JP3279035B2 - Photopolymerizable composition and photosensitive material - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

The present invention relates to a photopolymerizable composition. In particular, the present invention relates to a photopolymerizable composition which not only exhibits extremely high sensitivity to light in the visible region but also has excellent stability over time.

[0002]

2. Description of the Related Art Conventionally, many image forming methods using a photopolymerization system are known. For example, a photopolymerizable composition comprising an addition-polymerizable compound containing an ethylenic double bond, a photopolymerization initiator, and an organic polymer binder used as desired is prepared, and the photopolymerizable composition is supported. Create a light-sensitive material with a layer of photopolymerizable composition applied to the body, image-expose the desired image, polymerize and cure the exposed part, and dissolve and remove the unexposed part to form a cured relief image A method wherein the photosensitive material is provided with a layer of a photopolymerizable composition between two supports, at least one of which is transparent,
A method of forming an image by exposing the support after imagewise exposing from the transparent support side to cause a change in adhesive strength due to light, and other methods utilizing a change in toner adhesion due to light of the photopolymerizable composition layer. There are image creation methods and the like. Conventionally, benzoin, benzoin alkyl ether, benzyl ketal, benzophenone, anthraquinone, benzyl, or Michler's ketone has been used as a photopolymerization initiator of the photopolymerizable composition applied to these methods.

[0003] However, these photopolymerization initiators are 4
Compared with the photopolymerization initiation ability for light in the ultraviolet region of 00 nm or less, that for light in the visible region of 400 nm or more is remarkably low, thus limiting the application range of the photopolymerizable compositions containing them. In recent years, with the development of image forming technology, there has been a strong demand for photopolymers having high sensitivity to light rays in the visible region. It is a photosensitive material suitable for, for example, non-contact type projection exposure plate making or laser plate making using a visible light laser. Among these technologies, in particular, 488 of argon ion laser
A plate making method using a nm oscillation beam is considered to be one of the most promising techniques in the future.

[0004] Several proposals have heretofore been made for a photopolymerization composition containing a photopolymerization initiation system capable of responding to light in the visible light region. For example, a system of hexaarylbiimidazole and (p-dialkylaminobenzylidene) ketone (JP-A-47-2528, JP-A-54-155)
No. 292, JP-A-56-166154), a system of ketocoumarin and an activator (JP-A-52-112681,
JP-A-58-15503 and JP-A-60-88005), and a system of a substituted triazine and a sensitizer (JP-A-54-15803).
No. 15,1024, JP-A-58-29803, JP-A-58-29803
Nos. 8-40302), a system of biimidazole, a styrene derivative, and a thiol (JP-A-59-56403), and a system of an organic peroxide and a dye (JP-A-59-1402).
03, JP-A-59-189340) and others,
A system of a titanocene compound and a sensitizer (JP-A-63-2211)
No. 10, JP-A-4-26154, JP-A-4-2197
No. 56, each publication).

[0005]

An object of the present invention is to provide a photopolymerizable composition which is more excellent in practical use such as stability over time.

[0006]

Means for Solving the Problems As a result of intensive studies, the present inventors have found that the use of a pyromethene compound having a specific substituent as a sensitizer for a photopolymerization-initiating system makes it possible to obtain a photopolymerization initiator having a more practical use. The inventors have found that the composition is a polymerizable composition, and have reached the present invention. That is, an object of the present invention is to provide a photopolymerizable composition having better visible sensitivity. Another object of the present invention is to provide a photopolymerizable composition having excellent stability over time. Still another object of the present invention is to provide a photopolymerizable composition which is advantageous in production.

Thus, an object of the present invention is to provide a photopolymerizable composition containing a compound having at least one ethylenically unsaturated bond capable of addition polymerization and a photopolymerization initiation system, wherein the photopolymerization initiation system comprises a) a sensitizer represented by the following general formula [I] and

[0008]

Embedded image

(Wherein, R ^{1 to} R ⁶ are each a hydrogen atom,
Halogen atom, alkyl group, aryl group, aralkyl group, acyl group, alkoxycarbonyl group, substituted or unsubstituted hydrocarbon ring group, substituted or unsubstituted heterocyclic group or-
Represents SO ₃ -R ^8, R ⁸ is a hydrogen atom, an alkyl group,
Aryl group, aralkyl group, alkali metal atom or 4
Represents a quaternary ammonium group. R ⁷ represents an alkyl group having 3 to 20 carbon atoms; X ¹ and X ² each represent a halogen atom, an alkyl group, an aryl group, an aralkyl group, a substituted or unsubstituted hydrocarbon ring group or a substituted or unsubstituted heterocyclic ring; Represents a group. (B) It is easily attained by a photopolymerizable composition characterized by containing at least one activator capable of generating a radical upon irradiation with light in the presence of the sensitizer.

