JP3223771U - Substrate transfer device and substrate cleaning device - Google Patents

Abstract

A substrate transport apparatus capable of smoothly transporting a substrate and a substrate cleaning apparatus capable of satisfactorily cleaning the substrate. A substrate transport apparatus includes a lower roller and an upper roller that are rotated in opposite directions, and includes a transport unit that sandwiches and transports a glass plate between the lower roller and the upper roller. The lower roller has a resin surface layer portion 26 over a range longer than the width dimension orthogonal to the conveyance direction of the glass plate, and the surface layer portion is in contact with the entire width range on the lower surface of the glass plate, The roller has a long shaft 31 and a rubber elastic ring 33 provided in the vicinity of both ends of the shaft, and the elastic ring is in contact with a portion in the vicinity of both edges in the width direction on the upper surface of the glass plate. . The substrate cleaning apparatus includes a plurality of transfer units 11 and a cleaning mechanism unit that cleans the upper and lower surfaces of the substrate between the transfer units. [Selection] Figure 3

Description

  The present invention relates to a substrate transfer device and a substrate cleaning device.

  For example, as a cleaning device for cleaning glass plates used for flat panel displays (FPD) such as LCD (Liquid Crystal Display) and OLED (Organic Light-Emitting Diode), It is known to include a brush cleaning mechanism that performs cleaning by contacting a roll brush, and a transport mechanism that holds the end of the glass plate and transports the glass plate in a direction substantially perpendicular to the length of the roll brush. (For example, refer to Patent Document 1). In this cleaning apparatus, the transport roller and the anti-lifting roller constituting the transport mechanism are sent out with the edge of the glass plate interposed therebetween.

JP 2008-68223 A

  By the way, if the pressing force of the brush against the glass plate is increased in order to improve the cleaning power of the glass plate by the cleaning mechanism, the resistance in the cleaning mechanism increases. Then, there exists a possibility that the conveyance speed of a glass plate may fall, or a glass plate may stop and a cleaning defect may arise.

  SUMMARY OF THE INVENTION An object of the present invention is to provide a substrate transport apparatus that can smoothly transport a substrate and a substrate cleaning apparatus that can clean the substrate satisfactorily.

The present invention has the following configuration.
(1) A substrate transport apparatus including a transport unit that includes a lower roller and an upper roller that are rotated in opposite directions, and sandwiches and transports a substrate between the lower roller and the upper roller,
The lower roller has a resin surface layer over a range longer than the width dimension orthogonal to the transport direction of the substrate, and the surface layer is in contact with the entire width direction of the lower surface of the substrate,
The upper roller has a long shaft and a rubber elastic ring provided in the vicinity of both ends of the shaft, and the elastic ring is in contact with the vicinity of both edges in the width direction on the upper surface of the substrate. To be
Substrate transfer device.
(2) A plurality of the conveying sections of (1) are arranged,
A cleaning mechanism for cleaning the upper and lower surfaces of the substrate is provided between the transfer units.
Substrate cleaning device.

  According to the substrate transport device and the substrate cleaning device of the present invention, the substrate can be transported smoothly, and thus the substrate can be cleaned satisfactorily.

1 is a schematic plan view of a substrate cleaning apparatus including a substrate transfer apparatus according to an embodiment of the present invention. 1 is a schematic side view of a substrate cleaning apparatus including a substrate transfer apparatus according to an embodiment of the present invention. It is AA sectional drawing in FIG. It is a partial schematic sectional drawing in alignment with the axial direction of the conveyance part of a board | substrate conveyance apparatus. It is AA sectional drawing in FIG. 1 which shows the modification of the conveyance part of a board | substrate conveyance apparatus. It is a schematic plan view of the board | substrate cleaning apparatus which shows the other example of arrangement | positioning of the conveyance part and washing | cleaning mechanism part of a board | substrate conveyance apparatus. It is a schematic plan view of the board | substrate cleaning apparatus which shows the other example of arrangement | positioning of the conveyance part and washing | cleaning mechanism part of a board | substrate conveyance apparatus.

Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings.
FIG. 1 is a schematic plan view of a substrate cleaning apparatus provided with a substrate transfer apparatus according to an embodiment of the present invention. FIG. 2 is a schematic side view of a substrate cleaning apparatus provided with a substrate transfer apparatus according to an embodiment of the present invention.

  As shown in FIGS. 1 and 2, the substrate transfer apparatus 10 according to this embodiment includes a plurality of transfer units 11. The substrate transport apparatus 10 constitutes a substrate cleaning apparatus 100 together with a plurality of cleaning mechanisms 50. That is, the substrate cleaning apparatus 100 includes the substrate transport apparatus 10 and the substrate cleaning mechanism unit 50.

  The substrate cleaning apparatus 100 is an apparatus for cleaning a glass plate (substrate) G formed in a rectangular shape. The glass plate G cleaned by the substrate cleaning apparatus 100 is, for example, an alkali-free glass used for flat panel displays (FPD) such as LCD (Liquid Crystal Display) and OLED (Organic Light-Emitting Diode). Made of system material. The substrate cleaning apparatus 100 is an apparatus that cleans the upper and lower surfaces of the glass plate G that is transported horizontally.

  3 is a cross-sectional view taken along the line AA in FIG. FIG. 4 is a partial schematic cross-sectional view along the axial direction of the transfer unit of the substrate transfer apparatus.

  As shown in FIGS. 3 and 4, the plurality of transport units 11 constituting the substrate transport apparatus 10 include a lower roller 13 and an upper roller 15. The lower roller 13 and the upper roller 15 are horizontally arranged at the upper and lower opposing positions, and the glass plate G is passed between them. The conveying unit 11 rotates in the opposite direction with the glass plate G sandwiched between the lower roller 13 and the upper roller 15, thereby conveying the glass plate G in one direction (see FIGS. 1 and 2). ).

  The lower roller 13 includes a tube body 21 and support shaft portions 22 provided at both ends of the tube body 21. The support shaft portion 22 has a flange portion 23 on the tube body 21 side, and the tube body 21 is fixed to the flange portion 23. The support shaft portion 22 is made of, for example, stainless steel (SUS) and is supported by bearings (not shown).

  The pipe body 21 is made of a stainless steel (SUS) pipe material, and a reinforcing pipe portion 25 is provided therein. The reinforcing pipe portion 25 is a pipe material made of carbon fiber reinforced plastic (CFRP: Carbon Fiber Reinforced Plastic), and is fitted into the pipe body 21. Thereby, as for the tubular body 21, the internal peripheral surface is reinforced over the longitudinal direction by the reinforcement pipe part 25, and bending is suppressed, aiming at weight reduction. In addition, the reinforcement pipe | tube part 25 can suppress bending more by forming from the carbon fiber reinforced plastic of PITCH type | system | group harder than PAN type | system | group.

  Further, the lower roller 13 is provided with a surface layer portion 26 on the outer peripheral surface of the tube body 21. The surface layer portion 26 is formed from a urethane resin. Thereby, as for the tubular body 21, the outer peripheral surface except the vicinity of the both ends of a longitudinal direction is covered with the surface layer part 26. FIG. The length of the lower roller 13 in the axial direction of the surface layer portion 26 is set to be longer than the width dimension orthogonal to the conveyance direction X of the glass plate G. Thereby, both ends of the surface layer portion 26 of the lower roller 13 protrude from the glass plate G, and the glass plate G is brought into contact with the surface layer portion 26 of the lower roller 13 over the entire width.

  The upper roller 15 includes a shaft 31, a fixing member 32, and an elastic ring 33. The shaft 31 is made of, for example, a long round bar formed of stainless steel (SUS) or the like, and both ends are supported by bearings (not shown). The fixing member 32 is fixed near both ends of the shaft 31, and the elastic ring 33 is fitted on the outer periphery of the fixing member 32. Thereby, the elastic ring 33 is attached to the shaft 31 via the fixing member 32. The elastic ring 33 is made of, for example, an elastic material such as fluoro rubber having excellent heat resistance, chemical resistance, and oil resistance. The elastic ring 33 is formed in a square ring shape that is formed in a rectangular shape in cross section. In the upper roller 15, the elastic ring 33 is disposed in the vicinity of both edge portions in the width direction orthogonal to the conveyance direction X of the glass plate G to be conveyed. As a result, the upper roller 15 is brought into contact with the elastic rings 33 in the vicinity of both edges in the width direction of the glass plate G.

  In each transport unit 11, the lower roller 13 and the upper roller 15 are rotated in synchronization with each other in directions opposite to each other by a drive mechanism (not shown). As a result, the glass plate G fed between the lower roller 13 and the upper roller 15 is sandwiched between the surface layer portion 26 of the lower roller 13 and the elastic ring 33 of the upper roller 15 and conveyed toward the conveying direction X. The At this time, the lower surface of the glass plate G is in contact with the surface layer portion 26 over the entire region in the width direction, and the vicinity of both edges in the width direction on the upper surface is in contact with the elastic ring 33.

  As shown in FIGS. 1 and 2, the cleaning mechanism unit 50 constituting the substrate cleaning apparatus 100 is disposed between the transfer units 11. Specifically, the two transport units 11 are set as one set, and the cleaning mechanism unit 50 is disposed between the transport units 11 of these sets.

  The cleaning mechanism unit 50 includes a lower disk brush group 51 and an upper disk brush group 52. The lower disk brush group 51 and the upper disk brush group 52 each have a plurality of disk brushes 55, and each of these disk brushes 55 is rotated by a drive motor 56. The plurality of disk brushes 55 of the lower disk brush group 51 and the upper disk brush group 52 are arranged in a direction orthogonal to the transport direction X of the glass plate G transported by the substrate transport apparatus 10.

  In the lower disk brush group 51, the disk brush 55 is arranged upward, and cleans the lower surface of the glass plate G transported by the substrate transport apparatus 10. In the upper disk brush group 52, the disk brush 55 is disposed downward and cleans the upper surface of the glass plate G conveyed by the substrate conveying apparatus 10. The disk brush 55 is, for example, a sponge brush made of a resin such as PVA (polyvinyl alcohol), or a bristle brush made of a resin such as nylon (polyamide). It is. Note that the rotation (spinning) speed of the disk brush 55 by the drive motor 56 is preferably 100 to 500 rpm.

  The cleaning mechanism unit 50 includes nozzles (not shown) for injecting cleaning liquid onto the upper and lower surfaces of the glass plate G. On the upper and lower surfaces of the glass plate G, for example, a slurry containing cerium oxide or the like, a cleaning liquid such as a cleaning agent (alkaline or acidic) or pure water is sprayed from a nozzle. For example, if an aqueous cleaning agent containing an organic phosphonic acid, a polycarboxylic acid salt, an aromatic sulfonic acid, and an amine-alkylene oxide adduct is used as the cleaning liquid, it remains and / or adheres to the surface of the polished glass plate G. The polished abrasive grains made of cerium oxide or the like can be dispersed and removed well, and the flatness of the glass plate G is not impaired. In addition, as the cleaning liquid, for example, an inorganic alkali cleaning agent containing an inorganic alkali such as lithium hydroxide, sodium hydroxide, potassium hydroxide, lithium carbonate, sodium carbonate, and potassium carbonate is also used.

  In the substrate cleaning apparatus 100 having the above-described configuration, when the glass plate G is fed between the lower roller 13 and the upper roller 15 constituting the transport unit 11 of the substrate transport apparatus 10, the glass plate G is moved to the lower roller 13. And the upper roller 15 to be conveyed in the conveying direction X.

  The glass plate G transported in the transport direction X by the substrate transport apparatus 10 is cleaned by the cleaning mechanism unit 50 disposed between the transport units 11. Specifically, the disk brush 55 of the lower disk brush group 51 and the upper disk brush group 52 of each cleaning mechanism unit 50 is rotated while being pressed against the lower surface and the upper surface of the glass plate G. The deposits and the like on the lower and upper surfaces of the glass plate G are removed, and the lower and upper surfaces of the glass plate G are cleaned.

  During the cleaning by the disc brush 55 of the cleaning mechanism unit 50, the glass plate G is transported in the transport direction X with a high holding force by the lower roller 13 and the upper roller 15 of the transport unit 11. Therefore, even if the pressing force and rotational force transmitted from the disc brush 55 to the glass plate G are increased to increase the cleaning power, the glass plate G does not have a problem such as a decrease in conveyance speed or a conveyance stop, and does not meander. It is transported stably.

  As described above, according to the substrate transport apparatus 10 according to the present embodiment, the glass plate G includes the lower roller 13 having the resin surface layer portion 26 in contact with the entire surface in the width direction on the lower surface, and the upper surface. Is sandwiched by the upper roller 15 in which a rubber elastic ring 33 is in contact with the vicinity of both edges in the width direction, and is conveyed with a high holding force. Thereby, even if resistance arises by performing various processes, such as a washing process, with respect to the glass plate G, there is no problem such as a decrease in the conveyance speed or a conveyance stop, and the glass plate is stable without meandering. G can be conveyed.

  In particular, since the surface layer portion 26 of the lower roller 13 is made of urethane resin and the rubber elastic ring 33 of the upper roller 15 is made of a square ring having a rectangular cross section, the glass plate G is conveyed with a high holding force. Can do.

  In addition, since the elastic ring 33 of the upper roller 15 is brought into contact with the vicinity of both edges in the width direction on the upper surface of the glass plate G, various processes such as cleaning on the center side of the upper surface of the glass plate G are favorably performed. be able to.

  Further, the lower roller 13 has a structure in which a reinforcing tube portion 25 made of carbon fiber reinforced plastic is inserted into a stainless steel tube body 21 around which a surface layer portion 26 is wound around the outer periphery, so that the weight is reduced. However, the bending of the lower roller 13 due to the weight of the glass plate G can be suppressed. Thereby, the glass plate G can be conveyed, suppressing bending.

  Then, according to the substrate cleaning apparatus 100 including the substrate transfer apparatus 10, the glass plate G is transferred by the plurality of transfer units 11, and the glass plate G is cleaned by the cleaning mechanism unit 50 provided between the transfer units 11. The upper and lower surfaces can be cleaned well. In addition, since the transport unit 11 can transport the glass plate G while holding it with a high holding force, even if resistance is generated by performing a cleaning process on the glass plate G by the cleaning mechanism unit 50, the transport unit 11 transports the glass plate G. The glass plate G can be stably conveyed without problems such as a decrease in speed and conveyance stop, and without meandering.

  In particular, since the cleaning mechanism unit 50 includes a plurality of disk brushes 55 that rotate while contacting the upper and lower surfaces of the glass plate G, the disk brushes of the cleaning mechanism unit 50 with respect to the glass plate G transported by the transport unit 11. 55 can clean the upper and lower surfaces satisfactorily.

  In the above embodiment, the case where the upper roller 15 configuring the transport unit 11 of the substrate transport apparatus 10 is provided with the rectangular ring-shaped elastic ring 33 formed in a rectangular shape in cross-section is illustrated, but the elastic ring 33 is illustrated. The cross-sectional shape and the number of installations are not limited to the above embodiment.

FIG. 5 is a cross-sectional view taken along line AA in FIG. 1 illustrating a modification of the transport unit of the substrate transport apparatus.
As shown in FIG. 5, in the upper roller 15, two elastic rings 33 made of O-rings having a circular cross section are spaced apart in the axial direction on a fixing member 32 provided near both ends of the shaft 31. It is installed.

  Also in the case of the transport unit 11 provided with the upper roller 15, the glass plate G can be transported with a high holding force by the upper roller 15 and the lower roller 13 having the surface layer portion 26 made of urethane resin. Further, by using a commercially available O-ring as the elastic ring 33, the equipment cost can be reduced.

  Next, various substrate cleaning apparatuses according to modified examples in which the arrangement and the number of installation of the transport unit 11 and the cleaning mechanism unit 50 are different will be described.

(Modification 1)
FIG. 6 is a schematic plan view of the substrate cleaning apparatus showing another arrangement example of the transfer unit and the cleaning mechanism unit of the substrate transfer apparatus.

  As shown in FIG. 6, the substrate cleaning apparatus 200 according to Modification 1 includes a substrate cleaning unit 201. The substrate cleaning unit 201 includes three transfer units 11, and the cleaning mechanism unit 50 is disposed between these transfer units 11. The substrate cleaning apparatus 200 is configured by installing three sets of substrate cleaning units 201 in series.

  As described above, according to the substrate cleaning apparatus 200 including the substrate cleaning unit 201 including the transport unit 11 and the cleaning mechanism unit 50, a necessary number of substrate cleanings are performed according to various types of processing (cleaning processing) for the glass plate G and the like. The units 201 can be installed in series to easily expand the equipment.

(Modification 2)
FIG. 7 is a schematic plan view of the substrate cleaning apparatus showing another arrangement example of the transfer unit and the cleaning mechanism unit of the substrate transfer apparatus.

  As shown in FIG. 7, the substrate cleaning apparatus 300 according to the modified example 2 includes a substrate cleaning unit 301 in which a cleaning mechanism 50 is disposed between two transfer units 11. The substrate cleaning apparatus 300 is configured by installing two sets of substrate cleaning units 301 in series. Further, in the cleaning mechanism section 50 constituting the substrate cleaning unit 301, the disk brushes 55 arranged in two rows in the lower disk brush group 51 and the upper disk brush group 52 are arranged in zigzag alignment with each other. Yes.

  Thus, also in the case of the substrate cleaning apparatus 300 including the substrate cleaning unit 301 including the transport unit 11 and the cleaning mechanism unit 50, a necessary number of substrate cleanings are performed according to various processes (cleaning processes) for the glass plate G and the like. The units 201 can be installed in series to easily expand the equipment. In particular, in the substrate cleaning apparatus 300, the disc brushes 55 of the respective cleaning mechanisms 50 are arranged in a staggered manner, so that the deposits that have not been removed between the disc brushes 55 on the upstream side in the transport direction X are removed. It can be removed by a disk brush 55 on the downstream side of the above.

  In addition, this invention is applicable to conveying board | substrates, such as electronic devices other than LCD, OLED, and FPD, for example, a glass substrate for optical elements, a glass disk, a solar cell. Further, the substrate to be transported is not limited to a glass plate, but may be a substrate formed from, for example, metal, ceramic, or resin.

  As described above, the present invention is not limited to the above-described embodiments, and those skilled in the art can make changes and applications based on combinations of the configurations of the embodiments, descriptions in the specification, and well-known techniques. This is also the scope of the present invention, and is included in the scope of seeking protection.

As described above, the following items are disclosed in this specification.
(1) A substrate transport apparatus including a transport unit that includes a lower roller and an upper roller that are rotated in opposite directions, and sandwiches and transports a substrate between the lower roller and the upper roller,
The lower roller has a resin surface layer over a range longer than the width dimension orthogonal to the transport direction of the substrate, and the surface layer is in contact with the entire width direction of the lower surface of the substrate,
The upper roller has a long shaft and a rubber elastic ring provided in the vicinity of both ends of the shaft, and the elastic ring is in contact with the vicinity of both edges in the width direction on the upper surface of the substrate. A substrate transfer device.
According to the substrate transport apparatus having the configuration (1), the resin surface layer portion of the lower roller is brought into contact with the entire width direction of the lower surface of the substrate, and the rubber elastic ring of the upper roller is connected to the upper surface of the substrate. In the vicinity of both edges in the width direction. Thus, the substrate has a lower roller in which the resin surface layer portion is in contact with the entire width direction on the lower surface, and an upper roller in which a rubber elastic ring is in contact with both edges in the width direction on the upper surface. And are conveyed with a high holding force.
As a result, for example, even if resistance is generated by performing various processes such as a cleaning process on the substrate, the substrate can be stably removed without causing problems such as a decrease in the conveyance speed or a conveyance stop, and without meandering. Can be transported.
In addition, since the elastic ring of the upper roller is in contact with the vicinity of both edges in the width direction on the upper surface of the substrate, various processes on the center side of the upper surface of the substrate can be performed satisfactorily.

(2) The substrate transport apparatus according to (1), wherein the transport unit transports the substrate made of a glass plate.
According to the substrate transport apparatus configured as described in (2) above, the glass plate can be transported with a high holding force by the transport unit composed of the lower roller and the upper roller. Various processes such as a cleaning process can be performed smoothly.

(3) The substrate transfer apparatus according to (1) or (2), wherein the elastic ring is a square ring having a rectangular cross section.
According to the substrate transport apparatus having the configuration of (3) above, the lower roller whose surface layer portion is in contact with the entire range in the width direction on the lower surface of the substrate, and the elastic ring made up of a rectangular ring having a rectangular cross section have a width on the upper surface of the substrate. The substrate can be transported with a high holding force by the upper roller in contact with the vicinity of both edges in the direction.

(4) The substrate transfer apparatus according to (1) or (2), wherein the elastic ring is an O-ring having a circular cross section.
According to the substrate transport apparatus having the configuration of (4) above, the lower roller whose surface layer portion is in contact with the entire range in the width direction on the lower surface of the substrate, and the elastic ring composed of the O-ring having a circular cross section are the widths on the upper surface of the substrate. The substrate can be transported with a high holding force by the upper roller in contact with the vicinity of both edges in the direction.

(5) The substrate transfer apparatus according to any one of (1) to (4), wherein the shaft is provided with a plurality of elastic rings in the vicinity of both ends.
According to the substrate transport apparatus having the configuration of (5) above, the lower roller whose surface layer portion is in contact with the entire range in the width direction on the lower surface of the substrate, and a plurality of elastic rings in the vicinity of both edges in the width direction on the upper surface of the substrate The substrate can be transported with a high holding force by the upper rollers respectively in contact with each other.

(6) The substrate transport device according to any one of (1) to (5), wherein the surface layer portion is formed of a urethane resin.
According to the substrate transport apparatus having the above configuration (6), the lower roller in which the surface layer portion made of urethane resin contacts the entire range in the width direction on the lower surface of the substrate, and both edges in the width direction on the upper surface of the substrate The substrate can be conveyed with a high holding force by the upper roller in contact with the vicinity of the portion.

(7) The lower roller is
A stainless steel tube with the surface layer wound around the outer periphery;
A reinforcing tube portion made of carbon fiber reinforced plastic inserted into the tube,
The substrate transfer apparatus according to any one of (1) to (6).
According to the substrate transport device having the configuration of (7), the lower tube is bent by the weight of the substrate while reducing the weight by reinforcing the stainless steel tube body with the reinforcing tube portion made of carbon fiber reinforced plastic. Can be suppressed. Thereby, a board | substrate can be conveyed, suppressing bending.

(8) A plurality of transport units according to any one of (1) to (7) are arranged,
A substrate cleaning apparatus, wherein a cleaning mechanism for cleaning the upper and lower surfaces of the substrate is provided between the transfer units.
According to the substrate cleaning apparatus having the above configuration (8), the upper and lower surfaces of the substrate can be satisfactorily cleaned by the cleaning mechanism provided between the transfer units while the substrate is transferred by the plurality of transfer units. Moreover, since the transport unit can transport the substrate while holding the substrate with a high holding force, even if resistance is generated by performing a cleaning process on the substrate by the cleaning mechanism unit, the transport speed is reduced or the transport is stopped. In addition, the substrate can be transported stably without any troubles such as meandering.

(9) The substrate cleaning apparatus according to (8), wherein the cleaning mechanism section includes a plurality of disk brushes that rotate while contacting the upper and lower surfaces of the substrate.
According to the substrate cleaning apparatus having the configuration (9), the upper and lower surfaces can be satisfactorily cleaned while transporting the substrate by the plurality of disk brushes rotating while contacting the upper and lower surfaces of the substrate.

(10) The substrate cleaning apparatus according to (9), wherein the cleaning mechanism section includes a plurality of the disk brushes arranged in a staggered manner in a plan view.
According to the substrate cleaning apparatus having the above configuration (10), the upper and lower surfaces of the substrate can be cleaned without gaps by the plurality of disk brushes arranged in a staggered manner.

(11) The substrate cleaning apparatus according to any one of (8) to (10), wherein a plurality of substrate cleaning units provided with the cleaning mechanism unit are arranged in series between the transfer units.
According to the substrate cleaning apparatus having the above configuration (11), a plurality of substrate cleaning units each including a transfer unit and a cleaning mechanism unit can be installed in series according to various types of processing on the substrate to facilitate expansion of equipment. It can be carried out.

DESCRIPTION OF SYMBOLS 10 Substrate conveyance apparatus 11 Conveyance part 13 Lower roller 15 Upper roller 21 Tube 25 Reinforcement pipe part 26 Surface layer part 31 Shaft 33 Elastic ring 50 Cleaning mechanism part 55 Disc brush 100,200,300 Substrate cleaning apparatus 201,301 Substrate cleaning unit G Glass plate (substrate)

Claims (11)

A substrate transport apparatus comprising a transport section that includes a lower roller and an upper roller that are rotated in opposite directions, and sandwiches and transports a substrate between the lower roller and the upper roller,
The lower roller has a resin surface layer over a range longer than the width dimension orthogonal to the transport direction of the substrate, and the surface layer is in contact with the entire width direction of the lower surface of the substrate,
The upper roller has a long shaft and a rubber elastic ring provided in the vicinity of both ends of the shaft, and the elastic ring is in contact with the vicinity of both edges in the width direction on the upper surface of the substrate. To be
Substrate transfer device. The transport unit transports the substrate made of a glass plate.
The substrate transfer apparatus according to claim 1. The elastic ring is a square ring having a rectangular cross section.
The board | substrate conveyance apparatus of Claim 1 or Claim 2. The elastic ring is composed of an O-ring having a circular cross section.
The board | substrate conveyance apparatus of Claim 1 or Claim 2. A plurality of elastic rings are respectively attached to the shaft in the vicinity of both ends.
The board | substrate conveyance apparatus as described in any one of Claims 1-4. The surface layer portion is formed from urethane resin,
The board | substrate conveyance apparatus as described in any one of Claims 1-5. The lower roller is
A stainless steel tube with the surface layer wound around the outer periphery;
A reinforcing tube portion made of carbon fiber reinforced plastic inserted into the tube,
Having
The board | substrate conveyance apparatus as described in any one of Claims 1-6. A plurality of transport units according to any one of claims 1 to 7 are arranged,
A cleaning mechanism for cleaning the upper and lower surfaces of the substrate is provided between the transfer units.
Substrate cleaning device. The cleaning mechanism has a plurality of disk brushes that rotate while contacting the upper and lower surfaces of the substrate.
The substrate cleaning apparatus according to claim 8. In the cleaning mechanism section, a plurality of the disk brushes are arranged in a staggered manner in a plan view.
The substrate cleaning apparatus according to claim 9. A plurality of substrate cleaning units provided with the cleaning mechanism between the transfer units are arranged in series.
The board | substrate cleaning apparatus as described in any one of Claims 8-10.

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