JP3301223B2 - Cleaning equipment for parts and boards - Google Patents

Cleaning equipment for parts and boards

Info

Publication number
JP3301223B2
JP3301223B2 JP16635194A JP16635194A JP3301223B2 JP 3301223 B2 JP3301223 B2 JP 3301223B2 JP 16635194 A JP16635194 A JP 16635194A JP 16635194 A JP16635194 A JP 16635194A JP 3301223 B2 JP3301223 B2 JP 3301223B2
Authority
JP
Japan
Prior art keywords
cleaning
cleaning liquid
tank
liquid
pump
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP16635194A
Other languages
Japanese (ja)
Other versions
JPH081116A (en
Inventor
辰也 奥村
嘉一 増成
純一 前野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Arakawa Chemical Industries Ltd
Original Assignee
Arakawa Chemical Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Arakawa Chemical Industries Ltd filed Critical Arakawa Chemical Industries Ltd
Priority to JP16635194A priority Critical patent/JP3301223B2/en
Publication of JPH081116A publication Critical patent/JPH081116A/en
Application granted granted Critical
Publication of JP3301223B2 publication Critical patent/JP3301223B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、IC、コンデンサ等の
電子部品、金属部品、精密部品等の種々の部品類または
プリント基板等を洗浄するための洗浄装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a cleaning apparatus for cleaning various parts such as electronic parts such as ICs and capacitors, metal parts, precision parts and the like or printed circuit boards.

【0002】[0002]

【従来の技術】IC、コンデンサ等の電子部品、金属部
品、精密部品等の種々の部品類に付着している油脂類や
ワックス類、またプリント配線基板等のハンダ処理時に
使用されるフラックス等は、それぞれの被処理物が供さ
れる用途において様々な悪影響を及ぼすため、洗浄剤に
よりかかる被処理物から洗浄除去されている。
2. Description of the Related Art Fats and oils and waxes adhering to various parts such as electronic parts such as ICs and capacitors, metal parts and precision parts, and fluxes used for soldering of printed wiring boards and the like are used. In addition, since various adverse effects are caused in the use to which each object is provided, the object is washed and removed from the object by a cleaning agent.

【0003】従来、こうした洗浄剤としてはトリクロロ
エチレン、トリクロロトリフルオロエタン等のハロゲン
系洗浄剤が使用されていた。これらハロゲン系洗浄剤
は、それ自体不燃性であり、かつ乾燥性に優れ、また表
面張力が小さく被洗浄物上の汚れに対する浸透性に優れ
ていることから、該洗浄剤の使用にあたっては被洗浄物
を該洗浄剤に単に浸漬するか又は浸漬時に超音波照射等
をして被洗浄物上の汚れ除去し、その後洗浄剤から引き
上げ、該洗浄剤の蒸気によりすすぎ、乾燥が行われてい
た。しかし、かかるハロゲン系洗浄剤は、オゾン層破壊
等の環境汚染問題や毒性の問題から使用できない状況に
なってきている。
Heretofore, halogen-based cleaning agents such as trichloroethylene and trichlorotrifluoroethane have been used as such cleaning agents. These halogen-based cleaning agents are nonflammable in themselves, have excellent drying properties, and have a low surface tension and are excellent in penetrating dirt on an object to be cleaned. The object is simply immersed in the cleaning agent, or at the time of immersion, ultrasonic irradiation or the like is used to remove stains on the object to be cleaned, then lifted up from the cleaning agent, rinsed with steam of the cleaning agent, and dried. However, these halogen-based cleaning agents are becoming unusable due to environmental pollution problems such as ozone layer destruction and toxicity problems.

【0004】かかる状況を受けて近時、ハロゲン系洗浄
剤の代替洗浄剤として炭化水素系溶剤や、グリコールエ
ーテル系化合物、各種界面活性剤および水等の混合物ま
たは水そのものからなる水系または準水系洗浄剤が使用
されている。
Under these circumstances, water-based or quasi-water-based cleaning comprising hydrocarbon-based solvent, glycol ether-based compound, various surfactants, a mixture of water or the like, or water itself has recently been used as a cleaning agent instead of a halogen-based cleaning agent. Agent is used.

【0005】ところで、こうした代替洗浄剤のうち炭化
水素系溶剤は、溶解性、浸透性についてハロゲン系洗浄
剤に近い能力を有するものの、炭化水素系溶剤そのもの
の引火性の問題から、洗浄装置には防爆設備が必要にな
るという問題がある。
[0005] Among these alternative cleaning agents, hydrocarbon solvents have a solubility and permeability similar to those of halogen-based cleaning agents, but due to the problem of flammability of the hydrocarbon solvents themselves, cleaning apparatuses are not suitable. There is a problem that explosion-proof equipment is required.

