JP3300160B2 - Copper foil processing method - Google Patents

Copper foil processing method

Info

Publication number
JP3300160B2
JP3300160B2 JP12364394A JP12364394A JP3300160B2 JP 3300160 B2 JP3300160 B2 JP 3300160B2 JP 12364394 A JP12364394 A JP 12364394A JP 12364394 A JP12364394 A JP 12364394A JP 3300160 B2 JP3300160 B2 JP 3300160B2
Authority
JP
Japan
Prior art keywords
copper foil
treatment
rust
coupling agent
zinc
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP12364394A
Other languages
Japanese (ja)
Other versions
JPH07331454A (en
Inventor
規子 杉山
正志 熊谷
克之 土田
幸男 荻野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eneos Corp
Original Assignee
Japan Energy Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Japan Energy Corp filed Critical Japan Energy Corp
Priority to JP12364394A priority Critical patent/JP3300160B2/en
Publication of JPH07331454A publication Critical patent/JPH07331454A/en
Application granted granted Critical
Publication of JP3300160B2 publication Critical patent/JP3300160B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C2222/00Aspects relating to chemical surface treatment of metallic material by reaction of the surface with a reactive medium
    • C23C2222/20Use of solutions containing silanes

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、銅張積層板等の製造に
用いられる銅箔の処理方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for treating a copper foil used for producing a copper-clad laminate or the like.

【0002】[0002]

【従来の技術】プリント回路用の銅張積層板は銅箔を紙
−フェノール樹脂含浸基材やガラス−エポキシ樹脂含浸
基材に加熱、加圧して積層して形成され、これをエッチ
ングして回路網を形成し、これに半導体装置等の素子を
搭載することにより電子機器用のボードが作られる。こ
れらの過程では、基材との接着、加熱、酸やアルカリ液
への浸漬、レジストインクの塗布、ハンダ付け等が行わ
れるため、銅箔には各種の性能が要求される。例えば、
通常M面(粗化面、以下同様)と呼称されている基材と
接着される側には主として基材との接着性、耐薬品性等
が要求され、又M面の反対側の通常S面(光沢面、以下
同様)と呼称されている側には主として耐熱性、耐湿性
等が要求されている。これらの要求を満たすために、銅
箔のM面には黄銅層形成処理(特公昭51−35711
号公報、同54−6701号公報)、M、S双方の面に
はクロメート処理、亜鉛または酸化亜鉛とクロム酸化物
とからなる亜鉛−クロム基混合物被覆処理等(特公昭5
8−7077号公報)が行われている。ところで、近年
プリント配線板の微細化への要請がますます増大化して
いるが、これに伴うエッチング精度の向上に対応するた
めM面にはさらに低い表面粗さ(ロープロファイル)が
求められている。しかし、M面の表面粗さは一方では基
材との接着にあたって、アンカー効果をもたらしている
ので、M面に対するこのロープロファイルの要求と接着
力の向上とは二律背反の関係にあり、ロープロファイル
化によるアンカー効果の低減分は別の手段による接着力
の向上で補償することが必要である。
2. Description of the Related Art A copper-clad laminate for a printed circuit is formed by laminating a copper foil on a paper-phenol resin-impregnated substrate or a glass-epoxy resin-impregnated substrate by heating and pressing, and etching the circuit. By forming a net and mounting elements such as a semiconductor device on the net, a board for electronic equipment is manufactured. In these processes, the copper foil is required to have various performances because adhesion to a base material, heating, immersion in an acid or an alkaline solution, application of a resist ink, soldering, and the like are performed. For example,
The side which is usually referred to as the M surface (roughened surface, the same applies hereinafter) is required to be mainly adhered to the substrate, chemical resistance, and the like, and the normal S surface opposite to the M surface is required. On the side referred to as a surface (glossy surface, the same applies hereinafter), heat resistance, moisture resistance and the like are mainly required. In order to satisfy these demands, a brass layer forming treatment is performed on the M surface of the copper foil (Japanese Patent Publication No. 51-35711).
JP-A-54-6701), chromate treatment, coating of zinc or a mixture of zinc and chromium groups comprising zinc oxide and chromium oxide on both surfaces of M and S (Japanese Patent Publication No. Sho.
No. 8-7077). By the way, in recent years, the demand for miniaturization of printed wiring boards has been increasing more and more, and in order to cope with the improvement in etching accuracy accompanying this, a further lower surface roughness (low profile) is required on the M surface. . However, on the other hand, the surface roughness of the M surface has an anchor effect in bonding to the base material. Therefore, there is a trade-off relationship between the requirement of the low profile on the M surface and the improvement of the adhesive force. It is necessary to compensate for the reduction of the anchor effect by the improvement of the adhesive force by another means.