Hereinafter, the present invention will be described in detail. The addition-polymerizable compound having at least one ethylenically unsaturated double bond contained as the first essential component in the photopolymerizable composition of the present invention (hereinafter referred to as “ethylenic compound”
The photopolymerizable composition is addition-polymerized by the action of the photopolymerization initiation system, which is the second essential component, when the photopolymerizable composition is irradiated with actinic rays, and the ethylenically unsaturated double bond is cured. And a polymer having an ethylenically unsaturated double bond in a side chain or a main chain, for example. In the present invention, the meaning of the monomer is a concept corresponding to a so-called polymer substance, and therefore includes not only monomers in a narrow sense but also dimers, trimers, and oligomers. is there.

Examples of the monomer having an ethylenically unsaturated bond include an unsaturated carboxylic acid, an ester of an aliphatic polyhydroxy compound and an unsaturated carboxylic acid; an ester of an aromatic polyhydroxy compound and an unsaturated carboxylic acid; Esters obtained by an esterification reaction of a saturated carboxylic acid with a polyvalent carboxylic acid and a polyvalent hydroxy compound such as the above-mentioned aliphatic polyhydroxy compound and aromatic polyhydroxy compound are exemplified.

The ester of the aliphatic polyhydroxy compound and the unsaturated carboxylic acid is not limited, but specific examples include ethylene glycol diacrylate, triethylene glycol diacrylate, trimethylolpropane triacrylate, and trimethylolethane triacrylate. Acrylates such as pentaerythritol diacrylate, pentaerythritol triacrylate, pentaerythritol tetraacrylate, dipentaerythritol tetraacrylate, dipentaerythritol pentaacrylate, dipentaerythritol hexaacrylate, glycerol acrylate, and the acrylates of these exemplified compounds as methacrylates Methacrylic acid ester replaced with itaconic acid ester similarly replaced with itaconate Crotonate is maleic acid ester, and was replaced with crotonic acid ester or maleate was replaced.

Examples of the ester of the aromatic polyhydroxy compound with the unsaturated carboxylic acid include hydroquinone diacrylate, hydroquinone dimethacrylate, resorcin diacrylate, resorcin dimethacrylate, and pyrogallol triacrylate. The ester obtained by the esterification reaction between the unsaturated carboxylic acid and the polyhydric carboxylic acid and the polyhydric hydroxy compound is not necessarily a single substance, but typical examples include acrylic acid, phthalic acid and ethylene glycol. Condensates, condensates of acrylic acid, maleic acid and diethylene glycol, condensates of methacrylic acid, terephthalic acid and pentaerythritol, condensates of acrylic acid, adipic acid, butanediol and glycerin, and the like.

Other examples of the ethylenic compound used in the present invention include acrylamides such as ethylenebisacrylamide; allyl esters such as diallyl phthalate;
A vinyl group-containing compound such as divinyl phthalate is useful. The polymer having an ethylenically unsaturated bond in the main chain is, for example, a polyester obtained by a polycondensation reaction between an unsaturated divalent carboxylic acid and a dihydroxy compound,
There is a polyamide obtained by a polycondensation reaction between an unsaturated divalent carboxylic acid and a diamine. The polymer having an ethylenically unsaturated bond in the side chain includes a condensation polymer of a divalent carboxylic acid having an unsaturated bond in the side chain such as itaconic acid, propylidene succinic acid, ethylidene malonic acid and a dihydroxy or diamine compound. . Further, a polymer having a functional group having a reactive activity such as a hydroxy group or a methyl halide group in a side chain, for example, polyvinyl alcohol, poly (2-hydroxyethyl methacrylate), polyepichlorohydrin, etc., and acrylic acid, methacrylic acid, crotonic acid, etc. A polymer obtained by a polymer reaction with an unsaturated carboxylic acid of formula (I) can also be suitably used.

[0015] Of the ethylenic compounds described above, acrylate or methacrylate monomers can be particularly preferably used. Next, the photopolymerization initiation system, which is the second essential component of the photopolymerization composition of the present invention, will be described. The photopolymerization initiation system of the present invention is composed of a combination of two kinds of components. The first component has a structure of the pyrromethene complex represented by the above-mentioned general formula [I] represented by (a) in the present invention. It has a sensitizer.

