JP3256204B2 - Heat treatment furnace for substrates - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a substrate heat treatment furnace for performing various heat treatments such as oxidation, annealing, CVD (chemical vapor deposition), or diffusion on various substrates such as semiconductor substrates and ceramic substrates. About.

[0002]

2. Description of the Related Art In a substrate heat treatment furnace, it is necessary to uniformly heat the entire substrate group inserted into the furnace, and a heating means provided around the furnace core tube is divided in the longitudinal direction of the furnace core tube. It is adjusted and controlled for each of several sites.

However, since it is difficult to directly measure the temperature of the substrate being heated, for example, the longitudinal direction of the furnace core tube is placed between the inner peripheral surface of the furnace core tube and the substrate inside the furnace core tube. A temperature sensor (hereinafter referred to as a “side temperature sensor”) for measuring the heat distribution is inserted so that the heating state can be measured, for example, by measuring the temperature in the vicinity of the substrate group. When heat-treating the group, the heating means is controlled so that the measured heating condition matches heating conditions suitable for uniformly heating the entire substrate group.

[0004] For example, in a heating situation in which the entire substrate group is uniformly heated, the heat distribution measured by the side temperature sensor is determined in advance to determine the heat distribution. There is known a method of controlling a heating unit so that a heat distribution measured by a temperature sensor for a side at the time of heat treatment matches the heat distribution determined in advance. In this method, the heating conditions appropriate for uniformly heating the entire substrate group correspond to the temperature distribution of the temperature distribution measured by the side temperature sensor under the condition of uniform heating previously determined. That is.

[0005] The heating conditions for uniformly heating the entire substrate group are determined as follows. As a preparation before heat-treating the substrate, the core boat is not inserted into the furnace core tube, that is, in a so-called empty furnace state, or in a state where the substrate boat containing the same type of substrate as the substrate to be heat-treated is inserted into the furnace core tube, The drive set value (the value at the position in the longitudinal direction of the furnace core at which the heating means is to be driven and the output) is changed by trial and error to change the profile data. That is, the data of the heating condition obtained corresponding to each of the drive setting values changed variously (for example, the data of the temperature distribution measured by the temperature sensor for Zide or the surface of the substrate heat-treated with the drive setting value) Take the final condition of the heat treatment, such as the thickness and diffusion depth of the formed film.

Then, the profile data is analyzed,
The heating conditions suitable for uniformly heating the entire substrate group are determined.

[0007]

However, according to the conventional method for measuring the temperature when taking profile data, there is no data indicating the temperature distribution of the substrate group in the profile data obtained by the method, and the profile data is cooled by the process gas or the furnace end. Therefore, even if the profile data is analyzed, it is difficult to determine an appropriate heating condition for uniformly heating the entire substrate group. It is only a matter of estimating appropriate heating conditions that are considered to be uniform.

Therefore, even when the heating conditions are controlled so as to match the appropriate heating conditions determined from the profile data during the heat treatment of the substrate, it is not always possible to expect that the entire substrate group is uniformly heated. . Therefore, even after the step of heat-treating the substrate is started, it is troublesome to carry out the test heat-treatment many times and frequently correct the control of the heating means based on the finished condition of the heat treatment.

The above-mentioned inconvenience occurs because, in the first place, in the conventional temperature measurement method for obtaining profile data, there is no data on the temperature distribution of the substrate group in the profile data obtained by measurement. This is because it was difficult to accurately determine appropriate heating conditions for uniformly heating the entire substrate group from such profile data.

SUMMARY OF THE INVENTION The present invention has been made in view of the above circumstances, and has a heat treatment furnace for a substrate capable of obtaining data of a temperature distribution corresponding to a temperature distribution of a substrate group when obtaining profile data. The purpose is to be able to provide.

[0011]

In order to achieve the above object, a heat treatment furnace for a substrate according to the present invention is a heat treatment furnace for a substrate for performing heat treatment on a substrate, comprising: a core tube for accommodating a substrate; Heating means disposed around the furnace core tube, and can be inserted and withdrawn from the furnace core tube, inserted into the furnace core tube in a state where the substrate is not stored in the furnace core tube, A first temperature sensor located at a position corresponding to the central axis of the furnace core tube, and a first temperature sensor which can be inserted into and removed from the furnace core tube, and wherein the substrate is not housed in the furnace core tube; And a second temperature sensor located at a location near the inner peripheral surface of the furnace core tube, based on a detected temperature detected by the first temperature sensor and a detected temperature detected by the second detection sensor. Memorized heating conditions Storage means, in which comprises a.
Note that a rod-shaped center temperature sensor can be considered as the first temperature sensor, and a rod-shaped side temperature sensor can be considered as the second temperature sensor.