【0003】また接着力の増強手段としてあるいは前記
したロープロファイル化に伴う接着力の増強手段として
M面にシランカップリング剤を塗布する方法も提案され
ている(特公平2−19994号公報、特開昭63−1
83178号公報、特開平2−26097号公報)。こ
の種のシランカップリング剤としては、ビニルトリエト
キシシラン、ビニルトリス(2−メトキシエトキシ)シ
ラン、3−メタクリロイルオキシプロピルトリメトキシ
シラン、3−グリシドキシプロピルトリメトキシシラ
ン、2−(3,4−エポキシシクロヘキシル)エチルト
リメトキシシラン、N−2−(アミノエチル)−3−ア
ミノプロピルトリメトキシシラン、N−2−(アミノエ
チル)−3−アミノプロピルメチルジメトキシシラン、
3−アミノプロピルトリエトキシシラン、N−フェニル
−3−アミノプロピルトリメトキシシラン、3−メルカ
プトプロピルトリメトキシシラン、3−クロロプロピル
トリメトキシシラン等が知られている〔「高分子添加剤
の最新技術」120〜134頁、シーエムシー,198
8年1月6日発行〕。
[0003] A method of applying a silane coupling agent to the M surface has also been proposed as a means for increasing the adhesive force or as a means for increasing the adhesive force accompanying the low profile described above (Japanese Patent Publication No. 2-19994, 63-1
83178, JP-A-2-26097). Examples of this type of silane coupling agent include vinyltriethoxysilane, vinyltris (2-methoxyethoxy) silane, 3-methacryloyloxypropyltrimethoxysilane, 3-glycidoxypropyltrimethoxysilane, 2- (3,4- Epoxycyclohexyl) ethyltrimethoxysilane, N-2- (aminoethyl) -3-aminopropyltrimethoxysilane, N-2- (aminoethyl) -3-aminopropylmethyldimethoxysilane,
Known are 3-aminopropyltriethoxysilane, N-phenyl-3-aminopropyltrimethoxysilane, 3-mercaptopropyltrimethoxysilane, 3-chloropropyltrimethoxysilane and the like ["Latest technology of polymer additives" 120-134, CMC, 198.
Published on January 6, 2008].

【0004】[0004]

【発明が解決しようとする課題】上記のようにカップリ
ング剤を用いることによって、ある程度までは接着性を
向上できる。しかしながら、最近プリント回路が緻密化
しているので、使用されるプリント回路用銅箔に要求さ
れる特性はますます厳しくなっている。本発明は、こう
した要請に対応できる、すなわち、とくに銅箔表面と樹
脂基板との接着性を向上し、煮沸後のピール劣化率を改
善する銅箔の表面処理方法を提供することを目的とする
ものである。
By using a coupling agent as described above, the adhesiveness can be improved to some extent. However, as printed circuits are becoming more and more recent, the characteristics required for the copper foil for printed circuits used are becoming increasingly severe. An object of the present invention is to provide a copper foil surface treatment method that can respond to such a demand, that is, in particular, improves the adhesiveness between the copper foil surface and the resin substrate, and improves the rate of peel deterioration after boiling. Things.

【0005】[0005]

【課題を解決するための手段】本発明者は、鋭意検討し
た結果、防錆処理を施した銅箔表面に対し、水酸基を付
与した上でシランカップリング剤を塗布反応させる処理
方法を見出した。すなわち、本発明は銅箔の表面に防錆
処理層を形成し、次いで該防錆処理を施した銅箔表面の
該防錆処理層に水酸基を付与し、さらにカップリング剤
を塗布反応させることを特徴とする銅箔の処理方法をそ
の要旨とするものである。本発明に使用する防錆処理と
しては、銅箔について知られている処理法が適用でき
る。例えば、クロメート処理、亜鉛−クロム基混合物被
覆処理、あるいはこれらを組合わせた処理などを適用す
ることができる。浸漬によるクロメート処理の場合、と
くに好ましい条件は次のとおりである。
Means for Solving the Problems As a result of diligent studies, the present inventor has found a treatment method in which a silane coupling agent is applied to a surface of a copper foil which has been subjected to a rust-preventive treatment, after a hydroxyl group has been imparted thereto. . That is, the present invention forms a rust-proofing layer on the surface of a copper foil , and then imparts a hydroxyl group to the rust-proofing layer on the surface of the copper foil subjected to the rust-proofing treatment, and further comprises a coupling agent. The gist of the present invention is a method for treating a copper foil, which is characterized by performing a coating reaction. As the rust prevention treatment used in the present invention, a treatment method known for copper foil can be applied. For example, a chromate treatment, a zinc-chromium group mixture coating treatment, or a combination thereof can be applied. In the case of chromate treatment by immersion, particularly preferred conditions are as follows.

【0006】K2Cr27:1〜5g/l pH:2.5〜4.5 温度:40〜60℃ 時間:3〜8秒 電解クロメート処理の場合、特に好ましい条件は次のと
おりである。 K2Cr27(あるいはNa2Cr27,CrO3):
0.2〜20g/l 酸:りん酸、硫酸、有機酸 pH:1.0〜3.5 温度:20〜40℃ 電流密度:0.1〜5A/dm2 時間:0.5〜5秒 また、亜鉛−クロム基混合物被覆処理は、クロム酸化物
と亜鉛もしくは酸化亜鉛との混合被覆層を形成するもの
であり、めっき浴としては、例えばK2Cr27,Na2
Cr27等の重クロム酸塩やCrO3等の少なくとも1
種と、亜鉛若しくは水溶性亜鉛塩、例えばZnOやZn
SO4・7H2O等の少なくとも1種と、水酸化アルカリ
との混合水溶液が用いられる。この場合の特に好ましい
めっき浴組成と電解条件は次のとおりである。 K2Cr27(あるいはNa2Cr27,CrO3):2
〜10g/l NaOHあるいはKOH:10〜50g/l ZnOあるいはZnSO4・7H2O:0.05〜10g
/l pH:7〜13 浴温:20〜80℃ 電流密度:0.05〜5A/dm2 時間:5〜30秒 アノード:Pt−Ti板、ステンレス鋼板等 また、以下の条件も好ましい。
K 2 Cr 2 O 7 : 1 to 5 g / l pH: 2.5 to 4.5 Temperature: 40 to 60 ° C. Time: 3 to 8 seconds In the case of electrolytic chromate treatment, particularly preferred conditions are as follows. is there. K 2 Cr 2 O 7 (or Na 2 Cr 2 O 7 , CrO 3 ):
0.2 to 20 g / l Acid: phosphoric acid, sulfuric acid, organic acid pH: 1.0 to 3.5 Temperature: 20 to 40 ° C Current density: 0.1 to 5 A / dm 2 hours: 0.5 to 5 seconds In addition, the zinc-chromium group mixture coating treatment forms a mixed coating layer of chromium oxide and zinc or zinc oxide. As a plating bath, for example, K 2 Cr 2 O 7 , Na 2
Bichromate such as Cr 2 O 7 or at least one such as CrO 3
Species and zinc or a water-soluble zinc salt, such as ZnO or Zn
A mixed aqueous solution of at least one of SO 4 .7H 2 O and the like and an alkali hydroxide is used. Particularly preferred plating bath compositions and electrolysis conditions in this case are as follows. K 2 Cr 2 O 7 (or Na 2 Cr 2 O 7 , CrO 3 ): 2
To 10 g / l NaOH or KOH: 10~50g / l ZnO or ZnSO 4 · 7H 2 O: 0.05~10g
/ L pH: 7 to 13 Bath temperature: 20 to 80 ° C Current density: 0.05 to 5 A / dm 2 hours: 5 to 30 seconds Anode: Pt-Ti plate, stainless steel plate, etc. The following conditions are also preferable.

【0007】K2Cr27:2〜10g/l Zn:0.1〜0.5g/l pH:3.5〜5 浴温:40〜70℃ 電流密度:0.1〜0.5A/dm2 時間:1〜3秒 上記の銅箔表面の防錆処理は、銅箔表面の亜鉛、亜鉛合
金、錫又は錫合金等からなるバリヤー層を介して行うこ
ともできる。本発明の処理方法においては、上記の防錆
処理の後、形成された防錆処理層に水酸基が付与され
る。
K 2 Cr 2 O 7 : 2 to 10 g / l Zn: 0.1 to 0.5 g / l pH: 3.5 to 5 Bath temperature: 40 to 70 ° C. Current density: 0.1 to 0.5 A / Dm 2 hours: 1 to 3 seconds The above rust-proofing treatment of the copper foil surface can also be performed via a barrier layer made of zinc, zinc alloy, tin or tin alloy or the like on the copper foil surface. In the treatment method of the present invention, after the above rust prevention treatment, a hydroxyl group is provided to the formed rust prevention treatment layer.

【0008】水酸基の付与は、防錆処理した銅箔を水蒸
気の存在下に加熱処理したり、沸騰水中へ浸漬すること
により行うことができる。また、防錆処理した銅箔をN
a,Li,Si,ZrあるいはTiの金属アルコキシド
の溶液又は分散液に浸漬、又はこれらの液を表面に塗布
・乾燥させることによって行うこともできる。この場
合、金属アルコキシドが加水分解して形成した金属水酸
化物が銅箔表面の防錆処理層に結合される。又、銅箔表
面の防錆層をアルカリ処理することによっても水酸基を
付与することができる。このようなアルカリとしては水
酸化ナトリウム、水酸化カリウムなどが使用でき、これ
らの溶液に銅箔を浸漬するか、塗布することにより行う
ことができる。
The hydroxyl group can be imparted by subjecting the rust-proofed copper foil to a heat treatment in the presence of steam or immersing it in boiling water. The rust-proofed copper foil is treated with N
It can also be carried out by immersion in a solution or dispersion of a, Li, Si, Zr or Ti metal alkoxide, or by applying and drying these solutions on the surface. In this case, the metal hydroxide formed by hydrolyzing the metal alkoxide is bonded to the rust-proofing layer on the copper foil surface. The hydroxyl group can also be provided by treating the rust-preventive layer on the copper foil surface with an alkali. As such an alkali, sodium hydroxide, potassium hydroxide, or the like can be used, and the alkali can be obtained by immersing or applying a copper foil in these solutions.

【0009】次いで本発明の処理方法においては、銅箔
表面に水酸基導入後、カップリング剤が塗布される。カ
ップリング剤としては、シランカップリング剤が好まし
く、例えばビニルトリエトキシシラン、ビニルトリス
(2−メトキシエトキシ)シラン、3−メタクリロイル
オキシプロピルトリメトキシシラン、3−グリシドキシ
プロピルトリメトキシシラン、2−(3,4−エポキシ
シクロヘキシル)エチルトリメトキシシラン、N−2−
(アミノエチル)−3−アミノプロピルトリメトキシシ
ラン、N−2−(アミノエチル)−3−アミノプロピル
メチルジメトキシシラン、3−アミノプロピルトリエト
キシシラン、N−フェニル−3−アミノプロピルトリメ
トキシシラン、3−メルカプトプロピルトリメトキシシ
ラン、3−クロロプロピルトリメトキシシラン、イミダ
ゾールシラン、テトラエトキシシラン等がある。
Next, in the treatment method of the present invention, a coupling agent is applied to the surface of the copper foil after introducing a hydroxyl group. As the coupling agent, a silane coupling agent is preferable. For example, vinyltriethoxysilane, vinyltris (2-methoxyethoxy) silane, 3-methacryloyloxypropyltrimethoxysilane, 3-glycidoxypropyltrimethoxysilane, 2- ( 3,4-epoxycyclohexyl) ethyltrimethoxysilane, N-2-
(Aminoethyl) -3-aminopropyltrimethoxysilane, N-2- (aminoethyl) -3-aminopropylmethyldimethoxysilane, 3-aminopropyltriethoxysilane, N-phenyl-3-aminopropyltrimethoxysilane, Examples include 3-mercaptopropyltrimethoxysilane, 3-chloropropyltrimethoxysilane, imidazolesilane, tetraethoxysilane and the like.

【0010】カップリング剤は、そのまま直接銅箔表面
に塗布してもよいが、水、エタノール、メタノール等の
アルコール類、更にはアセトン、酢酸エチル、トルエン
等の溶剤で0.001〜20重量%、好ましくは0.0
1〜6重量%になるように希釈し、この溶液に銅箔を浸
漬させる方法で塗布するのが簡便で好ましいが、スプレ
ーして塗布してもよい。0.001重量%未満では煮沸
後のピール強度の改善効果が少なく、又20重量%を超
えると効果が飽和すると共に溶解性が悪くなるので好ま
しくない。なお、カップリング剤溶液には少量の酢酸や
塩酸等の酸を添加してカップリング剤の加水分解を促進
することもできる。銅箔表面には防錆処理層を介して水
酸基が結合しているから、カップリング剤はこの水酸基
と反応することにより銅箔表面に結合することができ
る。次いで銅箔は乾燥される。こうして得られた本発明
の処理方法により処理された銅箔を使用して常法により
銅張積層板を得ることができる。すなわち、ガラス−エ
ポキシ樹脂などの樹脂含浸基材を複数枚重ね、さらにこ
れに処理済み銅箔を重ねて加熱加圧して積層成形するこ
とによって銅張積層板を得ることができる。
The coupling agent may be directly applied to the surface of the copper foil as it is. However, the coupling agent may be added in an amount of 0.001 to 20% by weight with an alcohol such as water, ethanol or methanol, or a solvent such as acetone, ethyl acetate or toluene. , Preferably 0.0
It is simple and preferable to dilute the solution so as to have a concentration of 1 to 6% by weight and dipping a copper foil in this solution. If the amount is less than 0.001% by weight, the effect of improving the peel strength after boiling is small, and if it exceeds 20% by weight, the effect is saturated and the solubility deteriorates. It should be noted that a small amount of an acid such as acetic acid or hydrochloric acid can be added to the coupling agent solution to promote the hydrolysis of the coupling agent. Since the hydroxyl group is bonded to the copper foil surface via the rustproofing layer, the coupling agent can bond to the copper foil surface by reacting with the hydroxyl group. Then the copper foil is dried. A copper-clad laminate can be obtained by a conventional method using the thus obtained copper foil treated by the treatment method of the present invention. That is, a copper-clad laminate can be obtained by laminating a plurality of resin-impregnated base materials such as a glass-epoxy resin, further laminating a treated copper foil thereon, and applying heat and pressure to laminate.

【0011】[0011]

【実施例】【Example】

実施例 電解銅箔(25cm×25cm×33μm)の粗化面に
黄銅層(厚さ:10〜20mg/dm2、Zn/Cu=
3/7)を形成後、さらに亜鉛−クロム基混合物をめっ
き被覆(厚さ:Crとして40〜50μg/dm2、Z
nとして120〜160μg/dm2)して防錆層を形
成した。次いで、沸騰水中に上記防錆処理した銅箔を1
時間浸漬して表面処理することにより銅箔表面に防錆層
を介して水酸基を付与した。さらに3−グリシドキシプ
ロピルトリメトキシシランの0.4重量%水溶液に浸漬
し、カップリング剤処理を行った。処理後、銅箔をクリ
ップで吊り下げ、余分な液を落とした後、100℃の乾
燥器中で30分間乾燥し表面処理銅箔を得た。
Example A brass layer (thickness: 10 to 20 mg / dm 2 , Zn / Cu =) was formed on the roughened surface of an electrolytic copper foil (25 cm × 25 cm × 33 μm).
After forming 3/7), a zinc-chromium group mixture is further plated (thickness: 40 to 50 μg / dm 2 as Cr, Z
n was 120 to 160 μg / dm 2 ) to form a rust preventive layer. Then, the rust-proofed copper foil was placed in boiling water for 1 hour.
Hydroxyl groups were provided on the surface of the copper foil via a rust preventive layer by immersion for a time and surface treatment. Furthermore, it was immersed in a 0.4% by weight aqueous solution of 3-glycidoxypropyltrimethoxysilane to perform a coupling agent treatment. After the treatment, the copper foil was hung with a clip to remove excess liquid, and then dried in a dryer at 100 ° C. for 30 minutes to obtain a surface-treated copper foil.

【0012】比較例1 実施例において沸騰水処理(水酸基付与)を行わなかっ
た他は、実施例と同様にして表面処理銅箔を得た。 比較例2 実施例においてカップリング剤処理を行わなかった他
は、実施例と同様にして表面処理銅箔を得た。 比較例3 実施例において沸騰水処理及びカップリング剤処理を行
わず、防錆処理のみ行い表面処理銅箔を得た。
Comparative Example 1 A surface-treated copper foil was obtained in the same manner as in the example, except that the boiling water treatment (hydroxyl group addition) was not performed. Comparative Example 2 A surface-treated copper foil was obtained in the same manner as in Example except that the coupling agent treatment was not performed. Comparative Example 3 A surface-treated copper foil was obtained by performing only rust prevention treatment without performing boiling water treatment and coupling agent treatment in the example.

【0013】比較例4 実施例において防錆層を形成しない他は実施例と同様に
して表面処理銅箔を得た。これら実施例及び比較例1〜
4で得た表面処理銅箔の粗化面を、ガラス繊維クロスに
エポキシ樹脂を含浸させた基材に接着し、銅張積層板を
得た。この銅張積層板をJIS C 6481に規定す
る方法により常態ピール強度を測定した。またこの銅張
積層板の銅箔をエッチングして、0.1mm幅回路及び
0.2mm幅回路×10本を形成し、2時間煮沸処理し
た後のピール強度を測定し、その強度と煮沸前のピール
強度との差を求め、それを後者で除して得られた%を劣
化率として求めた。その結果を表に示す。
Comparative Example 4 A surface-treated copper foil was obtained in the same manner as in the example except that no rust preventive layer was formed. These Examples and Comparative Examples 1 to
The roughened surface of the surface-treated copper foil obtained in 4 was adhered to a substrate in which a glass fiber cloth was impregnated with an epoxy resin to obtain a copper-clad laminate. The normal peel strength of the copper clad laminate was measured by the method specified in JIS C6481. The copper foil of this copper-clad laminate was etched to form a circuit of 0.1 mm width and 10 circuits of 0.2 mm width, and the peel strength after boiling for 2 hours was measured. And the difference from the peel strength was determined, and the% obtained by dividing the difference by the latter was determined as the deterioration rate. The results are shown in the table.

【0014】[0014]

【表1】 [Table 1]

【0015】[0015]

【発明の効果】以上説明したように、本発明の表面処理
法で処理された銅箔は、煮沸後のピール劣化率が示すと
おり樹脂基板との接着性を向上することができる。
As described above, the copper foil treated by the surface treatment method of the present invention can improve the adhesiveness to the resin substrate as indicated by the peel deterioration rate after boiling.

フロントページの続き (72)発明者 荻野 幸男 埼玉県戸田市新曽南3丁目17番35号 株 式会社ジャパンエナジー内 (56)参考文献 特開 平6−81157(JP,A) 特開 昭61−76684(JP,A) 特開 昭61−23766(JP,A) 特開 昭62−152579(JP,A) 特開 平1−150539(JP,A) 特開 平5−309325(JP,A) 特開 平4−285179(JP,A) (58)調査した分野(Int.Cl.7,DB名) C23C 22/83 H05K 1/09 Continuation of the front page (72) Inventor Yukio Ogino 3--17-3 Nishinaminami, Toda City, Saitama Japan Inside Japan Energy Co., Ltd. (56) References JP-A-6-81157 (JP, A) JP-A-61- 76684 (JP, A) JP-A-61-23766 (JP, A) JP-A-62-152579 (JP, A) JP-A 1-150539 (JP, A) JP-A 5-309325 (JP, A) JP-A-4-285179 (JP, A) (58) Fields investigated (Int. Cl. 7 , DB name) C23C 22/83 H05K 1/09

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 銅箔の表面に防錆処理層を形成し、次い
で該防錆処理を施した銅箔表面の該防錆処理層に水酸基
を付与し、さらにカップリング剤を塗布反応させること
を特徴とする銅箔の処理方法。
1. A forming a rustproofing layer on the surface of the copper foil, then
A method for treating a copper foil, comprising: providing a hydroxyl group to the rust-proofing layer on the surface of the copper foil that has been subjected to the rust-proofing step, and applying a coupling agent thereto.
JP12364394A 1994-06-06 1994-06-06 Copper foil processing method Expired - Fee Related JP3300160B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12364394A JP3300160B2 (en) 1994-06-06 1994-06-06 Copper foil processing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12364394A JP3300160B2 (en) 1994-06-06 1994-06-06 Copper foil processing method

Publications (2)

Publication Number Publication Date
JPH07331454A JPH07331454A (en) 1995-12-19
JP3300160B2 true JP3300160B2 (en) 2002-07-08

Family

ID=14865678

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12364394A Expired - Fee Related JP3300160B2 (en) 1994-06-06 1994-06-06 Copper foil processing method

Country Status (1)

Country Link
JP (1) JP3300160B2 (en)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1894966A1 (en) * 2006-08-31 2008-03-05 Sika Technology AG Aqueous primer composition comprising aminosilane and mercaptosilane
WO2010140540A1 (en) * 2009-06-05 2010-12-09 Jx日鉱日石金属株式会社 Copper foil for semiconductor package substrate and subsrate for semiconductor package
TWI592293B (en) * 2012-03-29 2017-07-21 Jx Nippon Mining & Metals Corp Surface treatment of copper foil
WO2013147116A1 (en) * 2012-03-29 2013-10-03 Jx日鉱日石金属株式会社 Surface-treated copper foil
JP2014208893A (en) * 2013-03-28 2014-11-06 古河電気工業株式会社 Surface-treated copper foil, method of treating surface of the copper foil, copper-clad laminate sheet and method of producing the laminate sheet
JP7366436B2 (en) 2021-05-31 2023-10-23 古河電気工業株式会社 Surface-treated copper foil, copper-clad laminates, and printed wiring boards

Also Published As

Publication number Publication date
JPH07331454A (en) 1995-12-19

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