着する硬化した導電性ペーストを治具を用いるなど
して剥がさねばならず、リペア作業に多大な手間を要す
るという問題点があった。
If the result of the above inspection is rejected, the work with bumps is removed from the substrate and repaired. However, according to the conventional method, the above-described inspection cannot be performed until after the conductive paste is cured.To perform the repair work, the cured conductive paste for fixing the bumps to the pads is peeled off using a jig or the like. However, there is a problem that the repair work requires a great deal of trouble.

【0005】また上記従来方法では、検査結果が合格で
あれば、アンダーフィルを注入して再度加熱処理を行
い、アンダーフィルを硬化させる場合が多いため、かな
りの時間を要する加熱工程が前後2回必要であって生産
性があがらないだけでなく、バンプ付きワークは2回加
熱されるので熱ダメージを受けやすく、さらにはアンダ
ーフィルを加熱して硬化させる際に、その熱応力のため
に、先にパッドに固着されたバンプがパッドからはがれ
てしまうことがあるという問題点があった。
In the above conventional method, if the inspection result is acceptable, the underfill is often injected and heat-treated again to cure the underfill. Not only is it necessary to reduce the productivity, but also the work with bumps is heated twice so that it is susceptible to thermal damage. In addition, there is a problem that the bump fixed to the pad may come off from the pad.

【0006】したがって本発明は、上記従来方法の問題
点を解消し、バンプ付きワークの機能検査の結果が不合
格の場合には、バンプ付きワークのリペアを容易に行う
ことができるバンプ付きワークの実装方法を提供するこ
とを目的とする。
Therefore, the present invention solves the problems of the above-described conventional method, and when the result of the function test of the work with bumps is rejected, the work with bumps can be easily repaired. The purpose is to provide an implementation method.

【0007】[0007]

【課題を解決するための手段】請求項1記載の発明は、
常温の未硬化状態で導電性を有する導電性ペーストを用
いるバンプ付きワークの実装方法であって、バンプ付き
ワークのバンプを前記導電性ペーストを介して基板のパ
ッド上に付着させてバンプ付きワークを基板に搭載する
工程と、導電性ペーストが未硬化の状態で検査手段によ
りチップの機能検査を行う工程と、前記機能検査で合格
の場合には加熱処理を行って前記導電性ペーストを硬化
させ、前記バンプを前記パッド上に固着する工程と、を
含む。
According to the first aspect of the present invention,
A method for mounting a work with bumps using a conductive paste having conductivity in an uncured state at room temperature, wherein the bumps of the work with bumps are attached to pads of a substrate via the conductive paste to form a work with bumps. A step of mounting on a substrate, a step of performing a function test of the chip by a test means in a state where the conductive paste is uncured, and, if the function test passes, performing a heat treatment to cure the conductive paste, Fixing the bump on the pad.

【0008】請求項2記載の発明は、常温の未硬化状態
で導電性を有する導電性ペーストを用いるバンプ付きワ
ークの実装方法であって、バンプ付きワークのバンプを
前記導電性ペーストを介して基板のパッド上に付着させ
てバンプ付きワークを基板に搭載する工程と、導電性ペ
ーストが未硬化の状態で検査手段によりチップの機能検
査を行う工程と、前記機能検査で合格の場合には前記バ
ンプ付きワークと前記基板の間にアンダーフィルを注入
する工程と、加熱処理を行って前記導電性ペーストと前
記アンダーフィルを共に硬化させ、前記バンプを前記パ
ッド上に固着する工程と、を含む。
According to a second aspect of the present invention, there is provided a method of mounting a work with bumps using a conductive paste having conductivity in an uncured state at room temperature, wherein the bumps of the work with bumps are mounted on the substrate via the conductive paste. a step is deposited onto the pad mounting the bumped work on the substrate, a conductive Bae
Performing a function test of the chip by the inspection means in a state where the paste is in an uncured state, a step of injecting an underfill between the work with bumps and the substrate if the function test passes, and performing a heat treatment. Curing the conductive paste and the underfill together to fix the bumps on the pads.