Further, the heat treatment furnace for a substrate according to the present invention further comprises control means for controlling the heating means so that the temperature detected by the first temperature sensor becomes a target temperature, and the storage means comprises: The temperature detected by the second temperature sensor when the temperature detected by the one temperature sensor reaches the target temperature may be stored as the heating condition.

Further, the heat treatment furnace for a substrate according to the present invention further includes a third temperature sensor provided outside the furnace core tube and attached to the heating means, and the storage means includes the first temperature sensor.
The temperature detected by the third temperature sensor when the temperature detected by the temperature sensor reaches the target temperature may be further stored as a heating condition.

Further, in the heat treatment furnace for a substrate according to the present invention, the first temperature sensor is inserted into and extracted from the furnace core tube, and the second temperature sensor is inserted into and removed from the furnace core tube. It may be further provided with a lifting support means for extracting.

Further, the substrate heat treatment furnace according to the present invention further includes a substrate boat detachably attached to the furnace core tube and supporting a substrate, wherein the substrate boat in a state where the substrate is not supported is mounted on the substrate boat. After being inserted into the furnace core tube, the elevating and lowering means may insert the first temperature sensor into the furnace core tube and insert the second temperature sensor into the furnace core tube.

[0016]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Embodiments of a heat treatment for a substrate according to the present invention will be described below in detail with reference to the drawings.

The schematic structure of a vertical heat treatment furnace for a substrate will be described. As shown in a schematic vertical sectional view of FIG. 1, a tube core is formed around a furnace core tube 1 made of quartz material transparently. short direction first heater 2 a and a long second heater 2b
When the heating means 2 is provided consisting of short third heater 2 c. At the upper end of the furnace core tube 1, a gas introduction tube portion 1 a for introducing a reaction gas is integrally formed, while, on the lower furnace port side, an exhaust pipe 3 is attached in a state of being sealed via a packing 4. Have been. The exhaust pipe 3 is formed with an exhaust port 5 that communicates with an exhaust pipe (not shown).

Next, a description will be given of a temperature measuring method necessary for obtaining the temperature conditions for operating the above-described substrate heat treatment furnace.

As shown in FIG. 2, a substrate boat 9 described later is inserted into the furnace core tube 1 from a furnace port, and the furnace port is closed by a furnace cap 10 integrally attached to the substrate boat 9. At this time, the substrate boat 9 does not support the substrate. The furnace core tube 1 and the heating means 2 are assembled and fixed to a base (not shown), and the furnace cap 10 is removably locked at a position for closing the furnace port.

Next, as shown in FIG. 3, the furnace core tube 1 is placed on a vertically movable support arm 11 which can be moved up and down corresponding to the vertically supported means.
And a temperature sensor 12 for the center corresponding to the first temperature sensor and a temperature sensor 13 for the side corresponding to the second temperature sensor, which are respectively located at a position corresponding to the center axis core and a position near the inner peripheral surface of the furnace core tube 1. Is lifted and lowered, the furnace support cap 11, a heat insulating plate 7 described later, and a plate body 9 described below below the substrate boat 9.
a The temperature sensor 12 for the center is inserted through the opening formed at the center of each
The side temperature sensor 13 is inserted through an opening formed near the periphery of the zero.

Although not shown, each of the center temperature sensor 12 and the side temperature sensor 13 is provided with three thermocouples having different lengths (a temperature detecting portion of the center temperature sensor 12 is disposed above a transparent protection tube made of quartz). A1, A in order from
2, A3, and temperature detection units by the side temperature sensor 13 are indicated by M1, M2, and M3 in order from the top). The temperature, that is, the temperature distribution in the furnace core tube 1 is measured.

The first to third heaters 2a, 2b,
A temperature control temperature sensor C1, C2, C3 corresponding to a third temperature sensor such as a thermocouple is attached to each of the 2c. Center temperature sensor 12, side temperature sensor 1
3 and the temperature sensors C1, C2, C3 for temperature control are connected to a temperature control unit 14 corresponding to a control unit, and the temperature control unit 14 is provided with first to third heaters 2a, 2a, 2c.
The electric wires 15a, 15b and 15c of b and 2c are connected to a memory 16 corresponding to a storage means.

Under the above configuration, in the temperature control section 14, each process condition [temperature, type of reaction gas, steady state (state in which a constant heating temperature is maintained), unsteady state (temperature rising state, temperature falling) for each state), etc.], as both by the temperature sensor 12 for center of the detected temperature _{T A1, T A2, T A3} at each temperature sensing unit A1, A2, A3 becomes a predetermined target temperature _{T W,} the 1st to 3rd heater 2
a, 2b, 2c power supplies 15a, 15b, 15c
Adjust the power supplied to the.

As a result of the adjustment, T _A1 = T _A2 = T _A3
= When it is _{T W,} the detection by the side temperature sensor 13 temperature _{T M1, T M2, T M3} temperature for temperature control sensor C
1, C2, C3 detected temperatures _TC1 , _TC2 , _TC3
Are stored in the memory 16 in association with the data of the target temperature _TW and other process conditions. _{T A1} = T _{A 2}
= T _A3 = T _M1 , T _M2 , T under the situation of T _W
M3 is a heating condition suitable for uniformly heating the entire substrate group.

After all measured data on various process conditions are stored in the memory 16, the center temperature sensor 12 and the side temperature sensor 13 are extracted from the furnace core tube 1, and the substrate boat 9 is extracted. To heat treatment.

[0026] That is, the substrate baud preparative 9, loading the actual substrate group to be heat treated, is inserted the substrate baud preparative 9 to core tube 1, the side temperature sensor 13 for the monitoring It is inserted into the furnace core tube 1. Then, by inputting the process conditions to be processed into the temperature control unit 14 and starting the heat treatment, data corresponding to the process conditions is read out from the memory 16 and the temperature control temperature sensor C is read.
1, C2, C3 detects temperature _Tc 1 _by, Tc _2, Tc ₃
The power supplied to the power supplies 15a, 15b, and 15c of the first to third heaters 2a, 2b, and 2c is controlled so that each becomes the set temperature in the read data.

At this time, the temperatures T _M1 , T _M2 , T _M3 detected by the side temperature sensor 13 are compared with the corresponding set temperatures, and based on the difference between them, the center temperature sensor 12, the side temperature Detects malfunctions due to deterioration of the sensor 13 and the temperature sensors C1, C2, C3 for temperature control or the first to third heaters 2a, 2b, 2c, etc., and early discovers that a defective product occurs unexpectedly. I can do it.

Next, the substrate boat 9 used in the above temperature measuring method will be described. As shown in the perspective view of FIG. 4 and the cross-sectional view of FIG. 5, respectively, the substrate boat 9 has three longitudinally transparent quartz supporting columns 9c for supporting the substrate, which are provided at intervals in the circumferential direction. Quartz plates 9a, 9
b is provided integrally. Substrate insertion grooves 17 are formed in each of the columns 9c at a fine pitch in the longitudinal direction, and are configured so that a semicircular portion of the substrate W can be inserted and supported at three points.

A shielding member 18 for shielding radiant heat is embedded in each of the two plates 9a and 9b so that the radiant heat can be prevented from escaping from both ends in the longitudinal direction of the furnace core tube 1. As the shielding member 18, 1000-2
Any material may be used as long as it has a shielding performance against light having a central wavelength of radiant heat of 000 ° C. For example, silicon carbide SiC, alumina Al ₂ O ₃ , boron nitride BN, ceramics, and the like are used.

One of the plate members 9a is provided with legs 19 projecting toward the heat insulating support member 8, and in the plate member 9a, a portion where the center of the substrate is positioned when the substrate W is supported on the substrate boat, that is, An opening 20 into which the center temperature sensor 12 is inserted is formed at the center of the plate 9a. Further, in the substrate baud preparative 9, in the vicinity of the furnace cap 10, as shown in FIG. 2, the heat insulating plate 7 is attached.

