JP3050386B2 - Electron gun for color picture tube - Google Patents
Electron gun for color picture tubeInfo
- Publication number
- JP3050386B2 JP3050386B2 JP1187326A JP18732689A JP3050386B2 JP 3050386 B2 JP3050386 B2 JP 3050386B2 JP 1187326 A JP1187326 A JP 1187326A JP 18732689 A JP18732689 A JP 18732689A JP 3050386 B2 JP3050386 B2 JP 3050386B2
- Authority
- JP
- Japan
- Prior art keywords
- electrode
- focusing electrode
- focusing
- electron beam
- picture tube
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Description
【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、スクリーン面全域において低輝度から高輝
度まで高い解像度を得ることのできる電極構造を備えた
カラー受像管用電子銃に関する。Description: BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an electron gun for a color picture tube having an electrode structure capable of obtaining high resolution from low luminance to high luminance over the entire screen surface.
この種の受像管の解像度は、電子ビームのスポツト径
およびその形状に大きく依存する。すなわち、電子ビー
ムの射突によつて螢光体スクリーン面上に生成される輝
点である電子ビームスポツトが径小でかつ真円に近いも
のでなければ高い解像度はえられない。The resolution of this type of picture tube largely depends on the spot diameter of the electron beam and its shape. In other words, high resolution cannot be obtained unless the electron beam spot, which is a luminescent spot generated on the phosphor screen surface by the impact of the electron beam, is small in diameter and close to a perfect circle.
しかし、電子銃から螢光体スクリーン面に至る電子ビ
ーム軌道は電子ビームの偏向角度の増大に伴つて長大と
なるので、螢光体スクリーン面の中央部において径小で
かつ真円の電子ビームスポツトが得られる最適フオーカ
ス電圧に保つと、螢光体スクリーン面の周辺部ではオー
バフオーカスの状態となり、周辺部において良好な電子
ビームスポツトおよび高い解像度を得ることができなく
なる。そこで、電子ビームの偏向角の増大に伴つてフオ
ーカス電圧を高めて主レンズ電界を弱める，所謂ダイナ
ミツクフオーカス方式が採用されているのであるが、こ
の方式は、以下に説明するように、インライン型カラー
受像管の駆動には適しない。However, since the trajectory of the electron beam from the electron gun to the phosphor screen becomes longer as the deflection angle of the electron beam increases, the electron beam spot having a small diameter and a perfect circle at the center of the phosphor screen is obtained. Is maintained at the optimum focus voltage at which the laser beam can be obtained, an overfocus state occurs at the peripheral portion of the phosphor screen surface, and it becomes impossible to obtain a good electron beam spot and a high resolution in the peripheral portion. Therefore, a so-called dynamic focus method is adopted in which the focus voltage is increased with an increase in the deflection angle of the electron beam to weaken the electric field of the main lens. This method, as described below, employs an in-line method. It is not suitable for driving a type color picture tube.
すなわち、３つの電子ビーム出射部を水平走査方向一
直線上に配列してなるインライン型カラー受像管では、
セルフコンバーゼンス効果を得るために水平偏向磁界を
ピンクツシヨン状に、垂直偏向磁界をバレル状に、それ
ぞれ歪ませているので、ここを通過した電子ビームの断
面形状は歪を持つたものとなる。That is, in an in-line type color picture tube in which three electron beam emitting portions are arranged on a straight line in the horizontal scanning direction,
In order to obtain a self-convergence effect, the horizontal deflection magnetic field is distorted in the shape of a pink pulse and the vertical deflection magnetic field is distorted in the shape of a barrel. Therefore, the cross-sectional shape of the electron beam passing therethrough becomes distorted.
螢光体スクリーン面は、通常横長すなわち電子ビーム
配列方向（水平方向）の辺が長い矩形状であるので、水
平方向周辺部での歪が特に大きくなる。Since the phosphor screen surface is generally rectangular, which is long in the horizontal direction, that is, the side in the electron beam arrangement direction (horizontal direction), the distortion at the peripheral portion in the horizontal direction is particularly large.
第６図は４極レンズ磁界と電子ビームとの関係の説明
図であつて、1,2,3は電子ビーム、４は水平偏向磁界、
５は偏向作用によるビーム移動方向である。FIG. 6 is an explanatory view of the relationship between the magnetic field of the quadrupole lens and the electron beam, wherein 1, 2, 3 are the electron beam, 4 is the horizontal deflection magnetic field,
Reference numeral 5 denotes a beam moving direction due to the deflection action.
第７図はピンクッション磁界分布の水平偏向磁界と電
子ビームとの関係の説明図であつて、６は２極磁界成
分、７は４極磁界成分、８は偏向作用によるビーム移動
方向、９は電子ビームである。FIG. 7 is an explanatory view of the relationship between the horizontal deflection magnetic field of the pincushion magnetic field distribution and the electron beam. It is an electron beam.
第８図はビームスポツトの形状歪の説明図であつて、
9Hは電子ビームの高輝度部（コアー部）、9Lは同じく低
輝度部（ヘイズ部）である。FIG. 8 is an explanatory view of the shape distortion of the beam spot.
9H is a high-luminance portion (core portion) of the electron beam, and 9L is a low-luminance portion (haze portion).
以下、第６図から第８図について説明する。 Hereinafter, FIG. 6 to FIG. 8 will be described.
第６図において、同図図面の紙面裏側から進行してき
た３本の電子ビーム1,2,3は、ピンクツシヨン状分布の
水平偏向磁界４に入射することにより、矢印５で示す方
向への偏向作用を受ける。すなわち、ピンクツシヨン状
分布の水平偏向磁界４は、第７図（ａ）に示すような２
極磁界成分６と、同図（ｂ）に示すような４極磁界成分
とから成ると考えることができ、２極磁界成分６が電子
ビーム９に対して矢印８で示す方向への偏向作用を与え
る。In FIG. 6, three electron beams 1, 2, and 3 traveling from the back side of the drawing in FIG. 6 enter a horizontal deflection magnetic field 4 having a pink-thussion distribution, thereby causing a deflection action in a direction indicated by an arrow 5. Receive. In other words, the horizontal deflection magnetic field 4 having the pink-thussion distribution has a value of 2 as shown in FIG.
It can be considered that the magnetic field is composed of a polar magnetic field component 6 and a quadrupole magnetic field component as shown in FIG. 2B. The dipole magnetic field component 6 has a function of deflecting the electron beam 9 in the direction indicated by the arrow 8. give.
４極磁界成分７は３本の電子ビームにセルフコンバー
ゼンス作用を与えるものであるが、１本の電子ビーム９
についてみると、水平方向に発散作用を、垂直方向に集
束作用を、それぞれ与えるために、横長偏平の断面形状
となる。The quadrupole magnetic field component 7 gives a self-convergence effect to three electron beams, but one electron beam 9
In order to give a diverging effect in the horizontal direction and a focusing effect in the vertical direction, the cross-sectional shape becomes horizontally long and flat.
ところで、上記発散作用は、電子ビーム偏向角度の増
大に伴い電子ビーム軌道が長大となることによる電子ビ
ームスポツトのオーバフオーカスを打ち消す向きに作用
するので、インライン型カラー受像管では、電子ビーム
スポツトの水平方向に関しては、偏向期間中、最適フオ
ーカス状態に保たれる。しかし、垂直方向に関しては、
上記の集束作用が加わることによつて、オーバフオーカ
スの度合が著しく増す。By the way, the divergence acts in such a direction as to cancel the overfocus of the electron beam spot due to the electron beam trajectory becoming longer with an increase in the electron beam deflection angle. In the horizontal direction, the optimum focus state is maintained during the deflection period. But in the vertical direction,
Due to the addition of the above-described focusing action, the degree of overfocus is significantly increased.
その結果、螢光体スクリーン面の中央部に生成される
電子ビームスポツトが第８図に「00」で示すような円形
となるのに対し、水平方向周辺部に生成される電子ビー
ムスポツトは、高輝度のコアー部9Hと低輝度のヘイズ部
9Lとからなる非円形に歪み、特にヘイズ部9Lの垂直方向
への大きな伸びがフオーカス特性に悪影響を及ぼす。As a result, the electron beam spot generated at the center of the phosphor screen surface becomes circular as indicated by "00" in FIG. 8, while the electron beam spot generated at the peripheral portion in the horizontal direction is High brightness core 9H and low brightness haze
The non-circular distortion of 9L, in particular, a large vertical extension of the haze portion 9L adversely affects the focus characteristics.
そして、このような場合、従来のダイナミツクフオー
カス方式を適用すると、この方式が主レンズのレンズ作
用を水平，垂直方向に関係なく均等に弱めるので、垂直
方向についてはヘイズ部9Lを除去しても、すでに最適フ
オーカスとなつている水平方向は更にアンダーフオーカ
ス状態となり、水平方向の径が増大してしまう。In such a case, if the conventional dynamic focus method is applied, this method uniformly weakens the lens action of the main lens regardless of the horizontal and vertical directions, so that the haze portion 9L is removed in the vertical direction. However, the horizontal direction, which has already been the optimum focus, is further under-focused, and the diameter in the horizontal direction increases.