These sensitizers include, but are not limited to, for example, US Pat. H. Boger
et al, Hetroatom Chemistr
y, Vol. 1, 5, 389 (1990). As for the photopolymerizable composition containing the sensitizer, some of the present inventors have already proposed a highly sensitive photopolymerizable composition (JP-A-5-241338).
Gazette, Japanese Patent Application No. 5-83587). The present inventors have further studied the photopolymerizable composition as a result, and as a result of adopting a group of sensitizers having a specific substituent among the sensitizers, in addition to sensitivity, stability over time. The present inventors have found that a photopolymerizable composition having excellent properties and production difficulty and having extremely excellent practicality can be obtained, and arrived at the present invention.

That is, the sensitizer which characterizes the present invention is a compound wherein R ⁷ in the general formula [I] has an alkyl group having 3 to 20 carbon atoms and having a straight or side chain. More preferably, R ⁷ is a compound having an alkyl group having 3 to 12 carbon atoms. If the carbon number is too small,
Crystals may be gradually precipitated in the photosensitive material containing the same to deteriorate the characteristics of the photosensitive material. On the other hand, if the amount is too large or too small, the reactivity during the production of the sensitizer and the isolation characteristics may be disadvantageous. I found a thing.

Referring to the other substituents in the general formula [I], R ^{1 to} R ⁶ each represent a hydrogen atom, a halogen atom, an alkyl group, an aryl group, an aralkyl group, an acyl group, an alkoxycarbonyl group, a substituted or unsubstituted group. substituted hydrocarbon ring group, a substituted or unsubstituted heterocyclic group or -SO ₃ -R
Represents ^8, R ⁸ is a hydrogen atom, an alkyl group, an aryl group, an aralkyl group, an alkali metal atom or represents a quaternary ammonium group, X ¹ and X ² are each halogen atom, an alkyl group, an aryl group, an aralkyl group, a substituted Or an unsubstituted hydrocarbon ring group or a substituted or unsubstituted heterocyclic group.

When R ^{1 to} R ⁶ , R ⁸ , X ¹ and X ² each represent an alkyl group, it preferably has 1 to 6 carbon atoms, particularly preferably 1 to 3 carbon atoms.
It may be linear or have a side chain. When R ^{1 to} R ⁶ each represent an aralkyl group, an acyl group, or an alkoxycarbonyl group, or when R ⁸ , X ¹ and X ² each represent an aralkyl group, the number of carbon atoms in the alkyl portion is 1 to 3, respectively. It is particularly preferred that there is. R
^{When 1 to} R ⁶ , X ¹ and X ² each represent a halogen atom, it is generally preferred that they are a bromine atom or a chlorine atom, and when R ⁸ represents an alkali metal atom,
Generally, a lithium atom, a sodium atom or a potassium atom is preferred. R ^{1 to} R ⁶ , X ¹ and X
^When each of ² represents a hydrocarbon ring group, the hydrocarbon ring is preferably mononuclear or dinuclear, and when there is a substituent, it is particularly preferably an alkyl group having 1 to 3 carbon atoms. Further, it is generally preferable that the hetero atom contained in the heterocyclic group is a nitrogen atom, an oxygen atom or a sulfur atom.

Hereinafter, typical examples of the sensitizer represented by the general formula [I] will be given. However, the sensitizer represented by the general formula [I] used in the present invention is not limited to these specific examples. Absent. In the following examples, unless otherwise specified, R ¹ , R ³ , R ⁴ and R ⁶ represent a methyl group,
X ¹ and X ² represent a fluorine atom.

[0021]

[Table 1] Compound examples [I-1] R ² and R ⁵ : ethyl group, R ⁷ : n-butyl group [I-2] R ² and R ⁵ : ethyl group, R ⁷ : n-pentyl group [I -3] R ² and R ⁵ : ethyl group, R ⁷ : n-hexyl group [I-4] R ² and R ⁵ : ethyl group, R ⁷ : n-heptyl group [I-5] R ² and R ⁵ : Ethyl group, R ⁷ : 2-ethylpentyl group [I-6] R ² and R ⁵ : ethyl group, R ⁷ : iso
-Propyl group [I-7] R ² and R ⁵ : ethyl group, R ⁷ : n-decyl group [I-8] R ² and R ⁵ : ethyl group, R ⁷ : n-lauryl group [I-9] R ² and R ⁵ : hydrogen atom, R ⁷ : n-pentyl group [I-10] R ² and R ⁵ : methyl group, R ⁷ : n-pentyl group [I-11] R ² and R ⁵ : methyl group , R ⁷ : n-hexyl group [I-12] R ² and R ⁵ : ethoxycarbonyl group,
R ⁷ : n-butyl group [I-13] R ² and R ⁵ : sulfonylethyl group, R
⁷ : n-pentyl group In the present invention, at least one of the above sensitizers is selected for use.

