JP3215829B2 - Method of manufacturing aluminum substrate for photosensitive drum - Google Patents

Method of manufacturing aluminum substrate for photosensitive drum

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Publication number
JP3215829B2
JP3215829B2 JP21768994A JP21768994A JP3215829B2 JP 3215829 B2 JP3215829 B2 JP 3215829B2 JP 21768994 A JP21768994 A JP 21768994A JP 21768994 A JP21768994 A JP 21768994A JP 3215829 B2 JP3215829 B2 JP 3215829B2
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JP
Japan
Prior art keywords
polishing
aluminum tube
aluminum
oxide film
anodic oxide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
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JP21768994A
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Japanese (ja)
Other versions
JPH0882944A (en
Inventor
雅章 大出
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Showa Denko KK
Original Assignee
Showa Denko KK
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Priority to JP21768994A priority Critical patent/JP3215829B2/en
Publication of JPH0882944A publication Critical patent/JPH0882944A/en
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Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】この発明は、レーザープリンタ
ー、LEDプリンター、液晶プリンター、レーザーファ
クシミリ、複写機等の電子写真装置の感光ドラムとして
用いられるアルミニウム基体の製造方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing an aluminum substrate used as a photosensitive drum of an electrophotographic apparatus such as a laser printer, an LED printer, a liquid crystal printer, a laser facsimile, and a copying machine.

【0002】なお、この明細書において、アルミニウム
の語はアルミニウム及びアルミニウム合金の両方を含む
意味で用いる。
[0002] In this specification, the term aluminum is used to include both aluminum and aluminum alloys.

【0003】[0003]

【従来の技術及び解決しようとする課題】一般に、電子
写真用の感光ドラムは、アルミニウム基体の表面に感光
層が被覆されたものに構成されるが、かかる感光層とし
て、セレン等の無機系光導電材料に代えて有機物系材料
を用いた有機感光体(いわゆるOPC感光体)が、成膜
性、軽量性、低価格性等の面で優れているところから用
いられるようになっている。
2. Description of the Related Art In general, a photosensitive drum for electrophotography is constructed by coating a surface of an aluminum substrate with a photosensitive layer. As the photosensitive layer, inorganic photosensitive materials such as selenium are used. 2. Description of the Related Art Organic photoconductors using organic materials instead of conductive materials (so-called OPC photoconductors) have come to be used because of their excellent film-forming properties, light weight, and low cost.

【0004】そして、有機感光体の機能、特性を更に向
上させるために、近時、感光層を電荷発生層(CGL)
と電荷輸送層(CTL)を有するものに構成した積層型
の有機感光体が提供されている。そして、高感度の積層
型感光ドラムを得るため、前記電荷発生層を0.2〜
0.3μmの薄膜に塗工することも行われるようになっ
てきている。
Recently, in order to further improve the function and characteristics of the organic photoreceptor, the photosensitive layer has recently been replaced with a charge generation layer (CGL).
And a charge-transporting layer (CTL). Then, in order to obtain a high-sensitivity stacked photosensitive drum, the charge generation layer should be 0.2 to 0.2 mm.
Coating on a 0.3 μm thin film has also been performed.

【0005】ところで、表面粗さの大きなアルミニウム
管の表面に上記のような薄膜塗工を行うと、部分的に塗
工溜りを生じて、均一な画像形成ができないという問題
がある。このため、塗工面が平滑なアルミニウム基体の
提供が望まれている。
However, when the above-described thin film coating is performed on the surface of an aluminum tube having a large surface roughness, there is a problem that a coating pool is partially formed and a uniform image cannot be formed. Therefore, it is desired to provide an aluminum substrate having a smooth coated surface.

【0006】一方また、感光ドラム表面に一様帯電させ
る方法に関して、従来はコロナ帯電方式が採用されてい
たが、オゾンの発生を伴うという問題があるため、ロー
ラー帯電、ブラシ帯電等の直接帯電方式が多く採用され
るようになってきた。
On the other hand, as for the method of uniformly charging the surface of the photosensitive drum, a corona charging method has been conventionally used, but there is a problem of generation of ozone. Therefore, a direct charging method such as roller charging or brush charging is used. Has been increasingly adopted.

【0007】しかし、直接帯電方式では、従来のコロナ
帯電の際に絶縁層として働いていた空気層がなくなるた
め、感光ドラムへの負荷が大きくなり、アルミニウム基
体表面の局部的かつ微少な欠陥を原因としてリーク(漏
電)が発生し、感光層を焼損させるという不都合が生じ
ている。このため、直接帯電方式を採用しても、一様帯
電の際にリークが発生しないように、表面に凹凸のない
アルミニウム基体が望まれている。
[0007] However, in the direct charging method, the air layer, which worked as an insulating layer during conventional corona charging, is eliminated, so that the load on the photosensitive drum is increased, causing local and minute defects on the surface of the aluminum substrate. As a result, there is a problem that a leak (electric leakage) occurs and the photosensitive layer is burned. For this reason, even if the direct charging method is adopted, an aluminum substrate having no unevenness on its surface is desired so that no leakage occurs during uniform charging.

【0008】このように、感光層の塗工面から、あるい
は帯電方式の観点から、均一な平滑面を有するアルミニ
ウム基体の提供が望まれている。
As described above, it is desired to provide an aluminum substrate having a uniform smooth surface from the viewpoint of coating the photosensitive layer or from the viewpoint of the charging method.

【0009】もとより、アルミニウム管の表面を鏡面切
削することによって、平滑性を確保することはできる
が、鏡面仕上げは精度と熟練を要することからコスト高
につくという問題があった。
[0009] Naturally, smoothness can be ensured by mirror-cutting the surface of the aluminum tube, but there has been a problem that the mirror-finish requires high precision and skill and is costly.

【0010】この発明は、このような技術的背景に鑑み
てなされたものであって、鏡面加工を要することなく、
表面の凹凸部を少なくした感光ドラム用アルミニウム基
体を製作提供することを目的とする。
The present invention has been made in view of such a technical background, and does not require mirror finishing.
It is an object of the present invention to manufacture and provide an aluminum substrate for a photosensitive drum having reduced surface irregularities.

【0011】[0011]

【課題を解決するための手段】上記目的を達成するため
に、この発明は、アルミニウム管の表面をRmax1〜
5μmに簡易切削する工程と、切削後、前記アルミニウ
ム管を陽極酸化処理することによって、アルミニウム管
の表面凹凸を継承した微小凹凸部を表面に有する陽極酸
化皮膜を生成する工程と、陽極酸化処理後、前記陽極酸
化皮膜の表面を、微小凹凸部が消失しかつアルミニウム
管の地肌が露出しない厚さとなるまで、砥石を用いる研
磨法によって研磨除去する工程とを実施することを特徴
とする感光ドラム用アルミニウム基体の製造方法を要旨
とする。
In order to achieve the above object, the present invention provides an aluminum pipe having a surface Rmax1 to Rmax1.
A step of simply cutting to 5 μm, a step of anodizing the aluminum tube after cutting to form an anodic oxide film having fine irregularities on the surface that inherits the surface irregularities of the aluminum tube, Polishing the surface of the anodic oxide film by a polishing method using a grindstone until the thickness of the fine unevenness disappears and the thickness of the aluminum tube is not exposed. The gist is a method for manufacturing an aluminum substrate.

【0012】アルミニウム管の表面をRmax(最大高
さ)1〜5μmに簡易切削するのは、Rmax1μm未
満では、鏡面仕上げと同等になってしまい、コスト高に
つくからである。また、Rmaxが5μmを越えると、
後述する研磨によってアルミニウム管の地肌が露出しな
いように、生成させる陽極酸化皮膜厚さを厚くする必要
があり、コスト高につくからである。図1に示すよう
に、簡易切削したアルミニウム管(1)の表面には微小
凹凸(2)が形成されている。
The reason why the surface of the aluminum tube is simply cut to an Rmax (maximum height) of 1 to 5 μm is that if the Rmax is less than 1 μm, it becomes equivalent to a mirror-finished surface, resulting in an increase in cost. If Rmax exceeds 5 μm,
This is because it is necessary to increase the thickness of the anodic oxide film to be formed so that the background of the aluminum tube is not exposed by the polishing described later, which increases the cost. As shown in FIG. 1, minute irregularities (2) are formed on the surface of the aluminum tube (1) which is simply cut.

【0013】次に、上記のアルミニウム管(1)に陽極
酸化処理を実施して陽極酸化皮膜(3)を生成するが、
この陽極酸化皮膜(3)の表面には、図2に示されるよ
うに、アルミニウム管表面の微小凹凸(2)を継承した
継承凹凸部(4)が存在することになる。
Next, the aluminum tube (1) is anodized to form an anodized film (3).
As shown in FIG. 2, the surface of the anodic oxide film (3) has an inherited uneven portion (4) that inherits the minute unevenness (2) of the aluminum tube surface.

【0014】而して、この発明では、少なくとも継承凹
凸部(4)の最低部(4a)がアルミニウム管(1)の表
面の微小凹凸(2)の最高部(2a)よりも上方に位置す
るように、換言すればアルミニウム管(1)の微小凹凸
(2)の最高部(2a)を陽極酸化皮膜(3)が被覆して
なおかつその上方に皮膜が存在するように、陽極酸化皮
膜(3)の厚さを設定しなければならない。この理由
は、次工程である陽極酸化皮膜(3)の研磨工程におい
て、継承凹凸部(4)が消失しかつアルミニウム管
(1)の地肌が露出しない厚さとなるまで、陽極酸化皮
膜を研磨することができるようにするためである。この
条件を確実に満たすためは、陽極酸化皮膜(3)の厚さ
tを、アルミニウム管(1)表面の凹状欠陥(2)の最
大粗さRmax の1.5倍以上確保するのが良い。1.5
倍未満では、アルミニウム管(1)の微小凹凸(2)の
最高部(2a)と継承凹凸部(4)の最低部(4a)との距
離Tが小さくなり、研磨代の調整が困難になる恐れがあ
る。特に望ましくは2.0倍以上確保するのが良い。
According to the present invention, at least the lowest part (4a) of the inherited uneven part (4) is located above the highest part (2a) of the minute unevenness (2) on the surface of the aluminum tube (1). In other words, in other words, the anodic oxide film (3) covers the highest part (2a) of the minute irregularities (2) of the aluminum tube (1) so that the anodic oxide film (3) covers the upper part (2a) and the film exists above the anodic oxide film (3). ) Thickness must be set. The reason is that in the subsequent step of polishing the anodic oxide film (3), the anodic oxide film is polished until the inherited irregularities (4) disappear and the aluminum pipe (1) has a thickness that does not expose the background. It is to be able to do it. In order to reliably satisfy this condition, it is preferable that the thickness t of the anodic oxide film (3) is at least 1.5 times the maximum roughness Rmax of the concave defect (2) on the surface of the aluminum tube (1). 1.5
If it is less than twice, the distance T between the highest part (2a) of the minute unevenness (2) of the aluminum tube (1) and the lowest part (4a) of the inherited uneven part (4) becomes small, and it becomes difficult to adjust the polishing allowance. There is fear. It is particularly desirable to secure 2.0 times or more.

【0015】なお、陽極酸化皮膜(3)の種類や処理条
件は、厚さに関する点を除き特に限定されることはない
が、アルミニウム管(1)との密着性、感光層との密着
性、電荷注入防止性等に優れた硫酸皮膜や蓚酸皮膜を採
用するのが望ましい。
The type and processing conditions of the anodic oxide film (3) are not particularly limited except for the thickness, but the adhesion to the aluminum tube (1), the adhesion to the photosensitive layer, It is desirable to employ a sulfuric acid film or an oxalic acid film having excellent charge injection prevention properties.

【0016】上記の陽極酸化処理後、陽極酸化皮膜
(3)の表面を研磨する。この研磨は、前述のように、
陽極酸化皮膜(3)の厚さが、継承凹凸部(4)が消失
しかつアルミニウム管(1)の地肌が露出しない厚さと
なるまで行う。かつ、研磨は砥石を用いる研磨法によっ
て行う。この理由は、砥石を用いることによって、均一
な研磨表面を効率良く得ることができるからである。し
かも、陽極酸化皮膜(3)はHv硬度が高く180〜2
20もあることから、砥石を用いても砥粒の皮膜への食
い込みによる新たな表面欠陥が発生せず、良好な表面を
得ることができるからでもある。砥石を用いる研磨法の
代表例としては、センタレス研磨法(心なし研磨法)や
超仕上げ研磨法、あるいはこれらの組み合わせを挙げ得
る。センタレス研磨は、円筒管の表面研磨に適する公知
のものであり、アルミニウム管のセンタ穴を支持しない
でその外面を調整砥石と受板とで支え、調整砥石によっ
てアルミニウム管の表面を研磨する方法である。また、
超仕上げ研磨法は、比較的に細粒の軟らかいスティック
砥石を加工面に合わせて修正し、これを回転するアルミ
ニウム管の表面に比較的に低圧力で押し付け、場合によ
っては軸方向に微小振動を与えることにより、平滑な鏡
面状に研磨する方法である。
After the above anodic oxidation treatment, the surface of the anodic oxide film (3) is polished. This polishing, as described above,
The process is performed until the thickness of the anodic oxide film (3) becomes such that the inherited irregularities (4) disappear and the background of the aluminum pipe (1) is not exposed. Polishing is performed by a polishing method using a grindstone. The reason for this is that a uniform polished surface can be efficiently obtained by using a grindstone. Moreover, the anodic oxide film (3) has a high Hv hardness of 180 to 2
This is also because the use of a grindstone does not cause new surface defects due to the penetration of abrasive grains into the film, and a good surface can be obtained. Representative examples of the polishing method using a grindstone include a centerless polishing method (centerless polishing method), a super-finishing polishing method, and a combination thereof. Centerless polishing is a well-known method suitable for polishing the surface of a cylindrical tube. In this method, the outer surface of the aluminum tube is supported by an adjusting whetstone and a receiving plate without supporting the center hole of the aluminum tube, and the surface of the aluminum tube is polished by the adjusting whetstone. is there. Also,
In the super-finishing polishing method, a relatively fine-grained soft stick grindstone is modified according to the surface to be machined, pressed against the surface of the rotating aluminum tube at a relatively low pressure, and in some cases, generates minute vibration in the axial direction. This is a method of polishing to give a smooth mirror surface.

【0017】上記のような研磨工程によって、図3に示
すように、アルミニウム管(1)の凹状欠陥(2)の有
無にかかわらず、陽極酸化皮膜(3)の表面を継承凹凸
部(4)の存在しない平滑面とすることができる。
By the above-described polishing step, as shown in FIG. 3, the surface of the anodic oxide film (3) is transferred to the concavo-convex portion (4) regardless of the presence or absence of the concave defect (2) in the aluminum tube (1). Can be provided as a smooth surface free from the presence of.

【0018】研磨工程終了後、陽極酸化皮膜(3)の表
面を洗浄し、十分な濡れ性を確保してから感光層を被覆
形成して、所期する感光ドラムとなす。なお、要すれば
酢酸ニッケル溶液を用いて陽極酸化皮膜(3)の封孔処
理を行っても良い。
After completion of the polishing step, the surface of the anodic oxide film (3) is washed, and after ensuring sufficient wettability, a photosensitive layer is formed by coating to form a desired photosensitive drum. If necessary, the anodic oxide film (3) may be sealed using a nickel acetate solution.

【0019】感光層の種類は特に限定されないが、本願
発明によれば均一な薄膜塗工が可能となる点で、電荷発
生層の薄膜化が好ましい積層型のものを用いるのが良
い。
The type of the photosensitive layer is not particularly limited. However, according to the present invention, it is preferable to use a laminated type in which the charge generation layer is preferably made thinner in that a uniform thin film can be applied.

【0020】[0020]

【作用】陽極酸化処理後、陽極酸化皮膜(3)の表面
を、陽極酸化皮膜(3)の厚さが、継承凹凸部(4)が
消失しかつアルミニウム管(1)の地肌が露出しない厚
さとなるまで、砥石を用いる研磨法によって研磨除去す
ることによって、陽極酸化皮膜(3)の表面を凹凸の存
在しない均一な平滑面にすることができる。しかも、陽
極酸化皮膜(3)の硬度は高いから、砥石を用いる研磨
法によって研磨しても、アルミニウム管(1)の表面を
研磨したときのような脱落した砥粒の食い込みによる新
たな表面欠陥を生じることがない。
After the anodic oxidation treatment, the surface of the anodic oxide film (3) has a thickness such that the thickness of the anodic oxide film (3) is such that the inherited irregularities (4) disappear and the background of the aluminum pipe (1) is not exposed. Until the above, the surface of the anodic oxide film (3) can be made to be a uniform smooth surface without any irregularities by polishing and removing it by a polishing method using a grindstone. In addition, since the hardness of the anodic oxide film (3) is high, even if it is polished by a polishing method using a grindstone, a new surface defect due to the penetration of the dropped abrasive grains as in the case of polishing the surface of the aluminum tube (1). Does not occur.

【0021】また、研磨工程前の陽極酸化皮膜(3)の
厚さを、アルミニウム管(1)の表面粗さRmaxの
1.5倍以上確保しておくことによって、研磨加工時の
研磨代の選択範囲を拡大できる。
Further, by ensuring that the thickness of the anodic oxide film (3) before the polishing step is at least 1.5 times the surface roughness Rmax of the aluminum tube (1), the polishing allowance during polishing can be reduced. You can expand the selection.

【0022】[0022]

【実施例】【Example】

(実施例1)A3003合金からなる直径30mm×長
さ260.5mmのアルミニウム管の表面をRmax 3.
0μmとなるまで簡易切削した。
(Example 1) The surface of an aluminum tube made of A3003 alloy having a diameter of 30 mm and a length of 260.5 mm was subjected to Rmax.
Simple cutting was performed until the thickness became 0 μm.

【0023】次に、上記のアルミニウム管に、陽極酸化
処理を実施した。陽極酸化処理は、処理液:硫酸(14
w/v%)、液温:20℃、電流密度:1.0A/dm
2 、時間:30分の条件で行った。陽極酸化皮膜の厚さ
は8μmであり、アルミニウム管のRmax の2.7倍で
あった。また、この陽極酸化皮膜の表面を顕微鏡で観察
したところ、アルミニウム管の微細凹凸に対応する位置
に、該凹凸を継承した凹凸部が形成されていた。
Next, the above aluminum tube was anodized. The anodic oxidation treatment is performed using a treatment liquid: sulfuric acid (14
w / v%), liquid temperature: 20 ° C., current density: 1.0 A / dm
2. Time: 30 minutes. The thickness of the anodized film was 8 μm, which was 2.7 times the Rmax of the aluminum tube. In addition, when the surface of the anodic oxide film was observed with a microscope, irregularities which inherited the irregularities were formed at positions corresponding to the minute irregularities of the aluminum tube.

【0024】次に、陽極酸化皮膜の表面をセンタレス研
磨法によって均一に研磨した。陽極酸化皮膜の表面から
の研磨代は4μmとした。研磨後、陽極酸化皮膜の表面
を顕微鏡で観察したところ、凹凸部は消失しており全表
面が均一な平滑面を呈していた。
Next, the surface of the anodic oxide film was uniformly polished by a centerless polishing method. The polishing allowance from the surface of the anodic oxide film was 4 μm. After polishing, the surface of the anodic oxide film was observed with a microscope. As a result, the irregularities had disappeared, and the entire surface had a uniform smooth surface.

【0025】(比較例1)上記実施例1と同一のアルミ
ニウム管を用い、該アルミニウム管に実施例1と同一の
条件で陽極酸化処理を実施した。そして、研磨工程を実
施することなくそのままアルミニウム基体とした。
Comparative Example 1 The same aluminum tube as in Example 1 was used, and the aluminum tube was anodized under the same conditions as in Example 1. Then, the aluminum substrate was used as it was without performing the polishing step.

【0026】(比較例2)上記実施例1と同一のアルミ
ニウム管を、陽極酸化処理することなくそのままアルミ
ニウム基体とした。
Comparative Example 2 The same aluminum tube as in Example 1 was used as an aluminum substrate without anodizing.

【0027】上記により得た3種類のアルミニウム基体
に、電荷発生層と電荷輸送層とを有する感光層を以下の
ようにして被覆形成した。即ち、電荷発生層は、無金属
フタロシアニンをテトラヒドロフランにて4%に希釈し
て、膜厚が約0.3μmになるように塗工し乾燥して形
成した。次に、CT剤(ヒドラゾン化合物)とCT樹脂
(ポリカーボネート)を1:2の比率で塩化メチレンに
溶解して、膜厚が20μmになるように塗工し乾燥して
電荷輸送層とした。
A photosensitive layer having a charge generation layer and a charge transport layer was coated on the three types of aluminum substrates obtained as described above in the following manner. That is, the charge generation layer was formed by diluting a metal-free phthalocyanine to 4% with tetrahydrofuran, coating the film to a thickness of about 0.3 μm, and drying. Next, a CT agent (hydrazone compound) and a CT resin (polycarbonate) were dissolved in methylene chloride at a ratio of 1: 2, applied to a thickness of 20 μm, and dried to form a charge transport layer.

【0028】次に、これら感光ドラムを、直接帯電方式
の市販レーザープリンターに組み込み、700Vの電圧
で一様帯電させたところ、実施例1の感光ドラムではリ
ークはまったく認められなかったが、比較例1、2の感
光ドラムではリークが認められた。
Next, when these photosensitive drums were incorporated in a commercially available laser printer of a direct charging system and charged uniformly at a voltage of 700 V, no leak was observed in the photosensitive drum of Example 1, but a comparative example was obtained. Leaks were observed in the photosensitive drums 1 and 2.

【0029】[0029]

【発明の効果】この発明は、上述の次第で、アルミニウ
ム管の表面をRmax1〜5μmに簡易切削する工程
と、切削後、前記アルミニウム管を陽極酸化処理するこ
とによって、アルミニウム管の表面凹凸を継承した凹凸
部を表面に有する陽極酸化皮膜を生成する工程と、陽極
酸化処理後、前記陽極酸化皮膜の表面を、凹凸部(4)
が消失しかつアルミニウム管の地肌が露出しない厚さと
なるまで、砥石を用いる研磨法によって研磨除去する工
程とを実施することを特徴とするものであるから、陽極
酸化皮膜の表面を微小凹凸部の存在しない均一な平滑面
にすることができる。従って、積層型感光体における電
荷発生層のような薄膜塗工を行った場合にも、塗工溜り
を抑制することができ、ひいては均一で良好な画像形成
が可能となる。しかも、直接帯電方式により一様帯電さ
せた場合のリークを抑制することができ、直接帯電方式
の感光ドラムとして好適なものとなし得る。
According to the present invention, as described above, the step of simply cutting the surface of the aluminum tube to Rmax 1 to 5 μm, and after the cutting, the aluminum tube is anodized to inherit the surface irregularities of the aluminum tube. A step of forming an anodic oxide film having a roughened surface on the surface, and after the anodic oxidation treatment, the surface of the anodic oxide film is changed to the unevenness (4).
Until the thickness of the aluminum tube disappears and the thickness of the aluminum tube does not expose the background, and the step of polishing and removing the surface by an abrasion method using a grindstone is performed. A non-existent uniform smooth surface can be obtained. Therefore, even when a thin film such as a charge generation layer is applied to a laminated type photoreceptor, it is possible to suppress the accumulation of coating and to form a uniform and good image. In addition, it is possible to suppress the leakage when uniformly charged by the direct charging method, and it is possible to make the photosensitive drum suitable for the direct charging method.

【0030】もとより、アルミニウム管の切削は、Rm
ax1〜5μmの表面にする簡易切削で良いから、鏡面
加工は不要であり、低コストに製作できる。
Of course, the cutting of the aluminum tube is performed using Rm
Since simple cutting with a surface of ax1 to 5 μm is sufficient, mirror finishing is not required, and it can be manufactured at low cost.

【0031】しかも、陽極酸化皮膜の硬度は高いから、
砥石を用いる研磨法によって研磨しても、アルミニウム
管の表面を研磨したときのような脱落した砥粒の食い込
みによる新たな表面欠陥を生じることがなく、均一な平
滑面を容易に得ることができる。
Moreover, since the hardness of the anodic oxide film is high,
Even when polishing is performed by a polishing method using a whetstone, a uniform smooth surface can be easily obtained without generating a new surface defect due to the penetration of the dropped abrasive grains as when polishing the surface of the aluminum tube. .

【0032】また、研磨工程前の陽極酸化皮膜の厚さ
を、アルミニウム管(1)の表面粗さRmaxの1.5
倍以上確保しておくことによって、研磨加工時の研磨代
の選択範囲を拡大でき、確実にかつ安定的に研磨後の平
滑表面を得ることができる。
Further, the thickness of the anodic oxide film before the polishing step is set to be 1.5 times the surface roughness Rmax of the aluminum pipe (1).
By ensuring twice or more, the selection range of the polishing allowance at the time of polishing can be expanded, and a smooth surface after polishing can be reliably and stably obtained.

【図面の簡単な説明】[Brief description of the drawings]

【図1】簡易切削後のアルミニウム管の模式的断面拡大
図である。
FIG. 1 is a schematic cross-sectional enlarged view of an aluminum pipe after simple cutting.

【図2】図1のアルミニウム管の陽極酸化処理後の模式
的断面拡大図である。
FIG. 2 is an enlarged schematic cross-sectional view of the aluminum tube of FIG. 1 after anodizing treatment.

【図3】同じく研磨後の模式的断面拡大図である。FIG. 3 is a schematic cross-sectional enlarged view after polishing.

【符号の説明】[Explanation of symbols]

1…アルミニウム管 2…微小凹凸 3…陽極酸化皮膜 4…継承凹凸部 DESCRIPTION OF SYMBOLS 1 ... Aluminum tube 2 ... Micro unevenness 3 ... Anodized film 4 ... Inherited unevenness part

───────────────────────────────────────────────────── フロントページの続き (58)調査した分野(Int.Cl.7,DB名) G03G 5/10,5/14 ──────────────────────────────────────────────────続 き Continued on the front page (58) Field surveyed (Int.Cl. 7 , DB name) G03G 5 / 10,5 / 14

Claims (2)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 アルミニウム管(1)の表面をRmax
1〜5μmに簡易切削する工程と、 切削後、前記アルミニウム管を陽極酸化処理することに
よって、アルミニウム管(1)の表面凹凸を継承した凹
凸部(4)を表面に有する陽極酸化皮膜(3)を生成す
る工程と、 陽極酸化処理後、前記陽極酸化皮膜(3)の表面を、凹
凸部(4)が消失しかつアルミニウム管(1)の地肌が
露出しない厚さとなるまで、砥石を用いる研磨法によっ
て研磨除去する工程とを実施することを特徴とする感光
ドラム用アルミニウム基体の製造方法。
1. The surface of an aluminum tube (1) is Rmax
A step of simply cutting to 1 to 5 μm, and after the cutting, the aluminum tube is anodized to form an anodized film (3) having an uneven portion (4) inheriting the surface unevenness of the aluminum tube (1) on the surface. And polishing the surface of the anodic oxide film (3) after the anodizing treatment using a grinding stone until the unevenness (4) disappears and the aluminum tube (1) does not expose the background. And a step of polishing and removing the aluminum substrate by a polishing method.
【請求項2】 研磨工程前の陽極酸化皮膜(3)の厚さ
tを、アルミニウム管(1)の表面粗さRmaxの1.
5倍以上確保しておく請求項1に記載の感光ドラム用ア
ルミニウム基体の製造方法。
2. The thickness t of the anodic oxide film (3) before the polishing step is determined by setting the surface roughness Rmax of the aluminum tube (1) to 1.
2. The method for producing an aluminum substrate for a photosensitive drum according to claim 1, wherein the aluminum substrate is secured at least 5 times.
JP21768994A 1994-09-12 1994-09-12 Method of manufacturing aluminum substrate for photosensitive drum Expired - Fee Related JP3215829B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP21768994A JP3215829B2 (en) 1994-09-12 1994-09-12 Method of manufacturing aluminum substrate for photosensitive drum

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP21768994A JP3215829B2 (en) 1994-09-12 1994-09-12 Method of manufacturing aluminum substrate for photosensitive drum

Publications (2)

Publication Number Publication Date
JPH0882944A JPH0882944A (en) 1996-03-26
JP3215829B2 true JP3215829B2 (en) 2001-10-09

Family

ID=16708184

Family Applications (1)

Application Number Title Priority Date Filing Date
JP21768994A Expired - Fee Related JP3215829B2 (en) 1994-09-12 1994-09-12 Method of manufacturing aluminum substrate for photosensitive drum

Country Status (1)

Country Link
JP (1) JP3215829B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3365213B2 (en) * 1996-08-07 2003-01-08 富士電機株式会社 Electrophotographic photoreceptor and method of manufacturing the same

Also Published As

Publication number Publication date
JPH0882944A (en) 1996-03-26

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