この結果、電子ビームスポツトは著しく横長となり、
水平方向の解像度が低下する。As a result, the electron beam spot becomes remarkably oblong,
The horizontal resolution is reduced.
このような問題を解決し、螢光体スクリーン面の全域
において高い解像度を得ることができるようにした受像
管装置が本願出願人の出願にかかる特願昭63−230116号
として提案されている。A picture tube device which solves such a problem and can obtain a high resolution over the entire phosphor screen surface has been proposed as Japanese Patent Application No. 63-230116 filed by the present applicant.
第９図は上記提案にかかる受像管装置の電子銃の説明
図であつて、（ａ）は電子銃の構造を示す断面図、
（ｂ）は第１集束電極を（ａ）の矢印Ａ方向からみた正
面図、（ｃ）は第２集束電極を（ａ）の矢印Ｂ方向から
みた正面図である。FIG. 9 is an explanatory view of the electron gun of the picture tube device according to the above proposal, wherein (a) is a sectional view showing the structure of the electron gun,
(B) is a front view of the first focusing electrode viewed from the direction of arrow A in (a), and (c) is a front view of the second focusing electrode viewed from the direction of arrow B in (a).
同図において、K1，K2，K3は熱陰極（以下、単に陰
極）、10は制御電極、20は加速電極、30は第１集束電
極、38はリム電極、40は第２集束電極、50は陽極電極
（以下、単に陽極）、11,12,13,21,22,23,31a,32a,33a,
31b,32b,33b,41a,42a,43a,41b,42b,43b,51,52,53は電子
ビーム通過孔、Ｃは電子銃軸、CBはセンタービーム、SB
1，SB2はサイドビームである。そして、水平方向一直線
上に配列された陰極K1，K2，K3と、制御電極10、加速電
極20、第１集束電極30、第２集束電極40および最終加速
電極である陽極50とでインライン型カラー受像管用電子
銃を構成している。In the figure, K 1 , K 2 , and K 3 are hot cathodes (hereinafter simply referred to as cathodes), 10 is a control electrode, 20 is an acceleration electrode, 30 is a first focusing electrode, 38 is a rim electrode, and 40 is a second focusing electrode. , 50 are anode electrodes (hereinafter simply referred to as anodes), 11, 12, 13, 21, 22, 23, 31a, 32a, 33a,
31b, 32b, 33b, 41a, 42a, 43a, 41b, 42b, 43b, 51, 52, 53 are electron beam passage holes, C is an electron gun axis, CB is a center beam, SB
1 and SB 2 are side beams. Then, the cathodes K 1 , K 2 , and K 3 arranged on a straight line in the horizontal direction, the control electrode 10, the accelerating electrode 20, the first focusing electrode 30, the second focusing electrode 40, and the anode 50 as the final accelerating electrode. It constitutes an electron gun for an in-line type color picture tube.
第１集束電極30は、第２集束電極40側の端面に３個の
円形の電子ビーム通過孔31a,32a,33aを有し、第２集束
電極40に対向して、この電子ビーム通過孔を形成する端
面から上記電子ビーム通過孔を水平方向から挟んで上記
第２集束電極40方向に垂直に植立した４個の平行平板3
4,35,36,37からなる第１の平板電極（垂直板）を有して
いる。そして、第１の平板電極を構成する平行平板34,3
5,36,37を包囲し、かつこの平行平板の先端34a,35a,36
a,37aから第２集束電極40側に一定の距離まで延長した
リム電極38を有している。The first focusing electrode 30 has three circular electron beam passing holes 31a, 32a, and 33a on the end face on the side of the second focusing electrode 40, and is opposed to the second focusing electrode 40. Four parallel flat plates 3 vertically set in the direction of the second focusing electrode 40 with the electron beam passage hole interposed therebetween in the horizontal direction from the end face to be formed.
It has a first plate electrode (vertical plate) composed of 4,35,36,37. Then, the parallel plates 34, 3 constituting the first plate electrode
5,36,37 and the ends 34a, 35a, 36 of this parallel plate
The rim electrode 38 extends from the a, 37a to the second focusing electrode 40 side to a certain distance.
上記リム電極38は、第１集束電極30に構造的に接続し
たものとして図示しているが、第１集束電極30と構造的
に独立させ、電気的に同電位となるように接続してもよ
い。Although the rim electrode 38 is illustrated as being structurally connected to the first focusing electrode 30, the rim electrode 38 may be structurally independent of the first focusing electrode 30 and may be electrically connected to the same potential. Good.
また、第２集束電極40は、第１集束電極30側の端面に
３個の円形の電子ビーム通過孔41a,42a,43aを有し、こ
の電子ビーム通過孔を垂直方向から挟んで上記第１集束
電極30方向に水平に直立した一対の平行平板45,46から
なる第２の平板電極（水平板）を有している。Further, the second focusing electrode 40 has three circular electron beam passing holes 41a, 42a, 43a on the end face on the first focusing electrode 30 side, and the first focusing electrode 30 sandwiches the electron beam passing holes from the vertical direction. It has a second flat plate electrode (horizontal plate) composed of a pair of parallel flat plates 45 and 46 which stand horizontally in the direction of the focusing electrode 30.
この水平板の対は、各電子ビームに対して各別に，す
なわち３対設けてもよいものである。The pairs of horizontal plates may be provided separately for each electron beam, that is, three pairs may be provided.
そして、上記第２の平板電極を構成する平行平板の先
端部45a,46aは第１集束電極30のリム電極38内まで延長
されており、第１集束電極30の平行平板の先端部34a,35
a,36a,37aに対して電子銃軸方向に一定間隔ｌで設置さ
れている。また、陽極50側の端面には３個の円形の電子
ビーム通過孔41b,42b,43bを有している。そして、陽極5
0の第２集束電極40側の端面には３個の円形の電子ビー
ム通過孔51,52,53が設けられており、サイド電子ビーム
通過孔の電子銃軸からの離軸距離S2は、前段電極である
陰極K1，K2，K3、制御電極10、加速電極20、第１集束電
極30、第２集束電極40のサイド電子ビーム通過孔の離軸
距離S1に対して、S2＞S1の関係となつており、第２集束
電極40と陽極50との間で主レンズが形成され、サイド電
子ビームSB1，SB2を螢光体スクリーン面上に集中させる
ようになつている。The tips 45a and 46a of the parallel plates constituting the second plate electrode extend into the rim electrode 38 of the first focusing electrode 30, and the tips 34a and 35a of the parallel plates of the first focusing electrode 30.
A, 36a, and 37a are provided at a constant interval 1 in the axial direction of the electron gun. The end face on the anode 50 side has three circular electron beam passage holes 41b, 42b, 43b. And the anode 5
The end face of the second focusing electrode 40 side of the 0 is provided with three circular electron beam passage apertures 51, 52, 53, off-axis distance S 2 from the electron gun axis of the side electron beam passage holes, With respect to the off-axis distance S 1 of the side electron beam passage holes of the cathodes K 1 , K 2 , and K 3 , the control electrode 10, the acceleration electrode 20, the first focusing electrode 30, and the second focusing electrode 40, 2> of and relationship with summer S 1, it is the main lens is formed between the second focusing electrode 40 and the anode 50, summer the side electron beams SB 1, SB 2 to focus on fluorescers screen plane ing.
なお、制御電極10および加速電極20は、それぞれ３個
の円形の電子ビーム通過孔11,12,13,21,22,23を有し、
第１集束電極30の加速電極20側の端面には３個の円形の
電子ビーム通過孔31b,32b,33bが形成されている。The control electrode 10 and the acceleration electrode 20 have three circular electron beam passage holes 11, 12, 13, 21, 22, 23, respectively.
Three circular electron beam passage holes 31b, 32b, 33b are formed on the end surface of the first focusing electrode 30 on the side of the acceleration electrode 20.
動作時に各電極に与えられる印加電圧は、陰極に50〜
170V,制御電極に0V,加速電極に400〜800V、第１集束電
極30への印加電圧Vfとして５〜8kV、陽極電圧Ebとして2
5kVであり、また第２集束電極40には電子ビームの垂
直，水平偏向に同期して変化するダイナミツク電圧DVf
が印加される。このダイナミツク電圧DVfは、電子ビー
ムの偏向量が０のときは第１集束電極30の電圧Vfと同等
の５〜8kVであり、電子ビームの偏向量が増すに従つて
漸次上昇し、電子ビームの偏向量が最大のとき第１集束
電極30の電圧Vfよりも0.4〜1kVだけ高い電位となる。The applied voltage applied to each electrode during operation is 50-
170 V, 0 V for the control electrode, 400 to 800 V for the acceleration electrode, 5 to 8 kV as the applied voltage Vf to the first focusing electrode 30, 2 as the anode voltage Eb
5 kV, and a dynamic voltage DVf that changes in synchronization with the vertical and horizontal deflection of the electron beam is applied to the second focusing electrode 40.
