JP3074176B2 - Electron gun for cathode ray tube - Google Patents
Electron gun for cathode ray tubeInfo
- Publication number
- JP3074176B2 JP3074176B2 JP01265203A JP26520389A JP3074176B2 JP 3074176 B2 JP3074176 B2 JP 3074176B2 JP 01265203 A JP01265203 A JP 01265203A JP 26520389 A JP26520389 A JP 26520389A JP 3074176 B2 JP3074176 B2 JP 3074176B2
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- Japan
- Prior art keywords
- electrode
- electron beam
- focusing electrode
- change
- focusing
- Prior art date
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Description
【発明の詳細な説明】 〔産業上の利用分野〕 本発明は螢光体スクリーン全域において低輝度から高
輝度まで高い解像度を得ることのできる電極構造を備え
た陰極線管用電子銃に関する。Description: BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an electron gun for a cathode ray tube having an electrode structure capable of obtaining high resolution from low luminance to high luminance over the entire phosphor screen.
この種の陰極線管（カラーテレビ用受像管、カラーモ
ニタ用受像管等）では、設定輝度に対して最適の解像度
を得るために電子銃のプリフオーカス電極と主レンズ電
極の最適化を行つている。In a cathode ray tube of this type (a picture tube for a color television, a picture tube for a color monitor, etc.), a prefocus electrode and a main lens electrode of an electron gun are optimized in order to obtain an optimum resolution for a set luminance.
陰極線管の明るさを維持して解像度を向上させるため
には、電子ビームの電流量が多い高電流域における螢光
体スクリーン面上に生成される輝点である電子ビームス
ポツトが径小でかつ真円に近いものでなければならな
い。In order to maintain the brightness of the cathode ray tube and improve the resolution, the electron beam spot, which is the bright spot generated on the phosphor screen surface in the high current region where the electron beam current is large, has a small diameter and It must be close to a perfect circle.
しかし、電子銃から螢光体スクリーン面に至る電子ビ
ーム軌道は電子ビームの偏向角度の増大に伴つて長大と
なるので、螢光体スクリーン面の中央部において径小で
かつ真円の電子ビームスポツトが得られる最適フオーカ
ス電圧に保つと、螢光体スクリーン面の周辺部ではオー
バフオーカスの状態となり、周辺部において良好な電子
ビームスポツトおよび高い解像度を得ることができなく
なる。そこで、電子ビームの偏向角の増大に伴つてフオ
ーカス電圧を高めて主レンズ電界を弱める，所謂ダイナ
ミツクフオーカス方式が採用されているのであるが、こ
の方式は、以下に説明するように、インライン型カラー
陰極線管の駆動には適しない。However, since the trajectory of the electron beam from the electron gun to the phosphor screen becomes longer as the deflection angle of the electron beam increases, the electron beam spot having a small diameter and a perfect circle at the center of the phosphor screen is obtained. Is maintained at the optimum focus voltage at which the laser beam can be obtained, an overfocus state occurs at the peripheral portion of the phosphor screen surface, and it becomes impossible to obtain a good electron beam spot and a high resolution in the peripheral portion. Therefore, a so-called dynamic focus method is adopted in which the focus voltage is increased with an increase in the deflection angle of the electron beam to weaken the electric field of the main lens. This method, as described below, employs an in-line method. It is not suitable for driving a type color cathode ray tube.
３つの電子ビーム出射部を水平走査方向一直線上に配
列してなるインライン型カラー陰極線管では、セルフコ
ンバーゼンス効果を得るために水平偏向磁界をピンクツ
シヨン状に、垂直偏向磁界をバレル状に、それぞれ歪ま
せているので、ここを通過した電子ビームの断面形状は
歪を持つたものとなる。In an in-line type color cathode-ray tube in which three electron beam emitting portions are arranged on a straight line in the horizontal scanning direction, the horizontal deflection magnetic field is distorted into a pink shape and the vertical deflection magnetic field is distorted into a barrel to obtain a self-convergence effect. Therefore, the cross-sectional shape of the electron beam passing therethrough becomes distorted.
螢光体スクリーン面は、通常横長すなわち電子ビーム
配列方向（水平方向）の辺が長い短形状であるので、水
平方向周辺部での歪が特に大きくなる。Since the phosphor screen surface is usually short and long in the horizontal direction, that is, the side in the electron beam arrangement direction (horizontal direction), the distortion in the peripheral portion in the horizontal direction is particularly large.
第５図は４極レンズ磁界と電子ビームとの関係の説明
図であつて、1,2,3は電子ビーム、４は水平偏向磁界、
５は偏向作用によるビーム移動方向である。FIG. 5 is an explanatory view of the relationship between the quadrupole lens magnetic field and the electron beam, where 1, 2, 3 are the electron beam, 4 is the horizontal deflection magnetic field,
Reference numeral 5 denotes a beam moving direction due to the deflection action.
第６図はピンクツシヨン分布の水平偏向磁界と電子ビ
ームとの関係の説明図であつて、６は２極磁界成分、７
は４極磁界成分、８は偏向作用によるビーム移動方向、
９は電子ビームである。FIG. 6 is an explanatory diagram of the relationship between the horizontal deflection magnetic field of the pink distribution and the electron beam.
Is the quadrupole magnetic field component, 8 is the beam moving direction due to the deflection action,
9 is an electron beam.
第７図はビームスポツトの形状歪の説明図であつて、
9Hは電子ビームの高輝度部（コアー部）、9Lは同じく低
輝度部（ヘイズ部）である。FIG. 7 is an explanatory view of the shape distortion of the beam spot.
9H is a high-luminance portion (core portion) of the electron beam, and 9L is a low-luminance portion (haze portion).
以下、第５図乃至第７図を参照して磁界分布と電子ビ
ームスポツトの形状変化について説明する。Hereinafter, the magnetic field distribution and the change in the shape of the electron beam spot will be described with reference to FIGS.
第５図において、同図面の紙面裏側から進行してきた
３本の電子ビーム1,2,3は、ピンクツシヨン状分布の水
平偏向磁界４に入射することにより、矢印５で示す方向
への偏向作用を受ける。すなわち、ピンクツシヨン状分
布の水平偏向磁界４は、第６図（ａ）に示すような２極
磁界成分６と、同図（ｂ）に示すような４極磁界成分７
とから成ると考えることができ、２極磁界成分６が電子
ビーム９に対して矢印８で示す方向への偏向作用を与え
る。In FIG. 5, three electron beams 1, 2, and 3 traveling from the back side of the drawing of FIG. 5 enter a horizontal deflection magnetic field 4 having a pink-thussion distribution, thereby deflecting in a direction indicated by an arrow 5. receive. That is, the horizontal deflection magnetic field 4 having the pink-thussion distribution has a dipole magnetic field component 6 as shown in FIG. 6A and a quadrupole magnetic field component 7 as shown in FIG.
The dipole magnetic field component 6 gives a deflection action to the electron beam 9 in the direction indicated by the arrow 8.
４極磁界成分７は３本の電子ビームにセルフコンバー
ゼンス作用を与えるものであるが、１本の電子ビーム９
についてみると、水平方向に発散作用を、垂直方向に集
束作用を、それぞれ与えるがために、横長偏平の断面形
状となる。The quadrupole magnetic field component 7 gives a self-convergence effect to three electron beams, but one electron beam 9
In order to give a diverging effect in the horizontal direction and a focusing effect in the vertical direction, the cross-sectional shape becomes horizontally long and flat.
ところで、上記発散作用は、電子ビーム偏向角度の増
大に伴い電子ビーム軌道が長大となることによる電子ビ
ームスポツトのオーバフオーカスを打ち消す向きに作用
するので、インライン型カラー受像管では、電子ビーム
スポツトの水平方向に関しては、偏向期間中、最適フオ
ーカス状態に保たれる。しかし、垂直方向に関しては、
上記の集束作用が加わることによつて、オーバフオーカ
スの度合が著しく増す。By the way, the divergence acts in such a direction as to cancel the overfocus of the electron beam spot due to the electron beam trajectory becoming longer with an increase in the electron beam deflection angle. In the horizontal direction, the optimum focus state is maintained during the deflection period. But in the vertical direction,
Due to the addition of the above-described focusing action, the degree of overfocus is significantly increased.
その結果、螢光体スクリーン面の中央部に生成される
電子ビームスポツトが第７図に「00」で示すように円形
となるのに対し、水平方向周辺部に生成される電子ビー
ムスポツトは高輝度のコア−部9Hと低輝度のヘイズ部9L
とからなる非円形に歪み、特にヘイズ部9Lの垂直方向へ
の大きな伸びがフオーカス特性に悪影響を及ぼす。As a result, the electron beam spot generated at the center of the phosphor screen surface becomes circular as shown by "00" in FIG. 7, while the electron beam spot generated at the peripheral portion in the horizontal direction is high. Luminance core part 9H and low luminance haze part 9L
Non-circular distortion of, in particular, a large elongation of the haze portion 9L in the vertical direction adversely affects the focus characteristic.