【0009】[0009]

【発明の実施の形態】請求項1記載の発明は、常温の
硬化状態で導電性を有する導電性ペーストを用いること
により、導電性ペーストを加熱処理して硬化させる前に
バンプ付きワークの機能検査を行うことが可能となり、
したがって検査結果が不合格の場合でも、バンプ付きワ
ークのリペアを容易に行うことができる。
DESCRIPTION OF THE PREFERRED EMBODIMENTS The invention according to claim 1 uses a conductive paste having conductivity in an uncured state at room temperature, so that the function of a work with bumps can be improved before the conductive paste is cured by heat treatment. Inspection can be performed,
Therefore, even if the inspection result is rejected, the work with bumps can be easily repaired.

【0010】請求項2記載の発明は、導電性ペーストと
アンダーフィルを一緒に加熱処理してこれらを硬化させ
ることができ、したがって加熱処理は1回でよいので工
程数を削減して生産性をあげることができ、さらには導
電性ペーストと共にアンダーフィルが硬化することによ
り、熱応力によってバンプがパッドからはがれるのを防
止し、バンプをパッド上に確実に固着することができ
る。
According to the second aspect of the present invention, the conductive paste and the underfill can be heat-treated together to cure them, so that only one heat-treatment is required, so that the number of steps is reduced and the productivity is reduced. In addition, by curing the underfill together with the conductive paste, the bump can be prevented from peeling off from the pad due to thermal stress, and the bump can be firmly fixed on the pad.

【0011】図1、図2、図3、図4、図5、図6、図
7、図8、図9は本発明の一実施の形態のバンプ付きワ
ークの実装工程図であって、実装順に示している。なお
本実施の形態のバンプ付きワークはフリップチップであ
る。以下、図1〜図9を参照してフリップチップの実装
工程を説明する。
FIG. 1, FIG. 2, FIG. 3, FIG. 4, FIG. 5, FIG. 6, FIG. 7, FIG. They are shown in order. The work with bumps in the present embodiment is a flip chip. The flip chip mounting process will be described below with reference to FIGS.

【0012】図1において、1はフリップチップであ
り、その下面にバンプ2を有している。3は導電性ペー
ストであり、浅い容器4に貯溜されている。導電性ペー
スト3の表面は、スキージ(図示せず)により平滑され
ている。この導電性ペースト3は、未硬化でも導電性を
有するものであり、その詳細は後述する。
In FIG. 1, reference numeral 1 denotes a flip chip, which has a bump 2 on its lower surface. Reference numeral 3 denotes a conductive paste, which is stored in a shallow container 4. The surface of conductive paste 3 is smoothed by a squeegee (not shown). The conductive paste 3 has conductivity even when it is not cured, and will be described later in detail.

【0013】図1〜図3に示すように、フリップチップ
1をノズル5の下端部に真空吸着して保持し、導電性ペ
ーストに対して下降・上昇動作を行わせることにより、
バンプ2の下面に導電性ペースト3を付着させる。
As shown in FIGS. 1 to 3, the flip chip 1 is held by vacuum suction at the lower end of the nozzle 5, and the lowering and raising operations are performed on the conductive paste.
The conductive paste 3 is attached to the lower surface of the bump 2.

【0014】図4において、10は基板であり、その上
面にはパッド11と検査用パッド12が形成されてい
る。パッド11と検査用パッド12は配線13で接続さ
れている。図示するように、ノズル5に保持されたフリ
ップチップ1を基板10の上方へ移動させ、そこでノズ
ル5を下降させることによりバンプ2をパッド11上に
着地させ、次いで真空吸着状態を解除してノズル5を上
昇させることにより、フリップチップ1は基板10に搭
載される。
In FIG. 4, reference numeral 10 denotes a substrate, on which pads 11 and test pads 12 are formed. The pad 11 and the inspection pad 12 are connected by a wiring 13. As shown in the figure, the flip chip 1 held by the nozzle 5 is moved above the substrate 10, and the nozzle 5 is lowered there to land the bump 2 on the pad 11. Then, the vacuum suction state is released and the nozzle 5 is released. By raising 5, flip chip 1 is mounted on substrate 10.

【0015】次に、図5に示すようにフリップチップ1
の機能検査が行われる。この機能検査は、検査手段20
のプローブ21を検査用パッド12に接触させ、フリッ
プチップ1に電流を流すことにより行われる。導電性ペ
ースト3は未硬化であるが、この導電性ペースト3は本
発明のために開発されたものであって未硬化でも導電性
を有する新規なものであり、この検査を行うことができ
る。なお後で図11を参照して述べるように、実験結果
によれば、この機能検査は、40℃〜60℃程度に導電
性ペースト3を暖めて行うと、良い検査結果が得られ
た。その理由は不明である。但し、40℃〜60℃程度
では、導電性ペースト3は未硬化状態のままである。
Next, as shown in FIG.
Is performed. This function inspection is performed by the inspection unit 20.
This is performed by bringing the probe 21 into contact with the inspection pad 12 and passing a current through the flip chip 1. Although the conductive paste 3 is uncured, the conductive paste 3 has been developed for the present invention and is a new material having conductivity even when uncured, so that this inspection can be performed. As will be described later with reference to FIG. 11, according to the experimental results, a good inspection result was obtained when the conductive paste 3 was warmed to about 40 ° C. to 60 ° C. The reason is unknown. However, at about 40 ° C. to 60 ° C., the conductive paste 3 remains uncured.

【0016】図6および図7はこの検査結果が合格の場
合を示している。すなわち検査の結果が合格であれば、
図6に示すように注入器30のニードル31からアンダ
ーフィル32を注出し、フリップチップ1と基板10の
間に注入する。このアンダーフィル32は熱硬化性の樹
脂である。次に加熱炉(図示せず)内で加熱処理を行っ
て導電性ペースト3とアンダーフィル32を同時に加熱
することにより、これらを共に硬化させれば実装は終了
する(図7)。
FIGS. 6 and 7 show a case where the inspection result is acceptable. In other words, if the result of the inspection passes,
As shown in FIG. 6, the underfill 32 is poured out from the needle 31 of the injector 30 and injected between the flip chip 1 and the substrate 10. The underfill 32 is a thermosetting resin. Next, a heat treatment is performed in a heating furnace (not shown) to simultaneously heat the conductive paste 3 and the underfill 32, thereby curing them together, and the mounting is completed (FIG. 7).

【0017】このように本方法は、上記検査結果が合格
の場合には、導電性ペースト3とアンダーフィル32は
同時に加熱処理を行って一緒に硬化させることができ
る。したがって加熱処理は1回で済み、前後2回の加熱
処理が必要であった従来方法よりも工程数を削減して生
産性をあげることができ、またフリップチップ1が受け
る熱ダメージも小さくなる。さらには、アンダーフィル
32が硬化することにより、熱応力によってバンプ2が
パッド4からはがれるのを防止でき、バンプ2をパッド
4上に確実に固着することができる。
As described above, according to the present method, if the above inspection result is acceptable, the conductive paste 3 and the underfill 32 can be simultaneously heated and cured together. Therefore, only one heat treatment is required, the number of steps can be reduced and productivity can be improved as compared with the conventional method which requires two heat treatments before and after, and the heat damage to the flip chip 1 is reduced. Furthermore, by curing the underfill 32, the bump 2 can be prevented from peeling off from the pad 4 due to thermal stress, and the bump 2 can be securely fixed on the pad 4.

【0018】図8および図9は、上記検査結果が不合格
の場合を示している。この場合、図8に示すようにフリ
ップチップ1を基板10から取りはずし、次に図9に示
すように基板10のパッド11上に残存付着する導電性
ペースト3を拭きとる。図8の工程は、導電性ペースト
3が未硬化の状態で行われるので、フリップチップ1を
難なく基板10から取りはずし、またパッド11上の導
電性ペースト3をきれいに拭きとることができる。なお
基板10は一般に高価であり、導電性ペースト3をきれ
いに拭きとることにより再使用できる。
FIGS. 8 and 9 show a case where the above inspection result is rejected. In this case, the flip chip 1 is removed from the substrate 10 as shown in FIG. 8, and then the conductive paste 3 remaining on the pads 11 of the substrate 10 is wiped off as shown in FIG. Since the process of FIG. 8 is performed in a state where the conductive paste 3 has not been cured, the flip chip 1 can be easily removed from the substrate 10 and the conductive paste 3 on the pad 11 can be wiped clean. The substrate 10 is generally expensive and can be reused by wiping the conductive paste 3 clean.

【0019】次に、未硬化状態で導電性を有する上記導
電性ペースト3について説明する。(表1)は上記導電
性ペースト3の材料および配合比(重量%)を示すもの
である。また(表2)は、硬化しないと導電性を有しな
い従来の導電性ペーストの成分および配合比を示すもの
である。
Next, the conductive paste 3 having conductivity in an uncured state will be described. Table 1 shows the materials and the mixing ratio (% by weight) of the conductive paste 3. Table 2 shows the components and the mixing ratio of the conventional conductive paste which does not have conductivity unless cured.

【0020】[0020]

【表1】 [Table 1]

【0021】[0021]

【表2】 [Table 2]

【0022】(表2)において、従来は硬化剤としてジ
シアンジアミド及びイミダゾールを用いていた。これに
対し(表1)に示す本実施の形態の導電性ペーストの硬
化剤は、トリエタノールアミン及びイミダゾールを用い
ている。なお硬化剤としては、一般にアミン系の物質が
用いられる。
In Table 2, dicyandiamide and imidazole were conventionally used as curing agents. On the other hand, as the curing agent for the conductive paste of the present embodiment shown in (Table 1), triethanolamine and imidazole are used. In addition, as a curing agent, an amine-based substance is generally used.

【0023】図10は、本発明の一実施の形態の測定対
象基板の断面図、図11は同導電性ペーストの導電性特
性図である。図10において、パッド11は銅パッドで
あり、パッド間隔Lは60μm、パッドピッチPは12
0μmである。また基板10はガラエポ基板である。抵
抗計33によりパッド間の抵抗値を測定した結果を図1
1に示している。
FIG. 10 is a sectional view of a substrate to be measured according to an embodiment of the present invention, and FIG. 11 is a view showing the conductive characteristics of the conductive paste. In FIG. 10, a pad 11 is a copper pad, a pad interval L is 60 μm, and a pad pitch P is 12
0 μm. The substrate 10 is a glass epoxy substrate. FIG. 1 shows the result of measuring the resistance value between the pads by the resistance meter 33.
It is shown in FIG.

【0024】図11において、aは(表1)に示す本実
施の形態の導電性ペースト,bは(表2)に示す従来の
導電性ペーストの導電性特性をそれぞれ示している。図
11に示すように、従来の導電性ペーストは100℃以
下の未硬化状態では抵抗値はきわめて大きく、100℃
以上に加熱して硬化が始まらないと抵抗値は小さくなら
ない。これに対し本実施の形態の導電性ペーストは低温
(常温)の未硬化状態でも抵抗値は小さく、十分な導電
性を有している。なお図11に示すように、本実施の形
態の導電性ペーストは、特に40℃以上で抵抗値がより
小さくなるので、図5に示す検査は、40〜60℃程度
で行うことが望ましく、この程度の温度であれば、フリ
ップチップが熱ダメージを受けたり、バンプがパッドか
ら剥がれたりすることはない。
In FIG. 11, a shows the conductive property of the conductive paste of the present embodiment shown in (Table 1), and b shows the conductive property of the conventional conductive paste shown in (Table 2). As shown in FIG. 11, the conventional conductive paste has an extremely large resistance value in an uncured state at 100 ° C. or lower,
The resistance value does not decrease unless curing is started by heating as described above. On the other hand, the conductive paste of the present embodiment has a small resistance even in an uncured state at a low temperature (normal temperature) and has sufficient conductivity. As shown in FIG. 11, the resistance of the conductive paste of the present embodiment becomes smaller particularly at 40 ° C. or higher. Therefore, the inspection shown in FIG. 5 is desirably performed at about 40 to 60 ° C. At such temperatures, the flip chip is not thermally damaged and the bumps do not peel off the pads.