The second component constituting the photoinitiating system of the present invention is an activator capable of generating an active radical when irradiated with light in the presence of the above-mentioned sensitizer represented by (b) in the present invention. It is. Any of these activators can be used as long as they have a property of generating an active radical by causing some action with the photoexcited sensitizer. Examples include titanocene compounds, hexaarylbiimidazoles, halogenated hydrocarbon derivatives, organic thiol compounds, diaryliodonium salts, and organic peroxides.

Of these, particularly preferred are titanocene compounds. The titanocene compound is not particularly limited, but is described in, for example, JP-A-59-152396,
It can be used by appropriately selecting from various titanocene compounds described in each publication of 1-1151197. More specifically, di-cyclopentadienyl-Ti-di-
Chloride, di-cyclopentadienyl-Ti-bis-
Phenyl, di-cyclopentadienyl-Ti-bis-
2,3,4,5,6-pentafluorophenyl-1-1-1
Yl, di-cyclopentadienyl-Ti-bis-2,
3,5,6-tetrafluorophenyl-1-yl, di-cyclopentadienyl-Ti-2,4,6-trifluorophenyl-1-yl, di-cyclopentadienyl-Ti-
Bis-2,6-di-fluorophenyl-1-yl, di-cyclopentadienyl-Ti-bis-2,4-di-fluorophenyl-1-yl, di-methylcyclopentadienyl-Ti-bis -2,3,4,5,6-pentafluorophenyl-1-yl, di-methylcyclopentadienyl-T
i-bis-2,3,5,6-tetrafluorophenyl-1
-Yl, di-methylcyclopentadienyl-Ti-bis-2,6-difluorophenyl-1-yl, di-cyclopentadienyl-Ti-bis-2,6-difluoro-3-
(Pyr-1-yl) -phenyl-1-yl (hereinafter B-1
It is expressed as ) And the like.

Suitable amounts of the sensitizer and activator constituting the photopolymerization initiation system used in the above-described photopolymerizable composition of the present invention are not particularly limited.
The sensitizer is generally used in an amount of 0.05 to 20 parts by weight based on 00 parts by weight.
Parts by weight, preferably from 0.2 to 10 parts by weight, and the activator is generally used in a proportion of 0.1 to 100 parts by weight, preferably 0.5 to 50 parts by weight. I have.

In the photopolymerizable composition of the present invention, it is preferable to further add an organic polymer substance as a binder for modifying the composition and improving physical properties after photocuring, in addition to the above-mentioned constituents. . The binder may be appropriately selected according to the purpose of improving compatibility, film forming property, developability, adhesiveness and the like. Specifically, for example, for improving aqueous developability, acrylic acid copolymer, methacrylic acid copolymer, itaconic acid copolymer, partially esterified maleic acid copolymer, modified acidic cellulose having a carboxyl group in a side chain, Examples include polyethylene oxide and polyvinylpyrrolidone. Polyether of epichlorohydrin and bisphenol A for improving film strength and adhesion; soluble nylon; polyalkyl methacrylate and polyalkyl acrylate such as polymethyl methacrylate; alkyl methacrylate and acrylonitrile, acrylic acid, methacrylic acid Copolymer of acrylonitrile with vinyl chloride and vinylidene chloride; copolymer of vinylidene chloride, chlorinated polyolefin, copolymer of vinyl chloride and vinyl acetate; polyvinyl acetate; Copolymer of acrylonitrile and styrene; copolymer of acrylonitrile and butadiene, styrene; polyvinyl alkyl ether; polyvinyl alkyl ketone; polystyrene; polyamide; polyurethane; polyethylene terephthalate isophthalate Mention may be made of acetyl cellulose and polyvinyl butyral. These binders are generally not more than 500%, more preferably not more than 20% by weight based on the ethylenic compound.
It can be added and mixed in a range of 0% or less.

The photopolymerizable composition of the present invention may further comprise, if necessary, a thermal polymerization inhibitor, a coloring agent, a plasticizer, a surface protecting agent, a leveling agent,
Coating aids and other additives can be added. Examples of the thermal polymerization inhibitor include hydroquinone, p-methoxyphenol, pyrogallol, catechol, and 2,6-di-
There are t-butyl-p-cresol, β-naphthol, and the like. Examples of the coloring agent include phthalocyanine pigments, azo pigments, carbon black, pigments such as titanium oxide, ethyl violet, crystal violet, azo dyes, and anthraquinone dyes. And cyanine dyes. When the binder is used, the amount of the thermal polymerization inhibitor and the colorant is 0.01% to 3% and the amount of the colorant is 0.1% to 3% based on the total weight of the ethylenic compound and the binder. 1%
It is preferable to select from the range of ２０20%.

Examples of the plasticizer include dioctyl phthalate, didodecyl phthalate, triethylene glycol dicaprylate, dimethyl glycol phthalate, tricresyl phosphate, dioctyl adipate, dibutyl sebacate, and triacetyl glycerin. When is used, it is common to add 20% or less based on the total weight of the ethylenic compound and the binder.

When using the photopolymerizable composition of the present invention,
The light-sensitive material can be prepared by forming a light-sensitive material without a solvent or dissolving it in a suitable solvent to form a solution, coating the solution on a support and drying. Examples of the solvent include methyl ethyl ketone, cyclohexanone, butyl acetate, amyl acetate, ethyl propionate, toluene, xylene, monochlorobenzene, carbon tetrachloride, trichloroethylene,
There are trichloroethane, dimethylformamide, methyl cellosolve, ethyl cellosolve, tetrahydrofuran, bentoxone and the like, and one kind or two or more kinds can be used in combination.

The support applied when preparing the light-sensitive material using the photopolymerizable composition of the present invention may be any of those commonly used. For example, sheets of metals such as aluminum, magnesium, copper, zinc, chromium, nickel, iron or alloys containing these as main components; fine paper, art paper,
Papers such as release paper; inorganic sheets such as glass and ceramics; polyethylene terephthalate, polyethylene, polymethyl methacrylate, vinyl chloride, vinyl chloride-vinylidene chloride copolymer, polystyrene, 6-nylon, cellulose triacetate, cellulose acetate butyrate, etc. Polymer sheet.

Further, the photopolymerizable composition of the present invention can further be a known technique for preventing adverse effects such as a decrease in sensitivity and a deterioration in storage stability due to oxygen, for example, providing a peelable transparent cover sheet on a photosensitive layer. A low oxygen permeable waxy substance,
A coating layer of a water-soluble polymer or the like may be provided.
The exposure light source which can be applied to the composition of the present invention is not particularly limited. A general-purpose light source including the above can be more preferably used.

[0031]

EXAMPLES Hereinafter, the present invention will be described more specifically with reference to examples and comparative examples, but the present invention is not limited to these examples unless it exceeds the gist of the present invention. In addition, in order to evaluate the most characteristic feature of the sensitizer of the present invention, the characteristics of maintaining stable solubility in a stable photosensitive material were evaluated by the following methods in Examples 2 to 7 and Comparative Example 2 below. . That is, the optical density in the range of 500 to 550 nm shown during the dissolution of the sensitizer was measured over time, and the dissolution retention period was determined by a method for detecting the decrease in the optical density caused by crystallization. At that time, a sample was prepared by preparing a light-sensitive material containing an excess amount of a sensitizer corresponding to the accelerated test conditions.

On the other hand, the production difficulty of the sensitizer was defined as "easy" when the yield was 50% or more, and "slightly easy" when 30% to 50%.

Example 1 5 g of a methyl methacrylate / methacrylic acid copolymer (weight average molecular weight: 45,000, polymerization ratio: 85/15) and 5 g of trimethylolpropane triacrylate were dissolved in 90 g of methyl ethyl ketone. 2 g of the above-mentioned I-2 and 2 g of the titanocene compound B-1 were added and dissolved as a sensitizer to obtain a sample photosensitive solution.

