JP3242247B2 - Manufacturing method of square chip resistor - Google Patents

Manufacturing method of square chip resistor

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Publication number
JP3242247B2
JP3242247B2 JP33392793A JP33392793A JP3242247B2 JP 3242247 B2 JP3242247 B2 JP 3242247B2 JP 33392793 A JP33392793 A JP 33392793A JP 33392793 A JP33392793 A JP 33392793A JP 3242247 B2 JP3242247 B2 JP 3242247B2
Authority
JP
Japan
Prior art keywords
film
conductive film
edge
insulating plate
resistive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP33392793A
Other languages
Japanese (ja)
Other versions
JPH07201540A (en
Inventor
正志 五味
伸圭 原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Koa Corp
Original Assignee
Koa Corp
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Filing date
Publication date
Application filed by Koa Corp filed Critical Koa Corp
Priority to JP33392793A priority Critical patent/JP3242247B2/en
Publication of JPH07201540A publication Critical patent/JPH07201540A/en
Application granted granted Critical
Publication of JP3242247B2 publication Critical patent/JP3242247B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Non-Adjustable Resistors (AREA)

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、例えばプリント配線板
のクロス部分に実装される角形チップ抵抗器の製造方法
に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of manufacturing a rectangular chip resistor mounted on a cross portion of a printed wiring board, for example.

【0002】[0002]

【従来の技術】従来、この種の角形チップ抵抗器の製造
方法としては、例えば特開平5−205902号公報に
記載の構成が知られている。
2. Description of the Related Art Conventionally, as a method of manufacturing this type of square chip resistor, for example, a configuration described in Japanese Patent Application Laid-Open No. 5-205902 is known.

【0003】この特開平5−205902号公報に記載
の角形チップ抵抗器の製造方法は、第1の絶縁板の表面
上に、複数組の酸化ルテニウムの抵抗膜を印刷して乾燥
形成する。そして、各抵抗膜の両端に一部を重ねるよう
に、複数組の内部電極を印刷形成する。
In the method of manufacturing a rectangular chip resistor described in Japanese Patent Application Laid-Open No. 5-205902, a plurality of sets of ruthenium oxide resistive films are printed and formed on the surface of a first insulating plate. Then, a plurality of sets of internal electrodes are printed and formed so as to partially overlap both ends of each resistance film.

【0004】また、第2の絶縁板を第1の絶縁板の複数
組の抵抗膜を形成した面上に加熱および加圧して接合す
る。そして、この積層絶縁体を適宜分割して仮焼し、内
部に抵抗膜および両端に接続された内部電極を設けた複
合セラミックス基体を備えた半完成抵抗器を複数形成す
る。
[0004] A second insulating plate is bonded to the surface of the first insulating plate on which a plurality of sets of resistive films are formed by heating and pressing. Then, the laminated insulator is appropriately divided and calcined to form a plurality of semi-finished resistors each including a composite ceramic base having a resistive film and internal electrodes connected to both ends.

【0005】次に、半完成抵抗器を、バレル研磨機に
て、各稜線部に丸みを形成する。そして、この半完成抵
抗器の両端部に内部電極接続させて、順次ニッケルメ
ッキ層、半田メッキ層を形成して導電部である外部電極
を形成し、角形チップ抵抗器を形成する。
[0005] Next, the semi-finished resistor is rounded at each ridge line by a barrel polishing machine. Then, an internal electrode is connected to both ends of the semi-finished resistor, a nickel plating layer and a solder plating layer are sequentially formed to form an external electrode which is a conductive portion, and a square chip resistor is formed.

【0006】[0006]

【発明が解決しようとする課題】しかしながら、上記特
開平5−205902号公報に記載の角形チップ抵抗器
の製造方法は、積層絶縁体の端面から露出する抵抗膜に
接続された内部電極の面積が小さいため、外部電極とな
るニッケルメッキ層との接続面積が小さく接続力が弱い
という問題がある。
However, in the method of manufacturing a rectangular chip resistor described in Japanese Patent Application Laid-Open No. 5-205902, the area of the internal electrode connected to the resistive film exposed from the end face of the laminated insulator is reduced. Since it is small, there is a problem that a connection area with a nickel plating layer to be an external electrode is small and a connection force is weak.

【0007】本発明は、上記問題点に鑑みなされたもの
で、積層絶縁体の端面に露出する抵抗膜の面積が増大
し、抵抗膜と導電部との接着の安定性を向上し、信頼性
の高い角形チップ抵抗器の製造方法を提供するものであ
る。
SUMMARY OF THE INVENTION The present invention has been made in view of the above problems, and has an advantage in that an area of a resistive film exposed on an end face of a laminated insulator is increased, stability of adhesion between the resistive film and a conductive portion is improved, and reliability is improved. And a method for manufacturing a square chip resistor having a high resistance.

【0008】[0008]

【課題を解決するための手段】請求項1記載の角形チッ
プ抵抗器の製造方法は、複数条の帯状の抵抗膜間の距離
を第1の絶縁板の縁から前記抵抗膜の縁までの距離の略
2倍にして、前記第1の絶縁板の平面上に前記抵抗膜を
幅方向に間隔を介して略平行に形成し、この第1の絶縁
板の前記抵抗膜を形成した平面上の前記抵抗膜の長手方
向の両端側の縁に帯状の縁導電膜を形成するとともに、
この縁導電膜より幅寸法が略2倍の幅広導電膜をこの縁
導電膜に幅方向に間隔を介して略平行に複数条形成し、
前記第1の絶縁板の前記抵抗膜、縁導電膜および幅広導
電膜を形成した平面上に第2の絶縁板を重ね合わせて固
定してこれら第1および第2の絶縁板にて前記抵抗膜
縁導電膜および幅広導電膜を挟着して積層絶縁体を形成
し、この積層絶縁体を前記幅広導電膜の長手方向の略中
央で分割して細長絶縁片を形成し、この細長絶縁片の前
縁導電膜および幅広導電膜の長手方向に沿った断面が
露出する両側面に導電部を形成し、この細長絶縁片を前
記各抵抗膜間の中間位置からそれぞれチップ状に分割
るものである。
Means for Solving the Problems] claim 1 square chip resistor manufacturing method described, the distance between the plural rows of strip-shaped resistive film
Is approximately the distance from the edge of the first insulating plate to the edge of the resistive film.
And doubled, the resistance film substantially in parallel form through the space in the width direction, the resistance on the first plane said forming a resistive film of the insulating plate on the plane of said first insulating plate While forming a strip-shaped edge conductive film on the edges on both ends in the longitudinal direction of the film,
The wide conductive film approximately twice the width dimension than the edge conductive film plural rows formed substantially in parallel via a gap in the width direction in this Enshirube conductive film,
A second insulating plate is superimposed and fixed on a plane of the first insulating plate on which the resistive film, the edge conductive film and the wide conductive film are formed, and the resistive film is formed on the first and second insulating plates. ,
A laminated insulator is formed by sandwiching the edge conductive film and the wide conductive film, and the laminated insulator is divided substantially at the center in the longitudinal direction of the wide conductive film to form an elongated insulating piece. Conductive portions are formed on both side surfaces where the cross section along the longitudinal direction of the edge conductive film and the wide conductive film is exposed, and this elongated insulating piece is divided into chips from an intermediate position between the resistive films. > Things.

【0009】[0009]

【作用】請求項1記載の角形チップ抵抗器の製造方法
、帯状の抵抗膜を形成した第1の絶縁板の平面上に、
抵抗膜の長手方向の両端側の縁に帯状の縁導電膜を形成
するとともに、この縁導電膜より幅寸法が略2倍の幅広
導電膜をこの縁導電膜に幅方向に間隔を介して略平行に
複数条形成し、幅広導電膜の長手方向の略中央で分割
るため、第1および第2の絶縁板にて挟着した積層絶縁
体を縦横に分割するのみで、抵抗膜と導電部との接続性
が向上する角形チップ抵抗器を切除部分がなく容易に大
量に得られ、また、複数条の帯状の抵抗膜間の距離を第
1の絶縁板の縁から抵抗膜の縁までの距離の略2倍に
し、かつ幅広導電膜の幅寸法を縁導電膜の略2倍とする
ことにより、第1の絶縁板と第2の絶縁板とを重ね合わ
せた後における積層絶縁体を分割する際に、縁導電膜、
幅広導電膜および抵抗膜の少なくともいずれかの位置の
自由度が増加するから、積層絶縁体を分割する際の歩留
まりが向上する。
Method for manufacturing a rectangular chip resistor of the action] first aspect, the first insulating plate on a plane to form a band-shaped resistive film,
To form a strip-shaped Enshirube film in both longitudinal end edge of the resistive film, through a gap wide conductive film approximately twice the width dimension than the edge conductive film in the width direction in this Enshirube conductive film substantially A plurality of layers are formed in parallel and divided at substantially the center in the longitudinal direction of the wide conductive film. Therefore, the laminated insulator sandwiched between the first and second insulating plates is only divided vertically and horizontally. A large number of square chip resistors, which improve the connectivity between the resistive film and the conductive portion, can be easily obtained without a cut-out portion , and the distance between the plural strip-shaped resistive films can be reduced.
Approximately twice the distance from the edge of the insulating plate to the edge of the resistive film
And make the width dimension of the wide conductive film approximately twice as large as the edge conductive film.
Thereby, the first insulating plate and the second insulating plate are overlapped.
When dividing the laminated insulator after the
At least one of the position of the wide conductive film and the resistance film
Increased degree of freedom increases yield when dividing laminated insulators
Mari is you improve.

【0010】[0010]

【実施例】以下、本発明の角形チップ抵抗器の製造方法
により製造した一実施例の角形チップ抵抗器を図面を参
照して説明する。
BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a perspective view showing a square chip resistor manufactured by a method of manufacturing a square chip resistor according to the present invention.

【0011】図1において、1は角形チップ抵抗器で、
この角形チップ抵抗器1は、絶縁性のセラミック材料板
や合成樹脂板などから略長方形の平板状に形成された一
対の第1および第2の絶縁板2,3が積層されて形成さ
れている。
In FIG. 1, reference numeral 1 denotes a square chip resistor.
This square chip resistor 1 is formed by laminating a pair of first and second insulating plates 2 and 3 formed in a substantially rectangular flat plate shape from an insulating ceramic material plate or a synthetic resin plate. .

【0012】そして、角形チップ抵抗器1には、第1お
よび第2の絶縁板2,3の間に、長手方向に沿って長手
方向を有した帯状の抵抗膜5が略中央に挟着されてい
る。さらに、抵抗膜5の長手方向の両端部には、長手方
向が略垂直方向に直交して導電膜6,6が形成されてい
る。
In the rectangular chip resistor 1, a strip-shaped resistive film 5 having a longitudinal direction along the longitudinal direction is sandwiched between the first and second insulating plates 2, 3 substantially at the center. ing. Further, conductive films 6, 6 are formed at both ends in the longitudinal direction of the resistive film 5 so that the longitudinal directions are substantially perpendicular to the vertical direction.

【0013】また、角形チップ抵抗器1の長手方向の両
端部には、ニッケルメッキや半田メッキなどにより導電
部7,7が、抵抗膜5の長手方向の両端部および導電膜
6,6にそれぞれ接触して形成されている。さらに、角
形チップ抵抗器1の長手方向の両端部には、導電部7,
7を覆うようにニッケルメッキや半田メッキなどにより
電極8が形成されている。
At both ends of the rectangular chip resistor 1 in the longitudinal direction, conductive portions 7 and 7 are formed by nickel plating, solder plating, or the like on both ends of the resistive film 5 and the conductive films 6 and 6, respectively. It is formed in contact. Further, conductive portions 7 and 2 are provided at both ends of the rectangular chip resistor 1 in the longitudinal direction.
An electrode 8 is formed by nickel plating, solder plating, or the like so as to cover 7.

【0014】次に、上記角形チップ抵抗器を製造する工
程を図面を参照して説明する。
Next, the steps of manufacturing the above-mentioned square chip resistor will be described with reference to the drawings.

【0015】まず、略長方形の平板状の焼成前のセラミ
ックにて、図2に示すように、略長方形の平板状に、第
1の絶縁板2を成形する。
First, as shown in FIG. 2, the first insulating plate 2 is formed into a substantially rectangular flat plate shape using a substantially rectangular flat plate-shaped ceramic before firing.

【0016】そして、この第1の絶縁板2の平面上に、
図3に示すように、帯状の抵抗膜5,5を、幅方向に間
隔を介して複数条略平行に印刷により形成する。
Then, on the plane of the first insulating plate 2,
As shown in FIG. 3, the belt-shaped resistive films 5, 5 are formed by printing a plurality of strips substantially in parallel with an interval in the width direction.

【0017】なお、この抵抗膜5,5の形成の際、抵抗
膜5,5間の距離aは、第1の絶縁板2の縁から抵抗膜
5の縁までの距離bの略2倍(a=2b)の距離となるよ
うに形成する。
When forming the resistive films 5, 5, the distance a between the resistive films 5, 5 is approximately twice as large as the distance b from the edge of the first insulating plate 2 to the edge of the resistive film 5. a = 2b).

【0018】この抵抗膜5の材料としては、第1の絶縁
板2がセラミック材料板の場合には銀、パラジウム、金
またはタングステン、モリブデン、ルテニウム、錫など
の抵抗性物質をガラスや樹脂などに分散させた抵抗ペー
ストとし、第1の絶縁板2が合成樹脂板の場合は、銀や
カーボンなどを抵抗性物質とした合成樹脂抵抗塗料を用
いる。
When the first insulating plate 2 is a ceramic material plate, a material such as silver, palladium, gold or tungsten, molybdenum, ruthenium, tin or the like is used as a material of the resistance film 5. When the first insulating plate 2 is a synthetic resin plate as a dispersed resistance paste, a synthetic resin resistance paint using silver or carbon as a resistive substance is used.

【0019】また、第1の絶縁板2の抵抗膜5,5が形
成された平面上に、図4に示すように、抵抗膜5,5の
長手方向の両端の縁に位置して帯状の縁導電膜6a,6aを
形成するとともに、縁導電膜6a,6a間に、この縁導電膜6
aの幅寸法cの略2倍の幅寸法d(d=2c)の帯状の幅
広導電膜6b,6bを、幅方向に間隔を介して複数条略平行
に印刷により形成する。
On the plane of the first insulating plate 2 on which the resistive films 5, 5 are formed, as shown in FIG. The edge conductive films 6a, 6a are formed, and the edge conductive films 6a, 6a are interposed between the edge conductive films 6a, 6a.
A plurality of strip-shaped wide conductive films 6b, 6b each having a width dimension d (d = 2c) substantially twice as large as the width dimension c of a are formed by printing in parallel in the width direction at intervals.

【0020】なお、この縁導電膜6aおよび幅広導電膜6b
の材料としては、第1の絶縁板2がセラミック材料板の
場合には銀、パラジウム、金またはタングステン、モリ
ブデンなどの導電性物質をガラスや樹脂などに分散させ
た導電ペーストとし、第1の絶縁板2が合成樹脂板の場
合は、銀などを導電性物質とした合成樹脂抵抗塗料を用
いる。
The edge conductive film 6a and the wide conductive film 6b
When the first insulating plate 2 is a ceramic material plate, a conductive paste in which a conductive substance such as silver, palladium, gold, tungsten, or molybdenum is dispersed in glass, resin, or the like is used as the first insulating plate 2. When the plate 2 is a synthetic resin plate, a synthetic resin resistance paint using silver or the like as a conductive material is used.

【0021】次に、図5に示すように、第1の絶縁板2
の抵抗膜5、縁導電膜6aおよび幅広導電膜6bが形成され
た平面上に、第1の絶縁板2と同じ材質で同平板形状の
第2の絶縁板3を重ね合せ、150℃〜200℃で加
熱して積層絶縁体9を形成する。なお、第1および第2
の絶縁板2,3が合成樹脂板の場合は、接着材で接着す
る。
Next, as shown in FIG.
Resistive film 5, the Enshirubedenmaku 6a and the wide conductive film 6b is on are formed planar, the second insulating plate 3 so I if overlapping of the plate shape of the same material as the first insulating plate 2, 0.99 ° C. The laminated insulator 9 is formed by heating at about 200 ° C. Note that the first and second
When the insulating plates 2 and 3 are synthetic resin plates, they are bonded with an adhesive.

【0022】そして、この積層絶縁体9の第2の絶縁板
3の上面に、図5に示すように、各抵抗膜5間の略中央
位置ごとに分割する方向に沿って、V字状に割り溝10を
形成する。さらに、積層絶縁体9を、幅広導電膜6bの長
手方向の略中央で帯状の抵抗膜5の長手方向を寸断する
方向に切断、すなわち分割して、図6に示す細長絶縁片
11を形成する。
Then, on the upper surface of the second insulating plate 3 of the laminated insulator 9, as shown in FIG. The dividing groove 10 is formed. Further, the laminated insulator 9 is cut , that is, divided at a substantially central portion in the longitudinal direction of the wide conductive film 6b in a direction in which the longitudinal direction of the strip-shaped resistive film 5 is cut off.
Form 11.

【0023】この後、細長絶縁片11を焼成する。なお、
焼成温度は、抵抗膜5、縁導電膜6aおよび幅広導電膜6b
の材料が、銀、パラジウム、金、ルテニウムなどの厚膜
抵抗ペーストの場合には800℃〜900℃で焼成し
て、第1および第2の絶縁板2,3を焼結させる。ま
た、抵抗膜5、縁導電膜6aおよび幅広導電膜6bの材料が
タングステン、モリブデンの場合はN混合ガス中
で1400℃〜1600℃で焼成する。
Thereafter, the elongated insulating piece 11 is fired. In addition,
The firing temperature is determined by the resistance film 5, the edge conductive film 6a, and the wide conductive film 6b.
If the material is a thick film resistor paste such as silver, palladium, gold, ruthenium or the like, the paste is fired at 800 ° C. to 900 ° C. to sinter the first and second insulating plates 2 and 3. When the material of the resistance film 5, the edge conductive film 6a, and the wide conductive film 6b is tungsten or molybdenum, baking is performed at 1400 ° C. to 1600 ° C. in an N 2 H 2 mixed gas.

【0024】なお、セラミック化は高温焼結の方が好ま
しいが、銀、パラジウム、金、ルテニウムなどは、90
0℃以上では溶融してしまうため、それ以下の温度で焼
成することが好ましい。
High temperature sintering is more preferable for ceramification, but silver, palladium, gold, ruthenium, etc.
If the temperature is 0 ° C. or more, the material is melted.

【0025】次に、細長絶縁片11の幅方向の両端面、す
なわち、抵抗膜5の幅方向の断面および導電膜6の断
面、すなわち縁導電膜6aの側面もしくは幅広導電膜6bの
長手方向の断面が露出している面に、導電ペーストまた
は導電塗料を、抵抗膜5および導電膜6、すなわち縁
膜6aもしくは幅広導電膜6bに導通するように塗布し、
焼成または加熱乾燥を施し、図1および図7に示すよう
に、細長絶縁片11の両側面に導電部7,7を形成する。
Next, both end surfaces in the width direction of the elongated insulating piece 11, ie, the cross section in the width direction of the resistive film 5, and the cross section of the conductive film 6, ie, the side surface of the edge conductive film 6a or the longitudinal direction of the wide conductive film 6b. the surface section is exposed, the conductive paste or conductive coating, resistive film 5, and the conductive film 6, i.e. the edge guide
It applied to conduct the conductive film 6a or the wide conductive film 6b,
By baking or heating and drying, conductive portions 7, 7 are formed on both side surfaces of the elongated insulating piece 11, as shown in FIGS.

【0026】そして、細長絶縁片11を割り溝10の位置か
ら分割し、図8に示すように、長手方向の両端面に導電
部7,7が形成された直方体形状のチップ片12を形成す
る。
Then, the elongated insulating piece 11 is divided from the position of the dividing groove 10, and as shown in FIG. 8, a rectangular parallelepiped chip piece 12 having conductive portions 7, 7 formed on both end surfaces in the longitudinal direction is formed. .

【0027】次に、チップ片12の導電部7,7に、ニッ
ケル電解メッキあるいは半田メッキを施して電極8,8
を形成し、図1に示す角形チップ抵抗器1を形成する。
なお、この電極8,8は、ニッケル電解メッキを施した
後に、さらにこのニッケル電解メッキの表面に半田メッ
キを層状に施して形成してもできる。
Next, nickel conductive plating or solder plating is applied to the conductive portions 7, 7 of the chip piece 12 to form electrodes 8, 8,
To form the square chip resistor 1 shown in FIG.
The electrodes 8 , 8 may be formed by applying a nickel electrolytic plating and then applying a layer of solder plating on the surface of the nickel electrolytic plating.

【0028】上記実施例は、帯状の抵抗膜5を形成した
第1の絶縁板2の平面上に、抵抗膜5の長手方向の両端
側の縁に位置して帯状の縁導電膜6aを形成するととも
に、この縁導電膜6aより幅寸法が略2倍幅広の幅広導電
膜6bを、この縁導電膜6aに幅方向に間隔を介して略平行
に複数条形成し、幅広導電膜6bの長手方向の略中央で
し、抵抗膜5間の略中央位置ごとに分割するため、第
1および第2の絶縁板2,3にて挟着した積層絶縁体9
を縦横に分割するのみで、角形チップ抵抗器1を切除部
分がなく一挙に大量で容易に形成できる。さらに、抵抗
膜5および抵抗膜5に連続する導電膜6、すなわち縁導
電膜6aおよび幅広導電膜6bの断面が露出するため、単に
絶縁板2,3の平面上に形成した抵抗膜5の断面に比
し、細長絶縁片11に形成する導電部7と導電膜6を介し
た抵抗膜5との接続面積が増大でき、接続が非常に強固
になり、信頼性の高い電極が得られる。
In the above-described embodiment, the strip-shaped edge conductive film 6a is formed on the plane of the first insulating plate 2 on which the strip-shaped resistance film 5 is formed, located at both edges in the longitudinal direction of the resistance film 5. as well as, the edge conductive film 6a than the width dimension substantially twice wider wide conductive film 6b, plural rows formed substantially in parallel via a gap in the width direction in this Enshirubedenmaku 6a, longitudinal wide conductive film 6b Minutes in the approximate center of the direction
Order to split, is divided into a substantially central position between the resistive film 5, laminated insulators were sandwiched by the first and second insulating plates 2 and 3 9
Are divided vertically and horizontally, and the square chip resistor 1 can be easily formed in a large amount at once without a cut-out portion. Further, since the resistive film 5 and the conductive film 6 continuous with the resistive film 5, that is, the cross-sections of the edge conductive film 6a and the wide conductive film 6b are exposed, the cross-section of the resistive film 5 simply formed on the plane of the insulating plates 2, 3 is As compared with the above, the connection area between the conductive portion 7 formed on the elongated insulating piece 11 and the resistive film 5 via the conductive film 6 can be increased, the connection becomes very strong, and a highly reliable electrode can be obtained.

【0029】また、第1の絶縁板2の平面上に抵抗膜5
を形成する際に、これら抵抗膜5,5間の距離を第1の
絶縁板2の縁から抵抗膜5の縁までの距離の略2倍にす
るとともに、第1の絶縁板2の平面上の両端側の縁に形
成された縁導電膜6a,6aの略2倍の幅寸法を有する幅広
導電膜6b,6bを、これら縁導電膜6a,6aに幅方向に間隔を
介して形成することにより、第1の絶縁板2と第2の絶
縁板3とを重ね合わせた後における積層絶縁体9を分割
する際に、縁導電膜6a、幅広導電膜6bおよび抵抗膜5の
少なくともいずれかの位置の自由度が増加するから、積
層絶縁体9を分割する際の歩留まりを向上できる。
The resistance film 5 is formed on the plane of the first insulating plate 2.
Is formed, the distance between the resistive films 5 is set to a first distance.
Make the distance from the edge of the insulating plate 2 to the edge of the resistive film 5 approximately twice as large.
And the edges of the first insulating plate 2 at both ends on the plane.
Wide with a width twice as large as the formed edge conductive films 6a, 6a
The conductive films 6b, 6b are spaced apart from the edge conductive films 6a, 6a in the width direction.
By forming the first insulating plate 2 and the second insulating
The laminated insulator 9 after overlapping the edge plate 3 is divided
When performing, the edge conductive film 6a, the wide conductive film 6b and the resistance film 5
Since the degree of freedom of at least one position increases, the product
The yield when dividing the layer insulator 9 can be improved.

【0030】なお、上記実施例において、必要に応じて
1個のチップ片12に2層以上の抵抗膜5や縁導電膜6a、
幅広導電膜6bを形成することもできる。
In the above embodiment, two or more resistive films 5 and edge conductive films 6a,
The wide conductive film 6b can also be formed.

【0031】また、第1の絶縁板2上に縁導電膜6aを形
成して説明したが、第1の絶縁板2の縁近傍に各導電膜
6a,6bや抵抗膜5を形成せず、最終的に切り落とすよう
にしてもよい。また、各導電膜6a,6bや抵抗膜5の幅寸
法や厚さ寸法は適宜設定される。
Further, it has been described to form a Enshirube film 6a on the first insulating plate 2, each conductive film to near the edge of the first insulating plate 2
Instead of forming the resistive films 6a and 6b and the resistive film 5, the cutoff may be finally cut off. The width and thickness of each of the conductive films 6a and 6b and the resistance film 5 are appropriately set.

【0032】[0032]

【発明の効果】請求項1記載の角形チップ抵抗器の製造
方法は、帯状の抵抗膜を形成した第1の絶縁板の平面上
に、抵抗膜の長手方向の両端側の縁に帯状の縁導電膜を
形成するとともに、この縁導電膜の幅寸法より略2倍の
幅広導電膜を略平行に複数条形成し、幅広導電膜の長手
方向の略中央で分割するため、第1および第2の絶縁板
にて挟着した積層絶縁体を縦横に分割するのみで、抵抗
膜と導電部との接続性が向上した角形チップ抵抗器を切
除部分がなく容易に大量に製造でき、また、複数条の帯
状の抵抗膜間の距離を第1の絶縁板の縁から抵抗膜の縁
までの距離の略2倍にし、かつ幅広導電膜の幅寸法を縁
導電膜の略2倍としたので、第1の絶縁板と第2の絶縁
板とを重ね合わせた後における積層絶縁体を分割する際
に、縁導電膜、幅広導電膜および抵抗膜の少なくともい
ずれかの位置の自由度が増加するから、積層絶縁体を分
割する際の歩留まりを向上できる。
Method for manufacturing a rectangular chip resistor according to claim 1, wherein, according to the invention is, on the plane of the first insulating plate forming the band-shaped resistive film, in the longitudinal direction of both ends of the edges of the resistive film strip to form a Enshirubedenmaku, the edge conductive film plural rows formed substantially parallel to substantially twice the wide conductive film than the width of, for dividing the longitudinal direction of the substantially center of the wide conductive film, first and second By simply dividing the laminated insulator sandwiched between the two insulating plates vertically and horizontally, square chip resistors with improved connectivity between the resistive film and the conductive portion can be easily mass-produced without any cut-off portions . Multiple strips
The distance between the resistive films from the edge of the first insulating plate to the edge of the resistive film.
To approximately twice the distance to
The first insulating plate and the second insulating plate are approximately twice as large as the conductive film.
When dividing a laminated insulator after laminating a board
At least one of an edge conductive film, a wide conductive film, and a resistive film.
Since the degree of freedom of the position of the shift increases, the laminated insulator can be separated.
Ru can improve the yield at the time of the split.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の角形チップ抵抗器の製造方法により製
造した角形チップ抵抗器の一実施例を示す長手方向の断
面側面図である。
FIG. 1 is a longitudinal sectional side view showing one embodiment of a square chip resistor manufactured by a method of manufacturing a square chip resistor according to the present invention.

【図2】同上第1の絶縁板を示す斜視図である。FIG. 2 is a perspective view showing a first insulating plate according to the first embodiment;

【図3】同上第1の絶縁板上に抵抗膜を形成した状況を
示す斜視図である。
FIG. 3 is a perspective view showing a state in which a resistive film is formed on a first insulating plate.

【図4】同上抵抗膜を形成した第1の絶縁板上に導電膜
を形成した状況を示す斜視図である。
FIG. 4 is a perspective view showing a state where a conductive film is formed on the first insulating plate on which the resistance film is formed.

【図5】同上第2の絶縁板を重ね合わせた状況の積層絶
縁体を示す斜視図である。
FIG. 5 is a perspective view showing the laminated insulator in a state where the second insulating plates are overlapped with each other;

【図6】同上細長絶縁片を示す斜視図である。FIG. 6 is a perspective view showing the elongated insulating piece.

【図7】同上細長絶縁片に導電部を形成した状況を示す
平面図である。
FIG. 7 is a plan view showing a state in which a conductive portion is formed on the elongated insulating piece.

【図8】同上チップ片を示す平面図である。FIG. 8 is a plan view showing the same chip piece.

【符号の説明】[Explanation of symbols]

1 角形チップ抵抗器 2 第1の絶縁板 3 第2の絶縁板 5 抵抗 6a 縁導電膜 6b 幅広導電膜 7 導電部 9 積層絶縁体 11 細長絶縁片DESCRIPTION OF SYMBOLS 1 Square chip resistor 2 1st insulating plate 3 2nd insulating plate 5 Resistive film 6a Edge conductive film 6b Wide conductive film 7 Conductive part 9 Laminated insulator 11 Slender insulating piece

フロントページの続き (58)調査した分野(Int.Cl.7,DB名) H01C 17/06 H01C 7/00 Continuation of the front page (58) Field surveyed (Int.Cl. 7 , DB name) H01C 17/06 H01C 7/00

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 複数条の帯状の抵抗膜間の距離を第1の
絶縁板の縁から前記抵抗膜の縁までの距離の略2倍にし
て、前記第1の絶縁板の平面上に前記抵抗膜を幅方向に
間隔を介して略平行に形成し、 この第1の絶縁板の前記抵抗膜を形成した平面上の前記
抵抗膜の長手方向の両端側の縁に帯状の縁導電膜を形成
するとともに、この縁導電膜より幅寸法が略2倍の幅広
導電膜をこの縁導電膜に幅方向に間隔を介して略平行に
複数条形成し、 前記第1の絶縁板の前記抵抗膜、縁導電膜および幅広導
電膜を形成した平面上に第2の絶縁板を重ね合わせて固
定してこれら第1および第2の絶縁板にて前記抵抗膜
縁導電膜および幅広導電膜を挟着して積層絶縁体を形成
し、 この積層絶縁体を前記幅広導電膜の長手方向の略中央で
分割して細長絶縁片を形成し、 この細長絶縁片の前記縁導電膜および幅広導電膜の長手
方向に沿った断面が露出する両側面に導電部を形成し、 この細長絶縁片を前記各抵抗膜間の中間位置からそれぞ
れチップ状に分割することを特徴とする角形チップ抵抗
器の製造方法。
A distance between a plurality of strip-shaped resistive films is set to a first distance.
Approximately twice the distance from the edge of the insulating plate to the edge of the resistive film
Te, length of the first said resistive film on the plane of the insulating plate through a distance in the width direction substantially parallel to the resistive film on the first plane said forming a resistive film of the insulating plate to form a strip-shaped Enshirube film in the direction of both end sides of the edges, substantially parallel to the plurality condition through a gap in the width direction width dimension than the edge conductive film a wide conductive film substantially twice this Enshirube conductive film Forming a second insulating plate on a surface of the first insulating plate on which the resistive film, the edge conductive film, and the wide conductive film are formed, and fixing the second insulating plate on the first and second insulating plates; The resistive film ,
A laminated insulator is formed by sandwiching the edge conductive film and the wide conductive film, and the laminated insulator is formed at substantially the center in the longitudinal direction of the wide conductive film.
An elongated insulating piece is formed by dividing, and conductive portions are formed on both sides of the elongated insulating piece where the cross sections along the longitudinal direction of the edge conductive film and the wide conductive film are exposed. A method of manufacturing a square chip resistor, wherein each of the chips is divided into chips from an intermediate position between the films.
JP33392793A 1993-12-28 1993-12-28 Manufacturing method of square chip resistor Expired - Fee Related JP3242247B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP33392793A JP3242247B2 (en) 1993-12-28 1993-12-28 Manufacturing method of square chip resistor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP33392793A JP3242247B2 (en) 1993-12-28 1993-12-28 Manufacturing method of square chip resistor

Publications (2)

Publication Number Publication Date
JPH07201540A JPH07201540A (en) 1995-08-04
JP3242247B2 true JP3242247B2 (en) 2001-12-25

Family

ID=18271530

Family Applications (1)

Application Number Title Priority Date Filing Date
JP33392793A Expired - Fee Related JP3242247B2 (en) 1993-12-28 1993-12-28 Manufacturing method of square chip resistor

Country Status (1)

Country Link
JP (1) JP3242247B2 (en)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7014563B2 (en) * 2017-10-25 2022-02-01 Koa株式会社 Manufacturing method of chip resistors and chip resistors

Also Published As

Publication number Publication date
JPH07201540A (en) 1995-08-04

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