JP3132316B2 - Method for forming phosphor screen of color cathode ray tube - Google Patents

Method for forming phosphor screen of color cathode ray tube

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Publication number
JP3132316B2
JP3132316B2 JP06312888A JP31288894A JP3132316B2 JP 3132316 B2 JP3132316 B2 JP 3132316B2 JP 06312888 A JP06312888 A JP 06312888A JP 31288894 A JP31288894 A JP 31288894A JP 3132316 B2 JP3132316 B2 JP 3132316B2
Authority
JP
Japan
Prior art keywords
ray tube
cathode ray
color cathode
forming
opening
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP06312888A
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Japanese (ja)
Other versions
JPH08171853A (en
Inventor
龍男 矢谷
Original Assignee
関西日本電気株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 関西日本電気株式会社 filed Critical 関西日本電気株式会社
Priority to JP06312888A priority Critical patent/JP3132316B2/en
Publication of JPH08171853A publication Critical patent/JPH08171853A/en
Application granted granted Critical
Publication of JP3132316B2 publication Critical patent/JP3132316B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明はカラー受像管の蛍光面形
成方法に関し、特にブラックマトリクス膜に蛍光体の発
光領域を限定する所定のホール径分布の開口部を形成す
るのに好適する方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for forming a phosphor screen of a color picture tube, and more particularly to a method suitable for forming an opening having a predetermined hole diameter distribution for limiting a light emitting region of a phosphor in a black matrix film. .

【0002】[0002]

【従来の技術】一般に、蛍光体の発光領域を光吸収物質
であるグラファイト膜で限定したいわゆるブラックマト
リクス型カラー陰極線管の蛍光面形成は、特開平5−8
9775号公報に開示されているような工程により行な
われる。すなわち、図3(a)に示すように、パネル1
の内面に、たとえば、ポリビニルピロリドンおよびビス
アジド化合物を主成分とするフォトレジスト液を塗布
し、乾燥してフォトレジスト層2を形成した後、シャド
ウマスク(図示せず)を装着して露光する。そして、露
光終了後、図3(b)に示すように、上記フォトレジス
ト層2を現像し、シャドウマスクの電子ビーム通過孔を
介して焼き付けられたドット状のレジストパターン3を
形成する。そして、図3(c)に示すように、このレジ
ストパターン3の上にグラファイト懸濁液を塗布し、乾
燥してグラファイト膜4を形成した後、例えば、過酸化
水素水のようなエッチング液をパネル1内面に注入し、
レジストパターン3に作用させ、分解させる。さらに、
強力なスプレー圧でこの分解したレジストパターン3を
除去し、水洗して乾燥すると、図3(d)に示すよう
に、所望の開口部5を有するブラックマトリクス膜6が
形成される。そして、この開口部5の所定位置に三色蛍
光体層B,G,Rを埋め込んで蛍光面を形成している。
2. Description of the Related Art Generally, a phosphor screen of a so-called black matrix type color cathode ray tube in which a light emitting region of a phosphor is limited by a graphite film as a light absorbing material is disclosed in Japanese Patent Laid-Open No. 5-8 / 1993.
This is performed by a process as disclosed in Japanese Patent No. 9775. That is, as shown in FIG.
Is coated with a photoresist solution containing, for example, polyvinylpyrrolidone and a bisazide compound as main components, dried to form a photoresist layer 2, and then exposed by mounting a shadow mask (not shown). After the exposure, as shown in FIG. 3B, the photoresist layer 2 is developed to form a dot-shaped resist pattern 3 baked through an electron beam passage hole of a shadow mask. Then, as shown in FIG. 3C, a graphite suspension is applied on the resist pattern 3 and dried to form a graphite film 4, and then, for example, an etching solution such as a hydrogen peroxide solution is applied. Pour into the inside of panel 1,
Act on resist pattern 3 to decompose. further,
When the decomposed resist pattern 3 is removed by strong spray pressure, washed with water and dried, a black matrix film 6 having a desired opening 5 is formed as shown in FIG. The three-color phosphor layers B, G, and R are embedded in predetermined positions of the opening 5 to form a phosphor screen.

【0003】ところが、このブラックマトリクス膜の開
口部寸法はフォトレジスト層の膜厚分布、調光フィルタ
の透過率分布等の要因により変動するとともに、カラー
陰極線管の動作時、蛍光面の中央部に比べ周辺部では電
子ビームスポツトが偏向により拡がるため、この開口部
を大きくして蛍光体ドツト面積を増加させる必要があ
る。このようにブラックマトリクス膜の開口部径を所定
の寸法分布に形成するためには、シャドウマスクのホー
ル径分布を変更したり、調光フィルタの透過率分布を変
更したり、露光前に温風や冷風をフォトレジスト膜に吹
き付けてフォトレジスト膜の感度を調整したり、フォト
レジスト膜厚分布を調整したりすることが必要であっ
た。
However, the size of the opening of the black matrix film fluctuates due to factors such as the thickness distribution of the photoresist layer, the transmittance distribution of the light control filter, and the like. On the other hand, since the electron beam spot spreads in the peripheral portion due to deflection, it is necessary to enlarge the opening to increase the area of the phosphor dot. As described above, in order to form the opening diameter of the black matrix film in a predetermined size distribution, the hole diameter distribution of the shadow mask is changed, the transmittance distribution of the light control filter is changed, and the hot air is exposed before exposure. It was necessary to adjust the sensitivity of the photoresist film by blowing cold or cold air onto the photoresist film, or to adjust the photoresist film thickness distribution.

【0004】[0004]

【発明が解決しようとする課題】しかし、シャドウマス
クのホール径分布や調光フィルタの透過率分布の変更に
はシャドウマスク原板や調光フィルタの変更を要するた
め、実用上非常に困難であり、フォトレジスト膜厚分布
の調整は蛍光体残り、ホール落ち、膜ムラ等の不具合を
誘発し、フォトレジスト膜の感度調整は異物付着等の不
具合を誘発するという問題があった。本発明の目的は、
上記の問題点を解決するために、グラファイト膜の乾燥
工程で乾燥状態を調整することにより任意の箇所のグラ
ファイト膜へのエツチング液の浸透性を変化させ、ブラ
ックマトリクス膜の開口部の寸法を所定の分布に調整す
るカラー陰極線管の蛍光面形成方法を提供することにあ
る。
However, changing the hole diameter distribution of the shadow mask or the transmittance distribution of the light control filter requires changing the original shadow mask plate and the light control filter, which is very difficult in practice. Adjustment of the photoresist film thickness distribution causes problems such as phosphor remaining, holes dropping, and film unevenness, and sensitivity adjustment of the photoresist film causes problems such as adhesion of foreign substances. The purpose of the present invention is
In order to solve the above problems, the drying state is adjusted in the drying step of the graphite film to change the permeability of the etching liquid into the graphite film at an arbitrary position, and the size of the opening of the black matrix film is determined. It is an object of the present invention to provide a method for forming a fluorescent screen of a color cathode ray tube, which adjusts the distribution of the phosphors.

【0005】[0005]

【課題を解決するための手段】本発明は、内面にフォト
レジストを塗布したガラスパネルにシャドウマスクを介
して露光しレジストパターンを形成したのち、吸光性物
質を塗布して乾燥し、その後前記レジストパターンを除
去して、蛍光体配置部に開口部を有する吸光性物質膜を
形成する工程を具備したカラー陰極線管の蛍光面形成方
法において、前記吸光性物質膜の乾燥状態を制御して前
記開口部の形状寸法を調整することを特徴としたカラー
陰極線管の蛍光面形成方法を提供する。また、前記乾燥
状態を制御する方法が蛍光面形成面を複数のブロックに
分割した乾燥用ヒータの配置パターンとブロック毎の出
力調整で行なったり、前記乾燥状態を制御する方法が複
数の温風噴射ノズルの配置パターンとノズル毎の温風温
度調整で行なうのが望ましい。
According to the present invention, there is provided a glass panel having an inner surface coated with a photoresist, exposed through a shadow mask to form a resist pattern, coated with a light-absorbing substance, dried, and then dried. A method for forming a fluorescent screen of a color cathode ray tube, comprising removing a pattern and forming a light absorbing material film having an opening in a phosphor disposing portion, wherein the drying state of the light absorbing material film is controlled to form the light absorbing material film. The present invention provides a method for forming a fluorescent screen of a color cathode-ray tube, characterized by adjusting the shape and size of the portion. Also, the method for controlling the dry state is performed by adjusting the arrangement pattern of heaters for drying in which the phosphor screen forming surface is divided into a plurality of blocks and the output of each block, and the method for controlling the dry state includes a plurality of hot air jets. It is desirable to perform this by adjusting the arrangement pattern of the nozzles and the hot air temperature for each nozzle.

【0006】[0006]

【作用】通常、吸光性物質膜の乾燥状態が完全であれ
ば、レジストパターンのエッチング液は吸光性物質膜へ
浸透しないため、レジストパターンのみが除去されレジ
ストパターンと同一寸法の開口部が形成され、乾燥状態
が不十分であれば、レジストパターンのエッチング液が
吸光性物質膜にも浸透し、レジストパターンと接触して
いる吸光性物質膜の一部も除去されるため、レジストパ
ターンより大きい開口部が形成される。したがって、場
所により吸光性物質膜の乾燥状態を調整して任意の開口
部径分布を有する吸光性物質膜が形成できる。なお、蛍
光面の中央部ブロックと周辺部ブロックとに分割して乾
燥用ヒータや乾燥用温風噴射ノズルの配置パターンを変
化させ、乾燥出力を調整すれば、電子ビームの偏向によ
り密度が低下する周辺部の開口部径を大きくして、蛍光
面全域での発光光度を均一にしたカラー陰極線管の蛍光
面が容易に形成できる。
Normally, if the dry state of the light-absorbing material film is perfect, the etching solution for the resist pattern does not penetrate into the light-absorbing material film, so that only the resist pattern is removed and an opening having the same dimensions as the resist pattern is formed. If the drying state is insufficient, the etching solution of the resist pattern penetrates into the light absorbing material film, and a part of the light absorbing material film in contact with the resist pattern is also removed. A part is formed. Therefore, by adjusting the dry state of the light-absorbing material film depending on the location, a light-absorbing material film having an arbitrary aperture diameter distribution can be formed. If the drying output is adjusted by changing the arrangement pattern of the heater for drying and the hot air jet nozzle for drying by dividing the central block and the peripheral block of the phosphor screen, the density is reduced by the deflection of the electron beam. By increasing the diameter of the opening in the peripheral portion, it is possible to easily form a fluorescent screen of a color cathode ray tube in which the luminous intensity is uniform over the entire fluorescent screen.

【0007】[0007]

【実施例】以下、本発明について、図面を参照して説明
する。従来例と同一部分には同一参照符号を付し説明を
省略する。本発明のカラー陰極線管の蛍光面形成方法
は、図1(a)に示すように、従来例と同様に、パネル
1の内面に、たとえば、ポリビニルピロリドンおよびビ
スアジド化合物を主成分とするフォトレジスト液を塗布
し、乾燥してフォトレジスト層2を形成した後、シャド
ウマスク(図示せず)を装着して露光する。そして、露
光終了後、図1(b)に示すように、上記フォトレジス
ト層2を現像し、シャドウマスクの電子ビーム通過孔を
介して焼き付けられたドット状のレジストパターン3を
形成する。そして、図1(c)に示すように、このレジ
ストパターン3の上にグラファイト懸濁液を塗布し、例
えば、パネル1内面の中央部7と周辺部8に分割して配
置した乾燥用ヒータ9,9aの出力を調整して中央部7
は完全に、周辺部8は若干不完全に乾燥状態を制御して
乾燥してグラファイト膜10を形成した後、例えば、過
酸化水素水のようなエッチング液をパネル1内面に注入
し、レジストパターン3に作用させ、分解させる。さら
に、強力なスプレー圧でこの分解したレジストパターン
3を除去し、水洗して乾燥する。すると、図1(d)に
示すように、グラファイト膜10の乾燥状態が完全な中
央部7にはレジストパターンに一致した開口部11を、
グラファイト膜10の乾燥状態の不完全な周辺部8には
レジストパターンに接するグラファイト膜の一部がエッ
チング液の浸透で除去され、レジストパターンより若干
大きい開口部12を有するブラックマトリクス膜13が
形成される。そして、この開口部11,12の所定位置
に三色蛍光体層B,G,Rを埋め込んで蛍光面を形成す
れば、電子ビーム密度の低下する周辺部の蛍光体ドット
を大きくできるため、蛍光面全域に亘って輝度の均一な
特性の蛍光面が形成できる。
DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described below with reference to the drawings. The same parts as those in the conventional example are denoted by the same reference numerals, and description thereof will be omitted. As shown in FIG. 1 (a), the method for forming a phosphor screen of a color cathode ray tube according to the present invention, as shown in FIG. 1 (a), forms a photoresist solution containing, for example, polyvinylpyrrolidone and a bisazide compound as main components on the inner surface of panel 1. Is applied and dried to form a photoresist layer 2 and then exposed by mounting a shadow mask (not shown). After completion of the exposure, as shown in FIG. 1B, the photoresist layer 2 is developed to form a dot-shaped resist pattern 3 baked through an electron beam passage hole of a shadow mask. Then, as shown in FIG. 1 (c), a graphite suspension is applied on the resist pattern 3 and, for example, a drying heater 9 divided into a central portion 7 and a peripheral portion 8 on the inner surface of the panel 1. , 9a to adjust the output of the central part 7
After completely drying the peripheral portion 8 by controlling the drying state slightly incompletely to form the graphite film 10, an etching solution such as a hydrogen peroxide solution is injected into the inner surface of the panel 1 to form a resist pattern. 3 to cause decomposition. Further, the decomposed resist pattern 3 is removed by strong spray pressure, washed with water and dried. Then, as shown in FIG. 1D, an opening 11 corresponding to the resist pattern is formed in the central portion 7 where the graphite film 10 is completely dried.
A part of the graphite film in contact with the resist pattern is removed by the infiltration of the etchant in the incomplete peripheral portion 8 of the graphite film 10 in a dry state, and a black matrix film 13 having an opening 12 slightly larger than the resist pattern is formed. You. If the phosphor screen is formed by embedding the three-color phosphor layers B, G, and R at predetermined positions of the openings 11 and 12, the peripheral phosphor dots where the electron beam density is reduced can be enlarged. A fluorescent screen having uniform luminance characteristics over the entire surface can be formed.

【0008】また、本発明の第二の実施例のカラー陰極
線管の蛍光面形成方法は、図2に示すように、乾燥手段
として温風噴射ノズルを使用するもので、中央部7の温
風噴射ノズル14と、周辺部8の温風噴射ノズル14a
との温風温度や風量を調整して乾燥状態を制御するもの
である。この実施例によっても前記第一実施例と同様な
効果が得られる。
The method for forming a fluorescent screen of a color cathode ray tube according to the second embodiment of the present invention uses a hot air jet nozzle as a drying means as shown in FIG. Injection nozzle 14 and hot air injection nozzle 14a in peripheral portion 8
The drying state is controlled by adjusting the warm air temperature and air volume. According to this embodiment, effects similar to those of the first embodiment can be obtained.

【0009】以上、蛍光面の中央部と周辺部のブラック
マトリクス膜の開口部の寸法形状分布を乾燥状態を制御
して調整する方法について説明したが、本発明はこの例
に限定されず、例えば、乾燥用ヒータや温風噴射ノズル
等の乾燥手段の分割配置をさらに細分割したり、出力を
調整してて、シャドウマスクの孔径分布や調光フィルタ
の透過光量分布を補正する乾燥状態の制御を実施するこ
ともできる。
Although the method of controlling the size and shape distribution of the openings of the black matrix film in the central part and the peripheral part of the phosphor screen by controlling the dry state has been described above, the present invention is not limited to this example. In addition, the drying state is controlled by further subdividing the arrangement of the drying means such as a drying heater and a hot air injection nozzle, or by adjusting the output to correct the hole diameter distribution of the shadow mask and the transmitted light amount distribution of the light control filter. Can also be implemented.

【0010】[0010]

【発明の効果】本発明によれば、場所により吸光性物質
膜の乾燥状態を調整して任意の開口部径分布を有する吸
光性物質膜が形成できるので、例えば、蛍光面の中央部
ブロックと周辺部ブロックとに分割して乾燥用ヒータや
乾燥用温風噴射ノズルの配置パターンを変化させ、乾燥
出力を調整すれば、電子ビームの偏向により密度が低下
する周辺部の開口部径を大きくして、蛍光面全域での発
光光度を均一にしたカラー陰極線管の蛍光面が容易に形
成できる。
According to the present invention, it is possible to form a light absorbing material film having an arbitrary aperture diameter distribution by adjusting the dry state of the light absorbing material film depending on the location. By adjusting the drying output by changing the arrangement pattern of the heater for drying and the hot air jet nozzle for drying by dividing into the peripheral block, the diameter of the opening in the peripheral part where the density decreases due to the deflection of the electron beam can be increased. Thus, the fluorescent screen of the color cathode-ray tube in which the luminous intensity over the entire fluorescent screen is uniform can be easily formed.

【図面の簡単な説明】[Brief description of the drawings]

【図1】 (a)〜(d)本発明の一実施例のカラー陰
極線管の蛍光面形成工程の説明図
FIGS. 1A to 1D are explanatory views of a fluorescent screen forming process of a color cathode ray tube according to an embodiment of the present invention.

【図2】 本発明の第二実施例の乾燥噴射ノズルの配置
FIG. 2 is a layout view of a dry spray nozzle according to a second embodiment of the present invention.

【図3】 従来のカラー陰極線管の蛍光面形成工程の説
明図
FIG. 3 is an explanatory view of a conventional phosphor screen forming process of a color cathode ray tube.

Claims (3)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】内面にフォトレジストを塗布したガラスパ
ネルにシャドウマスクを介して露光しレジストパターン
を形成した後吸光性物質を塗布して、乾燥し、その後前
記レジストパターンを除去して蛍光体配置部に開口部を
有する吸光性物質膜を形成する工程を具備したカラー陰
極線管の蛍光面形成方法において、前記吸光性物質の乾
燥状態をパネル中央部は完全に、周辺部は若干不完全に
制御して前記開口部の形状を周辺部の開口部径を中央部
の開口部径より大きく調整することを特徴とするカラー
陰極線管の蛍光面形成方法。
1. A glass panel having an inner surface coated with a photoresist is exposed through a shadow mask to form a resist pattern, coated with a light-absorbing substance, dried, and then the resist pattern is removed. A method of forming a phosphor screen of a color cathode ray tube comprising a step of forming a light absorbing material film having an opening in a portion, wherein the dry state of the light absorbing material is completely in the center of the panel and slightly incomplete in the peripheral portion. controlling the shape of the opening so that the diameter of the opening at the periphery is at the center.
A method for forming a fluorescent screen of a color cathode ray tube, wherein the diameter is adjusted to be larger than the diameter of the opening .
【請求項2】前記乾燥状態を制御する方法が複数のブロ
ックに分割した乾燥用ヒータの配置パターンとブロック
毎の出力調整で行なうことを特徴とする請求項1記載の
カラー陰極線管の蛍光面形成方法。
2. A fluorescent screen forming method for a color cathode ray tube according to claim 1, wherein said method of controlling the drying state is performed by adjusting an arrangement pattern of a drying heater divided into a plurality of blocks and an output of each block. Method.
【請求項3】前記乾燥状態を制御する方法が複数の温風
噴射ノズルの配置パターンとノズル毎の温風温度調整で
行なうことを特徴とする請求項1記載のカラー陰極線管
の蛍光面形成方法。
3. The method for forming a fluorescent screen of a color cathode ray tube according to claim 1, wherein the method of controlling the drying state is performed by an arrangement pattern of a plurality of hot air jet nozzles and a hot air temperature adjustment for each nozzle. .
JP06312888A 1994-12-16 1994-12-16 Method for forming phosphor screen of color cathode ray tube Expired - Fee Related JP3132316B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP06312888A JP3132316B2 (en) 1994-12-16 1994-12-16 Method for forming phosphor screen of color cathode ray tube

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP06312888A JP3132316B2 (en) 1994-12-16 1994-12-16 Method for forming phosphor screen of color cathode ray tube

Publications (2)

Publication Number Publication Date
JPH08171853A JPH08171853A (en) 1996-07-02
JP3132316B2 true JP3132316B2 (en) 2001-02-05

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Country Status (1)

Country Link
JP (1) JP3132316B2 (en)

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* Cited by examiner, † Cited by third party
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