On a grained and anodized aluminum sheet, the above-mentioned photosensitive solution is applied to a dry film thickness of 2 μm using a wheeler, and a polyvinyl alcohol aqueous solution is further coated on the surface with a dry film thickness. It was coated to 3 μm to prepare a photosensitive material sample. Next, a xenon lamp; UXL-100 manufactured by Ushio Electric Co., Ltd.
Using 0-DO, irradiation was performed for 10 seconds using a spectral sensitivity measuring device manufactured by Narumi Co., Ltd. such that the horizontal axis was wavelength and the vertical axis was logarithmically weak in light intensity. Exposure samples were butyl cellosolve 2% by weight,
Development is carried out with an aqueous solution containing 1% by weight of sodium silicate, and the height of the cured image corresponding to each wavelength obtained is
The smallest exposure required for the formation of a photocurable image was calculated and defined as the sensitivity at each wavelength of the photosensitive composition. As a result, the wavelength 53
The sensitivity corresponding to 0 nm was 160 μJ / cm ² .
No change was observed in the appearance of the photosensitive layer and the aforementioned sensitivity after the photosensitive material sample was left at room temperature for 5 months.

Comparative Example 1 The following R-1 was used in Example 1 in place of the sensitizer I-2.
A light-sensitive material sample was prepared in the same manner as described above except for the above. What
This R-1 is described in JP-A-5-241338.
Sensitizer. R-1: R in sensitizer I-2⁷To
A compound having the same structure except that it has been changed to a methyl group (that is,
In general formula I, R¹= R^Three= R^Four= R⁶= Methyl group,
R^Two= R ^Five= Ethyl group, X¹= X^Two= Fuso atom, R⁷
= Methyl group compound] The sensitivity was measured by the same method.
Result, 170 μJ / cm^TwoThe value of was shown. Same photosensitive material
After leaving the sample at room temperature for 2 months, the sensitivity was 280 μJ /
cm^TwoCrystallization of the sensitizer in the photosensitive layer
Was observed.

Examples 2 to 6 and Comparative Example 2 The same method as in Example 1 except that the sensitizer described in Table 1 below was used and the amount of the sensitizer added was changed to 4 g. To prepare a photosensitive material sample. The obtained sample was left at room temperature, and the solubility retention period of the sensitizer was determined by the method described above.

On the other hand, from the yield of the sensitizer prepared according to the method described in the above-mentioned literature, the difficulty of the production of the sensitizer was also judged according to the aforementioned criteria. These results are shown in Table 1.

[0038]

[Table 2]

[0039]

The photopolymerizable composition of the present invention has extremely high sensitivity to visible light, and has excellent storage stability with time and difficulty in production. Therefore, the composition is useful in a wide range of application fields, for example, lithographic, intaglio, making printing plates such as letterpress, photoresist for making printed wiring and IC,
It is industrially extremely useful because it can be used for dry film, image formation such as relief images and image duplication, photocurable inks, paints and adhesives.

──────────────────────────────────────────────────続 き Continuation of the front page (72) Inventor Masaaki Tsuchiyama 1000 Kamoshita-cho, Midori-ku, Yokohama-shi, Kanagawa Prefecture, Mitsubishi Chemical Research Institute (56) References JP-A-1-298348 (JP, A) 2-244050 (JP, A) JP-A-5-5988 (JP, A) JP-A 4-271352 (JP, A) JP-A 5-241338 (JP, A) US Patent 5,187,288 (US, A) US Patent 4774339 (US, A) (58) Fields investigated (Int. Cl. ⁷ , DB name) G03F 7/004 503 G03F 7/00 501 G03F 7/027 502 G03F 7/028

Claims (2)

(57) [Claims] 1. A photopolymerizable composition comprising a compound having at least one ethylenically unsaturated double bond capable of addition polymerization and a photopolymerization initiation system, wherein the photopolymerization initiation system comprises (a) a compound represented by the following general formula [ A sensitizer represented by the formula (I): (Wherein, R ^{1 to} R ⁶ each represent a hydrogen atom, a halogen atom,
Alkyl group, an aryl group, an aralkyl group, an acyl group, an alkoxycarbonyl group, a substituted or unsubstituted hydrocarbon ring group, a heterocyclic group or -SO ₃ -R ⁸ substituted or unsubstituted, R ⁸ is a hydrogen atom, Represents an alkyl group, an aryl group, an aralkyl group, an alkali metal atom or a quaternary ammonium group. R ⁷ represents an alkyl group having 3 to 20 carbon atoms; X ¹ and X ² each represent a halogen atom, an alkyl group, an aryl group, an aralkyl group, a substituted or unsubstituted hydrocarbon ring group or a substituted or unsubstituted heterocyclic ring; Represents a group. (B) A photopolymerizable composition containing at least one activator capable of generating a radical upon irradiation with light in the presence of the sensitizer. 2. The photopolymerizable composition according to claim 1, which is provided on a support.
A photosensitive material having a layer containing the composition.