Next, the results of comparative experiments will be described. (Comparative Example 1) with a plate body 9a, 9 b in the above embodiment is formed by only a quartz material constituting the substrate boat H1, accommodating the substrate W to the substrate boat H1, furnace core tube and the substrate boat H1 1
And a temperature sensor 13 for the side was inserted at a position near the inner peripheral surface of the furnace core tube 1. The first, second, and third powers required to heat the substrate W with a uniform temperature distribution in the longitudinal direction of the furnace core tube 1 at the time of the actual heat treatment are determined in advance by a special method described later. Power is supplied to each of the power supplies 15a, 15b, and 15c of the heaters 2a, 2b, and 2c through the temperature control unit 14, and the state (hereinafter, referred to as the state)
The temperature distribution in an ideal heating state was measured by the side temperature sensor 13.

[0032] As a result, _{D S} shown in graph of FIG. 9
Was obtained.

(Experimental Example of Example 1) The substrate boat H1 is inserted into the furnace core tube 1 without accommodating the substrate W, and the substrate center is positioned when the substrate W is supported by the substrate boat H1. Temperature sensor 1 for center
2 was inserted into the furnace core tube 1 at a position close to the inner peripheral surface thereof, and the temperature distribution was measured in an ideal heating state.

As a result, in the graph of FIG.
Temperature distribution of the temperature sensor 12 for _CShown for side
The temperature distribution of the temperature sensor 13 is C_SIndicated by

(Consideration of Comparative Experimental Example 1 and Experimental Example of Example 1) Comparative Experimental Example 1 is an experimental example using the temperature measuring method described as a prior art, and was measured in an ideal heating state. What is performed is only the data of the side temperature sensor 13. Therefore, under the situation where it is unknown how to control the first, second and third heaters 2a, 2b, 2c to achieve the ideal heating state, the data of the side temperature sensor 13 is If it is a temperature distribution,
It is difficult to determine whether the entire substrate group can be heated uniformly. That is, it is difficult to determine appropriate heating conditions for uniformly heating the entire substrate group.

In the experimental example according to the first embodiment, it is unknown how to control the first, second and third heaters 2a, 2b and 2c to achieve the ideal heating state. Also, since the state where the measurement results of the center temperature sensor 12 have a uniform distribution can be determined to be the ideal heating state, the side temperature sensor 12 in the state where the measurement results of the center temperature sensor 12 have a uniform distribution can be determined. There is no problem if the data is adopted as appropriate heating conditions for uniformly heating the entire substrate group. During the actual heating process, as described above, the first, second, and third heaters are set so that the detection value of the side temperature sensor 13 matches the data of the side temperature sensor 13 in the profile data. 2
By controlling a, 2b and 2c, the substrate can be brought into an ideal heating state.

(Comparative Experimental Example 2) The above-mentioned substrate boat 9, that is, the substrate boat 9 in which the shielding members 18 are embedded in the plate members 9a and 9b of the substrate boat 9, and the substrate W is accommodated in the substrate boat 9, The substrate boat 9 is inserted into the furnace core tube 1, and a side temperature sensor 13 is inserted at a position near the inner peripheral surface of the furnace core tube 1, so that the temperature distribution in an ideal heating state can be measured by the side temperature sensor. 13 was measured. As a result, to obtain a temperature distribution of B _S shown in the graph of FIG.

(Experimental Example of Second Embodiment) Substrate Boat 9
A substrate boat 9 in which the shielding members 18 are embedded in plate bodies 9a and 9b is inserted into the furnace core tube 1 without accommodating the substrate W, and the substrate is supported by the substrate boat. At this time, the center temperature sensor 12 was inserted at a position where the center of the substrate was located, and the side temperature sensor 13 was inserted at a position near the inner peripheral surface of the furnace core tube 1, and the temperature distribution was measured in an ideal heating state.

As a result, the temperature distribution shown in the graph of FIG. 6 was obtained. A _C indicates the temperature distribution measured by the temperature sensor 12 for center, A _S is the temperature sensor for side 1
3 shows the temperature distribution measured according to FIG.

(Consideration of Comparative Experimental Example 2 and Experimental Example of Example 2) Comparative Experimental Example 2 is an experimental example using the temperature measuring method described as the prior art, and Comparative Experimental Example 1 was used. Similar to, what is measured in the ideal heating state is
Only the data of the side temperature sensor 13 is provided. Therefore, how the first, second and third heaters 2a, 2
Under the situation where it is unknown whether or not the ideal heating state can be achieved by controlling b and 2c, if the data of the side temperature sensor 13 has a temperature distribution, it is determined whether the entire substrate group can be uniformly heated. It is difficult to determine. That is,
It is difficult to determine appropriate heating conditions for uniformly heating the entire substrate group.

