JP3067154B2 - Charged particle beam column - Google Patents
Charged particle beam columnInfo
- Publication number
- JP3067154B2 JP3067154B2 JP2078371A JP7837190A JP3067154B2 JP 3067154 B2 JP3067154 B2 JP 3067154B2 JP 2078371 A JP2078371 A JP 2078371A JP 7837190 A JP7837190 A JP 7837190A JP 3067154 B2 JP3067154 B2 JP 3067154B2
- Authority
- JP
- Japan
- Prior art keywords
- charged particle
- particle beam
- beam column
- groove
- vacuum
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000002245 particle Substances 0.000 title claims description 15
- 239000002184 metal Substances 0.000 claims description 20
- 229910052751 metal Inorganic materials 0.000 claims description 20
- 239000000919 ceramic Substances 0.000 claims description 9
- 238000000034 method Methods 0.000 claims description 3
- 230000000873 masking effect Effects 0.000 claims 1
- 125000006850 spacer group Chemical group 0.000 description 13
- 239000011248 coating agent Substances 0.000 description 8
- 238000000576 coating method Methods 0.000 description 8
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 6
- 238000007747 plating Methods 0.000 description 5
- 229910052759 nickel Inorganic materials 0.000 description 3
- 238000004140 cleaning Methods 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 238000003754 machining Methods 0.000 description 2
- 238000010943 off-gassing Methods 0.000 description 2
- 230000002265 prevention Effects 0.000 description 2
- 239000002390 adhesive tape Substances 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000007772 electroless plating Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000002241 glass-ceramic Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
Description
【発明の詳細な説明】 〔産業上の利用分野〕 本発明は荷電粒子線鏡筒に係り、該荷電粒子線鏡筒内
の真空度を向上させるために、内部のコンタミネーショ
ンを防止する技術に関するものである。Description: BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a charged particle beam column, and to a technique for preventing internal contamination in order to improve the degree of vacuum in the charged particle beam column. Things.
従来のこの種装置に使用される絶縁部材（以降絶縁ス
ペーサと称する）は一般に機械加工が可能なガラスセラ
ミックスあるいはアルミナ等のセラミックス（以下セラ
ミックと称する）が良く用いられており、その使用に関
しては、セラミックの素地のままで供していた。Insulating members (hereinafter referred to as insulating spacers) used in conventional devices of this type are generally made of glass ceramics which can be machined or ceramics such as alumina (hereinafter referred to as ceramics). It was served as a ceramic base.
上記の如き従来の技術においては、絶縁スペーサとし
てセラミックを使用している。しかしながら、セラミッ
クは表面が微少な結晶の集合で出来ているため、真空中
における単位面積当りのガス放出量が大きい。そのため
に、真空の鏡筒内で使用すると、その真空度を低下させ
ると共に、短時間の動作のみで内部汚れが発生し、分解
クリーニングを行なわなければならない問題点があっ
た。In the prior art as described above, ceramic is used as an insulating spacer. However, since the surface of the ceramic is made of a collection of fine crystals, the amount of gas released per unit area in a vacuum is large. Therefore, when used in a vacuum lens barrel, there is a problem that the degree of vacuum is reduced and internal dirt is generated only by a short-time operation, so that it is necessary to perform disassembly cleaning.
本発明の目的は、鏡筒内に配設される絶縁スペーサか
らのガス放出量を最小限に押えた荷電粒子線鏡筒を提供
することにある。An object of the present invention is to provide a charged particle beam column in which the amount of gas released from an insulating spacer provided in the column is minimized.
上記目的のために本発明では、荷電粒子線鏡筒の真空
内に配置された電極２を絶縁可能に保持するための絶縁
スペーサ３を有する荷電粒子線鏡筒において、 前記絶縁スペーサ３は絶縁保持に必要とする部分８を
除く全表面に、真空中におけるガス放出量の少ない金属
被膜を有することを課題解決の手段とするものである。In order to achieve the above object, the present invention provides a charged particle beam column having an insulating spacer 3 for insulatingly holding an electrode 2 disposed in a vacuum of the charged particle beam column. The object of the present invention is to provide a metal coating that emits a small amount of gas in a vacuum on the entire surface except for the portion 8 required for the method.
本発明においては、セラミック等からなる絶縁物の素
地が真空中に露出している表面を金属で被膜することに
よって、ガス放出が起きやすい表面積を減少させると共
に金属被膜のガス放出量はセラミックの表面からのそれ
と比較して１〜２桁少ないので、従来の如きガスの放出
を激減させることが出来る。従って荷電粒子線鏡筒内の
真空度を向上させることが出来ることはもとより、短時
間の動作のみで内部汚れが発生する従来の如き不都合は
ない。In the present invention, the surface of the insulating body made of ceramic or the like exposed in a vacuum is coated with a metal, thereby reducing the surface area where gas is easily released and reducing the amount of gas released from the metal coating. Since it is one or two orders of magnitude less than that of the prior art, the emission of gas as in the prior art can be drastically reduced. Therefore, not only can the degree of vacuum in the charged particle beam column be improved, but also there is no inconvenience as in the related art in which internal contamination occurs only by a short-time operation.
尚、ニッケルは無電解鍍金が可能な上に、非磁性にす
ることが可能なのでこの種の装置に使用する金属として
好適であるが、更に金を積層すれば、ガス放出量は更に
少なくなり酸化等で表面状態が変化する不都合も解消す
る。Nickel is suitable as a metal used in this type of apparatus because it can be electroless plated and can be made non-magnetic. For example, the inconvenience that the surface state changes due to the above-mentioned condition is also eliminated.
第１図は本発明の一実施例であって、８極の偏向電極
の一部を省略した２極のみを示した横断面図である。FIG. 1 is an embodiment of the present invention, and is a cross-sectional view showing only two poles in which a part of eight deflection electrodes is omitted.
第１図において偏向電極２はセラミック型の絶縁スペ
ーサ３に固定ビス４によって固設されている。電極間空
間５は放電加工によって形成された空間である。絶縁ス
ペーサ７内面の切欠かれた金属被膜面７は絶縁スペーサ
３の円筒内径を加工する前にあらかじめ所定位置に円形
穴を加工し、その後に円筒内径を加工することによって
形成される。この金属被膜面７はニッケルの無電解鍍金
を施された後に金鍍金で積層され実際使用状態ではガス
放出防止と共にアース電位も兼ねるようになっている。
放電防止逃げ６は金属被膜面７と偏向電極電位との間の
放電を防止するための逃げであって、偏向電極２の外径
の円筒面を加工する前に円形穴を所定位置に加工して後
に、外径加工をなすことによって形成される。絶縁スペ
ーサ３の表面は偏向電極、固定ビスの当接面及びその近
傍と固定ビスの貫通孔に形成した金属被膜未加工部８を
除き鍍金がなされておりアース電位となっている。In FIG. 1, the deflection electrode 2 is fixed to a ceramic type insulating spacer 3 by a fixing screw 4. The interelectrode space 5 is a space formed by electric discharge machining. The notched metal coating surface 7 on the inner surface of the insulating spacer 7 is formed by processing a circular hole in a predetermined position in advance before processing the cylindrical inner diameter of the insulating spacer 3 and then processing the cylindrical inner diameter. This metal coating surface 7 is electrolessly plated with nickel and then laminated with gold plating so as to prevent outgassing and also serve as a ground potential in an actual use state.
The discharge prevention relief 6 is a relief for preventing discharge between the metal coating surface 7 and the potential of the deflection electrode, and forms a circular hole at a predetermined position before machining the outer diameter cylindrical surface of the deflection electrode 2. Later, it is formed by working the outer diameter. The surface of the insulating spacer 3 is plated except for the contact surface of the deflection electrode and the fixing screw and the vicinity thereof and the metal film unprocessed portion 8 formed in the through hole of the fixing screw, and is at the ground potential.
紙面に垂直方向に形成されたビーム通路１からは、絶
縁スペーサ３の表面は見えず、金属鍍金された金属被膜
面７のみが見える。金属鍍金を施さない絶縁スペーサ３
の内面と金属鍍金実施面は曲率半径が異るため、容易に
その境界が判別される。The surface of the insulating spacer 3 cannot be seen from the beam path 1 formed in a direction perpendicular to the plane of the paper, and only the metal-coated metal coating surface 7 can be seen. Insulation spacer 3 without metal plating
Since the radius of curvature is different between the inner surface and the metal plating surface, the boundary between them can be easily determined.
実施例では金属被膜未加工部８に鍍金液に耐える接着
テープを若干幅広に切って、未加工部前面に貼付けた
後、無電解鍍金を行なった。In the example, the metal tape unprocessed portion 8 was slightly widened with an adhesive tape resistant to the plating solution, attached to the front of the unprocessed portion, and then subjected to electroless plating.
この結果セラミックからなる絶縁スペーサ７の全表面
積のうち約2/3は金属被膜を形成することが出来た。As a result, a metal film could be formed on about 2/3 of the total surface area of the insulating spacer 7 made of ceramic.
尚鍍金による金属被膜は非磁性ニッケル被膜上に金を
積層させる構成とした。The metal film formed by plating had a structure in which gold was laminated on a nonmagnetic nickel film.
以上の様に本発明によれば絶縁スペーサの大部分をガ
ス放出率の小さい金属被膜で被覆したので荷電粒子線鏡
筒内の真空度の保持が容易になる効果がある。また、ガ
スの放出が従来と比較して激減することから、鏡筒内部
の汚れの進行が非常に遅くなるので分解クリーニングを
する間隔が長くなる利点もある。As described above, according to the present invention, since most of the insulating spacers are covered with the metal film having a small outgassing rate, it is possible to easily maintain the degree of vacuum in the charged particle beam column. In addition, since the release of gas is greatly reduced as compared with the conventional case, the progress of dirt inside the lens barrel becomes very slow, so that there is an advantage that the interval of the disassembly cleaning becomes longer.
第１図は本発明による荷電粒子線鏡筒の一実施例を示す
図であって、８極の変更電極の一部省略した２極のみを
示した横断面図である。 〔主要部分の符号の説明〕 １……ビーム通路、 ２……偏向電極、 ３……絶縁スペーサ、 ４……固定ビス、 ５……電極間空間、 ６……放電防止逃げ、 ７……金属被膜面、 ８……金属被膜未加工部。FIG. 1 is a view showing one embodiment of a charged particle beam column according to the present invention, and is a cross-sectional view showing only two poles of which eight electrodes are partially omitted. [Description of Signs of Main Parts] 1... Beam path, 2... Deflecting electrode 3... Insulating spacer 4... Fixing screw 5... Interelectrode space 6... Discharge prevention escape 7. Coating surface, 8: Unprocessed portion of metal coating.
───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 昭57−68027（ＪＰ，Ａ) 特開 昭64−89135（ＪＰ，Ａ) 特開 平２−247966（ＪＰ，Ａ) 特開 平３−102751（ＪＰ，Ａ) 特開 平３−276548（ＪＰ，Ａ) 特開 平２−100250（ＪＰ，Ａ) (58)調査した分野(Int.Cl.7，ＤＢ名) H01J 37/16 H01L 21/265 603 ────────────────────────────────────────────────── ─── Continuation of front page (56) References JP-A-57-68027 (JP, A) JP-A-64-89135 (JP, A) JP-A-2-247966 (JP, A) JP-A-3- 102751 (JP, A) JP-A-3-276548 (JP, A) JP-A-2-100250 (JP, A) (58) Fields investigated (Int. Cl. 7 , DB name) H01J 37/16 H01L 21 / 265 603
Claims (4)
を絶縁可能に保持するための絶縁部材を有する荷電粒子
線鏡筒において、 前記絶縁部材は同軸円筒形状で、その内側に軸方向に沿
って電極数に等しい数の、断面が円の一部で深さが円の
半径より小さい溝を設けると共に、該溝及び前記電極の
絶縁保持に必要とする部分を除く全表面に、真空中にお
けるガス放出量が少なく酸化され難い金属皮膜を選択的
に形成したことを特徴とする荷電粒子線鏡筒。1. A charged particle beam column having an insulating member for insulatingly holding an electrode arranged in a vacuum of the charged particle beam column, wherein the insulating member has a coaxial cylindrical shape, and a shaft is provided inside the coaxial cylindrical member. Along with the number of electrodes along the direction, while providing a groove having a cross section that is a part of a circle and a depth that is smaller than the radius of the circle, on the whole surface except for the groove and the part required for insulating the electrode, A charged particle beam column characterized by selectively forming a metal film that emits a small amount of gas in a vacuum and is hardly oxidized.
幅方向の端部と一定以上の間隔を保つ溝を２本形成した
ことを特徴とする荷電粒子線鏡筒。2. A charged particle beam column according to claim 1, wherein each of said electrodes is formed with two grooves which keep a predetermined distance or more from an end of said groove in the width direction.
ックである事を特徴とする荷電粒子線鏡筒。3. A charged particle beam column according to claim 1, wherein said insulating member is made of ceramic.
皮膜を形成する時、皮膜形成面と非形成面との曲率半径
が異なることによる境界が容易に判別される事を利用し
てマスキングを行い金属皮膜を選択的に形成したことを
特徴とする荷電粒子線鏡筒。4. A method according to claim 1, wherein when a metal film is selectively formed in said groove, a boundary due to a difference in curvature radius between a film-formed surface and a non-formed surface is easily determined. A charged particle beam column characterized by selectively forming a metal film by masking.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2078371A JP3067154B2 (en) | 1990-03-27 | 1990-03-27 | Charged particle beam column |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2078371A JP3067154B2 (en) | 1990-03-27 | 1990-03-27 | Charged particle beam column |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH03276549A JPH03276549A (en) | 1991-12-06 |
| JP3067154B2 true JP3067154B2 (en) | 2000-07-17 |
Family
ID=13660153
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2078371A Expired - Fee Related JP3067154B2 (en) | 1990-03-27 | 1990-03-27 | Charged particle beam column |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3067154B2 (en) |
-
1990
- 1990-03-27 JP JP2078371A patent/JP3067154B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH03276549A (en) | 1991-12-06 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |