JP3050253B2 - Method of manufacturing multilayer electronic component mounting substrate - Google Patents

Method of manufacturing multilayer electronic component mounting substrate

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Publication number
JP3050253B2
JP3050253B2 JP4061295A JP6129592A JP3050253B2 JP 3050253 B2 JP3050253 B2 JP 3050253B2 JP 4061295 A JP4061295 A JP 4061295A JP 6129592 A JP6129592 A JP 6129592A JP 3050253 B2 JP3050253 B2 JP 3050253B2
Authority
JP
Japan
Prior art keywords
dry film
substrate
electronic component
conductor circuit
component mounting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP4061295A
Other languages
Japanese (ja)
Other versions
JPH05226839A (en
Inventor
直人 石田
嘉隆 小野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ibiden Co Ltd
Original Assignee
Ibiden Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ibiden Co Ltd filed Critical Ibiden Co Ltd
Priority to JP4061295A priority Critical patent/JP3050253B2/en
Publication of JPH05226839A publication Critical patent/JPH05226839A/en
Application granted granted Critical
Publication of JP3050253B2 publication Critical patent/JP3050253B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は,電子部品搭載部におけ
る内層導体回路に損傷を与えることがない,多層電子部
品搭載用基板の製造方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of manufacturing a substrate for mounting a multilayer electronic component without damaging an inner conductor circuit in an electronic component mounting portion.

【0002】[0002]

【従来技術】従来,基板上に電子部品搭載部を有する多
層電子部品搭載用基板の製造方法としては,図8ないし
図10に示すものがある(特開昭61−75596号公
報)。即ち,この方法は,図10に示すごとく,電子部
品と電気的に接続される内層導体回路911を設けた第
二基板9と,その上に接着層5を介して接合した第一基
板7と,第二基板9の上方に設けた電子部品搭載用の凹
部950とを有する多層電子部品搭載用基板の製造方法
である。
2. Description of the Related Art Conventionally, as a method for manufacturing a multilayer electronic component mounting substrate having an electronic component mounting portion on a substrate, there is a method shown in FIGS. 8 to 10 (Japanese Patent Laid-Open No. 61-75596). That is, as shown in FIG. 10, this method comprises the following steps: a second substrate 9 provided with an inner layer conductor circuit 911 electrically connected to an electronic component, and a first substrate 7 bonded thereon via an adhesive layer 5. And a concave part 950 for mounting an electronic component provided above the second substrate 9.

【0003】この方法においては,まず,図8(a)に
示すごとく,基板の上部91にニッケル・金メッキ層を
形成した電子部品搭載部951と内層導体回路911と
を有してなる第二基板9と,上記電子部品搭載部951
よりも大きい開口部75を有すると共に,表面に上記と
同様のメッキ層を形成した外層導体回路711を有する
第一基板7と,上記開口部75と同平面形状の開口部5
5を有する接着層5とを準備する。次に,図8(b)に
示すごとく,第二基板9の上に接着層5を介して上記第
一基板7を積層すると共に,これらを熱圧着により接合
して多層板を作製する。
In this method, first, as shown in FIG. 8A, a second substrate having an electronic component mounting portion 951 having a nickel / gold plating layer formed on an upper portion 91 of the substrate and an inner conductor circuit 911 is provided. 9 and the electronic component mounting section 951
A first substrate 7 having an opening 75 which is larger than the opening 75 and an outer conductor circuit 711 having the same plating layer formed on the surface thereof; and an opening 5 having the same planar shape as the opening 75.
5 is prepared. Next, as shown in FIG. 8B, the first substrate 7 is laminated on the second substrate 9 via the adhesive layer 5, and these are joined by thermocompression bonding to produce a multilayer board.

【0004】次いで,図9(a)に示すごとく,上記多
層板に貫通孔97を穿設し,更に多層板の全表面及び貫
通孔97にスルーホールメッキとしての金属(銅)メッ
キ11を施す。次いで,図9(b)に示すごとく,エッ
チングにより,第二基板9の下部99に,外層導体回路
991を,また第一基板7の上部71には外層導体回路
711を形成する。そして,図10に示すごとく,電子
部品搭載部951の上に第一基板7の開口部75によっ
て囲まれた凹部950が形成される。また,貫通孔97
には,リードピンを挿入する。
Then, as shown in FIG. 9A, a through-hole 97 is formed in the multilayer board, and a metal (copper) plating 11 is applied to the entire surface of the multilayer board and the through-hole 97 as through-hole plating. . Next, as shown in FIG. 9B, an outer conductor circuit 991 is formed on the lower part 99 of the second substrate 9 and an outer conductor circuit 711 is formed on the upper part 71 of the first substrate 7 by etching. Then, as shown in FIG. 10, a concave portion 950 surrounded by the opening 75 of the first substrate 7 is formed on the electronic component mounting portion 951. In addition, the through hole 97
, Insert the lead pin.

【0005】[0005]

【解決しようとする課題】しかしながら,図9(b)に
示すごとく,エッチングにより外層導体回路991,7
11を形成する工程においては,電子部品搭載部951
において露出している内層導体回路911を汚染するお
それがある。即ち,上記外層導体回路991,711を
形成する際には,上記のごとく,まず貫通孔97及び基
板の全表面に一旦銅メッキ11を施し,その後電子部品
搭載部951,当初の内層導体回路911上の銅メッキ
11(図9a)をエッチングにより除去している。
However, as shown in FIG. 9 (b), the outer conductor circuits 991, 7 are etched by etching.
In the step of forming the electronic component mounting portion 11,
May contaminate the exposed inner conductor circuit 911. That is, when forming the outer conductor circuits 991 and 711, as described above, first, the through-hole 97 and the entire surface of the substrate are once plated with copper 11, and then the electronic component mounting portion 951 and the inner conductor circuit 911 are initially formed. The upper copper plating 11 (FIG. 9a) has been removed by etching.

【0006】そのため,上記エッチングにより第二基板
9の内層導体回路911の表面が汚染され,電気的接合
性の劣化等が生じるおそれがある。本発明は,かかる問
題点に鑑み,電子部品搭載部の内層導体回路を損傷する
ことがない多層電子部品搭載用基板の製造方法を提供し
ようとするものである。
[0006] Therefore, the surface of the inner conductor circuit 911 of the second substrate 9 may be contaminated by the above-mentioned etching, and the electrical connection may be deteriorated. SUMMARY OF THE INVENTION The present invention has been made in view of the above circumstances, and provides a method of manufacturing a multilayer electronic component mounting substrate that does not damage an inner conductor circuit of an electronic component mounting portion.

【0007】[0007]

【課題の解決手段】本発明は,下記の工程により多層電
子部品搭載用基板を製造することを特徴とする。即ち,
内層導体回路が形成された第二基板と,電子部品搭載部
の上に開口部を有する少なくとも1つの第一基板を接着
層を介して貼り合わせて多層板を形成するA工程と,上
記多層板の所定位置に貫通孔を設けるB工程と,多層板
の表面全体に感光性のドライフィルムを貼着するC工程
と,ドライフィルムを露光すると共に貫通孔に対面する
部分のドライフィルムを現像除去し,他の部分はドライ
フィルムを残しておくD工程とを行う。
According to the present invention, a substrate for mounting a multilayer electronic component is manufactured by the following steps. That is,
A step of bonding a second substrate on which the inner-layer conductor circuit is formed and at least one first substrate having an opening above the electronic component mounting portion via an adhesive layer to form a multilayer board; Step B of providing a through hole at a predetermined position, Step C of attaching a photosensitive dry film to the entire surface of the multilayer board, and exposing the dry film and developing and removing the dry film in the portion facing the through hole. , And the other step is performed with a step D in which a dry film is left.

【0008】その後上記貫通孔とドライフィルムの表面
にメッキ触媒を施すE工程と,ドライフィルムをその表
面に形成された上記メッキ触媒と共に除去するF工程
と,再び,多層板の表面全体に感光性のドライフィルム
を貼着するG工程と,ドライフィルムを露光すると共に
貫通孔に対面する部分のドライフィルムを現像除去し,
他の部分はドライフィルムを残しておくH工程とを行
う。
[0008] Thereafter, an E step of applying a plating catalyst to the through holes and the surface of the dry film, an F step of removing the dry film together with the plating catalyst formed on the surface, and a photosensitive layer is again applied to the entire surface of the multilayer board. G step of sticking the dry film, and exposing the dry film, and developing and removing the dry film in the portion facing the through hole,
The other part is subjected to an H step for keeping the dry film.

【0009】更に,その後,貫通孔内に金属メッキを施
すI工程と,ドライフィルムを除去するJ工程と,上記
多層板の表面に外層回路形成膜を形成するK工程と,エ
ッチングにより外層導体回路を形成するL工程と,上記
外層回路形成膜を除去するM工程とを行う。
Further, thereafter, an I step of applying metal plating in the through holes, a J step of removing the dry film, a K step of forming an outer layer circuit forming film on the surface of the multilayer board, and the outer layer conductor circuit by etching. Is performed, and an M process for removing the outer layer circuit formation film is performed.

【0010】本発明において最も注目すべきことは,多
層板の表面全体に感光性のドライフィルムを貼着するC
工程と,ドライフィルムを露光すると共に貫通孔に対面
する部分のドライフィルムを現像除去し,他の部分はド
ライフィルムを残しておくD工程と,上記貫通孔とドラ
イフィルムの表面にメッキ触媒を施すE工程と,ドライ
フィルムをその表面に形成された上記メッキ触媒と共に
除去するF工程と,再び,上記C,D工程を繰り返す
G,H工程と,貫通孔内に金属メッキを施すI工程にあ
る。上記第二基板は,その上部に電子部品搭載部とその
周辺部に設けられた内層導体回路とを有する。上記第一
基板は,電子部品搭載部よりも大きい開口部を有する。
The most remarkable point in the present invention is that a photosensitive dry film is adhered to the entire surface of the multilayer board.
Step D, exposing the dry film and developing and removing the dry film in the portion facing the through hole, leaving the dry film in the other portion, and applying a plating catalyst to the through hole and the surface of the dry film. There are an E process, an F process for removing the dry film together with the plating catalyst formed on the surface, a G and H process for repeating the C and D processes again, and an I process for performing metal plating in the through holes. . The second substrate has an electronic component mounting portion on an upper portion thereof and an inner conductor circuit provided on a peripheral portion thereof. The first substrate has an opening that is larger than the electronic component mounting portion.

【0011】上記多層板は,上記第二基板と,その上に
積層された上記第一基板とよりなる。また,この第二基
板と第一基板との間に,中間基板を設けてもよい。該中
間基板は,電子部品搭載部よりも大きく第二基板の開口
部の外径よりも小さい開口部と,該開口部の周辺部に内
層導体回路を有する。この中間基板の開口部は,上方の
基板程大きい外径を有する。
[0011] The multilayer board comprises the second substrate and the first substrate laminated thereon. Further, an intermediate substrate may be provided between the second substrate and the first substrate. The intermediate substrate has an opening larger than the electronic component mounting portion and smaller than the outer diameter of the opening of the second substrate, and an inner conductor circuit around the opening. The opening of the intermediate substrate has a larger outer diameter as the upper substrate.

【0012】即ち,本発明は,電子部品搭載部を有する
第二基板の上方に上記第一基板を設けるものであって,
両基板の間に1枚又は複数枚の上記中間基板を設けるこ
ともできる。また,上記第一基板の上部及び第二基板の
上部と下部には,予め銅箔層が設けられている。
That is, according to the present invention, the first substrate is provided above the second substrate having an electronic component mounting portion.
One or more intermediate substrates may be provided between the two substrates. Further, a copper foil layer is previously provided on the upper portion of the first substrate and the upper and lower portions of the second substrate.

【0013】上記感光性のドライフィルムは,上記メッ
キ触媒及び金属メッキを貫通孔とドライフィルムに施す
工程(E,I工程)のいずれにおいても,電子部品搭載
部及びその開口部と,第一基板の上部に設けられた銅箔
層とを被覆する。ドライフィルムは,耐化学銅メッキ液
性,かつ耐強アルカリ性である。上記接着層は,シート
状のプリプレグなどを用い,各基板の間に介在させる。
プリプレグは基板と同材料のものが好ましい。
In the photosensitive dry film, the electronic component mounting portion and its opening, the first substrate and the first substrate are provided in any of the steps (E and I) of applying the plating catalyst and metal plating to the through hole and the dry film. And a copper foil layer provided on top of the above. The dry film has chemical copper plating solution resistance and strong alkali resistance. The adhesive layer is interposed between the substrates using a sheet-shaped prepreg or the like.
The prepreg is preferably made of the same material as the substrate.

【0014】第一,第二基板,中間基板としては,エポ
キシ,トリアジン,ポリイミド樹脂等の銅張積層板など
が用いられる。電子部品搭載部内には,防湿性の向上,
放熱性向上のために金属メッキ被膜を形成しておくこと
が好ましい。内層,外層の導体回路表面には,通常,ニ
ッケル・金メッキが施される。貫通孔はリードピンなど
の外部導出端子を取り付けるための孔である。また,外
層導体回路は,貫通孔に金属メッキを施した後に形成す
る。この外層導体回路の形成方法としては,例えば半田
剥離法,電着膜法がある。
As the first, second and intermediate substrates, copper-clad laminates of epoxy, triazine, polyimide resin and the like are used. Improves moisture proofing inside the electronic component mounting area,
It is preferable to form a metal plating film in order to improve heat dissipation. The inner and outer conductor circuit surfaces are usually plated with nickel and gold. The through hole is a hole for attaching an external lead terminal such as a lead pin. The outer conductor circuit is formed after metal plating is applied to the through hole. As a method of forming the outer layer conductor circuit, for example, there are a solder peeling method and an electrodeposition film method.

【0015】[0015]

【作用及び効果】本発明の多層電子部品搭載用基板の製
造方法においては,ドライフィルムを多層板の全面に貼
着させ(C,G工程),貫通孔に対面する部分のみを現
像除去し(D,H工程),その後貫通孔内メッキ触媒及
び金属メッキを施している(E,I工程)。このE,I
工程において,多層板の上部に貼着されているドライフ
ィルムは,電子部品搭載部及びその開口部と,第一基板
の銅箔層とを被覆している。そのため,電子部品搭載部
における内層導体回路には,メッキ触媒及び金属メッキ
が施されない。
In the method of manufacturing a substrate for mounting a multilayer electronic component according to the present invention, a dry film is attached to the entire surface of the multilayer board (C and G steps), and only the portion facing the through hole is removed by development ( D and H processes), and then a plating catalyst in the through-hole and metal plating are applied (E and I processes). This E, I
In the process, the dry film adhered on the upper part of the multilayer board covers the electronic component mounting portion and the opening thereof and the copper foil layer of the first substrate. Therefore, the plating catalyst and metal plating are not applied to the inner conductor circuit in the electronic component mounting portion.

【0016】それ故,電子部品搭載部のメッキ触媒及び
金属メッキを除去する工程が不必要となる。電子部品搭
載部における内層導体回路に損傷を与えることがない。
上記のごとく,本発明によれば,電子部品搭載部におけ
る内層導体回路を損傷することがない多層電子部品搭載
用基板の製造方法を提供することができる。
Therefore, a step of removing the plating catalyst and the metal plating on the electronic component mounting portion becomes unnecessary. The inner conductor circuit in the electronic component mounting portion is not damaged.
As described above, according to the present invention, it is possible to provide a method for manufacturing a multilayer electronic component mounting board that does not damage the inner conductor circuit in the electronic component mounting portion.

【0017】[0017]

【実施例】実施例1 本発明の実施例にかかる多層電子部品搭載用基板の製造
方法につき,図1ないし図6を用いて説明する。なお,
本例は,外層導体回路の形成法として,半田剥離法を用
いたものである。本例の多層電子部品搭載用基板は,図
6(m)に示すごとく,第二基板9と,第一基板7とを
有する。
Embodiment 1 A method for manufacturing a multilayer electronic component mounting board according to an embodiment of the present invention will be described with reference to FIGS. In addition,
In this example, a solder peeling method is used as a method for forming an outer conductor circuit. As shown in FIG. 6 (m), the substrate for mounting a multilayer electronic component of the present example has a second substrate 9 and a first substrate 7.

【0018】上記第二基板9の上部91には,電子部品
搭載部としての凹部95と,電子部品と電気的に接続す
るための内層導体回路911とを設けている。凹部95
は金属メッキ951で被覆されている。また,第二基板
9の下部99には,放熱層や外層導体回路991を設け
ている。
The upper portion 91 of the second substrate 9 is provided with a concave portion 95 as an electronic component mounting portion, and an inner conductor circuit 911 for electrically connecting to the electronic component. Recess 95
Is covered with metal plating 951. In the lower part 99 of the second substrate 9, a heat radiation layer and an outer layer conductor circuit 991 are provided.