【0025】本発明は上記実施の形態に限定されないの
であって、例えば導電性ペースト3は図2および図3に
示す転写方式でバンプ2に付着させているが、スクリー
ン印刷法により基板10のパッド11上に付着させても
よい。
The present invention is not limited to the above-described embodiment. For example, the conductive paste 3 is adhered to the bumps 2 by the transfer method shown in FIGS. 11 may be attached.

【0026】[0026]

【発明の効果】請求項1記載の発明は、常温の未硬化で
導電性を有する導電性ペーストを用いることにより、導
電性ペーストを加熱処理して硬化させる前にバンプ付き
ワークの機能検査を行うことが可能となり、したがって
検査結果が不合格の場合でも、バンプ付きワークのリペ
アを容易に行うことができる。
According to the first aspect of the present invention, the use of a conductive paste which is uncured at room temperature and has conductivity allows the functional inspection of the work with bumps before the conductive paste is cured by heating. Therefore, even if the inspection result is rejected, the work with bumps can be easily repaired.

【0027】請求項2記載の発明は、導電性ペーストと
アンダーフィルを一緒に加熱処理してこれらを硬化させ
ることができ、したがって加熱処理は1回でよいので工
程数を削減して生産性をあげることができ、さらにはア
ンダーフィルが硬化することにより、熱応力によってバ
ンプがパッドからはがれるのを防止し、バンプをパッド
上に確実に固着することができる。
According to the second aspect of the present invention, the conductive paste and the underfill can be heat-treated together to cure them, so that only one heat-treatment is required, so that the number of steps is reduced and the productivity is reduced. In addition, by curing the underfill, it is possible to prevent the bump from peeling off from the pad due to thermal stress, and to securely fix the bump on the pad.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の一実施の形態のバンプ付きワークの実
装工程図
FIG. 1 is a mounting process diagram of a work with bumps according to an embodiment of the present invention.

【図2】本発明の一実施の形態のバンプ付きワークの実
装工程図
FIG. 2 is a mounting process diagram of a work with bumps according to an embodiment of the present invention.

【図3】本発明の一実施の形態のバンプ付きワークの実
装工程図
FIG. 3 is a mounting process diagram of a work with bumps according to an embodiment of the present invention.

【図4】本発明の一実施の形態のバンプ付きワークの実
装工程図
FIG. 4 is a mounting process diagram of a work with bumps according to an embodiment of the present invention.

【図5】本発明の一実施の形態のバンプ付きワークの実
装工程図
FIG. 5 is a mounting process diagram of a work with bumps according to an embodiment of the present invention.

【図6】本発明の一実施の形態のバンプ付きワークの実
装工程図
FIG. 6 is a mounting process diagram of a work with bumps according to an embodiment of the present invention.

【図7】本発明の一実施の形態のバンプ付きワークの実
装工程図
FIG. 7 is a mounting process diagram of a work with bumps according to an embodiment of the present invention.

【図8】本発明の一実施の形態のバンプ付きワークの実
装工程図
FIG. 8 is a mounting process diagram of a work with bumps according to an embodiment of the present invention.

【図9】本発明の一実施の形態のバンプ付きワークの実
装工程図
FIG. 9 is a mounting process diagram of a work with bumps according to an embodiment of the present invention.

【図10】本発明の一実施の形態の測定対象基板の断面
FIG. 10 is a sectional view of a substrate to be measured according to an embodiment of the present invention.

【図11】本発明の一実施の形態の導電性ペーストの導
電性特性図
FIG. 11 is a diagram showing the conductivity characteristics of a conductive paste according to an embodiment of the present invention.

【符号の説明】[Explanation of symbols]

1 フリップチップ 2 バンプ 3 導電性ペースト 10 基板 11 パッド 12 検査用パッド 20 検査手段 21 プローブ 32 アンダーフィル DESCRIPTION OF SYMBOLS 1 Flip chip 2 Bump 3 Conductive paste 10 Substrate 11 Pad 12 Inspection pad 20 Inspection means 21 Probe 32 Underfill

───────────────────────────────────────────────────── フロントページの続き (58)調査した分野(Int.Cl.7,DB名) H01L 21/52 H01L 21/60 H05K 3/32 C09J 9/02 ──────────────────────────────────────────────────続 き Continued on the front page (58) Field surveyed (Int.Cl. 7 , DB name) H01L 21/52 H01L 21/60 H05K 3/32 C09J 9/02

Claims (2)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】常温の未硬化状態で導電性を有する導電性
ペーストを用いるバンプ付きワークの実装方法であっ
て、バンプ付きワークのバンプを前記導電性ペーストを
介して基板のパッド上に付着させてバンプ付きワークを
基板に搭載する工程と、導電性ペーストが未硬化の状態
検査手段によりチップの機能検査を行う工程と、前記
機能検査で合格の場合には加熱処理を行って前記導電性
ペーストを硬化させ、前記バンプを前記パッド上に固着
する工程と、を含むことを特徴とするバンプ付きワーク
の実装方法。
1. A method of mounting a work with bumps using a conductive paste having conductivity in an uncured state at room temperature, wherein a bump of the work with bumps is attached to a pad of a substrate via the conductive paste. The process of mounting the work with bumps on the substrate by pressing, and the conductive paste is in an uncured state
A step of performing a function test of the chip by a test means, and a step of performing a heat treatment to cure the conductive paste if the function test passes, and fixing the bump on the pad. A method for mounting a work with bumps, characterized in that:
【請求項2】常温の未硬化状態で導電性を有する導電性
ペーストを用いるバンプ付きワークの実装方法であっ
て、バンプ付きワークのバンプを前記導電性ペーストを
介して基板のパッド上に付着させてバンプ付きワークを
基板に搭載する工程と、導電性ペーストが未硬化の状態
検査手段によりチップの機能検査を行う工程と、前記
機能検査で合格の場合には前記バンプ付きワークと前記
基板の間にアンダーフィルを注入する工程と、加熱処理
を行って前記導電性ペーストと前記アンダーフィルを共
に硬化させ、前記バンプを前記パッド上に固着する工程
と、を含むことを特徴とするバンプ付きワークの実装方
法。
2. A method of mounting a work with bumps using a conductive paste having conductivity in an uncured state at room temperature, wherein the bumps of the work with bumps are attached to pads on a substrate via the conductive paste. The process of mounting the work with bumps on the substrate by pressing, and the conductive paste is in an uncured state
A step of performing a chip functional inspection by inspection means, and a step of injecting an underfill between the bumped work and the substrate if the functional inspection passes, and performing a heat treatment on the conductive paste. Curing the underfill together and fixing the bump on the pad.
JP1086697A 1997-01-24 1997-01-24 Mounting method of work with bump Expired - Fee Related JP3307256B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1086697A JP3307256B2 (en) 1997-01-24 1997-01-24 Mounting method of work with bump

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1086697A JP3307256B2 (en) 1997-01-24 1997-01-24 Mounting method of work with bump

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2002059939A Division JP2002353602A (en) 2002-03-06 2002-03-06 Conductive paste for mounting work with bumps

Publications (2)

Publication Number Publication Date
JPH10209217A JPH10209217A (en) 1998-08-07
JP3307256B2 true JP3307256B2 (en) 2002-07-24

Family

ID=11762279

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1086697A Expired - Fee Related JP3307256B2 (en) 1997-01-24 1997-01-24 Mounting method of work with bump

Country Status (1)

Country Link
JP (1) JP3307256B2 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100361299C (en) * 2005-12-21 2008-01-09 威盛电子股份有限公司 Packed module with positioning structure, electronic device and inspection after assembly
JPWO2021214813A1 (en) * 2020-04-20 2021-10-28

Also Published As

Publication number Publication date
JPH10209217A (en) 1998-08-07

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