【0006】一方、水系または準水系洗浄剤は、非引火
性であり、炭化水素系溶剤に比べ使用が容易で安全なた
め、洗浄装置に防爆設備等は不要であるが、ハロゲン系
洗浄剤に比べると浸透性に劣るため、洗浄槽には液中噴
流機構等による物理的補助が必要になる。しかし、従来
こうした液中噴流機構を利用する場合において、洗浄液
を循環使用するには、洗浄槽とポンプを配管でつなぎ、
かつポンプと噴流機構部を配管でつなぐ必要があり、以
下のような問題があった。
On the other hand, water-based or semi-water-based cleaning agents are nonflammable and easy to use and safer than hydrocarbon-based solvents. Therefore, explosion-proof equipment is not required for cleaning equipment. Since the permeability is inferior to that of the cleaning tank, physical assistance is required for the cleaning tank by a submerged jet mechanism or the like. However, in the case where such a submerged jet mechanism is conventionally used, in order to circulate and use the cleaning liquid, the cleaning tank and the pump are connected by a pipe,
In addition, it is necessary to connect the pump and the jet mechanism with piping, and there are the following problems.

【0007】すなわち、(1)各配管のつなぎめで洗浄
液が漏れる危険性がある。(2)洗浄装置を一定の場所
に収納するための工夫が必要であり設計及び製作工数が
多い。その結果として、設計、製作に要する時間、費用
が大きくなる。(3)構造が複雑になるため、メンテナ
ンスが難しい。(4)全体として、洗浄装置が大きい。
(5)複雑な配管となった場合、噴流の圧損が発生す
る。といった問題があった。特に問題(1)は配管を有
する以上避けられない問題であり、装置稼働時には常に
注意が必要であった。
[0007] That is, (1) there is a risk that the cleaning liquid leaks at the connection of each pipe. (2) It is necessary to devise a method for storing the cleaning device in a certain place, and the number of design and manufacturing steps is large. As a result, the time and cost required for designing and manufacturing are increased. (3) Maintenance is difficult because the structure is complicated. (4) The cleaning device is large as a whole.
(5) When the piping is complicated, pressure loss of the jet flow occurs. There was such a problem. In particular, the problem (1) is an unavoidable problem because of having a pipe, and always requires attention when the apparatus is operating.

【0008】また、液中噴流機構を利用した洗浄槽内で
は、噴流機構から発生する噴流の他に、噴流が洗浄槽の
底面および/または側面で反流となり洗浄槽内で乱流が
発生するため被洗浄物を部分的に洗浄できず洗浄効率が
悪いといった問題もある。
In the cleaning tank using the submerged jet mechanism, in addition to the jet generated from the jet mechanism, the jet flows countercurrently on the bottom and / or side surfaces of the cleaning tank, and turbulence occurs in the cleaning tank. Therefore, there is also a problem that the object to be cleaned cannot be partially cleaned and cleaning efficiency is poor.

【0009】[0009]

【発明が解決しようとする課題】本発明は、配管に伴う
前記問題を解決しようとするものである。さらには液中
噴流機構を利用した洗浄槽内での洗浄効率を向上しよう
とするものである。
SUMMARY OF THE INVENTION The present invention seeks to solve the problems associated with piping. Further, it is intended to improve the cleaning efficiency in a cleaning tank using a submerged jet mechanism.

【0010】[0010]

【課題を解決するための手段】本発明は、被洗浄物を液
中噴流機構により洗浄液を用いて洗浄する洗浄槽を有す
る洗浄装置であって、該洗浄槽が洗浄に使用する洗浄液
を貯える容器の内側に設けられており、かつ該液中噴流
機構がポンプに直接接続し、該ポンプの洗浄液吸入部が
該容器中に貯える洗浄液中にあるような構成になってい
ることを特徴とする部品、基板類の洗浄装置に関する。
SUMMARY OF THE INVENTION The present invention is a cleaning apparatus having a cleaning tank for cleaning an object to be cleaned by using a cleaning liquid by a submerged jet mechanism, wherein the cleaning tank stores a cleaning liquid used for cleaning. Wherein the submerged jet mechanism is directly connected to a pump, and the cleaning liquid suction portion of the pump is in the cleaning liquid stored in the container. And a substrate cleaning apparatus.

【0011】以下に本発明の実施例を添付図面にもとづ
き説明する。
An embodiment of the present invention will be described below with reference to the accompanying drawings.

【0012】図1に概略的に示すように、本発明の洗浄
装置は、洗浄液1を貯えた容器2の内側に、被洗浄物4
が設置された洗浄槽3が設けられており、洗浄槽3内に
は液中噴流機構により被洗浄物4を洗浄するために使用
する噴射ノズル5を有する。噴射ノズル5はノズルヘッ
ド6で、ポンプ7に接続しており、ポンプ7の洗浄液吸
入部8は容器2中の洗浄液1内にある。また、洗浄槽3
には洗浄液1の流通口9が噴流方向の側面に設けられて
いる。
As schematically shown in FIG. 1, a cleaning apparatus according to the present invention includes an object 4 to be cleaned inside a container 2 storing a cleaning liquid 1.
Is provided, and the cleaning tank 3 has an injection nozzle 5 used for cleaning the object 4 to be cleaned by a submerged jet mechanism. The injection nozzle 5 is a nozzle head 6 and is connected to a pump 7, and a cleaning liquid suction part 8 of the pump 7 is in the cleaning liquid 1 in the container 2. Cleaning tank 3
Is provided with a flow port 9 for the cleaning liquid 1 on the side surface in the jet direction.

【0013】かかる構成の洗浄装置は図1から明らかな
とおり、配管を全く必要とすることなく、洗浄液を循環
使用できる。すなわち、図中の矢印が示すように、容器
2内の洗浄液1はポンプ7の洗浄液吸入部8により吸入
され、洗浄槽3内の噴射ノズル5から噴射される。そし
て、噴射された洗浄液1の噴流により被洗浄物4が洗浄
され、一方では被洗浄物4を洗浄した洗浄槽3内の洗浄
液1は、流通口9から容器2内に戻り、洗浄液1は再び
洗浄液1として循環される。このように液中噴流から洗
浄液の循環までの全ての工程が容器2の側内で行われて
いるので、洗浄液の循環ラインが不要になる。その結
果、洗浄装置内での洗浄液漏れの心配もなく、配管の配
置設計も必要ないので全体としてコンパクトな洗浄装置
とすることができる。さらには、洗浄槽3内では、噴射
ノズル5から噴射された洗浄剤1は流通口9の方向に流
れ、一方容器2内では、流通口9から戻った洗浄液1は
ポンプ7の洗浄液吸入部8の方向に流れ、洗浄槽3内の
洗浄部と容器2内での洗浄液1の循環部においてそれぞ
れスムーズな液流れ状態をつくるため、洗浄槽3内で乱
流がなくなり洗浄性も向上する。また、洗浄槽3内での
流速が低下しないため、洗浄性にも優れる。
As is clear from FIG. 1, the cleaning apparatus having such a configuration can use a cleaning liquid in a circulating manner without requiring any piping. That is, as indicated by the arrow in the figure, the cleaning liquid 1 in the container 2 is sucked by the cleaning liquid suction unit 8 of the pump 7 and is injected from the injection nozzle 5 in the cleaning tank 3. Then, the cleaning object 1 is washed by the jet of the jetted cleaning liquid 1, while the cleaning liquid 1 in the cleaning tank 3 that has washed the cleaning object 4 returns to the container 2 from the circulation port 9, and the cleaning liquid 1 is again Circulated as the cleaning liquid 1. As described above, since all the steps from the submerged jet to the circulation of the cleaning liquid are performed inside the container 2, a circulation line for the cleaning liquid is not required. As a result, there is no need to worry about leakage of the cleaning liquid in the cleaning device, and there is no need to design the arrangement of the pipes. Furthermore, in the cleaning tank 3, the cleaning agent 1 injected from the injection nozzle 5 flows in the direction of the circulation port 9, while in the container 2, the cleaning liquid 1 returned from the circulation port 9 is supplied to the cleaning liquid suction portion 8 of the pump 7. , And a smooth liquid flow state is formed in each of the cleaning section in the cleaning tank 3 and the circulation section of the cleaning liquid 1 in the vessel 2, so that turbulence is eliminated in the cleaning tank 3 and the cleaning property is improved. Further, since the flow velocity in the cleaning tank 3 does not decrease, the cleaning property is excellent.

【0014】以下、洗浄装置の構成を説明する。Hereinafter, the structure of the cleaning apparatus will be described.

【0015】ポンプ7は、ジェットポンプ等の循環ポン
プを使用できる。具体的には、投げ込み式ポンプを採用
でき、容器2内に直接セットする。前記投げ込み式ポン
プは、各種公知のものを使用でき、例えば、ガデリウス
社製のグルンドフォスポンプ、SPK型、CRK型等を
例示できる。また、ポンプ7は、一般的に図1に示すよ
うにフランジ止め10で固定され、メンテナンス時は容
易に取り外しができるように設置されている。
As the pump 7, a circulation pump such as a jet pump can be used. Specifically, a throw-in type pump can be adopted and is set directly in the container 2. Various known pumps can be used as the throw-in type pump, and examples thereof include a Grundfos pump, SPK type, and CRK type manufactured by Gadelius. The pump 7 is generally fixed by a flange stopper 10 as shown in FIG. 1, and is installed so that it can be easily removed during maintenance.

【0016】ノズルヘッド6は、被洗浄物4の形状、大
きさ等により、洗浄に最適なもの選択し、その設置位置
も適宜に選択する。ノズルヘッド6は直接ポンプ7に接
続されるので、配管で接続していたときのように配置の
設計や、洗浄液の洗浄装置外への漏れの心配は必要な
い。またノズルヘッド6はポンプ7の吐き出し口に近接
しているので、液中噴流の圧損は最小限に抑制される。
さらにはノズルヘッド6には、圧力調整用バルブや、バ
イパス回路等を付与することにより、液中噴流の圧力を
種々調整することができる。
The nozzle head 6 is optimally selected for cleaning according to the shape and size of the object 4 to be cleaned, and its installation position is also appropriately selected. Since the nozzle head 6 is directly connected to the pump 7, there is no need to design the arrangement as in the case where the nozzle head 6 is connected by piping or to worry about leakage of the cleaning liquid out of the cleaning device. Further, since the nozzle head 6 is close to the discharge port of the pump 7, the pressure loss of the submerged jet is suppressed to a minimum.
Furthermore, the pressure of the submerged jet can be variously adjusted by providing the nozzle head 6 with a pressure adjusting valve, a bypass circuit, and the like.

【0017】また、洗浄槽3内の汚れを、洗浄液1が循
環される容器2内に持ち込まないよう、洗浄槽3の流通
口9にはフィルター11を設けることもできる。フィル
ター11により洗浄液1が循環される容器2内の液循環
部の清浄性を維持するとともに、ポンプ7への負荷を低
減することができる。フィルターの目は、40〜100
メッシュ程度が適当である。フィルター11は洗浄槽3
から容易に取り外しができるような構造とすることで、
目詰まり等の汚れが付着してきた際のメンテナンスを簡
易にできる。なお、フィルター11は、流通口9の他に
図4に示すように容器2内の洗浄液1の循環部に設けて
もよい。
Further, a filter 11 can be provided in the circulation port 9 of the cleaning tank 3 so that the dirt in the cleaning tank 3 is not brought into the container 2 in which the cleaning liquid 1 is circulated. The filter 11 can maintain the cleanliness of the liquid circulation section in the container 2 in which the cleaning liquid 1 is circulated, and can reduce the load on the pump 7. Filter eyes should be 40-100
A mesh size is appropriate. The filter 11 is the washing tank 3
With a structure that can be easily removed from
Maintenance when dirt such as clogging adheres can be simplified. In addition, the filter 11 may be provided in the circulation part of the cleaning liquid 1 in the container 2 as shown in FIG.

【0018】本発明の実施にあたっては、被洗浄物4は
洗浄槽3内にそのまま設置してもよく、バスケット等に
収納して設置してもよい。また、本発明の洗浄装置は図
1に示すように洗浄液1を槽から抜き取るためのドレン
12を設けてもよい。ドレン12からの洗浄液1の抜き
取りを効率よくするために、容器2の底部をドレン方向
に傾斜構造とすることもできる。また、容器2の特に底
部についてメンテナンスを行うために清掃口13を設け
てもよい。
In practicing the present invention, the object to be cleaned 4 may be installed in the cleaning tank 3 as it is, or may be installed in a basket or the like. Further, the cleaning apparatus of the present invention may be provided with a drain 12 for extracting the cleaning liquid 1 from the tank as shown in FIG. In order to efficiently extract the cleaning liquid 1 from the drain 12, the bottom of the container 2 may have an inclined structure in the drain direction. Further, a cleaning port 13 may be provided for performing maintenance particularly on the bottom of the container 2.

【0019】以上は、図1にもとづいて本発明の洗浄装
置を説明したが、本発明の洗浄装置における洗浄槽3
は、必ずしも図1に示すように容器2内の洗浄液1中に
浸漬されている必要はなく、容器2内の洗浄液1より上
部にあってもよい。また、洗浄槽3の流通口9も、洗浄
槽の側面の他、底面にあってもよい。ただし、被洗浄物
4の洗浄性を考慮すれば、図1に示すように洗浄槽3の
流通口9は噴流方向の側面にあるのがよい。また、洗浄
槽3の流通口9は必須ではなく、単純なオーバーフロー
構造を採用することにより、洗浄槽3から容器2内の洗
浄液1に戻してもよい。こうしたオーバーフロー構造の
場合には循環ラインの配管がなくなるという効果を奏す
るが、噴流の流れを完全にスムーズにすることはでき
ず、図1に示す洗浄装置と同程度の洗浄効率の向上は期
待できない。ただし、洗浄液1をオーバーフローさせる
ことにより乱流の発生を低減できるため、従来の配管を
用いたタイプの洗浄装置に比べると、洗浄効率を向上で
きる。
In the above, the cleaning apparatus of the present invention has been described with reference to FIG. 1, but the cleaning tank 3 in the cleaning apparatus of the present invention has been described.
Need not necessarily be immersed in the cleaning liquid 1 in the container 2 as shown in FIG. 1 and may be above the cleaning liquid 1 in the container 2. Further, the circulation port 9 of the cleaning tank 3 may be provided on the bottom surface in addition to the side surface of the cleaning tank. However, in consideration of the cleanability of the object 4 to be cleaned, the flow port 9 of the cleaning tank 3 is preferably provided on the side surface in the jet direction as shown in FIG. Further, the circulation port 9 of the cleaning tank 3 is not essential, and the cleaning liquid 1 in the container 2 may be returned from the cleaning tank 3 by adopting a simple overflow structure. In the case of such an overflow structure, there is an effect that the piping of the circulation line is eliminated, but the flow of the jet cannot be completely smoothed, and the improvement of the cleaning efficiency at the same level as the cleaning device shown in FIG. 1 cannot be expected. . However, since the occurrence of turbulence can be reduced by overflowing the cleaning liquid 1, the cleaning efficiency can be improved as compared with a conventional cleaning apparatus using a pipe.

【0020】さらに、本発明の洗浄装置は、図2に示す
ように、流通口9として洗浄槽3の液中噴流機構部の噴
流方向の側面に流通口9aと噴流方向とは逆の側面に流
通口9b設けることにより、容器2内の洗浄液1から、
噴射ノズル5の先端部への吸い込み流れを発生させるこ
とができる。これにより洗浄槽3内には、より効果の高
い液中噴流が発生し、洗浄効率をさらに向上させること
ができる。
Further, as shown in FIG. 2, the cleaning apparatus of the present invention has a flow port 9 on the side of the jet direction of the submerged jet mechanism of the cleaning tank 3 on the side opposite to the flow port 9a. By providing the circulation port 9b, the cleaning liquid 1 in the container 2
A suction flow to the tip of the injection nozzle 5 can be generated. As a result, a more effective submerged jet is generated in the cleaning tank 3, and the cleaning efficiency can be further improved.

【0021】図3は図1の平面図であり、洗浄槽3の底
面下部を洗浄液1が循環する構造である。また図4は、
洗浄槽3の底面下部および外側部を洗浄液1が循環する
構造である。図4の構造によれば、図1(図3)と同様
に、液流れを効率化する他に、洗浄槽3の外側面を洗浄
液1の循環部として利用していることから液中噴流の側
面壁部での盛り上がり力を外側面に逃がすこともでき
る。
FIG. 3 is a plan view of FIG. 1 and shows a structure in which the cleaning liquid 1 circulates under the bottom of the cleaning tank 3. Also, FIG.
The structure is such that the cleaning liquid 1 circulates through the lower portion and the outer portion of the bottom of the cleaning tank 3. According to the structure of FIG. 4, similarly to FIG. 1 (FIG. 3), in addition to improving the efficiency of the liquid flow, since the outer surface of the cleaning tank 3 is used as a circulating portion of the cleaning liquid 1, The swelling force on the side wall can be released to the outer side.

【0022】本発明の洗浄装置に使用できる洗浄液1と
しては純水、イオン交換水、工業用水の他、グリコール
エーテル系化合物もしくはアルコール系溶剤の洗浄剤、
またはこれらと各種界面活性剤および/または水等の混
合物からなる水系また準水系の洗浄剤や前記混合物から
なるエマルジョン系の洗浄剤、さらにはカチオン性、ア
ニオン性、ノニオン性の各種の洗浄剤を使用することも
できる。また、図1に示すように、洗浄液1はヒーター
14で、加温して使用することもできる。なお、本発明
の洗浄装置では前記洗浄液をリンス水として使用するこ
ともできる。
The cleaning liquid 1 that can be used in the cleaning apparatus of the present invention includes pure water, ion-exchanged water, industrial water, a cleaning agent of a glycol ether compound or an alcohol solvent,
Or an aqueous or quasi-aqueous detergent comprising a mixture of these with various surfactants and / or water, or an emulsion detergent comprising the above mixture, and further various cationic, anionic or nonionic detergents. Can also be used. Further, as shown in FIG. 1, the cleaning liquid 1 can be used after being heated by a heater 14. In the cleaning apparatus of the present invention, the cleaning liquid can be used as rinsing water.

【0023】以下に、本発明の洗浄装置の洗浄効率を表
す試験の結果を示す。試験には例1として図1のタイプ
の洗浄装置、例2として図2のタイプの洗浄装置、例3
として図1のタイプの洗浄装置で流通口9のない場合
(オーバーフロー型)を用いた。また本発明の洗浄装置
との比較として、洗浄槽とポンプを配管でつなぎ、かつ
ポンプと噴流機構部を配管でつないだ従来のタイプの液
中噴流機構を有する洗浄装置を用いた。
The results of a test showing the cleaning efficiency of the cleaning apparatus of the present invention are shown below. In the test, a cleaning apparatus of the type shown in FIG. 1 was used as Example 1, a cleaning apparatus of the type shown in FIG.
1 was used in the case of a washing apparatus of the type shown in FIG. 1 without an outlet 9 (overflow type). As a comparison with the cleaning apparatus of the present invention, a cleaning apparatus having a conventional submerged jet mechanism in which a cleaning tank and a pump are connected by a pipe and the pump and a jet mechanism are connected by a pipe was used.

【0024】(洗浄効率の試験) (1)洗浄液:洗浄剤としてパインアルファST−10
0S(準水系洗浄剤、荒川化学工業(株))、リンス水
としてイオン交換水を用いた。 (2)被洗浄物:金メッキ銅板(40×40mm)にフ
ラックス固形分(AGF200−J3、(株)アサヒ化
学研究所社製)20mgを塗布し、その上から同じ金メ
ッキ銅板を隙間が0.5mmとなるよう重ねて固定した
ものを調整し、さらに銅板表面に50mgの同フラック
スを塗布したものを用いた。 (3)洗浄工程:洗浄(液中噴流圧:6kg/cm2
60℃、2分)、第一リンス(液中噴流圧:4kg/c
2 、25℃、2分)、第二リンス(液中噴流圧:4k
g/cm2 、25℃、2分)、乾燥(熱風循環、80
℃、5分)の順で行った。 (4)洗浄試験:前記被洗浄物を冶具に固定し、噴射ノ
ズルから20cmの位置に、ジェット噴流方向と同一方
向となるように洗浄槽内にセットし、前記(3)の工程
を行った。なお、噴射ノズルから出される噴流の流量
は、6〜7リットル/分とした。 (5)評価方法:洗浄後の被洗浄物上のフラックス残存
量を重量測定し、銅板の表面と銅板の重部の除去率
(%)=((塗布量−残存量)/塗布量)×100で示
した。評価結果を表1に示す。
(Test of cleaning efficiency) (1) Cleaning solution: Pine Alpha ST-10 as a cleaning agent
0S (quasi-aqueous cleaning agent, Arakawa Chemical Industry Co., Ltd.) and ion-exchanged water were used as rinse water. (2) Object to be cleaned: 20 mg of a flux solid content (AGF200-J3, manufactured by Asahi Chemical Laboratory Co., Ltd.) was applied to a gold-plated copper plate (40 × 40 mm), and the same gold-plated copper plate was cut from above with a gap of 0.5 mm. The copper foil was fixed by being overlapped and fixed so that the same flux was applied to the surface of a copper plate at 50 mg. (3) Cleaning step: cleaning (jet pressure in liquid: 6 kg / cm 2 ,
60 ° C, 2 minutes), first rinse (jet pressure in liquid: 4kg / c)
m 2 , 25 ° C., 2 minutes), second rinse (jet pressure in liquid: 4 k)
g / cm 2 , 25 ° C., 2 minutes), drying (hot air circulation, 80
C., 5 minutes). (4) Cleaning test: The object to be cleaned was fixed on a jig, set in a cleaning tank at a position 20 cm from the injection nozzle so as to be in the same direction as the jet jet direction, and the step (3) was performed. . In addition, the flow rate of the jet flow emitted from the injection nozzle was set to 6 to 7 liters / minute. (5) Evaluation method: The amount of flux remaining on the object to be cleaned after washing is weighed, and the removal rate (%) of the surface of the copper plate and the heavy portion of the copper plate = ((application amount−remaining amount) / application amount) × Indicated by 100. Table 1 shows the evaluation results.

【0025】[0025]

【表1】 [Table 1]

【0026】(考察)本発明の洗浄装置(例1〜3)
は、いずれも従来の洗浄装置(例4)に比べて洗浄効率
のよいことが認められる。本発明の図1および図2で示
される洗浄装置(例1および例2)は、被洗浄物表面の
フラックスが完全に除去されており、洗浄効率がよい。
特に例2では、被洗浄物の重合部のフラックスも完全に
除去されており、洗浄効率が非常によい。したがって、
洗浄が難しい箇所の洗浄に有効である。例3のオーバー
フロー構造の本発明の洗浄装置は、流通口を持たないた
めに側面からの反流による乱流を完全には防止できず、
洗浄槽内でのスムーズな液中噴流が得られないため例1
および例2に比べて洗浄効率は低い。
(Consideration) The cleaning apparatus of the present invention (Examples 1 to 3)
It is recognized that the cleaning efficiency is higher than that of the conventional cleaning apparatus (Example 4). In the cleaning apparatus (Examples 1 and 2) shown in FIGS. 1 and 2 of the present invention, the flux on the surface to be cleaned is completely removed, and the cleaning efficiency is high.
In particular, in Example 2, the flux in the polymerized portion of the article to be washed was completely removed, and the washing efficiency was very good. Therefore,
It is effective for cleaning difficult parts. The cleaning device of the present invention having the overflow structure of Example 3 cannot completely prevent turbulence due to countercurrent from the side because it does not have a flow port,
Example 1 because a smooth submerged jet in the cleaning tank cannot be obtained
And the cleaning efficiency is lower than that of Example 2.

【0027】[0027]

【発明の効果】本発明の洗浄装置によれば、次の効果を
得ることができる。 (1)洗浄液の噴射場所、噴出口からポンプへの吸入口
まで、全て同一の容器(装置)で実施できるので、洗浄
液が洗浄装置外へ漏れる心配がない。 (2)配管の配置の必要がなくなり、全体的に簡素な構
造となり、設計及び製作に要する時間の省力化が実現で
きる。 (3)配管がなくなることにより、非常にコンパクトな
洗浄装置を実現でき、設置容積を小さくすることができ
る。 (4)配管継ぎ目等からの漏れの心配もなく、また取り
外し容易なフィルター、ポンプが設置された構造となっ
ているので、メンテナンス及び洗浄装置の管理が容易で
ある。 (5)液中噴流機構のポンプ噴射口から噴射ノズルまで
の接続距離が短いので、その間の圧損を最小限に抑制す
ることができる。 (6)液中噴流機構を有する洗浄槽内での乱流を低減で
きる。さらには、洗浄槽に流通口を設けることにより、
洗浄槽内での乱流の発生を防止でき洗浄効率を向上でき
る。
According to the cleaning apparatus of the present invention, the following effects can be obtained. (1) Since the cleaning liquid can be implemented in the same container (equipment) from the jetting location and the spout to the suction port of the pump, there is no fear that the cleaning liquid leaks out of the cleaning device. (2) There is no need to arrange pipes, the whole structure becomes simple, and time and labor required for design and manufacture can be saved. (3) By eliminating the piping, a very compact cleaning device can be realized, and the installation volume can be reduced. (4) There is no fear of leakage from the seam of the pipe and the like, and since the filter and the pump are easily detachable, maintenance and management of the cleaning device are easy. (5) Since the connection distance from the pump injection port to the injection nozzle of the submerged jet mechanism is short, pressure loss during the connection can be minimized. (6) Turbulence in a cleaning tank having a submerged jet mechanism can be reduced. Furthermore, by providing a circulation port in the washing tank,
The generation of turbulence in the cleaning tank can be prevented, and the cleaning efficiency can be improved.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の第1実施例に関する洗浄装置を示す概
略説明図である。
FIG. 1 is a schematic explanatory view showing a cleaning apparatus according to a first embodiment of the present invention.

【図2】図1において、洗浄槽の噴射ノズルの後部に流
通口を設けた場合である。
FIG. 2 shows a case where a circulation port is provided in a rear part of an injection nozzle of a cleaning tank in FIG.

【図3】図1の平面図である。FIG. 3 is a plan view of FIG. 1;

【図4】洗浄槽の外側部にも循環部を有する場合の平面
図である。
FIG. 4 is a plan view in a case where a circulation portion is also provided on an outer portion of the cleaning tank.

【符号の説明】[Explanation of symbols]

1 洗浄液 2 洗浄液を仕込む容器 3 洗浄槽 4 被洗浄物 5 噴射ノズル 6 ノズルヘッド 7 ポンプ 8 ポンプの洗浄液の吸入部 9 洗浄槽の洗浄液の流通口 10 フランジ 11 フィルター 12 ドレン 13 清掃口 14 ヒーター REFERENCE SIGNS LIST 1 cleaning liquid 2 container for charging cleaning liquid 3 cleaning tank 4 object to be cleaned 5 injection nozzle 6 nozzle head 7 pump 8 suction part of cleaning liquid of pump 9 cleaning liquid circulation port of cleaning tank 10 flange 11 filter 12 drain 13 cleaning port 14 heater

Claims (5)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 被洗浄物を液中噴流機構により洗浄液を
用いて洗浄する洗浄槽を有する洗浄装置であって、該洗
浄槽が洗浄に使用する洗浄液を貯える容器の内側に設け
られており、かつ該液中噴流機構がポンプに直接接続
し、該ポンプの洗浄液吸入部が該容器中に貯える洗浄液
中にあるような構成になっていることを特徴とする部
品、基板類の洗浄装置。
1. A cleaning apparatus having a cleaning tank for cleaning an object to be cleaned using a cleaning liquid by a submerged jet mechanism, wherein the cleaning tank is provided inside a container for storing a cleaning liquid used for cleaning. The apparatus for cleaning components and substrates is characterized in that the submerged jet mechanism is directly connected to a pump, and the cleaning liquid suction part of the pump is in the cleaning liquid stored in the container.
【請求項2】 洗浄槽の底面および/または側面に洗浄
液の流通口を有する請求項1記載の洗浄装置。
2. The cleaning apparatus according to claim 1, wherein a cleaning liquid circulation port is provided on a bottom surface and / or a side surface of the cleaning tank.
【請求項3】 流通口を洗浄槽の液中噴流機構部の噴流
方向の側面、または噴流方向の側面と噴流方向とは逆の
側面に有する請求項1または2記載の洗浄装置。
3. The cleaning apparatus according to claim 1, wherein the flow port has a side surface in the jet direction of the submerged jet mechanism of the cleaning tank, or a side surface opposite to the jet direction in the jet direction.
【請求項4】 流通口にフィルターを設けてなる請求項
2または3記載の洗浄装置。
4. The cleaning device according to claim 2, wherein a filter is provided in the circulation port.
【請求項5】 洗浄槽の洗浄部が洗浄液を貯える容器中
の洗浄液中に浸漬されるような構成になっている請求項
1、2、3または4記載の洗浄装置。
5. The cleaning apparatus according to claim 1, wherein the cleaning section of the cleaning tank is immersed in the cleaning liquid in a container storing the cleaning liquid.
JP16635194A 1994-06-24 1994-06-24 Cleaning equipment for parts and boards Expired - Lifetime JP3301223B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16635194A JP3301223B2 (en) 1994-06-24 1994-06-24 Cleaning equipment for parts and boards

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16635194A JP3301223B2 (en) 1994-06-24 1994-06-24 Cleaning equipment for parts and boards

Publications (2)

Publication Number Publication Date
JPH081116A JPH081116A (en) 1996-01-09
JP3301223B2 true JP3301223B2 (en) 2002-07-15

Family

ID=15829774

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16635194A Expired - Lifetime JP3301223B2 (en) 1994-06-24 1994-06-24 Cleaning equipment for parts and boards

Country Status (1)

Country Link
JP (1) JP3301223B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108235689A (en) * 2017-11-15 2018-06-29 深圳市诚捷智能装备股份有限公司 A kind of naked product cleaning device of capacitor

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107718384B (en) * 2017-10-20 2020-07-10 山东英科医疗制品有限公司 Butyronitrile gloves hand former belt cleaning device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108235689A (en) * 2017-11-15 2018-06-29 深圳市诚捷智能装备股份有限公司 A kind of naked product cleaning device of capacitor

Also Published As

Publication number Publication date
JPH081116A (en) 1996-01-09

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