JP3127647U - Waste gas discharge device - Google Patents

Waste gas discharge device Download PDF

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JP3127647U
JP3127647U JP2006007907U JP2006007907U JP3127647U JP 3127647 U JP3127647 U JP 3127647U JP 2006007907 U JP2006007907 U JP 2006007907U JP 2006007907 U JP2006007907 U JP 2006007907U JP 3127647 U JP3127647 U JP 3127647U
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waste gas
peripheral surface
gas discharge
inflow
inner peripheral
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アン，セヨン
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    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F23—COMBUSTION APPARATUS; COMBUSTION PROCESSES
    • F23J—REMOVAL OR TREATMENT OF COMBUSTION PRODUCTS OR COMBUSTION RESIDUES; FLUES 
    • F23J15/00—Arrangements of devices for treating smoke or fumes
    • F23J15/08—Arrangements of devices for treating smoke or fumes of heaters
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F23—COMBUSTION APPARATUS; COMBUSTION PROCESSES
    • F23L—SUPPLYING AIR OR NON-COMBUSTIBLE LIQUIDS OR GASES TO COMBUSTION APPARATUS IN GENERAL ; VALVES OR DAMPERS SPECIALLY ADAPTED FOR CONTROLLING AIR SUPPLY OR DRAUGHT IN COMBUSTION APPARATUS; INDUCING DRAUGHT IN COMBUSTION APPARATUS; TOPS FOR CHIMNEYS OR VENTILATING SHAFTS; TERMINALS FOR FLUES
    • F23L17/00—Inducing draught; Tops for chimneys or ventilating shafts; Terminals for flues
    • F23L17/16—Induction apparatus, e.g. steam jet, acting on combustion products beyond the fire
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment

Abstract

【課題】半導体製造工程で発生する廃棄ガスを移動速度を早く排出させた廃棄ガス排出装置の提供。
【解決手段】流入部材２の案内環鍔部と拡管部との間に、吸気口と通じる噴出溝が形成され、拡管部の外周面と流入部材の内周面との間に噴出溝と通じる高圧ガス室が形成されるように、流入部材に結合される排出部材と、上記排出部材の上部に嵌め込まれて結合され、内周面に10〜12個の案内溝が9〜11゜の傾斜度を有するように縦方向で傾くように形成された延長部材６と、上記排出部材の外部に離間されるように設置されて加熱室を形成する外部カバーと、上記加熱室内に設置される電熱装置と、上記電熱装置の温度を制御する温度感知部と、上記加熱室の外部カバーの外部に設置され、複数個の打孔９０を持つ保護カバー９と、上記保護カバー及び外部カバーの上、下部を閉塞するように設置される上、下部閉塞板を含んで成る。
【選択図】図1Disclosed is a waste gas discharge device that discharges waste gas generated in a semiconductor manufacturing process at a high moving speed.
An ejection groove that communicates with an intake port is formed between a guide ring portion of an inflow member and an expanded pipe portion, and communicates with the ejection groove between an outer peripheral surface of the expanded portion and an inner peripheral surface of the inflow member. In order to form a high-pressure gas chamber, a discharge member coupled to the inflow member, and an upper portion of the discharge member are coupled to each other, and 10 to 12 guide grooves are inclined at 9 to 11 ° on the inner peripheral surface. An extension member 6 formed so as to be inclined in the vertical direction so as to have a degree, an external cover installed so as to be separated from the discharge member and forming a heating chamber, and electric heat installed in the heating chamber A device, a temperature sensing unit for controlling the temperature of the electric heating device, a protective cover 9 installed outside the outer cover of the heating chamber and having a plurality of punching holes 90, on the protective cover and the outer cover, It is installed so as to close the lower part and includes a lower closing plate.
[Selection] Figure 1

Description

本考案は廃棄ガス排出装置に関し、半導体またはLCD製造装置から発生する非反応副産物による真空配管及び排気配管内部の未反応副産物累積を最小化することができる廃棄ガス排出装置に関する。   The present invention relates to a waste gas discharge device, and more particularly to a waste gas discharge device capable of minimizing the accumulation of unreacted by-products in vacuum piping and exhaust piping due to non-reactive by-products generated from a semiconductor or LCD manufacturing device.

一般的に、LCD製造及び半導体製造工程は大きく前工程(Fabrication工程)と後工程(Assembly工程)からなり、前工程とは、各種プロセスチェンバー(Chamber)内で基板上に薄膜を蒸着し、蒸着された薄膜を選択的に蝕刻する過程を繰り返して遂行し、特定のパターンを加工することにより、いわゆる、チップ(Chip)を製造する工程を言い、後工程とは、上記の前工程で製造されたチップを個別的に分離した後、リードフレームと結合して完製品で組立てる工程を言う。   In general, the LCD manufacturing and semiconductor manufacturing processes are largely composed of a pre-process (Fabrication process) and a post-process (Assembly process), and the pre-process consists of depositing a thin film on a substrate in various process chambers (Chamber) The process of selectively etching the thin film is performed repeatedly, and a specific pattern is processed to manufacture a so-called chip, and the post-process is manufactured in the above-mentioned pre-process. This refers to the process of separating the chips individually and then combining them with the lead frame and assembling them as finished products.

この際、上記基板上に薄膜を蒸着するか、基板上に蒸着された薄膜を蝕刻する工程は、プロセスチェンバー内で、シラン(Silane)、アルシン(Arsine)及び塩化ホウ素などの有害ガスと水素などのプロセスガスを用いて高温で遂行され、上記工程が進行される間、プロセスチェンバー内部には各種発火性ガスと腐食性異物及び有毒成分を含んだ有害ガス(以下‘廃棄ガス’という)などが多量発生するようになる。   At this time, a process of depositing a thin film on the substrate or etching a thin film deposited on the substrate is performed in a process chamber, such as silane (Silane), arsine (Arsine) and boron chloride, hydrogen, etc. The process chamber is filled with various ignitable gases, corrosive foreign substances and toxic components (hereinafter referred to as 'waste gas'). A large amount comes out.

従って、LCD及び半導体製造装備には、プロセスチェンバーを真空状態にする真空ポンプの後端に、上記プロセスチェンバーから排出される廃棄ガスを浄化させた後、大気に放出するスクラバー(Scrubber)を設置する。   Therefore, in the LCD and semiconductor manufacturing equipment, a scrubber that purifies the waste gas discharged from the process chamber and then releases it to the atmosphere is installed at the rear end of the vacuum pump that puts the process chamber in a vacuum state. .

しかし、上記プロセスチェンバーから排出される廃棄ガスすなわち、未反応副産物は大気と接触するか周辺の温度が低ければ固形化されてパウダーに変わることになるが、上記パウダーは排気ラインに固着されて、排気圧力を上昇させると共に真空ポンプに流入される場合、真空ポンプの故障を誘発し、廃棄ガスの逆流をもたらしてプロセスチェンバー内にある基板を汚染させるとの問題点があった。   However, the waste gas discharged from the process chamber, that is, the unreacted by-product is solidified and turns into powder if it comes into contact with the atmosphere or the surrounding temperature is low, but the powder is fixed to the exhaust line, When the exhaust pressure is increased and the vacuum pump is flown into the vacuum pump, there is a problem in that the vacuum pump is caused to malfunction, and the waste gas is caused to flow backward to contaminate the substrate in the process chamber.

このような問題を解決するための方案であって、廃棄ガスを迅速に排出させるための多様な形態の廃棄ガス排出装置が提案されている。
上述した廃棄ガス排出装置の先行技術として大韓民国登録実用新案20-0275417号が開始されている。 In order to solve such a problem, various forms of waste gas discharge devices for quickly discharging waste gas have been proposed.
As a prior art of the above-mentioned waste gas discharge apparatus, the Korean registered utility model No. 20-0275417 has been started.

しかし、上述した従来廃棄ガス排出装置は、廃棄ガスの排出力が弱くて比較的短い距離までしか廃棄ガスの排出駆動力が作用しないので、真空ポンプからガススクラバーまでの距離が遠い場合、一定距離毎に、このような排出装置をいくつも設置しなければならないし、これに比例してシステム設備に所要される費用が増加されるとの問題点があった。   However, the above-mentioned conventional waste gas discharge device has a weak waste gas discharge force and a waste gas discharge driving force acts only up to a relatively short distance. Therefore, when the distance from the vacuum pump to the gas scrubber is long, a certain distance is required. Each time, a number of such discharge devices must be installed, and there is a problem that the cost required for the system equipment increases in proportion to this.

本考案は上述した従来技術の問題点を解決するため案出されたもので、半導体製造工程で発生される廃棄ガスを捕集して排出させるが、移動速度を早く増加させることで、もっと遠い距離まで排出することができ、これによって、より少ない排出装置にでも十分な排出効果を発現することができるので、廃棄ガス排出システムを構築するに所要の設置費用を減らすことができるようにした廃棄ガス排出装置を提供するにその目的がある。   The present invention was devised to solve the above-mentioned problems of the prior art, and collects and discharges waste gas generated in the semiconductor manufacturing process, but it is farther away by increasing the moving speed faster. Disposal that can reduce the installation cost required to build a waste gas discharge system, because it can be discharged to a distance, which can produce a sufficient discharge effect even with fewer discharge devices The purpose is to provide a gas discharge device.

上述した目的を果たすため、本考案は、
両端部が開口され、側面に複数個の吸気口が形成され、内周面に固定鍔と案内環鍔部が形成された流入部材と、両端部が開口され、外周面に上記固定鍔に支持される支持鍔が形成され、下端には外側に向かう拡管部が形成されることで、上記流入部材の案内環鍔部と上記拡管部との間に、上記吸気口と通じる噴出溝が形成され、上記拡管部の外周面と流入部材の内周面との間に噴出溝と通じる高圧ガス室が形成されるように、流入部材に結合される排出部材と、上記排出部材の上部に嵌め込まれて結合され、内周面に10〜12個の案内溝が9゜〜11゜の傾斜度を有するように縦方向に傾斜して形成された延長部材と、上記排出部材の外部に離間して設置されて加熱室を形成する外部カバーと、上記加熱室内に設置される電熱装置と、上記電熱装置の温度を制御する温度感知部と、上記加熱室の外部カバーの外部に設置され、複数個の打孔を有する保護カバー及び上記保護カバー及び外部カバーの上、下部を閉塞するように設置される上、下部閉塞板を含んでなることを特徴とする。 In order to achieve the above-mentioned purpose, the present invention
Both ends are opened, a plurality of air inlets are formed on the side, an inflow member having a fixed collar and a guide ring collar formed on the inner circumferential surface, and both ends are opened and supported by the stationary collar on the outer circumferential surface A support rod is formed, and an expanded pipe portion extending outward is formed at the lower end, so that an ejection groove communicating with the intake port is formed between the guide ring flange portion of the inflow member and the expanded tube portion. A discharge member coupled to the inflow member and an upper portion of the discharge member so that a high-pressure gas chamber communicating with the ejection groove is formed between the outer peripheral surface of the expanded pipe portion and the inner peripheral surface of the inflow member. And an extension member formed by inclining in the vertical direction so that 10 to 12 guide grooves have an inclination of 9 ° to 11 ° on the inner peripheral surface, and spaced apart from the discharge member. An external cover installed to form a heating chamber, an electric heating device installed in the heating chamber, and an electric heating device A temperature sensing unit for controlling temperature, and a protective cover installed outside the outer cover of the heating chamber and having a plurality of punched holes and the protective cover and the outer cover. And a lower closing plate.

また、本考案の廃棄ガス排出装置において、上記流入部材は内周面に10〜12個の案内溝が9゜〜11゜の傾斜度を有するように、縦方向に傾くように形成されることを特徴とする。   In the waste gas discharge apparatus of the present invention, the inflow member is formed to be inclined in the vertical direction so that 10 to 12 guide grooves have an inclination of 9 ° to 11 ° on the inner peripheral surface. It is characterized by.

また、本考案の廃棄ガス排出装置において、上記流入部材の下端開口部と隣接された内周面には内側に向けた隆起部が形成され、上記隆起部からつながって、上記案内環鍔部まで急に外側に向かうようにした傾斜部が形成されることを特徴とする。   Further, in the waste gas discharge device of the present invention, a ridge portion directed inward is formed on the inner peripheral surface adjacent to the lower end opening of the inflow member, and is connected from the ridge to the guide ring portion. An inclined portion that suddenly goes outward is formed.

また、本考案の廃棄ガス排出装置において、上記流入部材の案内溝は直線形であることを特徴とする。   In the waste gas discharge apparatus of the present invention, the guide groove of the inflow member is a straight line.

また、本考案の廃棄ガス排出装置において、上記流入部材の案内溝は湾曲形であることを特徴とする。   In the waste gas discharge apparatus of the present invention, the guide groove of the inflow member is curved.

また、本考案の廃棄ガス排出装置において、上記延長部材の案内溝は直線形であることを特徴とする。   In the waste gas discharge apparatus of the present invention, the guide groove of the extension member is linear.

また、本考案の廃棄ガス排出装置において、上記延長部材の案内溝は湾曲形であることを特徴とする。   In the waste gas discharge apparatus of the present invention, the guide groove of the extension member is curved.

上述したように、本考案の廃棄ガス排出装置によると、廃棄ガスを捕集して排出させるが、移動速度を早く増加させることで、もっと遠い距離まで排出することができて、より少ない装置にでも十分な排出効果を発現することができるので、廃棄ガス排出システムを構築するに所要される設置費用を減らすことができる効果を発現する。   As described above, according to the waste gas discharge device of the present invention, the waste gas is collected and discharged, but by increasing the moving speed faster, it can be discharged to a farther distance, and the number of devices is less. However, since a sufficient emission effect can be exhibited, the installation cost required for constructing a waste gas emission system can be reduced.

以下、本考案の望ましい実施の形態を添付した図面に基づいて詳細に説明すれば次のようである。   Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings.

添付した図1は、本考案に係る廃棄ガス排出装置に対する結合された斜視図であり、図2は、本考案に係る廃棄ガス排出装置に対する分解斜視図であり、図3は、本考案に係る廃棄ガス排出装置に対する断面図である。   FIG. 1 is a combined perspective view of a waste gas discharge device according to the present invention, FIG. 2 is an exploded perspective view of a waste gas discharge device according to the present invention, and FIG. It is sectional drawing with respect to a waste gas discharge device.

本考案を説明するにおいて、同一の構成に対しては、同一符号を付けて、重複される説明は省略することにし、廃棄ガスの移動方向を基準として流入側を下部とし、排出側を上部とする。   In the description of the present invention, the same components are denoted by the same reference numerals, and redundant descriptions are omitted. The inflow side is defined as the lower side and the exhaust side is defined as the upper side based on the direction of waste gas movement. To do.

図1ないし図3に示したように、本考案に係る廃棄ガス排出装置Aは、廃棄ガスが流入される流入部材2と、上記流入部材2の上部に結合されて、廃棄ガスの排出を案内する排出部材4と、上記排出部材4の上部に結合され、廃棄ガスを排出させる延長部材6と、上記排出部材4の外側に設置された外部と、上記外部カバー8の内側に設けられた電熱装置5と、上記外部カバー8の外側に設けられた保護カバー9と、から構成される。   As shown in FIGS. 1 to 3, the waste gas discharge apparatus A according to the present invention is connected to the inflow member 2 into which the waste gas flows and the upper part of the inflow member 2 to guide the discharge of the waste gas. Discharge member 4, an extension member 6 connected to the upper portion of the discharge member 4, and for discharging waste gas, an outside installed on the outside of the discharge member 4, and an electric heat provided on the inside of the external cover 8 The apparatus 5 and a protective cover 9 provided outside the outer cover 8 are configured.

上記流入部材2は、図2及び図3に示したように、上下部が開口された管体形態であって、下端には所定の環鍔が形成されていて、上部の外面には後述される下部閉塞板14が結合される所定の支持鍔231が形成され、上記支持鍔231の上部側壁には吸気孔27が複数形成される。   As shown in FIGS. 2 and 3, the inflow member 2 is in the form of a tube having an open top and bottom, and a predetermined ring is formed at the lower end, which will be described later on the upper outer surface. A predetermined support rod 231 to which the lower closing plate 14 is coupled is formed, and a plurality of intake holes 27 are formed in the upper side wall of the support rod 231.

また、上記流入部材2の内側には、上記支持鍔231が対応される内周面に案内環鍔部25が形成され、下端開口部と隣接した内周面には内側に向けた隆起部23が形成され、上記隆起部23からつながって、上記案内環鍔部25まで急に外側に向かうようにした傾斜部24が形成される。   Further, inside the inflow member 2, a guide ring flange portion 25 is formed on the inner peripheral surface to which the support rod 231 corresponds, and a protruding portion 23 facing inward is formed on the inner peripheral surface adjacent to the lower end opening. Is formed, and an inclined portion 24 is formed which is connected to the raised portion 23 and suddenly goes outward to the guide ring portion 25.

また、図3に示したように、上記案内環鍔部25の下部は、内側上方に向かうように緩慢な傾斜面256が形成される。   In addition, as shown in FIG. 3, a sloping inclined surface 256 is formed at the lower part of the guide ring flange 25 so as to be directed inward and upward.

上記案内環鍔部25の内周面の上部には、後述される排出部材4が支持されるように所定の固定鍔26が形成され、上記固定鍔26の周辺には、密閉のためのO-リング42が介在されることで、排出部材4の外面と密着されるようにする。   A predetermined fixing rod 26 is formed on an upper portion of the inner peripheral surface of the guide ring flange portion 25 so as to support a discharge member 4 to be described later. -The ring 42 is interposed so as to be in close contact with the outer surface of the discharge member 4.

また、上記流入部材2の内周面には、10〜12個の直線形の案内溝22が9゜〜11゜の傾斜度を有するように、縦方向に傾くように形成される。   Further, 10 to 12 linear guide grooves 22 are formed on the inner peripheral surface of the inflow member 2 so as to be inclined in the vertical direction so as to have an inclination of 9 ° to 11 °.

上記排出部材4は、上下部が開口された管体形状であって、上記流入部材2の上部側内部に嵌め込まれて結合されるように、外周面に上記流入部材2の固定鍔26に支持される支持鍔(不図示)が形成される。   The discharge member 4 has a tubular shape with an open top and bottom, and is supported by a fixing rod 26 of the inflow member 2 on the outer peripheral surface so as to be fitted and coupled to the upper side inside the inflow member 2 A support rod (not shown) is formed.

上記排出部材4の下端には外側に拡開された拡管部44が更に形成されることで、流入部材2と排出部材4が結合された時、上記拡管部44の先端と上記流入部材2の案内環鍔部25との間に、所定の噴出溝16が形成されることができ、上記噴出溝16に通じる高圧ガス室18が形成されることができる。   An expanded pipe portion 44 that is expanded outward is further formed at the lower end of the discharge member 4, so that when the inflow member 2 and the discharge member 4 are combined, the tip of the expand portion 44 and the inflow member 2 A predetermined ejection groove 16 can be formed between the guide ring portion 25 and a high-pressure gas chamber 18 communicating with the ejection groove 16 can be formed.

上記延長部材6は上、下部が開口された筒体形状であって、前述した排出部材4の上部に嵌め込まれて結合され廃棄ガスを遠い距離まで排出させる役目をする。   The extension member 6 has a cylindrical shape with an upper and lower part opened, and is fitted into and coupled to the upper part of the discharge member 4 described above, and serves to discharge waste gas to a long distance.

すなわち、上記延長部材6は、下部に上記排出部材4の上端外側に結合される結合部62が形成され、内周面には10〜12個の直線形になった案内溝64が9゜〜11゜の傾斜度を有するように、縦方向に傾くように形成される。   That is, the extension member 6 is formed with a coupling portion 62 that is coupled to the outside of the upper end of the discharge member 4 at the lower portion, and 10 to 12 linear guide grooves 64 are formed on the inner peripheral surface at 9 ° to It is formed to incline in the vertical direction so as to have an inclination of 11 °.

上記外部カバー8は上、下部が開口された円筒形状であって、前述した排出部材4の外側に挿入されて離間して設置される。   The outer cover 8 has a cylindrical shape with upper and lower openings, and is inserted and spaced apart from the discharge member 4 described above.

従って、上記外部カバー8と排出部材4との間に形成された空間すなわち、加熱室82に電熱装置5が更に設置されることで、上記加熱室82に流入された窒素ガスN2に対する加熱作業を遂行することができる。 Therefore, a space formed between the outer cover 8 and the discharge member 4, that is, the heating operation for the nitrogen gas N 2 flowing into the heating chamber 82 by further installing the electric heating device 5 in the heating chamber 82. Can be carried out.

上記電熱装置5は、図3に示したように、熱効率がすぐれた銅パイプ52の内に熱線(不図示)を挿入して、電源の印加により発熱される加熱コイル54が適当であり、以外にも発熱のための装置であれば、いずれのものを使っても構わない。   As shown in FIG. 3, the electric heating device 5 has a heating coil 54 (not shown) inserted into a copper pipe 52 with excellent thermal efficiency, and a heating coil 54 that generates heat by applying power is appropriate. In addition, any device that generates heat may be used.

上記加熱コイル54は、収納筒体56の内に設置されるが、上記収納筒体56は上、下部が開口された円筒体であり、上記収納筒体56の下端には、所定の端鍔562が形成されることで、上記収納筒体56の内壁に加熱コイル54が巻かれて配置される時、上記端鍔562によって加熱コイル54が支持されるようにすることで垂れる現状を防止することができる。   The heating coil 54 is installed in a storage cylinder 56. The storage cylinder 56 is a cylindrical body having an upper and a lower opening, and a predetermined terminal is provided at a lower end of the storage cylinder 56. By forming 562, when the heating coil 54 is wound around the inner wall of the storage cylinder 56, the heating coil 54 is supported by the terminal rod 562, thereby preventing the current situation from drooping. be able to.

上記加熱室82には、電熱装置5の温度を感知して適正な温度に維持するための温度感知部7が更に設置されるが、望ましくは後述される保護カバー9の通孔94を介して挿入されて設置される。   The heating chamber 82 is further provided with a temperature sensing unit 7 for sensing the temperature of the electric heating device 5 and maintaining it at an appropriate temperature, preferably through a through hole 94 of the protective cover 9 described later. Inserted and installed.

上記外部カバー8の外側には、やけど事故を防止するため、保護カバー9が設置されるが、上記保護カバー9は上、下部が開口された円筒形状であり、上記外部カバー8より直径がもっと大きく形成されることで、外部カバー8と離間するように設置される。   A protective cover 9 is installed outside the outer cover 8 to prevent a burn accident. The protective cover 9 has a cylindrical shape with an opening at the top and bottom, and has a diameter larger than that of the outer cover 8. By being formed large, it is installed so as to be separated from the outer cover 8.

上記保護カバー9には、複数個の打孔90が形成されることで、発熱を図り、空気による冷却が可能である。   The protective cover 9 is formed with a plurality of punching holes 90 so that heat can be generated and cooling with air is possible.

また、上記保護カバー9には、前述した電熱装置5の銅パイプ52が挿入される通孔92と、上記温度感知部7が設置される通孔94と、窒素ガスが流入される通孔96が更に形成されている。   The protective cover 9 has a through hole 92 into which the copper pipe 52 of the electric heating device 5 described above is inserted, a through hole 94 in which the temperature sensing unit 7 is installed, and a through hole 96 into which nitrogen gas is introduced. Is further formed.

上記上部閉塞板12は、図2及び図3に示したように、中心部に前述した延長部材6が貫通されるように通孔120が形成され、複数個のボルト締結孔122が形成された円板であって、上記延長部材6の外側に嵌め込まれて結合された後、前述した排出部材4及び外部カバー8、保護カバー9の上端部に結合される。   As shown in FIGS. 2 and 3, the upper blocking plate 12 is formed with a through hole 120 at the center so that the extension member 6 is penetrated, and a plurality of bolt fastening holes 122 are formed. It is a disc, and is fitted to the outside of the extension member 6 and coupled thereto, and then coupled to the discharge member 4, the outer cover 8, and the upper end of the protective cover 9 described above.

上記下部閉塞板14は、前述した上部閉塞板12と同一の直径を有し、中心部に流入部材2が貫通される通孔140が形成され、複数個のボルト締付け孔142が形成された円板状であって、上記流入部材2の外側に嵌め込まれて結合された後、前述した排出部材4及び外部カバー8、保護カバー9の下端部に結合される。   The lower closing plate 14 has the same diameter as the upper closing plate 12 described above, a through hole 140 through which the inflow member 2 passes is formed at the center, and a circle in which a plurality of bolt fastening holes 142 are formed. It is plate-shaped, and is fitted and joined to the outside of the inflow member 2, and then joined to the discharge member 4, the outer cover 8, and the lower end of the protective cover 9 described above.

従って、所定長さを有するボルト100を上部閉塞板12のボルト締結孔122に挿入した後、上記ボルト100の末端が下部閉塞板14のボルト締付け孔142に締結することで、上記上部閉塞板12と下部閉塞板14が固定設置されることができる。   Therefore, after the bolt 100 having a predetermined length is inserted into the bolt fastening hole 122 of the upper closing plate 12, the end of the bolt 100 is fastened to the bolt fastening hole 142 of the lower closing plate 14, so that the upper closing plate 12 is The lower closing plate 14 can be fixedly installed.

このように構成された本考案の作動関係を説明すると次のようである。
本考案の廃棄ガス排出装置Aは、真空ポンプ(不図示)とガススクラバー(不図示)との間に設置されるが、これに対しては、公知された技術事項であるので詳細な説明は省略する。 The operational relationship of the present invention configured as described above will be described as follows.
The waste gas discharge device A of the present invention is installed between a vacuum pump (not shown) and a gas scrubber (not shown), but since this is a known technical matter, a detailed explanation is provided. Omitted.

窒素ガス(N2)が前述した流入部材2の吸気孔27を通じて加熱室82に流入されると、上記電熱装置5によって加熱される。このように加熱された窒素ガスは更に上記流入部材2の吸気孔27を通じて上記高圧ガス室18と噴出溝16を順次に通過して上記排出部材4に流入される。 When nitrogen gas (N 2 ) flows into the heating chamber 82 through the intake hole 27 of the inflow member 2 described above, it is heated by the electric heating device 5. The nitrogen gas thus heated further passes through the high-pressure gas chamber 18 and the ejection groove 16 sequentially through the intake hole 27 of the inflow member 2 and flows into the exhaust member 4.

この際、上記排出部材4に流入された窒素ガスは、前述した拡管部44によって案内されて排出されるが、上記拡管部44を通しながら、流速が早くなるので、これによって、流入部材2内部の圧力が外部の圧力より低くなり、吸入力が発生される。   At this time, the nitrogen gas that has flowed into the discharge member 4 is guided and discharged by the above-mentioned expanded pipe portion 44, but the flow velocity increases while passing through the expanded pipe portion 44. The suction pressure is lower than the external pressure, and suction force is generated.

従って、上記排出部材4に噴出された窒素ガスの流れによって発生された吸入力によって、上記流入部材2から廃棄ガスが流入されて窒素ガスと混合するようになる。   Therefore, the waste gas is introduced from the inflow member 2 and mixed with the nitrogen gas by the suction input generated by the flow of the nitrogen gas ejected to the discharge member 4.

この際、上記流入された廃棄ガスは、前述した高温の窒素ガスによって冷却されず、一定の温度に維持されるので、埃の積もり又は固形化が防止されて、パウダーが形成される弊害を防止することができる。   At this time, the inflowing waste gas is not cooled by the above-described high-temperature nitrogen gas, but is maintained at a constant temperature, so that dust accumulation or solidification is prevented, thereby preventing the problem of forming powder. can do.

特に、上記流入部材2の内周面に形成された案内溝22が多数傾斜しているので、流入された廃棄ガスは、上記案内溝22に乗って移動しながら回転力が得られて、早い速度で上記排出部材4に移動されることができる。   In particular, since a number of guide grooves 22 formed on the inner peripheral surface of the inflow member 2 are inclined, the inflowing waste gas gets on the guide groove 22 while moving, and a rotational force is obtained. It can be moved to the discharge member 4 at a speed.

以後、上記排出部材4に移送された窒素ガスと廃棄ガスは、前述した延長部材6を通過して外部に排出されるが、上記延長部材6の内周面に傾くように形成された多数の案内溝64を通過しながら回転力が発生されて、更に早い速度で噴出されることができて、従来よりずっと遠い距離まで噴出されることができる。   Thereafter, the nitrogen gas and the waste gas transferred to the discharge member 4 pass through the extension member 6 and are discharged to the outside, but a large number of inclined gas is formed on the inner peripheral surface of the extension member 6. Rotational force is generated while passing through the guide groove 64, and can be ejected at a higher speed, and can be ejected to a far distance than before.

従って、前述したように、廃棄ガスは流入部材2を通過しながら発生された回転力によって、瞬間移動速度が早くなり、上記排出部材4を通過した後、延長部材6を通しながら、移動速度が更に早くなる。   Therefore, as described above, the instantaneous moving speed of the waste gas is increased by the rotational force generated while passing through the inflow member 2, and after passing through the discharge member 4, the moving speed is increased while passing through the extension member 6. Even faster.

以上本考案者によってなされた考案を、上記の実施の形態によって具体的に説明したが、本考案は上記実施の形態に限定されるのではなく、その要旨を外れない範囲で様々に変更可能なことは勿論である。   The invention made by the present inventors has been specifically described by the above embodiment. However, the present invention is not limited to the above embodiment, and various modifications can be made without departing from the scope of the invention. Of course.

すなわち、前述した実施の形態では、流入部材2及び延長部材6に形成された案内溝(22、64)は直線形で説明したが、必ずこれに限定されず、上記案内溝(22、64)の他の実施の形態として湾曲した形状で形成することもできる。   That is, in the above-described embodiment, the guide grooves (22, 64) formed in the inflow member 2 and the extension member 6 have been described as being linear, but the guide grooves (22, 64) are not necessarily limited thereto. As another embodiment, it can be formed in a curved shape.

本考案に係る廃棄ガス排出装置に対する結合された斜視図である。1 is a combined perspective view of a waste gas discharge device according to the present invention. 本考案に係る廃棄ガス排出装置に対する分解斜視図である。1 is an exploded perspective view of a waste gas discharge device according to the present invention. 本考案に係る廃棄ガス排出装置に対する断面図である。It is sectional drawing with respect to the waste gas discharge device which concerns on this invention.

符号の説明Explanation of symbols

2：流入部材
4：排出部材
6：延長部材
7：温度感知部
8：外部カバー
9：保護カバー
22：案内溝
23：隆起部
24：傾斜部
25：案内環鍔部
44：拡管部
64：案内溝 2: Inflow member
4: Discharge member
6: Extension member
7: Temperature sensor
8: External cover
9: Protective cover
22: Guide groove
23: Uplift
24: Inclined part
25: Guide environment
44: Tube expansion section
64: Guide groove

Claims (8)

両端部が開口され、側面に複数個の吸気口が形成され、内周面に固定鍔と案内環鍔部が形成された流入部材と、
両端部が開口され、外周面に上記固定鍔に支持される支持鍔が形成され、下端には外側に向かう拡管部が形成されることで、上記流入部材の案内環鍔部と上記拡管部との間に、上記吸気口と通じる噴出溝が形成され、上記拡管部の外周面と流入部材の内周面との間に噴出溝と通じる高圧ガス室が形成されるように流入部材に結合される排出部材と、
上記排出部材の上部に嵌め込まれて結合され、内周面に10〜12個の案内溝が9゜〜11゜の傾斜度を有するように縦方向で傾くように形成された延長部材と、
上記排出部材の外部に離間して設置されて加熱室を形成する外部カバーと、
上記加熱室内に設置されて内側に加熱コイルがグォンフェドエン収納筒体で構成された電熱装置と、
上記電熱装置の温度を制御する温度感知部と、
上記加熱室の外部カバーの外部に設置されて複数個の打孔を有する保護カバーと、
上記保護カバー及び外部カバーの上、下部を閉塞するように設置される上、下部閉塞板と、を含んでなることを特徴とする廃棄ガス排出装置。 An inflow member having both ends opened, a plurality of air inlets formed on a side surface, and a fixed rod and a guide ring rod portion formed on an inner peripheral surface;
Both ends are opened, a support rod supported by the fixed rod is formed on the outer peripheral surface, and a tube expansion portion toward the outside is formed at the lower end, so that the guide ring flange portion and the tube expansion portion of the inflow member are formed. A jet groove that communicates with the intake port is formed between the inlet member and the inflow member so that a high pressure gas chamber that communicates with the jet groove is formed between the outer peripheral surface of the expanded pipe portion and the inner peripheral surface of the inflow member. A discharge member;
An extension member that is fitted and coupled to the upper part of the discharge member, and is formed so that 10 to 12 guide grooves are inclined in the vertical direction so as to have an inclination of 9 ° to 11 ° on the inner peripheral surface;
An external cover which is installed outside the discharge member and forms a heating chamber;
An electric heating device installed in the heating chamber and having a heating coil formed of a Gonfedoene storage cylinder inside;
A temperature sensing unit for controlling the temperature of the electric heating device;
A protective cover having a plurality of punched holes installed outside the outer cover of the heating chamber;
A waste gas discharge device comprising: an upper cover plate and an upper cover plate which are installed to close the upper and lower portions of the protective cover and the outer cover. 第1項において、
上記流入部材は、内周面に10〜12個の案内溝が9゜〜11゜の傾斜度を有するように縦方向に傾くように形成されたことを特徴とする廃棄ガス排出装置。 In paragraph 1,
The waste gas discharging apparatus according to claim 1, wherein the inflow member is formed so that 10 to 12 guide grooves are inclined in the longitudinal direction on the inner peripheral surface so as to have an inclination of 9 to 11 degrees. 第1項または第2項において、
上記流入部材の下端開口部と隣接された内周面には内側に向けた隆起部が形成され、上記隆起部からつながって上記案内環鍔部まで急に外側に向かうようにした傾斜部が形成されたことを特徴とする廃棄ガス排出装置。 In paragraph 1 or 2,
The inner peripheral surface adjacent to the lower end opening of the inflow member is formed with a raised portion directed inward, and an inclined portion is formed which is connected to the raised portion and suddenly goes outward to the guide ring portion. A waste gas discharge device characterized by being made. 第3項において、
上記電熱装置の収納筒体は上、下部が開口され、下端には端鍔が形成されたことを特徴とする廃棄ガス排出装置。 In Section 3,
The waste gas discharging apparatus according to claim 1, wherein the storage cylinder of the electric heating device has an upper and lower opening, and a lower end is formed with a terminal. 第4項において、
上記流入部材の案内溝は、直線形であることを特徴とする廃棄ガス排出装置。 In section 4,
The waste gas discharge device according to claim 1, wherein the guide groove of the inflow member is linear. 第4項において、
上記流入部材の案内溝は、湾曲形であることを特徴とする廃棄ガス排出装置。 In section 4,
The waste gas discharge device according to claim 1, wherein the guide groove of the inflow member is curved. 第4項において、
上記延長部材の案内溝は直線形であることを特徴とする廃棄ガス排出装置。 In section 4,
The waste gas discharge device according to claim 1, wherein the guide groove of the extension member is linear. 第4項において、
上記延長部材の案内溝は湾曲形であることを特徴とする廃棄ガス排出装置。 In section 4,
The waste gas discharge device according to claim 1, wherein the guide groove of the extension member is curved.
JP2006007907U 2006-02-14 2006-09-28 Waste gas discharge device Expired - Fee Related JP3127647U (en)

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