Is applied. When the deflection amount of the electron beam is 0, the dynamic voltage DVf is 5 to 8 kV, which is equivalent to the voltage Vf of the first focusing electrode 30, and gradually increases as the deflection amount of the electron beam increases. When the deflection amount is the maximum, the potential becomes 0.4 to 1 kV higher than the voltage Vf of the first focusing electrode 30.
電子ビームの偏向量が０のときは、上記のように、第
１集束電極30と第２集束電極40との間に電位差がないた
め、第１集束電極30内部の平行平板（第１の平板電極：
垂直板）34,35,36、37と第２集束電極40に取付られてい
る平行平板（第２の平板電極：水平板）45,46による電
子ビームへの影響はなく、電子ビームは第２集束電極40
と陽極50との間の主レンズにより螢光体スクリーン面の
中央部で最適フオーカスで集束する。When the deflection amount of the electron beam is 0, since there is no potential difference between the first focusing electrode 30 and the second focusing electrode 40 as described above, a parallel flat plate (the first flat plate) inside the first focusing electrode 30 is used. electrode:
There is no influence on the electron beam by the parallel plates (second plate electrode: horizontal plate) 45, 46 attached to the vertical plates 34, 35, 36, 37 and the second focusing electrode 40. Focusing electrode 40
The main lens between the lens and the anode 50 focuses on the optimum focus at the center of the phosphor screen.
電子ビームの偏向量が増すと、第２集束電極40の電位
が第１集束電極30の電位よりも高くなることから、第１
集束電極30内部の平行平板（垂直板）34,35,36,37と第
２集束電極40に取付られた平行平板（水平板）45,46と
によつて４極レンズ電界が形成されると共に、第２集束
電極40と陽極50との電位差が減少して主レンズによる集
束作用が弱くなる。When the amount of deflection of the electron beam increases, the potential of the second focusing electrode 40 becomes higher than the potential of the first focusing electrode 30.
A quadrupole lens electric field is formed by parallel flat plates (vertical plates) 34, 35, 36, and 37 inside the focusing electrode 30 and parallel flat plates (horizontal plates) 45 and 46 attached to the second focusing electrode 40. The potential difference between the second focusing electrode 40 and the anode 50 is reduced, and the focusing effect of the main lens is weakened.
第10図は、第９図に示した電子銃の第１集束電極と第
２集束電極とによる４極レンズ電界作用の説明図であつ
て、（ａ）は第１集束電極の部分正面図、（ｂ）は第２
集束電極の部分断面図である。FIG. 10 is an explanatory view of a four-pole lens electric field effect by the first focusing electrode and the second focusing electrode of the electron gun shown in FIG. 9, (a) is a partial front view of the first focusing electrode, (B) is the second
FIG. 3 is a partial cross-sectional view of a focusing electrode.
同図において、Fh,Fv,Fvvは電界による電子ビームに
作用する力を、また第９図と同一符号は同一部分を示
す。9, Fh, Fv, and Fvv denote the forces acting on the electron beam due to the electric field, and the same reference numerals as those in FIG. 9 denote the same parts.
第１集束電極30内部の平行平板（垂直板）34,35,36,3
7と第２集束電極40に取付られた平行平板（水平板）45,
46とにより形成される電界は、所謂４極レンズ電界であ
り、同図（ａ）の第１集束電極30内部の垂直板34−35,3
5−36,36−37間（同図には35−36のみ示す）では、垂直
方向にゆるやかな、水平方向ではきつい集束電界が形成
され、電子ビームはFh−Fv（Fh＞Fv）の力で水平方向に
大きく集束される。また、同図（ｂ）の第２集束電極40
に取付られた水平板45−46間では、垂直方向できつく、
水平方向では殆ど影響のない発散レンズが形成され、Fv
vの力で垂直方向に大きく発散される。Parallel flat plates (vertical plates) 34, 35, 36, 3 inside the first focusing electrode 30
7 and a parallel flat plate (horizontal plate) 45 attached to the second focusing electrode 40,
46 is a so-called quadrupole lens electric field, and the vertical plates 34-35, 3 inside the first focusing electrode 30 in FIG.
Between 5-36 and 36-37 (only 35-36 is shown in the figure), a gentle focusing electric field is formed in the vertical direction and tight in the horizontal direction, and the electron beam is Fh-Fv (Fh> Fv). Is focused largely in the horizontal direction. Also, the second focusing electrode 40 shown in FIG.
Between the horizontal plates 45-46 attached to the vertical direction,
A divergent lens with little effect in the horizontal direction is formed, and Fv
It is greatly diverged in the vertical direction by the force of v.
このため、第１集束電極30と第２集束電極40との間で
電子ビームは垂直方向に縦長断面となり、偏向磁界を通
過する電子ビームが、前記第７図で説明したような４極
磁界成分によつて水平方向に横長の断面形状に歪むのと
は逆の作用となり、第１集束電極30と第２集束電極40の
両集束電極による作用の相殺によつて電子ビームスポツ
トの横長偏平化が防止される。For this reason, the electron beam has a vertically long section between the first focusing electrode 30 and the second focusing electrode 40, and the electron beam passing through the deflecting magnetic field has a quadrupole magnetic field component as described in FIG. Is distorted into a horizontally long cross-sectional shape in the horizontal direction, and the horizontal flattening of the electron beam spot is caused by the cancellation of the operation by the first focusing electrode 30 and the second focusing electrode 40. Is prevented.
また、電子ビームの偏向量が増すに従い、主レンズの
レンズ倍率が弱くなるので、偏向量が増加した電子ビー
ムが螢光体スクリーン面上でオーバフオーカスとなる度
合も軽減され、螢光体スクリーン面の中央部のみなら
ず、その周辺部においても最適フオーカスで集中させる
ことができ、かつ真円に近い電子ビームスポツトを得る
ことができる。Also, as the deflection amount of the electron beam increases, the lens magnification of the main lens becomes weaker, so that the degree of over-focusing of the electron beam having the increased deflection amount on the phosphor screen surface is reduced, and the phosphor screen is reduced. It is possible to concentrate the electron beam at an optimum focus not only at the center of the surface but also at the periphery thereof, and to obtain an electron beam spot close to a perfect circle.
上記の技術においては、カソードから出射される電子
ビームの量により螢光体スクリーン面の周辺部の補正量
が異なり、大電流時（高輝度時）と小電流時（低輝度
時）とで解像度が異なつてしまう。以下、上記従来技術
の問題点を図面により説明する。In the above technique, the amount of correction in the peripheral portion of the phosphor screen surface differs depending on the amount of the electron beam emitted from the cathode, and the resolution differs between a large current (high luminance) and a small current (low luminance). Will be different. Hereinafter, the problems of the above-described conventional technology will be described with reference to the drawings.
第11図は電子ビームの電流量の違いによる電子ビーム
スポツト形状変化の説明図であり、また第12図は陰極Ｋ
から螢光体スクリーンまでの間で電子ビームに作用する
力の説明図である。FIG. 11 is a diagram for explaining a change in the shape of the electron beam spot due to a difference in the amount of current of the electron beam, and FIG.
FIG. 4 is an explanatory diagram of a force acting on an electron beam between the device and the phosphor screen.
大電流時には前記第１集束電極30の垂直板34,35,36,3
7と第２集束電極40の水平板45,46の最適化を行つて螢光
体スクリーン面の周辺部のビームスポツトを第８図
（ａ）の（ａ−１）に示すように径小かつ真円に近いも
のにすると、小電流時では第８図（ａ）の（ａ−２）に
示したように水平方向オーバフオーカスとなり、ハロー
が生じて横長となる。また、小電流時には同図（ｂ）の
（ｂ−１）に示したように径小かつ真円に近いスポツト
形状とすることができるが、大電流では（ｂ−２）のよ
うに水平方向がアンダーフオーカスとなり、横長楕円の
コアーとなる。これは、電流量により電子ビーム相互間
の反発作用の力が異なるためと考えられる。At the time of a large current, the vertical plates 34, 35, 36, 3 of the first focusing electrode 30 are used.
7 and the horizontal plates 45 and 46 of the second focusing electrode 40 were optimized to reduce the beam spot at the periphery of the phosphor screen surface as shown in FIG. 8 (a) (a-1). When the current is close to a perfect circle, at a small current, a horizontal overfocus occurs as shown in (a-2) of FIG. 8 (a), and a halo occurs to be horizontally long. When the current is small, the spot shape can be small and close to a perfect circle as shown in (b-1) of FIG. Becomes an underfocus and becomes a horizontally long elliptical core. This is probably because the repulsive force between the electron beams differs depending on the amount of current.
通常、第２集束電極40に印加されるダイナミツクフオ
ーカス電圧DVfは螢光体スクリーン周辺部のビームスポ
ツトの垂直方向のハローを消すことで最適フオーカスと
なるように、大電流時では第１集束電極30の垂直板34,3
5,36,37と第２集束電極40の水平板45,46を最適化し、螢
光体スクリーン面周辺部の水平方向のビームスポツト径
を最小としている。このときの電子ビームへの水平方向
の作用は、第１集束電極と第２集束電極間の４極レンズ
作用（Fh），偏向歪みの作用（偏向磁界の作用：F
h1），電子ビーム間の反発作用（空間電荷反発作用：Fh
2）の３つが考えられ、螢光体スクリーン周辺部で最適
フオーカスを得るには、第12図（ａ）のように４極レン
ズの作用Fhは偏向歪みFh1（発散作用）と電子ビーム間
の反発作用Fh2（発散作用）とを合成したものの均衡が
とれ、螢光体スクリーン面周辺部で断面が丸いビームス
ポツトが得られる。一方、小電流では、同図（ｂ）のよ
うに電子ビーム間の反発作用Fh2が弱くなる分（同図で
はFh2を零としている）、４極レンズの集束作用Fhによ
り水平方向がオーバフオーカスとなる。このため、前記
先行技術では電子ビームの電流量の変化による螢光体ス
クリーン面周辺部でのビームスポツト形状の最適化は困
難であるという問題がある。Normally, the dynamic focus voltage DVf applied to the second focusing electrode 40 becomes the optimum focus by eliminating the vertical halo of the beam spot around the phosphor screen. Vertical plate 34,3 of electrode 30
5, 36, 37 and the horizontal plates 45, 46 of the second focusing electrode 40 are optimized to minimize the horizontal beam spot diameter at the periphery of the phosphor screen surface. At this time, the horizontal action on the electron beam includes the quadrupole lens action (Fh) between the first focusing electrode and the second focusing electrode, the action of deflection distortion (the action of the deflection magnetic field: F
h 1 ), repulsion between electron beams (space charge repulsion: Fh
In order to obtain the optimum focus at the periphery of the phosphor screen, the action Fh of the quadrupole lens is determined by the deflection distortion Fh 1 (divergence action) and the electron beam distance, as shown in FIG. 12 (a). The resilience Fh 2 (divergence) is balanced and a beam spot with a round cross section is obtained around the phosphor screen surface. On the other hand, in the case of a small current, the repulsion Fh 2 between the electron beams is weakened as shown in FIG. 4B (Fh 2 is set to zero in the figure), and the horizontal direction is over due to the focusing action Fh of the quadrupole lens. It becomes a focus. For this reason, the prior art has a problem that it is difficult to optimize the beam spot shape around the phosphor screen surface due to a change in the amount of current of the electron beam.
本発明は、このような問題点を除くもので、その目的
は、非軸対称レンズによるダイナミックフォーカスが行
われた際に、電子ビームの電流量に依存して生じる螢光
体スクリーンの周辺部の解像度の劣化を補正することを
可能にしたカラー受像管用電子銃を提供することにあ
る。The present invention eliminates such a problem. It is an object of the present invention to provide a method for controlling a peripheral portion of a phosphor screen which is generated depending on a current amount of an electron beam when dynamic focusing is performed by a non-axisymmetric lens. An object of the present invention is to provide an electron gun for a color picture tube which can correct the deterioration of the resolution.
上記目的を達成するために、本発明によるカラー受像
管用電子銃は、一方向に配列されて３本の電子ビームを
出射する陰極と、この陰極に対して少なくとも制御電
極、加速電極、集束電極、陽極電極とをこの順で管軸方
向に配置してなるものであって、上記集束電極は上記加
速電極側から上記陽極電極側にかけて配置された第１集
束電極、第２集束電極、第３集束電極からなり、上記陽
極電極と上記第３集束電極とが主レンズを構成し、上記
第２集束電極と上記第３集束電極とが相対向し、その対
向する端面に４極レンズ電界を形成する構造を設け、上
記第２集束電極に一定のフォーカス電圧を印加し、上記
第１集束電極と上記第３集束電極に直流電圧と電子ビー
ムの偏向角度の増大に伴って増大する電圧との重畳電圧
を印加することにより、上記第２集束電極と上記第３集
束電極との間で電子ビームの断面形状を縦長に変化させ
る作用を持つレンズ構造を形成し、かつ、上記第１集束
電極と上記加速電極との間で電子ビームの断面形状を横
長に変化させる作用を持つレンズ構造を形成しているも
のである。To achieve the above object, an electron gun for a color picture tube according to the present invention comprises a cathode arranged in one direction and emitting three electron beams, and at least a control electrode, an acceleration electrode, a focusing electrode, And an anode electrode arranged in this order in the tube axis direction, wherein the focusing electrode is a first focusing electrode, a second focusing electrode, and a third focusing electrode arranged from the acceleration electrode side to the anode electrode side. An anode electrode and the third focusing electrode constitute a main lens, and the second focusing electrode and the third focusing electrode face each other, and form a quadrupole lens electric field on the facing end surface. A constant focus voltage is applied to the second focusing electrode, and a superimposed voltage of a DC voltage and a voltage that increases with an increase in the deflection angle of the electron beam is applied to the first focusing electrode and the third focusing electrode. By applying A lens structure having a function of vertically changing the cross-sectional shape of the electron beam is formed between the second focusing electrode and the third focusing electrode, and electrons are formed between the first focusing electrode and the accelerating electrode. This forms a lens structure having the function of changing the cross-sectional shape of the beam horizontally.
また、上記目的を達成するために、本発明によるカラ
ー受像管用電子銃は、一方向に配列されて３本の電子ビ
ームを出射する陰極と、この陰極に対して少なくとも制
御電極、加速電極、集束電極、陽極電極とをこの順で管
軸方向に配置してなるものであって、上記集束電極は上
記加速電極側から上記陽極電極側にかけて配置された第
１集束電極、第２集束電極、第３集束電極からなり、上
記陽極電極と上記第３集束電極とが主レンズを構成し、
上記第２集束電極と上記第３集束電極とが相対向し、そ
の対向する端面に４極レンズ電界を形成する構造を設
け、上記第１集束電極と上記加速電極とが相対向し、上
記加速電極の上記第１集束電極側に電子ビーム通過孔に
対して垂直方向で狭く水平方向で広いスリット構造を形
成し、上記第２集束電極に一定のフォーカス電圧を印加
し、上記第１集束電極と上記第３集束電極にフォーカス
電圧と電子ビームの偏向角度の増大に伴って増大する電
圧との重畳電圧を印加することにより、上記第２集束電
極と上記第３集束電極との間で電子ビームの断面形状を
縦長に変化させる作用を持つ集束レンズ構造を形成して
いるものである。In order to achieve the above object, an electron gun for a color picture tube according to the present invention comprises a cathode which is arranged in one direction and emits three electron beams, and at least a control electrode, an acceleration electrode, and a focusing electrode. An electrode and an anode electrode are arranged in this order in the tube axis direction, wherein the focusing electrode is a first focusing electrode, a second focusing electrode, and a second focusing electrode arranged from the acceleration electrode side to the anode electrode side. The anode electrode and the third focusing electrode constitute a main lens;
The second focusing electrode and the third focusing electrode are opposed to each other, and a structure for forming a quadrupole lens electric field is provided on the facing end surface. The first focusing electrode and the accelerating electrode face each other, and the acceleration A slit structure that is narrow in the vertical direction and wide in the horizontal direction with respect to the electron beam passage hole is formed on the first focusing electrode side of the electrode, and a constant focus voltage is applied to the second focusing electrode. By applying a superimposed voltage of a focus voltage and a voltage that increases with an increase in the deflection angle of the electron beam to the third focusing electrode, an electron beam is applied between the second focusing electrode and the third focusing electrode. This forms a converging lens structure having the function of changing the cross-sectional shape into a vertically long shape.
第２集束電極の電子ビーム通過孔を挟む平行平板電極
（垂直板）および／または第３集束電極の電子ビーム通
過孔を挟む平行平板電極（水平板）により、４極レンズ
電界が形成される。また、第１集束電極と加速電極のス
リツト孔との間で４極レンズ電界が形成され、電子ビー
ム量が少ないときに大きく、電子ビーム量が増すに従つ
て小さくなるように上記４極レンズ作用が変化する。A quadrupole lens electric field is formed by a parallel plate electrode (vertical plate) sandwiching the electron beam passage hole of the second focusing electrode and / or a parallel plate electrode (horizontal plate) sandwiching the electron beam passage hole of the third focusing electrode. A quadrupole lens electric field is formed between the first focusing electrode and the slit hole of the accelerating electrode. The quadrupole lens action is such that the electric field is large when the electron beam amount is small and becomes small as the electron beam amount increases. Changes.
また、第１集束電極と第３集束電極の印加電圧を電子
ビームの偏向角の増大に従つて高くなるように変化させ
ることにより、電子ビームの偏向角が大きくなるに伴つ
て４極レンズの作用が増す。Further, by changing the applied voltage of the first focusing electrode and the third focusing electrode so as to increase as the deflection angle of the electron beam increases, the action of the quadrupole lens increases as the deflection angle of the electron beam increases. Increase.
以上により、電子ビームの電流量による主レンズの４
極レンズ作用をプリフオーカスレンズの４極レンズによ
り補正でき、電子ビームの電流量変化に伴う解像度の低
下を招くことなく螢光体スクリーン全域にわたつて高い
解像度が得られる。As described above, the amount of current of the main lens 4
The function of the polar lens can be corrected by the quadrupole lens of the prefocus lens, and a high resolution can be obtained over the entire phosphor screen without causing a decrease in resolution due to a change in the amount of current of the electron beam.
以下、本発明の実施例を図面を参照して説明する。 Hereinafter, embodiments of the present invention will be described with reference to the drawings.
第１図は本発明によるカラー受像管用電子銃の第１の
実施例の説明図であり、（ａ）は電子銃の構成を示す断
面図、（ｂ）は加速電極を（ａ）の矢印Ａ方向からみた
正面図であつて、K1，K2，K3は熱陰極（以下、単に陰
極）、10は制御電極、20は加速電極、30は第１集束電
極、40は第２集束電極、48はリム電極、50は第３集束電
極、60は陽極電極（以下、単に陽極）、11,12,13,21,2
2,23,31,32,33,41a,42a,43a,41b,42b,43b,51a,52a,53a,
51b,52b,53b,61,62,63は電子ビーム通過孔を示し、44,4
5,46,47は垂直板、48はリム電極、54（55）は水平板を
示す。また、Ｃは電子銃軸、CBはセンタービーム、S
B1，SB2はサイドビームである。そして、水平方向一直
線上に配列された陰極K1，K2，K3、制御電極10、加速電
極20、第１集束電極30、第２集束電極40、第３集束電極
50および最終加速電極である陽極60とでインライン型カ
ラー受像管用電子銃を構成している。FIG. 1 is an explanatory view of a first embodiment of an electron gun for a color picture tube according to the present invention, wherein FIG. 1 (a) is a cross-sectional view showing the structure of the electron gun, and FIG. K 1 , K 2 , and K 3 are hot cathodes (hereinafter simply referred to as cathodes), 10 is a control electrode, 20 is an accelerating electrode, 30 is a first focusing electrode, and 40 is a second focusing electrode. , 48 is a rim electrode, 50 is a third focusing electrode, 60 is an anode electrode (hereinafter simply referred to as anode), 11, 12, 13, 21, 2
2,23,31,32,33,41a, 42a, 43a, 41b, 42b, 43b, 51a, 52a, 53a,
51b, 52b, 53b, 61, 62, 63 indicate electron beam passage holes, and 44, 4
5, 46, 47 are vertical plates, 48 is a rim electrode, and 54 (55) is a horizontal plate. C is the electron gun axis, CB is the center beam, S
B 1 and SB 2 are side beams. Then, the cathodes K 1 , K 2 , K 3 arranged on a straight line in the horizontal direction, the control electrode 10, the acceleration electrode 20, the first focusing electrode 30, the second focusing electrode 40, and the third focusing electrode
An electron gun for an in-line type color picture tube is constituted by 50 and an anode 60 which is a final accelerating electrode.
加速電極20は３個の円形の電子ビーム通過孔21,22,23
を有し、第１集束電極30側に電子ビーム配列方向に長い
スリツト孔24,25,26が形成されている。このスリツト孔
は３個独立して図示してあるが、これに替えて第２図に
例示したように３個の電子ビーム通過孔を包囲する一個
のスリツトとしてもよく、加速電極20と構造的に独立さ
せ、電気的に同電位となるように接続してもよい。The accelerating electrode 20 has three circular electron beam passage holes 21, 22, 23.
And slit holes 24, 25, 26 long in the electron beam arrangement direction are formed on the first focusing electrode 30 side. Although three slit holes are shown independently, it may be replaced with one slit surrounding three electron beam passage holes as shown in FIG. And may be connected so as to be electrically at the same potential.
第２図は第１図における加速電極に設けるスリツト孔
の他の例の説明図であつて、（ａ）〜（ｃ）は各電子ビ
ーム毎にスリツト孔を設けたもの、（ｄ）〜（ｆ）は全
電子ビームに共通のスリツト孔を設けたものを示す。FIG. 2 is an explanatory view of another example of the slit holes provided in the accelerating electrode in FIG. 1, wherein (a) to (c) show slit holes provided for each electron beam, and (d) to (d). f) shows a case where a slit hole common to all electron beams is provided.
同図（ａ）は、加速電極20に電子ビーム通過孔21,22,
23より大きな矩形開孔241,242,243を開設した電極200を
一体化して実効的にスリツト孔を形成したものである。FIG. 3A shows that the electron beam passing holes 21, 22,
A slit hole is effectively formed by integrating the electrode 200 having rectangular openings 241, 242, 243 larger than 23.
同図（ｂ）は各電子ビームを個別に包囲する横長枠状
の電極341,342,343を加速電極20に取り付けてスリツト
孔の効果を付与したものである。FIG. 2B shows a horizontally elongated frame-shaped electrode 341, 342, 343 which individually surrounds each electron beam attached to the accelerating electrode 20 to give the effect of a slit hole.
同図（ｃ）は、加速電極20に対して構造的に分離し、
各電子ビームに個別の横長開孔401,402,403を形成した
電極400を近接配置したものである。FIG. 3C shows a structure in which the accelerating electrode 20 is structurally separated.
An electrode 400 having individual horizontally elongated holes 401, 402, and 403 formed in each electron beam is arranged close to each other.
同図（ｄ）は、加速電極20の第１集束電極30側に全電
子ビームに共通の横長スリツト500を形成したものであ
る。FIG. 4D shows a horizontal slit 500 common to all electron beams formed on the first focusing electrode 30 side of the acceleration electrode 20.
同図（ｅ）は、加速電極20に対して全電子ビームに共
通の横長開孔601を有する電極600を近接配置したもので
ある。FIG. 7E shows an arrangement in which an electrode 600 having a horizontally long opening 601 common to all electron beams is arranged close to the acceleration electrode 20.
同図（ｆ）は、加速電極20の形状を図示のように電子
ビーム通過孔21,22,23の配列方向に折曲した横長溝状に
形成して第１集束電極30側に伸びた壁700でスリツト孔
の効果を付与したものである。FIG. 5F shows a configuration in which the shape of the accelerating electrode 20 is formed in a horizontally long groove shape bent in the arrangement direction of the electron beam passage holes 21, 22, and 23, and the wall extending toward the first focusing electrode 30 is shown in FIG. At 700, the effect of the slit hole was given.
なお、この他に実質的スリツト孔は上記各例に限るも
のでなく、また開孔形状も横長楕円，あるいは菱形等と
してもよい。In addition, the substantial slit holes are not limited to the above examples, and the opening shape may be a horizontally long ellipse, a rhombus, or the like.
第１集束電極30は円形の電子ビーム通過孔31,32,33を
有し、第３集束電極50と電気的に接続されて電子ビーム
の偏向に同期して変化するダイナミックフォーカス電圧
DVfが印加されている。また、第１集束電極30の電子ビ
ーム通過孔は加速電極20側の電子ビーム通過孔と第２集
束電極40側の電子ビーム通過孔とは必ずしも一致した孔
径である必要はなく、加速電極20側の電子ビーム通過孔
の孔径が第２集束電極40側の孔径より小さくても，大き
くてもよい。The first focusing electrode 30 has circular electron beam passage holes 31, 32, and 33, and is electrically connected to the third focusing electrode 50 to change a dynamic focus voltage synchronized with the deflection of the electron beam.
DVf is applied. The electron beam passage hole of the first focusing electrode 30 does not necessarily have to have the same diameter as the electron beam passage hole of the acceleration electrode 20 side and the electron beam passage hole of the second focusing electrode 40 side. The hole diameter of the electron beam passage hole may be smaller or larger than the hole diameter on the second focusing electrode 40 side.
第３図，第４図は本発明の第２実施例と第３実施例の
説明図であつて、Ec1は制御電極10に印加する電圧、Ec2
は加速電極20に印加する電圧、Vfはフオーカス電圧、DV
fはダイナミックフオーカス電圧である。FIGS. 3 and 4 are explanatory views of the second embodiment and the third embodiment of the present invention, wherein Ec1 is a voltage applied to the control electrode 10, Ec2
Is the voltage applied to the acceleration electrode 20, Vf is the focus voltage, DV
f is a dynamic focus voltage.
同各図において、第１集束電極30と第２集束電極40と
の間に３個の電子ビーム通過孔を有する補助電極70を設
けると共に、第３図では加速電極20と補助電極70とを電
気的に接続し、第１集束電極30,第２集束電極40に印加
される電圧よりも低い電圧である加速電極20に印加する
加速電圧Ec2を補助電極70に与えるように構成したもの
である。In each of the figures, an auxiliary electrode 70 having three electron beam passage holes is provided between a first focusing electrode 30 and a second focusing electrode 40, and the acceleration electrode 20 and the auxiliary electrode 70 are electrically connected in FIG. The auxiliary voltage is applied to the auxiliary electrode 70 with an acceleration voltage Ec2 applied to the acceleration electrode 20 which is lower than the voltage applied to the first focusing electrode 30 and the second focusing electrode 40.
また、第４図は補助電極70に第１集束電極30,第２集
束電極40に印加する電圧よりも高い電圧である陽極電圧
Ebを印加するようにしたものである。FIG. 4 shows the anode voltage which is higher than the voltage applied to the auxiliary electrode 70 to the first focusing electrode 30 and the second focusing electrode 40.
Eb is applied.
再度、第１図を参照して説明する。 Description will be made again with reference to FIG.
第２集束電極40は、第３集束電極50側の端面に３個の
円形の電子ビーム通過孔41b,42b,43bを有し、第３集束
電極50に対向して、この電子ビーム通過孔を形成する端
面から上記電子ビーム通過孔を水平方向から挟んで上記
第３集束電極50方向に垂直に植立した４個の平行平板4
4,45,46,47からなる第１の平板電極（垂直板）を有して
いる。そして、第１の平板電極を構成する平行平板44,4
5,46,47を包囲し、かつこの平行平板の先端44a,45a,46
a,47aから第３集束電極50側に一定の距離まで延長した
リム電極48を有している。このリム電極48は、第２集束
電極40に構造的に一体化したものとして図示してある
が、これに替えて、第２集束電極40と構造的に独立させ
た電極で構成し、電気的に第２集束電極40と接続した構
成とすることもできる。The second focusing electrode 40 has three circular electron beam passing holes 41b, 42b, and 43b on the end face on the third focusing electrode 50 side, and is opposed to the third focusing electrode 50. Four parallel flat plates 4 vertically set in the direction of the third focusing electrode 50 with the electron beam passage hole interposed therebetween in the horizontal direction from the end face to be formed.
It has a first plate electrode (vertical plate) composed of 4,45,46,47. Then, the parallel plates 44, 4 constituting the first plate electrode
5,46,47 and the ends 44a, 45a, 46 of this parallel plate
A rim electrode 48 is extended from a, 47a to the third focusing electrode 50 side to a certain distance. Although the rim electrode 48 is shown as being structurally integrated with the second focusing electrode 40, the rim electrode 48 may be constituted by an electrode that is structurally independent from the second focusing electrode 40, and Alternatively, a configuration in which the second focusing electrode 40 is connected to the second focusing electrode 40 may be employed.
また、第３集束電極50は第２集束電極40側の端面に３
個の円形の電子ビーム通過孔51a,52a,53aを有し、この
電子ビーム通過孔を垂直方向から挟んで上記第２集束電
極40方向に水平に植立した一対の平行平板54,55からな
る第２の平板電極（水平板）を有している。なお、この
水平板の対は各電子ビームに対して各別に（すなわち３
対）設けてもよいものである。In addition, the third focusing electrode 50 is provided on the end face on the second focusing electrode 40 side.
It comprises a pair of parallel flat plates 54, 55 having a plurality of circular electron beam passing holes 51a, 52a, 53a, and vertically standing in the direction of the second focusing electrode 40 with the electron beam passing holes sandwiched from the vertical direction. It has a second plate electrode (horizontal plate). Note that this pair of horizontal plates is individually (ie, 3) for each electron beam.
Pair) may be provided.
そして、上記第２の平板電極（水平板）を構成する平
行平板の先端部54a,55aは第２集束電極40のリム電極48
内まで延長されており、第２集束電極40の平行平板の先
端部44a,45a,46a,47aに対して電子銃軸方向に一定間隔
ｌで設置されている。また、陽極60側の端面には３個の
円形の電子ビーム通過孔51b,52b,53bを有している。そ
して、陽極60の第３集束電極50側の端面には３個の円形
の電子ビーム通過孔61,62,63が設けられており、サイド
電子ビーム通過孔の電子銃軸からの離軸距離S2は、前段
電極である陰極K1，K2，K3、制御電極10、加速電極20、
第１集束電極30、第２集束電極40、第３集束電極50のサ
イド電子ビーム通過孔の離軸距離S1に対して、S2＞S1の
関係となつており、第３集束電極50と陽極60との間で主
レンズが形成され、サイド電子ビームSB1，SB2を螢光体
スクリーン面上に集中させるようになつている。The tips 54a, 55a of the parallel flat plates constituting the second flat plate electrode (horizontal plate) are connected to the rim electrode 48 of the second focusing electrode 40.
It extends to the inside and is disposed at a constant interval 1 in the axial direction of the electron gun with respect to the tips 44a, 45a, 46a, 47a of the parallel flat plates of the second focusing electrode 40. The end face on the anode 60 side has three circular electron beam passage holes 51b, 52b, 53b. On the end face of the anode 60 on the side of the third focusing electrode 50, three circular electron beam passage holes 61, 62, 63 are provided, and an off-axis distance S of the side electron beam passage hole from the electron gun axis is provided. 2 is a cathode K 1 , K 2 , K 3 , a control electrode 10, an acceleration electrode 20,
The first focusing electrode 30, a second focusing electrode 40, with respect to off-axis distance S 1 of the third side electron beam passage apertures of the focusing electrode 50, S 2> of and relationship with summer S 1, the third focusing electrode 50 A main lens is formed between the anode and the anode 60 so that the side electron beams SB 1 and SB 2 are concentrated on the phosphor screen.
なお、制御電極10および加速電極20は、それぞれ３個
の円形の電子ビーム通過孔11,12,13,21,22,23を有し、
第１集束電極30側には３個の電子ビーム通過孔31,32,33
が形成されている。The control electrode 10 and the acceleration electrode 20 have three circular electron beam passage holes 11, 12, 13, 21, 22, 23, respectively.
On the first focusing electrode 30 side, three electron beam passage holes 31, 32, 33
Are formed.
動作時に各電極に与えられる印加電圧は、陰極K1，
K2，K3に50〜170V、制御電極10に0V、加速電極20に400
〜800V、第２集束電極40への印加電圧Vfとして５〜8k
V、陽極電圧Ebとして25kVであり、また第１集束電極30
と第３集束電極50には電子ビームの垂直，水平偏向に同
期して変化するダイナミツク電圧DVfが印加される。こ
のダイナミツク電圧DVfは、電子ビームの偏向量が０の
ときは第２集束電極40の電圧Vfと同等の５〜8kVであ
り、電子ビームの偏向量が増すに従つて漸次上昇し、電
子ビームの偏向量が最大のとき第２集束電極40の電圧Vf
よりも0.4〜1kVだけ高い電位となる。During operation, the applied voltage applied to each electrode is the cathode K 1 ,
50 to 170 V for K 2 and K 3 , 0 V for control electrode 10, 400 for acceleration electrode 20
~ 800V, 5-8k as applied voltage Vf to the second focusing electrode 40
V, the anode voltage Eb is 25 kV, and the first focusing electrode 30
A dynamic voltage DVf which changes in synchronization with the vertical and horizontal deflection of the electron beam is applied to the third focusing electrode 50. When the deflection amount of the electron beam is 0, the dynamic voltage DVf is 5 to 8 kV, which is equivalent to the voltage Vf of the second focusing electrode 40, and gradually increases as the deflection amount of the electron beam increases. When the deflection amount is the maximum, the voltage Vf of the second focusing electrode 40
It becomes a potential higher by 0.4 to 1 kV than that.
電子ビームの偏向量が０のときは、上記のように、第
１集束電極30と第２集束電極40および第３集束電極50と
の間に電位差がないため、第２集束電極40内部の平行平
板（第１の平板電極：垂直板）44,45,46,47と第３集束
電極50に取付られている平行平板（第２の平板電極：水
平板）54,55による電子ビームへの影響はなく、電子ビ
ームは第３集束電極50と陽極60との間の主レンズにより
螢光体スクリーン面の中央部で最適フオーカスで集束す
る。When the deflection amount of the electron beam is 0, there is no potential difference between the first focusing electrode 30, the second focusing electrode 40, and the third focusing electrode 50 as described above. Influence on electron beam by flat plates (first flat electrode: vertical plate) 44, 45, 46, 47 and parallel flat plates (second flat electrode: horizontal plate) 54, 55 attached to third focusing electrode 50 Instead, the electron beam is focused at the optimum focus at the center of the phosphor screen by the main lens between the third focusing electrode 50 and the anode 60.
電子ビームの偏向量が増すと、第１集束電極30と第３
集束電極50の電位が第２集束電極40の電位よりも高くな
ることから、第２集束電極40内部の平行平板（垂直板）
44,45,46,47と第３集束電極50に取付られた平行平板
（水平板）54,55とによつて４極レンズ電界が形成され
ると共に、第３集束電極50と陽極60との電位差が減少し
て主レンズによる集束作用が弱くなり、前記した４極作
用によつて螢光体スクリーン面周辺部の電子ビームの横
長偏平化が防止される。なお、上記垂直板44、45、46、
47と水平板54、55の何れか一方が取付けられていれば、
上記第２集束電極40と第３集束電極50との間で４極レン
ズ電界が形成される。When the deflection amount of the electron beam increases, the first focusing electrode 30 and the third
Since the potential of the focusing electrode 50 is higher than the potential of the second focusing electrode 40, a parallel flat plate (vertical plate) inside the second focusing electrode 40 is used.
A quadrupole lens electric field is formed by the parallel flat plates (horizontal plates) 54 and 55 attached to the third focusing electrode 50 and the third focusing electrode 50 and the anode 60. The potential difference is reduced, the focusing effect by the main lens is weakened, and the above-described quadrupole effect prevents the electron beam in the periphery of the phosphor screen from being oblong and flattened. The vertical plates 44, 45, 46,
If either 47 or one of the horizontal plates 54, 55 is installed,
A quadrupole lens electric field is formed between the second focusing electrode 40 and the third focusing electrode 50.
また同時に、第１集束電極30の電位が高くなると加速
電極20と第１集束電極30との電位差が増大し、加速電極
20のスリツト孔24,25,26の４極レンズ作用が強くなる。At the same time, when the potential of the first focusing electrode 30 increases, the potential difference between the accelerating electrode 20 and the first focusing electrode 30 increases,
The four slit lenses 24, 25, 26 of the 20 slit holes function strongly as a quadrupole lens.
第５図は第１図に示した電子銃の加速電極20と第１集
束電極30とによる４極レンズ作用の説明図であつて、
（ａ）は電子ビームの偏向が０のときの管軸方向のカソ
ード，制御電極，加速電極，第１集束電極の断面図、
（ｂ）は電子ビームの偏向量を増加させた場合の上記と
同様の断面図である。FIG. 5 is a view for explaining the function of a quadrupole lens by the acceleration electrode 20 and the first focusing electrode 30 of the electron gun shown in FIG.
(A) is a sectional view of a cathode, a control electrode, an accelerating electrode, and a first focusing electrode in the tube axis direction when the electron beam deflection is 0,
(B) is a cross-sectional view similar to the above when the amount of deflection of the electron beam is increased.
同図において、カソードK2から出射した電子ビーム
は、制御電極10,加速電極20、第１集束電極30を通して
加速，集束されて一旦クロスオーバを形成し、主レンズ
に入射する。このクロスオーバの位置は電子ビームの電
流量によつて異なり、該電流量が少ないときはカソード
側のL1の距離になり、電流量が多いときは第１集束電極
30側のL2の距離となるように変化する。In the figure, the electron beam emitted from the cathode K 2 is a control electrode 10, acceleration electrode 20, accelerated through the first focusing electrode 30, is focused once to form a crossover, enters the main lens. The position of the crossover varies connexion by the current amount of the electron beam, when the power flow is small becomes the distance L 1 of the cathode side, when the amount of current is large first focusing electrode
Changes so that the 30 side of the distance L 2.
また、加速電極20のスリツト孔25は管軸方向に垂直方
向で狭く、水平方向で広い開口であるため、電子ビーム
は垂直方向で強く、水平方向で弱い集束作用を受けて横
長の断面形状となる。ただし、上記のように、電子ビー
ムの電流量によりクロスオーバの位置が変化して加速電
極のスリツト孔による４極作用が異なり、電子ビームの
電流量が少ないときはクロスオーバがカソード側にある
ため、スリツト孔による４極レンズ作用を強く受けて横
長楕円断面のビーム形状に、また該電流量が多いときは
クロスオーバの位置が第１集束電極30側に寄るため、４
極レンズ作用は弱くなつて丸に近い横長楕円断面のビー
ム形状となる。Further, since the slit hole 25 of the accelerating electrode 20 is narrow in the vertical direction in the tube axis direction and has a wide opening in the horizontal direction, the electron beam is strong in the vertical direction and weakly focused in the horizontal direction to have a horizontally long cross-sectional shape. Become. However, as described above, the position of the crossover changes depending on the current amount of the electron beam, and the quadrupole action due to the slit holes of the accelerating electrode differs. When the current amount of the electron beam is small, the crossover is on the cathode side. , Because of the strong influence of the quadrupole lens due to the slit hole, the beam shape becomes a horizontally long elliptical cross section, and when the current amount is large, the crossover position is closer to the first focusing electrode 30 side.
The polar lens function becomes weaker and becomes a beam shape having a horizontally long elliptical cross section close to a circle.
電子ビームの偏向時は、第１集束電極30の電位が偏向
角度が０のときに比べて高くなるため、前記４極レンズ
作用が強くなり、電子ビームの横長楕円はさらに横長と
なる。このため、第２集束電極40と第３集束電極50の垂
直板，水平板を電子ビームのビーム電流量が多いときに
最適化したときに生じる該ビーム量が少ないときの螢光
体スクリーン面周辺部の水平方向のオーバフオーカスを
上記横長楕円断面形状のビームスポツトを第２集束電極
40,第３集束電極50の４極レンズに入射させることによ
りオーバフオーカスを補正して真円に近いビームスポツ
トが得られ、電子ビーム量の変化によつて生じる第２集
束電極40と第３集束電極50の間の４極レンズ作用を補正
することができる。When the electron beam is deflected, the potential of the first focusing electrode 30 is higher than when the deflection angle is 0, so that the quadrupole lens function is enhanced, and the oblong ellipse of the electron beam becomes further oblong. Therefore, when the vertical plate and the horizontal plate of the second focusing electrode 40 and the third focusing electrode 50 are optimized when the beam current amount of the electron beam is large, the periphery of the phosphor screen when the beam amount is small is generated. The horizontal overfocus of the portion is converted to the beam spot having the above-mentioned oblong cross section by the second focusing electrode.
40, the beam is made incident on the quadrupole lens of the third focusing electrode 50 to correct the overfocus and obtain a beam spot close to a perfect circle, and the second focusing electrode 40 and the third focusing electrode generated by a change in the amount of electron beam. The quadrupole lens action between the focusing electrodes 50 can be corrected.
以上説明したように、本発明によれば、第２集束電極
と第３集束電極との対向面に電子ビームの非点収差を補
正する構造を備えたダイナミックフォーカスが行われる
カラー受像管用電子銃において、第２集束電極と第３集
束電極との間に電子ビームの断面形状を縦長に変化させ
る作用を持つ集束レンズ構造（第１構造）を形成してお
り、かつ、加速電極に電子ビームの断面形状を横長に変
化させる構造（第２構造）を形成しているので、電子ビ
ームの電流が小さいときに、第１構造によって形成され
る螢光体スクリーン面の周辺部の水平方向のオーバーフ
ォーカスによる縦長の電子ビームスポット形状が、第２
構造によって形成される同周辺部の横長の電子ビームス
ポット形状によって補正され、電子ビームの電流量の変
動に係わりなく、螢光体スクリーン面全体にわたり高い
解像度を得ることができる。As described above, according to the present invention, there is provided an electron gun for a color picture tube in which a dynamic focus is provided having a structure for correcting astigmatism of an electron beam on a surface facing a second focusing electrode and a third focusing electrode. A focusing lens structure (first structure) having a function of vertically changing the cross-sectional shape of the electron beam is formed between the second focusing electrode and the third focusing electrode, and the electron beam cross-section is formed on the accelerating electrode. Since the structure for changing the shape horizontally (second structure) is formed, when the current of the electron beam is small, a horizontal overfocus on the peripheral portion of the phosphor screen surface formed by the first structure occurs. The vertically elongated electron beam spot shape
Correction is made by the laterally elongated electron beam spot shape of the peripheral portion formed by the structure, and a high resolution can be obtained over the entire phosphor screen surface regardless of the fluctuation of the current amount of the electron beam.
第１図は本発明によるカラー受像管用電子銃の第１の実
施例の説明図、第２図は第１図における加速電極に設け
るスリツト孔の他の例の説明図、第３図，第４図は本発
明の第２実施例と第３実施例の説明図、第５図は第１図
に示した電子銃の加速電極と第１集束電極とによる４極
レンズ作用の説明図、第６図は４極レンズ磁界と電子ビ
ームとの関係の説明図、第７図はピンクッション磁界分
布の水平偏向磁界と電子ビームとの関係の説明図、第８
図はビームスポツトの形状歪の説明図、第９図は従来技
術による受像管装置の電子銃の説明図、第10図は第９図
に示した電子銃の第１集束電極と第２集束電極とによる
４極レンズ電界作用の説明図、第11図は電子ビームの電
流量の違いによる電子ビームスポツト形状変化の説明
図、第12図は電子ビームに作用する力の説明図である。 10……制御電極、20……加速電極、30……第１集束電
極、40……第２集束電極、48……リム電極、50……第３
集束電極、60……陽極電極、70……補助電極。FIG. 1 is an explanatory view of a first embodiment of an electron gun for a color picture tube according to the present invention, FIG. 2 is an explanatory view of another example of a slit hole provided in an accelerating electrode in FIG. 1, and FIGS. FIG. 5 is an explanatory view of a second embodiment and a third embodiment of the present invention. FIG. 5 is an explanatory view of a quadrupole lens action by the acceleration electrode and the first focusing electrode of the electron gun shown in FIG. FIG. 7 is an explanatory view of the relationship between the quadrupole lens magnetic field and the electron beam. FIG. 7 is an explanatory view of the relationship between the horizontal deflection magnetic field of the pincushion magnetic field distribution and the electron beam.
FIG. 9 is an explanatory view of the shape distortion of the beam spot, FIG. 9 is an explanatory view of an electron gun of a picture tube device according to the prior art, and FIG. 10 is a first focusing electrode and a second focusing electrode of the electron gun shown in FIG. FIG. 11 is a diagram for explaining the change in the shape of the electron beam spot due to the difference in the current amount of the electron beam, and FIG. 12 is a diagram for explaining the force acting on the electron beam. 10 control electrode, 20 acceleration electrode, 30 first focusing electrode, 40 second focusing electrode, 48 rim electrode, 50 third
Focusing electrode, 60 ... Anode electrode, 70 ... Auxiliary electrode.
フロントページの続き (72)発明者 石井 栄 千葉県茂原市早野3681番地 日立デバイ スエンジニアリング株式会社内 (56)参考文献 特開 昭64−38946（ＪＰ，Ａ) 特開 昭59−111237（ＪＰ，Ａ) 特開 昭63−218129（ＪＰ，Ａ) 特開 昭61−250933（ＪＰ，Ａ) (58)調査した分野(Int.Cl.7，ＤＢ名) H01J 29/50 Continuation of front page (72) Inventor Sakae Ishii 3681 Hayano, Mobara-shi, Chiba Hitachi Devices Engineering Co., Ltd. (56) References JP-A-64-38946 (JP, A) JP-A-59-111237 (JP, A) JP-A-63-218129 (JP, A) JP-A-61-250933 (JP, A) (58) Fields investigated (Int. Cl. 7 , DB name) H01J 29/50
Claims (5)
射する陰極と、この陰極に対して少なくとも制御電極、
加速電極、集束電極、陽極電極とをこの順で管軸方向に
配置してなるカラー受像管用電子銃において、上記集束
電極は上記加速電極側から上記陽極電極側にかけて配置
された第１集束電極、第２集束電極、第３集束電極から
なり、上記陽極電極と上記第３集束電極とが主レンズを
構成し、上記第２集束電極と上記第３集束電極とが相対
向し、その対向する端面に４極レンズ電界を形成する構
造を設け、上記第２集束電極に一定のフォーカス電圧を
印加し、上記第１集束電極と上記第３集束電極に直流電
圧と電子ビームの偏向角度の増大に伴って増大する電圧
との重畳電圧を印加することにより、上記第２集束電極
と上記第３集束電極との間で電子ビームの断面形状を縦
長に変化させる作用を持つレンズ構造を形成し、かつ、
上記第１集束電極と上記加速電極との間で電子ビームの
断面形状を横長に変化させる作用を持つレンズ構造を形
成していることを特徴とするカラー受像管用電子銃。1. A cathode arranged in one direction to emit three electron beams, and at least a control electrode with respect to the cathode,
In a color picture tube electron gun in which an acceleration electrode, a focusing electrode, and an anode electrode are arranged in this order in the tube axis direction, the focusing electrode is a first focusing electrode arranged from the acceleration electrode side to the anode electrode side, A second focusing electrode and a third focusing electrode, wherein the anode electrode and the third focusing electrode constitute a main lens; the second focusing electrode and the third focusing electrode face each other; And a constant focus voltage is applied to the second focusing electrode, and the DC voltage and the deflection angle of the electron beam are increased to the first focusing electrode and the third focusing electrode. A lens structure having a function of vertically changing the cross-sectional shape of the electron beam between the second focusing electrode and the third focusing electrode, and
An electron gun for a color picture tube, wherein a lens structure having a function of changing a cross-sectional shape of an electron beam into a horizontally long shape is formed between the first focusing electrode and the acceleration electrode.
射する陰極と、この陰極に対して少なくとも制御電極、
加速電極、集束電極、陽極電極とをこの順で管軸方向に
配置してなるカラー受像管用電子銃において、上記集束
電極は上記加速電極側から上記陽極電極側にかけて配置
された第１集束電極、第２集束電極、第３集束電極から
なり、上記陽極電極と上記第３集束電極とが主レンズを
構成し、上記第２集束電極と上記第３集束電極とが相対
向し、その対向する端面に４極レンズ電界を形成する構
造を設け、上記第１集束電極と上記加速電極とが相対向
し、上記加速電極の上記第１集束電極側に電子ビーム通
過孔に対して垂直方向で狭く水平方向で広いスリット構
造を形成し、上記第２集束電極に一定のフォーカス電圧
を印加し、上記第１集束電極と上記第３集束電極にフォ
ーカス電圧と電子ビームの偏向角度の増大に伴って増大
する電圧との重畳電圧を印加することにより、上記第２
集束電極と上記第３集束電極との間で電子ビームの断面
形状を縦長に変化させる作用を持つ集束レンズ構造を形
成していることを特徴とするカラー受像管用電子銃。2. A cathode arrayed in one direction to emit three electron beams, and at least a control electrode with respect to the cathode.
In a color picture tube electron gun in which an acceleration electrode, a focusing electrode, and an anode electrode are arranged in this order in the tube axis direction, the focusing electrode is a first focusing electrode arranged from the acceleration electrode side to the anode electrode side, A second focusing electrode and a third focusing electrode, wherein the anode electrode and the third focusing electrode constitute a main lens; the second focusing electrode and the third focusing electrode face each other; The first focusing electrode and the accelerating electrode are opposed to each other, and the first focusing electrode and the accelerating electrode face each other in the direction perpendicular to the electron beam passage hole. Forming a wide slit structure in the direction, applying a constant focus voltage to the second focusing electrode, and increasing the focusing voltage and the deflection angle of the electron beam to the first focusing electrode and the third focusing electrode. Superposition with voltage By applying pressure, the second
An electron gun for a color picture tube, characterized in that a focusing lens structure is formed between the focusing electrode and the third focusing electrode, the focusing lens structure having a function of vertically changing the cross-sectional shape of the electron beam.
おいて、上記スリット構造は、上記加速電極と別体の電
極により構成されていることを特徴とするカラー受像管
用電子銃。3. The electron gun for a color picture tube according to claim 1, wherein said slit structure comprises an electrode separate from said acceleration electrode.
いて、上記第１集束電極と上記第２集束電極との間に、
上記第１集束電極と上記第２集束電極に印加されるフォ
ーカス電圧よりも低い電圧が印加される補助電極を設け
たことを特徴とするカラー受像管用電子銃。4. An electron gun for a color picture tube according to claim 2, wherein said first focusing electrode and said second focusing electrode are disposed between said first focusing electrode and said second focusing electrode.
An electron gun for a color picture tube, comprising an auxiliary electrode to which a voltage lower than a focus voltage applied to the first focusing electrode and the second focusing electrode is provided.
いて、上記第１集束電極と上記第２集束電極との間に、
上記第１集束電極と上記第２集束電極に印加されるフォ
ーカス電圧よりも高い電圧が印加される補助電極を設け
たことを特徴とするカラー受像管用電子銃。5. An electron gun for a color picture tube according to claim 2, wherein said first focusing electrode and said second focusing electrode are disposed between said first focusing electrode and said second focusing electrode.
An electron gun for a color picture tube, further comprising an auxiliary electrode to which a voltage higher than a focus voltage applied to the first focusing electrode and the second focusing electrode is provided.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1187326A JP3050386B2 (en) | 1989-07-21 | 1989-07-21 | Electron gun for color picture tube |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1187326A JP3050386B2 (en) | 1989-07-21 | 1989-07-21 | Electron gun for color picture tube |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0353434A JPH0353434A (en) | 1991-03-07 |
| JP3050386B2 true JP3050386B2 (en) | 2000-06-12 |
Family
ID=16204046
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1187326A Expired - Fee Related JP3050386B2 (en) | 1989-07-21 | 1989-07-21 | Electron gun for color picture tube |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3050386B2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2682809B1 (en) * | 1991-10-21 | 1993-12-31 | Thomson Tubes Displays Sa | CATHODE RAY TUBE WITH IMPROVED ELECTRON CANON. |
-
1989
- 1989-07-21 JP JP1187326A patent/JP3050386B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0353434A (en) | 1991-03-07 |
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| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |