JP3151533B2 - Composite plating solution, composite plating method and composite plating film - Google Patents

Composite plating solution, composite plating method and composite plating film

Info

Publication number
JP3151533B2
JP3151533B2 JP19469591A JP19469591A JP3151533B2 JP 3151533 B2 JP3151533 B2 JP 3151533B2 JP 19469591 A JP19469591 A JP 19469591A JP 19469591 A JP19469591 A JP 19469591A JP 3151533 B2 JP3151533 B2 JP 3151533B2
Authority
JP
Japan
Prior art keywords
plating
composite plating
pitch
solution
plating solution
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP19469591A
Other languages
Japanese (ja)
Other versions
JPH04329897A (en
Inventor
宏之 藤本
俊之 前田
信淳 渡辺
幹雄 笹部
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Osaka Gas Co Ltd
Original Assignee
Osaka Gas Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Osaka Gas Co Ltd filed Critical Osaka Gas Co Ltd
Priority to JP19469591A priority Critical patent/JP3151533B2/en
Publication of JPH04329897A publication Critical patent/JPH04329897A/en
Application granted granted Critical
Publication of JP3151533B2 publication Critical patent/JP3151533B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Landscapes

  • Electroplating And Plating Baths Therefor (AREA)
  • Electroplating Methods And Accessories (AREA)

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、複合メッキ液、複合メ
ッキ方法及び複合メッキ皮膜に関する。
The present invention relates to a composite plating solution, a composite plating method, and a composite plating film.

【0002】[0002]

【従来の技術及びその課題】フッ化黒鉛やポリテトラフ
ルオロエチレン(PTFE)は、自己潤滑性、低摩擦
性、撥水性、撥油性、非粘着性等の特徴を有するもので
あり、これを金属塩の水溶液中に分散させ、メッキ法に
より素地上に金属と共にフッ化黒鉛等を電折させて、非
金属であるフッ化黒鉛等の固有の性質とマトリックスと
なる金属の性質とを合せ持った複合皮膜を形成する方法
が知られている。
2. Description of the Related Art Fluorinated graphite and polytetrafluoroethylene (PTFE) have characteristics such as self-lubrication, low friction, water repellency, oil repellency, and non-adhesiveness. Dispersed in an aqueous salt solution, electroplated fluorinated graphite, etc. with metal on the substrate by plating to combine the unique properties of non-metallic fluorinated graphite etc. with the properties of the matrix metal Methods for forming composite coatings are known.

【0003】かかるメッキ方法において、フッ化黒鉛を
金属塩の水溶液中に分散させ、かつ電析させるために
は、フッ化黒鉛粒子を正に帯電させ、かつ完全に濡れた
状態を作り出す必要がある。しかしながら、フッ化黒鉛
は、非常に撥水性が強く、安定した分散状態を得るため
には、界面活性剤を多量に添加する必要がある。また、
このようにして得たフッ化黒鉛共析メッキ皮膜中のフッ
化黒鉛は、界面活性剤によって、その表面を覆われてい
るために、メッキ直後は撥水性が著しく悪く、メッキ後
熱処理を行って、メッキ表面を乾燥させる必要がある。
In such a plating method, in order to disperse and deposit graphite fluoride in an aqueous solution of a metal salt, it is necessary to positively charge graphite fluoride particles and to create a completely wet state. . However, fluorinated graphite has extremely strong water repellency, and it is necessary to add a large amount of a surfactant in order to obtain a stable dispersion state. Also,
The fluorinated graphite in the fluorinated graphite eutectoid plating film thus obtained has a very poor water repellency immediately after plating because its surface is covered by a surfactant. It is necessary to dry the plating surface.

【0004】[0004]

【課題を解決するための手段】本発明者は、上記した問
題点に鑑みて、鋭意研究を重ねた結果、被分散物質とし
てフッ化黒鉛に代えてフッ化ピッチを用いる場合には、
非常に少ない界面活性剤の使用量で安定にメッキ液中に
分散させることができ、得られた複合メッキ皮膜は、フ
ッ化黒鉛やPTFEを共析させたメッキ皮膜と比べて優
れた撥水性を示し、しかもメッキ直後においても加熱乾
燥を行うことなく高い撥水性を示すものとなることを見
出した。
Means for Solving the Problems In view of the above problems, the present inventor has conducted intensive studies. As a result, when pitch fluoride is used instead of graphite fluoride as a substance to be dispersed,
With a very small amount of surfactant used, it can be stably dispersed in the plating solution, and the resulting composite plating film has excellent water repellency compared to a plating film made of eutectoid graphite or PTFE. Further, it has been found that even after plating, high water repellency is exhibited without heating and drying.

【0005】即ち、本発明は、以下に示す複合メッキ
液、複合メッキ方法及び複合メッキ皮膜を提供するもの
である。 i)メッキ液中でカチオン性を示す界面活性剤を用いて
電気メッキ液中にフッ化ピッチを分散させてなることを
特徴とする複合メッキ液。 ii)メッキ液中でカチオン性を示す界面活性剤を用い
て電気メッキ液中にフッ化ピッチを分散させたメッキ液
を使用し、電気メッキ法により基材上にフッ化ピッチが
共析した複合メッキ皮膜を形成させることを特徴とする
複合メッキ方法。 iii)金属メッキ皮膜中にフッ化ピッチを共析させて
なることを特徴とする複合メッキ皮膜。
That is, the present invention provides the following composite plating solution, composite plating method and composite plating film. i) A composite plating solution characterized by dispersing pitch fluoride in an electroplating solution using a cationic surfactant in the plating solution. ii) A composite in which pitch fluoride is eutectoidally deposited on a base material by an electroplating method using a plating solution in which pitch fluoride is dispersed in an electroplating solution using a surfactant showing cationicity in the plating solution. A composite plating method characterized by forming a plating film. iii) A composite plating film obtained by eutecting pitch fluoride into a metal plating film.

【0006】本発明で用いるフッ化ピッチは、組成式C
Fx(0.5<x<1.8)で表される組成を有する化
合物であって、各炭素原子にフッ素が1〜3個共有結合
によって強固に結合したものである。色は、褐色〜黄白
色〜白色であり、耐水性、耐薬品性等に優れた空気中で
非常に安定な化合物であり、層状構造を有する。工業的
には、ピッチを常温付近でフッ素ガスと直接反応させる
ことにより得られる。
The pitch fluoride used in the present invention has a composition formula C
A compound having a composition represented by Fx (0.5 <x <1.8), in which one to three fluorine atoms are firmly bonded to each carbon atom by a covalent bond. The color is brown to yellowish white to white, is a compound which is very stable in air and has excellent water resistance and chemical resistance, and has a layered structure. Industrially, it is obtained by directly reacting the pitch with fluorine gas at around normal temperature.

【0007】本発明では、添加するフッ化ピッチの粒径
は、特に限定的ではないが、メッキ皮膜の膜厚よりも大
きいとメッキ面の摩擦によりフッ化ピッチが脱落するた
め微粒子状のフッ化ピッチを使用することが望ましく、
通常は10μm程度以下のものが好ましく、1μm以下
のものがより好ましい。フッ化ピッチのメッキ液中への
添加量は、特に限定的ではなく、メッキ液の撹拌状態、
所望の共析量等によって決めればよく、通常500g/
1程度以下、好ましくは1〜50g/1程度とすれば良
い。
In the present invention, the particle size of the pitch fluoride to be added is not particularly limited. It is desirable to use pitch,
Usually, it is preferably about 10 μm or less, more preferably 1 μm or less. The amount of the fluorinated pitch added to the plating solution is not particularly limited.
It may be determined according to the desired amount of eutectoid, etc., usually 500 g /
It may be about 1 or less, preferably about 1 to 50 g / 1.

【0008】本発明において、フッ化ピッチを添加すべ
きメッキ液の種類は、特に限定されず、電気メッキ法に
よって陰極に金属を析出させ得る通常の電気メッキ液で
あれば良い。例えば、銅、ニッケル、クロム、亜鉛、カ
ドミウム、錫、鉄、鉛及びこれらの合金メッキ液を挙げ
ることが出来る。これらのメッキ液は、各種の組成のも
のが公知となっており、本発明ではこれらの公知のメッ
キ液をいずれも使用できる。
In the present invention, the type of plating solution to which pitch fluoride is to be added is not particularly limited, and may be any ordinary electroplating solution capable of depositing a metal on a cathode by electroplating. For example, copper, nickel, chromium, zinc, cadmium, tin, iron, lead and their alloy plating solutions can be mentioned. These plating solutions are known in various compositions, and any of these known plating solutions can be used in the present invention.

【0009】本発明のメッキ液では、フッ化ピッチをメ
ッキ液中に均一に分散させるために、界面活性剤を用い
る。界面活性剤としては、メッキ液中のpHでカチオン
性を示す界面活性剤分子を用いることが必要であり、例
えば、水溶性のカチオン系、非イオン系ないしメッキ液
のpHにおいてカチオン性を示すような両性界面活性剤
を用いることができる。この場合、カチオン系界面活性
剤としては第4級アンモニウム塩、第2、3アミン類、
イミダゾリン類などが挙げられ、非イオン系界面活性剤
としてはポリオキシエチレン系、ポリエチレンイミン
系、エステル系のもの等が挙げられ、両性界面活性剤と
してはカルボン酸系、スルホン系のもの等が挙げられ
る。特に、分子中にC−F結合を有するフッ素系界面活
性剤を用いることが好ましい。分子中にC−F結合をも
つ非イオン系の界面活性剤については、酸性メッキ液の
場合においてのみカチオン性を示す。
In the plating solution of the present invention, a surfactant is used to uniformly disperse the pitch fluoride in the plating solution. As the surfactant, it is necessary to use a surfactant molecule exhibiting cationicity at the pH of the plating solution. For example, a water-soluble cationic type, a nonionic type, or a surfactant exhibiting cationicity at the pH of the plating solution is required. Any amphoteric surfactant can be used. In this case, as the cationic surfactant, a quaternary ammonium salt, a secondary or tertiary amine,
Imidazolines and the like; non-ionic surfactants include polyoxyethylene-based, polyethyleneimine-based and ester-based surfactants; and amphoteric surfactants include carboxylic acid-based and sulfone-based surfactants. Can be In particular, it is preferable to use a fluorinated surfactant having a CF bond in the molecule. A nonionic surfactant having a CF bond in a molecule shows cationicity only in the case of an acidic plating solution.

【0010】メッキ液中への界面活性剤の添加量は、フ
ッ化ピッチ1gに対して1mg〜100mg程度とする
ことが好ましく、より好ましくはフッ化ピッチ1gに対
して1mg〜30mg程度とする。本発明では、被分散
物質としてフッ化ピッチを用いることにより、この様に
界面活性剤の使用量が非常に少ない場合にもメッキ液中
に均一に分散させることが可能となる。その結果フッ化
ピッチへの界面活性剤の付着量が少なくなり、メッキ直
後においても高い撥水性を示すことができる。
The amount of the surfactant added to the plating solution is preferably about 1 mg to 100 mg per 1 g of pitch fluoride, more preferably about 1 mg to 30 mg per 1 g of pitch fluoride. In the present invention, by using pitch fluoride as the substance to be dispersed, it is possible to uniformly disperse the surfactant in the plating solution even when the amount of the surfactant used is extremely small. As a result, the amount of the surfactant attached to the fluorinated pitch decreases, and high water repellency can be exhibited even immediately after plating.

【0011】本発明のメッキ液では、フッ化ピッチを均
一に分散させるためにメッキ液を撹拌しつつメッキを行
うことが好ましい。撹拌方法は特に限定されず、通常の
機械的撹拌手段、例えばスクリュー撹拌、マグネチック
スターラーによる撹拌等の方法を採用することができ
る。
In the plating solution of the present invention, it is preferable to perform plating while stirring the plating solution in order to uniformly disperse the fluoride pitch. The stirring method is not particularly limited, and ordinary mechanical stirring means, for example, a method of screw stirring, a method of stirring with a magnetic stirrer, and the like can be adopted.

【0012】メッキ条件は、使用するメッキ液の種類に
応じて適宜決定すれば良く、一般に通常のメッキの場合
と同様の液温、pH、電流密度とすれば良い。
The plating conditions may be appropriately determined according to the type of plating solution to be used, and generally, the same solution temperature, pH, and current density as those in normal plating may be used.

【0013】本発明のメッキ液により形成されるメッキ
皮膜では、メッキ皮膜中に含まれるフッ化ピッチの量
は、使用目的に応じて適宜決定すれば良く、メッキ液中
のフッ化ピッチ添加量の調整、メッキ条件の調整等によ
ってフッ化ピッチの共析量を適宜変更することができ
る。一般にメッキ皮膜中に含まれるフッ化ピッチの量が
多くなるほどメッキ金属と基材との密着性が低下するの
で、メッキ皮膜中のフッ化ピッチ量は体積分率で80%
程度以下とすることが適当であり、特にメッキ皮膜の機
械的強度が要求されるような場合には、多量のフッ化ピ
ッチを共析させることは避けるべきであり、フッ化ピッ
チ量の体積分率を5%程度以下とすることが好ましい。
また、フッ化ピッチの共析量の下限は特に限定されず、
使用目的に応じて適宜設定すれば良いが、通常フッ化ピ
ッチの共析による効果を生じさせるためには、体積分率
で1%程度以上とすることが好ましい。
In the plating film formed by the plating solution of the present invention, the amount of pitch fluoride contained in the plating film may be appropriately determined according to the purpose of use. The amount of eutectoid pitch fluoride can be appropriately changed by adjustment, adjustment of plating conditions, and the like. Generally, the greater the amount of pitch fluoride contained in the plating film, the lower the adhesion between the plating metal and the base material. Therefore, the amount of pitch fluoride in the plating film is 80% by volume.
It is appropriate that the amount is not more than the extent, and especially when the mechanical strength of the plating film is required, it is necessary to avoid co-depositing a large amount of pitch fluoride, and the volume of It is preferable that the rate be about 5% or less.
Further, the lower limit of the amount of eutectoid pitch fluoride is not particularly limited,
The volume fraction may be appropriately set according to the purpose of use, but is usually preferably about 1% or more in volume fraction in order to produce the effect of eutectoid pitch fluoride.

【0014】[0014]

【発明の効果】本発明の複合メッキ液によれば、従来の
フッ化黒鉛、PTFEなどを共析させたメッキ皮膜と比
べてより高い撥水性を有するメッキ皮膜を形成すること
ができる。また、フッ化ピッチのメッキ液への分散性が
非常に良好であることから、界面活性剤の添加量を著し
く低減させることができ、メッキ直後においても良好な
撥水性が示される。
According to the composite plating solution of the present invention, it is possible to form a plating film having higher water repellency than a conventional plating film obtained by co-depositing fluorinated graphite, PTFE or the like. Further, since the dispersibility of the fluorinated pitch in the plating solution is very good, the amount of the surfactant added can be significantly reduced, and good water repellency is exhibited immediately after plating.

【0015】[0015]

【実施例】以下に、実施例を示して本発明をより詳細に
説明する。
The present invention will be described in more detail with reference to the following examples.

【0016】[0016]

【実施例1】軟化点100℃、キノリン不溶分0.2w
t%、ベンゼン不溶分30wt%のコールタールピッチ
に2倍量の水素化アントラセン油を加え、430℃で9
0分間加熱し、さらに減圧下300℃で水素化アントラ
セン油を除去して還元ピッチを得た。
Example 1 Softening point: 100 ° C., quinoline insoluble content: 0.2 w
A double amount of hydrogenated anthracene oil was added to a coal tar pitch containing 30% by weight of benzene insoluble matter and 30% by weight of benzene.
The mixture was heated for 0 minutes, and the reduced pitch was obtained by removing the hydrogenated anthracene oil at 300 ° C. under reduced pressure.

【0017】ついで、窒素ガスを導入して、この還元ピ
ッチから低分子量成分を除去し、400℃で5時間熱重
合して、軟化点300℃、キノリン不溶分60wt%、
ベンゼン不溶分98wt%、メソフェーズ含有量90%
以上のメソフェーズピッチを得た。
Next, a low-molecular-weight component is removed from the reduced pitch by introducing nitrogen gas, and thermally polymerized at 400 ° C. for 5 hours to obtain a softening point of 300 ° C., a quinoline insoluble content of 60 wt%,
Benzene insoluble content 98 wt%, mesophase content 90%
The above mesophase pitch was obtained.

【0018】得られたピッチ50gをニッケル製反応容
器に仕込んだ後、系内を真空排気し、アルゴンガスで満
たした。その後、70℃でフッ素ガス(20vol%フ
ッ素、80vol%アルゴンの混合ガス)を平均流速6
50cc/分の速度で流通し、20時間反応させたとこ
ろ、144gのフッ化ピッチが得られた。元素分析を行
ったところ、組成式は、CF1.39であった。
After 50 g of the obtained pitch was charged into a nickel reaction vessel, the system was evacuated and filled with argon gas. Then, at 70 ° C., a fluorine gas (mixed gas of 20 vol% fluorine and 80 vol% argon) was supplied at an average flow rate of 6%.
After flowing at a flow rate of 50 cc / min and reacting for 20 hours, 144 g of pitch fluoride was obtained. As a result of an elemental analysis, the composition formula was CF 1.39 .

【0019】このようにして得たフッ化ピッチを下記の
組成を有するニッケル電解浴中に1重量%添加した。そ
の際、界面活性剤としては、第3級パーフルオロアンモ
ニウム塩(C17SONH(CH(C
・Cl)をフッ化ピッチ1gに対して、4.
5mgとなるように添加した。
1% by weight of the pitch fluoride thus obtained was added to a nickel electrolytic bath having the following composition. At that time, a tertiary perfluoroammonium salt (C 8 F 17 SO 2 NH (CH 2 ) 3 N + (C
3. H 3 ) 3 .Cl ) per 1 g of pitch fluoride;
5 mg was added.

【0020】 ニッケル板、銅板をそれぞれ正極、負極として、液温
45℃±5℃、pH4.2、電流密度1−5A/dm
の条件で、スクリュー撹拌しつつ1000クーロンの電
気量でメッキを行った。得られたメッキ皮膜についてメ
ッキ直後及び真空乾燥後に水の接触角の測定を行い、そ
の撥水性を調べた。結果を第1表に示す。
[0020] Using a nickel plate and a copper plate as a positive electrode and a negative electrode, respectively, a liquid temperature of 45 ° C. ± 5 ° C., a pH of 4.2, and a current density of 1-5 A / dm 2
Under the conditions described above, plating was performed with an electric quantity of 1000 coulombs while stirring with a screw. The contact angle of water was measured on the obtained plating film immediately after plating and after vacuum drying, and the water repellency was examined. The results are shown in Table 1.

【0021】[0021]

【比較例1】フッ化ピッチを添加することなく、その他
の条件は実施例1と同様にして、ニッケルメッキを行っ
た。得られたニッケルメッキ皮膜について水の接触角を
測定した結果を下記第1表に示す。
Comparative Example 1 Nickel plating was performed in the same manner as in Example 1 except that pitch fluoride was not added. The results of measuring the contact angle of water on the obtained nickel plating film are shown in Table 1 below.

【0022】[0022]

【比較例2】フッ化黒鉛を下記の組成を有するニッケル
電解浴中に1重量%添加した。その際、界面活性剤とし
て第3級パーフルオロアンモニウム塩(C17SO
NH(CH(CH・Cl)をフッ
化黒鉛1gに対して、40mgとなるように添加した。
Comparative Example 2 1% by weight of fluorinated graphite was added to a nickel electrolytic bath having the following composition. At this time, a tertiary perfluoroammonium salt (C 8 F 17 SO
2 NH (CH 2 ) 3 N + (CH 3 ) 3 .Cl ) was added to 40 mg per 1 g of fluorinated graphite.

【0023】 得られたメッキ浴を用いて実施例1と同様の条件でメ
ッキを行い、メッキ皮膜の撥水性を測定した。結果を下
記第1表に示す。
[0023] Using the plating bath obtained, plating was performed under the same conditions as in Example 1, and the water repellency of the plating film was measured. The results are shown in Table 1 below.

【0024】[0024]

【比較例3】フッ化黒鉛に代えてPTFEを用い、界面
活性剤の添加量をPTFE1gに対して、4.5mgと
すること以外は、比較例2と同様にしてメッキを行い、
メッキ皮膜の撥水性を測定した。結果を下記第1表に示
す。
Comparative Example 3 Plating was performed in the same manner as in Comparative Example 2 except that PTFE was used instead of fluorinated graphite, and the amount of surfactant added was 4.5 mg per 1 g of PTFE.
The water repellency of the plating film was measured. The results are shown in Table 1 below.

【0025】[0025]

【表1】 以上の結果から、本発明の複合メッキ液によれば、メッ
キ直後においても優れた撥水性を有するメッキ皮膜を形
成できることが判る。
[Table 1] From the above results, it is understood that the composite plating solution of the present invention can form a plating film having excellent water repellency immediately after plating.

───────────────────────────────────────────────────── フロントページの続き (72)発明者 笹部 幹雄 神奈川県横浜市神奈川区羽沢町1150番地 旭硝子株式会社 中央研究所内 (56)参考文献 特開 昭62−275190(JP,A) 特開 昭48−49827(JP,A) 特開 平5−33153(JP,A) 特開 平7−26397(JP,A) 特表 昭62−502552(JP,A) (58)調査した分野(Int.Cl.7,DB名) C25D 15/00 - 15/02 C23C 18/16 - 18/52 ──────────────────────────────────────────────────続 き Continuation of the front page (72) Inventor Mikio Sasabe 1150 Hazawacho, Kanagawa-ku, Yokohama-shi, Kanagawa Prefecture Asahi Glass Co., Ltd. Central Research Laboratory (56) References JP-A-62-275190 (JP, A) JP-A-48 JP-A-49827 (JP, A) JP-A-5-33153 (JP, A) JP-A-7-26397 (JP, A) JP-T-62-502552 (JP, A) (58) Fields investigated (Int. . 7, DB name) C25D 15/00 - 15/02 C23C 18/16 - 18/52

Claims (4)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】メッキ液中でカチオン性を示す界面活性剤
とフッ化ピッチを含むことを特徴とする複合メッキ液。
1. A composite plating solution comprising a cationic surfactant and a pitch fluoride in a plating solution.
【請求項2】メッキ液中でカチオン性を示す界面活性剤
とフッ化ピッチを含むメッキ液を使用し、電気メッキ法
により基材上にフッ化ピッチが共析した複合メッキ被膜
を形成させることを特徴とする複合メッキ方法。
2. A composite plating film in which pitch fluoride is eutectoidally formed on a substrate by an electroplating method using a plating solution containing a cationic surfactant and a pitch fluoride in the plating solution. A composite plating method.
【請求項3】メッキ後に加熱乾燥を行わないことを特徴
とする請求項2に記載の複合メッキ方法。
3. The composite plating method according to claim 2, wherein heating and drying are not performed after plating.
【請求項4】金属メッキ被膜中にフッ化ピッチを共析さ
せてなることを特徴とする複合メッキ被膜。
4. A composite plating film obtained by eutecting pitch fluoride into a metal plating film.
JP19469591A 1991-04-30 1991-04-30 Composite plating solution, composite plating method and composite plating film Expired - Fee Related JP3151533B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19469591A JP3151533B2 (en) 1991-04-30 1991-04-30 Composite plating solution, composite plating method and composite plating film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19469591A JP3151533B2 (en) 1991-04-30 1991-04-30 Composite plating solution, composite plating method and composite plating film

Publications (2)

Publication Number Publication Date
JPH04329897A JPH04329897A (en) 1992-11-18
JP3151533B2 true JP3151533B2 (en) 2001-04-03

Family

ID=16328740

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19469591A Expired - Fee Related JP3151533B2 (en) 1991-04-30 1991-04-30 Composite plating solution, composite plating method and composite plating film

Country Status (1)

Country Link
JP (1) JP3151533B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114959811B (en) * 2022-05-31 2023-08-15 暨南大学 High corrosion-resistant composite electroplating electrolyte and preparation method of plating layer thereof

Also Published As

Publication number Publication date
JPH04329897A (en) 1992-11-18

Similar Documents

Publication Publication Date Title
US4098654A (en) Codeposition of a metal and fluorocarbon resin particles
Mafi et al. Comparison of the coating properties and corrosion rates in electroless Ni–P/PTFE composites prepared by different types of surfactants
US4302374A (en) Stable dispersion of positively charged polyfluorocarbon resin particles
US3996114A (en) Electroplating method
Afshar et al. Electrodeposition of graphite-bronze composite coatings and study of electroplating characteristics
CN109518237B (en) Zinc-nickel-phosphorus electroplating solution, preparation method thereof and electroplating method
US4716059A (en) Composites of metal with carbon fluoride and method of preparation
CN112368422A (en) Silver electrolyte for depositing a silver dispersion layer and a contact surface with a silver dispersion layer
US3756925A (en) The same dry lubricant coating of self replenishing type and method of making
JP3151533B2 (en) Composite plating solution, composite plating method and composite plating film
EP0365969B1 (en) Method for continuously electro-tinplating metallic material
JPS5811518B2 (en) Metal-diamond composite plating method
JPS5937354B2 (en) Gold alloy electroplating baths and gold alloys
JP3062630B2 (en) Electroless composite plating solution, electroless composite plating method and electroless composite plating film
Shrestha et al. Non-aqueous composite plating of Ni-ceramic particles using ethanol bath and anti-wear performance of the coatings
Menzies et al. The Electrodeposition of Copper from Non-Aqueous Solutions: I. General Review and Preliminary Studies
JPS6048599B2 (en) Composite plating film
JPH01201486A (en) Ag plated powder for electrically conductive paint having superior migration resistance
CN106947983B (en) Intercalation Zn-Al alloy powder and its zinc-aluminium of preparation collaboration anticorrosive paint and method
RU2156324C1 (en) Electrolyte for deposition of zinc-antimony alloy
US4586990A (en) Chelating metals
US20060162655A1 (en) Composite material composed of a metal matrix and of talc
WO2019044383A1 (en) Electroplating liquid for iron-nickel alloy having low coefficient of thermal expansion, and electroplating method using the electroplating liquid
RU2064535C1 (en) Electrolyte for applying bismuth covers
JPS6316477B2 (en)

Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees