JP2005099637A - Substrate for photoreceptor and photoreceptor, and image forming apparatus - Google Patents

Substrate for photoreceptor and photoreceptor, and image forming apparatus Download PDF

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JP2005099637A
JP2005099637A JP2003335799A JP2003335799A JP2005099637A JP 2005099637 A JP2005099637 A JP 2005099637A JP 2003335799 A JP2003335799 A JP 2003335799A JP 2003335799 A JP2003335799 A JP 2003335799A JP 2005099637 A JP2005099637 A JP 2005099637A
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substrate
photoreceptor
photoconductor
toner
unit
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Makoto Saito
誠 斉藤
Toshiyuki Shibata
俊幸 柴田
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Kyocera Corp
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Kyocera Corp
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<P>PROBLEM TO BE SOLVED: To provide a substrate for a photoreceptor capable of suppressing the deformation which arises at the time of forming a photosensitive layer and the photoreceptor using the same, and an image forming apparatus. <P>SOLUTION: In the substrate A for the photoreceptor equipped with the cylindrical substrate 1 to be deposited with the photosensitive layer 2 on the surface, the internal stress of the cylindrical substrate 1 is set at ≤9.2 MPa. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

本発明は、アモルファスシリコン等の感光層を形成する感光体用基体、及び感光体、並びにこれらを用いた画像形成装置に関する。   The present invention relates to a photoconductor substrate on which a photosensitive layer such as amorphous silicon is formed, a photoconductor, and an image forming apparatus using the same.

従来より、電子写真プロセスにより画像を形成する装置として、複写機、LEDプリンタ、レーザービームプリンタ等の画像形成装置が知られている。   2. Description of the Related Art Conventionally, image forming apparatuses such as copying machines, LED printers, and laser beam printers are known as apparatuses that form images by an electrophotographic process.

かかる画像形成装置は、感光体の周囲に、帯電手段と、露光手段と、現像手段と、転写手段と、クリーニング手段と、除電手段と、を備えた構成を有している。また、その電子写真プロセスは、感光体の表面に帯電手段によるコロナ帯電により帯電させ、該帯電した感光体にLEDヘッド等の露光手段からの光を照射して所定の潜像を形成するとともに、これを現像手段でもって感光体にトナーを付着させ、該トナー像を転写手段を用いて記録紙に転写・定着させることによって画像形成が行われ、しかる後、クリーニング手段及び除電手段によって感光体表面の残留トナー及び潜像が除去されることで1サイクルが終了する。   Such an image forming apparatus has a configuration including a charging unit, an exposure unit, a developing unit, a transfer unit, a cleaning unit, and a charge eliminating unit around the photoreceptor. The electrophotographic process is such that the surface of the photoreceptor is charged by corona charging by a charging means, and the charged photoreceptor is irradiated with light from exposure means such as an LED head to form a predetermined latent image, An image is formed by attaching toner to the photosensitive member with a developing unit, and transferring and fixing the toner image onto a recording sheet using a transferring unit. Thereafter, the surface of the photosensitive member is cleaned by a cleaning unit and a discharging unit. The remaining toner and latent image are removed to complete one cycle.

一方、上述の画像形成装置内に組み込まれる感光体は、例えば、アモルファスシリコン感光体の場合、アルミニウム(以下、Alという)合金製の円筒状基体からなる感光体用基体の上面に、キャリア注入阻止層、光導電層、表面保護層を順次積層してなるa−Si感光層を10〜100μmの厚みに被着させた構造が知られている。この感光体は、その両端の内部にフランジ等の支持手段が挿着されており、かかる支持手段によって回転可能に支持される。   On the other hand, in the case of an amorphous silicon photoconductor, for example, in the case of an amorphous silicon photoconductor, the photoconductor incorporated in the above-described image forming apparatus prevents carrier injection on the upper surface of a photoconductor substrate made of an aluminum (hereinafter referred to as Al) alloy. There is known a structure in which an a-Si photosensitive layer formed by sequentially laminating a layer, a photoconductive layer, and a surface protective layer is deposited to a thickness of 10 to 100 μm. The photosensitive member has support means such as flanges inserted in both ends thereof and is rotatably supported by the support means.

また感光体の製造方法は、まず、Al合金を押出加工または押出加工と引抜き加工を行うことにより所定の円筒形状に成形し、成形された円筒体の外周部、内周部、両端部などを粗切削し、インロー内径部を切削加工して所定の基体形状に加工する。さらに、基体形状に加工したものに所定の表面性状を与えるために、仕上げ切削、各種のブラスト処理、化学処理などを行い、表面に付着した油分や汚れなどを除去するための脱脂、洗浄工程を経て、感光体用基体を得る。   In addition, the manufacturing method of the photosensitive member is formed by first forming an Al alloy into a predetermined cylindrical shape by extruding or extruding and drawing, and forming the outer peripheral portion, inner peripheral portion, both end portions, and the like of the formed cylindrical member. Rough cutting is performed, and the inner diameter portion of the inlay is cut to be processed into a predetermined base shape. Furthermore, in order to give a predetermined surface property to the substrate processed into a substrate shape, finish cutting, various blasting treatments, chemical treatments, etc. are performed, and a degreasing and washing process for removing oil and dirt adhering to the surface is performed. Then, a photoreceptor substrate is obtained.

つぎに、得られたAl合金の基体に、a−Si感光層を10〜100μmの厚さで成膜形成して電子写真用感光体(以下、感光体という)とする。a−Si感光層は、例えば、プラズマCVD法により基体側からキャリア注入阻止層、光導電層、表面保護層を順次積層することにより形成される。   Next, an a-Si photosensitive layer is formed to a thickness of 10 to 100 [mu] m on the obtained Al alloy substrate to obtain an electrophotographic photoreceptor (hereinafter referred to as a photoreceptor). The a-Si photosensitive layer is formed, for example, by sequentially laminating a carrier injection blocking layer, a photoconductive layer, and a surface protective layer from the substrate side by plasma CVD.

ところで、近年、電子写真技術の飛躍的な進歩によって、画像形成装置の高速化、軽量化、高分解能化が進み、これらの高性能を達成するために、感光層の特性向上のみでなく、感光体の寸法精度や基体の良好な表面性状が要求されている。   By the way, in recent years, the rapid progress of electrophotographic technology has led to an increase in the speed, weight, and resolution of an image forming apparatus. In order to achieve these high performances, Dimensional accuracy of the body and good surface properties of the substrate are required.

感光体の寸法精度には、基体製作工程におけるAl合金の押出、引抜き工程での寸法精度と、粗切削加工、仕上げ切削加工工程における寸法精度とが大きく影響するが、現状ではこれら各工程における技術の進歩により、十分対応可能となっている。
特開2000−72526号公報
The dimensional accuracy of the photoreceptor is greatly influenced by the dimensional accuracy in the extrusion and drawing processes of the Al alloy in the substrate manufacturing process, and the dimensional accuracy in the rough cutting process and the finishing cutting process. This has made it possible to respond sufficiently.
JP 2000-72526 A

しかしながら、Al合金の基体とa−Si感光層との密着性を向上させ、また良好なa−Si感光層形成を目的として、基体温度を高温(200℃〜300℃)にして感光層の成膜形成するようになったため、基体が変形するという問題が生じるようになった。特に基体の長手方向両端部に中央部よりも内径が大きなインロー部を形成した場合、インロー部において変形が生じ易い。   However, for the purpose of improving the adhesion between the Al alloy substrate and the a-Si photosensitive layer and forming a good a-Si photosensitive layer, the substrate temperature is increased (200 ° C. to 300 ° C.) to form the photosensitive layer. Since a film is formed, there arises a problem that the substrate is deformed. In particular, when an inlay portion having an inner diameter larger than that of the central portion is formed at both longitudinal ends of the base body, the inlay portion is likely to be deformed.

このような基体の変形が生じると、基体自体の真円度が低下し、感光体に回転ブレが生じ、その結果、形成画像に濃度ムラが生じる問題を誘発する。   When such deformation of the substrate occurs, the roundness of the substrate itself decreases, causing rotational blurring of the photoreceptor, and as a result, causes a problem of density unevenness in the formed image.

そこで上述の問題点を解消すべく、基体材料としてJISH0001における質別Oの材料を使用することが提案されているが、かかる対策をもってしても基体の熱変形を抑えるのに十分なものではなかった。   Therefore, in order to solve the above-mentioned problems, it has been proposed to use a material classified by quality O in JISH0001 as a base material, but even with such measures, it is not sufficient to suppress thermal deformation of the base. It was.

本発明は上記問題点を解消すべく案出されたものであり、その目的は、感光層を形成する際に生じる基体の変形を抑制することが可能な感光体用基体、及びそれを用いた感光体、画像形成装置を提供することにある。   The present invention has been devised to solve the above-mentioned problems, and an object of the present invention is to provide a substrate for a photoreceptor capable of suppressing deformation of the substrate that occurs when a photosensitive layer is formed, and the same. The object is to provide a photoreceptor and an image forming apparatus.

本発明の感光体用基体は、上面に感光層が被着される円筒状基体を備えた感光体用基体において、前記円筒状基体の内部応力を9.2MPa以下に設定したことを特徴とするものである。   The photoconductor substrate of the present invention is characterized in that in the photoconductor substrate comprising a cylindrical substrate on which a photosensitive layer is deposited, the internal stress of the cylindrical substrate is set to 9.2 MPa or less. Is.

また本発明の感光体用基体は、上述の感光体用基体において、前記円筒状基体が端部に中央部よりも内径が大きなインロー部を有することを特徴とするものである。更に本発明の感光体用基体は、上述の感光体用基体において、前記インロー部の肉厚が0.7mm〜8mmであることを特徴とするものである。   The photoreceptor substrate of the present invention is characterized in that, in the above-described photoreceptor substrate, the cylindrical substrate has an inlay portion having an inner diameter larger than that of a central portion at an end portion. Furthermore, the photoreceptor substrate of the present invention is characterized in that, in the above-described photoreceptor substrate, the thickness of the inlay portion is 0.7 mm to 8 mm.

また更に本発明の感光体用基体は、上述の感光体用基体において、前記感光体用基体の内部応力の下限値が0.01MPa以上に設定されていることを特徴とするものである。   Further, the photoreceptor substrate of the present invention is characterized in that, in the above-described photoreceptor substrate, the lower limit of the internal stress of the photoreceptor substrate is set to 0.01 MPa or more.

更にまた本発明の感光体用基体は、上述の感光体用基体において、前記円筒状基体の内部応力は長手方向中央部よりも両端部で小さいことを特徴とするものである。   Furthermore, the photoreceptor substrate of the present invention is characterized in that, in the above-described photoreceptor substrate, the internal stress of the cylindrical substrate is smaller at both ends than in the longitudinal center.

一方、本発明の感光体は、上述の感光体用基体上にアモルファスシリコンを含む感光層を設けたことを特徴とするものである。   On the other hand, the photoreceptor of the present invention is characterized in that a photosensitive layer containing amorphous silicon is provided on the above-mentioned photoreceptor substrate.

そして本発明の画像形成装置は、上述の感光体と、該感光体を回転可能に支持するための支持手段と、前記感光体の表面に電荷を付与する帯電手段と、前記感光体に光を照射して感光体に静電潜像を形成する露光手段と、前記感光体にトナーを付着させる現像手段と、前記トナーを被転写材に転写する転写手段と、前記トナーの転写後に感光体表面の残留トナーを除去するクリーニング手段と、前記トナーの転写後に残余静電潜像を除去する除電手段と、を備えたことを特徴とするものである。   The image forming apparatus of the present invention includes the above-described photoconductor, a support unit for rotatably supporting the photoconductor, a charging unit for applying an electric charge to the surface of the photoconductor, and light to the photoconductor. An exposure unit that forms an electrostatic latent image on the photoconductor by irradiation, a developing unit that attaches toner to the photoconductor, a transfer unit that transfers the toner to a transfer material, and a surface of the photoconductor after the toner is transferred Cleaning means for removing the residual toner, and charge eliminating means for removing the residual electrostatic latent image after the transfer of the toner.

本発明によれば、上面に感光層が被着される円筒状基体を備えた感光体用基体において、前記円筒状基体の内部応力を9.2MPa以下に設定したことから、高速で画像形成を行っても、画像欠陥となる濃度ムラが発生しなくなり、良好な画像形成が得られる高性能な画像形成装置が実現される。   According to the present invention, since the internal stress of the cylindrical substrate is set to 9.2 MPa or less in the photosensitive substrate including the cylindrical substrate on which the photosensitive layer is deposited, the image formation can be performed at high speed. Even if the operation is performed, density unevenness that is an image defect does not occur, and a high-performance image forming apparatus that can achieve good image formation is realized.

また本発明によれば、前記円筒状基体の内部応力を長手方向中央部よりも両端部で小さくすることにより、両端部を起点とした感光層の膜剥がれを良好に防止することができる利点がある。   Further, according to the present invention, the internal stress of the cylindrical substrate is made smaller at both end portions than in the longitudinal central portion, thereby advantageously preventing film peeling of the photosensitive layer starting from both end portions. is there.

以下に、本発明の実施の形態を図面に基づいて説明する。図1は本発明の一実施形態にかかる感光体用基体Aの断面図、図2は図1の感光体用基体Aを用いて構成された感光体Bの断面図であり、図2に示す感光体Bは大略的に感光体用基体A上に感光層2を被着させた構造を有している。   Embodiments of the present invention will be described below with reference to the drawings. 1 is a cross-sectional view of a photoconductor substrate A according to an embodiment of the present invention, and FIG. 2 is a cross-sectional view of a photoconductor B formed using the photoconductor substrate A of FIG. The photoconductor B has a structure in which the photoconductive layer 2 is deposited on the photoconductor substrate A.

感光体用基体
感光体用基体Aは、Al合金やマグネシウム合金,SUS,ニッケル,銅,黄銅等の導電性材料、あるいはガラス、セラミックなどの絶縁体表面に前記導電性材料で被覆したものにより形成された円筒状基体1から成っており、その上面にはキャリア注入阻止層3、光導電層4、表面保護層5等を順次積層してなる感光層2が被着され、該感光層2を支持する支持母材として機能する。
Photoconductor Substrate The photoconductor substrate A is formed of a conductive material such as an Al alloy, a magnesium alloy, SUS, nickel, copper, or brass, or an insulating material such as glass or ceramic coated with the conductive material. A photosensitive layer 2 comprising a carrier injection blocking layer 3, a photoconductive layer 4, a surface protective layer 5 and the like laminated in order is deposited on the upper surface of the cylindrical substrate 1. Functions as a supporting base material to support.

また感光体用基体A(円筒状基体1)は、その長手方向両端部には長手方向中央部よりも内径が大きなインロー部1aが形成されている。このインロー部1aは、感光体Bを回転可能に支持するためのフランジ等の支持手段が感光体の両端から挿着された場合に、インロー部1aの根元に形成される段差に支持手段の一部を当接させることで支持手段と感光体Bとの位置関係を固定させる作用を為す。   The photosensitive substrate A (cylindrical substrate 1) has inlay portions 1a having a larger inner diameter than the central portion in the longitudinal direction at both ends in the longitudinal direction. The inlay portion 1a is provided in a step formed at the base of the inlay portion 1a when support means such as a flange for rotatably supporting the photoconductor B is inserted from both ends of the photoconductor. By bringing the portion into contact, the positional relationship between the support means and the photosensitive member B is fixed.

このような円筒状基体1は、インロー部1aにおける内径が22mm〜240mm、インロー部1a以外の領域、すなわち長手方向中央部における内径が20mm〜232mmにそれぞれ設定される。またインロー部1aにおける肉厚が0.7mm〜8mm、長手方向中央部における肉厚が0.8mm〜10mmにそれぞれ設定される。   In such a cylindrical substrate 1, the inner diameter in the spigot part 1a is set to 22 mm to 240 mm, and the area other than the spigot part 1a, that is, the inner diameter in the longitudinal center is set to 20 mm to 232 mm. Moreover, the thickness in the inlay part 1a is set to 0.7 mm-8 mm, respectively, and the thickness in a longitudinal direction center part is set to 0.8 mm-10 mm, respectively.

そして感光体用基体Aを構成する円筒状基体1は、その内部応力が9.2MPa以下に設定されている。このため、円筒状基体1上に後に詳述する感光層2を被着させた際に円筒状基体1が成膜時の熱によって変形することが良好に防止され、円筒状基体1の真円度を高く保持することができる。   The cylindrical substrate 1 constituting the photoreceptor substrate A has an internal stress set to 9.2 MPa or less. For this reason, when the photosensitive layer 2 which will be described in detail later is deposited on the cylindrical substrate 1, the cylindrical substrate 1 is well prevented from being deformed by heat during film formation, and the circular shape of the cylindrical substrate 1 is prevented. The degree can be kept high.

なお、円筒状基体1の内部応力は、9.2MPa以下であれば、小さければ小さいほど良いが、より好ましくは8.5MPa以下である。また円筒状基体1の内部応力を0.01MPaよりも小さく設定しようとすると、円筒状基体1を形成する際の軟化処理や切削処理に時間がかかり、その生産性が低下するため、0.01MPa以上に設定することが好ましい。   The internal stress of the cylindrical substrate 1 is preferably 9.2 MPa or less, but the smaller the better, the more preferably 8.5 MPa or less. Further, if the internal stress of the cylindrical substrate 1 is set to be smaller than 0.01 MPa, it takes time for the softening process or the cutting process when forming the cylindrical substrate 1, and the productivity is reduced. It is preferable to set the above.

また円筒状基体1の内部応力は、その分布を長手方向中央部で高く、両端部で低く設定することが好ましい。その理由は、両端部で内部応力が大きいと、両端部を起点として感光層2の膜剥がれが生じ易いからである。また両端部に形成されるインロー部1aにはフランジ等の支持手段が挿着されるために大きな外力が印加され易く、両端部で内部応力が大きいとインロー部1aで基板変形が起こり易いからである。   The internal stress of the cylindrical substrate 1 is preferably set such that its distribution is high at the longitudinal center and low at both ends. The reason is that if the internal stress is large at both ends, the photosensitive layer 2 is likely to peel off from both ends. Further, since a supporting means such as a flange is inserted into the inlay portion 1a formed at both ends, a large external force is likely to be applied, and if the internal stress is large at both ends, the substrate deformation is likely to occur at the inlay portion 1a. is there.

更に円筒状基体1の内部応力は、引張応力あるいは圧縮応力のいずれの場合であっても良いが、好ましくは、圧縮応力である方がよい。円筒状基体1の内部応力が引張応力になるか、あるいは圧縮応力になるかは感光層2の成膜方法や、成膜時の基体保持方法、感光層2の膜厚均一性等の条件で決定される。   Furthermore, the internal stress of the cylindrical substrate 1 may be either a tensile stress or a compressive stress, but is preferably a compressive stress. Whether the internal stress of the cylindrical substrate 1 becomes a tensile stress or a compressive stress depends on conditions such as the film formation method of the photosensitive layer 2, the substrate holding method during film formation, and the film thickness uniformity of the photosensitive layer 2. It is determined.

上述の円筒状基体1の製造方法は、円筒状基体1がAl合金から成る場合、まず、Al合金を押出加工または押出加工と引抜き加工を行うことにより所定の円筒状の素管を形成するとともに、該素管を所定の温度で所定の時間、加熱することにより軟化処理を施す。次に、軟化処理した素管を所定の速度で軸中心に回転させながら単結晶ダイヤモンドや焼結ダイヤモンド、超硬等からなるバイト等の切削手段を用いて粗切削し、インロー部1aを切削加工して所定の基体形状に加工する。そして、基体形状に加工したものに所定の表面性状を与えるために、仕上げ切削、各種のブラスト処理、化学処理などを行い、表面に付着した油分や汚れなどを除去するための脱脂、洗浄工程を経て、感光体用基体を得る。このとき、基体形状が同一であっても、上述の軟化処理の仕方、切削加工の仕方によって円筒状基体1に蓄積される内部応力が大きく異なるので注意を要する。例えば、軟化処理において加熱温度が高く、加熱時間が長いほど円筒状基体1の内部応力は小さくなる。また切削手段の送りスピード(移動スピード)が遅いほど感光体用基体Aの内部応力が小さくなり、また一回の切削量が小さいほど内部応力が小さくなる。それ故、例えば、切削手段として単結晶ダイヤモンドからなるバイトを用いる場合、素管の1分あたりの回転数を600〜12000rev/min、素管の長手方向に沿った切削手段の素管1回転あたりの送りスピードを0.02μm/rev〜0.5μm/revに設定するとともに、素管1回転あたりの切削量を0.8μm/rev以内に抑えることによって円筒状基体1を所定形状に加工することが好ましい。   In the manufacturing method of the cylindrical substrate 1 described above, when the cylindrical substrate 1 is made of an Al alloy, first, a predetermined cylindrical tube is formed by extruding or extruding and drawing an Al alloy. The base tube is softened by heating at a predetermined temperature for a predetermined time. Next, while the softened tube is rotated about the axis at a predetermined speed, rough cutting is performed using cutting means such as a single crystal diamond, sintered diamond, carbide, or the like, and the inlay portion 1a is cut. Then, it is processed into a predetermined substrate shape. Then, in order to give a predetermined surface property to the substrate processed into a base shape, finish cutting, various blast treatments, chemical treatment, etc. are performed, and a degreasing and washing process for removing oil and dirt attached to the surface is performed. Then, a photoreceptor substrate is obtained. At this time, even if the base shapes are the same, the internal stress accumulated in the cylindrical base body 1 varies greatly depending on the above-described softening method and cutting method. For example, the higher the heating temperature in the softening treatment and the longer the heating time, the smaller the internal stress of the cylindrical substrate 1. Further, the lower the feed speed (moving speed) of the cutting means, the smaller the internal stress of the substrate A for photoreceptors, and the smaller the amount of cutting at one time, the smaller the internal stress. Therefore, for example, when a cutting tool made of single crystal diamond is used as the cutting means, the number of rotations per minute of the raw tube is 600 to 12000 rev / min, and per turn of the cutting means along the longitudinal direction of the raw pipe The cylindrical substrate 1 is processed into a predetermined shape by setting the feed speed of the steel sheet to 0.02 μm / rev to 0.5 μm / rev and suppressing the cutting amount per revolution of the raw tube within 0.8 μm / rev. Is preferred.

感光層
上述の感光体用基体A(円筒状基体1)上に積層される感光層2は、例えば、キャリア注入阻止層3、光導電層4、表面保護層5を順次積層して構成されている。
Photosensitive layer The photosensitive layer 2 laminated on the above-mentioned photoreceptor substrate A (cylindrical substrate 1) is formed by sequentially laminating a carrier injection blocking layer 3, a photoconductive layer 4, and a surface protective layer 5, for example. Yes.

キャリア注入阻止層3は、その名の通り、円筒状基体1内のキャリア(例えば、後述する帯電手段によって感光層2の表面が正に帯電する場合にはキャリアは電子、感光層2の表面が負に帯電する場合にはキャリアは正孔である)が光導電層4に侵入しようとするのを阻止する作用を為す。   As the name suggests, the carrier injection blocking layer 3 is a carrier in the cylindrical substrate 1 (for example, when the surface of the photosensitive layer 2 is positively charged by a charging means described later, the carrier is an electron, and the surface of the photosensitive layer 2 is In the case of being negatively charged, the carrier is a hole) and prevents the photoconductive layer 4 from entering the photoconductive layer 4.

かかるキャリア注入阻止層3は、a−Si:Hを主成分とする構成となっており、円筒状基体1の表面全体に0.5μm〜3μmの厚みに形成される。キャリア注入阻止層3中には、感光層2の表面を正に帯電させる正帯電用の感光体である場合、不純物として、周期律表第IIIa族元素(B等)を含有させておけば、キャリアである電子に対するポテンシャル障壁を高く形成でき、これによって円筒状基体1中の電子が光導電層4に注入されるのを防止する効果を高めることができる。一方、負帯電用の感光体である場合は、周期律表Va族元素(P等を含有させておけば、正孔に対するポテンシャル障壁を高くできる。   The carrier injection blocking layer 3 is composed mainly of a-Si: H, and is formed on the entire surface of the cylindrical substrate 1 with a thickness of 0.5 μm to 3 μm. When the carrier injection blocking layer 3 is a positively charged photoconductor that positively charges the surface of the photosensitive layer 2, if a Group IIIa element (such as B) in the periodic table is contained as an impurity, It is possible to form a high potential barrier against electrons as carriers, thereby enhancing the effect of preventing the electrons in the cylindrical substrate 1 from being injected into the photoconductive layer 4. On the other hand, in the case of a negatively charged photoreceptor, the potential barrier against holes can be increased by adding a Va group element (such as P) in the periodic table.

またキャリア注入阻止層3中にOを含有させても良く、この場合、キャリア注入阻止層3の禁制帯幅を大きくすることができ、これによってもキャリアの注入阻止効果を高めることができる上に、Oを含有させることで円筒状基体1に対するキャリア注入阻止層3の密着性を向上させることができる。ただし、Oをキャリア注入阻止層3中に含有させる場合、Oのみでは成膜中にチャンバー内に導入されるSiHガスと反応して爆発を引き起こす可能性があるため、不活性なNを同時に含有させることが好ましい。 In addition, O may be contained in the carrier injection blocking layer 3, and in this case, the forbidden band width of the carrier injection blocking layer 3 can be increased, and this can also enhance the carrier injection blocking effect. , O can improve the adhesion of the carrier injection blocking layer 3 to the cylindrical substrate 1. However, when O is contained in the carrier injection blocking layer 3, since only O may react with the SiH 4 gas introduced into the chamber during film formation and cause an explosion, the inert N is simultaneously added. It is preferable to contain.

一方、キャリア注入阻止層3上に被着される光導電層4は、露光手段からの光の照射によって内部に上述したキャリアを発生させるためのものであり、かかるキャリアが感光層表面まで到達すると、感光体表面の電位が減少し、感光体表面に静電潜像が形成される。   On the other hand, the photoconductive layer 4 deposited on the carrier injection blocking layer 3 is for generating the above-mentioned carriers inside by irradiation of light from the exposure means, and when such carriers reach the surface of the photosensitive layer. The potential on the surface of the photoconductor is reduced, and an electrostatic latent image is formed on the surface of the photoconductor.

この光導電層4の材料としては、a−Si:Hやa−SiC:H、a−SiO等のアモルファス材料、Se,Se−Te,AsSe等のSe合金、ZnO,CdS,CdSeなどのII−VI族化合物の粒子を樹脂に分散させたもの等が採用され、これらの材料で単層に形成してもよいし、あるいは、電荷発生層と電荷輸送層に分けた複数層としても良い。 Examples of the material of the photoconductive layer 4 include amorphous materials such as a-Si: H, a-SiC: H, and a-SiO, Se alloys such as Se, Se-Te, and As 2 Se 3 , ZnO, CdS, and CdSe. Such as those obtained by dispersing particles of II-VI group compound in a resin, etc., may be formed as a single layer with these materials, or as a plurality of layers divided into a charge generation layer and a charge transport layer Also good.

かかる光導電層4は、帯電手段の作用によって感光体表面に帯電した電荷を保持する帯電保持能力を高くするため、暗導電率(光照射前の導電率)を小さく設定し(導電率10−11〜10−13/Ω・cm)、また感光層2の表面までキャリアをスムーズに移動可能とするため、光が照射された領域における明導電率(光照射後の導電率)を比較的大きく(導電率10−6〜10−10/Ω・cm)に設定することが好ましい。なお、光導電層4は、キャリア注入阻止層3の上に15μm〜80μmの厚みに形成される。 The photoconductive layer 4 has a dark conductivity (conductivity before light irradiation) set to a small value (conductivity 10 ) in order to increase the charge holding capability for holding the charge charged on the surface of the photoreceptor by the action of the charging means. 11 to 10 −13 / Ω · cm), and in order to enable the carrier to move smoothly to the surface of the photosensitive layer 2, the light conductivity in the region irradiated with light (conductivity after light irradiation) is relatively large. It is preferable to set to (conductivity 10 −6 to 10 −10 / Ω · cm). The photoconductive layer 4 is formed on the carrier injection blocking layer 3 to a thickness of 15 μm to 80 μm.

そして、光導電層4上に被着される表面保護層5は、感光体の周囲に配される帯電手段からの放電によって帯電した電荷を表面に保持するとともに、クリーニング手段による研磨から光導電層4等を保護する作用を為す。   The surface protective layer 5 deposited on the photoconductive layer 4 holds the charge charged by the discharge from the charging means disposed around the photosensitive member on the surface, and from the polishing by the cleaning means to the photoconductive layer. It works to protect 4 etc.

この表面保護層5は、a−SiC:Hを主成分とする構成、あるいは、a−C:Hを主成分とする構成等、種々の構成が考えられるが、いずれの場合であっても、表面に帯電した電荷を保持すべく、暗導電率と明導電率との差が小さく、導電率が低く(導電率:10−12〜10−14/Ω・cm)、硬度がビッカース硬度Hvで1500以上、光学バンドギャップ2.0eV以上の材料により形成することが好ましい。なお、この表面保護層5は、膜厚が大きくなると高抵抗となり、光照射によって表面電位が減少しにくくなって鮮明な画像形成に悪影響を及ぼすおそれがあるため、非常に薄く形成されており、好ましくは3μm以下、更に好ましくは0.5μm〜1.5μmの厚みに形成される。 The surface protective layer 5 may have various configurations such as a configuration having a-SiC: H as a main component or a configuration having a-C: H as a main component. In order to retain the charged electric charge on the surface, the difference between the dark conductivity and the light conductivity is small, the conductivity is low (conductivity: 10 −12 to 10 −14 / Ω · cm), and the hardness is Vickers hardness Hv It is preferable to form with a material having 1500 or more and an optical band gap of 2.0 eV or more. The surface protective layer 5 has a high resistance when the film thickness is increased, and it is difficult to reduce the surface potential by light irradiation, which may adversely affect the formation of a clear image. The thickness is preferably 3 μm or less, more preferably 0.5 μm to 1.5 μm.

このようなキャリア注入阻止層3、光導電層4、表面保護層5を有する感光層2と上述の円筒状基体1との内部応力の差は100MPa以内に設定することが好ましく、このような範囲に両者の内部応力の差を設定することにより、外径が40mm以下の小型の円筒状基体であっても、その熱変形を小さく抑えることが可能となる。   The difference in internal stress between the photosensitive layer 2 having the carrier injection blocking layer 3, the photoconductive layer 4, and the surface protective layer 5 and the cylindrical substrate 1 is preferably set within 100 MPa. By setting the difference between the two internal stresses, it is possible to suppress the thermal deformation of a small cylindrical substrate having an outer diameter of 40 mm or less.

更に上述の感光層2と上述の円筒状基体1の内部応力は双方ともに圧縮応力であることが好ましい。なお、感光層2の内部応力が引張応力であるか、圧縮応力であるかは、成膜時の基体保持方法や感光層2の成膜方法、膜厚の均一性等の条件で決定される。   Further, it is preferable that the internal stresses of the photosensitive layer 2 and the cylindrical substrate 1 are both compressive stresses. Whether the internal stress of the photosensitive layer 2 is a tensile stress or a compressive stress is determined by conditions such as a substrate holding method at the time of film formation, a film formation method of the photosensitive layer 2, and film thickness uniformity. .

また感光層2の内部応力の大きさを調整する方法としては、基体温度、印加電力、真空度を調整することが考えられ、例えば、内部応力を大きくするには、基体温度を高くしたり、印加電力を高くすればよい。   Further, as a method for adjusting the magnitude of the internal stress of the photosensitive layer 2, it is conceivable to adjust the substrate temperature, the applied power, and the degree of vacuum. For example, to increase the internal stress, the substrate temperature is increased, The applied power may be increased.

このような感光層2の成膜方法としては、例えばプラズマCVD法や熱CVD法、真空蒸着法、イオンプレーティング法、スパッタリング法(RF,DC,RFマグネトロン、DCマグネトロン)、CAT−CVD法、活性反応蒸着法等の方法が考えられる。上記の成膜法では、密着性の良好なa−Si感光層2を得るために、円筒状基体1の温度を高温(200℃〜300℃)にして成膜形成するため、従来、基体が熱変形したり、高温で成膜形成された感光体を室温に冷却することによって成膜変形が生じ寸法精度が低下する。この現象は基体の肉厚が薄くなるほど顕著であり、熱変形は、円筒状基体1では、インロー部1aにおいて大きくなりやすい。しかしながら、本発明においては、円筒状基体1の内部応力が9.2MPa以下に設定されているため、熱変形を小さく抑えることができ、円筒状基体1の真円度を高く維持することができ、濃度ムラの少ない画像形成に供することができる感光体を実現可能となる。   Examples of the method for forming the photosensitive layer 2 include a plasma CVD method, a thermal CVD method, a vacuum deposition method, an ion plating method, a sputtering method (RF, DC, RF magnetron, DC magnetron), a CAT-CVD method, A method such as an active reaction vapor deposition method is conceivable. In the above film forming method, in order to obtain the a-Si photosensitive layer 2 having good adhesion, the film is formed at a high temperature (200 ° C. to 300 ° C.) of the cylindrical substrate 1. Deformation of the film occurs due to thermal deformation or cooling of the photoconductor formed at high temperature to room temperature, resulting in a reduction in dimensional accuracy. This phenomenon becomes more conspicuous as the thickness of the substrate becomes thinner, and the thermal deformation tends to increase in the inlay portion 1a in the cylindrical substrate 1. However, in the present invention, since the internal stress of the cylindrical substrate 1 is set to 9.2 MPa or less, thermal deformation can be suppressed to a low level, and the roundness of the cylindrical substrate 1 can be maintained high. Therefore, it is possible to realize a photoconductor that can be used for image formation with little density unevenness.

画像形成装置
上述の感光体Bは図3、図4に示すような画像形成装置Cに搭載される。かかる画像形成装置Cは、大略的に、支持手段7と、帯電手段8と、露光手段9と、現像手段10と、転写手段11と、クリーニング手段12と、除電手段13と、を備えた構造を有しており、具体的には、支持手段7を感光体Bの両端部に配置するとともに、感光体Bの円周方向に沿って帯電手段8、露光手段9、現像手段10、転写手段11、クリーニング手段12、除電手段13を順次配設した構成となっている。
Image Forming Apparatus The above-described photoreceptor B is mounted on an image forming apparatus C as shown in FIGS. The image forming apparatus C generally includes a support unit 7, a charging unit 8, an exposure unit 9, a developing unit 10, a transfer unit 11, a cleaning unit 12, and a charge eliminating unit 13. Specifically, the support means 7 is disposed at both ends of the photoconductor B, and the charging means 8, the exposure means 9, the developing means 10, and the transfer means are arranged along the circumferential direction of the photoconductor B. 11, a cleaning unit 12, and a static elimination unit 13 are sequentially arranged.

感光体Bの両端部に配置される支持手段7は、Al、樹脂、SUS、セラミックス等、種々の材料から成り、先端部を円盤状もしくは円柱状に成したフランジが好適に用いられ、該フランジの先端部を感光体の両端部(本実施形態においてはインロー部1a)に挿着することにより、感光体Bを回転可能に支持する作用を為す。かかる支持手段7の外径は挿着されるインロー部1aの内径よりも若干大きめに設定する方が感光体Bを良好に固定する点で好ましいが、大きすぎると感光層2の膜剥がれの原因となりやすいことから、インロー部1aの内径よりも0.02mm〜0.12mm大きめに設定することが好ましい。   The support means 7 disposed at both ends of the photoreceptor B is made of various materials such as Al, resin, SUS, ceramics, etc., and a flange having a disk-like or columnar tip is preferably used. Is inserted into both end portions of the photosensitive member (inlay portion 1a in the present embodiment), so that the photosensitive member B is rotatably supported. It is preferable to set the outer diameter of the support means 7 slightly larger than the inner diameter of the inserted spigot portion 1a from the viewpoint of fixing the photosensitive member B satisfactorily. However, if the diameter is too large, the photosensitive layer 2 may be peeled off. Since it becomes easy to become, it is preferable to set 0.02 mm-0.12 mm larger than the internal diameter of the spigot part 1a.

また感光体Bの周囲に配置される帯電手段8は、感光体Bの感光層2の表面に電荷を付与して感光層2を正もしくは負に帯電させるためのものであり、例えばコロナ帯電を行うコロナ帯電器やローラ帯電器等が用いられる。   The charging means 8 arranged around the photosensitive member B is for applying a charge to the surface of the photosensitive layer 2 of the photosensitive member B to charge the photosensitive layer 2 positively or negatively. For example, a corona charger or a roller charger is used.

一方、帯電手段8の下流側に配される露光手段9は、光を感光体Bの表面に照射させることによって該照射領域の電位を減少させ、感光層2に所定の静電潜像を形成するためのものである。露光手段9としては、画像形成装置がLEDプリンタである場合、感光体Bの長手方向と略平行に配列した複数の発光ダイオードを有したLEDヘッドが好適に使用され、その光の波長は600nm〜740nmである。また画像形成装置が複写機である場合、露光手段9としてはフィルタを通したハロゲンランプが好適に使用され、その光の波長は550nm〜650nmである。一方、画像形成装置がレーザービームプリンタである場合、露光手段9としては、レーザー素子及び該レーザー素子からのレーザー光を感光体Bに照射させるためのポリゴンミラーを備えた構成が好適に採用され、その光の波長は600nm〜800nmである。   On the other hand, the exposure means 9 arranged on the downstream side of the charging means 8 irradiates the surface of the photoconductor B with light, thereby reducing the potential of the irradiated area and forming a predetermined electrostatic latent image on the photosensitive layer 2. Is to do. When the image forming apparatus is an LED printer, an LED head having a plurality of light emitting diodes arranged substantially parallel to the longitudinal direction of the photosensitive member B is preferably used as the exposure unit 9, and the wavelength of the light is from 600 nm to 740 nm. When the image forming apparatus is a copying machine, a halogen lamp through a filter is preferably used as the exposure unit 9, and the wavelength of the light is 550 nm to 650 nm. On the other hand, when the image forming apparatus is a laser beam printer, as the exposure unit 9, a configuration including a laser element and a polygon mirror for irradiating the photosensitive member B with laser light from the laser element is suitably employed. The wavelength of the light is 600 nm to 800 nm.

更に露光手段9よりも下流側に配される現像手段10は、現像剤貯蔵容器と現像スリーブとを含んで構成されており、該現像スリーブによって現像剤貯蔵容器内の現像剤を感光体表面に形成された静電潜像にパターンに応じて付着させ、これを可視像化する作用を為す。なお、現像剤としては、導電性磁性キャリア及び絶縁トナー、磁性絶縁性トナー等の2成分現像剤や1成分現像剤等が好適に用いられる。   Further, the developing means 10 disposed downstream of the exposure means 9 includes a developer storage container and a developing sleeve, and the developer in the developer storage container is transferred to the surface of the photoreceptor by the developing sleeve. It adheres to the formed electrostatic latent image according to the pattern, and performs the effect | action which makes this visible image. As the developer, a two-component developer or a one-component developer such as a conductive magnetic carrier and an insulating toner or a magnetic insulating toner is preferably used.

そして、現像手段10に対して下流側に配される転写手段11は、被転写材である記録紙を挟んで感光体Bと対向するように配置されており、現像手段10によって付着されたトナー像を記録紙に対して転写させる作用を為す。   The transfer unit 11 disposed on the downstream side with respect to the developing unit 10 is disposed so as to face the photosensitive member B with the recording paper as the transfer material interposed therebetween, and the toner attached by the developing unit 10 It acts to transfer the image to the recording paper.

これに対して、転写手段11よりも下流側に配されるクリーニング手段12は、弾性ゴムからなるクリーニングブレードを有しており、該ブレードの先端部を感光体表面に摺接させておくことでトナー転写後に感光体表面に付着した残留トナーを除去する作用を為す。   On the other hand, the cleaning means 12 disposed downstream of the transfer means 11 has a cleaning blade made of elastic rubber, and the tip of the blade is in sliding contact with the surface of the photoreceptor. It acts to remove residual toner adhering to the surface of the photoreceptor after toner transfer.

またクリーニング手段12と上述の帯電手段8との間に配される除電手段13は、感光体Bの表面を強い光で全面露光することでトナー転写後に感光体表面に残った静電潜像を除去するためのものであり、例えば、ハロゲン光やレーザー光等が好適に用いられる。   Further, the neutralizing unit 13 disposed between the cleaning unit 12 and the above-described charging unit 8 exposes the entire surface of the photosensitive member B with strong light so that the electrostatic latent image remaining on the surface of the photosensitive member after toner transfer can be obtained. For example, halogen light or laser light is preferably used.

かくして、上述した画像形成装置は、カールソン方式による電子写真プロセスで画像形成を行う場合、支持手段7によって感光体Bを軸周りに回転させながら、感光体表面を帯電手段8によって帯電させるとともに、該帯電させた感光体に露光手段9からの光を照射して所定の静電潜像を形成し、現像手段10を用いて静電潜像に応じたパターンにトナーを付着させ、該トナーを転写手段11によって記録紙に転写させることによって記録紙に画像が形成される。そして、トナー転写後に残留したトナーや静電潜像がクリーニング手段12や除電手段13によって除去されることによって一連の電子写真プロセスが完了する。   Thus, when the image forming apparatus described above performs image formation by the electrophotographic process using the Carlson method, the surface of the photoconductor is charged by the charging unit 8 while the photoconductor B is rotated around the axis by the support unit 7, and The charged photoreceptor is irradiated with light from the exposure unit 9 to form a predetermined electrostatic latent image, and the developing unit 10 is used to attach toner to a pattern corresponding to the electrostatic latent image, and transfer the toner. An image is formed on the recording paper by being transferred onto the recording paper by means 11. The toner and the electrostatic latent image remaining after the toner transfer are removed by the cleaning unit 12 and the charge eliminating unit 13 to complete a series of electrophotographic processes.

なお、本発明は上述の実施形態に限定されるものではなく、本発明の要旨を逸脱しない範囲内において種々の変更、改良が可能である。   In addition, this invention is not limited to the above-mentioned embodiment, A various change and improvement are possible in the range which does not deviate from the summary of this invention.

例えば、上述の実施形態においては、感光体Bの感光層2として主にアモルファス材料を用いるようにしたが、これに代えて、感光層2として有機材料を用いても良く、この場合、感光層2としては電荷発生層と電荷輸送層とで構成され、電荷発生層としてはフタロシアニン顔料、キノン顔料、アゾ顔料等が用いられ、電荷輸送層としてはオキサジアゾ−ル系の化合物、有機シラン化合物、ナフトキノン系、ピラゾイリン系の有機材料が用いられる。   For example, in the above-described embodiment, an amorphous material is mainly used as the photosensitive layer 2 of the photoreceptor B. However, instead of this, an organic material may be used as the photosensitive layer 2, and in this case, the photosensitive layer 2 includes a charge generation layer and a charge transport layer. As the charge generation layer, a phthalocyanine pigment, a quinone pigment, an azo pigment or the like is used. As the charge transport layer, an oxadiazol compound, an organic silane compound, or a naphthoquinone is used. Organic and pyrazoline-based organic materials are used.

また上述の実施形態において、感光層2をキャリア注入阻止層3、光導電層4、表面保護層5の3層構造としたが、キャリア注入阻止層3と円筒状基体1との間に光吸収層を介在させたり、表面保護層を複数層に形成したりしても良く、前者の場合、画像形成装置をレーザービームプリンタとして用いる場合、特に有効である。   In the above-described embodiment, the photosensitive layer 2 has a three-layer structure including the carrier injection blocking layer 3, the photoconductive layer 4, and the surface protective layer 5, but light absorption is performed between the carrier injection blocking layer 3 and the cylindrical substrate 1. A layer may be interposed, or a surface protective layer may be formed in a plurality of layers. In the former case, it is particularly effective when the image forming apparatus is used as a laser beam printer.

以下、本発明の作用効果を確かめるために実施例を用いて説明する。なお、これらの実施例は、本発明の好ましい一実施態様を説明するためのものであって、これにより本発明が制限されるものではない。   Hereinafter, in order to confirm the effect of this invention, it demonstrates using an Example. These examples are for explaining a preferred embodiment of the present invention, and the present invention is not limited thereby.

本実施例では、純度99.9%のAl合金に対して押出・引抜加工により円筒状の素管を形成し、該素管に対して表1の条件の下で種々の軟化処理、切削加工を施して複数の感光体用基体を作成するとともに、各基体に対して表2の条件の下で、キャリア注入阻止層、光導電層、表面保護層を順次積層した感光層を形成し、複数の感光体サンプル(No.1〜No.6)を作成した。感光体の外径は84mmである。そして各サンプルNo.1〜No.6について内部応力と真円度変化量を測定するとともに、各サンプルを画像形成装置内に搭載して画像を形成し、形成画像の濃度ムラを評価した。画像形成装置としてはLEDプリンタを用い、LEDヘッドの光の波長を685nmとした。画像形成時における感光体の回転速度は100mm/secとした。

Figure 2005099637
Figure 2005099637
なお、内部応力の測定方法としては、下記式にて内部応力を表現するCrampton法を用いた。すなわち、内径を測定した各感光体サンプルを、図5に示す如く、長手方向にわたって切断するとともに、切断後の内径を測定し、最外表面の円周応力を求め、この値を内部応力とした。縦弾性係数Eは71700MPa、ポアソン比νを0.33として計算した。
Figure 2005099637
真円度変化量は、感光層形成前の感光体用基体、並びに感光層形成後の感光体に関して、両端部に存在するインロー部で切断し、該切断面の最外周5箇所で真円度を測定し、各箇所において「感光体真円度−感光体用基体真円度」を算出し、その算出結果の最大値と定義した。なお、真円度の測定は、(株)ミツトヨ製ROUND TEST RA−400真円度測定器を用いて行った。 In this example, a cylindrical element pipe is formed by extrusion and drawing of an Al alloy having a purity of 99.9%, and various softening treatments and cutting processes are performed on the element pipe under the conditions shown in Table 1. To form a plurality of photoconductor substrates, and form a photosensitive layer in which a carrier injection blocking layer, a photoconductive layer, and a surface protective layer are sequentially laminated on each substrate under the conditions shown in Table 2. Photoconductor samples (No. 1 to No. 6) were prepared. The outer diameter of the photoreceptor is 84 mm. And each sample No. 1-No. In addition to measuring the internal stress and the amount of change in roundness for No. 6, each sample was mounted in an image forming apparatus to form an image, and the density unevenness of the formed image was evaluated. An LED printer was used as the image forming apparatus, and the wavelength of the light from the LED head was 685 nm. The rotational speed of the photoconductor during image formation was 100 mm / sec.
Figure 2005099637
Figure 2005099637
In addition, as a measuring method of internal stress, Clampton method which expresses internal stress by the following formula was used. That is, each photoconductor sample whose inner diameter was measured was cut in the longitudinal direction as shown in FIG. 5, and the inner diameter after cutting was measured to determine the circumferential stress on the outermost surface, and this value was used as the internal stress. . The longitudinal elastic modulus E was calculated as 71700 MPa and the Poisson's ratio ν was 0.33.
Figure 2005099637
The amount of change in roundness is the degree of roundness at the five outermost circumferences of the cut surface of the photoreceptor substrate before formation of the photosensitive layer and the photoreceptor after formation of the photosensitive layer. Was measured, and “photoreceptor roundness−photoreceptor roundness” was calculated at each location, and defined as the maximum value of the calculation results. In addition, the measurement of roundness was performed using Mitutoyo Corporation ROUND TEST RA-400 roundness measuring device.

また濃度ムラの有無は、形成画像を目視にて観察し、○:濃度ムラほとんど無し、△:濃度ムラ少ない、×:濃度ムラ多いの3段階で評価した。以上の測定結果を表3に示す。

Figure 2005099637
表3によれば、内部応力を9.2MPa以下となったサンプルNo.2〜No.6については真円度変化量が小さく、形成画像の濃度ムラも比較的少なかった。特に内部応力が8.5MPa以下のサンプルNo.4〜No.6については特に濃度ムラが少なかった。従って、良好な画像を得るためには感光体用基体の内部応力を9.2MPa以下に設定すればよいことがわかる。 The presence / absence of density unevenness was evaluated by three steps: visually observing the formed image, ○: almost no density unevenness, Δ: little density unevenness, and x: much density unevenness. The above measurement results are shown in Table 3.
Figure 2005099637
According to Table 3, the sample No. whose internal stress was 9.2 MPa or less. 2-No. For No. 6, the change in roundness was small, and the density unevenness of the formed image was relatively small. In particular, sample No. with an internal stress of 8.5 MPa or less. 4-No. For No. 6, the density unevenness was particularly small. Therefore, it can be seen that the internal stress of the photoreceptor substrate may be set to 9.2 MPa or less in order to obtain a good image.

本発明の一実施形態に係る感光体用基体の断面図である。1 is a cross-sectional view of a photoreceptor substrate according to an embodiment of the present invention. 図1の感光体用基体を用いて構成された感光体の断面図である。FIG. 2 is a cross-sectional view of a photoconductor configured using the photoconductor substrate of FIG. 1. 図2の感光体を用いて構成された画像形成装置の概略構成図である。It is a schematic block diagram of the image forming apparatus comprised using the photoconductor of FIG. 図2の感光体と支持手段との配設状態を示す断面図である。FIG. 3 is a cross-sectional view showing an arrangement state of the photosensitive member and supporting means of FIG. 2. 内部応力の測定方法を説明するための図である。It is a figure for demonstrating the measuring method of an internal stress.

符号の説明Explanation of symbols

1・・・円筒状基体
1a・・・インロー部
2・・・感光層
3・・・キャリア注入阻止層
4・・・光導電層
5・・・表面保護層
7・・・帯電手段
8・・・支持手段
9・・・露光手段
10・・・現像手段
11・・・転写手段
12・・・クリーニング手段
13・・・除電手段
A・・・感光体用基体
B・・・感光体
C・・・画像形成装置
DESCRIPTION OF SYMBOLS 1 ... Cylindrical base | substrate 1a ... Inlay part 2 ... Photosensitive layer 3 ... Carrier injection | pouring prevention layer 4 ... Photoconductive layer 5 ... Surface protective layer 7 ... Charging means 8 ... Supporting means 9 ... exposure means 10 ... developing means 11 ... transfer means 12 ... cleaning means 13 ... static means A ... photosensitive substrate B ... photosensitive body C ...・ Image forming device

Claims (7)

上面に感光層が被着される円筒状基体を備えた感光体用基体において、前記円筒状基体の内部応力を9.2MPa以下に設定したことを特徴とする感光体用基体。 A photoconductor substrate comprising a cylindrical substrate on which a photosensitive layer is deposited, wherein the internal stress of the cylindrical substrate is set to 9.2 MPa or less. 前記円筒状基体は、長手方向両端部に中央部よりも内径が大きなインロー部を有することを特徴とする請求項1に記載の感光体用基体。 2. The substrate for a photoreceptor according to claim 1, wherein the cylindrical substrate has inlay portions having an inner diameter larger than that of the central portion at both ends in the longitudinal direction. 前記インロー部の肉厚が0.7mm〜8mmであることを特徴とする請求項2に記載の感光体用基体。 The photoreceptor substrate according to claim 2, wherein a thickness of the inlay portion is 0.7 mm to 8 mm. 前記円筒状基体の内部応力の下限値は0.01MPa以上に設定されていることを特徴とする請求項1乃至請求項3のいずれかに記載の感光体用基体。 4. The photoreceptor substrate according to claim 1, wherein a lower limit value of internal stress of the cylindrical substrate is set to 0.01 MPa or more. 前記円筒状基体の内部応力は長手方向中央部よりも両端部で小さいことを特徴とする請求項1乃至請求項4のいずれかに記載の感光体用基体。 5. The photoreceptor substrate according to claim 1, wherein an internal stress of the cylindrical substrate is smaller at both end portions than in a longitudinal central portion. 請求項1乃至請求項5のいずれかに記載の感光体用基体上にアモルファスシリコンを含む感光層を設けたことを特徴とする感光体。 6. A photoconductor comprising a photosensitive layer containing amorphous silicon on the photoconductor substrate according to any one of claims 1 to 5. 請求項6に記載の感光体と、該感光体を回転可能に支持するための支持手段と、前記感光体の表面に電荷を付与する帯電手段と、前記感光体に光を照射して感光体に静電潜像を形成する露光手段と、前記感光体にトナーを付着させる現像手段と、前記トナーを被転写材に転写する転写手段と、前記トナーの転写後に感光体表面の残留トナーを除去するクリーニング手段と、前記トナーの転写後に残余静電潜像を除去する除電手段と、を備えた画像形成装置。 7. The photosensitive member according to claim 6, a supporting unit for rotatably supporting the photosensitive member, a charging unit for applying an electric charge to the surface of the photosensitive member, and irradiating the photosensitive member with light. An exposure unit that forms an electrostatic latent image on the surface, a developing unit that attaches toner to the photoconductor, a transfer unit that transfers the toner to a transfer material, and residual toner on the surface of the photoconductor after the toner is transferred. An image forming apparatus comprising: a cleaning unit that removes the residual electrostatic latent image after transferring the toner.
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JP2009150958A (en) * 2007-12-19 2009-07-09 Mitsubishi Chemicals Corp Method of manufacturing support for electrophotographic photoreceptor
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