JP3151566B2 - Barium titanate-based semiconductor material - Google Patents

Barium titanate-based semiconductor material

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Publication number
JP3151566B2
JP3151566B2 JP30858791A JP30858791A JP3151566B2 JP 3151566 B2 JP3151566 B2 JP 3151566B2 JP 30858791 A JP30858791 A JP 30858791A JP 30858791 A JP30858791 A JP 30858791A JP 3151566 B2 JP3151566 B2 JP 3151566B2
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JP
Japan
Prior art keywords
mol
barium titanate
based semiconductor
atoms
resistance
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP30858791A
Other languages
Japanese (ja)
Other versions
JPH0570223A (en
Inventor
大 小田
慎輔 治田
基治 花木
修二 山田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ube Corp
Original Assignee
Ube Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ube Industries Ltd filed Critical Ube Industries Ltd
Priority to JP30858791A priority Critical patent/JP3151566B2/en
Publication of JPH0570223A publication Critical patent/JPH0570223A/en
Application granted granted Critical
Publication of JP3151566B2 publication Critical patent/JP3151566B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、電気抵抗の温度係数が
正の特性を示す半導体磁器(以下PTC素子と略記す
る)において、低抵抗で且つ高耐電圧を有するチタン酸
バリウム系半導体材料に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a barium titanate-based semiconductor material having a low resistance and a high withstand voltage in a semiconductor ceramic (hereinafter abbreviated as a PTC element) having a positive temperature coefficient of electric resistance. Things.

【0002】[0002]

【従来技術およびその問題点】チタン酸バリウム系半導
体材料は、チタン酸バリウムを主成分とし、Bi,S
b,Ta、または稀土類元素などのうち一種以上を微量
含有させたもので、常温における比抵抗が低く、抵抗急
変点(キュリー点)を越えると著しい正の抵抗温度変化
を示すという特徴を有している。この特性を利用するこ
とにより、PTC素子は温度検知素子、電流制限素子な
どとして使用されている。従来よりBa原子をCa,S
r,Pb原子でそれぞれ置換することにより、比較的大
きな正の抵抗温度特性を有したまま、キュリー点を高温
側、低温側に移動させることが行われている。さらにM
nを含有させることにより、キュリー点を越えたのちの
比抵抗温度変化率を大きくすることが知られており、さ
らにまたSiOを含有させることにより、常温におけ
る比抵抗を低くするとともに安定したものとすることが
知られている。
2. Description of the Related Art Barium titanate-based semiconductor materials are mainly composed of barium titanate, and Bi, S
It contains a trace amount of one or more of b, Ta, and rare earth elements, and has the characteristic of low specific resistance at room temperature and showing a remarkable positive resistance temperature change when the resistance exceeds a sudden change point (Curie point). are doing. By utilizing this characteristic, the PTC element is used as a temperature detecting element, a current limiting element, and the like. Conventionally, Ba atoms are replaced with Ca, S
By substituting with r and Pb atoms, respectively, the Curie point is moved to a high temperature side and a low temperature side while having a relatively large positive resistance temperature characteristic. And M
It is known that by including n, the specific resistance temperature change rate after exceeding the Curie point is increased, and furthermore, by including SiO 2 , the specific resistance at room temperature is lowered and stable. It is known that

【0003】例えば特公昭63−28324号公報には
チタン酸バリウムを主成分とし、バリウムの一部をC
a,SrおよびPbで置換し、半導体化剤としてY,L
a,Ceなどの稀土類元素が含有され、マンガンがMn
に換算して0.03〜0.10モル%、シリカがSiO
に換算して0.5〜5モル%、それぞれ添加含有され
ているチタン酸バリウム系半導体磁器組成物が開示され
ている。しかしながら、前記特公昭63−28324号
公報記載のPTC素子の比抵抗は数十Ωと高く、このた
め温度検知素子、電流制限素子などの用途に使用する場
合には、制限電力の増加や検知感度の増大などの点にお
いては未だ充分とは言いがたく、このため、より一層の
低抵抗化材料が望まれ、しかも高い耐電圧を有するバラ
ンスの取れたPTC材料の開発が望まれている。PTC
素子の特性の向上のために従来より多くの提案がなされ
ているが、比抵抗を小さくするに従って耐電圧が低下
し、一方、耐電圧を向上させようとすると、比抵抗が大
きくなるという不都合があり、両者のバランスの取れた
材料の開発は未だなされていない。
For example, Japanese Patent Publication No. Sho 63-28324 discloses that barium titanate is used as a main component and a part of barium is C
a, Sr and Pb, and Y, L
a, Ce and other rare earth elements are contained, and manganese is Mn.
0.03 to 0.10 mol% in terms of
There is disclosed a barium titanate-based semiconductor porcelain composition which is added and contained in an amount of 0.5 to 5 mol% in terms of 2 , respectively. However, the specific resistance of the PTC element described in JP-B-63-28324 is as high as several tens of ohms. However, it is still not enough in terms of an increase in the resistance of the PTC material. For this reason, there is a demand for a material having a lower resistance, and a development of a well-balanced PTC material having a high withstand voltage. PTC
Although many proposals have been made to improve the characteristics of the element compared to the conventional one, the withstand voltage decreases as the specific resistance decreases, while the inconvenience of increasing the specific resistance increases the withstand voltage. Yes, the development of a balanced material has not yet been achieved.

【0004】[0004]

【発明の目的】本発明の目的は、前記の問題点を解決
し、低抵抗で高い耐電圧を有するチタン酸バリウム系半
導体材料を提供するものである。
SUMMARY OF THE INVENTION An object of the present invention is to solve the above-mentioned problems and to provide a barium titanate-based semiconductor material having low resistance and high withstand voltage.

【0005】[0005]

【問題点を解決するための手段】本発明は、チタン酸バ
リウム系半導体磁器において、Ba、Ca、Sr、N
b、SiおよびMnの炭酸塩または酸化物を湿式混合
後、仮焼し、焼成して得られる、Ba原子をCa原子で
15〜20原子%およびSr原子で5〜12原子%置換
した主成分組成物とするとともに、主成分組成物に対し
て、ニオブをNb25に換算して0.10〜0.18モ
ル%、シリカをSiO2に換算して2.5〜5モル%、
およびマンガンをMnに換算して0.07〜0.10モ
ル%含有することを特徴とする正の抵抗温度特性を有す
るチタン酸バリウム系半導体材料に関する。
SUMMARY OF THE INVENTION The present invention relates to a barium titanate-based semiconductor porcelain comprising Ba, Ca, Sr, N
b, after wet mixing Si and Mn carbonate or oxide, the main component of calcined, obtained by baking, that Ba atoms were substituted 5-12 atomic% with 15-20 atomic% and Sr atoms Ca atoms with the composition, with respect to the main component composition, from 0.10 to 0.18 mol% in terms of niobium Nb 2 O 5, 2.5 to 5 mol% in terms of silica on SiO 2,
And a barium titanate-based semiconductor material having a positive resistance temperature characteristic, which contains manganese in an amount of 0.07 to 0.10 mol% in terms of Mn.

【0006】本発明に使用されるチタン酸バリウム系半
導体磁器は、Ba原子をCa原子で15〜20原子%
よびSr原子で5〜12原子%置換した主成分組成物と
するとともに、主成分組成物に対して、ニオブをNb 2
5 に換算して0.10〜0.18モル%、シリカを
iO2 に換算して2.5〜5モル%、およびマンガンを
Mnに換算して0.07〜0.10モル%複合含有させ
たものである。Ca原子は、15原子%未満であると高
耐電圧化に関する効果がなくなり、一方20モル%を超
えて置換すると粒子が均一微小化して比抵抗が大きくな
る。また、Nb25はその添加量が0.10〜0.18
モル%の範囲を外れると比抵抗が大きくなる。SiO2
はその添加量が2.5〜5モル%の範囲を外れると比抵
抗が大きくなる。さらに、Mnはその添加量が0.07
モル%未満では耐電圧が低下し、一方、0.1モル%を
超えると比抵抗が急激に高まり、本発明の目的に合致せ
ず実用に適さない。
In the barium titanate-based semiconductor porcelain used in the present invention, Ba atoms are 15 to 20 atomic% by Ca atoms .
And a main component composition substituted with 5 to 12 atomic% of Sr atoms.
As well as, with respect to the main component composition, the niobium Nb 2
0.10 to 0.18 mol% in terms of O 5 , silica is S
It contains 2.5 to 5 mol% in terms of iO 2 and 0.07 to 0.10 mol% of manganese in terms of Mn. If the Ca atom content is less than 15 at%, the effect of increasing the withstand voltage is lost, while if it exceeds 20 mol%, the particles are uniformly miniaturized and the specific resistance increases. Nb 2 O 5 is added in an amount of 0.10 to 0.18.
Outside the range of mol%, the specific resistance increases. SiO 2
When the addition amount is out of the range of 2.5 to 5 mol%, the specific resistance increases. Further, Mn is added in an amount of 0.07.
If the amount is less than 0.1 mol%, the withstand voltage decreases, while if it exceeds 0.1 mol%, the specific resistance sharply increases, which is not suitable for practical use because it does not meet the purpose of the present invention.

【0007】なお、本発明のチタン酸バリウム系半導体
材料において、主成分のBaの一部をPbで置換した
り、Tiの一部をSnやZrで置換することができる。
さらに過剰の酸化チタンを添加しても発明の目的を達成
することができる。
In the barium titanate-based semiconductor material of the present invention, part of Ba as the main component can be replaced with Pb, and part of Ti can be replaced with Sn or Zr.
The object of the invention can be achieved even if an excessive amount of titanium oxide is added.

【0008】[0008]

【実施例】以下に実施例および比較例を示し、本発明を
具体的に説明する。出発原料として、BaCO、Ca
CO、SrCO、PbO、TiO、Nb
MnCO、SiOを所定の比率になるように調合
し、ジルコニアボールを用いて18時間湿式ボールミル
混合を行い、乾燥後、1150℃で2時間仮焼した。こ
の仮焼粉末を粉砕し、さらにポリビニルアルコールを2
wt%加えて1000kg/cmの圧力で直径20m
m、厚さ1.5mmの円板に成形した。
The present invention will be specifically described below with reference to examples and comparative examples. As starting materials, BaCO 3 , Ca
CO 3 , SrCO 3 , PbO, TiO 2 , Nb 2 O 5 ,
MnCO 3 and SiO 2 were prepared so as to have a predetermined ratio, mixed by a wet ball mill using zirconia balls for 18 hours, dried, and then calcined at 1150 ° C. for 2 hours. This calcined powder is pulverized, and polyvinyl alcohol is further
20% in diameter at a pressure of 1000 kg / cm 2 with the addition of wt%
m and a disk having a thickness of 1.5 mm.

【0009】次にこれを1340℃、約1時間の条件で
焼成した。このようにして得られたPTCセラミックス
に、オーミックコンタクトが良好なAg電極を焼き付け
てPTC素子を得た。このPTC素子について、常温
(25℃)における比抵抗(ρ25)、耐電圧(VB)、
キュリー点(Tc)を測定した。原料組成を表1、また
測定結果を表2に示した。上述の各種特性のうち、耐電
圧特性は、PTC素子に電圧を印加し徐々に電圧を上昇
させたときに、電流値が急増して素子が破壊する直前の
電圧を素子厚み1mm当たりに換算した値を示した。また
表1および表2中の試料番号に*印を付したものは本発
明の範囲外であり、それ以外は全て本発明の範囲内のも
のである。なお、上記実施例では出発原料として炭酸
塩、もしくは酸化物を用いた。表1および表2から明ら
かなように、各実施例のPTC素子は比較例のものに比
べ、耐電圧と比抵抗の比(VB/ρ25)が大幅に増大す
る。これに対して、比較例は、Ca置換量が15原子%
未満では高耐電圧化に関係する効果が低下し、一方、C
a置換量が20原子%を超える場合には比抵抗が急激に
増加する。またBa原子をCa原子で15〜20原子%
置換した主成分組成物に対して、Nb25の添加量が
0.10〜0.18モル%、SiO2添加量が2.5〜
5モル%、Mn添加量が0.07〜0.10モル%の範
囲から外れると、低抵抗且つ高耐電圧のPTC素子が得
られない。以上述べたように、本発明はPTC素子にお
いて比抵抗を6Ωcm以下に下げ、且つ耐電圧を格段に改
良することができ、その産業上の効果は格別のものであ
る。
Next, it was fired at 1340 ° C. for about 1 hour. An Ag electrode having good ohmic contact was baked on the PTC ceramic thus obtained to obtain a PTC element. About this PTC element, specific resistance (ρ 25 ) at normal temperature (25 ° C.), withstand voltage (V B ),
The Curie point (Tc) was measured. Table 1 shows the raw material composition, and Table 2 shows the measurement results. Among the various characteristics described above, the withstand voltage characteristic is obtained by converting a voltage immediately before the element is destroyed due to a sudden increase in current value when a voltage is applied to the PTC element and gradually increased in voltage, per element thickness of 1 mm. The value was shown. Samples marked with an asterisk (*) in Tables 1 and 2 are outside the scope of the present invention, and all others are within the scope of the present invention. In the above examples, carbonates or oxides were used as starting materials. As is clear from Tables 1 and 2, the PTC element of each example has a greatly increased ratio of withstand voltage and specific resistance (V B / ρ 25 ) as compared with that of the comparative example. On the other hand, in the comparative example, the Ca substitution amount was 15 atomic%.
If it is less than 30, the effect related to high withstand voltage decreases, while C
When the substitution amount exceeds 20 atomic%, the specific resistance sharply increases. Ba atoms are 15 to 20 atomic% by Ca atoms.
Against substituted main component composition, the addition amount is 0.10 to 0.18 mol% of Nb 2 O 5, SiO 2 amount is 2.5
If the amount of 5 mol% and the amount of Mn are out of the range of 0.07 to 0.10 mol%, a PTC element having low resistance and high withstand voltage cannot be obtained. As described above, according to the present invention, the specific resistance of the PTC element can be reduced to 6 Ωcm or less, and the withstand voltage can be remarkably improved. The industrial effect is remarkable.

【0010】[0010]

【表1】 [Table 1]

【0011】[0011]

【表2】 [Table 2]

【0012】[0012]

【発明の効果】本発明によると、Ca量およびSr量、
且つNb、SiおよびMn量を適正範囲とすることによ
り、低抵抗で且つ高耐電圧のPTC素子を得ることがで
きる。この結果、同一定格電圧に対して、より低抵抗な
素子を製造することができるため、さらに大きな負荷に
対する電流制限素子を実用化できる。また、同一抵抗素
子としては従来より薄型で小型のものを実用化でき、従
って安価な素子を提供することができるなど、その利用
価値は極めて高いものである。
According to the present invention, the amounts of Ca and Sr,
Further, by setting the amounts of Nb, Si and Mn in appropriate ranges, a PTC element having low resistance and high withstand voltage can be obtained. As a result, an element having a lower resistance can be manufactured for the same rated voltage, so that a current limiting element for a larger load can be put to practical use. Further, as the same resistance element, a thinner and smaller one can be practically used as compared with the conventional resistance element, so that an inexpensive element can be provided, and its use value is extremely high.

フロントページの続き 合議体 審判長 野田 直人 審判官 唐戸 光雄 審判官 吉田 敏明 (56)参考文献 特開 平3−54165(JP,A) 特開 平3−88770(JP,A) 特開 昭52−20291(JP,A)Continuation of the front page Judge, Naoto Noda Judge, Mitsuo Karato Judge, Toshiaki Yoshida (56) References JP-A-3-54165 (JP, A) JP-A-3-88770 (JP, A) JP-A 52- 20291 (JP, A)

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 チタン酸バリウム系半導体磁器におい
て、Ba、Ca、Sr、Nb、SiおよびMnの炭酸塩
または酸化物を湿式混合後、仮焼し、焼成して得られ
る、Ba原子をCa原子で15〜20原子%およびSr
原子で5〜12原子%置換した主成分組成物とするとと
もに、主成分組成物に対して、ニオブをNb25に換算
して0.10〜0.18モル%、シリカをSiO2に換
算して2.5〜5モル%、およびマンガンをMnに換算
して0.07〜0.10モル%含有することを特徴とす
る正の抵抗温度特性を有するチタン酸バリウム系半導体
材料。
In a barium titanate-based semiconductor porcelain, Ba, Ca, Sr, Nb, Si and Mn carbonates or oxides are wet-mixed , then calcined and calcined, and Ba atoms are obtained by Ca atoms. 15-20 atomic% and Sr
The main component composition was replaced with 5 to 12 atomic% of atoms. Niobium was converted to Nb 2 O 5 in an amount of 0.10 to 0.18 mol%, and silica was converted to SiO 2 with respect to the main component composition. A barium titanate-based semiconductor material having a positive resistance temperature characteristic, comprising 2.5 to 5 mol% in terms of Mn and 0.07 to 0.10 mol% in terms of Mn of manganese.
JP30858791A 1991-09-13 1991-09-13 Barium titanate-based semiconductor material Expired - Lifetime JP3151566B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP30858791A JP3151566B2 (en) 1991-09-13 1991-09-13 Barium titanate-based semiconductor material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP30858791A JP3151566B2 (en) 1991-09-13 1991-09-13 Barium titanate-based semiconductor material

Publications (2)

Publication Number Publication Date
JPH0570223A JPH0570223A (en) 1993-03-23
JP3151566B2 true JP3151566B2 (en) 2001-04-03

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Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Link
JP (1) JP3151566B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3319314B2 (en) * 1996-11-20 2002-08-26 株式会社村田製作所 Barium titanate-based semiconductor porcelain composition

Also Published As

Publication number Publication date
JPH0570223A (en) 1993-03-23

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