JP3264995B2 - Liquid crystal display - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a liquid crystal display device in which a liquid crystal composition is held between a pair of electrodes, and more particularly to an electrode structure thereof.

[0002]

2. Description of the Related Art In recent years, liquid crystal display devices have been used in various fields for television display and graphic display, taking advantage of their features of small size, light weight and low power consumption.

As a liquid crystal display device, for example, in addition to a simple matrix type in which a liquid crystal composition is sandwiched between a pair of striped electrodes arranged in a matrix, a switching element is provided for each display pixel. There are various types such as an active matrix type.

However, what is required for any of these liquid crystal display devices is that at least one of the electrode substrates is formed to be transparent. That is, it is necessary to make the electrodes as well as the substrate light-transmitting.

[0005] In general, transparent electrode materials include, for example, NESA (tin oxide) film, I.O. T. O. (Indium Tin O
xide) Films and the like are well known. In particular, I. T. O. The demand for a transparent electrode material is steadily increasing because the film is easier to pattern by a photo-etching process and the like, and also has a higher light transmittance and higher conductivity than other transparent electrode materials. I have.

[0006]

The above-mentioned I.D. T. O. Indium (In) is used for the film. However, indium (In) is a very rare metal and is difficult to recover. T.
O. The development of transparent electrode materials in place of films has been actively pursued.

SUMMARY OF THE INVENTION The present invention has been made in view of the above-described problems, and has been made in consideration of the problems described above. T. O. It is an object of the present invention to provide a liquid crystal display device having an electrode instead of a film.

[0008]

The present invention provides a first electrode substrate on which a first electrode is formed, a second electrode substrate on which a second electrode is formed, A liquid crystal display device comprising: a liquid crystal composition held between the first electrode and the second electrode; and a liquid crystal display device having a display pixel at an intersection of the first electrode and the second electrode. At least one of the first electrode and the second electrode is made of a material that does not contain indium, is formed at a pitch of 5 to 40 microns, and has at least two sides of the first electrode substrate and the second electrode.
The second electrode substrate is made of a light-shielding conductor having a plurality of light-transmitting holes arranged substantially parallel to a diagonal direction of the second electrode substrate .

Further, the present invention provides a first electrode substrate on which a first electrode is formed, a second electrode substrate on which a second electrode is formed, the first electrode and the second electrode. And a liquid crystal composition held between the first electrode and the second electrode.
In a liquid crystal display device in which a display pixel is formed at an intersection with an electrode of the first electrode and the second electrode of the display pixel,
At least one of the electrodes is made of an indium-free material, is formed at a pitch of 5 to 40 microns, and
At least two sides have the first electrode substrate and the second electrode
It is characterized by comprising a light-shielding conductor having a plurality of light-transmitting slits arranged substantially parallel to the diagonal direction of the substrate .

[0010]

As described above, the liquid crystal display of the present invention has a light-shielding conductor in which at least one of the pair of electrodes has a light-transmitting hole or a light-transmitting slit.

By providing a light-transmitting hole or a light-transmitting slit in the electrode, a sufficient light transmittance can be obtained even when the electrode is made of a light-shielding conductor. Then, it was confirmed that even when the light transmitting hole or the light transmitting slit was provided in the electrode, the liquid crystal composition inside the light transmitting hole or the light transmitting slit of the electrode responded sufficiently.

When the electrode is provided with the light-transmitting hole or the light-transmitting slit, the principle of the response of the liquid crystal composition inside the light-transmitting hole or the light-transmitting slit is not clear, but the electric force from the electrode is not clear. It is thought to be due to line and charge accumulation.

FIG. 11 shows the ratio of the optical response of the liquid crystal composition in contact with the insulating region inside the rectangular light-transmitting hole on the vertical axis, and the light-transmitting hole pitch on the horizontal axis. . The curve (a) in the figure shows the case where the motor was driven at a response speed of 50 msec, the curve (b) in the diagram shows the case where the motor was driven at a response speed of 100 msec, and the curve (c) in the diagram shows the case where the motor was driven at a response speed of 200 msec. Each case is shown. Incidentally, the light transmission hole pitch or light transmission slit pitch in the present specification,
It indicates the distance between the centers of gravity of adjacent light transmitting holes or light transmitting slits.

From this figure, it can be understood that the response of the liquid crystal composition can be 60% or more even when the light-transmitting hole pitch is set to 15 μm or less, even when driven at a high response speed of 50 msec. it can.

In view of the above, the pitch of the light-transmitting holes or the pitch of the light-transmitting slits is practically preferably 5 to 40 microns, more preferably 5 to 15 microns. If the pitch is smaller than 5 microns, the patterning accuracy of the light-shielding conductor is reduced, and there is a possibility that disconnection, poor drilling and the like may occur. On the other hand, if the pitch is larger than 40 microns, the ratio of the optical response of the liquid crystal composition decreases, and a good display image may not be obtained.

As for the line width between the adjacent light-transmitting holes or light-transmitting slits of the light-shielding conductor having the light-transmitting holes or the light-transmitting slits, the aperture ratio of the liquid crystal display device is maximized. Should be adjusted as follows. If the line width between the light-transmitting slits is 5 μm or less, the aperture ratio of the liquid crystal display device can be relatively easily increased to 60% or more.

The light-transmitting holes or the light-transmitting slits may be arranged such that at least two sides are substantially parallel to the rubbing direction or to be substantially parallel to the rubbing direction. It is good to arrange a slit for light transmission. By arranging the light-transmitting holes or the light-transmitting slits as described above, the contour of the light-shielding conductor that is in contact with the rubbing direction at an angle can be reduced, so that poor alignment does not occur.

This operation will be described in more detail with reference to FIGS. The pixel electrodes provided on the matrix array substrate of the liquid crystal display device are composed of a light-shielding conductor (601) having a square light-transmitting hole (611) as shown in FIG. 13, and the diagonal line of the light-transmitting hole (611) is When arranged so as to coincide with the rubbing processing direction, a portion (62) near the contour of the light-shielding conductor (601) that contacts the rubbing processing direction at an angle
Poor alignment occurs in 1). This is a light-shielding conductor (601)
And the region where the light-shielding conductor (601) does not exist, the height of the alignment film is different. In 621), it is considered that the alignment film is not sufficiently subjected to the alignment treatment.

On the other hand, as shown in FIG. 12, a light-shielding conductor having a light transmitting hole (711) such that at least two sides of the light transmitting hole (711) are substantially parallel to the rubbing direction.
If (701) is configured, a portion (721) near the contour of the light-shielding conductor (701) contacting at an angle to the rubbing direction
Can be reduced, whereby poor alignment can be suppressed.

Further, at least one electrode of the liquid crystal display device may be constituted by a light-shielding conductor having a light-transmitting hole or a light-transmitting slit, and a transparent resistor having a higher resistance than the light-shielding conductor. . With such a laminated structure,
Since the light-transmitting hole or the light-transmitting slit can be made as large as about 40 microns, the aperture ratio can be further improved while securing a sufficient response speed as a liquid crystal display device.

As the light-shielding conductor in the present invention, for example, a metal, an alloy, an amorphous body, a polycrystal, or the like can be used. Examples of the metal include aluminum (Al) and tantalum (Ta), which have particularly high conductivity and are easy to pattern.
Examples of the amorphous body or the polycrystalline body include amorphous silicon (a-Si) and polysilicon (p-Si) which can be easily and uniformly manufactured.

As the transparent resistor in the present invention, for example, tantalum oxide, tungsten oxide, molybdenum oxide,
Zinc oxide etc. can be used, and the volume resistance value is 10 ~
It is preferably about 106 Ω · cm. Hereinafter, the present invention will be described in detail with reference to examples.

[0023]

FIG. 1 is a schematic structural view of a matrix array substrate (71) of a liquid crystal display (1) according to a first embodiment of the present invention, and FIG. 2 is a sectional view taken along the line AA 'in FIG. 1 shows a schematic cross-sectional view of a liquid crystal display device (1).

A plurality of signal electrodes (21) and scanning electrodes (31) are arranged in a matrix on a transparent glass substrate (11), and a channel region (41a) is formed of amorphous silicon at each intersection. Thin film transistor composed of (a-Si) film (41)
Is connected to a pixel electrode (51) made of a light-shielding conductor (53) having a light-transmitting hole (52). The light-shielding conductor (53) is made of a film made of a material that blocks light or a conductive material that attenuates light, for example, an a-Si film, and has a light-transmitting hole (5).
2) is a square shape having a light transmission hole pitch (P1) of 15 microns and a plurality of lines arranged at a line width of 4 microns. Then, on this, an alignment film (61) rubbed in a predetermined direction is provided, and a matrix array substrate (7
1) is composed. I.I. on a transparent glass substrate (111). T. O. Film common electrode (151), alignment film (16
The counter electrode substrate (171) is configured by sequentially installing 1).

The pixel electrode (51) having such a structure and the common electrode
(151) and the liquid crystal composition (10
The liquid crystal display device (1) is constructed by sandwiching the first and second polarizers (81) and (181) on the outer surfaces of the matrix array substrate (71) and the counter electrode substrate (171). The pitch at which the liquid crystal composition (101) is sandwiched is preferably 5 to
By setting the pitch to 10 microns, the liquid crystal composition (101) in the light transmitting hole (52) can also respond sufficiently.

Next, a method of manufacturing the liquid crystal display device (1) of this embodiment will be described with reference to FIG. First, FIG.
As shown in (a), a tantalum (Ta) film is formed on a transparent glass substrate (11) to a thickness of 3000 angstroms by sputtering, and a plurality of scan electrodes (31) and scan electrodes are formed by a photoetching process. A gate electrode (31a) connected to (31) is formed.

Next, an insulating film (35) made of SiOx is
By forming a film of Å in thickness, and further forming an a-Si film to be a channel region (41a) of the thin film transistor (41) to a thickness of 2,000 Å by plasma CVD, and patterning the film. 3
The channel region (41a) of the thin film transistor (41) as shown in (b), and the light transmission hole pitch (P1) is 15 microns,
A light-shielding conductor (5) having a light transmitting hole (52) with a line width of 4 microns
3) is formed as a pixel electrode (51). At this time, the thickness of the light-shielding conductor (53) made of an a-Si film is particularly preferably 2000 Å or more in consideration of a reduction in resistance.

Next, an aluminum (Al) film is deposited by sputtering so as to have a thickness of 5000 angstroms, and is patterned as shown in FIG. 3 (c) to form a signal electrode (21) and a thin film transistor (41). Drain electrode (21a) for connecting to the channel region (41a) of the
Then, a source electrode (51a) for connecting the pixel electrode (51) and the channel region (41a) of the thin film transistor (41) is formed. Then, as shown in FIG. 3D, an orientation film (61) is provided, and a rubbing process is performed in a predetermined direction to form a matrix array substrate (71).

According to the liquid crystal display device (1) of the first embodiment of the present invention, the pixel electrode (51) has a plurality of light transmitting holes (52).
Light-shielding conductor made of a-Si film having a predetermined pitch
Therefore, the amount of indium (In), which is a rare metal, can be reduced. The light transmittance of the black-and-white liquid crystal display device (1) is also 17%, and the pixel electrode (51) is set to I.D. T. O. There was no inferiority to the case where the film was used. In particular, a-
The use of a Si film greatly reduces the resistance value during light irradiation, and is therefore very useful as an electrode material.

Further, the liquid crystal display device (1) of the embodiment described above
According to the channel region (41) of the thin film transistor (41)
a) Because it can be manufactured in the same process at the time of formation,
The number of manufacturing steps can be reduced as compared with the case where the pixel electrodes (51) are individually formed.

In the first embodiment described above, the rubbing direction of the alignment film (61) and the arrangement of the light-transmitting holes (52) provided in the light-shielding conductor (53) are the same as those of the light-transmitting holes (52). Is not parallel to the rubbing direction, but as shown in FIG.
Are arranged to form a matrix array substrate (72), whereby a further effect can be obtained.

That is, the matrix array substrate (72) is provided with a pixel electrode (51) in which two sides of a rectangular light-transmitting hole (52) are arranged in a direction coinciding with the rubbing direction of the alignment film (61). Have.

By constructing a liquid crystal display device using such a matrix array substrate (72), in addition to the above-described embodiment, the outline of the light-transmitting hole (52) contacting at an angle to the rubbing direction is further improved. Can be reduced, whereby defective alignment is eliminated, and a display image with a large contrast ratio can be obtained effectively.

Light-transmitting hole (52) provided in light-shielding conductor (53)
As the shape, in addition to the square shape in the above-described embodiment, a hexagonal light-transmitting hole (52) as shown in FIG. 5 may be used.
The effective contrast ratio can be increased.

In the above-described embodiment, the case where the pixel electrode (51) in which the light-transmitting hole (52) is provided in the light-shielding conductor (53) is used is shown. The matrix array substrate (73) may be configured by the pixel electrode (51) in which the transparent conductor (53) is provided with the light-transmitting slit (55).

In the pixel electrode (51), a plurality of light-transmitting slits (54) having a slit pitch (P2) of 15 microns along a rubbing direction are provided on a light-shielding conductor (53) made of an a-Si film. And is electrically connected to the source electrode (51a). The line width of the light-shielding conductor (53) constituting the pixel electrode (51) is 4 microns.

In the liquid crystal display device using the matrix array substrate (73) configured as described above, the liquid crystal composition between the light-shielding conductors (53) gives a good optical response, and the liquid crystal display device according to the above-described embodiment is different from the embodiment described above. Similarly, excellent display images could be obtained.

Also, as described above, the aperture ratio of the pixel electrode (51) is improved as compared with the case where the light-transmitting holes (52) are provided in a mesh shape in the light-shielding conductor (53) made of an a-Si film. Can be
As a result, the aperture ratio of the liquid crystal display device could be improved from 17% to 25%.

In this embodiment, the case where an a-Si film is used as the light-shielding conductor (53) constituting the pixel electrode (51) has been described, but this a-Si film transmits red light. Therefore, the displayed image may be reddish as a whole. However, in such a case, by adjusting the wavelength of the light source, or by providing a filter or the like to suppress the red light, a favorable display image can be secured.

The light-shielding conductor (53) is described above.
Although it can be composed of various light-shielding conductors other than the a-Si film, for example, the source electrode (51a) of the thin film transistor (41)
And may be configured integrally. With this configuration, the liquid crystal display device can be configured without increasing the number of manufacturing steps. Next, the liquid crystal display device (3) of the second embodiment of the present invention
In the following description, the same parts as those in the first embodiment will be denoted by the same reference numerals.

FIG. 7 shows a liquid crystal display device (3) of the second embodiment.
FIG. 8 shows a schematic configuration diagram of a matrix array substrate (74) of FIG.
Is a liquid crystal display device cut along the line BB 'in FIG.
FIG. 3 shows a schematic sectional view of (3).

A plurality of signal electrodes (21) and scanning electrodes (31) are arranged in a matrix on a transparent glass substrate (11). A pixel electrode (51) is connected to each of these intersections via a thin film transistor (41). This pixel electrode (51) is a transparent resistor made of a tantalum oxide film.
(55) and a light-shielding conductor (53) made of aluminum (Al) in which a plurality of substantially square light-transmitting holes (52) are disposed on the transparent resistor (55). . Translucent hole (52)
Has a light-transmitting hole pitch of 20 microns and a light-shielding conductor (53) having a line width of 5 microns, and the rubbing direction of the alignment film (61) is parallel to two sides of the light-transmitting hole (52). Are arranged as follows. I.I. on a transparent glass substrate (11). T. O. A common electrode (151) made of a film and an alignment film (161) are sequentially provided to constitute a counter electrode substrate (171).

A liquid crystal composition (101) is sandwiched between the pixel electrode (51) having such a configuration and the common electrode (151) at a pitch of 10 μm.
4) and counter electrode substrate (171) Polarizing plates (81), (18)
The liquid crystal display device (3) is configured by each of the devices 1).

Next, a method of manufacturing the liquid crystal display device (3) of this embodiment will be briefly described. First, as shown in FIG. 9A, a tantalum (Ta) film is formed on a transparent glass substrate (11) to a thickness of 3000 angstroms by sputtering, and a plurality of scanning electrodes (31) are formed by a photo-etching process. ) And the gate electrode (3
1a) is formed.

Next, as shown in FIG. 3B, SiOx is formed to a thickness of 3500 Å as a gate insulating film (35), and further, a channel region of the thin film transistor (41) is formed.
An a-Si film serving as (40) is formed sequentially by a plasma CVD method so as to have a thickness of 2000 Å, and is patterned to form a channel region (41a) of the thin film transistor (41).

Then, as shown in FIG. 2C, a tantalum oxide film is formed to a thickness of 1000 Å by sputtering to form the pixel electrode (51), and is patterned in an island shape to form a transparent resistor ( 55). Furthermore,
An Al film is deposited by sputtering to a thickness of 5000 angstroms, patterned, and signal electrodes (2
1) forming a drain electrode (21a) for connecting the thin film transistor (41) to the thin film transistor (41), and having a light transmitting hole (52) integral with the source electrode (51a) connected to the thin film transistor (41). Forming the body (53).

Although not shown, an alignment film (6
1) is provided, and a rubbing process is performed on the alignment film (61) along a direction substantially parallel to two sides of the light transmitting hole (52) to form a matrix array substrate (74).

According to such a liquid crystal display device (3), the pixel electrode (51) is made of a transparent resistor (55) made of a tantalum oxide film and a plurality of light transmitting holes (52) made of an aluminum (Al) film. Because of the laminated structure with the provided light-shielding conductor (53), the amount of indium (In), which is a rare metal, could be significantly reduced.

The liquid crystal display device (3) of this embodiment is
The light transmittance of the liquid crystal display device (1) of the first embodiment described above is
In contrast to 17%, the pitch of the light transmitting holes could be increased from 15 microns to 20 microns, so that the light transmittance could be improved from 17% to 25%.

In the second embodiment, the light-shielding conductor (53)
Is composed of an aluminum (Al) film having a plurality of light transmitting holes (52), but as shown in FIG.
A pixel electrode (51) having a light-shielding conductor (53) composed of an aluminum (Al) film having
5) may be configured.

By doing so, the aperture ratio can be further improved as compared with the above-described embodiment, and the light transmittance can be increased by 25%.
To 33%. And
By performing a rubbing process on the alignment film (61) along the extending direction of the light-transmitting slit (54), poor alignment can be eliminated and excellent display characteristics can be secured. This second
According to the third embodiment, the light-shielding conductor (53) is made of an aluminum (Al) film.
It may be constituted by a Si film.

In this embodiment, a tantalum oxide film is used as the transparent resistor (55). However, various light-transmitting metal oxides can be used. For example, zinc oxide, molybdenum oxide, tungsten oxide, etc. are used. A sufficient effect can be obtained if the volume resistance is about 1 MΩ · cm.

Further, according to the second embodiment, the transparent resistor
Although the pixel electrode (51) is formed by laminating the light-shielding conductor (53) on the (55), the order of lamination may be reversed, and the transparent resistor (53) is disposed on the light-shielding conductor (53). 55)
The unevenness on (51) can be reduced, and the occurrence of poor alignment or the like in the alignment film (61) can be reduced.

In each of the above-described embodiments, a light-transmitting hole (52) or a light-transmitting slit (54) through which a light beam passes through a pixel electrode in an active matrix type liquid crystal display device.
A light-shielding electrode having a light-transmitting hole or a light-transmitting slit, and the common electrode is made of a light-shielding or light-attenuating material. Is also good.

For example, a counter electrode substrate may be configured as shown in FIG. That is, in this counter electrode substrate, the common electrode (161) is made of Cr, and a rectangular light transmitting hole (162) is formed and arranged in the pixel region facing the pixel electrode in the same manner as the pixel electrode described above. Have been. By configuring the common electrode in this manner, the portion between the light transmitting holes (162) becomes opaque, and has a function as a so-called black matrix. Therefore, it is possible to suppress the incidence of an undesired light beam on the thin film transistor without providing a separate member as a black matrix, and obtain a good display image.

When the common electrode is made of a light-shielding conductor, light reflection occurs on the surface of the light-shielding conductor, and it is considered that an undesired light beam enters the thin film transistor. For this reason, it is preferable to blacken the surface of the light-shielding conductor, or to arrange a color filter on the common electrode in the case of color display.

In each of the above embodiments, an active matrix type liquid crystal display device has been described.
As shown in FIG. 15, the present invention relates to one glass substrate (11).
On the top, stripe electrodes (22
0) extend substantially parallel to each other, and opposite thereto, stripe electrodes (222) extend substantially parallel to each other in the X direction on the other glass substrate (111). Can also be applied. That is, at least one stripe electrode of the simple matrix type liquid crystal display device
(220, 222) into the light transmitting hole (52) or light transmitting slit (5
By using a stripe-shaped conductor having 4), the amount of rare metal indium (In) can be reduced without impairing light transmittance. still,
It is preferable that the light-transmitting hole or the light-transmitting slit is provided only in a region where a pair of stripe electrodes overlap to form a display pixel in consideration of the resistance value of the electrode. This is the same in the case of the common electrode in the active matrix type liquid crystal display device. In FIG. 15, the same reference numerals as in the other drawings denote the same parts and the same portions, and a detailed description thereof will be omitted.

In the above-described active matrix type liquid crystal display device or simple matrix type liquid crystal display device, light-transmitting holes or slits of a certain size are regularly arranged at any pitch. However, for example, the arrangement direction of the slits in one pixel electrode may be different as shown in FIG.

With this configuration, the arrangement state of the liquid crystal is different on one pixel electrode, so that the liquid crystal operation differs for each pixel, and the viewing angle can be improved.

[0060]

As described above in detail, according to the liquid crystal display device of the present invention, the amount of indium (In), which is a rare metal, can be reduced, and good light transmittance can be secured. .

[Brief description of the drawings]

FIG. 1 is a schematic front view of a matrix array substrate of a liquid crystal display device according to a first embodiment of the present invention.

FIG. 2 is a schematic cross-sectional view of the liquid crystal display device of the first embodiment, taken along the line AA ′ in FIG.

FIG. 3 is a diagram showing a manufacturing process of the liquid crystal display device of the first embodiment in FIG.

FIG. 4 is a schematic front view of a matrix array substrate according to a modified example of the liquid crystal display device according to the first embodiment of the present invention.

FIG. 5 is an enlarged view of a main part of a matrix array substrate according to another modification of the liquid crystal display device of the first embodiment of the present invention.

FIG. 6 is a schematic front view of a matrix array substrate according to another modification of the liquid crystal display device according to the first embodiment of the present invention.

FIG. 7 is a schematic front view of a matrix array substrate of a liquid crystal display device according to a second embodiment of the present invention.

8 is a schematic cross-sectional view of the liquid crystal display device of the second embodiment, taken along the line BB ′ in FIG.

FIG. 9 is a diagram showing a manufacturing process of the liquid crystal display device of the second embodiment in FIG.

FIG. 10 is a schematic front view of a matrix array substrate according to another modification of the liquid crystal display device according to the second embodiment of the present invention.

FIG. 11 is a graph showing the dependence of the response of the liquid crystal composition on the insulating region inside the mesh on the vertical axis, and the mesh pitch on the horizontal axis, and the light transmission pitch dependence of the response of the liquid crystal composition.

FIG. 12 is a diagram for explaining the operation of one liquid crystal display device of the present invention.

FIG. 13 is a diagram for explaining the operation of the liquid crystal display device of the present invention.

FIG. 14 is a perspective view schematically showing a structure of a counter electrode of a liquid crystal display according to another embodiment of the present invention.

FIG. 15 is a cross-sectional view schematically illustrating a simple matrix type liquid crystal display according to another embodiment of the present invention.

FIG. 16 is a front view schematically showing a matrix array substrate of a liquid crystal display according to a modified embodiment of the present invention.

[Explanation of symbols]

 (1), (3) ... liquid crystal display device (51) ... pixel electrode (52) ... translucent hole (53) ... light-shielding conductor (54) ... translucent slit (55) ... transparent resistor (71), (73), (74), (75) ... Matrix array substrate (101) ... Liquid crystal composition (171) ... Counter electrode substrate

──────────────────────────────────────────────────続 き Continuation of front page (56) References JP-A-62-69238 (JP, A) JP-A-56-46289 (JP, A) JP-A-3-264929 (JP, A) JP-A-3- 293639 (JP, A) (58) Field surveyed (Int. Cl. ⁷ , DB name) G02F 1/1343 G02F 1/1362 G02F 1/1333

Claims (4)

(57) [Claims] A first electrode substrate on which a first electrode is formed, a second electrode substrate on which a second electrode is formed, and between the first electrode and the second electrode. A liquid crystal display device comprising a held liquid crystal composition, wherein a display pixel is formed at an intersection of the first electrode and the second electrode, wherein the first electrode and the second electrode in the display pixel are provided. At least one is made of an indium-free material, is formed at a pitch of 5 to 40 microns, and has at least two sides.
Is a diagonal line between the first electrode substrate and the second electrode substrate
A liquid crystal display device comprising a light-shielding conductor having a plurality of light-transmitting holes arranged substantially in parallel to each other . 2. A light-shielding conductor having a light-transmitting hole and at least one of the first electrode and the second electrode according to claim 1 having a higher resistance than the light-shielding conductor, and indium. A liquid crystal display device comprising: a transparent resistor made of a material containing no. 3. A first electrode substrate on which a first electrode is formed.
And a second electrode substrate on which a second electrode is formed;
Liquid crystal composition held between one electrode and the second electrode
And an intersection between the first electrode and the second electrode.
In a liquid crystal display device comprising a portion as a display pixel,
Less of the first electrode and the second electrode in a pixel
The other is made of a material that does not contain indium, and
Formed at a pitch of 40 microns to at least two sides
Is a diagonal line between the first electrode substrate and the second electrode substrate
Has a plurality of light-transmitting slits arranged substantially parallel to the
A liquid crystal display device comprising a light-shielding conductor. 4. The first electrode and the second electrode according to claim 3,
At least one electrode has a light-transmitting slit and is light-shielded
And a higher resistance than the light-shielding conductor,
Consisting of a transparent resistor made of a material that does not contain indium
A liquid crystal display device characterized by the above.