JP3219253B2 - Gas sensor - Google Patents

Gas sensor

Info

Publication number
JP3219253B2
JP3219253B2 JP20709092A JP20709092A JP3219253B2 JP 3219253 B2 JP3219253 B2 JP 3219253B2 JP 20709092 A JP20709092 A JP 20709092A JP 20709092 A JP20709092 A JP 20709092A JP 3219253 B2 JP3219253 B2 JP 3219253B2
Authority
JP
Japan
Prior art keywords
film
heater
gas sensor
electrode
electrodes
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP20709092A
Other languages
Japanese (ja)
Other versions
JPH0627070A (en
Inventor
隆司 山口
博宣 町田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Figaro Engineering Inc
Original Assignee
Figaro Engineering Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Figaro Engineering Inc filed Critical Figaro Engineering Inc
Priority to JP20709092A priority Critical patent/JP3219253B2/en
Publication of JPH0627070A publication Critical patent/JPH0627070A/en
Application granted granted Critical
Publication of JP3219253B2 publication Critical patent/JP3219253B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の利用分野】この発明は、パルス駆動型ガスセン
サに関する。
The present invention relates to a pulse-driven gas sensor.

【0002】[0002]

【従来技術】発明者らは、絶縁基板上にガラス断熱膜を
介して、ヒータ膜とガス検出用の金属酸化物半導体膜を
形成し、ヒータをパルス的に発熱させるようにしたガス
センサを提案した(特開平1−206,252号)。ま
た特公平4−1301号,同219号は、シリコン基板
をアンダーカットエッチングした空洞上にシリカの薄い
橋を設け、この橋上にヒータ膜とガス検出用の金属酸化
物半導体膜とを設けることを示している。これらの公報
でもヒータはパルス的に発熱させる。これらのガスセン
サでは、ヒータをパルス的に発熱させ、センサをパルス
駆動することにより消費電力を著しく減少させている。
2. Description of the Related Art The present inventors have proposed a gas sensor in which a heater film and a metal oxide semiconductor film for gas detection are formed on an insulating substrate via a glass heat insulating film so that the heater generates heat in a pulsed manner. (Japanese Patent Laid-Open No. 1-206,252). Japanese Patent Publication Nos. 4-1301 and 219 disclose that a thin silica bridge is provided on a cavity obtained by undercut etching a silicon substrate, and a heater film and a metal oxide semiconductor film for gas detection are provided on the bridge. Is shown. Also in these publications, the heater generates heat in a pulsed manner. In these gas sensors, the heater is pulsed to generate heat, and the pulse driving of the sensor significantly reduces power consumption.

【0003】センサをパルス駆動し消費電力を節減する
と、次の課題はヒータの発熱部を小さくパターニングす
ることになる。このためにはヒータ材料に高抵抗なもの
を用い、ヒータにはPtやAu等の低抵抗な電極を接続
することになる。図4に、考え易い電極配置を示す。図
のように電極01,01を配置すると、ヒータ電流は図
の破線のように流れ、発熱部が本来の意図している範囲
よりも広がる。これは消費電力を増加させる。
If the power consumption is reduced by pulsing the sensor, the next problem is to pattern the heating portion of the heater to a small size. For this purpose, a high-resistance heater material is used, and a low-resistance electrode such as Pt or Au is connected to the heater. FIG. 4 shows a possible electrode arrangement. When the electrodes 01 and 01 are arranged as shown in the figure, the heater current flows as shown by the broken line in the figure, and the heat-generating portion spreads out of the originally intended range. This increases power consumption.

【0004】[0004]

【発明の課題】この発明の課題は、以下の点にある。 (1) 発熱部の広がりを抑え、消費電力を抑制すること
(請求項1,2)。 (2) ヒータ膜や、ガス検出膜を設ける場合、ヒータ膜
とガス検出膜を対向部の外側でエッチングし、余分の発
熱と伝熱による消費電力を節減すること(請求項3)。 (3) ヒータ膜の電極パターンとガス検出膜の電極パタ
ーンを重ね、電極からの放熱を最小限にし、かつほこり
の付着等でヒータ膜とガス検出膜とがショートすること
を防止すること(請求項5)。
The object of the present invention is as follows. (1) To suppress the spread of the heat generating portion and suppress the power consumption. (2) When a heater film or a gas detection film is provided, the heater film and the gas detection film are etched on the outside of the opposing portion, so that excess heat generation and power consumption due to heat transfer are reduced. (3) Overlap the electrode pattern of the heater film with the electrode pattern of the gas detection film to minimize heat radiation from the electrodes, and to prevent short-circuit between the heater film and the gas detection film due to the adhesion of dust (claim) Item 5).

【0005】[0005]

【発明の構成】この発明は、絶縁基体上に一対の電極を
接続したヒータ膜を設け、ヒータ膜をパルス的に発熱さ
せるようにしたガスセンサにおいて、前記一対の電極の
各々を、直線状の対向部と、外部との接続部と、前記対
向部と前記接続部との間を結ぶ電極本体とで構成し、各
々の電極の対向部を、ヒータ膜と重なるように、かつ対
向部が互いに平行に向き合うように配置して、対向部間
のヒータ膜の領域を発熱部とし、さらに前記電極本体
を、対向部から見て発熱部から反対側へ、対向部に対し
て直角ないしは斜めに配置したことを特徴とする。
According to the present invention, there is provided a gas sensor in which a heater film to which a pair of electrodes are connected is provided on an insulating substrate so that the heater film generates heat in a pulsed manner. Part, a connection part with the outside, and an electrode body connecting the facing part and the connection part, and the facing part of each electrode overlaps the heater film, and the facing parts are parallel to each other. The area of the heater film between the opposing portions is a heat generating portion, and the electrode body is disposed at a right angle or obliquely to the opposite portion from the heat generating portion as viewed from the opposing portion. It is characterized by the following.

【0006】ここで例えば基体を絶縁基板の表面に断熱
ガラス膜を設けたものとするが、シリコン等の基板をア
ンダーカットエッチして設けた空洞上にブリッジ状のシ
リカ膜等を設けて、これを基体としても良い。またヒー
タ膜や、ガス検出膜を設ける場合にはヒータ膜とガス検
出膜は、例えば長方形状の形状とし、電極部には設ける
が、対向部の外側には設けないようにする。これはヒー
タ膜や金属酸化物半導体膜のエッチングは電極膜のエッ
チングより難しく、ヒータ膜や金属酸化物半導体膜を対
向部の外側でエッチングし、電極の引出し部側は残すよ
うにすることである。ガスとの接触で抵抗値が変化する
金属酸化物半導体膜を用いる場合、金属酸化物半導体膜
をヒータ膜に積層し、前記の一対の電極によりヒータ膜
と金属酸化物半導体膜との合成抵抗値を検出するように
しても良く、あるいは絶縁膜を中間に設けて、絶縁膜上
にガスとの接触で抵抗値が変化する金属酸化物半導体膜
を積層し、金属酸化物半導体膜に一対の電極を接続し
て、これらの電極がヒータ膜に接続した一対の電極と、
ヒータ膜からの引出し部でパターンが重なるようにして
も良い。用いるヒータ膜やガス検出膜は、原則としてパ
ターニングが容易で、熱容量の小さな薄膜とするが、厚
膜でも良い。
Here, for example, the base is provided with a heat insulating glass film on the surface of an insulating substrate. A bridge-like silica film or the like is provided on a cavity formed by undercut etching of a substrate such as silicon. May be used as a substrate. When a heater film or a gas detection film is provided, the heater film and the gas detection film have, for example, a rectangular shape, and are provided on the electrode portion but are not provided outside the facing portion. This means that the etching of the heater film or the metal oxide semiconductor film is more difficult than the etching of the electrode film, and the heater film or the metal oxide semiconductor film is etched outside the facing portion, and the lead portion of the electrode is left. . In the case of using a metal oxide semiconductor film whose resistance value changes by contact with a gas, the metal oxide semiconductor film is stacked on a heater film, and the combined resistance value of the heater film and the metal oxide semiconductor film is formed by the pair of electrodes. May be detected, or an insulating film may be provided in the middle, a metal oxide semiconductor film whose resistance value changes by contact with a gas is laminated on the insulating film, and a pair of electrodes is formed on the metal oxide semiconductor film. And a pair of these electrodes connected to the heater film,
The patterns may be overlapped at the portion drawn from the heater film. The heater film and the gas detection film to be used are, in principle, a thin film which is easily patterned and has a small heat capacity, but may be a thick film.

【0007】[0007]

【発明の作用】発明の作用を説明する。電極には先端に
直線状の対向部を設け、この間のヒータ領域を発熱部と
する。対向部は直線状で、電極本体とは斜めないし直角
に配置され、電極本体は対向部で相手側の電極や対向部
からマスクされているので、発熱は対向部間でのみ生
じ、発熱部がクリアに定まり、発熱部の広がりによる消
費電力の増加を防止できる。
The operation of the present invention will be described. A linear opposing portion is provided at the tip of the electrode, and a heater region between the opposing portions is a heating portion. The opposing portion is linear and is disposed obliquely or at right angles to the electrode body, and since the electrode body is masked by the opposing portion of the electrode and the opposing portion, heat is generated only between the opposing portions, and the heat generating portion is generated. It is determined to be clear, and an increase in power consumption due to the spread of the heat generating portion can be prevented.

【0008】[0008]

【実施例】図1ないし図3に、最初の実施例を示す。図
1において、2はアルミナ等の基板で、4はその表面全
体に設けた断熱用のガラス膜で、部分的に設けても良
く、厚さは20〜100μm程度が好ましい。6,8は
電極パッド、10,12は一対の電極で、例えばAuや
Pt等を用いる。14は酸化イリジウム,酸化ルテニウ
ム、窒化タンタル等の薄膜ヒータで、例えば0.1〜2
μm程度の膜厚とする。薄膜ヒータ14には、耐久性の
高い酸化イリジウム膜が好ましい。16は、SnO2薄
膜やITO薄膜(In2O3−SnO2薄膜),酸化タン
グステン薄膜、ナフィオン等のプロトン導電体薄膜等
の、ガス検出膜である。ガス検出膜16の膜厚は、例え
ば0.1〜1μmとする。なお接触燃焼式ガスセンサと
し、ヒータ14の温度変化をガス検出信号とする場合に
は、ガス検出膜16は不要である。18,18はエッチ
ング部である。
1 to 3 show a first embodiment. In FIG. 1, reference numeral 2 denotes a substrate made of alumina or the like, and reference numeral 4 denotes a heat insulating glass film provided on the entire surface of the substrate, which may be partially provided, and preferably has a thickness of about 20 to 100 μm. Reference numerals 6 and 8 denote electrode pads, and reference numerals 10 and 12 denote a pair of electrodes, made of, for example, Au or Pt. Reference numeral 14 denotes a thin film heater made of iridium oxide, ruthenium oxide, tantalum nitride, or the like.
The thickness is about μm. The thin film heater 14 is preferably made of an iridium oxide film having high durability. Reference numeral 16 denotes a gas detection film such as a SnO2 thin film, an ITO thin film (In2O3-SnO2 thin film), a tungsten oxide thin film, or a proton conductor thin film such as Nafion. The thickness of the gas detection film 16 is, for example, 0.1 to 1 μm. When a contact combustion type gas sensor is used and a temperature change of the heater 14 is used as a gas detection signal, the gas detection film 16 is unnecessary. 18 and 18 are etching parts.

【0009】図2に、電極本体10,12の配置を示
す。図において、20,20はくびれ部、22,22は
電極の対向部で、電極本体10,12とほぼ直角に配置
し、対向部22,22が平行に向き合うようにする。対
向部22,22は図2のように単純な直線状とする。こ
れは簡単な形状で、ヒータ膜14の内で発熱する部分を
明確に定めるためである。例えば櫛の歯状電極では、セ
ンサの抵抗値を低下させることができるがパターニング
が難しく、発熱部が大型化し消費電力が増加する。エッ
チング部18,18は、対向部22の両端のラインに平
行に、ヒータ薄膜14とガス検出膜16とをイオンミリ
ング(逆スパッタ)して除去したものである。24は対
向部22,22間のヒータ14の発熱部である。センサ
の形状精度は、エッチングが容易な電極本体10,12
に対して20μmルールを適用し、電極本体10,12
の本来の線幅W1が40μm、くびれ部20,20での
線幅W2が20μm、くびれ部20,20の長さが例え
ば80μmとする。対向部22,22は線幅が30μ
m、対向部22,22の長さLが100μm、対向部2
2,22間の間隔Dが60μmとする。この結果、発熱
部24は、100μm×60μmとなる。
FIG. 2 shows the arrangement of the electrode bodies 10 and 12. In the drawing, reference numerals 20 and 20 denote constricted portions, and 22 and 22 denote opposing portions of the electrodes, which are disposed substantially at right angles to the electrode main bodies 10 and 12 so that the opposing portions 22 and 22 face in parallel. The facing portions 22, 22 have a simple linear shape as shown in FIG. This is to clearly define a portion of the heater film 14 that generates heat with a simple shape. For example, in the case of a comb tooth-shaped electrode, the resistance value of the sensor can be reduced, but patterning is difficult, and the size of the heat generating portion is increased, and power consumption is increased. The etching portions 18 and 18 are formed by removing the heater thin film 14 and the gas detection film 16 by ion milling (reverse sputtering) in parallel with the lines at both ends of the facing portion 22. Reference numeral 24 denotes a heat-generating portion of the heater 14 between the facing portions 22. The shape accuracy of the sensor is determined by the electrode bodies 10 and 12 that are easy to etch.
To the electrode bodies 10 and 12
The original line width W1 is 40 μm, the line width W2 at the constricted portions 20 is 20 μm, and the length of the constricted portions 20 is 20 μm, for example. The facing portions 22 have a line width of 30 μm.
m, the length L of the facing portions 22 and 22 is 100 μm, and the facing portion 2
It is assumed that the interval D between the two 22 is 60 μm. As a result, the size of the heating section 24 is 100 μm × 60 μm.

【0010】図3に、ガスセンサの要部断面を示す。電
極本体10,12は例えばヒータ薄膜14上に配置し、
ガス検出膜16の電極と兼用し、全体として2端子のセ
ンサとする。
FIG. 3 shows a cross section of a main part of the gas sensor. The electrode bodies 10 and 12 are arranged on the heater thin film 14, for example,
Also serves as an electrode of the gas detection film 16 and is a two-terminal sensor as a whole.

【0011】図5に、変形例の電極配置を示す。変形例
では、電極30,32に接続した対向部34,34を斜
めに傾け、電極30,32と対向部34とを斜めに配置
した。これでも図2の電極配置と同様に、対向部34,
34間の領域以外へのヒータ電流の広がりはほとんど無
い。
FIG. 5 shows a modified electrode arrangement. In the modification, the opposing portions 34, 34 connected to the electrodes 30, 32 are inclined obliquely, and the electrodes 30, 32 and the opposing portion 34 are arranged obliquely. Even in this case, similarly to the electrode arrangement of FIG.
There is almost no spread of the heater current outside the region between 34.

【0012】図6により、実施例の製造工程を示す。最
初に基板2の全面に断熱ガラス膜4を印刷し、焼成す
る。次に例えば酸化イリジウム膜を印刷等で形成し、焼
成してヒータ14を完成する。この後、電極材料を大き
く印刷し、電極本体10,12,パッド6,8,対向部
22,22を残すように、イオンミリングやウェットエ
ッチング等でエッチングする。AuやPt等の電極材料
のエッチングは容易である。成膜後にエッチングする変
わりに、最初からマスクを用いてリフトオフでパターン
を定めても良い。電極本体10,12の成膜後に、ガス
検出膜16を成膜する。成膜はスパッタリングや真空蒸
着、原材料溶液の印刷等で行う。これらの後に、レジス
トを印刷し露光してマスクを設け、エッチング部18,
18で、ヒータ薄膜14とガス検出膜16とをエッチン
グする。SnO2のウェットエッチングは困難なので、
イオンミリング(逆スパッタエッチ)を用いた。しかし
ITO膜の場合、ウェットエッチングが可能であった。
エッチング部18,18は図2のように、対向部22,
22の外側をエッチングし、電極本体10,12の根元
側を残すようにする。これは電極材料がエッチングを受
け易いため、電極本体10,12側をエッチングすると
電極本体10,12もエッチングされてしまうこと、電
極本体10,12側にヒータ膜14や金属酸化物半導体
膜16が残っても、消費電力に影響しないことによる。
この結果、対向部22,22の付近でヒータ薄膜14や
ガス検出膜16は長方形状となる。
FIG. 6 shows a manufacturing process of the embodiment. First, a heat insulating glass film 4 is printed on the entire surface of the substrate 2 and fired. Next, for example, an iridium oxide film is formed by printing or the like and fired to complete the heater 14. Thereafter, the electrode material is largely printed, and is etched by ion milling, wet etching, or the like so as to leave the electrode main bodies 10, 12, the pads 6, 8, and the opposing portions 22, 22. Etching of an electrode material such as Au or Pt is easy. Instead of etching after film formation, a pattern may be defined by lift-off using a mask from the beginning. After the electrode bodies 10 and 12 are formed, the gas detection film 16 is formed. Film formation is performed by sputtering, vacuum evaporation, printing of a raw material solution, or the like. After these, a resist is printed and exposed to form a mask, and the etching unit 18 and the
At 18, the heater thin film 14 and the gas detection film 16 are etched. Since wet etching of SnO2 is difficult,
Ion milling (reverse sputter etching) was used. However, in the case of the ITO film, wet etching was possible.
As shown in FIG.
Etching is performed on the outside of the electrode body 22 so that the base sides of the electrode bodies 10 and 12 are left. This is because the electrode material is easily susceptible to etching, so that if the electrode bodies 10 and 12 are etched, the electrode bodies 10 and 12 are also etched, and the heater film 14 and the metal oxide semiconductor film 16 are formed on the electrode bodies 10 and 12. Even if it remains, it does not affect the power consumption.
As a result, the heater thin film 14 and the gas detection film 16 in the vicinity of the facing portions 22 and 22 have a rectangular shape.

【0013】実施例のガスセンサでは、8mSec/S
ecの条件でパルス駆動し、発熱部24の最高温度を4
00℃強とした場合、消費電力を約0.5mWattと
することができる。これは100×60μmに発熱部2
4を絞ったこと、対向部22,22を平行に配置し発熱
部24の広がりを抑えたこと、エッチング部18,18
を設けて、不要部への伝熱と不要部での発熱を抑えたこ
とによるものである。
In the gas sensor of the embodiment, 8 mSec / S
pulse driving under the condition of ec, and the maximum temperature of the heat generating portion 24 is set to 4
When the temperature is slightly higher than 00 ° C., the power consumption can be reduced to about 0.5 mWatt. This is 100 × 60 μm and the heating part 2
4, the opposed portions 22, 22 are arranged in parallel to suppress the spread of the heat generating portion 24, and the etching portions 18, 18
Is provided to suppress heat transfer to the unnecessary portion and heat generation in the unnecessary portion.

【0014】[0014]

【実施例2】図7ないし図11に、3端子ないし4端子
のガスセンサを示す。図7において、40はシリカやア
ルミナ膜等の絶縁膜で、膜厚1μm程度のものを用い
る。図8のように、エッチング部18でガス検出膜16
と絶縁膜40,ヒータ膜14を同じライン上でエッチン
グすると、ほこり粒子44の付着等で、ヒータ膜14と
ガス検出膜16が短絡する。そこで図7のように、ヒー
タ膜14を絶縁膜40の成膜前にエッチングし、ヒータ
膜14の端部とガス検出膜16の端部が同じライン上で
露出しないようにする。
[Embodiment 2] FIGS. 7 to 11 show three to four terminal gas sensors. In FIG. 7, reference numeral 40 denotes an insulating film such as a silica or alumina film having a thickness of about 1 μm. As shown in FIG. 8, the gas detecting film 16 is
When the insulating film 40 and the heater film 14 are etched on the same line, the heater film 14 and the gas detection film 16 are short-circuited due to adhesion of dust particles 44 and the like. Therefore, as shown in FIG. 7, the heater film 14 is etched before the insulating film 40 is formed so that the end of the heater film 14 and the end of the gas detection film 16 are not exposed on the same line.

【0015】図9に、このセンサの電極配置を示す。図
において、42,42は感ガス電極、46,46はその
くびれ部、48,48は対向部で、対向部48,48の
間隔を例えば20μm、対向部48,48の長さを10
0μmとし、図の破線のヒータ側の電極本体10,12
上に重ねる。この結果発熱部24の中に、対向部48,
48を置き、発熱部24の中心のガス検出膜16を用い
て温度分布の影響を小さくすることができる。また50
は、ガス検出膜16のエッチング部である。感ガス電極
42,42はヒータ側の電極本体10,12に重ね、電
極からの放熱を最小にする。即ち電極本体10,12と
感ガス電極42,42のパターンを重ね、電極からの放
熱面積の増加を防止する。なおセンサは全体として4端
子としても良く、あるいはパッド6,8のいずれかを兼
用して3端子としても良い。
FIG. 9 shows the electrode arrangement of this sensor. In the figure, 42 and 42 are gas-sensitive electrodes, 46 and 46 are constricted portions, and 48 and 48 are opposing portions. The distance between opposing portions 48 and 48 is, for example, 20 μm, and the length of opposing portions 48 and 48 is 10
0 μm, and the electrode bodies 10 and 12 on the heater side indicated by broken lines in the figure.
Layer on top. As a result, the facing portion 48,
48, the influence of the temperature distribution can be reduced by using the gas detection film 16 at the center of the heat generating portion 24. Also 50
Denotes an etched portion of the gas detection film 16. The gas-sensitive electrodes 42, 42 overlap the heater-side electrode bodies 10, 12 to minimize heat radiation from the electrodes. That is, the patterns of the electrode main bodies 10 and 12 and the gas-sensitive electrodes 42 and 42 are overlapped to prevent an increase in a heat radiation area from the electrodes. The sensor may have four terminals as a whole, or may have three terminals by using any of the pads 6 and 8.

【0016】図10に、第2の実施例のセンサの分解状
態を示す。また図11に、その製造工程を示す。
FIG. 10 shows a disassembled state of the sensor according to the second embodiment. FIG. 11 shows the manufacturing process.

【0017】[0017]

【発明の効果】この発明では、以下の効果が得られる。 (1) 発熱部の広がりを抑え、消費電力を抑制できる
(請求項1,2)。 (2) ヒータ膜や、ガス検出膜を設ける場合、ヒータ膜
とガス検出膜を対向部の外側でエッチングし、余分の発
熱と伝熱による消費電力を節減できる(請求項3)。 (3) ヒータ膜の電極パターンとガス検出膜の電極パタ
ーンを重ね、電極からの放熱を最小限にし、かつほこり
の付着等でヒータ膜とガス検出膜とがショートすること
を防止できる(請求項5)。
According to the present invention, the following effects can be obtained. (1) The spread of the heat generating portion can be suppressed, and the power consumption can be suppressed. (2) When a heater film or a gas detection film is provided, the heater film and the gas detection film are etched outside the facing portion, so that excess heat generation and power consumption due to heat transfer can be reduced. (3) The electrode pattern of the heater film and the electrode pattern of the gas detection film are overlapped to minimize heat radiation from the electrodes, and it is possible to prevent short-circuit between the heater film and the gas detection film due to dust or the like. 5).

【図面の簡単な説明】[Brief description of the drawings]

【図1】 実施例のガスセンサの平面図FIG. 1 is a plan view of a gas sensor according to an embodiment.

【図2】 実施例のガスセンサの電極配置を示す要部
平面図
FIG. 2 is a main part plan view showing an electrode arrangement of the gas sensor of the embodiment.

【図3】 実施例のガスセンサの要部端面図FIG. 3 is an end view of a main part of the gas sensor according to the embodiment.

【図4】 従来例のガスセンサの電極配置を示す要部
平面図
FIG. 4 is a plan view of a main part showing an electrode arrangement of a conventional gas sensor.

【図5】 変形例のガスセンサの電極配置を示す要部
平面図
FIG. 5 is a main part plan view showing an electrode arrangement of a gas sensor according to a modification.

【図6】 実施例のガスセンサの製造工程を示す工程
FIG. 6 is a process chart showing a manufacturing process of the gas sensor of the embodiment.

【図7】 第2の実施例のガスセンサの、要部断面図FIG. 7 is a sectional view of a main part of a gas sensor according to a second embodiment.

【図8】 従来例のガスセンサでの、ほこりによるシ
ョートを示す要部断面図
FIG. 8 is a sectional view of a main part showing a short circuit due to dust in a conventional gas sensor.

【図9】 第2の実施例のガスセンサの電極配置を示
す要部平面図
FIG. 9 is a plan view of a main part showing an electrode arrangement of the gas sensor according to the second embodiment.

【図10】 第2の実施例のガスセンサの分解状態を示
す斜視図
FIG. 10 is a perspective view showing a disassembled state of the gas sensor according to the second embodiment.

【図11】 第2の実施例のガスセンサの、製造工程を
示す工程図
FIG. 11 is a process diagram showing a manufacturing process of the gas sensor according to the second embodiment.

【符号の説明】 2 基板 4 断熱用のガラス膜 6,8 電極パッド 10,12 電極本体 14 薄膜ヒータ 16 ガス検出膜 18,18 エッチング部 20,20 くびれ部 22,22 電極の対向部 24 発熱部 30,32 電極 34,34 対向部 40 絶縁膜 42,42 感ガス電極 44 ほこり 46,46 くびれ部 48,48 対向部 50,50 エッチング部[Description of Signs] 2 Substrate 4 Glass film for heat insulation 6, 8 Electrode pad 10, 12 Electrode main body 14 Thin film heater 16 Gas detection film 18, 18 Etching unit 20, 20 Constriction unit 22, 22 Electrode facing unit 24 Heat generation unit 30, 32 electrode 34, 34 facing part 40 insulating film 42, 42 gas-sensitive electrode 44 dust 46, 46 constricted part 48, 48 facing part 50, 50 etching part

Claims (5)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 絶縁基体上に一対の電極を接続したヒー
タ膜を設け、ヒータ膜をパルス的に発熱させるようにし
たガスセンサにおいて、 前記一対の電極の各々を、直線状の対向部と、外部との
接続部と、前記対向部と前記接続部との間を結ぶ電極本
体とで構成し、 各々の電極の対向部を、ヒータ膜と重なるように、かつ
対向部が互いに平行に向き合うように配置して、対向部
間のヒータ膜の領域を発熱部とし、 さらに前記電極本体を、対向部から見て発熱部から反対
側へ、対向部に対して直角ないしは斜めに配置したこと
を特徴とする、ガスセンサ。
1. A gas sensor in which a heater film to which a pair of electrodes are connected is provided on an insulating substrate, and the heater film generates heat in a pulsed manner. And an electrode body that connects between the opposing portion and the connecting portion. The opposing portions of the respective electrodes overlap with the heater film, and the opposing portions face each other in parallel. It is characterized in that the region of the heater film between the opposed parts is arranged as a heat generating part, and the electrode body is arranged at a right angle or obliquely to the opposed part from the heat generating part to the opposite side when viewed from the opposed part. A gas sensor.
【請求項2】 前記の基体を、絶縁基板の表面に断熱ガ
ラス膜を設けたものとしたことを特徴とする、請求項1
のガスセンサ。
2. The substrate according to claim 1, wherein the base is provided with a heat insulating glass film on a surface of an insulating substrate.
Gas sensor.
【請求項3】 電極の対向部の外側でヒータ膜を除去す
るとともに、電極本体側のヒータ膜を除去せずに残した
ことを特徴とする、請求項2のガスセンサ。
3. The gas sensor according to claim 2, wherein the heater film is removed outside the opposing portion of the electrode, and the heater film on the electrode body side is left without being removed.
【請求項4】 ヒータ膜に、ガスとの接触で抵抗値が変
化する金属酸化物半導体膜を積層し、前記の一対の電極
によりヒータ膜と金属酸化物半導体膜との合成抵抗値を
検出するようにしたことを特徴とする、請求項3のガス
センサ。
4. A metal oxide semiconductor film having a resistance value changed by contact with a gas is laminated on the heater film, and a combined resistance value of the heater film and the metal oxide semiconductor film is detected by the pair of electrodes. The gas sensor according to claim 3, wherein:
【請求項5】 ヒータ膜に、絶縁膜を積層するととも
に、絶縁膜上にガスとの接触で抵抗値が変化する金属酸
化物半導体膜を積層し、金属酸化物半導体膜に一対の電
極を接続して、これらの電極がヒータ膜に接続した一対
の電極と、ヒータ膜からの引出し部でパターンが重なる
ようにしたことを特徴とする、請求項3のガスセンサ。
5. An insulating film is laminated on a heater film, a metal oxide semiconductor film whose resistance value changes by contact with a gas is laminated on the insulating film, and a pair of electrodes is connected to the metal oxide semiconductor film. 4. The gas sensor according to claim 3, wherein the electrodes overlap with a pair of electrodes connected to the heater film, and a pattern is drawn out at a portion drawn from the heater film.
JP20709092A 1992-07-10 1992-07-10 Gas sensor Expired - Fee Related JP3219253B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP20709092A JP3219253B2 (en) 1992-07-10 1992-07-10 Gas sensor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP20709092A JP3219253B2 (en) 1992-07-10 1992-07-10 Gas sensor

Publications (2)

Publication Number Publication Date
JPH0627070A JPH0627070A (en) 1994-02-04
JP3219253B2 true JP3219253B2 (en) 2001-10-15

Family

ID=16534039

Family Applications (1)

Application Number Title Priority Date Filing Date
JP20709092A Expired - Fee Related JP3219253B2 (en) 1992-07-10 1992-07-10 Gas sensor

Country Status (1)

Country Link
JP (1) JP3219253B2 (en)

Also Published As

Publication number Publication date
JPH0627070A (en) 1994-02-04

Similar Documents

Publication Publication Date Title
US4984446A (en) Gas detecting device and gas detecting system using the same
JPS6136616B2 (en)
JP3219253B2 (en) Gas sensor
JPH03293553A (en) Gas sensor and manufacture thereof
JPS61191953A (en) Gas detector
JPH0213739B2 (en)
JPS6157067U (en)
JP3033143B2 (en) Gas sensor manufacturing method
KR101992022B1 (en) Semiconductor gas sensor
JPS62220850A (en) Atmosphere detector
JPH0495741A (en) Pressure sensor
JP2913793B2 (en) Thermal flow sensor
JPH0661949B2 (en) Thermal print head
JPH08219836A (en) Mass flow sensor
JP3637665B2 (en) Pyroelectric infrared detector
JP2996161B2 (en) Platinum temperature sensitive resistor
JPH10221144A (en) Micro heater and its manufacture
JPS6116930B2 (en)
JPH0394401A (en) Thermosensitive sensor
JPH03160332A (en) Thermometric resistor
JP2714006B2 (en) Gas sensor
JPS6249251A (en) Gas sensor
JPH03215768A (en) Magnetic sensor
JPS631430Y2 (en)
JP2508317B2 (en) Resistance temperature detector

Legal Events

Date Code Title Description
R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20070810

Year of fee payment: 6

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20100810

Year of fee payment: 9

LAPS Cancellation because of no payment of annual fees