JP3184261B2 - Glass substrate for magnetic disk, method of manufacturing magnetic disk, glass substrate for magnetic disk and magnetic disk - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a glass substrate for a magnetic disk used for a magnetic disk capable of high-density recording, a method for manufacturing a magnetic disk using the glass substrate, and a glass for a magnetic disk manufactured by the above manufacturing method. The present invention relates to a substrate and a magnetic disk using the glass substrate.

[0002]

2. Description of the Related Art Even with magnetic disks using glass substrates, there is a strong demand for improvement in recording capacity, and there is an urgent need to increase the recording density and expand the recording area.

In order to enable high-density recording, it is necessary to make the surface of the glass substrate serving as a recording portion (hereinafter referred to as a main surface) as smooth as possible. It is necessary to secure as much area as possible.

[0004] By the way, with respect to a substrate plated with metal on an aluminum alloy or a crystallized glass substrate, attempts have been made to smooth the surface thereof with high precision in order to enable high-density recording (for example, see Japanese Unexamined Patent Publication No. Japanese Patent Publication No. 60-229234 and Japanese Patent Publication No. 62-40140), however, the fact is that the glass substrate has not yet been subjected to surface smoothing from such a viewpoint.

[0005]

Therefore, the present inventor has proposed:
An attempt was made to smooth the disc-shaped glass substrate with high precision to enable high-density recording over the entire area of the substrate. As is well known, the surface finishing process of glass can be roughly divided into (1) rough shearing (rough grinding), (2) sanding (fine grinding), and (3) polishing. Become. Of these, the sanding step (2) is called wrapping, and aims at improving the dimensional accuracy and shape accuracy of the workpiece. The polishing step (3) is called polishing, and aims at improving the surface smoothness (reducing the surface roughness) and reducing the processing distortion. The polishing step (3) is usually further divided into two steps, and comprises a first polishing step using a hard polisher and a second polishing (final polishing) step using a soft polisher. Here, the polishing was performed to a degree close to the highest level considered in the second polishing step.

However, when such a polishing finish is applied, sufficient accuracy can be obtained in terms of smoothness, but a bump which is harmful to the flying of the magnetic head is formed at the outer peripheral edge of the substrate (peripheral edge of the substrate). I understand.

That is, a surface profile measuring device (RANKT T)
As shown in FIG. 9, a stylus is moved from a position A toward the center of the outer periphery of the glass substrate 2 by about 10 mm to an outer periphery B using a TYLIFF of AYL0R H0BS0N. When the straightness accuracy in the diameter direction of No. 1 was measured, the result as shown in FIG. 10 was obtained. According to this, a raised portion (frame) 1c is formed in the vicinity of the outer peripheral end of the glass substrate, and it is confirmed that an edge droop is formed at a portion transitioning from the raised portion 1c to the outer peripheral end surface. It was confirmed that the height of 1c was high, which could hinder flying of the magnetic head. Here, the surface of the raised portion 1C is hereinafter referred to as ski jump, and the surface of the edge is referred to as roll-off. In this case, the maximum height (distance between the flat surface and the vertex of the ski jump) S of the ski jump with respect to the flat surface is referred to as the value of the ski jump. The distance R to the boundary with the surface is referred to as a roll-off value. Then, the value S of the ski jump was 0.45 μm. If the value of the ski jump is such a large value, the magnetic head cannot fly this portion, so that this portion cannot be used as an effective recording section. Therefore, there is a problem that the recording area is narrowed accordingly.

The present inventor has investigated the cause of this. As a result, at the stage where the first polishing step, which is a step before the second polishing (final polishing) step, has been completed, FIG.
It has been found that the ski jump value S has a sufficiently small value as shown in FIG. Therefore, it has been found that the value of the ski jump value S is increased due to the second polishing step.

The present invention has been made under the above-mentioned background, and has a sufficient degree of smoothness to enable high-density recording, and allows a recording area to be extended to the periphery. It is an object of the present invention to provide a magnetic disk glass substrate to be manufactured, a method of manufacturing a magnetic disk using the glass substrate, a magnetic disk glass substrate manufactured by the above manufacturing method, and a magnetic disk using the glass substrate. .

[0010]

SUMMARY OF THE INVENTION In order to solve the above-mentioned problems, the present invention provides (1) grinding, first polishing using a hard polisher, and using a soft polisher on the main surface of a disk-shaped glass substrate. Second
In the method for manufacturing a glass substrate for a magnetic disk in which the main surface is mirror-finished by sequentially performing polishing, the second polishing is performed.
Pressure P (g / cm ² ) and polishing time t
(Min) is 1000 <Pt <150
00 and the polishing pressure P
The construction time t was selected .

Further, as an aspect of the first aspect, (2) In the method for manufacturing a glass substrate for a magnetic disk of the first aspect, the polishing pressure P (g / g) when the second polishing is performed.
cm ² ) is P <300, and the polishing time t (m
in) is 15 <t <75, and P and t are
Is within the range of 3000 <Pt <10000
The polishing pressure P and the polishing time t are set such that
The configuration is characterized by the selection .

Further, the glass substrate for a magnetic disk according to the present invention has the following features. (3) The maximum height of the raised portion formed on the peripheral portion of the main surface is set at 0. (4) a ski jump formed on the periphery of the main surface;
A value of less than 0.35 μm;
did.

Further, the glass substrate for a magnetic disk according to the present invention is characterized in that: (5) the height of the roll-off of the raised portion formed on the peripheral portion of the main surface is 0.5 μm or less. And

The magnetic disk according to the present invention is characterized in that: (6) the magnetic disk glass substrate described in Structures 3 and 4, wherein a film including a magnetic film is formed on a main surface of the glass substrate. did.

[0015]

According to the method of the above-described configuration 1, the glass for a magnetic disk has a sufficient smoothness to enable high-density recording, and allows an effective recording area to be extended to the periphery. It was confirmed that a substrate was obtained. This result is the first one obtained by the present inventor based on the above-described elucidation results and performing various experiments while widely changing polishing conditions without being particular about common sense of the conventional glass polishing process.

According to the configuration 2, it has been confirmed that a glass substrate for a magnetic disk having a smoothness capable of recording at higher density while securing an effective recording area in the configuration 1 can be obtained.

Further, the glass substrate of the configuration 3 can be used as a glass substrate for a magnetic disk capable of high-density recording up to the periphery of the substrate.

According to the configurations 4 and 5, a magnetic disk capable of high-density recording up to the periphery of the substrate can be obtained.

[0019]

【Example】

(One Embodiment of Manufacturing Method of Glass Substrate for Magnetic Disk) FIG. 1 is an explanatory view of first and second polishing steps, FIG. 2 is an explanatory view of sanding step, and FIG. 3 is a view showing measured values and evaluation after polishing. 4 and 5 are diagrams showing an example of measurement of the profile of the main surface after polishing, FIG. 6 is a diagram showing the relationship between ski jump, processing pressure and processing time, and FIG. 7 is roll-off, processing pressure and processing. FIG. 8 is a diagram showing a relationship with time, and FIG. 8 is an explanatory diagram of a measurement of a contact state with a magnetic head. Hereinafter, a method for manufacturing a glass substrate for a magnetic disk according to one embodiment will be described with reference to these drawings.

The steps of the method of this embodiment can be roughly divided into (1) rough grinding (rough grinding), (2) sanding (fine grinding),
(3) First polishing and (4) Second polishing (final polishing). Of these steps, (4) Second polishing (final polishing) is a feature of the present invention. . Hereinafter, these steps will be described in detail.

(1) Roughing Step First, a glass substrate made of aluminosilicate glass press-formed into a disk having a diameter of 96 mmφ and a thickness of 3 mm is ground with a relatively coarse diamond grindstone to obtain a diameter of 96 mmφ and a thickness of 96 mmφ. It is formed to a thickness of 1.5 mm.

Next, both surfaces of the glass substrate are ground one by one with a diamond grindstone having a finer grain size than the above grindstone. The load at this time is about 100 kg. Thereby, the surface roughness of both surfaces is finished to about 10 μm in Rmax.

Next, a hole is made in the center of the glass substrate using a cylindrical grindstone, and the outer peripheral end surface is also ground to a diameter of 95 mmφ, and then the outer peripheral end surface and the inner peripheral surface are subjected to predetermined chamfering. .

(2) Sanding Step Next, sanding is performed. This sanding process is performed twice using a polishing apparatus as shown in a schematic cross section in FIG. 2 and changing the grain size of the abrasive grains to # 400 and # 1000.

In FIG. 2, reference numeral 1 is a glass substrate, reference numeral 2 is a carrier slightly thinner than the glass substrate 1, reference numerals 10 and 11 are lapping machines made of cast iron, reference numeral 6 is an inner gear, and reference numeral 7 is The outer gear, symbol 9 is alumina abrasive grains.

First, the inner gear 6 and the outer gear 7 are rotated with the load L set at about 100 kg using alumina abrasive grains having a grain size of # 400, so that both surfaces of the glass substrate 1 housed in the carrier 2 are faced. Lapping is performed to an accuracy of 0 to 1 .mu.

Next, lapping is carried out to a surface accuracy of 0 to 1 μm and a surface roughness Rmax of about 2 μm by changing the alumina abrasive grains to # 1000.

(3) First Polishing Step Next, a first polishing process is performed. This first polishing is performed as shown in FIG.
Performed using a polishing device as shown in the schematic cross section,
This is to remove scratches and distortion remaining in the above sanding step. Here, the polishing apparatus shown in FIG. 1 is different from the polishing apparatus shown in FIG. 2 in that the polishing machines shown in FIG. 2 except that a polishing liquid 9a in which cerium oxide having a particle diameter of 1 μm is dissolved in water is used.

In the first polishing step, the polisher 5 is a hard polisher (trade name “SERIES” manufactured by Speed Fam Co., Ltd.).
And the following polishing conditions.

(4) Second polishing step Next, using the polishing apparatus (FIG. 1) used in the first polishing step,
The second polishing was performed by changing the polisher 5 from a hard polisher to a soft polisher (trade name “Porelax” manufactured by Speed Fam). In the second polishing step, the processing pressure P
(G / cm ² ) and processing time t (min)
The value of t was set to be in the range of 1000 <Pt <15000. This is a feature of the present invention. By setting the Pt value in this range, the scratches remaining in the first polishing can be reduced to a level enough to withstand high-density recording, and at the same time, the value of the ski jump of the glass substrate 1 (s)
And the roll-off value (r) could be reduced to such an extent that the magnetic head could fly in the vicinity without any trouble. The other polishing conditions at this time are the same as those in the first polishing step.

FIG. 3 shows a processing pressure P in the second polishing processing.
(G / cm ² ) and the processing time t (min) were variously changed, and the ski jump value (s) and the roll-off value (r) were measured for each glass substrate. , Check the possibility of flying with the magnetic head,
Furthermore, the number of scratches remaining on the surface of each glass substrate was inspected, and an evaluation based on these results was shown. FIGS. 4 and 5 show examples of measurement of the main surface profile obtained in the actual measurement of the value (s) of the ski jump and the value (r) of the roll-off, and FIGS. 6 and 7 show the results. Based on the actual measurement result, the relationship between the machining time and the ski jump and the relationship between the machining time and the roll-off are shown in a graph with the machining pressure as a parameter. In this case, the actual value of the ski jump value (S) and the roll-off value (r) are measured using the above-described surface profile measuring device (Talysuff of RANK TAYL0R H0BS0N) using the method shown in FIG. The same method as the measurement method when the results shown in FIGS. 10 and 11 were obtained was used.

Regarding the possibility of flying by the magnetic head, as shown in FIG. 8, with the glass substrate 1 being rotated, the reading surface of the magnetic head 20 is separated from the main surface of the glass substrate 1 by 0.1 μm. The magnetic head 20 was repeatedly moved 10 times from the inner peripheral side to the outer peripheral side of the substrate 1 to check for the presence or absence of contact. The presence or absence of the contact was detected by a piezo element attached to the reading surface of the magnetic head . The magnetic head 20 was stopped at a position where the outer end of the magnetic head 20 was located 1 mm inward from the outer peripheral end surface of the glass substrate 1.

Further, inspection for scratches (including both scratches with cracks and scratches without cracks) is performed by irradiating the glass substrate 1 with transmitted light and measuring the number of scratches remaining in the entire area of the glass substrate 1 with a microscope. Was done by counting.

As a criterion for evaluating these results, it was first determined that the flying with the magnetic head could not be performed four times or more. Also, if the number of scratches is 1
One or more observations were also unsuitable. In FIG. 3, the evaluation results are indicated by the following symbols.

Evaluation of “suitable” ◎: all 10 times flying possible No scratch ○: all 10 times flying possible 1 to 5 scratches △ ₂ … all 10 times flying possible 5 to 10 scratches △ ₁ … … Flying not possible 1 to 3 times out of 10 times Evaluation of “unsuitable” without scratch × ₁ …… Flying not more than 4 times out of 10 times No scratching × ₂ …… Flying all 10 times Possible 11 or more scratches Clear from FIG. Thus, if the value of Pt is 1000 <Pt
If it is <15,000, there will be some anxiety in flying, and some scratches will remain on the main surface of the glass substrate, but this is within a practically acceptable range, and the value of Pt is 3000 <Pt <10000 (◎ ), The ski jump value is 0.3 μm or less and the roll-off value is 0.5 μm. Since the ski jump value is sufficiently low and the roll-off value is small, the ski jump value is Since the position of the apex is also located near the outer peripheral end, the risk of hindering flying is further completely eliminated. Further, in this case, since the scratches are almost completely removed, high-density recording can be performed with high quality.

(One Embodiment of Manufacturing Method of Magnetic Disk) Next, one embodiment of a method of manufacturing a magnetic disk using the glass substrate obtained by the method of manufacturing a glass substrate for a magnetic disk according to the above-described embodiment. An example will be described. First,
The surface of the glass substrate obtained by the method of manufacturing a glass substrate for a magnetic disk according to one embodiment is chemically strengthened by replacing Na ions on the surface portion with K ions by ion exchange.

Next, Cr is applied to one main surface of the glass substrate.
Film (thickness: 1800 angstroms), Cr-Co-Ni alloy film (1000 angstroms), SiO ₂
Films (1000 Å) are sequentially formed by sputtering to obtain a magnetic disk.

In the magnetic disk thus obtained,
The Cr—Co—Ni alloy film is a magnetic film, the Cr film as an underlayer is an underlayer for improving the magnetic characteristics of the magnetic film, and the SiO ₂ film is a protective film.

When a magnetic head flying test was performed on this magnetic disk in the same manner as in the above-described embodiment, no contact between the magnetic head and the protective film was observed.

Further, a magnetic disk according to this embodiment,
As shown in FIG. 10, the distance over which the magnetic head can fly differs from the magnetic disk using the magnetic disk glass substrate manufactured by the conventional method by about 1 mm. The difference in storage capacity due to this corresponds to about 4%. Further, since the scratch on the main surface of the glass substrate serving as the base of the magnetic film is small, it is possible to prevent a possibility that an error occurs when recording or reading information.

[0041] In each embodiment described above has flown an example using aluminosilicate glass as the glass material constituting the glass substrate, which is Sodaraimuga
Las, may use other glass materials such as quartz glass.

Further, chemical strengthening at the time of manufacturing a magnetic disk is not necessarily required.

The hardness of the hard polisher used in the first polishing step is 80 to 95 (JIS K6301 A type), and the hardness of the soft polisher used in the second polishing is 60 to 95.
About 80 (JIS K6301 A type) is a standard,
Soft polishers are made of suede or velor, while hard polishers are hard velor,
Urethane foam, pitch impregnated suede, etc. can be used.

In addition, zircon oxide, colloidal silica and the like can be used as abrasives that can be used in the first and second polishing steps.

The polishing method may be one-side polishing instead of double-side polishing, and a technique such as pitch polishing or float polishing may be used.

[0046]

As described in detail above, the glass substrate for a magnetic disk and the method for manufacturing a magnetic disk according to the present invention, and the glass substrate for a magnetic disk and the magnetic disk are subjected to the second polishing as final polishing in the polishing process. Pressure P (g / cm ² ) and polishing time t
(Min) is 1000 <Pt <150
The polishing pressure P and the polishing time t are selected so as to fall within the range of 00, thereby having sufficient smoothness to enable high-density recording.
In addition, it is possible to obtain a magnetic disk glass substrate and a magnetic disk that enable the recording area to be expanded to the periphery.

[Brief description of the drawings]

FIG. 1 is an explanatory diagram of first and second polishing steps.

FIG. 2 is an explanatory view of a sanding process.

FIG. 3 is a diagram showing measured values and evaluation after polishing.

FIG. 4 is a diagram showing a measurement example of a profile of a main surface after polishing.

FIG. 5 is a diagram showing a measurement example of a profile of a main surface after polishing.

FIG. 6 is a diagram showing a relationship between a ski jump, a processing pressure, and a processing time.

FIG. 7 is a diagram showing the relationship between roll-off, processing pressure, and processing time.

FIG. 8 is an explanatory diagram of measurement of a contact state with a magnetic head.

FIG. 9 is an explanatory view of straightness measurement in a diameter direction of a glass substrate.

FIG. 10 is a view showing a measurement result of a peripheral portion of a glass substrate after a conventional second polishing step.

FIG. 11 is a view showing a measurement result of a peripheral portion of a glass substrate after a conventional first polishing step.

[Explanation of symbols]

DESCRIPTION OF SYMBOLS 1 ... Glass substrate, 2 ... Carrier, 3 ... Lower surface plate, 4 ... Upper surface plate, 5 ... Polisher, 6 ... Inner gear, 7 ... Outer gear,
9: Alumina abrasive grains, 9a: Polishing liquid, 10, 11: Lapping machine.

──────────────────────────────────────────────────続 き Continued on the front page (58) Field surveyed (Int.Cl. ⁷ , DB name) G11B 5/84 G11B 5/82

Claims (6)

(57) [Claims] 1. A glass substrate for a magnetic disk, in which a main surface of a disk-shaped glass substrate is sequentially subjected to grinding, first polishing using a hard polisher, and second polishing using a soft polisher to make the main surface a mirror surface. In the manufacturing method, the polishing pressure P (g / cm ² ) when the second polishing is performed
The value of the product Pt of the polishing time t (min) is 100
A method for manufacturing a glass substrate for a magnetic disk, wherein the polishing pressure P and the polishing time t are selected so that 0 <Pt <15000. 2. The method for manufacturing a glass substrate for a magnetic disk according to claim 1, wherein a polishing pressure P (g / cm ² ) when the second polishing is performed.
Is P <300, the value of the polishing time t (min) is 15 <t <75, and the product Pt of P and t is Pt.
Wherein the polishing pressure P and the polishing time t are selected so that the value of is in the range of 3000 <Pt <10000. 3. The maximum height of the ridge formed on the periphery of the main surface is 0.35 with respect to another flat portion of the main surface.
A glass substrate for a magnetic disk, which is less than μm. 4. A skier formed on a peripheral portion of a main surface.
The value of the pump is less than 0.35 μm
Glass substrate for magnetic disk. 5. A glass substrate for a magnetic disk, wherein a height of a roll-off of a raised portion formed on a peripheral portion of a main surface is 0.5 μm or less. 6. A magnetic disk, wherein a film including a magnetic film is formed on a main surface of the glass substrate for a magnetic disk according to claim 3 .