JP3057042B2 - Blanking system for charged particle beam writing - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a charged particle beam drawing blanking apparatus used for on / off operation of a charged particle beam when drawing a fine pattern of a semiconductor device.

[0002]

2. Description of the Related Art Among the most advanced semiconductor manufacturing processes, it is said that electron beams will be used in the lithography process in the future. Electron beam lithography has a great advantage in that a higher resolution than that obtained by lithography using light can be obtained.

However, it is known that electron beam writing has the following problems. That is, the electron beam applied to the sample surface enters the inside of the sample, is scattered there, and returns to the sample surface again, so that the resist on the sample surface other than where the electron beam is incident is exposed by so-called backscattered electrons. The proximity effect occurs, and the drawing accuracy is degraded.

On the other hand, even when there is a proximity effect as a physical phenomenon, in order to obtain a high-precision pattern drawing accuracy, an effective irradiation amount due to back scattering and an incident electron Proximity effect correction for giving a dose distribution such that the sum with the dose is constant is performed.
As the demand for pattern accuracy becomes stricter, the correction of the irradiation amount becomes finer. When writing a mask used for forming a pattern of 0.15 μm or less, the pulse width of the beam is 30 ns or less due to the increased sensitivity of the resist, and the electron beam Is required to be 1 ns or less. In order to control the pulse width of such a beam, the rising and falling time of the pulse waveform of the beam needs to be 10 ns or less. This requirement is expected to become more severe in the future.

In general, a blanking device as shown in FIG. 5 is used to turn on and off an electron beam. FIG.
FIG. 1 is a diagram showing the overall configuration of a conventional electron beam drawing blanking apparatus. The voltage signal applied from the pulse generator 4 is applied through the coaxial cable 5 to the blanking electrodes 2 and 3 having a parallel plate shape. At this time, the trajectory of the electron beam 1 is bent in the direction shown by the broken line by the electric field generated between the blanking electrodes, and is blocked by the wall of the blanking aperture 8. This is the state where the beam is off. Conversely, when the voltage signal is 0, the electron beam 1 passes through the blanking aperture 8 without being affected by the blanking electrodes 2 and 3. This is the state where the beam is on.

However, this method has the following problems. That is, considering this blanking device as an electric circuit, the blanking electrodes 2 and 3 function as capacitors. That is, the impedance is almost 0 for a fast signal, while the impedance is almost infinite for a slow signal. On the other hand, since the characteristic impedance of the coaxial cable 5 is generally 50Ω or 75Ω, the actual voltage applied to the blanking electrodes 2 and 3 is
When the characteristic impedance of the blanking electrodes 2 and 3 matches the characteristic impedance of the coaxial cable 5, the impedance becomes maximum by impedance matching. Otherwise,
That is, if the two characteristic impedances do not match,
The signal applied from the pulse generator 4 is reflected on the blanking electrodes 2 and 3. Therefore, the actual voltage applied to the blanking electrodes 2 and 3 is affected by the speed of the applied signal.

In order to solve the problem of impedance mismatch, Kelly et al. In US Pat. No. 4,445,041 proposed a blanking device having a parallel-line transmission line type structure as shown in FIG. Since the electromagnetic wave transmitted through such a parallel-line transmission line may be considered as a TEM mode, the phase velocity and group velocity are not dependent on the frequency, and are therefore advantageous for high-speed operation. However, this method has the following disadvantages. That is, since the parallel line is open to the space, when there is a conductor around, a current flows on the conductor surface by an electromagnetic field leaking from the transmission line. In terms of an equivalent circuit, the impedance has a discontinuity, and the impedance has a frequency characteristic. In that case, the phase speed and the group speed have frequency dependence, and the expected high speed performance cannot be obtained after all.

[0008]

As described above, the blanking operation for turning on and off the charged particle beam by the conventional blanking apparatus for drawing a charged particle beam involves the problem of impedance mismatch between the blanking electrode and the coaxial cable, or Due to the problem of impedance discontinuity due to the electromagnetic field leaking from the transmission line, it has been difficult to perform the operation at high speed.

SUMMARY OF THE INVENTION The present invention has been made to solve the above problems, and an object of the present invention is to provide a charged particle beam writing blanking apparatus capable of performing a highly reliable blanking operation at high speed. To provide.

[0010]

A blanking apparatus for drawing a charged particle beam according to the first aspect of the present invention is used in a charged particle beam drawing apparatus for drawing a desired pattern by irradiating a charged particle beam onto a sample. A blanking electrode that deflects the charged particle beam by applying a voltage to the two electrodes,
A blanking aperture configured to cut off the path of the charged particle beam in one of the ON and OFF states of the voltage by the blanking electrode, wherein the blanking electrode includes an inner conductor and the inner conductor. A coaxial line composed of an outer conductor provided so as to cover the conductor, one of the blanking electrodes is an inner conductor, the other electrode is an outer conductor, and a charged particle beam is provided on a side wall of the outer conductor. Characterized in that an entrance port and an exit port are formed.

The preferred embodiments of the present invention are as follows. (1) A charged particle beam passes through one of the slit-like holes substantially parallel to the axial direction to the outer conductor of the coaxial line constituting the blanking electrode, and the slit through which the beam passes deflects the charged particles by the blanking electrode. Is substantially parallel to the direction in which (2) A cooling pipe for cooling the internal conductor is provided in the internal conductor. (3) An exhaust slit is provided on the side wall of the outer conductor to maintain a vacuum between the inner conductor and the outer conductor.

A charged particle beam writing blanking apparatus according to a second aspect of the present invention is used in a charged particle beam writing apparatus for writing a desired pattern by irradiating a charged particle beam onto a sample. And a plurality of blanking electrodes provided along the path of the charged particle beam, and provided at or near the image forming position of the virtual light source of the charged particle beam or a position conjugate to the virtual light source. A charged particle comprising a blanking aperture that blocks the path of the charged particle beam in one of the on / off states of the voltage by the blanking electrode, and a shaped aperture provided downstream of the plurality of blanking electrodes. In the blanking apparatus for beam writing, each of the plurality of blanking electrodes has two electrodes, and one of the electrodes is an inner electrode. A conductor, and the other electrode is a coaxial line composed of an outer conductor provided so as to cover the inner conductor; an entrance and an exit of a charged particle beam are formed on side walls of the outer conductor; The coaxial line constituting the blanking electrode is characterized in that, when the charged particle beam is deflected by the blanking electrode, the center of gravity of the charged particle beam in the shaping aperture is not moved. .

In a preferred embodiment of the present invention, there are two blanking electrodes, and the two blanking electrodes are arranged so that the beam deflection directions are reversed. The charged particle beam drawing blanking apparatus according to claim 3 of the present invention is such that the voltages to the plurality of blanking electrodes are applied in accordance with the passage time of the charged particle beam in each blanking electrode. There is a feature.

Preferred embodiments of the present invention are as follows. (1) Means for cooling the inner conductor of the coaxial line. (2) A TEM mode is used as an electromagnetic wave propagating between conductors. Strictly speaking, the TEM mode is defined by a transmission line that is uniform in the direction of propagation of a wave.

According to a fourth aspect of the present invention, there is provided a blanking apparatus for drawing a charged particle beam, wherein an entrance and an exit formed in the outer conductor are provided with attenuation of a desired operating frequency of a blanking electrode against an electromagnetic field. A hole longer than the length and attached along the traveling direction of the charged particles is provided.

According to a fifth aspect of the present invention, there is provided the blanking apparatus for drawing a charged particle beam, wherein the entrance and the exit formed in the outer conductor are formed with slits formed in parallel with the axial direction of the outer conductor. It is characterized by comprising a hole of a shape. (Function) In the present invention, a coaxial line composed of an internal conductor and an external conductor provided so as to cover the internal conductor is used as a blanking electrode.
Each constitutes two electrodes of a blanking electrode.
The charged particle beam enters the inside of the external conductor from the entrance provided in the external conductor, that is, between the external conductor and the internal conductor, exits from the exit, and exits the external conductor. At this time, the path of the charged particle beam is deflected by applying a voltage between the inner conductor and the outer conductor. In this course deflection, the beam course is cut off by the blanking aperture corresponding to the on / off state of the voltage application, and the charged particle beam can be turned on / off. In addition, by using a coaxial line as a blanking electrode, the electromagnetic field exists only in a region surrounded by the outer conductor, so that the electromagnetic field is highly reliable without being affected by the presence of the conductor outside the outer conductor. Operation becomes possible.

Further, as an electromagnetic wave propagating between conductors, TE
Since the M mode can be used, the phase velocity and the group velocity of the electromagnetic field generated in the external conductor have no frequency dependence, and a high-speed blanking operation can be performed.

Further, by providing a plurality of blanking electrodes and arranging the respective coaxial lines constituting the plurality of blanking electrodes so that the center of gravity of the charged particle beam in the shaping aperture does not move in both the on and off states, a stable blanking is achieved. Ranking operation becomes possible.

[0019]

Embodiments of the present invention will be described below with reference to the drawings. (First Embodiment) FIG. 1 is a perspective view showing the entire configuration of a charged particle beam drawing apparatus to which a blanking apparatus according to a first embodiment of the present invention is applied. The charged particle beam writing apparatus includes an electron gun 11 for emitting an electron beam, a first shaping aperture 12, a first shaping lens 13, and a second shaping lens 1.
4, a second forming aperture 15, a reducing lens 16, a blanking electrode 17a, and a blanking aperture 17b.
, A deflector 18, a focusing lens 19, and a drawing sample 20. The electron beam emitted from the electron gun 11 is processed into a desired shape and drawn on the drawing sample 20.

The object of the present invention is a blanking electrode 17a and a blanking aperture 17b. The blanking electrode 17a is fired from the electron gun 11 and
The deflection of the trajectory of the electron beam formed by the molding lens 12, the second molding lens 14, and the like is performed. The blanking aperture 17b cuts off the electron beam out of the trajectory to turn on and off the electron beam. The electron beam is turned on and off in accordance with the presence or absence of a voltage applied to the blanking electrode 17a, and the drawing sample 20 is irradiated on and off in accordance with the on / off operation.

Here, the detailed configuration of the charged particle beam drawing blanking apparatus according to the first embodiment of the present invention is shown in FIG.
Shown in As shown in FIG. 2, the blanking device according to the present embodiment is roughly divided into a blanking electrode for deflecting the trajectory of the electron beam, and a blanking device for cutting off the path of the electron beam when the voltage is turned on by the blanking electrode. It comprises a ranking aperture 34.

Here, the blanking electrode is constituted by a coaxial line. That is, for example, the inner conductor 21 made of copper or the like
And an outer conductor 22 made of the same material as that of the inner conductor 21 to form a coaxial line. The inner conductor 21 and the outer conductor 22 of the coaxial line are respectively connected to a blanking electrode. Become.

The inner conductor 21 and the outer conductor 22 are respectively connected to a source connection part 31, an electron beam passage part 32, and a termination part 3.
3, and each part is made of the same conductor and is electrically conductive.

The source connection unit 31 includes a pulse generator 311
And a blanking electrode composed of an inner conductor 21 and an outer conductor 22. That is, the inner conductor 21 and the outer conductor 22 are formed by the coaxial cable 312 and the connector 31.
3 is connected to a pulse generator 311. At the time of this connection, a tapered portion 314 is provided at the distal end of the outer conductor 22 to match the impedance between the blanking electrode and the coaxial cable 312, and a connector 313 is connected to the tapered portion 314.

That is, the inner conductor 21 is
12 and the outer end of the coaxial cable 312 is connected via a connector 313 to the distal end of the tapered portion 314 constituting the end of the outer conductor 22. As a result, the signal output from the pulse generator 311 is It is sent to the conductor 21 and the outer conductor 22, that is, both electrodes of the blanking electrode.

When the impedance matching is performed by the tapered portion 314 and the characteristic impedance of the coaxial cable 312 is 50Ω, the characteristic impedance of the blanking electrode is determined to be 50Ω.

The electron beam passage portion 32 is a portion through which the electron beam 321 incident from the outside to the inside of the external conductor 22 passes, and the conductors 21, 22 in the source connection portion 31.
Electron beam 321 that is formed by bending from
Is not affected by the generation source connection unit 31.

The electron beam passage section 32 is formed by the inner conductor 2
Both 1 and the outer conductor 22 are linear portions. That is, the electron beam 321 that has entered the outer conductor 22 passes through the outer conductor 22 and is sufficiently affected by the blanking on both paths of the electron beam 321 in the ON / OFF state of the blanking electrode, and is again affected by the external conductor. It is configured to exit out of the light source 22.

In the progress of the electron beam 321 in the electron beam passage section 32, an entrance aperture 322 and an opening 323 are provided in the external conductor 22 to allow the inside and outside of the external conductor 22 to enter and exit. That is, the electron beam 321 entering from the outside passes between the outer conductor 22 and the inner conductor 21 through the entrance aperture 322 and is
The light exits from the outside. These incident apertures 322
The opening 323 is formed in a slit shape along the longitudinal direction of the external conductor 22, that is, along the traveling direction of the electron beam, so that the current flowing on the surface of the external conductor 22 is not interrupted, and the impedance mismatching occurs. The structure does not occur.

In order to maintain the inside of the blanking electrode in a vacuum, the evacuation slit 3 is formed along the longitudinal direction of the outer conductor 22 in the hollow portion of the electron beam passage portion 32.
24 are provided.

Further, the incident aperture 322 and the opening 3
23, sleeves 325 and 326 are provided along the path of the electron beam 321 respectively.
24 is provided with a sleeve 327 along the vertical direction of its opening. The widths and lengths of the openings of the sleeves 325 and 326 are determined by the cut-off frequency of the main waveguide mode induced when the hollow waveguides of the sleeves 325 and 326 are considered. Waveguide T
In the E ₁₀ mode, this is a c / 2a. Here, c is determined to be higher than the target frequency. The length is set longer than the attenuation length at the cutoff frequency. For example, the main mode of a rectangular waveguide, TE
_{In the 10} mode, assuming that the length of the long side of the cross section is a, the angular frequency is ω, and the speed of light is c, the attenuation length is 1 / ｛(π / a) ² −
(Ω / c) ² ｝ ^1/2 . Thereby, the outer conductor 22
The electromagnetic field generated inside is prevented from flowing outside the outer conductor 22.

The terminal section 33 is bent from the electron beam passing section 32 like the source connection section 31 so that the terminal section 33 is not affected by the passing electron beam 321. A terminating resistor 331 is provided at the tip of the terminating portion 33 so as to close the gap between the inner conductor 21 and the outer conductor 22.
Is provided.

In a portion where the conductor is in contact with the high frequency, the electromagnetic field exists only in the conductor wall at a skin thickness of about 1 / (σωμ) ^0.5 . Here, σ represents the conductivity of the inner conductor 21 and the outer conductor 22, ω represents the angular frequency of the electromagnetic field propagating inside the conductors 21 and 22, and μ represents the magnetic permeability. Therefore, a normal thin film resistor is used for the terminating resistor 331, and the thickness of the resistor is set to be smaller than the skin thickness at a target frequency. That is, since the conductivity σ is small at the terminal of the terminating resistor 331, the skin thickness is larger than that of the conductor. Even in this case, if ω is large, the skin thickness may be smaller than the film thickness of the terminating resistor 331. The reason is that the resistance value actually felt at such a high frequency is different from that of the low frequency.

A cooling pipe (not shown) is externally connected to the outer conductor 22 and the terminating resistor 331.
A cooling pipe 316 is provided inside via an insulating plate 315. Here, the insulating plate 315 is a thin insulator for separating the vacuum from the atmosphere, and uses, for example, ceramic, polyethylene, or the like. In the present blanking device, current flows through the inner conductor 21, the outer conductor 22, and the terminating resistor 331 in an operating state, that is, while a voltage is applied to the blanking electrode. Since heat is generated in the area where the current flows, a cooling pipe is provided, or a refrigerant 317 or the like is guided to the cooling pipe 316 through the insulating plate 315.
Each part is cooled. In addition, it is also possible to partially fill the space between the inner conductor 21 and the outer conductor 22 with a dielectric, and to cool by flowing a coolant through the dielectric.

The operation of the blanking device according to the above embodiment will be described. First, the operation of the charged particle beam drawing apparatus to which the blanking apparatus according to the present embodiment is applied will be described. As shown in FIG. 1, the electron beam emitted from the electron gun 11 is made rectangular by a first shaping diaphragm 12 and a first shaping lens 13 and is incident on a second shaping diaphragm 15. Both apertures 12,
Since the beam is transmitted only through the 15 common openings, an arbitrary rectangular or 45 ° triangular beam shape is possible. Thereafter, the drawing sample 2 is focused by the focusing lens 19 and the deflector 18.
Irradiation is performed at a position determined to be zero. The blanking electrode 17a and the blanking aperture 17b apply a voltage to the two electrodes to bend the electron beam to cut off the beam, and to apply no voltage so that the electron beam enters the writing sample 20 without bending. .

Next, a detailed operation of the blanking apparatus for drawing a charged particle beam will be described with reference to FIG. When the signal of the pulse generator 311 is off, no voltage is applied between both electrodes of the blanking electrode, that is, between the inner conductor 21 and the outer conductor 22, and therefore, the electron beam 32
No. 1 receives no force from both electrodes and moves straight as indicated by the solid line. Then, the electron beam 321 that has traveled straight passes through the opening of the blanking aperture 34 and is emitted outside the blanking apparatus as a result.

On the other hand, when the signal of the pulse generator 311 is in the ON state, the negative voltage signal generated by the pulse generator 311 passes through the coaxial cable 312, passes through the connector 313, and the internal through the taper portion 314 for impedance matching. It is transmitted to the conductor 21 and the outer conductor 22. The applied voltage signal is absorbed by the terminating resistor 331 provided in the terminating section 33.

Here, the electron beam 321 takes an orbit shown by a broken line. That is, the electron trajectory is bent toward the outer conductor 22 by the electric field generated between the inner conductor 21 and the outer conductor 22, goes out of the opening 323, and is blocked by the blanking aperture 34. Here, the opening 323 is opened in a slit shape in the longitudinal direction of the outer conductor 22,
It is provided substantially parallel to the current flowing through the outer conductor 22. Therefore, since the current flowing on the surface of the outer conductor 22 is not interrupted, the change in impedance is small and the impedance mismatch hardly occurs. Therefore, the blanking operation can be performed at a high speed.

As described above, in the present blanking device, since the electromagnetic field exists only in the region surrounded by the outer conductor 22, the electromagnetic field is not affected by the presence of the conductor outside the blanking device, and therefore the reliability is high. Operation becomes possible.

In this structure, a TEM mode can be used as an electromagnetic wave propagating inside.
The phase velocity or group velocity of the electromagnetic wave does not depend on the frequency, or has little frequency dependence. Therefore, propagation of an electromagnetic wave of an arbitrary frequency becomes possible.

Note that a modification of the present embodiment is shown in FIGS.
It is shown in (c). FIGS. 3A and 3B are modified diagrams of a portion surrounded by a dashed line in FIG. 2, and the configuration of other portions is the same as that of FIG. FIG. 3 (c)
FIG. 4 schematically shows the entire configuration of a modification of FIG. 2.
As shown in FIGS. 3A and 3B, a curved configuration is formed from the outer conductor 22 to the terminating resistor 331, unlike FIG. This is because the terminating resistance 33
1 is made invisible, and by adopting such a configuration, the terminating resistor 331 causes the electron beam 3
It is possible to prevent charging or the like under the influence of the power supply 21. 3 (c) also has the same effect as FIGS. 3 (a) and 3 (b). In this case, the path of the electron beam 321 is similarly applied not only to the terminal section 33 but also to the source connection section 31. The structure is such that the source connection portion 31 cannot be seen from above.

In this embodiment, copper is used as the material of the internal conductors 21 and 22. However, any conductive material such as copper plated with gold or silver may be used. . Also, the terminating resistor 331
Although a case where a thin film resistor is used has been described above, the present invention can be applied to a case where a resistor is added to an insulator.

In this embodiment, the case where the refrigerant 317 is guided into the inner conductor 21 to cool the inner conductor 21 has been described. It is also possible to cool by flowing a refrigerant through the cooling device. (Second Embodiment) FIG. 4 is a cross-sectional view showing a blanking apparatus for drawing a charged particle beam according to a second embodiment of the present invention, and FIG. FIG. 4B shows an enlarged view of the electron beam passing through the headquarters ranking device. The blanking device according to the present embodiment is provided with two coaxial line type blanking electrodes shown in the first embodiment along the path of the electron beam. The blanking electrode 42 is provided with the same blanking aperture 44 as that shown in the first embodiment, and the shaping aperture 47 is disposed further downstream of the blanking electrode 43 on the downstream side of the electron beam path. .

The electron gun 41 and the blanking electrode 42
A condensing lens 49 is provided between the
A blanking aperture 44 is arranged near the position where the electron beam focused at 9 forms an image. Note that the blanking aperture 44 is not provided between the blanking electrodes 42 and 43, but may be arranged, for example, downstream of the shaping aperture 48 and in the vicinity of a position where an electron beam that travels further is imaged by a lens (not shown). You can also.

As shown in FIGS. 4A and 4B, the beam deflection directions of the blanking electrodes 42 and 43 are arranged to be opposite. Here, the magnitude of deflection by the two electrodes 42 and 43 is determined by the beam passing position 48 at the position of the forming aperture 47 provided downstream of the blanking electrode 43.
Is adjusted not to move. When the image of the shaping aperture 47 is a beam pattern on a writing sample, by disposing the two blanking electrodes 42 and 43 in this manner, the current density distribution of the beam is constant even when each blanking electrode is operated. The beam current can be reduced as it is.

Therefore, in the transient state of the ON / OFF state of the electron beam during the blanking operation, for example, even when a part of the electron beam is cut off by the blanking aperture 44, the electron beam is formed by the shaping aperture 44. A change in the center of gravity of the current distribution is small, and a stable blanking operation is realized.

Further, a blanking electrode 42 (not shown)
The signal source for applying a voltage to the
A shift is provided for the signal transmitted to the second and the third. That is, when the TEM mode is used as the propagation mode of the electromagnetic field, the propagation speed of the electromagnetic wave propagating through the coaxial lines constituting each blanking electrode is the speed of light. On the other hand, the speed of electrons is, for example, about 40% of the speed of light at 50 keV. Therefore, if a signal is applied to the two blanking electrodes 42 and 43 at the same timing, one of the electrons may be deflected by only one of the blanking electrodes. Therefore, most of the electrons are always supplied to the two blanking electrodes 43 by delaying the signal from the signal applied to the upstream blanking electrode 42 to the time required for the electrons to travel the distance of the center of each blanking electrode to the downstream blanking electrode 43. It can be made to be deflected by the ranking electrodes 42 and 43.

In order to cause this signal shift,
Each of the blanking electrodes 42 and 43 can be connected in series. That is, the output of the blanking electrode 42 is not used as a terminating load, but is connected to a coaxial cable, and the length of the coaxial cable is set to a length that causes a necessary time delay, and is connected to the input of the blanking electrode 43. Even in this case, the output terminal of the blanking electrode 43 is connected to the terminating resistor.

With this connection, when the electron beam passes through the upstream blanking electrode 42, it is deflected by the blanking electrode 42, and the electron beam passes through the downstream blanking electrode 43. At the timing, the deflection of the blanking electrode 43 is received.

The operation of the charged particle beam drawing blanking apparatus according to the above embodiment will be described. As shown in FIG. 3, when each of the blanking electrodes 42 and 43 is in the off state,
The electron beam travels on a trajectory 45 shown by a broken line. That is, the electron beam emitted from the electron gun 41 enters the blanking electrode 42. Since the electron beam is not deflected in the blanking electrode 42, the electron beam goes straight and exits the blanking electrode 42 as it is, and the blanking electrode 43 on the downstream side
Incident on. Similarly, in the blanking electrode 43, the electron beam travels straight without being deflected, exits the blanking electrode 43, and passes through the forming aperture 44.

On the other hand, when the blanking electrodes 42 and 43 are in the ON state, the electron beam emitted from the electron gun 41 enters the blanking electrode 42 and is deflected at the same time, and its trajectory shifts to the left. And the blanking electrode 42
And is shut off by the blanking aperture 44.

In the transitional state from the off state to the on state of the blanking electrode 42 or from the on state to the off state, the electron beam travels along the trajectory 46 shown by a solid line. That is, although the electron beam is deflected by the blanking electrode 42, it does not proceed in a direction completely blocked by the blanking aperture 44. Therefore, the light enters the blanking electrode 43. When the electron beam enters the blanking electrode 43, a voltage is applied to the blanking electrode 43 at the timing of the incidence, and the electron beam is deflected in the opposite direction to the deflection received by the blanking electrode 42 and exits the blanking electrode 43.

The electron beam deflected by the blanking electrodes 42 and 43 passes through the shaping aperture 47 with the same current density as the electron beam in the completely off state and with a reduced beam current. Further, this electron beam passes through the same position in the shaping aperture 47 as in the off state.

As described above, in the blanking apparatus for drawing a charged particle beam according to the present embodiment, the blanker structure has a coaxial structure, so that high-speed operation is possible. In addition, by operating the two blanking electrodes, the beam passes through the beam shaping aperture 47 while maintaining the same current density distribution as in the case where the blanking electrode is turned off even in the transient state of the blanking on / off operation. The beam current can be reduced. further,
Since the electron beam passes through the same position both on and off in the shaping aperture 47, a stable blanking operation can be performed.

Although the first and second embodiments have been described using an electron beam, any other charged particle beam such as an ion beam may be used. For example, when a positively charged particle is used, it is added to a blanking electrode. Of course, the same operation can be obtained by inverting the sign of the voltage.

Instead of applying a vacuum between the outer conductor and the inner conductor, it is also possible to use a part of the dielectric as a dielectric to make the transmission speed of the electromagnetic field substantially equal to the speed of electrons. Furthermore, the number of blanking electrodes is not limited to one, but may be multiple.

[0057]

As described above, according to the blanking apparatus for writing a charged particle beam according to the present invention, since the electromagnetic field exists only in the region surrounded by the outer conductor, the electromagnetic field exists outside the blanking apparatus. A blanking operation that is not affected by the existence and is therefore highly reliable is possible. Further, since the phase velocity and the group velocity of the electromagnetic field do not have frequency dependence or have little frequency dependence, a high-speed blanking operation can be performed.

[Brief description of the drawings]

FIG. 1 is a perspective view showing the overall configuration of a charged particle beam drawing apparatus to which a blanking apparatus according to the present invention is applied.

FIG. 2 is a diagram showing the overall configuration of a charged particle beam drawing blanking apparatus according to the first embodiment of the present invention.

FIG. 3 is a view showing a modification of the blanking apparatus for drawing a charged particle beam in the embodiment.

FIG. 4 is a diagram showing the overall configuration of a charged particle beam drawing blanking apparatus according to a second embodiment of the present invention and the path of an electron beam.

FIG. 5 is a diagram showing the overall configuration of a first conventional charged particle drawing blanking apparatus.

FIG. 6 is a diagram showing an overall configuration of a second conventional charged particle drawing blanking apparatus.

[Explanation of symbols]

 11, 41 Electron gun 12 First shaping aperture 13 First shaping lens 14 Second shaping lens 15 Second shaping aperture 16 Reduction lens 17 Blanking electrode 18 Deflector 19 Converging lens 20 Drawing sample 21 Internal conductor 22 External conductor 31 Source Connection part 32 Electron beam passage part 33 Termination part 34 Blanking aperture 42, 43 Blanking electrode 44 Blanking aperture 45, 46 Track 47 Shaping aperture 48 Beam passage position 49 Condensing lens 311 Pulse generator 312 Coaxial cable 313 Connector 314 Tapered part 315 Insulator 316 Cooling pipe 317 Coolant 321 Electron beam 322 Incident aperture 323 Opening 324 Exhaust slit 325, 326, 327 Sleeve 331 Termination resistance

Claims (5)

(57) [Claims] 1. A blanking electrode which is used in a charged particle beam drawing apparatus for drawing a desired pattern by irradiating a charged particle beam onto a sample, and deflecting the charged particle beam by applying a voltage to two electrodes; A blanking aperture for blocking the path of the charged particle beam in one of the on / off states of the voltage by the blanking electrode, wherein the blanking electrode is an internal conductor and the internal conductor A blanking electrode, one of the blanking electrodes is an inner conductor, the other electrode is an outer conductor, and the side wall of the outer conductor has a charged particle beam. A blanking apparatus for drawing a charged particle beam, wherein an entrance and an exit are formed. 2. A charged particle beam drawing apparatus which irradiates a charged particle beam onto a sample to draw a desired pattern, and deflects the trajectory of the charged particle beam along the path of the charged particle beam. A plurality of blanking electrodes provided, and the charged particle beam is provided at or near the image forming position of the virtual light source of the charged particle beam or a position conjugate with it, and the charged particle beam is in one of the ON and OFF states of the voltage by the blanking electrode In a blanking apparatus for drawing a charged particle beam, which is configured by a blanking aperture that blocks a course of the plurality of blanking electrodes, and a shaping aperture provided downstream of the plurality of blanking electrodes, each of the plurality of blanking electrodes is It has two electrodes, one electrode is an inner conductor, and the other electrode is an outer conductor provided so as to cover the inner conductor. The entrance and exit of the charged particle beam are formed on the side wall of the outer conductor, and the coaxial line constituting the plurality of blanking electrodes deflects the charged particle beam by the blanking electrodes. A charged particle beam drawing blanking apparatus, wherein the charged particle beam is positioned so that the center of gravity of the charged particle beam in the shaping aperture does not move when receiving the beam. 3. The charged particle beam drawing according to claim 2, wherein the voltage to the plurality of blanking electrodes is applied in accordance with the passage time of the charged particle beam in each blanking electrode. Blanking device. 4. A hole which is longer than an attenuation length of a blanking electrode with respect to an electromagnetic field having a desired operating frequency and is provided along an advancing direction of charged particles in an entrance and an exit formed in the outer conductor. The blanking apparatus for drawing a charged particle beam according to claim 1 or 2, further comprising: 5. The charging device according to claim 1, wherein the entrance and the exit formed in the outer conductor are formed as slit-shaped holes formed in parallel with the axial direction of the outer conductor. Blanking device for particle beam writing.