The experimental example according to the embodiment 2 is an experimental example in the embodiment corresponding to the best mode, and what kind of the first, second and third heaters 2a, 2b, 2c are controlled. Even if it is unknown whether it can be set to the ideal heating state, the state where the measurement result of the center temperature sensor 12 has a uniform distribution can be determined to be the ideal heating state.
The data of the side temperature sensor 13 in a state where the measurement results of the center temperature sensor 12 have a uniform distribution may be adopted as appropriate heating conditions for uniformly heating the entire substrate group. During the actual heat treatment, as described above,
The first, second and third heaters 2a, 2a, 2b are arranged so that the detection value of the side temperature sensor 13 matches the data of the side temperature sensor 13 in the profile data.
By controlling b and 2c, the substrate can be brought into an ideal heating state.

(Consideration of the experimental example according to the first embodiment and the experimental example according to the second embodiment) In the experimental example according to the second embodiment, the shielding member 18 is embedded in the plates 9a and 9b of the substrate boat 9. Since the substrate boat 9 is used, even at the time of the heat treatment for supporting the substrate group on the substrate boat 9, the substrates located at the ends are also in thermal equilibrium.

Therefore, if the temperature control during the heat treatment is performed based on the profile data obtained by using the substrate boat 9, the heat distribution when the profile data is obtained, that is, the ideal temperature distribution can be obtained even at the end of the substrate group. Heat distribution can be achieved in the heated state.

In the experimental example according to the first embodiment, since the plate members 9a and 9b of the substrate boat H1 are formed only of a quartz material, they are located at the ends during the heat treatment for supporting the substrate group on the substrate boat. Unlike a substrate located in the middle, a substrate exerts radiant heat on each other with a nearby substrate and the radiant heat is balanced between the substrates, unlike a radiant heat received from another or a substrate. Since more radiant heat is emitted, thermal equilibrium is not established.

Therefore, if the temperature control during the heat treatment is performed based on the profile data measured in a state where the substrate is not supported on the substrate boat H1, the temperature distribution at the time of the heat treatment shows that the profile data at the middle position of the substrate group The heat distribution at the time of taking can be reproduced. That is, a hotbed distribution can be obtained in the ideal heating state, but a heat distribution in which the temperature is lowered near the end of the substrate group is obtained.

In order to realize the ideal heating state, the following was carried out. In the experimental example according to the comparative experimental example 1 and the example 1, the substrate boat H1 was used. In the experimental example according to the comparative experimental example 2 and the example 2 was used, the substrate boat H1 was used.
A holed substrate W having a hole formed in the center is accommodated, the substrate boat H1 to the substrate boat 9 is inserted into the furnace core tube 1, and a center temperature sensor 12 is inserted through a hole formed in the center of the holed substrate W. So that the temperature distribution in the longitudinal direction of the furnace core tube measured by the center temperature sensor 12 becomes uniform, so that the first, second and third heaters 2a, 2
Drives b and 2c were controlled.

In the above embodiment, the vertical substrate boat used in the vertical substrate heat treatment furnace was described. However, the horizontal substrate boat used in the horizontal substrate heat treatment furnace can be used. In the case of a boat, both plates 9a, 9
b On both sides of each intermediate support 9c,
Support legs for standing and supporting in the furnace are connected.

The above-mentioned substrate boat can be used not only when measuring the temperature distribution but also when actually performing the heat treatment of the substrate W. In the above embodiment, the center temperature sensor 12 is inserted at the center axis of the furnace core tube 1. However, in the vertical heat treatment furnace of the above embodiment, the center of the substrate W supported by the substrate boat 9 is located at the center of the furnace core tube. Since it has a structure that coincides with the location of the center core of No. 1, it was inserted into that location. For example, as in some horizontal heat treatment furnaces, a substrate boat is placed on the inner peripheral surface of the furnace core tube. In the heat treatment furnace, the center of the substrate supported by the substrate boat may not coincide with the center axis of the furnace core tube. In such a case, the position where the center temperature sensor 12 is inserted is The center of the furnace core tube 1 may be set at a position where the center of the substrate is located when the substrate is supported on the base boat, not at the position of the center axis.

[0049]

As described in detail above, according to the heat treatment furnace for a substrate according to the present invention, the substrate is inserted into the furnace core tube in a state where the substrate is not stored in the furnace core tube, and the center of the furnace core tube is The temperature detected by the first temperature sensor located at a position corresponding to the axis and the temperature which is inserted into the furnace core tube in a state where the substrate is not housed in the furnace core tube and is close to the inner peripheral surface of the furnace core tube Since the storage means stores the heating condition obtained based on the detected temperature detected by the second temperature sensor located, the temperature distribution of the substrate group is taken when taking profile data in the substrate heat treatment furnace. The corresponding temperature distribution data can be obtained.

[Brief description of the drawings]

FIG. 1 is a diagram illustrating a procedure of a temperature measuring method when profile data of a substrate heat treatment furnace is obtained.

FIG. 2 is a diagram illustrating a procedure of a temperature measuring method when profile data of a substrate heat treatment furnace is obtained.

FIG. 3 is a diagram illustrating a procedure of a temperature measuring method when profile data of a substrate heat treatment furnace is obtained.

FIG. 4 is a perspective view of a substrate boat.

FIG. 5 is a sectional view of a substrate boat.

FIG. 6 is a graph showing the results of a comparative experiment.

FIG. 7 is a graph showing the results of a comparative experiment.

FIG. 8 is a graph showing the results of a comparative experiment.

FIG. 9 is a graph showing the results of a comparative experiment.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 Furnace tube 2 Heating means 2a 1st heater 2b 2nd heater 2c 3rd heater 9 Substrate boat 11 Elevating support arm 12 Center temperature sensor 13 Side temperature sensor 14 Temperature controller 16 Memory C1 Temperature control temperature sensor C2 Temperature sensor for temperature control C3 Temperature sensor for temperature control

──────────────────────────────────────────────────続 き Continuation of the front page Examiner Akira Kawai (56) References JP-A-63-131722 (JP, A) JP-A-63-121720 (JP, A) JP-A-1-309318 (JP, A) 54-154376 (JP, A) Hira 1-174917 (JP, U) (58) Fields investigated (Int. Cl. ⁷ , DB name) H01L 21/22 511 H01L 21/22 501

Claims (5)

(57) [Claims] 1. A substrate heat treatment furnace for performing heat treatment on a substrate, comprising: a furnace core tube for accommodating a substrate; heating means disposed around the furnace core tube; A first temperature sensor that can be withdrawn, is inserted into the furnace core tube in a state where the substrate is not stored in the furnace core tube, and is located at a position corresponding to a central axis of the furnace core tube; Can be inserted into and removed from the furnace core tube, and is inserted into the furnace core tube in a state where the substrate is not stored on the inner peripheral surface of the furnace core tube, and is located at a position near the inner peripheral surface of the furnace core tube. A second temperature sensor; and storage means for storing a heating condition obtained based on the detected temperature detected by the first temperature sensor and the detected temperature detected by the second detection sensor. Substrate heat treatment furnace. 2. The heat treatment furnace for a substrate according to claim 1, further comprising control means for controlling the heating means so that a temperature detected by the first temperature sensor becomes a target temperature, wherein the storage means comprises: A substrate heat treatment furnace, wherein a temperature detected by the first temperature sensor is stored as a heating condition. 3. The heat treatment furnace for a substrate according to claim 2, further comprising a third temperature sensor provided outside of the furnace core tube and attached to the heating means, wherein the storage means comprises a first temperature sensor. The substrate heat treatment furnace further stores a temperature detected by the third temperature sensor when the temperature detected by the temperature sensor reaches a target temperature as a heating condition. 4. The heat treatment furnace for a substrate according to claim 1, wherein the first temperature sensor is inserted into and removed from the furnace core tube, and the second temperature sensor is A substrate heat treatment furnace, further comprising elevating and lowering support means for inserting and extracting the furnace core tube. 5. The heat treatment furnace for a substrate according to claim 4, further comprising a substrate boat detachable to the furnace core tube and supporting a substrate, wherein the substrate boat does not support the substrate. Is inserted into the furnace core tube, and the elevating and lowering support means inserts the first temperature sensor into the furnace core tube and inserts the second temperature sensor into the furnace core tube. Substrate heat treatment furnace.