JP3146351B2 - Method for producing layered compound having interlayer crosslinked structure - Google Patents
Method for producing layered compound having interlayer crosslinked structureInfo
- Publication number
- JP3146351B2 JP3146351B2 JP32549597A JP32549597A JP3146351B2 JP 3146351 B2 JP3146351 B2 JP 3146351B2 JP 32549597 A JP32549597 A JP 32549597A JP 32549597 A JP32549597 A JP 32549597A JP 3146351 B2 JP3146351 B2 JP 3146351B2
- Authority
- JP
- Japan
- Prior art keywords
- powder
- interlayer
- kca
- compound
- layered
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 150000001875 compounds Chemical class 0.000 title claims description 35
- 239000011229 interlayer Substances 0.000 title claims description 30
- 238000004519 manufacturing process Methods 0.000 title claims description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 18
- 238000006243 chemical reaction Methods 0.000 claims description 15
- 239000000377 silicon dioxide Substances 0.000 claims description 9
- 150000003973 alkyl amines Chemical class 0.000 claims description 8
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 6
- 239000001301 oxygen Substances 0.000 claims description 6
- 229910052760 oxygen Inorganic materials 0.000 claims description 6
- 229910052804 chromium Inorganic materials 0.000 claims description 3
- 229910052802 copper Inorganic materials 0.000 claims description 3
- 239000007789 gas Substances 0.000 claims description 3
- 229910052751 metal Inorganic materials 0.000 claims description 3
- 239000002184 metal Substances 0.000 claims description 3
- 229910052759 nickel Inorganic materials 0.000 claims description 3
- 229910052721 tungsten Inorganic materials 0.000 claims description 3
- 229910052720 vanadium Inorganic materials 0.000 claims description 3
- 239000000843 powder Substances 0.000 description 42
- 239000010955 niobium Substances 0.000 description 36
- 239000000126 substance Substances 0.000 description 25
- 239000003153 chemical reaction reagent Substances 0.000 description 16
- 239000011575 calcium Substances 0.000 description 14
- 239000004065 semiconductor Substances 0.000 description 12
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 12
- BMVXCPBXGZKUPN-UHFFFAOYSA-N 1-hexanamine Chemical compound CCCCCCN BMVXCPBXGZKUPN-UHFFFAOYSA-N 0.000 description 11
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 11
- 239000010410 layer Substances 0.000 description 11
- 238000000034 method Methods 0.000 description 11
- 239000011941 photocatalyst Substances 0.000 description 11
- 238000002441 X-ray diffraction Methods 0.000 description 10
- 239000011734 sodium Substances 0.000 description 10
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 9
- 239000011651 chromium Substances 0.000 description 9
- 238000009830 intercalation Methods 0.000 description 9
- 239000000203 mixture Substances 0.000 description 9
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 8
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 8
- 238000003756 stirring Methods 0.000 description 8
- 230000002687 intercalation Effects 0.000 description 7
- 150000002736 metal compounds Chemical class 0.000 description 7
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 6
- 239000007864 aqueous solution Substances 0.000 description 6
- 229910017604 nitric acid Inorganic materials 0.000 description 6
- 229910004298 SiO 2 Inorganic materials 0.000 description 4
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 4
- 229910000019 calcium carbonate Inorganic materials 0.000 description 4
- 238000004132 cross linking Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 239000012153 distilled water Substances 0.000 description 4
- 229910000027 potassium carbonate Inorganic materials 0.000 description 4
- 238000002360 preparation method Methods 0.000 description 4
- 238000001354 calcination Methods 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 238000010304 firing Methods 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- QHMGFQBUOCYLDT-RNFRBKRXSA-N n-(diaminomethylidene)-2-[(2r,5r)-2,5-dimethyl-2,5-dihydropyrrol-1-yl]acetamide Chemical compound C[C@@H]1C=C[C@@H](C)N1CC(=O)N=C(N)N QHMGFQBUOCYLDT-RNFRBKRXSA-N 0.000 description 3
- ZKATWMILCYLAPD-UHFFFAOYSA-N niobium pentoxide Inorganic materials O=[Nb](=O)O[Nb](=O)=O ZKATWMILCYLAPD-UHFFFAOYSA-N 0.000 description 3
- 230000001590 oxidative effect Effects 0.000 description 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- 125000003545 alkoxy group Chemical group 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 229910000484 niobium oxide Inorganic materials 0.000 description 2
- URLJKFSTXLNXLG-UHFFFAOYSA-N niobium(5+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Nb+5].[Nb+5] URLJKFSTXLNXLG-UHFFFAOYSA-N 0.000 description 2
- 238000013032 photocatalytic reaction Methods 0.000 description 2
- 238000006303 photolysis reaction Methods 0.000 description 2
- 229910000029 sodium carbonate Inorganic materials 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 1
- 150000001342 alkaline earth metals Chemical class 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- GVHCUJZTWMCYJM-UHFFFAOYSA-N chromium(3+);trinitrate;nonahydrate Chemical compound O.O.O.O.O.O.O.O.O.[Cr+3].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O GVHCUJZTWMCYJM-UHFFFAOYSA-N 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 239000003344 environmental pollutant Substances 0.000 description 1
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 239000003574 free electron Substances 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 125000003253 isopropoxy group Chemical group [H]C([H])([H])C([H])(O*)C([H])([H])[H] 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 125000003506 n-propoxy group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])O* 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000001699 photocatalysis Effects 0.000 description 1
- 238000007146 photocatalysis Methods 0.000 description 1
- 238000006862 quantum yield reaction Methods 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 238000003980 solgel method Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
Description
【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION
【0001】[0001]
【発明の属する技術分野】本発明は、光触媒などとして
有用な層間架橋構造を有する層状化合物を、層状ペロブ
スカイト型化合物を用い、インターカレーション反応を
利用して効率よく製造する方法に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for efficiently producing a layered compound having an interlayer crosslinked structure useful as a photocatalyst or the like by using a layered perovskite type compound and utilizing an intercalation reaction.
【0002】[0002]
【従来の技術】酸化チタンに代表される光応答性半導体
特性を有する金属化合物を利用した半導体光触媒反応
は、半導体電極での水の光分解の発見[「工業化学雑
誌」,第72巻,第108〜113ページ(1969
年)]以来、光エネルギーから化学エネルギーへの交換
の有力な手段として、多くの研究がなされてきており、
様々な分野における潜在的有用性が明らかになりつつあ
る。2. Description of the Related Art A semiconductor photocatalytic reaction utilizing a metal compound having photoresponsive semiconductor characteristics represented by titanium oxide is disclosed by the discovery of photodecomposition of water at a semiconductor electrode [Industrial Chemistry Magazine, Vol. Pages 108 to 113 (1969
Years)], many studies have been conducted as a promising means of converting light energy into chemical energy.
The potential utility in various fields is emerging.
【0003】この光応答性半導体特性を有する金属化合
物、いわゆる光触媒は、その結晶分子における価電子帯
と伝導帯との間のエネルギーギャップである「禁止帯」
の値以上のエネルギーを有する光を吸収すると、価電子
帯の電子が伝導帯に光励起されて、伝導帯には自由電子
が、価電子帯には正孔が生成し、これらがそれぞれ還元
反応と酸化反応を起こすことによって光触媒反応が進行
する。A metal compound having photoresponsive semiconductor properties, a so-called photocatalyst, has a "forbidden band" which is an energy gap between a valence band and a conduction band in a crystal molecule.
When light having energy equal to or greater than is absorbed, electrons in the valence band are photoexcited into the conduction band, free electrons are generated in the conduction band, and holes are generated in the valence band. The photocatalytic reaction proceeds by causing the oxidation reaction.
【0004】しかしながら、半導体光触媒によって水の
光分解が起こるためには、半導体のバンド幅が水の電解
圧(理論値1.23V+過電圧0.4V=1.63V)
より大きくなければならず、さらに伝導帯の電子が水を
還元でき、かつ価電子帯の正孔が水を酸化できる能力が
なければならない。すなわち、伝導帯の下端が水からの
水素発生電位よりマイナス側に、価電子帯の上端が酸素
発生電位よりプラス側に位置していなくてはならない。
この制約のために、理論的に水を完全分解できる半導体
の種類は限られている。However, in order for photodecomposition of water to occur by the semiconductor photocatalyst, the bandwidth of the semiconductor must be equal to the electrolytic pressure of water (theoretical value 1.23 V + overvoltage 0.4 V = 1.63 V).
It must be larger, moreover, electrons in the conduction band must be able to reduce water and holes in the valence band must be capable of oxidizing water. That is, the lower end of the conduction band must be located on the minus side of the hydrogen generation potential from water, and the upper end of the valence band must be located on the plus side of the oxygen generation potential.
Due to this limitation, the types of semiconductors that can completely decompose water theoretically are limited.
【0005】ところで、光触媒、例えば金属化合物(T
iO2)を主体とする光触媒の製造方法としては、無機
材料粉末を用いて、直接高温焼結させる方法、化学処理
により、半導体に一層優れた光応答性を付与するため
に、半導体に金属又は金属化合物の水溶液を吸着させた
のち、この半導体に吸着した金属又は金属化合物を酸
化、還元あるいは還元後に一部酸化する方法、ゾル−ゲ
ル方法などがこれまで知られている。A photocatalyst such as a metal compound (T
As a method for producing a photocatalyst mainly composed of iO 2 ), a method of directly sintering a high temperature using an inorganic material powder or a chemical treatment to impart more excellent photoresponsiveness to the semiconductor by chemical treatment, A method of adsorbing an aqueous solution of a metal compound and then oxidizing, reducing or partially oxidizing the metal or the metal compound adsorbed on the semiconductor, a sol-gel method, and the like have been known.
【0006】しかしながら、光応答性半導体特性を有す
る金属化合物を用いた光触媒においては、半導体のバン
ド幅が大きすぎるため、太陽光の可視光部分を吸収でき
ず、ほぼ近紫外光のみが反応に寄与し、また、光エネル
ギーによる励起により生じた電子と正孔が容易に再結合
するために、種々の反応系における反応量子収率が低い
という欠点がある。However, in a photocatalyst using a metal compound having photoresponsive semiconductor characteristics, the visible light portion of sunlight cannot be absorbed because the bandwidth of the semiconductor is too large, and almost only near-ultraviolet light contributes to the reaction. In addition, since electrons and holes generated by excitation by light energy easily recombine, there is a disadvantage that the reaction quantum yield in various reaction systems is low.
【0007】最近、層状複合酸化物、例えば層状ペロブ
スカイト型のKCa2Nb3O10が、光応答性半導体
特性を有する光触媒として提案されている。このような
層状ペロブスカイト型化合物は、用いる元素に種々の組
合わせが可能であり、例えばK[Ca2Nan−3Nb
nO3n+1]で表わされる各種の化合物を調製するこ
とができるという利点を有している。Recently, a layered composite oxide, for example, layered perovskite type KCa 2 Nb 3 O 10 has been proposed as a photocatalyst having photoresponsive semiconductor properties. Such a layered perovskite compound can be variously combined with the element to be used, for example, K [Ca 2 Nan - 3Nb
It has the advantage that the n O 3n + 1] Various compounds represented by may be prepared.
【0008】一般に、層状化合物を用いて、高機能の光
触媒、例えば可視光による水の水素と酸素への完全分解
触媒を調製する際には、層間をいかに修飾するかが、重
要な問題となるが、層状ペロブスカイトの場合には、層
間電荷密度が高いため、層間距離を拡大しにくく、層間
を修飾することが困難であり、高機能の光触媒が得られ
にくいという欠点がある。In general, when preparing a highly functional photocatalyst, for example, a catalyst for completely decomposing water into hydrogen and oxygen by visible light using a layered compound, how to modify the layers becomes an important issue. However, in the case of a layered perovskite, the interlayer charge density is high, so that it is difficult to increase the interlayer distance, it is difficult to modify the interlayer, and it is difficult to obtain a highly functional photocatalyst.
【0009】[0009]
【発明が解決しようとする課題】本発明は、このような
事情のもとで、層状化合物の層間距離を拡大して層間を
修飾し、高機能光触媒として有用な層状化合物を効率よ
く製造する方法を提供することを目的としてなされたも
のである。SUMMARY OF THE INVENTION Under such circumstances, the present invention provides a method for efficiently producing a layered compound useful as a high-performance photocatalyst by increasing the interlayer distance of the layered compound and modifying the layers. The purpose of this is to provide.
【0010】[0010]
【課題を解決するための手段】本発明者らは、層状化合
物の層間を修飾する方法について鋭意研究を重ねた結
果、NaNbO3とKCa2Nb3O10とを高温で反
応させて調製した層状ペロブスカイト型化合物を用い、
これをプロトン交換処理したのち、長鎖アルキルアミン
のインターカレーション処理、テトラアルコキシシラン
による処理及び焼成処理を順次施すことにより、層間に
シリカの支柱を有する層間架橋構造の層状化合物が容易
に得られることを見出し、この知見に基づいて本発明を
完成するに至った。Means for Solving the Problems The present inventors have conducted intensive studies on a method for modifying the interlayer of a layered compound, and as a result, have found that a layered layer prepared by reacting NaNbO 3 and KCa 2 Nb 3 O 10 at a high temperature. Using a perovskite compound,
After this is subjected to a proton exchange treatment, a long-chain alkylamine intercalation treatment, a treatment with tetraalkoxysilane, and a calcination treatment are sequentially performed, whereby a layered compound having an interlayer crosslinked structure having silica pillars between layers can be easily obtained. This led to the completion of the present invention based on this finding.
【0011】すなわち、本発明は、NaNbO3とKC
a2Nb3O10とを1150〜1350℃の温度で反
応させて、一般式 K[Ca2Nan−3NbnO3n+1] (I) (式中のnは4〜6の数であり、Nbは10原子%以下
の割合でNi、V、Cu、Cr及びWの中から選ばれた
少なくとも1種の金属と置換されていてもよい)で表わ
される層状ペロブスカイト型化合物を調製し、これをプ
ロトン交換処理したのち、長鎖アルキルアミンをインタ
ーカレートし、次いでテトラアルコキシシランを反応さ
せ、さらに酸素含有ガス雰囲気下、400〜600℃の
温度で焼成処理して層間にシリカの支柱を形成させるこ
とを特徴とする層間架橋構造を有する層状化合物の製造
方法を提供するものである。[0011] That is, the present invention relates to NaNbO 3 and KC
a 2 Nb 3 O 10 is reacted at a temperature of 1150 to 1350 ° C. to obtain a general formula K [Ca 2 Na n-3 Nb n O 3n + 1 ] (I) (where n is a number of 4 to 6) , Nb may be substituted with at least one metal selected from Ni, V, Cu, Cr and W at a ratio of 10 atomic% or less) to prepare a layered perovskite compound represented by the formula: After proton exchange treatment, intercalate the long-chain alkylamine, then react with tetraalkoxysilane, and further calcine at 400-600 ° C under an oxygen-containing gas atmosphere to form silica pillars between layers. It is intended to provide a method for producing a layered compound having an interlayer crosslinked structure, characterized in that the method comprises:
【0012】[0012]
【発明の実施の形態】本発明方法においては、層状化合
物として、前記一般式(I)で表わされる層状ペロブス
カイト型化合物が用いられるが、この層状ペロブスカイ
ト型化合物は、NaNbO3とKCa2Nb3O10と
を1150〜1350℃の高温で反応させることにより
調製される。一般式(I)におけるNbは、10原子%
以下の割合でNi、V、Cu、Cr又はW、あるいはこ
れらを2種以上組み合わせたものと置換されていてもよ
い。In DETAILED DESCRIPTION OF THE INVENTION The present invention method, as layered compound, the generally formula layered perovskite compound represented by (I) is used, the layered perovskite type compound, NaNbO 3 and KCa 2 Nb 3 O 10 at a high temperature of 1150-1350 ° C. Nb in the general formula (I) is 10 atomic%.
Ni, V, Cu, Cr or W or a combination of two or more thereof may be substituted at the following ratio.
【0013】前記一般式(I)で表わされる層状ペロブ
スカイト型化合物は、通常用いられている方法、例えば
酸化ニオブ粉末、炭酸カルシウム粉末、炭酸カリウム粉
末及び場合により用いられる炭酸ナトリウム粉末の中か
ら選ばれる金属化合物を、それぞれ所定の割合で混合
し、この粉末混合物を、空気などの酸素含有ガス雰囲気
下に、前記範囲の温度で焼成することによりNaNbO
3とKCa2Nb3O10とを別々に調製し、次いで両
者を所定の割合で混合し焼成することによって調製され
る。このようにして得られる層状ペロブスカイト型化合
物においては、一般式(I)中のnが4から6まで増加
するに従って、層間距離が拡大する。The layered perovskite compound represented by the general formula (I) is selected from commonly used methods, for example, niobium oxide powder, calcium carbonate powder, potassium carbonate powder and optionally used sodium carbonate powder. The metal compounds are mixed at a predetermined ratio, and this powder mixture is calcined in an atmosphere containing oxygen such as air at a temperature within the above range to obtain NaNbO.
3 and KCa 2 Nb 3 O 10 are separately prepared, and then both are mixed at a predetermined ratio and fired. In the layered perovskite compound thus obtained, the interlayer distance increases as n in the general formula (I) increases from 4 to 6.
【0014】本発明方法においては、このようにして調
製された前記一般式(I)で表わされる層状ペロブスカ
イト型化合物に対し、続いて、プロトン交換処理を施す
ことが必要である。このプロトン交換処理は、酸溶液例
えば適当な濃度の硝酸水溶液中で該層状ペロブスカイト
型化合物を、常温にて50〜100時間程度かきまぜる
ことにより行うことができる。この処理により、層状ペ
ロブスカイト型化合物は、一般式 H[Ca2Nan−3NbnO3n+1] (II) 又は電子価を考慮した場合、 H+[Ca2Nan−3NbnO3n+1]− (II′) (式中のnは前記と同じ意味をもつ)で表わされる化合
物に変換される。In the method of the present invention, it is necessary that the layered perovskite compound represented by the general formula (I) thus prepared is subsequently subjected to a proton exchange treatment. This proton exchange treatment can be carried out by stirring the layered perovskite compound in an acid solution, for example, an aqueous solution of nitric acid of an appropriate concentration at room temperature for about 50 to 100 hours. This process, the layered perovskite type compound represented by the general formula H [Ca 2 Na n-3 Nb n O 3n + 1] (II) or considering the electronic value, H + [Ca 2 Na n -3 Nb n O 3n + 1] - (II ') wherein n has the same meaning as described above.
【0015】次いで、このプロトン交換層状化合物に長
鎖アルキルアミンをインターカレートする。この際用い
られる長鎖アルキルアミンとしては、炭素数5〜15程
度のものが好ましく、特にn‐ヘキシルアミンが好適で
ある。このインターカレーション反応は、低級アルコー
ルなどの適当な溶媒中において、長鎖アルキルアミンと
前記プロトン変換層状化合物とを常温で50〜200時
間程度接触させることにより、行うことができる。この
反応により、層状化合物の層間に、長鎖アルキルアミン
がインターカレートされ、層間距離が拡大する。Next, a long-chain alkylamine is intercalated into the proton exchange layered compound. As the long-chain alkylamine used at this time, one having about 5 to 15 carbon atoms is preferable, and n-hexylamine is particularly preferable. This intercalation reaction can be performed by contacting the long-chain alkylamine with the above-mentioned proton conversion layered compound in a suitable solvent such as a lower alcohol at room temperature for about 50 to 200 hours. By this reaction, a long-chain alkylamine is intercalated between the layers of the layered compound, and the interlayer distance is increased.
【0016】次に、このようにして長鎖アルキルアミン
がインターカレートされた層状化合物にテトラアルコキ
シシランを反応させる。この際用いられるテトラアルコ
キシシランとしては、アルコキシル基がメトキシ基、エ
トキシ基、n‐プロポキシ基、イソプロポキシ基などの
低級アルコキシル基であるものが好ましく、特にテトラ
エトキシシランが好適である。この反応は、一般に40
〜80℃程度の温度において50〜200時間程度行わ
れる。Next, a tetraalkoxysilane is reacted with the layered compound in which the long-chain alkylamine has been intercalated as described above. As the tetraalkoxysilane used at this time, those in which the alkoxyl group is a lower alkoxyl group such as a methoxy group, an ethoxy group, an n-propoxy group, and an isopropoxy group are preferable, and tetraethoxysilane is particularly preferable. This reaction generally takes 40
This is performed at a temperature of about 80 ° C. for about 50 to 200 hours.
【0017】最後に、空気などの酸素含有ガス雰囲気下
に、400〜600℃の範囲の温度において焼成処理
し、層間中の有機物を燃焼させる。この焼成処理によ
り、一般式 SiO2−Ca2Nan−3NbnO3n+1 (III) (式中のnは前記と同じ意味をもつ)で表わされ、層間
にシリカの支柱を有する層間架橋構造の層状化合物が得
られる。このものは多孔体であって、大きな表面積を有
するとともに、高温安定性も良好である。Finally, in an oxygen-containing gas atmosphere such as air, a baking treatment is performed at a temperature in the range of 400 to 600 ° C. to burn organic substances in the interlayer. By this calcination treatment, an interlayer bridge represented by the general formula SiO 2 —Ca 2 Na n−3 Nb n O 3n + 1 (III) (wherein n has the same meaning as described above) and having silica pillars between the layers A layered compound of the structure is obtained. This is a porous body, has a large surface area, and has good high-temperature stability.
【0018】[0018]
【発明の効果】本発明によれば、複数のアルカリ金属及
びアルカリ土類金属を含む層状ペロブスカイト型化合物
を用い、インターカレーション反応を利用して、従来の
ものよりも拡大された層間距離のシリカの支柱を有する
層間架橋構造の層状化合物からなる多孔体を効率よく製
造することができる。このものは、高機能光触媒とし
て、例えば光化学変換や光を用いた合成化学分野、ある
いは光触媒反応を利用した環境汚染物質の除去処理分野
などに有用である。According to the present invention, a layered perovskite compound containing a plurality of alkali metals and alkaline earth metals is used, and the intercalation reaction is used to increase the interlayer distance of the silica compared with the conventional silica. It is possible to efficiently produce a porous body composed of a layered compound having an interlayer cross-linking structure having the above-mentioned pillars. This is useful as a highly functional photocatalyst, for example, in the field of synthetic chemistry using photochemical conversion or light, or in the field of removal of environmental pollutants using photocatalysis.
【0019】[0019]
【実施例】次に、本発明を実施例により、さらに詳細に
説明するが、本発明は、これらの例によってなんら限定
されるものではない。Next, the present invention will be described in more detail with reference to examples, but the present invention is not limited to these examples.
【0020】参考例1 KCa2Nb3O10の調製 酸化ニオブ(V)粉末[和光純薬工業(株)製、純度9
9.9%]0.03モル、炭酸カルシウム粉末[和光純
薬工業(株)製、試薬特級]0.04モル及び炭酸カリ
ウム粉末[片山化学工業(株)製、試薬一級]0.01
1モルをよく混合したのち、空気中、1200℃におい
て7時間焼成して得られたものを粉砕し、再び空気中、
1200℃において7時間焼成した。次いで、これを蒸
留水で十分に洗浄したのち、110℃で乾燥処理して、
KCa2Nb3O10粉末を調製した。このもののX線
回折図を図1にaとして示す。Reference Example 1 Preparation of KCa 2 Nb 3 O 10 Niobium (V) oxide powder [purity 9 manufactured by Wako Pure Chemical Industries, Ltd.]
9.9%] 0.03 mol, calcium carbonate powder [manufactured by Wako Pure Chemical Industries, Ltd., reagent grade] 0.04 mol and potassium carbonate powder [Katayama Chemical Industry Co., Ltd., reagent first grade] 0.01
After thoroughly mixing 1 mol, the mixture obtained by calcining in air at 1200 ° C. for 7 hours is pulverized, and again in air,
It was baked at 1200 ° C. for 7 hours. Next, this is sufficiently washed with distilled water, and then dried at 110 ° C.
KCa 2 Nb 3 O 10 powder was prepared. The X-ray diffraction pattern of this is shown in FIG.
【0021】参考例2 KCa2NaNb4O13の調
製 酸化ニオブ(V)粉末[和光純薬工業(株)製、純度9
9.9%]0.045モル、炭酸カルシウム粉末[和光
純薬工業(株)製、試薬特級]0.06モル及び炭酸カ
リウム粉末[片山化学工業(株)製、試薬一級]0.0
165モルをよく混合したのち、空気中、1000℃に
おいて20時間焼成して得られたものを粉砕し、再び空
気中、1000℃において20時間焼成した。次いで、
これを蒸留水で十分に洗浄したのち、500℃で3時間
乾燥処理して、KCa2Nb3O10粉末を調製した。
一方、酸化ニオブ(V)粉末[和光純薬工業(株)製、
純度99.9%]0.02モルと炭酸ナトリウム粉末
[和光純薬工業(株)製、試薬一級]0.02モルとを
よく混合したのち、空気中、1050℃において6時間
焼成してNaNbO3粉末を得た。このようにして得ら
れたKCa2Nb3O10粉末0.025モルとNaN
bO3粉末0.025モルとをよく混合したのち、空気
中、1230℃において10時間焼成して、KCa2N
aNb4O13粉末を調製した。このもののX線回折図
を図1にbとして示す。Reference Example 2 Preparation of KCa 2 NaNb 4 O 13 Niobium (V) oxide powder [Wako Pure Chemical Industries, Ltd., purity 9
9.9%] 0.045 mol, calcium carbonate powder [manufactured by Wako Pure Chemical Industries, Ltd., reagent grade] 0.06 mol and potassium carbonate powder [Katayama Chemical Industry Co., Ltd., reagent first grade] 0.0
After well mixing 165 moles, the mixture was calcined in air at 1000 ° C. for 20 hours, and the resultant was pulverized and calcined again in air at 1000 ° C. for 20 hours. Then
After sufficiently washing this with distilled water, it was dried at 500 ° C. for 3 hours to prepare KCa 2 Nb 3 O 10 powder.
On the other hand, niobium oxide (V) powder [manufactured by Wako Pure Chemical Industries, Ltd.
[Purity 99.9%] and 0.02 mol of sodium carbonate powder [Wako Pure Chemical Industries, Ltd., first class reagent] are mixed well, and then calcined in air at 1050 ° C. for 6 hours to obtain NaNbO. Three powders were obtained. The thus obtained KCa 2 Nb 3 O 10 powder 0.025 mol and NaN
After sufficiently mixing 0.025 mol of bO 3 powder, the mixture was calcined at 1230 ° C. for 10 hours in air to obtain KCa 2 N
aNb 4 O 13 powder was prepared. The X-ray diffraction pattern of this is shown as b in FIG.
【0022】参考例3 KCa2Na2Nb5O16の
調製 参考例2で得たKCa2NaNb4O13粉末0.01
モルと参考例2で得たNaNbO3粉末0.01モルと
をよく混合して、空気中、1260℃において15時間
焼成したのち、粉砕し、再度空気中、1300℃におい
て10時間焼成して、KCa2Na2Nb5O16粉末
を調製した。このもののX線回折図を図1にcとして示
す。REFERENCE EXAMPLE 3 Preparation of KCa 2 Na 2 Nb 5 O 16 KCa 2 NaNb 4 O 13 powder obtained in Reference Example 2 0.01
Mol and 0.01 mol of the NaNbO 3 powder obtained in Reference Example 2 were thoroughly mixed, fired in air at 1260 ° C. for 15 hours, pulverized, and fired again in air at 1300 ° C. for 10 hours. KCa 2 Na 2 Nb 5 O 16 powder was prepared. The X-ray diffraction pattern of this is shown as c in FIG.
【0023】参考例4 KCa2Na3Nb6O19の
調製 参考例2で得たKCa2NaNb4O13粉末0.01
モルと参考例2で得たNaNbO3粉末0.02モルと
をよく混合して、空気中、1320℃において5時間焼
成したのち、粉砕し、再度空気中、1320℃において
5時間焼成して、KCa2Na3Nb6O19粉末を調
製した。このもののX線回折図を図1にdとして示す。REFERENCE EXAMPLE 4 Preparation of KCa 2 Na 3 Nb 6 O 19 KCa 2 NaNb 4 O 13 powder obtained in Reference Example 2 0.01
Mol and 0.02 mol of the NaNbO 3 powder obtained in Reference Example 2 were mixed well, calcined in air at 1320 ° C. for 5 hours, pulverized, and calcined again in air at 1320 ° C. for 5 hours. KCa 2 Na 3 Nb 6 O 19 powder was prepared. The X-ray diffraction pattern of this is shown in FIG. 1 as d.
【0024】上記参考例1〜4から、前記一般式(I)
で示されるK[Ca2Nan−3NbnO3n+1]
(n=3〜6)は、骨格の[Ca2Nan−3NbnO
3n+1]部分と層間のK部分を組み合わせた層状ペロ
ブスカイト型化合物であり、nを増加すると骨格部分の
厚みが増加することが分る。X線回折により同定したと
ころ、nが3から4,5,6になると、層間距離は、そ
れぞれ2.94nm、3.72nm、4.47nm及び
5.24nmの順に増加したことが分かった。すなわ
ち、参考例で得られた層状ペロブスカイト型化合物は、
その骨格の修飾を可能にするものである。From the above Reference Examples 1 to 4, the above-mentioned general formula (I)
In shown are K [Ca 2 Na n-3 Nb n O 3n + 1]
(N = 3 to 6) are the backbone [Ca 2 Na n-3 Nb n O
3n + 1 ] and a layered perovskite compound in which the interlayer K is combined. It can be seen that as n increases, the thickness of the skeleton increases. As a result of identification by X-ray diffraction, it was found that when n was changed from 3 to 4, 5, 6, the interlayer distances increased in the order of 2.94 nm, 3.72 nm, 4.47 nm, and 5.24 nm, respectively. That is, the layered perovskite compound obtained in Reference Example is
It allows for modification of its backbone.
【0025】比較例1 参考例1で調製したKCa2Nb3O102.5gを6
N硝酸[和光純薬工業(株)製、試薬特級]水溶液10
0ml中に入れて、室温でかきまぜながら、3日間プロ
トン交換させたのち、ろ過、洗浄及び乾燥処理してHC
a2Nb3O10粉末を得た。Comparative Example 1 2.5 g of KCa 2 Nb 3 O 10 prepared in Reference Example 1 was added to 6
N nitric acid [Wako Pure Chemical Industries, Ltd., reagent grade] aqueous solution 10
After stirring for 3 days while stirring at room temperature, the mixture was filtered, washed and dried to give HC
It was obtained a 2 Nb 3 O 10 powder.
【0026】このようにして得たHCa2Nb3O10
粉末2.2gを、n‐ヘキシルアミン[和光純薬工業
(株)製、試薬一級]50mlとエタノール[和光純薬
工業(株)製、試薬特級]25mlとの混合溶液中に入
れ、室温でかきまぜながら7日間反応させたのち、ろ
過、洗浄及び乾燥処理して[C6H13NH3][Ca
2Nb3O10]粉末を得た。The thus obtained HCa 2 Nb 3 O 10
2.2 g of the powder was placed in a mixed solution of 50 ml of n-hexylamine [manufactured by Wako Pure Chemical Industries, Ltd., reagent first grade] and 25 ml of ethanol [manufactured by Wako Pure Chemical Industries, Ltd., special grade reagent], and the mixture was stirred at room temperature. After reacting for 7 days while stirring, the mixture was filtered, washed and dried to obtain [C 6 H 13 NH 3 ] [Ca
To obtain a 2 Nb 3 O 10] powder.
【0027】このようにして得た[C6H13NH3]
[Ca2Nb3O10]粉末2.0gをテトラエトキシ
シラン[和光純薬工業(株)製、試薬特級]50ml中
に入れ、65℃でかきまぜながら3日間反応させたの
ち、ろ過し、エタノールで洗浄後、乾燥した。これによ
りテトラエトキシシランを層間に導入することができ
た。次いで、これを空気中、500℃において焼成する
ことにより、層間にシリカの支柱を形成させ、層間架橋
構造の層状化合物であるSiO2−Ca2Nb3O10
を製造した。なお、n‐ヘキシルアミンによるインター
カレーション反応を行うと層間距離が1.47nmから
2.87nmになり、さらにテトラエトキシシランによ
り支柱を形成させると、層間距離は3.03nmになっ
た。[C 6 H 13 NH 3 ] thus obtained.
2.0 g of [Ca 2 Nb 3 O 10 ] powder was placed in 50 ml of tetraethoxysilane [Wako Pure Chemical Industries, Ltd., reagent grade], reacted at 65 ° C. for 3 days with stirring, filtered, and then ethanol. And then dried. Thereby, tetraethoxysilane could be introduced between the layers. Next, this is calcined in air at 500 ° C. to form a pillar of silica between the layers, and SiO 2 —Ca 2 Nb 3 O 10 which is a layered compound having an interlayer cross-linking structure is formed.
Was manufactured. When an intercalation reaction with n-hexylamine was performed, the interlayer distance was changed from 1.47 nm to 2.87 nm, and when pillars were formed using tetraethoxysilane, the interlayer distance was 3.03 nm.
【0028】実施例1 参考例2で調製したKCa2NaNb4O13粉末を用
い、比較例1と同様の方法により、層間にシリカの支柱
を形成させ、層間架橋構造の層間化合物であるSiO2
−Ca2NaNb4O13を調製した。なお、n‐ヘキ
シルアミンによるインターカレーション反応を行うと層
間距離が1.86nmから3.30nmになり、テトラ
エトキシシランにより支柱を形成させると、層間距離は
3.40nmになった。Example 1 Using the KCa 2 NaNb 4 O 13 powder prepared in Reference Example 2, a silica column was formed between layers by the same method as in Comparative Example 1, and SiO 2 , an interlayer compound having an interlayer cross-linking structure, was formed.
The -Ca 2 NaNb 4 O 13 was prepared. When the intercalation reaction with n-hexylamine was performed, the interlayer distance was changed from 1.86 nm to 3.30 nm, and when the pillar was formed with tetraethoxysilane, the interlayer distance was 3.40 nm.
【0029】比較例2 酸化ニオブ(V)粉末[和光純薬工業(株)製、純度9
9.9%]0.029モル、炭酸カルシウム粉末[和光
純薬工業(株)製、試薬特級]0.04モル、炭酸カリ
ウム粉末[片山化学工業(株)製、試薬一級]0.01
1モル及び硝酸クロム9水和物[Cr(NO3)3・9
H2O]粉末[片山化学工業(株)製、試薬特級]0.
002モルを蒸留水100mlに加え、かき混ぜながら
蒸発乾固した。得られた固形物を110℃で乾燥させ、
次いで、空気中、1200℃において5時間焼成したの
ち粉砕した。この粉砕物を空気中、1200℃において
10時間焼成し、蒸留水で十分に洗浄後、110℃で乾燥
して、KCa2Nb2.9Cr0.1O10粉末を調製
した。Comparative Example 2 Niobium (V) oxide powder [manufactured by Wako Pure Chemical Industries, Ltd., purity 9]
9.9%] 0.029 mol, calcium carbonate powder [Wako Pure Chemical Industries, Ltd., reagent grade] 0.04 mol, potassium carbonate powder [Katayama Chemical Industry Co., Ltd., reagent first grade] 0.01
1 mol of chromium nitrate nonahydrate [Cr (NO 3) 3 · 9
H 2 O] powder [Katayama Chemical Industry Co., Ltd., reagent grade]
002 mol was added to 100 ml of distilled water and evaporated to dryness while stirring. Drying the resulting solid at 110 ° C.
Next, it was baked in air at 1200 ° C. for 5 hours, and then pulverized. The pulverized material was fired in air at 1200 ° C. for 10 hours, sufficiently washed with distilled water, and dried at 110 ° C. to prepare KCa 2 Nb 2.9 Cr 0.1 O 10 powder.
【0030】このようにして得たKCa2Nb2.9C
r0.1O10粉末4.0gを6Nの硝酸[和光純薬工
業(株)製、試薬特級]水溶液150ml中に入れ、室
温でかきまぜながら3日間プロトン交換させたのち、ろ
過、洗浄、乾燥して、HCa2Nb2.9Cr0.1O
10粉末を得た。次いで、このHCa2Nb2.9Cr
0.1O10粉末2.8gを、n‐ヘキシルアミン[和
光純薬工業(株)製、試薬一級]80mlとエタノール
[和光純薬工業(株)製、試薬特級]40mlとの混合
溶液中に入れ、室温でかきまぜながら7日間反応させた
のち、ろ過、洗浄及び乾燥処理して[C6H13NH3]
[Ca2Nb2.9Cr0.1O10]粉末を得た。次
に、この[C6H13NH3][Ca2Nb2.9Cr
0.1O10]粉末2.0gをテトラエトキシシラン
[和光純薬工業(株)製、試薬特級]50ml中に入
れ、65℃でかきまぜながら7日間(その間にテトラエ
トキシシラン20mlを2回添加した)反応させたの
ち、ろ過し、エタノールで洗浄後、乾燥した。次いで、
空気中、500℃において焼成することにより、層間に
シリカの支柱を形成させ、層間架橋構造の層状化合物で
あるSiO2−Ca2Nb2.9Cr0.1O10を製
造した。なお、n‐ヘキシルアミンによるインターカレ
ーション反応を行うと層間距離が1.46nmから2.
73nmになり、さらにテトラエトキシシランにより支
柱を形成させると、層間距離は2.95nmになった。
また、温度を変え、400℃、500℃及び600℃で
焼成すると、層間距離は、それぞれ2.61nm、2.
45nm、2.39nmとなり、有機物を燃焼させるこ
とでやや小さくなることが認められたが、高表面積(5
00℃で焼成したものは292m2/g)を有し、かつ
高温安定性も認められた。ここで得られた各段階におけ
る生成物のX線回折図を図2に示す。図2において、
(a)はKCa2Nb3O10についての未処理物、
(b)は(a)を6N硝酸水溶液で処理したもの、
(c)は(b)をヘキシルアミンを用いてインターカレ
ートしたもの、(d)は(c)のヘキシルアミンをテト
ラエトキシシランで置換したもの、(e)は(d)を3
30℃で焼成したもの及び(f)は(d)を500℃で
焼成したものである。The thus obtained KCa 2 Nb 2.9 C
4.0 g of r 0.1 O 10 powder was placed in 150 ml of 6N nitric acid [Wako Pure Chemical Industries, Ltd., reagent grade] aqueous solution, and stirred at room temperature for 3 days for proton exchange, followed by filtration, washing and drying. And HCa 2 Nb 2.9 Cr 0.1 O
10 powders were obtained. Next, the HCa 2 Nb 2.9 Cr
2.8 g of 0.1 O 10 powder is mixed with 80 ml of n-hexylamine [manufactured by Wako Pure Chemical Industries, Ltd., first grade reagent] and 40 ml of ethanol [wako Pure Chemical Industries, Ltd., special grade reagent]. After stirring at room temperature for 7 days, the mixture was filtered, washed and dried to obtain [C 6 H 13 NH 3 ].
[Ca 2 Nb 2.9 Cr 0.1 O 10 ] powder was obtained. Next, this [C 6 H 13 NH 3 ] [Ca 2 Nb 2.9 Cr
0.1 O 10 ] powder (2.0 g) is placed in 50 ml of tetraethoxysilane [Wako Pure Chemical Industries, Ltd., reagent grade] for 50 days with stirring at 65 ° C. for 7 days (in the meantime, 20 ml of tetraethoxysilane is added twice) After the reaction, the mixture was filtered, washed with ethanol, and dried. Then
By baking at 500 ° C. in air, pillars of silica were formed between the layers, and SiO 2 —Ca 2 Nb 2.9 Cr 0.1 O 10 which was a layered compound having an interlayer cross-linking structure was produced. When an intercalation reaction with n-hexylamine is carried out, the interlayer distance becomes 1.46 nm to 2.46 nm.
When the thickness became 73 nm, and further when pillars were formed with tetraethoxysilane, the interlayer distance became 2.95 nm.
When the temperature is changed and firing is performed at 400 ° C., 500 ° C., and 600 ° C., the interlayer distances are 2.61 nm and 2.
45 nm and 2.39 nm, which was recognized to be slightly reduced by burning organic substances.
Those fired at 00 ° C. had 292 m 2 / g) and high temperature stability was also observed. FIG. 2 shows an X-ray diffraction diagram of the product obtained at each stage. In FIG.
(A) untreated KCa 2 Nb 3 O 10
(B) is obtained by treating (a) with a 6N nitric acid aqueous solution,
(C) is a product obtained by intercalating (b) with hexylamine, (d) is a product obtained by substituting hexylamine of (c) with tetraethoxysilane, and (e) is a product obtained by replacing (d) by 3
(F) is obtained by firing (d) at 500 ° C.
【0031】実施例2 実施例1と同様にしてKCa2NaNb4O13粉末を
用い、6N硝酸水溶液による処理、n‐ヘキシルアミン
による処理及びテトラエトキシシランによる処理を行っ
たのち、330℃又は500℃で焼成した。これらの各
段階におけるX線回折図を図3に示す。図3において、
(a)はKCa2NaNb4O13についての未処理
物、(b)は(a)を6N硝酸水溶液で処理したもの、
(c)は(b)をヘキシルアミンを用いてインターカレ
ートしたもの、(d)は(c)のヘキシルアミンをテト
ラエトキシシランで置換したもの、(e)は(d)を3
30℃で焼成したもの及び(f)は(d)を500℃で
焼成したものである。Example 2 In the same manner as in Example 1, KCa 2 NaNb 4 O 13 powder was used, followed by treatment with a 6N aqueous nitric acid solution, treatment with n-hexylamine and treatment with tetraethoxysilane. Fired at ℃. FIG. 3 shows X-ray diffraction patterns at each of these stages. In FIG.
(A) untreated KCa 2 NaNb 4 O 13 , (b) (a) treated with 6N nitric acid aqueous solution,
(C) is a product obtained by intercalating (b) with hexylamine, (d) is a product obtained by substituting hexylamine of (c) with tetraethoxysilane, and (e) is a product obtained by replacing (d) by 3
(F) is obtained by firing (d) at 500 ° C.
【図1】 参考例1〜4で得た層状ペロブスカイト型化
合物のX線回折図。FIG. 1 is an X-ray diffraction diagram of a layered perovskite compound obtained in Reference Examples 1 to 4.
【図2】 KCa2Nb3O10及びその処理物のX線
回折図。FIG. 2 is an X-ray diffraction diagram of KCa 2 Nb 3 O 10 and a processed product thereof.
【図3】 KCa2NaNb4O13及びその処理物の
X線回折図。FIG. 3 is an X-ray diffraction diagram of KCa 2 NaNb 4 O 13 and a processed product thereof.
───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 平8−196912(JP,A) 特表 昭63−503538(JP,A) (58)調査した分野(Int.Cl.7,DB名) C01G 33/00 B01J 23/20 CA(STN)──────────────────────────────────────────────────続 き Continuation of the front page (56) References JP-A-8-196912 (JP, A) JP-A-63-503538 (JP, A) (58) Fields investigated (Int. Cl. 7 , DB name) C01G 33/00 B01J 23/20 CA (STN)
Claims (1)
を1150〜1350℃の温度で反応させて、一般式 K[Ca2Nan−3NbnO3n+1] (式中のnは4〜6の数であり、Nbは10原子%以下
の割合でNi、V、Cu、Cr及びWの中から選ばれた
少なくとも1種の金属と置換されていてもよい)で表わ
される層状ペロブスカイト型化合物を調製し、これをプ
ロトン交換処理したのち、長鎖アルキルアミンをインタ
ーカレートし、次いでテトラアルコキシシランを反応さ
せ、さらに酸素含有ガス雰囲気下、400〜600℃の
温度で焼成処理して層間にシリカの支柱を形成させるこ
とを特徴とする層間架橋構造を有する層状化合物の製造
方法。1. A reaction between NaNbO 3 and KCa 2 Nb 3 O 10 at a temperature of 1150 to 1350 ° C. to obtain a general formula K [Ca 2 Na n-3 Nb n O 3n + 1 ] (where n is 4 to 1 ). 6, and Nb may be substituted by at least one kind of metal selected from Ni, V, Cu, Cr and W at a ratio of 10 atomic% or less.) After proton exchange treatment, a long-chain alkylamine is intercalated, then tetraalkoxysilane is reacted, and further calcined at a temperature of 400 to 600 ° C. under an oxygen-containing gas atmosphere to form an interlayer. A method for producing a layered compound having an interlayer crosslinked structure, wherein pillars of silica are formed.
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KR100425024B1 (en) * | 2001-11-01 | 2004-03-27 | 주식회사 성원인더스트리 | Hybrid material with multifunctional properties |
JP5672726B2 (en) * | 2010-03-11 | 2015-02-18 | 独立行政法人物質・材料研究機構 | Organic solvent dispersion blended with flaky perovskite oxide particles, method for producing the same, perovskite oxide thin film using the same, and method for producing the same |
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