【0019】上記第一基板7は,凹部95の外径よりも
大きい開口部75を有し,その上部71においては,貫
通孔97のランドや接続回路等よりなる外層導体回路7
11を形成している。第二基板9の上にはプリプレグよ
りなる接着層5を介して第一基板7が積層され,これら
は多層板を形成している。該多層板の所定位置には,貫
通孔97が穿設されている。該貫通孔97は金属メッキ
3で被覆されている。
The first substrate 7 has an opening 75 which is larger than the outer diameter of the concave portion 95. In the upper portion 71, an outer layer conductor circuit 7 including a land of a through hole 97 and a connection circuit is provided.
11 are formed. The first substrate 7 is laminated on the second substrate 9 via the adhesive layer 5 made of prepreg, and these form a multilayer board. A through hole 97 is formed at a predetermined position of the multilayer board. The through holes 97 are covered with the metal plating 3.

【0020】次に,上記多層電子部品搭載用基板の製造
方法にかかる,A工程ないしM工程につき説明する。ま
ず,A行程においては,図1(a1)に示すごとく,第
二基板9と第一基板7と接着層5とを準備する。上記第
二基板9は,その上部91に金属メッキ951で被覆さ
れた凹部95と,その開口周辺部に内層導体回路911
とを有する。またその下部99は銅箔層990を有す
る。上記第一基板7の上部71は,銅箔層710で被覆
され,上記凹部95の外径よりも大きい開口部75を有
する。第一基板7の下部79には,プリプレグよりなる
上記接着層5が貼着されている。
Next, the steps A to M according to the method of manufacturing the multilayer electronic component mounting board will be described. First, in the step A, as shown in FIG. 1 (a1), a second substrate 9, a first substrate 7, and an adhesive layer 5 are prepared. The second substrate 9 has a concave portion 95 covered with a metal plating 951 on the upper portion 91 and an inner conductor circuit 911 around the opening.
And The lower part 99 has a copper foil layer 990. The upper portion 71 of the first substrate 7 is covered with a copper foil layer 710 and has an opening 75 larger than the outer diameter of the concave portion 95. The adhesive layer 5 made of a prepreg is adhered to the lower part 79 of the first substrate 7.

【0021】次に,図1(a2)に示すごとく,上記第
二基板9の上に,接着層5を介して上記第一基板7を積
層し,これらを熱圧着により接合し,多層板を得る。B
工程においては,図1(b)に示すごとく,多層板の所
定位置に貫通孔97を穿設する。C工程においては,図
2(c)に示すごとく,感光性のドライフィルム1によ
り多層板の上部71及び下部99の全表面を被覆し,こ
れを熱圧着する。
Next, as shown in FIG. 1 (a2), the first substrate 7 is laminated on the second substrate 9 with the adhesive layer 5 interposed therebetween, and these are joined by thermocompression bonding to form a multilayer board. obtain. B
In the process, as shown in FIG. 1B, a through hole 97 is formed at a predetermined position on the multilayer board. In the step C, as shown in FIG. 2C, the entire surface of the upper portion 71 and the lower portion 99 of the multilayer board is covered with the photosensitive dry film 1 and is thermocompression-bonded.

【0022】D工程においては,図2(d)に示すごと
く,貫通孔97に対応する部分のドライフィルム1に孔
17を設けるための露光をする。次いで,貫通孔97に
対面する部分のドライフィルム1を現像除去し,他の部
分はドライフィルム1を残しておく。E工程において
は,図2(e)に示すごとく,貫通孔97とドライフィ
ルム1の表面を含む多層板の全表面にメッキ触媒2を施
す。
In the step D, as shown in FIG. 2D, exposure for providing the holes 17 in the portion of the dry film 1 corresponding to the through holes 97 is performed. Next, the dry film 1 in the portion facing the through hole 97 is removed by development, and the dry film 1 is left in the other portions. In step E, the plating catalyst 2 is applied to the entire surface of the multilayer board including the through holes 97 and the surface of the dry film 1 as shown in FIG.

【0023】F工程においては,図3(f)に示すごと
く,ドライフィルム1をその表面に形成したメッキ触媒
2と共に多層板から剥離除去する。G工程においては,
図3(g)に示すごとく,再び,多層板の表面全体にド
ライフィルム1を貼着する。H工程においては,図3
(h)に示すごとく,貫通孔97に対応する部分のドラ
イフィルム1に孔17を設けるための露光をする。次い
で,貫通孔97に対面する部分のドライフィルム1を現
像除去し,他の部分はドライフィルム1を残しておく。
In step F, as shown in FIG. 3 (f), the dry film 1 is peeled off from the multilayer board together with the plating catalyst 2 formed on its surface. In process G,
As shown in FIG. 3 (g), the dry film 1 is again adhered to the entire surface of the multilayer board. In the H step, FIG.
As shown in (h), exposure for providing holes 17 in a portion of the dry film 1 corresponding to the through holes 97 is performed. Next, the dry film 1 in the portion facing the through hole 97 is removed by development, and the dry film 1 is left in the other portions.

【0024】尚,上記G,H工程では,上記C,D工程
と同様の操作を繰り返すこととなる。I工程において
は,図4(i)に示すごとく,貫通孔97に金属メッキ
3を施す。J工程においては,図4(j)に示すごと
く,ドライフィルム1を多層板から除去する。
In the G and H steps, the same operation as in the C and D steps is repeated. In the I step, as shown in FIG. 4 (i), the metal plating 3 is applied to the through hole 97. In the J step, as shown in FIG. 4J, the dry film 1 is removed from the multilayer board.

【0025】K工程においては,図5(k1)に示すご
とく,再々度,ドライフィルム1を多層板の表面全体に
貼着する。そして,図5(k2)に示すごとく,外層導
体回路形成のための露光をする。その後に,外層導体回
路を形成する部分のドライフィルム1を現像により除去
し,外層導体回路を形成しない部分はドライフィルム1
を残すことにより,外層導体回路形成膜44を形成す
る。次に,図5(k3)に示すごとく,多層板の表面に
おける外層導体回路を形成する部分に半田メッキ4を施
す。その後,図6(k4)に示すごとく,ドライフィル
ム1を多層板から除去する。
In the K step, as shown in FIG. 5 (k1), the dry film 1 is again adhered to the entire surface of the multilayer board. Then, as shown in FIG. 5 (k2), exposure for forming an outer layer conductor circuit is performed. Thereafter, the dry film 1 where the outer conductor circuit is formed is removed by development, and the dry film 1 where the outer conductor circuit is not formed is removed.
Is left, the outer conductor circuit forming film 44 is formed. Next, as shown in FIG. 5 (k3), solder plating 4 is applied to a portion of the surface of the multilayer board where an outer conductor circuit is to be formed. Thereafter, as shown in FIG. 6 (k4), the dry film 1 is removed from the multilayer board.

【0026】L工程においては,図6(l)に示すごと
く,エッチングにより外層導体回路を形成しない部分の
銅箔層を除去する。M工程においては,図6(m)に示
すごとく,半田メッキ4を多層板から除去し,多層板の
表面に外層導体回路711,991を形成する。
In the L step, as shown in FIG. 6 (l), the portion of the copper foil layer where the outer conductor circuit is not formed is removed by etching. In the M step, as shown in FIG. 6 (m), the solder plating 4 is removed from the multilayer board, and outer-layer conductor circuits 711, 991 are formed on the surface of the multilayer board.

【0027】上記より知られるごとく,本例の多層電子
部品搭載用基板の製造方法においては,ドライフィルム
1を多層板の全表面に貼着させ(C,G工程),貫通孔
97に対面する部分のみを現像除去し(D,H工程),
その後貫通孔97にメッキ触媒及び金属メッキを施して
いる(E,I工程)。そのため,上記E,I工程におい
て,多層板の上部71に貼着されているドライフィルム
1は,凹部95及びその開口部55とを被覆している。
それ故,凹部95内の内層導体回路911には,メッキ
触媒2及び金属メッキ3が施されない。
As is known from the above, in the method of manufacturing a multilayer electronic component mounting board of this embodiment, the dry film 1 is attached to the entire surface of the multilayer board (C and G steps) and faces the through hole 97. Develop and remove only part (D, H steps)
Thereafter, a plating catalyst and metal plating are applied to the through holes 97 (E and I steps). Therefore, in the above steps E and I, the dry film 1 stuck on the upper portion 71 of the multilayer board covers the recess 95 and the opening 55 thereof.
Therefore, the plating catalyst 2 and the metal plating 3 are not applied to the inner conductor circuit 911 in the recess 95.

【0028】また,凹部95内のメッキ触媒2及び金属
メッキ3を除去する工程が不必要となり,凹部95にお
ける内層導体回路911に損傷を与えることはない。な
お,本例では,K工程で形成される外層導体回路形成膜
44として,外層導体回路となる部分に半田メッキ4を
形成している。そして外部導体回路を形成した後は,こ
れを剥離する。この方法は,半田剥離法と呼ばれる方法
である。
Further, the step of removing the plating catalyst 2 and the metal plating 3 in the concave portion 95 becomes unnecessary, and the inner conductor circuit 911 in the concave portion 95 is not damaged. In this example, the solder plating 4 is formed on the portion to be the outer conductor circuit as the outer conductor circuit forming film 44 formed in the K step. Then, after forming the external conductor circuit, it is peeled off. This method is a method called a solder peeling method.

【0029】実施例2 本例は,図7に示すごとく,外層導体回路の形成方法と
して,実施例1の半田剥離法に代えて,電着膜法を用い
たものである。上記電着膜法においては,実施例1の図
4(j)に示したJ工程(ドライフィルム除去)の後
に,図7(n1)に示すごとく,多層板を電着液中に浸
漬し,多層板の全表面に電着膜40を施す。その後,エ
ッチング法により,図7(n2)に示すごとく,外層導
体回路を形成しない部分の電着膜40を除去し,一方外
層導体回路を形成する部分の電着膜40を残すことによ
り,外層導体回路形成膜41を形成する。
Embodiment 2 In this embodiment, as shown in FIG. 7, an electrodeposition film method is used in place of the solder peeling method of Embodiment 1 as a method of forming an outer conductor circuit. In the above electrodeposition film method, after the J step (dry film removal) shown in FIG. 4 (j) of Example 1, as shown in FIG. 7 (n1), the multilayer plate is immersed in the electrodeposition liquid, The electrodeposition film 40 is applied to the entire surface of the multilayer board. Thereafter, as shown in FIG. 7 (n2), the electrodeposition film 40 at the portion where the outer conductor circuit is not formed is removed by etching, while the electrodeposition film 40 at the portion where the outer conductor circuit is formed is left as shown in FIG. A conductive circuit forming film 41 is formed.

【0030】その後,実施例1のM工程と同様に,外層
導体回路711,991を形成し,前記図6(m)に示
した多層電子部品搭載用基板を得る。その他は,実施例
1と同様である。本例においても,実施例1と同様の効
果を得ることができる。
After that, the outer layer conductor circuits 711 and 991 are formed in the same manner as in the M step of the first embodiment, and the multilayer electronic component mounting board shown in FIG. 6 (m) is obtained. Others are the same as the first embodiment. In this embodiment, the same effect as in the first embodiment can be obtained.

【図面の簡単な説明】[Brief description of the drawings]

【図1】実施例1の多層電子部品搭載用基板の製造工程
説明図。
FIG. 1 is a view illustrating a manufacturing process of a multilayer electronic component mounting board according to a first embodiment.

【図2】図1に続く製造工程説明図。FIG. 2 is an explanatory view of a manufacturing process following FIG. 1;

【図3】図2に続く製造工程説明図。FIG. 3 is an explanatory view of a manufacturing process following FIG. 2;

【図4】図3に続く製造工程説明図。FIG. 4 is an explanatory view of the manufacturing process following FIG. 3;

【図5】図4に続く製造工程説明図。FIG. 5 is an explanatory view of the manufacturing process following FIG. 4;

【図6】図5に続く製造工程説明図。FIG. 6 is an explanatory view of the manufacturing process following FIG. 5;

【図7】実施例2の多層電子部品搭載用基板の製造工程
説明図。
FIG. 7 is an explanatory diagram of a manufacturing process of the multilayer electronic component mounting board according to the second embodiment.

【図8】従来例の多層電子部品搭載用基板の製造工程説
明図。
FIG. 8 is an explanatory view of a manufacturing process of a conventional multilayer electronic component mounting substrate.

【図9】図8に続く製造工程説明図。FIG. 9 is an explanatory view of the manufacturing process following FIG. 8;

【図10】図9に続く製造工程説明図。FIG. 10 is an explanatory view of the manufacturing process following FIG. 9;

【符号の説明】[Explanation of symbols]

1...ドライフィルム, 2...メッキ触媒, 3...金属メッキ, 4...半田メッキ, 40...電着膜, 41,44...外層導体回路形成膜, 5,...接着層, 55,75,...開口部, 7,...第一基板, 711,991...外層導体回路, 71,,91...上部, 9...第二基板, 911...内層導体回路 95,950...凹部, 79,99...下部, 1. . . 1. dry film, . . Plating catalyst, 3. . . Metal plating, 4. . . Solder plating, 40. . . Electrodeposition film, 41, 44. . . Outer layer conductor circuit forming film, 5,. . . Adhesive layers, 55, 75,. . . Openings, 7,. . . First substrate, 711, 991. . . Outer layer conductor circuit, 71, 91. . . Upper part, 9. . . Second substrate, 911. . . Inner layer conductor circuit 95,950. . . Recess, 79, 99. . . beneath,

───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 平2−189995(JP,A) 特開 平4−22190(JP,A) 特開 昭62−242341(JP,A) 特開 昭63−137499(JP,A) 特開 昭61−75596(JP,A) (58)調査した分野(Int.Cl.7,DB名) H05K 3/46 ──────────────────────────────────────────────────続 き Continuation of the front page (56) References JP-A-2-189995 (JP, A) JP-A-4-22190 (JP, A) JP-A-62-242341 (JP, A) JP-A-63-1988 137499 (JP, A) JP-A-61-75596 (JP, A) (58) Fields investigated (Int. Cl. 7 , DB name) H05K 3/46

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 内層導体回路が形成された第二基板と,
電子部品搭載部の上に開口部を有する少なくとも1つの
第一基板を接着層を介して貼り合わせて多層板を形成す
るA工程と, 上記多層板の所定位置に貫通孔を設けるB工程と, 多層板の表面全体に感光性のドライフィルムを貼着する
C工程と, ドライフィルムを露光すると共に貫通孔に対面する部分
のドライフィルムを現像除去し,他の部分はドライフィ
ルムを残しておくD工程と, 上記貫通孔とドライフィルムの表面にメッキ触媒を施す
E工程と, ドライフィルムをその表面に形成された上記メッキ触媒
と共に除去するF工程と, 再び,多層板の表面全体に感光性のドライフィルムを貼
着するG工程と, ドライフィルムを露光すると共に貫通孔に対面する部分
のドライフィルムを現像除去し,他の部分はドライフィ
ルムを残しておくH工程と, 貫通孔内に金属メッキを施すI工程と, ドライフィルムを除去するJ工程と, 上記多層板の表面に外層回路形成膜を形成するK工程
と, エッチングにより外層導体回路を形成するL工程と, 上記外層回路形成膜を除去するM工程とからなる多層電
子部品搭載用基板の製造方法。
A second substrate on which an inner conductor circuit is formed;
An A step of bonding at least one first substrate having an opening on the electronic component mounting portion via an adhesive layer to form a multilayer board; and a B step of providing a through hole at a predetermined position of the multilayer board. Step C of adhering a photosensitive dry film to the entire surface of the multilayer board, and exposing the dry film and developing and removing the dry film in the portion facing the through hole, leaving the dry film in the other portions. A step of applying a plating catalyst to the through holes and the surface of the dry film; and an F step of removing the dry film together with the plating catalyst formed on the surface. Step G of attaching a dry film, exposing the dry film and developing and removing the dry film in a portion facing the through hole, and leaving the dry film in the other portions. Process, I process of plating metal in the through hole, J process of removing the dry film, K process of forming an outer layer circuit forming film on the surface of the multilayer board, and L step of forming an outer layer conductor circuit by etching. A method for manufacturing a substrate for mounting a multilayer electronic component, comprising: a step; and an M step of removing the outer layer circuit formation film.
JP4061295A 1992-02-14 1992-02-14 Method of manufacturing multilayer electronic component mounting substrate Expired - Lifetime JP3050253B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4061295A JP3050253B2 (en) 1992-02-14 1992-02-14 Method of manufacturing multilayer electronic component mounting substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4061295A JP3050253B2 (en) 1992-02-14 1992-02-14 Method of manufacturing multilayer electronic component mounting substrate

Publications (2)

Publication Number Publication Date
JPH05226839A JPH05226839A (en) 1993-09-03
JP3050253B2 true JP3050253B2 (en) 2000-06-12

Family

ID=13167064

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4061295A Expired - Lifetime JP3050253B2 (en) 1992-02-14 1992-02-14 Method of manufacturing multilayer electronic component mounting substrate

Country Status (1)

Country Link
JP (1) JP3050253B2 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002237682A (en) * 2001-02-08 2002-08-23 Cmk Corp Multilayer printed circuit board having component- mounting recess, and its manufacturing method
CN113133206B (en) * 2021-03-17 2022-06-17 东莞联桥电子有限公司 Burr-free circuit board manufacturing process
CN115038263A (en) * 2022-05-16 2022-09-09 盐城维信电子有限公司 Method for removing carbon powder residue at front cover opening position of multilayer board

Also Published As

Publication number Publication date
JPH05226839A (en) 1993-09-03

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