そして、このような場合、従来のダイナミツクフオー
カス方式を適用すると、この方式が主レンズのレンズ作
用を水平，垂直方向に関係なく均等に弱めるので、垂直
方向についてはヘイズ部9Lを除去しても、すでに最適フ
オーカス状態となつている水平方向は更にアンダーフオ
ーカス状態となり、水平方向の径が増大してしまう。In such a case, if the conventional dynamic focus method is applied, this method uniformly weakens the lens action of the main lens regardless of the horizontal and vertical directions, so that the haze portion 9L is removed in the vertical direction. However, the horizontal direction, which is already in the optimum focus state, is further in the underfocus state, and the diameter in the horizontal direction increases.
この結果、電子ビームスポツトは著しく横長となり、
水平方向の解像度が低下する。As a result, the electron beam spot becomes remarkably oblong,
The horizontal resolution is reduced.
このような問題を解決し、螢光体スクリーン面の全域
において高い解像度を得ることができるようにした陰極
線管装置が本願出願人の出願にかかる特願昭63−230116
号として提案されている。Japanese Patent Application No. 63-230116 filed by the applicant of the present invention discloses a cathode ray tube apparatus which solves such a problem and is capable of obtaining a high resolution over the entire phosphor screen surface.
No. has been proposed.
第８図は上記提案にかかる陰極線管装置の電子銃の説
明図であつて、（ａ）は電子銃の構造を示す断面図、
（ｂ）は第１集束電極を（ａ）の矢印Ａ方向からみた正
面図、（ｃ）は第２の集束電極を（ａ）の矢印Ｂ方向か
らみた正面図である。FIG. 8 is an explanatory view of an electron gun of the cathode ray tube device according to the above proposal, wherein (a) is a sectional view showing the structure of the electron gun,
(B) is a front view of the first focusing electrode viewed from the direction of arrow A in (a), and (c) is a front view of the second focusing electrode viewed from the direction of arrow B in (a).
同図において、K1,K2,K3は熱陰極（以下、単に陰
極）、10は制御電極、20は加速電極、30は第１集束電
極、38はリム電極、40は第２集束電極、50は陽極電極
（以下、単に陽極）、11,12,13,21,22,23,31a,32a,33a,
31b,32b,33b,41a,42a,43a,41b,42b,43b,51,52,53は電子
ビーム通過孔、Ｃは電子銃軸、CBはセンタービーム、SB
1,SB2はサイドビームである。そして、水平方向一直線
上に配列された陰極K1,K2,K3、制御電極10、加速電極2
0、第１集束電極30、第２集束電極40および最終加速電
極である陽極50とでインライン型カラー陰極線管用電子
銃を構成している。In the figure, K 1 , K 2 , and K 3 are hot cathodes (hereinafter simply referred to as cathodes), 10 is a control electrode, 20 is an accelerating electrode, 30 is a first focusing electrode, 38 is a rim electrode, and 40 is a second focusing electrode. , 50 are anode electrodes (hereinafter simply referred to as anodes), 11, 12, 13, 21, 22, 23, 31a, 32a, 33a,
31b, 32b, 33b, 41a, 42a, 43a, 41b, 42b, 43b, 51, 52, 53 are electron beam passage holes, C is an electron gun axis, CB is a center beam, SB
1 and SB 2 are side beams. Then, the cathodes K 1 , K 2 , K 3 arranged on a straight line in the horizontal direction, the control electrode 10 and the acceleration electrode 2
The first focusing electrode 30, the second focusing electrode 40, and the anode 50 as the final accelerating electrode constitute an in-line type color cathode ray tube electron gun.
第１集束電極30は、第２集束電極40側の端面に３個の
円形の電子ビーム通過孔31a,32a、33aを有し、第２集束
電極40に対向して、この電子ビーム通過孔を形成する端
面から上記電子ビーム通過孔を水平方向から挟んで上記
第２集束電極40方向に垂直に植立した４個の平行平板3
4,35,36,37からなる第１の平板電極（垂直板）を有して
いる。The first focusing electrode 30 has three circular electron beam passing holes 31a, 32a, and 33a on the end face on the second focusing electrode 40 side. Four parallel flat plates 3 vertically set in the direction of the second focusing electrode 40 with the electron beam passage hole interposed therebetween in the horizontal direction from the end face to be formed.
It has a first plate electrode (vertical plate) composed of 4,35,36,37.
そして、第１の平板電極を構成する平行平板34,35,3
6,37を包囲し、かつこの平行平板の先端34a,35a,36a,37
aから第２集束電極40側に一定の距離まで延長したリム
電極38を有している。Then, the parallel plates 34, 35, 3 constituting the first plate electrode
6, 37, and the tips 34a, 35a, 36a, 37 of this parallel plate
A rim electrode 38 is extended from a to the second focusing electrode 40 to a certain distance.
上記リム電極38は、第１集束電極30に構造的に接続し
たものとして図示しているが、第１集束電極30と構造的
に独立させ、電気的に同電位となるように接続してもよ
い。Although the rim electrode 38 is illustrated as being structurally connected to the first focusing electrode 30, the rim electrode 38 may be structurally independent of the first focusing electrode 30 and may be electrically connected to the same potential. Good.
また、第２集束電極40は、第１集束電極30側の端面に
３個の円形の電子ビーム通過孔41a,42a,43aを有し、こ
の電子ビーム通過孔を垂直方向から挟んで上記第１集束
電極30方向に水平に植立した一対の平行平板45,46から
なる第２の平板電極（水平板）を有している。Further, the second focusing electrode 40 has three circular electron beam passing holes 41a, 42a, 43a on the end face on the first focusing electrode 30 side, and the first focusing electrode 30 sandwiches the electron beam passing holes from the vertical direction. It has a second flat plate electrode (horizontal plate) composed of a pair of parallel flat plates 45 and 46 stood horizontally in the direction of the focusing electrode 30.
この水平板の対は、各電子ビームに対して各別に、す
なわち３対設けてもよいものである。This pair of horizontal plates may be provided separately for each electron beam, that is, three pairs may be provided.
そして、上記第２の平板電極を構成する平行平板の先
端部45a,46aは第１集束電極30のリム電極38内まで延長
されており、第１集束電極30の平行平板の先端部34a,35
a,36a,37aに対して電子銃軸方向に一定間隔ｌで設置さ
れている。また、陽極50側の端面には３個の円形の電子
ビーム通過孔41b,42b,43bを有している。そして、陽極5
0の第２集束電極40側の端面には３個の円形の電子ビー
ム通過孔51,52,53が設けられており、サイド電子ビーム
通過孔の電子銃軸からの離軸距離S2は、前段電極である
陰極K1,K2,K3、制御電極10、加速電極20、第１集束電極
30、第２集束電極40のサイド電子ビーム通過孔の離軸距
離S1に対して、S2＞S1の関係となつており、第２集束電
極40と陽極50との間で主レンズが形成され、サイド電子
ビームSB1,SB2を螢光体スクリーン面上に集中させるよ
うになつている。The tips 45a and 46a of the parallel plates constituting the second plate electrode extend into the rim electrode 38 of the first focusing electrode 30, and the tips 34a and 35a of the parallel plates of the first focusing electrode 30.
A, 36a, and 37a are provided at a constant interval 1 in the axial direction of the electron gun. The end face on the anode 50 side has three circular electron beam passage holes 41b, 42b, 43b. And the anode 5
The end face of the second focusing electrode 40 side of the 0 is provided with three circular electron beam passage apertures 51, 52, 53, off-axis distance S 2 from the electron gun axis of the side electron beam passage holes, Cathodes K 1 , K 2 , K 3 , control electrodes 10, acceleration electrodes 20, first focusing electrodes
30, with respect to off-axis distance S 1 of the side electron beam passage holes in the second focusing electrode 40, S 2> and relationship with summer S 1, the main lens between the second focusing electrode 40 and the anode 50 The formed side electron beams SB 1 and SB 2 are focused on the phosphor screen surface.
なお、制御電極10および加速電極20は、それぞれ３個
の円形の電子ビーム通過孔11,12,13,21,22,23を有し、
第１集束電極30の加速電極20側の端面には３個の円形の
電子ビーム通過孔31b,32b,33bが形成されている。The control electrode 10 and the acceleration electrode 20 have three circular electron beam passage holes 11, 12, 13, 21, 22, 23, respectively.
Three circular electron beam passage holes 31b, 32b, 33b are formed on the end surface of the first focusing electrode 30 on the side of the acceleration electrode 20.
動作時に各電極に与えられる印加電圧は、陰極に50〜
170V,制御電極に0V,加速電極に400〜800V、第１集束電
極30への印加電圧Vfとして５〜8kV、陽極電圧Ebとして2
5kVであり、また第２集束電極40には電子ビームの垂
直，水平偏向へ同期して変化するダイナミツク電圧DVf
が印加される。このダイナミツク電圧DVfは、電子ビー
ムの偏向量が０のときは第１集束電極30の電圧Vfと同等
の５〜8kVであり、電子ビームの偏向量が増すに従つて
漸次上昇し、電子ビームの偏向量が最大のとき第１集束
電極30の電圧Vfよりも0.4〜1kVだけ高い電位となる。The applied voltage applied to each electrode during operation is 50-
170 V, 0 V for the control electrode, 400 to 800 V for the acceleration electrode, 5 to 8 kV as the applied voltage Vf to the first focusing electrode 30, 2 as the anode voltage Eb
5 kV, and a dynamic voltage DVf that changes in synchronization with vertical and horizontal deflection of the electron beam is applied to the second focusing electrode 40.
Is applied. When the deflection amount of the electron beam is 0, the dynamic voltage DVf is 5 to 8 kV, which is equivalent to the voltage Vf of the first focusing electrode 30, and gradually increases as the deflection amount of the electron beam increases. When the deflection amount is the maximum, the potential becomes 0.4 to 1 kV higher than the voltage Vf of the first focusing electrode 30.
電子ビームの偏向量が０のときは、上記のように、第
１集束電極30と第２集束電極40との間に電位差がないた
め、第１集束電極30内部の平行平板（第１の平板電極：
垂直板）34,35,36、37と第２集束電極40に取付られてい
る平行平板（第２の平板電極：水平板）45,46による電
子ビームへの影響はなく、電子ビームは第２集束電極40
と陽極50との間の主レンズにより螢光体スクリーン面の
中央部で最適フオーカスで集中する。When the deflection amount of the electron beam is 0, since there is no potential difference between the first focusing electrode 30 and the second focusing electrode 40 as described above, a parallel flat plate (the first flat plate) inside the first focusing electrode 30 is used. electrode:
There is no influence on the electron beam by the parallel plates (second plate electrode: horizontal plate) 45, 46 attached to the vertical plates 34, 35, 36, 37 and the second focusing electrode 40. Focusing electrode 40
The main lens between the and the anode 50 concentrates at the optimum focus at the center of the phosphor screen surface.
電子ビームの偏向量が増すと、第２集束電極40の電位
が第１集束電極30の電位よりも高くなることから、第１
集束電極30内部の平行平板（垂直板）34,35,36,37と第
２集束電極40に取付られた平行平板（水平板）45,46と
によつて４極レンズ電界が形成されると共に、第２集束
電極40と陽極50との電位差が減少して主レンズによる集
束作用が弱くなる。When the amount of deflection of the electron beam increases, the potential of the second focusing electrode 40 becomes higher than the potential of the first focusing electrode 30.
A quadrupole lens electric field is formed by parallel flat plates (vertical plates) 34, 35, 36, and 37 inside the focusing electrode 30 and parallel flat plates (horizontal plates) 45 and 46 attached to the second focusing electrode 40. The potential difference between the second focusing electrode 40 and the anode 50 is reduced, and the focusing effect of the main lens is weakened.
第９図は第８図に示した電子銃の第１集束電極と第２
集束電極とによる４極レンズ電界作用の説明図であつ
て、（ａ）は第１集束電極の部分正面図、（ｂ）は第２
集束電極の部分断面図である。FIG. 9 shows the first focusing electrode and the second focusing electrode of the electron gun shown in FIG.
4A and 4B are explanatory views of a quadrupole lens electric field effect by a focusing electrode, wherein FIG. 4A is a partial front view of a first focusing electrode, and FIG.
FIG. 3 is a partial cross-sectional view of a focusing electrode.
同図において、Fh,Fv,Fvvは電界による電子ビームに
作用する力を、また第８図と同一符号は同一部分を示
す。8, Fh, Fv, Fvv denote the forces acting on the electron beam due to the electric field, and the same reference numerals as in FIG. 8 denote the same parts.
第１図集束電極30内部の平行平板（垂直板）3435,36,
37と第２集束電極40に取付られた平行平板（水平板）4
5,46とにより形成される電界は、所謂４極レンズ電界で
あり、同図（ａ）の第１集束電極30内部の垂直板34−3
5,35−36,36−37間（同図には35−36のみ示す）では、
垂直方向にゆるやかな、水平方向ではきつい集束電界が
形成され、電子ビームはFh−Fv（Fh＞Fv）の力で水平方
向に大きく集束される。また、同図（ｂ）の第２集束電
極40に取付られた水平板45−46間では、垂直方向できつ
く、水平方向では殆ど影響のない発散レンズが形成さ
れ、Fvvの力で垂直方向に大きく発散される。Fig. 1 Parallel plate (vertical plate) 3435, 36, inside focusing electrode 30
Parallel plate (horizontal plate) 4 attached to 37 and second focusing electrode 40
5 and 46 is a so-called quadrupole lens electric field, and the vertical plate 34-3 inside the first focusing electrode 30 in FIG.
Between 5,35-36,36-37 (only 35-36 is shown in the figure)
A focused electric field that is gentle in the vertical direction and tight in the horizontal direction is formed, and the electron beam is largely focused in the horizontal direction by the force of Fh-Fv (Fh> Fv). In addition, a divergent lens that is tight in the vertical direction and hardly affected in the horizontal direction is formed between the horizontal plates 45 and 46 attached to the second focusing electrode 40 in FIG. Diversified greatly.
このため、第１集束電極30と第２集束電極40との間で
電子ビームは垂直方向に縦長断面となり、偏向磁界を通
過する電子ビームが、前記第６図で説明したような４極
磁界成分によつて水平方向に横長の断面形状に歪むのと
は逆の作用となり、第１集束電極30と第２集束40の両集
束電極による作用の相殺によつて電子ビームスポツトの
横長偏平化が防止される。For this reason, the electron beam has a vertically long section between the first focusing electrode 30 and the second focusing electrode 40, and the electron beam passing through the deflecting magnetic field has a quadrupole magnetic field component as described in FIG. Is distorted into a horizontally long cross-sectional shape in the horizontal direction, and the horizontal and flattening of the electron beam spot is prevented by canceling out the effects of the first and second focusing electrodes 30 and 40. Is done.
また、電子ビームの偏向量が増すに従い、主レンズの
レンズ倍率が弱くなるので、偏向量が増加した電子ビー
ムが螢光体スクリーン面上でオーバフオーカスとなる度
合も軽減され、螢光体スクリーン面の中央部のみなら
ず、その周辺部においても最適フオーカスで集中させる
ことができ、かつ真円に近い電子ビームスポツトを得る
ことができる。Also, as the deflection amount of the electron beam increases, the lens magnification of the main lens becomes weaker, so that the degree of over-focusing of the electron beam having the increased deflection amount on the phosphor screen surface is reduced, and the phosphor screen is reduced. It is possible to concentrate the electron beam at an optimum focus not only at the center of the surface but also at the periphery thereof, and to obtain an electron beam spot close to a perfect circle.
上記従来の技術においては、設定輝度に対するビーム
スポツト径，並びに電子ビームスポツト形状の最適化は
可能であるが、電子ビームの電流値を変えると、画面上
のビームスポツト径は画面中央部と周辺部とで各々異な
つた変化を示し、画面中央部では水平方向と垂直方向の
ビームスポツト径が同じように変化し、画面周辺部では
垂直方向のビームスポツト径に対し水平方向のビームス
ポツト径の変化が大きく、電流変化による解像度の劣化
は画像中央においては水平方向と垂直方向の両方向で、
また画面周辺部においては水平方向で大きくなる。In the above prior art, it is possible to optimize the beam spot diameter and the electron beam spot shape with respect to the set brightness. However, when the current value of the electron beam is changed, the beam spot diameter on the screen becomes larger at the center and at the periphery of the screen. In the center of the screen, the horizontal and vertical beam spot diameters change in the same way, and in the periphery of the screen, the change in the horizontal beam spot diameter with respect to the vertical beam spot diameter changes. Degradation of resolution due to current change is large in the horizontal and vertical directions at the center of the image,
In the peripheral portion of the screen, the size increases in the horizontal direction.
第10図は電子ビームの電流量の違いによる電子ビーム
スポット形状変化の説明図であつて、（ａ）はビームス
ポツトの輝度分布の概念図で、BMAXは最大輝度（ピーク
輝度）、BMINは最小輝度、ｈは電流量に応じた輝度値、
d10はピーク輝度から10分の１の輝度におけるスポツト
径を示し、同図（ｂ）はカソード電流（μＡ）に対する
d10の関係を示す特性図、同図（ｃ）は画面上の測定位
置の説明図である。FIG. 10 is an explanatory view of a change in the shape of an electron beam spot due to a difference in the amount of current of an electron beam. FIG. 10 (a) is a conceptual diagram of a brightness distribution of a beam spot, where B MAX is the maximum brightness (peak brightness), B MIN Is the minimum luminance, h is a luminance value according to the current amount,
d 10 represents the Supotsuto diameter of 1 of the luminance of 10 minutes from the peak intensity, for the (b) shows the cathode current (.mu.A)
characteristic diagram showing the relationship of d 10, FIG. (c) is an explanatory view of a measuring position on the screen.
同図（ｂ）において、曲線イは画面中央部の垂直方向
径、曲線口は画面中央部の水平方向径、曲線ハは画面周
辺部の垂直方向径、曲線ニは画面周辺部の水平方向径に
おけるそれぞれの変化を示す。In FIG. 8B, curve A is the vertical diameter at the center of the screen, curve mouth is the horizontal diameter at the center of the screen, curve C is the vertical diameter at the screen periphery, and curve D is the horizontal diameter at the screen periphery. Each change in is shown.
この第10図からも、上記した電流変化による解像度の
劣化が画面中央においてはビーム径が水平方向と垂直方
向で同じく太るため水平方向と垂直方向の両方向で、ま
た画面周辺部においては水平方向のビーム径が大きく太
るため水平方向での劣化が大きくなることがわかる。From FIG. 10 as well, it can be seen that the deterioration of the resolution due to the above-described current change is due to the beam diameter increasing in the horizontal direction and the vertical direction in the center of the screen in both the horizontal and vertical directions, and in the peripheral portion of the screen in the horizontal direction. It can be seen that the beam diameter is large and thick, so that the deterioration in the horizontal direction becomes large.
本発明の目的は、上記従来技術の欠点を解消し、電子
ビームのビーム電流の変化に対して該電子ビームのスポ
ツト径を一方向に変化させ、螢光面全域でのビームスポ
ツト径の垂直方向の変化量と水平方向の変化量の比が特
定の範囲となるように設定したことにより、解像度の劣
化を少なくした陰極線管用電子銃を提供することにあ
る。An object of the present invention is to solve the above-mentioned disadvantages of the prior art, and to change the spot diameter of the electron beam in one direction with respect to a change in the beam current of the electron beam, so that the beam spot diameter is perpendicular to the entire fluorescent surface. An object of the present invention is to provide an electron gun for a cathode ray tube in which the deterioration of the resolution is reduced by setting the ratio of the change amount in the horizontal direction to the change amount in the horizontal direction.
上記目的は、電子ビームを出射する陰極、この陰極に
対向して制御電極，加速電極、集束電極，および陽極の
少なくとも一組を配置して成る陰極線管用電子銃におい
て、上記加速電極に円形の電子ビーム通過孔を形成する
と共にその集束電極側に水平方向に長い短形または楕円
形のスリット構造を形成し、上記集束電極を加速電極側
の第１集束電極，陽極電極側の第３集束電極および第１
集束電極と第３集束電極の間に設けた第２集束電極とか
ら構成すると共に、第２集束電極と第３集束電極とは相
対向しその対向する端面に４極レンズ電界を形成する構
造、例えば第２集束電極に電子ビームを水平方向から挟
むように第３集束電極方向に植立した垂直板とこの垂直
板を包囲するリム電極とを設け、第３集束電極に電子ビ
ームを垂直方向から挟むように第２集束電極方向に植立
した水平板とを設け、上記電子銃のカソード電流の所定
の範囲における螢光面全域でのビームスポツト径の垂直
方向の変化量と水平方向の変化量の比が特定の範囲とな
るように設定したことにより達成される。An object of the present invention is to provide a cathode ray tube electron gun comprising at least one set of a control electrode, an accelerating electrode, a focusing electrode, and an anode disposed opposite to the cathode for emitting an electron beam. A beam passing hole is formed, and a short or elliptical slit structure is formed in the focusing electrode side in the horizontal direction. The focusing electrode is a first focusing electrode on the acceleration electrode side, a third focusing electrode on the anode electrode side, and First
A second focusing electrode provided between the focusing electrode and the third focusing electrode, wherein the second focusing electrode and the third focusing electrode are opposed to each other, and a quadrupole lens electric field is formed on the opposite end face; For example, a vertical plate planted in the direction of the third focusing electrode so as to sandwich the electron beam from the horizontal direction in the second focusing electrode and a rim electrode surrounding the vertical plate are provided, and the electron beam is applied to the third focusing electrode from the vertical direction. A horizontal plate implanted in the direction of the second focusing electrode so as to sandwich the same, and a vertical change amount and a horizontal change amount of the beam spot diameter over the entire phosphor screen in a predetermined range of the cathode current of the electron gun. Is set to fall within a specific range.
第２集束電極の電子ビーム通過孔を挟む平行平板電極
（垂直板）及び／または第３集束電極の電子ビーム通過
孔を挟む平行平板電極（水平板）により、４極レンズ電
界が形成される。また、加速電極のスリツトにより画面
中央における電子ビームの電流量によるビームスポツト
形状を、小電流で縦長，大電流で横長として電子ビーム
スポツト径の垂直径の変化量を少なくする。また、加速
電極に対向する第１集束電極にダイナミツクフオーカス
電圧を印加することで垂直方向の電子ビームスポツト径
の増加を抑制し、水平方向の電子ビームスポツト径の大
きさを変化させる。A quadrupole lens electric field is formed by a parallel plate electrode (vertical plate) sandwiching the electron beam passage hole of the second focusing electrode and / or a parallel plate electrode (horizontal plate) sandwiching the electron beam passage hole of the third focusing electrode. The slit of the accelerating electrode is used to reduce the change in the vertical diameter of the electron beam spot diameter by setting the beam spot shape according to the current amount of the electron beam at the center of the screen to be vertical with a small current and horizontal with a large current. Further, by applying a dynamic focus voltage to the first focusing electrode facing the acceleration electrode, an increase in the electron beam spot diameter in the vertical direction is suppressed, and the size of the electron beam spot diameter in the horizontal direction is changed.
これにより、輝度変化に対する垂直方向の電子ビーム
スポツト径の変化量を少なくでき、解像度の差を螢光面
の全面において低減させて良好な画像を映出することが
可能となる。As a result, the amount of change in the electron beam spot diameter in the vertical direction with respect to the change in luminance can be reduced, and the difference in resolution can be reduced over the entire fluorescent screen, so that a good image can be displayed.
以下、本発明の実施例を図面を参照して説明する。 Hereinafter, embodiments of the present invention will be described with reference to the drawings.
第１図は本発明をカラー受像管用電子銃に適用した本
発明の一実施例の説明図であり、（ａ）は電子銃の構成
を示す断面図、（ｂ）は加速電極を（ａ）の矢印Ａ方向
からみた正面図であつて、K1,K2,K3は熱陰極（以下、陰
極）、10は制御電極、20は加速電極、30は第１集束電
極、40は第２集束電極、50は第３集束電極、60は陽極電
極（以下、陽極）、11,12,13,21,22,23,31,32,33、41a,
42a,43a、41b,42b,43b、51a,52a,53a、51b,52b,53b、6
1,62,63は電子ビーム通過孔を示し、44,45,46,47は垂直
板、48はリム電極、54（55）は水平板を示す。また、Ｃ
は電子銃軸、CBはセンタービーム、SB1,SB2はサイドビ
ームである。そして、水平方向一直線上に配列された陰
極K1,K2,K3、制御電極10、加速電極20、第１集束電極3
0、第２集束電極40、第３集束電極50および最終加速電
極である陽極60とでインライン型カラー受像管用電子銃
を構成している。FIG. 1 is an explanatory view of one embodiment of the present invention in which the present invention is applied to an electron gun for a color picture tube. FIG. 1 (a) is a cross-sectional view showing the structure of an electron gun, and FIG. K 1 , K 2 , K 3 are hot cathodes (hereinafter, cathodes), 10 is a control electrode, 20 is an accelerating electrode, 30 is a first focusing electrode, and 40 is a second Focusing electrode, 50 is a third focusing electrode, 60 is an anode electrode (hereinafter, anode), 11, 12, 13, 21, 22, 23, 31, 32, 33, 41a,
42a, 43a, 41b, 42b, 43b, 51a, 52a, 53a, 51b, 52b, 53b, 6
1,62,63 indicate electron beam passage holes, 44,45,46,47 indicate vertical plates, 48 indicate rim electrodes, and 54 (55) indicate horizontal plates. Also, C
Is an electron gun axis, CB is a center beam, and SB 1 and SB 2 are side beams. Then, the cathodes K 1 , K 2 , K 3 arranged on a straight line in the horizontal direction, the control electrode 10, the acceleration electrode 20, and the first focusing electrode 3
The second focusing electrode 40, the third focusing electrode 50, and the anode 60 as the final accelerating electrode constitute an in-line type color picture tube electron gun.
陰極K1,K2,K3と対向配置した制御電極10には３個の電
子ビーム通過孔11,12,13,が形成されている。The control electrode 10 arranged opposite to the cathodes K 1 , K 2 and K 3 has three electron beam passage holes 11, 12 and 13.
加速電極20は３個の円形の電子ビーム通過孔21,22,23
を有し、第１集束電極30側に電子ビーム配列方向に長い
スリツト孔24,25,26が形成されている。このスリツト孔
は３個独立して図示してあるが、これに替えて３個の電
子ビーム通過孔を包囲する一個のスリツトとしてもよ
く、また加速電極20と構造的に独立させ、電気的に同電
位となるように接続してもよい。The accelerating electrode 20 has three circular electron beam passage holes 21, 22, 23.
And slit holes 24, 25, 26 long in the electron beam arrangement direction are formed on the first focusing electrode 30 side. Although the three slit holes are shown independently of each other, one slit surrounding the three electron beam passage holes may be used instead. Alternatively, the slit holes may be structurally independent of the accelerating electrode 20 and electrically connected. They may be connected so as to have the same potential.
第１集束電極30は円形の電子ビーム通過孔31,32,33を
有し、第３集束電極50と電気的に接続されている。ま
た、第１集束電極30の電子ビーム通過孔は、加速電極20
側の電子ビーム通過孔と第２集束電極40側の電子ビーム
通過孔とが必ずしも一致した孔径である必要はなく、加
速電極20側の電子ビーム通過孔の孔径が第２集束電極40
側の孔径より小さくても、また大きくてもよい。また、
第１集束電極30と第２集束電極40は必ず対向して配置し
なければならないというものではなく、第１集束電極30
と第２集束電極40との間に３個の電子ビーム通過孔を有
する電極を設けると共に、この電極を加速電極20または
陽極電極60と電気的に接続した構成を取つてもよい。The first focusing electrode 30 has circular electron beam passage holes 31, 32, and 33, and is electrically connected to the third focusing electrode 50. The electron beam passage hole of the first focusing electrode 30 is
The diameter of the electron beam passage hole on the side of the acceleration electrode 20 and the diameter of the electron beam passage hole on the side of the acceleration electrode 20 do not necessarily have to coincide with each other.
It may be smaller or larger than the side hole diameter. Also,
The first focusing electrode 30 and the second focusing electrode 40 do not necessarily have to be arranged to face each other.
An electrode having three electron beam passage holes may be provided between the electrode and the second focusing electrode 40, and this electrode may be electrically connected to the acceleration electrode 20 or the anode electrode 60.
第２集束電極40は、第３集束電極50側の端面に３個の
円形の電子ビーム通過孔41b,42b,43bを有し、第３集束
電極50に対向してこの電子ビーム通過孔を形成する端面
から上記電子ビーム通過孔を水平方向から挟んで上記第
３集束電極50方向に垂直に植立した４個の平行平板44,4
5,46,47からなる第１の平板電極（垂直板）を有してい
る。そして、第１の平板電極を構成する平行平板44,45,
46,47を包囲し、この平行平板の先端44a,45a,46a,47aか
ら第３集束電極50側に一定の距離まで延長したリム電極
48を有している。The second focusing electrode 40 has three circular electron beam passing holes 41b, 42b, 43b on the end face on the third focusing electrode 50 side, and forms the electron beam passing hole facing the third focusing electrode 50. Four parallel flat plates 44, 4 vertically set in the direction of the third focusing electrode 50 with the electron beam passing hole interposed therebetween from the horizontal direction.
It has a first plate electrode (vertical plate) composed of 5, 46, 47. The parallel plates 44, 45, which constitute the first plate electrode,
A rim electrode surrounding 46, 47 and extending from the tips 44a, 45a, 46a, 47a of this parallel plate to a certain distance to the third focusing electrode 50 side
Has 48.
このリム電極48は、第２集束電極40に構造的に一体化
したものとして図示してあるが、これに替えて、第２集
束電極40と構造的に独立させた電極で構成し、電気的に
第２集束電極40と接続した構成とすることもできる。Although the rim electrode 48 is shown as being structurally integrated with the second focusing electrode 40, the rim electrode 48 may be constituted by an electrode that is structurally independent from the second focusing electrode 40, and Alternatively, a configuration in which the second focusing electrode 40 is connected to the second focusing electrode 40 may be employed.
また、第３集束電極50は第２集束電極40側の端面に３
個の円形の電子ビーム通過孔51a,52a,53aを有し、この
電子ビーム通過孔を垂直方向から挟んで上記第１集束電
極40方向に水平に植立した一対の平行平板54,55からな
る第２の平板電極（水平板）を有している。なお、この
水平板の対は各電子ビームに対して各別に（すなわち３
対）設けてもよいのである。In addition, the third focusing electrode 50 is provided on the end face on the second focusing electrode 40 side.
It comprises a pair of parallel flat plates 54, 55 having a plurality of circular electron beam passage holes 51a, 52a, 53a, and vertically standing in the direction of the first focusing electrode 40 with the electron beam passage holes sandwiched from the vertical direction. It has a second plate electrode (horizontal plate). Note that this pair of horizontal plates is individually (ie, 3) for each electron beam.
Pair) may be provided.
そして、上記第２の平板電極（水平板）を構成する平
行平板の先端部54a,55aは第２集束電極40のリム電極48
内まで延長されており、第２集束電極40の平行平板の先
端部44a,45a,46a,47aに対して電子銃軸方向に一定間隔
ｌで設置されている。また、陽極60側の端面には３個の
円形の電子ビーム通過孔51b,52b,53bを有している。そ
して、陽極60の第３集束電極50側の端面には３個の円形
の電子ビーム通過孔61,62,63が設けられており、サイド
電子ビーム通過孔の電子銃軸からの離軸距離S2は、前段
電極である陰極K1,K2,K3、制御電極10、加速電極20、第
１集束電極30、第２集束電極40、第３集束電極50のサイ
ド電子ビーム通過孔の離軸距離S1に対して、S2＞S1の関
係となつており、第３集束電極50と陽極60との間で主レ
ンズが形成され、サイド電子ビームSB1,SB2を螢光体ス
クリーン面上に集中させるようになつている。The tips 54a, 55a of the parallel flat plates constituting the second flat plate electrode (horizontal plate) are connected to the rim electrode 48 of the second focusing electrode 40.
It extends to the inside and is disposed at a constant interval 1 in the axial direction of the electron gun with respect to the tips 44a, 45a, 46a, 47a of the parallel flat plates of the second focusing electrode 40. The end face on the anode 60 side has three circular electron beam passage holes 51b, 52b, 53b. On the end face of the anode 60 on the side of the third focusing electrode 50, three circular electron beam passage holes 61, 62, 63 are provided, and an off-axis distance S of the side electron beam passage hole from the electron gun axis is provided. Reference numeral 2 denotes a distance between the side electron beam passage holes of the cathodes K 1 , K 2 , and K 3 , the control electrode 10, the acceleration electrode 20, the first focusing electrode 30, the second focusing electrode 40, and the third focusing electrode 50. with respect to the axis a distance S 1, S 2> S relationships and have summer 1, a main lens is formed between the third focus electrode 50 and the anode 60, fluorescers the side electron beams SB 1, SB 2 They concentrate on the screen.
動作時に各電極に与えられる印加電圧は、陰極に50〜
170V,制御電極に0V,加速電極に400〜800V,第２集束電極
40への印加電圧Vfとして５〜8kV、陽極電圧Ebとして25k
Vであり、また第１集束電極30と第３集束電極50には電
子ビームの垂直，水平偏向に同期して変化するダイナミ
ツク電圧DVfが印加される。このダイナミツク電圧DVf
は、電子ビームの偏向量が０のときは第２集束電極40の
電圧Vfと同等の５〜8kVであり、電子ビームの偏向量が
増すに従つて漸次上昇し、電子ビームの偏向量が最大の
とき第２集束電極40の電圧Vfよりも0.4〜1kvだけ高い電
位となる。The applied voltage applied to each electrode during operation is 50-
170V, 0V for control electrode, 400-800V for acceleration electrode, 2nd focusing electrode
5 to 8 kV as applied voltage Vf to 40, 25 k as anode voltage Eb
V, and a dynamic voltage DVf that changes in synchronization with the vertical and horizontal deflection of the electron beam is applied to the first focusing electrode 30 and the third focusing electrode 50. This dynamic voltage DVf
Is 5 to 8 kV, which is equal to the voltage Vf of the second focusing electrode 40 when the deflection amount of the electron beam is 0, gradually increases as the deflection amount of the electron beam increases, and the deflection amount of the electron beam becomes the maximum. At this time, the potential becomes 0.4 to 1 kv higher than the voltage Vf of the second focusing electrode 40.
電子ビームの偏向量が０のときは、上記のように、第
１集束電極30と第２集束電極40および第３集束電極50と
の間に電位差がないため、第２集束電極40内部の平行平
板（第１の平板電極：垂直板）44,45,46,47と第３集束
電極50に取付けられている平行平板（第２の平板電極：
水平板）54,55による電子ビームへの影響はなく、電子
ビームは第３集束電極50と陽極60との間の主レンズによ
り螢光体スクリーン面の中央部で最適フオーカスで集中
する。When the deflection amount of the electron beam is 0, there is no potential difference between the first focusing electrode 30, the second focusing electrode 40, and the third focusing electrode 50 as described above. Flat plates (first plate electrodes: vertical plates) 44, 45, 46, 47 and parallel flat plates (second plate electrodes:
There is no influence on the electron beam by the horizontal plates 54, 55, and the electron beam is concentrated at an optimum focus at the center of the phosphor screen surface by the main lens between the third focusing electrode 50 and the anode 60.
電子ビームの偏向量が増すと、第１集束電極30と第３
集束電極50の電位が第２集束電極40の電位よりも高くな
ることから、第２集束電極40内部の平行平板（垂直板）
44,45,46,47と第３集束電極50に取付られた平行平板
（水平板）54,55とによつて４極レンズ電界が形成され
ると共に、第３集束電極50と陽極60との電位差が減少し
て主レンズによる集束作用が弱くなり、前記した４極レ
ンズ作用で磁気偏向収差による螢光体スクリーン面周辺
部の電子ビームの横長偏平化が防止される。When the deflection amount of the electron beam increases, the first focusing electrode 30 and the third
Since the potential of the focusing electrode 50 is higher than the potential of the second focusing electrode 40, a parallel flat plate (vertical plate) inside the second focusing electrode 40 is used.
A quadrupole lens electric field is formed by the parallel flat plates (horizontal plates) 54 and 55 attached to the third focusing electrode 50 and the third focusing electrode 50 and the anode 60. The potential difference is reduced, the focusing effect of the main lens is weakened, and the above-described quadrupole lens function prevents the electron beam in the periphery of the phosphor screen surface from being flattened horizontally due to the magnetic deflection aberration.
なお、上記垂直板44、45、46、47と水平板54、55のい
ずれかが一方が取付けられていれば、上記第２集束電極
40と第３集束電極50との間で４極レンズ電界が形成され
る。If one of the vertical plates 44, 45, 46, 47 and the horizontal plates 54, 55 is attached, the second focusing electrode
A quadrupole lens electric field is formed between 40 and the third focusing electrode 50.
また同時に、第１集束電極30の電位が高くなると加速
電極20と第１集束電極30との電位差が増大し、加速電極
20のスリツト孔24,25,26の４極レンズ作用が強くなる。At the same time, when the potential of the first focusing electrode 30 increases, the potential difference between the accelerating electrode 20 and the first focusing electrode 30 increases,
The four slit lenses 24, 25, 26 of the 20 slit holes function strongly as a quadrupole lens.
第２図は第１図に示した電子銃の加速電極20と第１集
束電極30とによる４極レンズ作用の説明図であつて、
（ａ）は電子ビームの偏向が０のときの管軸方向の陰
極，制御電極，加速電極，第１集束電極の部分断面図、
（ｂ）は電子ビームの偏向量を増加させた場合の上記と
同様の部分断面図、（ｃ）は（ａ）のＹ−Ｙ線における
ビーム断面の説明図である。FIG. 2 is a view for explaining the function of a quadrupole lens by the acceleration electrode 20 and the first focusing electrode 30 of the electron gun shown in FIG.
(A) is a partial sectional view of a cathode, a control electrode, an acceleration electrode, and a first focusing electrode in the tube axis direction when the electron beam deflection is 0,
(B) is a partial sectional view similar to the above when the amount of deflection of the electron beam is increased, and (c) is an explanatory view of the beam section along the line YY in (a).
同図において、陰極K2（K1,K3）から出射した電子ビ
ーム、は制御電極10,加速電極20,第１集束電極30を通し
て加速，集束されて一旦クロスオーバを形成し、主レン
ズに入射する。このクロスオーバの位置は電子ビームの
電流量によつて異なり、該電流量が少ないときは陰極側
のL1の距離になり、電流量が多いときは第１集束電極30
側のL2の距離となるように変化する。In the figure, an electron beam emitted from a cathode K 2 (K 1 , K 3 ) is accelerated and focused through a control electrode 10, an acceleration electrode 20, and a first focusing electrode 30 to once form a crossover, and is applied to a main lens. Incident. The position of the crossover varies connexion by the current amount of the electron beam, when the power flow is small becomes the distance L 1 of the cathode side, a first focusing electrode when the amount of current is large 30
Changes so that the distance of the side L 2.
また、加速電極20のスリツト孔25（24,26）は管軸方
向に垂直方向で狭く、水平方向で広い開口であるため、
電子ビームは垂直方向で強く、水平方向で弱い集束作用
を受けて横長の断面形状となる。ただし、上記のよう
に、電子ビームの電流量によりクロスオーバの位置が変
化して加速電極のスリツト孔による４極作用が異なり、
電子ビームの電流量が少ないときはクロスオーバがカソ
ード側にあるため、スリツト孔による４極レンズ作用を
強く受けて横長楕円断面のビーム形状に、また該電流量
が多いときはクロスオーバの位置が第１集束電極30側に
寄るため、４極レンズ作用は弱くなつて丸に近い横長楕
円断面のビーム形状となる。このときの螢光体スクリー
ン面中央部でのビームスポツト形状は加速電極20のスリ
ツト孔25により小電流で縦長形状となり、大電流で丸に
近い横長のコア形状となる。すなわち、同図（ｃ）に示
したように小電流時には加速電極を通過する電子ビーム
が電流密度の高い垂直方向に縦長の2Hに対し、水平方向
に電流密度の低い2Lをもち、螢光体スクリーン面中央部
では縦長のコア部分でジヤストフオーカスとなるように
調整される。また、大電流時にはクロスオーバが加速電
極20のスリツト孔より先に出るため電流密度が均一な横
長楕円形状2Mとなる。The slit holes 25 (24, 26) of the accelerating electrode 20 are narrow in the vertical direction in the tube axis direction and wide in the horizontal direction.
The electron beam receives a strong focusing action in the vertical direction and a weak focusing action in the horizontal direction to have a horizontally long cross-sectional shape. However, as described above, the position of the crossover changes depending on the amount of current of the electron beam, and the quadrupole action due to the slit hole of the acceleration electrode differs.
When the current amount of the electron beam is small, the crossover is on the cathode side. Therefore, the crossover is strongly affected by the quadrupole lens action by the slit hole, and the beam shape has a horizontally long elliptical cross section. Since it is closer to the first focusing electrode 30 side, the quadrupole lens function is weakened and the beam shape has a horizontally long elliptical cross section close to a circle. At this time, the shape of the beam spot at the center of the phosphor screen surface becomes a vertically long shape with a small current due to the slit hole 25 of the accelerating electrode 20, and a horizontally long core shape near a circle with a large current. That is, as shown in FIG. 3 (c), when the current is small, the electron beam passing through the accelerating electrode has a vertically long 2H with a high current density and a 2L with a low current density in the horizontal direction. At the center of the screen surface, adjustment is made so as to be a just focus at the vertically elongated core portion. Further, at the time of a large current, the crossover comes before the slit hole of the accelerating electrode 20, so that the oblong shape 2M is uniform in current density.
画面周辺部のビームスポツトは、偏向歪みによるもの
と螢光面スクリーンに斜めにビームが入射することによ
る図形歪みの二つの歪みがあり、前者の偏向歪みは第２
集束電極と第３集束電極による４極レンズにより補正可
能であるが、図形歪みは偏向が０のときの加速電極の４
極レンズ作用の効果と同様に低電流時にビームが縦長と
なることで補正されるため、第１集束電極の電位が上が
ることで加速電極の四極レンズ作用が強くなり画面周辺
の横長が補正される。The beam spot at the peripheral portion of the screen has two distortions, that is, distortion due to deflection distortion and figure distortion due to oblique incidence of the beam on the phosphor screen.
It can be corrected by a quadrupole lens with a focusing electrode and a third focusing electrode.
Similarly to the effect of the polar lens function, the beam is corrected by the fact that the beam becomes vertically long at the time of a low current. Therefore, by increasing the potential of the first focusing electrode, the quadrupole lens function of the acceleration electrode is strengthened, and the horizontal length around the screen is corrected. .
上記のように、電子ビームの偏向時は、第１集束電極
30の電位が偏向角度が０のときに比べて高くなるため、
前記４極レンズ作用が更に強くなり、偏向が０のときと
同様の作用をするが、電子ビームの電流量が少ないとき
の垂直方向の電子ビームの広がりは、大電流時に比べて
電子ビームが絞りこまれているため、電子間の反発作用
によりスポツト径は太くなつて、大電流時との電子ビー
ムスポツト径の差は少なくなる。As described above, when the electron beam is deflected, the first focusing electrode
Since the potential of 30 is higher than when the deflection angle is 0,
The quadrupole lens action is further enhanced and acts in the same way as when the deflection is zero, but when the amount of current of the electron beam is small, the spread of the electron beam in the vertical direction is smaller than when the current is large. Because of this, the spot diameter becomes larger due to the repulsive action between the electrons, and the difference in the electron beam spot diameter from that at the time of a large current is reduced.
第３図は電子ビームの電流量と電子ビームスポツト径
の関係の説明図であつて、Ikは電子ビームの電流（カソ
ード電流）（μＡ）、ｄは電子ビームスポツト径（mm）
を示し、太線の実線と一点鎖線で示したdHとdVは螢光体
スクリーン面中央部での輝度のピークから1/10の輝度に
おける電子ビームスポット径d10の変化、細線の二点鎖
線と点線で示したdH′dV′は螢光体スクリーン面周辺部
での輝度のピークから1/10の輝度における電子ビームス
ポツト径d10の変化を示す。FIG. 3 is an explanatory view showing the relationship between the electron beam current amount and the electron beam spot diameter, where Ik is the electron beam current (cathode current) (μA), and d is the electron beam spot diameter (mm).
Are shown, changes in the electron beam spot diameter d 10 in the thick solid line and d H and d V is the luminance of 1/10 from the peak of the luminance at fluorescers screen surface central portion shown by a chain line, two points of the thin line d H 'd V' shown by a dashed line and a dotted line indicates a change in the electron beam spot diameter d 10 in the luminance of 1/10 from the peak of the luminance at fluorescers screen surface periphery.
同図に示したように、電子ビームの電流量が変化して
も、電子ビームスポツトの垂直方向径は螢光体スクリー
ン面の中央部と周辺部の何れにおいても変化が少ない。
しかし、水平方向径の変化は大きく、電流量が増えるに
従い大径となる。As shown in the figure, even if the amount of current of the electron beam changes, the diameter of the electron beam spot in the vertical direction hardly changes at both the central portion and the peripheral portion of the phosphor screen surface.
However, the change in the diameter in the horizontal direction is large, and the diameter increases as the amount of current increases.
そして、電子ビームの電流量の増減により変化する電
子ビームスポツト径について、上記電流値が略100〜500
μＡの範囲において、水平方向の電子ビームスポツト径
の変化量に対する垂直方向の電子ビームスポツト径の変
化量の比を0.6以下、垂直方向の電子ビームスポツト径
の変化量に対する水平方向の電子ビームスポツト径の変
化量の比を0.6以下とすることにより、螢光体スクリー
ン面における有効表示領域中の中央部及び周辺部におい
て高解像度の表示が得られる。なお、上記の電子ビーム
電流値は図示の実施例で説明した動作条件におけるもの
であり、本発明はこれに限られるものではなく、電子銃
の構成、動作条件次第では上記電流値の範囲は変わるも
のである。Then, as for the electron beam spot diameter which changes due to the increase or decrease of the current amount of the electron beam, the above current value is approximately 100 to 500.
In the μA range, the ratio of the change amount of the electron beam spot diameter in the vertical direction to the change amount of the electron beam spot diameter in the horizontal direction is 0.6 or less, and the diameter of the electron beam spot diameter in the horizontal direction is smaller than the change amount of the electron beam spot diameter in the vertical direction. By setting the ratio of the change amount to 0.6 or less, a high-resolution display can be obtained in the central portion and the peripheral portion of the effective display area on the phosphor screen surface. The above electron beam current value is based on the operating conditions described in the illustrated embodiment, and the present invention is not limited to this. The range of the current value varies depending on the configuration and operating conditions of the electron gun. Things.
第４図は螢光体スクリーン面上での電子ビームスポツ
トの形状変化の説明図であつて、同図（ａ）及び（ｂ）
は電子ビームの電流量の増加に従って画面全域で各々横
長及び縦長方向に変化する場合を示す。電子ビームの電
流量が多い場合は同図（ａ）に示すような電子ビームス
ポットは主に水平方向で大径になるため、垂直方向の解
像度の劣化は少なくなり、同図（ｂ）に示すような電子
ビームスポットは主に垂直方向で大径になるため、水平
方向の解像度の劣化は少なくなる。FIG. 4 is a view for explaining a change in the shape of the electron beam spot on the phosphor screen, and FIGS. 4 (a) and 4 (b).
Indicates a case where the current changes in the horizontal direction and the vertical direction over the entire screen as the current amount of the electron beam increases. When the amount of current of the electron beam is large, the electron beam spot as shown in FIG. 4A mainly has a large diameter in the horizontal direction, so that the deterioration of the resolution in the vertical direction is reduced, and as shown in FIG. Since such an electron beam spot has a large diameter mainly in the vertical direction, the deterioration in resolution in the horizontal direction is reduced.
なお、本発明は、上記した実施例に開示した形式の電
子銃に限るものではなく、既知の各種形式の電子銃に適
用可能である。Note that the present invention is not limited to the electron gun of the type disclosed in the above-described embodiment, but is applicable to various known types of electron gun.
以上説明したように、本発明によれば、螢光体スクリ
ーン面の全面全域にわたつて、電子ビームの小電流域か
ら大電流域までの広い範囲で高い解像度を得ることがで
きる優れた機能の陰極線管用電子銃を提供することがで
きる。As described above, according to the present invention, an excellent function of obtaining high resolution over a wide range from a small current region to a large current region of an electron beam over the entire surface of a phosphor screen surface. An electron gun for a cathode ray tube can be provided.
第１図は本発明による陰極線管用電子銃の第１の実施例
の説明図、第２図は第１図に示した電子銃の加速電極と
第１集束電極とによる４極レンズ作用の説明図、第３図
は電子ビームの電流量と電子ビームスポツト径の関係の
説明図、第４図は第３図の関係を螢光体スクリーン面上
での電子ビームスポツト形状で示した説明図、第５図は
４極レンズ磁界と電子ビームとの関係の説明図、第６図
はピンクツシヨン分布の水平偏向磁界と電子ビームとの
関係の説明図、第７図はビームスポツトの形状歪の説明
図、第８図は受像管装置の電子銃の説明図、第９図は第
８図に示した電子銃の第１集束電極と第２集束電極とに
よる４極レンズ電界作用の説明図、第10図は電子ビーム
の電流量の違いによる電子ビームスポツト形状変化の説
明図である。 10……制御電極、20……加速電極、30……第１集束電
極、40……第２集束電極、48……リム電極、50……第３
集束電極、60……陽極電極。FIG. 1 is an explanatory view of a first embodiment of an electron gun for a cathode ray tube according to the present invention, and FIG. 2 is an explanatory view of a four-pole lens function by an acceleration electrode and a first focusing electrode of the electron gun shown in FIG. FIG. 3 is an explanatory diagram showing the relationship between the electron beam current amount and the electron beam spot diameter, and FIG. 4 is an explanatory diagram showing the relationship of FIG. 3 in the form of the electron beam spot on the phosphor screen. FIG. 5 is an explanatory view of the relationship between the quadrupole lens magnetic field and the electron beam, FIG. 6 is an explanatory view of the relationship between the horizontal deflection magnetic field having the pink distribution and the electron beam, FIG. 7 is an explanatory view of the beam spot shape distortion, FIG. 8 is an explanatory view of an electron gun of a picture tube device, FIG. 9 is an explanatory view of a quadrupole lens electric field effect by a first focusing electrode and a second focusing electrode of the electron gun shown in FIG. 8, and FIG. FIG. 4 is an explanatory diagram of a change in the shape of an electron beam spot due to a difference in the amount of current of an electron beam. 10 control electrode, 20 acceleration electrode, 30 first focusing electrode, 40 second focusing electrode, 48 rim electrode, 50 third
Focusing electrode, 60 ... Anode electrode.
フロントページの続き (72)発明者 山内 昌昭 千葉県茂原市早野3618番地 日立デバイ スエンジニアリング株式会社内 (72)発明者 大沼 邦彦 茨城県日立市大みか町５丁目２番１号 株式会社日立製作所大みか工場内 (56)参考文献 特開 昭50−146264（ＪＰ，Ａ) 特開 昭59−73835（ＪＰ，Ａ) 特開 昭63−266736（ＪＰ，Ａ) 特開 昭58−59534（ＪＰ，Ａ) 特開 平１−236552（ＪＰ，Ａ) 特開 昭63−218129（ＪＰ，Ａ) 特開 昭61−250933（ＪＰ，Ａ) (58)調査した分野(Int.Cl.7，ＤＢ名) H01J 29/50 H01J 29/56 Continuing from the front page (72) Inventor Masaaki Yamauchi 3618 Hayano, Mobara-shi, Chiba Prefecture Within Hitachi Device Engineering Co., Ltd. (72) Kunihiko Onuma 5-2-1 Omikamachi, Hitachi City, Ibaraki Prefecture Omika Plant, Hitachi, Ltd. (56) References JP-A-50-146264 (JP, A) JP-A-59-73835 (JP, A) JP-A-63-266736 (JP, A) JP-A-58-59534 (JP, A) JP-A-1-236552 (JP, A) JP-A-63-218129 (JP, A) JP-A-61-250933 (JP, A) (58) Fields investigated (Int. Cl. 7 , DB name) H01J 29/50 H01J 29/56
Claims (4)
射するための陰極と、この陰極に対して少なくとも制御
電極、加速電極、集束電極、陽極電極とをこの順で管軸
方向に配置してなる陰極線管用電子銃において、上記集
束電極は上記加速電極側から陽極電極側にかけて第１集
束電極、第２集束電極、第３集束電極を設けてなり、上
記陽極電極と第３集束電極との間で主レンズを形成し、
上記第２集束電極と第３集束電極とは相対向してその対
向する端面に４極レンズ電界を形成する構造を備え、上
記第１集束電極と加速電極との間で４極レンズ電界を形
成する構造を備え、上記第２集束電極に一定のフォーカ
ス電圧を、上記第１集束電極と第３集束電極に直流電圧
と電子ビーム偏向角の増大に伴って上昇する電圧との重
畳電圧を印加する構成とし、上記陰極から出射された電
子ビームの螢光体スクリーン面の中央部における電流量
の増減により変化する電子ビームスポット径について、
上記電流量が略100〜500μＡの範囲における輝度のピー
クから1/10の輝度における電子ビームスポット径の変化
が、水平方向の変化量に対する垂直方向の変化量の比を
0.6以下、または垂直方向の変化量に対する水平方向の
変化量の比を0.6以下としたことを特徴とする陰極線管
用電子銃。1. A cathode for emitting three electron beams arranged in one direction, and at least a control electrode, an accelerating electrode, a focusing electrode, and an anode electrode with respect to the cathode in the tube axial direction in this order. In the cathode ray tube electron gun, the focusing electrode is provided with a first focusing electrode, a second focusing electrode, and a third focusing electrode from the acceleration electrode side to the anode electrode side, and the anode electrode and the third focusing electrode are provided. Form the main lens between
The second focusing electrode and the third focusing electrode are opposed to each other, and have a structure in which a quadrupole lens electric field is formed on the opposite end surface, and a quadrupole lens electric field is formed between the first focusing electrode and the accelerating electrode. A constant focus voltage is applied to the second focusing electrode, and a superimposed voltage of a DC voltage and a voltage that increases with an increase in the electron beam deflection angle is applied to the first focusing electrode and the third focusing electrode. With regard to the electron beam spot diameter which changes due to the increase and decrease of the current amount at the center of the phosphor screen surface of the electron beam emitted from the cathode,
The change in the electron beam spot diameter at 1/10 of the luminance from the luminance peak in the range where the current amount is approximately 100 to 500 μA is the ratio of the vertical change amount to the horizontal change amount.
An electron gun for a cathode ray tube, wherein the ratio of the amount of change in the horizontal direction to the amount of change in the vertical direction is 0.6 or less, or 0.6 or less.
び陽極電極を有する陰極線管用電子銃において、上記加
速電極に４極レンズ構造を備え、上記集束電極を２つ以
上に分割し、分割した集束電極相互の対向面の少なくと
も一方に偏向収差を補正する非点収差補正構造を備え、
上記４極レンズ構造は電子ビーム偏向角の増大に伴って
レンズ作用が強くなり、上記陰極から出射された電子ビ
ームの螢光体スクリーン面の中央部における電流量の増
減により変化する電子ビームスポット径について、上記
電流量が略100〜500μＡの範囲における輝度のピークか
ら1/10の輝度における電子ビームスポット径の変化が、
水平方向の変化量に対する垂直方向の変化量の比を0.6
以下、または垂直方向の変化量に対する水平方向の変化
量の比を0.6以下としたことを特徴とする陰極線管用電
子銃。2. An electron gun for a cathode ray tube having a cathode, a control electrode, an accelerating electrode, a focusing electrode and an anode electrode, wherein the accelerating electrode has a four-pole lens structure, and the focusing electrode is divided into two or more parts. At least one of the opposing surfaces of the focusing electrodes includes an astigmatism correction structure for correcting deflection aberration,
The quadrupole lens structure has a stronger lens function as the deflection angle of the electron beam increases, and the electron beam spot diameter changes with an increase or decrease in the amount of current at the center of the phosphor screen surface of the electron beam emitted from the cathode. About the change in the electron beam spot diameter at 1/10 of the luminance from the luminance peak in the range of approximately 100 to 500 μA of the current,
The ratio of the vertical change to the horizontal change is 0.6
An electron gun for a cathode ray tube, wherein the ratio of the amount of change in the horizontal direction to the amount of change in the vertical direction is 0.6 or less.
射するための陰極と、この陰極に対して少なくとも制御
電極、加速電極、集束電極、陽極電極とをこの順で管軸
方向に配置してなる陰極線管用電子銃において、上記集
束電極は上記加速電極側から陽極電極側にかけて第１集
束電極、第２集束電極、第３集束電極を設けてなり、上
記陽極電極と第３集束電極との間で主レンズを形成し、
上記第２集束電極と第３集束電極とは相対向してその対
向する端面に４極レンズ電界を形成する構造を備え、上
記第１集束電極と加速電極との間で４極レンズ電界を形
成する構造を備え、上記第２集束電極に一定のフォーカ
ス電圧を、上記第１集束電極と第３集束電極に直流電圧
と電子ビーム偏向角の増大に伴って上昇する電圧との重
畳電圧を印加する構成とし、上記陰極から出射された電
子ビームの螢光体スクリーン面の周辺部における電流量
の増減により変化する電子ビームスポット径について、
上記電流量が略100〜500μＡの範囲における輝度のピー
クから1/10の輝度における電子ビームスポット径の変化
が、水平方向の変化量に対する垂直方向の変化量の比を
0.6以下、または垂直方向の変化量に対する水平方向の
変化量の比を0.6以下としたことを特徴とする陰極線管
用電子銃。3. A cathode for emitting three electron beams arranged in one direction, and at least a control electrode, an accelerating electrode, a focusing electrode, and an anode electrode with respect to the cathode in the tube axial direction in this order. In the cathode ray tube electron gun, the focusing electrode is provided with a first focusing electrode, a second focusing electrode, and a third focusing electrode from the acceleration electrode side to the anode electrode side, and the anode electrode and the third focusing electrode are provided. Form the main lens between
The second focusing electrode and the third focusing electrode are opposed to each other, and have a structure in which a quadrupole lens electric field is formed on the opposite end surface, and a quadrupole lens electric field is formed between the first focusing electrode and the accelerating electrode. A constant focus voltage is applied to the second focusing electrode, and a superimposed voltage of a DC voltage and a voltage that increases with an increase in the electron beam deflection angle is applied to the first focusing electrode and the third focusing electrode. With regard to the electron beam spot diameter which changes due to the increase and decrease of the current amount in the peripheral portion of the phosphor screen surface of the electron beam emitted from the cathode,
The change in the electron beam spot diameter at 1/10 of the luminance from the luminance peak in the range where the current amount is approximately 100 to 500 μA is the ratio of the vertical change amount to the horizontal change amount.
An electron gun for a cathode ray tube, wherein the ratio of the amount of change in the horizontal direction to the amount of change in the vertical direction is 0.6 or less, or 0.6 or less.
び陽極電極を有する陰極線管用電子銃において、上記加
速電極に４極レンズ構造を備え、上記集束電極を２つ以
上に分割し、分割した集束電極相互の対向面の少なくと
も一方に偏向収差を補正する非点収差補正構造を備え、
上記４極レンズ構造は電子ビーム偏向角の増大に伴って
レンズ作用が強くなり、上記陰極から出射された電子ビ
ームの螢光体スクリーン面の周辺部における電流量の増
減により変化する電子ビームスポット径について、上記
電流量が略100〜500μＡの範囲における輝度のピークか
ら1/10の輝度における電子ビームスポット径の変化が、
水平方向の変化量に対する垂直方向の変化量の比を0.6
以下、または垂直方向の変化量に対する水平方向の変化
量の比を0.6以下としたことを特徴とする陰極線管用電
子銃。4. An electron gun for a cathode ray tube having a cathode, a control electrode, an accelerating electrode, a focusing electrode and an anode electrode, wherein the accelerating electrode has a quadrupole lens structure, and the focusing electrode is divided into two or more parts. At least one of the opposing surfaces of the focusing electrodes includes an astigmatism correction structure for correcting deflection aberration,
The above-described quadrupole lens structure has a stronger lens function as the electron beam deflection angle increases, and the electron beam spot diameter changes with an increase or decrease in the amount of current of the electron beam emitted from the cathode at the periphery of the phosphor screen surface. About the change in the electron beam spot diameter at 1/10 of the luminance from the luminance peak in the range of approximately 100 to 500 μA of the current,
The ratio of the vertical change to the horizontal change is 0.6
An electron gun for a cathode ray tube, wherein the ratio of the amount of change in the horizontal direction to the amount of change in the vertical direction is 0.6 or less.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP01265203A JP3074176B2 (en) | 1989-10-13 | 1989-10-13 | Electron gun for cathode ray tube |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP01265203A JP3074176B2 (en) | 1989-10-13 | 1989-10-13 | Electron gun for cathode ray tube |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH03129644A JPH03129644A (en) | 1991-06-03 |
| JP3074176B2 true JP3074176B2 (en) | 2000-08-07 |
Family
ID=17413967
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP01265203A Expired - Fee Related JP3074176B2 (en) | 1989-10-13 | 1989-10-13 | Electron gun for cathode ray tube |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3074176B2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR950020925A (en) * | 1993-12-14 | 1995-07-26 | 이헌조 | Kalashnikov gun |
-
1989
- 1989-10-13 JP JP01265203A patent/JP3074176B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH03129644A (en) | 1991-06-03 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |