JP3044333B2 - Lid opening / closing device for decompression type substrate processing tank - Google Patents

Lid opening / closing device for decompression type substrate processing tank

Info

Publication number
JP3044333B2
JP3044333B2 JP6128426A JP12842694A JP3044333B2 JP 3044333 B2 JP3044333 B2 JP 3044333B2 JP 6128426 A JP6128426 A JP 6128426A JP 12842694 A JP12842694 A JP 12842694A JP 3044333 B2 JP3044333 B2 JP 3044333B2
Authority
JP
Japan
Prior art keywords
opening
closing
lid
substrate processing
processing tank
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP6128426A
Other languages
Japanese (ja)
Other versions
JPH07335605A (en
Inventor
研二 安井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Screen Holdings Co Ltd
Dainippon Screen Manufacturing Co Ltd
Original Assignee
Screen Holdings Co Ltd
Dainippon Screen Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Screen Holdings Co Ltd, Dainippon Screen Manufacturing Co Ltd filed Critical Screen Holdings Co Ltd
Priority to JP6128426A priority Critical patent/JP3044333B2/en
Publication of JPH07335605A publication Critical patent/JPH07335605A/en
Application granted granted Critical
Publication of JP3044333B2 publication Critical patent/JP3044333B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】この発明は、半導体ウエハや液晶
用ガラス基板等(以下、単に基板という)の基板製造プ
ロセスにおいて、当該基板を減圧下で処理する減圧式基
板処理槽に関し、さらに詳しくは、減圧式基板処理槽の
蓋開閉装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a reduced pressure type substrate processing tank for processing a substrate under reduced pressure in a substrate manufacturing process of a semiconductor wafer, a glass substrate for liquid crystal, or the like (hereinafter, simply referred to as a substrate). And a lid opening / closing device for a decompression type substrate processing tank.

【0002】[0002]

【従来の技術】減圧式基板処理槽の蓋開閉装置として
は、従来より例えば図3に示すものが知られている。そ
れは、減圧式の基板処理槽1と、この基板処理槽1の上
部開口2をシール部材4を介して開閉自在に閉止する開
閉蓋3と、この開閉蓋3を上部開口2の上側に位置する
前進位置(F)と上部開口2から外れた後退位置(R)
との間でガイド手段5に沿って進退駆動する駆動手段1
5と、上記開閉蓋3を前進位置(F)において開閉操作
する開閉手段20とを具備している。
2. Description of the Related Art As a lid opening / closing device for a decompression type substrate processing tank, for example, the one shown in FIG. 3 is conventionally known. It comprises a decompression type substrate processing tank 1, an opening / closing lid 3 for opening and closing the upper opening 2 of the substrate processing tank 1 via a sealing member 4, and the opening / closing lid 3 is located above the upper opening 2. Forward position (F) and retracted position (R) out of upper opening 2
Drive means 1 for driving forward and backward along guide means 5 between
5 and an opening / closing means 20 for opening / closing the opening / closing lid 3 at the forward position (F).

【0003】上記ガイド手段5は、基板処理槽1の左右
両側に一対配設され、その後端部が支軸Qにより揺動可
能に枢支されている。また、上記開閉蓋3は左右一対の
支持枠7で支持され、この支持枠7を介して上記一対の
ガイド手段5に沿って進退可能に設けられている。上記
駆動手段15は、駆動モータ16と、この駆動モータ1
6の出力軸と同軸をなす駆動プーリ17と、上記支軸Q
と同軸をなす従動プーリ18と、これらのプーリ17・
18間に巻掛けられた無端ベルト19とから成り、上記
支持枠7を無端ベルト19に固定して開閉蓋3を前進位
置(F)と後退位置(R)との間で進退駆動するように
構成されている。
A pair of the guide means 5 are provided on both left and right sides of the substrate processing tank 1, and the rear end thereof is pivotally supported by a support shaft Q. The opening / closing lid 3 is supported by a pair of left and right support frames 7, and is provided so as to be able to advance and retreat along the pair of guide means 5 via the support frames 7. The drive means 15 includes a drive motor 16 and the drive motor 1.
6, a driving pulley 17 coaxial with the output shaft,
Driven pulleys 18, which are coaxial with
The support frame 7 is fixed to the endless belt 19 so that the opening / closing lid 3 is driven forward and backward between a forward position (F) and a backward position (R). It is configured.

【0004】上記開閉手段20は、基板処理槽1の左右
両側に一対固設されており、上記開閉蓋3の前進位置
(F)において、上記ガイド手段5の先端部を押し下げ
て当該開閉蓋3を閉止するように構成されている。な
お、符号30は上記開閉手段20による押し下げを解除
したときに、上記ガイド手段5の先端部を押し上げて開
閉蓋3を開くための弾発バネである。
A pair of the opening / closing means 20 is fixedly provided on both left and right sides of the substrate processing tank 1. At the forward position (F) of the opening / closing lid 3, the leading end of the guide means 5 is pushed down to open and close the lid. Is configured to be closed. Reference numeral 30 denotes a resilient spring for pushing up the distal end of the guide means 5 to open the open / close lid 3 when the push-down by the open / close means 20 is released.

【0005】[0005]

【発明が解決しようとする課題】上記従来例では、ガイ
ド手段5の後端部が支軸Qにより枢支され、上記開閉蓋
3は閉止姿勢を自在に変更できないことから、開閉手段
20でガイド手段5の先端部を押し下げて開閉蓋3を閉
止する際に、シール部材4が片当たりして偏摩耗する。
これは基板処理槽1の上部開口2の端面のうち上記支軸
Qに近い側においてシール部材4が先当たりすることに
起因する。しかも、シール部材4がよじれを生じて上部
開口2を均一にシールすることができない。従って、開
閉蓋3を上部開口2に十分に押圧した後でなければ基板
処理槽1内を所定の目標値に減圧することができないた
め、迅速に減圧を達成することができず、スループット
も低下する。
In the above conventional example, the rear end of the guide means 5 is pivotally supported by a support shaft Q, and the opening / closing lid 3 cannot be freely changed in the closing posture. When the front end of the means 5 is pushed down to close the opening / closing lid 3, the seal member 4 is one-sided and wears unevenly.
This is because the sealing member 4 comes in contact with the end surface of the upper opening 2 of the substrate processing tank 1 on the side closer to the support shaft Q. In addition, the seal member 4 is twisted, so that the upper opening 2 cannot be uniformly sealed. Therefore, the pressure inside the substrate processing tank 1 cannot be reduced to a predetermined target value only after the opening / closing lid 3 is sufficiently pressed against the upper opening 2, so that the pressure cannot be quickly reduced and the throughput also decreases. I do.

【0006】そこで、図4に示すように、左右一対の支
持枠7をそれぞれ上下に2分割し、下側支持枠71に長
孔73をあけ、上側支持枠72に上記長孔73に遊嵌す
る支持ピン74を横外向きに突設し、当該長孔73と支
持ピン74を介して上記開閉蓋3を首振り自在に支持す
るものを先に考案した(以下、先考案例という)。この
場合には、開閉蓋3が閉止姿勢を自在に変更できるの
で、上記弊害はかなり改善できる。しかし、上部開口2
の端面の支軸Qに近い側においてシール部材4が先当た
りする点は従来例と同様であり、前記不都合を完全に解
消することはできない。
Therefore, as shown in FIG. 4, a pair of left and right support frames 7 are vertically divided into two parts, a long hole 73 is formed in the lower support frame 71, and the long hole 73 is loosely fitted in the upper support frame 72. A supporting pin 74 projecting laterally and outwardly and supporting the opening / closing lid 3 so as to swing freely through the elongated hole 73 and the supporting pin 74 has been previously devised (hereinafter, referred to as a preconventional example). In this case, since the opening / closing lid 3 can freely change the closing posture, the above-mentioned adverse effects can be considerably improved. However, the upper opening 2
The point where the seal member 4 comes in contact with the end face near the support shaft Q is the same as in the conventional example, and the above-mentioned inconvenience cannot be completely eliminated.

【0007】本発明はこのような事情を考慮してなされ
たもので、シール部材の片当たりに起因するシール部材
4の偏摩耗をなくし、併せて均一なシールを確保するこ
とにより、基板処理槽内を迅速に減圧してスループット
の向上を図ることを技術課題とする。
The present invention has been made in view of such circumstances, and eliminates uneven wear of the seal member 4 due to one end of the seal member, and at the same time, secures a uniform seal. It is an object of the present invention to improve the throughput by rapidly reducing the pressure in the inside.

【0008】[0008]

【課題を解決するための手段】本発明は上記課題を解決
するために、以下のように構成した。即ち、上記従来の
減圧式基板処理槽の蓋開閉装置において、上記ガイド手
段及び上記開閉手段を上記基板処理槽の左右両側面にそ
れぞれ一対固設し、上記開閉蓋を支持する一対の支持枠
と当該開閉蓋を閉止するための一対の閉蓋枠とを当該開
閉蓋の左右両側部に設け、上記一対の支持枠は、それぞ
れ上記一対のガイド手段に沿って進退可能に設けられ、
上記開閉蓋を開蓋浮上可能に付勢する弾発バネを介して
当該開閉蓋を支持して成り、上記一対の閉蓋枠は、上記
開閉蓋の前進位置において、上記開閉手段と係合して押
し下げられる係合部を有し、弾発バネの弾発力に抗して
当該開閉蓋を押し下げ可能に構成したことを特徴とす
る。
Means for Solving the Problems The present invention has the following constitution in order to solve the above-mentioned problems. That is, in the conventional lid opening / closing device for the decompression type substrate processing tank, a pair of the guide means and the opening / closing means are fixedly provided on left and right side surfaces of the substrate processing tank, respectively, and a pair of support frames for supporting the opening / closing lid. A pair of closing frames for closing the open / close lid are provided on both left and right sides of the open / close lid, and the pair of support frames are provided so as to be able to advance and retreat along the pair of guide means, respectively.
The open / close lid is supported by an elastic spring that urges the open / close lid so that the open / close can float, and the pair of closed frames is engaged with the open / close means at the forward position of the open / close lid. The opening / closing lid is configured to be able to be pushed down against the elastic force of the elastic spring.

【0009】[0009]

【作用】本発明では、上記開閉蓋は開蓋浮上可能に付勢
する弾発バネを介して首振り自在に支持されているの
で、左右一対の開閉手段で閉蓋枠の係合部を押し下げる
際に、先に開閉蓋の姿勢が上部開口に対して平行に整え
られ、その後で上部開口を閉止することになる。従って
シール部材が片当たりすることはなくなる。
According to the present invention, the opening / closing lid is swingably supported via a resilient spring that urges the lid to float so that the engaging portion of the closing frame is pushed down by a pair of left and right opening / closing means. At this time, the position of the opening / closing lid is first adjusted parallel to the upper opening, and then the upper opening is closed. Therefore, the sealing member does not hit one side.

【0010】[0010]

【実施例】以下本発明の実施例を図面に基づいてさらに
詳しく説明する。図1(A)は本発明の実施例に係る減
圧式基板処理槽の蓋開閉装置の側面図、同図(B)は図
1(A)中の要部Bの拡大縦断面図、図2はその減圧式
基板処理槽の蓋開閉装置の縦断正面図である。この蓋開
閉装置は、減圧式の基板処理槽1と、この基板処理槽1
の開閉蓋3と、この開閉蓋3を基板処理槽1の上側に位
置する前進位置(F)とこれから外れた後退位置(R)
との間にガイドするガイド手段5と、このガイド手段5
に沿って開閉蓋3を進退駆動する駆動手段15と、上記
開閉蓋3を前進位置(F)において開閉操作する開閉手
段20とを具備して成る。
Embodiments of the present invention will be described below in more detail with reference to the drawings. FIG. 1A is a side view of a lid opening / closing device for a decompression type substrate processing tank according to an embodiment of the present invention, and FIG. 1B is an enlarged vertical sectional view of a main part B in FIG. FIG. 2 is a vertical sectional front view of a lid opening / closing device for the decompression type substrate processing tank. The lid opening and closing device includes a substrate processing tank 1 of a reduced pressure type,
Opening / closing lid 3, a forward position (F) in which the opening / closing lid 3 is located above the substrate processing bath 1, and a retreating position (R) out of this position
Guide means 5 for guiding between the guide means 5 and the guide means 5
A drive means 15 for driving the opening / closing lid 3 forward and backward along the path, and an opening / closing means 20 for opening and closing the opening / closing lid 3 at the forward position (F).

【0011】上記基板処理槽1は、例えば半導体ウエハ
(以下、ウエハという)を洗浄・乾燥する引上式の基板
処理槽であり、当該基板処理槽1の下部に図示しないオ
ーバーフロー型の洗浄浴槽を備え、複数のウエハWをリ
フター25で保持して当該洗浄浴槽内に浸漬して洗浄す
るとともに、減圧下でリフター25を上昇させてウエハ
を当該洗浄浴槽から引き上げることにより、ウエハWを
乾燥するように構成されている。
The substrate processing tank 1 is, for example, a pull-up type substrate processing tank for cleaning and drying a semiconductor wafer (hereinafter, referred to as a wafer). An overflow type cleaning bath (not shown) is provided below the substrate processing tank 1. A plurality of wafers W are held by the lifter 25 and washed by immersion in the cleaning bath, and the lifter 25 is lifted under reduced pressure to lift the wafers from the cleaning bath, thereby drying the wafer W. Is configured.

【0012】上記開閉蓋3は、基板処理槽1の上部開口
2をシール部材4を介して開閉自在に閉止するもので、
基板処理槽1の上部開口2の上側に位置する前進位置
(F)と上部開口2から外れた後退位置(R)との間で
ガイド手段5に沿って進退移動可能に設けられている。
また、上記開閉蓋3の左右両側部には、図1及び図2に
示すように、当該開閉蓋3を支持する左右一対の支持枠
7・7と、当該開閉蓋3を閉止するための左右一対の閉
蓋枠11・11とが設けられている。
The opening / closing lid 3 closes the upper opening 2 of the substrate processing tank 1 via a sealing member 4 so as to be openable and closable.
It is provided so as to be able to advance and retreat along the guide means 5 between a forward position (F) located above the upper opening 2 of the substrate processing tank 1 and a retracted position (R) deviating from the upper opening 2.
As shown in FIGS. 1 and 2, a pair of left and right support frames 7 for supporting the open / close lid 3 and left and right sides for closing the open / close lid 3 are provided on both left and right sides of the open / close lid 3. A pair of lid frames 11 are provided.

【0013】上記開閉蓋3の周縁部下面には、図2に示
すように、シール部材4である耐食性のパッキンが装着
されており、上部開口2の端面に当接して当該上部開口
2を密閉するように構成されている。また、上記開閉蓋
3の下面には洗浄用のシャワーパイプ23が付設されて
おり、基板処理槽1内に搬入したウエハWを洗浄浴槽内
に浸漬させる前に洗浄するように構成されている。
As shown in FIG. 2, a corrosion-resistant packing, which is a sealing member 4, is mounted on the lower surface of the peripheral edge of the opening / closing lid 3, and the upper opening 2 is closed by contacting the end surface of the upper opening 2. It is configured to be. A shower pipe 23 for cleaning is attached to the lower surface of the opening / closing lid 3 so that the wafer W carried into the substrate processing bath 1 is cleaned before being immersed in the cleaning bath.

【0014】上記ガイド手段5は、図2に示すように、
基板処理槽1の左右両側面に一対固設されている。この
ガイド手段5は、それぞれ各支持枠7をスライドベアリ
ング6を介してスライドレール5aに沿って前後方向へ
進退自在に案内するように構成されている。各支持枠7
は、つる巻型の弾発バネ10を介して上記開閉蓋3を支
持して成り、図2に示すように、この弾発バネ10の開
蓋付勢力により開閉蓋3を上部開口2の端面より浮上可
能に支持する。即ち、図1(A)(B)に示すように、
各支持枠7の上辺部7aと開閉蓋3のバネ当接板3bと
の間に上記弾発バネ10を介装するとともに、当該上辺
部7aにガイドピン8を上向きに突設する。このガイド
ピン8の先端部は、上記バネ当接板3bを貫通して弾発
バネ10が脱落するのを防止する。
The guide means 5 is, as shown in FIG.
A pair is fixedly provided on both left and right side surfaces of the substrate processing tank 1. The guide means 5 is configured to guide each support frame 7 via a slide bearing 6 so as to be able to advance and retreat in the front-rear direction along a slide rail 5a. Each support frame 7
Is formed by supporting the opening / closing lid 3 via a helical spring 10 and, as shown in FIG. Support it so that it can levitate. That is, as shown in FIGS. 1A and 1B,
The resilient spring 10 is interposed between the upper side portion 7a of each support frame 7 and the spring contact plate 3b of the opening / closing lid 3, and the guide pin 8 projects upward from the upper side portion 7a. The leading end of the guide pin 8 prevents the spring 10 from dropping through the spring contact plate 3b.

【0015】上記各閉蓋枠11は、上記弾発バネ10の
開蓋付勢力に抗して開閉蓋3を押し下げるためのもので
あり、図2に示すように、正面視において略コ字状をな
すように形成され、当該閉蓋枠11が上記支持枠7の外
側に位置するように配置されている。そして閉蓋枠11
の上辺部11aは、上記開閉蓋3の左右両側部にスペー
サ12を介して固設され、その下辺部11bは、開閉蓋
3の前進位置(F)において、後述する開閉手段20と
係合して押し下げられる係合部として形成されている。
Each of the closing frames 11 is for pushing down the opening / closing lid 3 against the urging force of the resilient spring 10 as shown in FIG. 2, and as shown in FIG. And the lid frame 11 is disposed so as to be located outside the support frame 7. And the closing frame 11
The upper side 11a is fixed to the left and right sides of the opening / closing lid 3 via spacers 12, and the lower side 11b is engaged with opening / closing means 20 described later at the forward position (F) of the opening / closing lid 3. It is formed as an engaging portion that can be pushed down.

【0016】上記駆動手段15は、上記右側のガイド手
段5の先端部に設けられた駆動モータ16と、当該駆動
モータ16の出力軸と同軸の駆動プーリ17と、当該ガ
イド手段5の後端部に設けられた従動プーリ18と、こ
れらのプーリ17・18間に巻掛けられた無端ベルト1
9とから成り、右側の支持枠7の下端部が無端ベルト1
9に固着されて、上記開閉蓋3を基板処理槽1の上部開
口2の上側に位置する前進位置(F)と上部開口2から
外れた後退位置(R)との間でガイド手段5に沿って進
退移動するように構成されている。
The drive means 15 includes a drive motor 16 provided at the tip of the right guide means 5, a drive pulley 17 coaxial with the output shaft of the drive motor 16, and a rear end of the guide means 5. And the endless belt 1 wound between these pulleys 17
9, the lower end of the right support frame 7 is an endless belt 1.
9, the opening / closing lid 3 is moved along the guide means 5 between an advanced position (F) located above the upper opening 2 of the substrate processing tank 1 and a retracted position (R) separated from the upper opening 2. It is configured to move forward and backward.

【0017】上記開閉手段20は、図1及び図2に示す
ように、エアで出力ロッド21を下向きに突出するアク
チュエータにより構成され、基板処理槽1の左右両側面
にそれぞれ2個で一組をなすように、右側の開閉手段2
0・20と左側の開閉手段20・20とがそれぞれ組付
用フランジ22を介して同時に並行作動するように組み
付けられている。即ち、各開閉手段20は、組み付け調
整の手段として例えば上記組付用フランジ22を備えて
成り、上記開閉蓋3の前進位置(F)において、閉蓋枠
11の係合部11bを各開閉手段20で同時に押し下げ
ることにより、上記開閉蓋3を上部開口2の端面に対し
て平行に押し下げて上部開口2を閉止するように組み付
け調整されている。なお、図2中の符号24は、上記開
閉蓋3が前進位置(F)にあることを検出する位置検出
器である。
As shown in FIGS. 1 and 2, the opening / closing means 20 is constituted by an actuator which projects the output rod 21 downward by air, and a pair of two is provided on each of the left and right sides of the substrate processing tank 1. Opening means 2 on the right side
0 and 20 and the left and right opening and closing means 20 and 20 are respectively assembled so as to operate simultaneously in parallel via an assembling flange 22. That is, each opening / closing means 20 includes, for example, the assembling flange 22 as an assembling adjustment means. When the opening / closing lid 3 is moved forward (F), the engaging portion 11b of the closing frame 11 is moved to each opening / closing means. At the same time, the opening and closing lid 3 is pushed down in parallel with the end face of the upper opening 2 to close the upper opening 2 and is adjusted. Reference numeral 24 in FIG. 2 is a position detector that detects that the open / close lid 3 is at the forward position (F).

【0018】以下、本実施例装置の動作について簡単に
説明する。あらかじめ基板処理槽1内にウエハWを搬入
してリフター25に移載し、引き続き上記駆動手段15
の駆動モータ16を作動させて上記開閉蓋3を基板処理
槽1の上部開口2の上側に位置する前進位置(F)移動
させる。次いで位置検出器24により上記開閉蓋3が前
進位置(F)にあることを検出し、各開閉手段20が出
力ロット21を突出して閉蓋枠11の係合部11bを同
時に押し下げることにより、上記開閉蓋3は上部開口2
を閉止する。
Hereinafter, the operation of the apparatus of this embodiment will be briefly described. The wafer W is loaded into the substrate processing tank 1 in advance and transferred to the lifter 25, and then the driving means 15
The opening / closing lid 3 is moved to the forward position (F) located above the upper opening 2 of the substrate processing tank 1 by operating the drive motor 16 of the above. Next, the position detector 24 detects that the opening / closing lid 3 is at the forward position (F), and each opening / closing means 20 projects the output lot 21 and simultaneously pushes down the engaging portion 11 b of the closing lid frame 11, whereby Opening / closing lid 3 is upper opening 2
Is closed.

【0019】上記開閉蓋3は弾発バネ10を介して首振
り自在に支持され、かつ、上部開口2の端面に対して平
行に押し下げられて上部開口2を閉止するように組み付
け調整されているので、仮に、開閉蓋3が傾いた状態で
下降すると、傾いた方(より多く下降する側)の弾発バ
ネの弾発力は、その他の弾発バネの弾発力に比べて大き
くなる。これに対して左右一対の開閉手段20は、エア
アクチュエータ20で構成されており、その押下力は弾
発バネ10の弾発力により抵抗をうける分だけ弱められ
る。その結果、上記開閉蓋3は上部開口2の端面に対し
て平行になる。その後で上部開口2が閉止される。これ
により、従来例や先考案例のようにシール部材4が上部
開口2の端面に片当たりすることによる前記不都合を解
消することができる。
The opening / closing lid 3 is supported by a resilient spring 10 so as to swing freely, and is assembled and adjusted so as to be pressed down in parallel with the end face of the upper opening 2 to close the upper opening 2. Therefore, if the opening / closing lid 3 is lowered in a tilted state, the resilience of the resilient spring on the tilted side (the side that descends more) becomes larger than the resilience of the other resilient springs. On the other hand, the pair of left and right opening / closing means 20 is constituted by the air actuator 20, and the pressing force thereof is weakened by the resilience of the resilient spring 10 by an amount corresponding to the resistance. As a result, the opening / closing lid 3 becomes parallel to the end face of the upper opening 2. Thereafter, the upper opening 2 is closed. As a result, it is possible to eliminate the above-mentioned inconvenience caused by the contact of the seal member 4 with the end face of the upper opening 2 as in the conventional example and the prior art example.

【0020】次いで、基板処理槽1内を減圧し、減圧下
でウエハWを洗浄・乾燥処理する。処理を終えたなら、
各開閉手段20による押し下げを解除する。すると弾発
バネ10の開蓋付勢力により開閉蓋3が押し上げられて
上部開口2の端面より浮上する。引き続き駆動手段15
を作動させて開閉蓋3を上部開口2から外れた後退位置
(R)に移動させ、処理を終えたウエハWを基板処理槽
1内から搬出する。
Next, the pressure in the substrate processing tank 1 is reduced, and the wafer W is washed and dried under reduced pressure. After finishing the process,
The depression by each opening / closing means 20 is released. Then, the opening / closing lid 3 is pushed up by the urging force of the resilient spring 10 and floats from the end face of the upper opening 2. Continued driving means 15
Is operated to move the opening / closing lid 3 to the retracted position (R) outside the upper opening 2, and unload the processed wafer W from the substrate processing tank 1.

【0021】なお、本発明は上記実施例に限るものでは
なく、例えば以下のように多様な変形を加えて実施する
ことができる。 シール部材4を開閉蓋3の下面に代えて、基板処理
槽1の上部開口2の端面に装着する。 開閉手段20として出力ロッド21を有するアクチ
ュエータに代えて、偏心カムを有するアクチュエータを
用いる。 左右一対の開閉手段20は、同時に並行作動するこ
とにより、開閉蓋3の姿勢を上部開口に対して平行に整
えものであればよく、実施例のように必ずしも基板処理
槽1の左右両側面にそれぞれ2個づつ設ける必要はな
い。また、上記組付用フランジ22に代えて別の組付け
調整手段を用いることもできる。
The present invention is not limited to the above embodiment, but can be implemented with various modifications as described below. The seal member 4 is mounted on the end surface of the upper opening 2 of the substrate processing bath 1 instead of the lower surface of the opening / closing lid 3. Instead of the actuator having the output rod 21 as the opening / closing means 20, an actuator having an eccentric cam is used. The pair of left and right opening / closing means 20 need only be arranged so that the posture of the opening / closing lid 3 is adjusted in parallel to the upper opening by operating in parallel at the same time. It is not necessary to provide two each. Further, another assembling adjusting means can be used in place of the assembling flange 22.

【0022】[0022]

【発明の効果】本発明では、開閉蓋は開蓋浮上可能に付
勢する弾発バネを介して首振り自在に支持されているの
で、左右一対の開閉手段で閉蓋枠の係合部を押し下げる
際に、開閉蓋の姿勢が上部開口に対して平行に整えら
れ、その後で上部開口が閉止されるので、シール部材が
片当たりすることもなくなる。これによりシール部材の
偏摩耗がなくなる。また、均一なシールを確保すること
により基板処理槽内の迅速な減圧が可能になり、スルー
プットを向上することができる。
According to the present invention, the opening / closing lid is swingably supported via a resilient spring which urges the lid to float so that the engagement portion of the closing frame can be engaged with the pair of left and right opening / closing means. When the cover is pushed down, the posture of the opening / closing lid is adjusted parallel to the upper opening, and thereafter the upper opening is closed, so that the sealing member does not hit one side. This eliminates uneven wear of the seal member. In addition, by ensuring a uniform seal, rapid pressure reduction in the substrate processing tank is possible, and the throughput can be improved.

【図面の簡単な説明】[Brief description of the drawings]

【図1】図1(A)は本発明の実施例に係る減圧式基板
処理槽の蓋開閉装置の側面図、同図(B)は図1(A)
中の要部Bの拡大縦断面図である。
FIG. 1A is a side view of a lid opening / closing device for a decompression type substrate processing tank according to an embodiment of the present invention, and FIG. 1B is FIG. 1A.
It is an expanded longitudinal sectional view of the principal part B in a middle.

【図2】本発明の実施例に係る減圧式基板処理槽の蓋開
閉装置の縦断正面図である。
FIG. 2 is a vertical sectional front view of a lid opening / closing device for a decompression type substrate processing tank according to an embodiment of the present invention.

【図3】従来例に係る図1相当図である。FIG. 3 is a diagram corresponding to FIG. 1 according to a conventional example.

【図4】先考案例に係る図1相当図である。FIG. 4 is a diagram corresponding to FIG. 1 according to a preconventional example.

【符号の説明】[Explanation of symbols]

1…基板処理槽、2…基板処理槽の上部開口、3…開閉
蓋、4…シール部材、5…ガイド手段、7…支持枠、1
0…弾発バネ、11…閉蓋枠、11b…閉蓋枠の係合
部、15…駆動手段、20…開閉手段、F…前進位置、
R…後退位置。
DESCRIPTION OF SYMBOLS 1 ... Substrate processing tank, 2 ... Upper opening of a substrate processing tank, 3 ... Opening / closing lid, 4 ... Seal member, 5 ... Guide means, 7 ... Support frame, 1
0: elastic spring, 11: closing frame, 11b: engaging portion of the closing frame, 15: driving means, 20: opening / closing means, F: forward position,
R: Retreat position.

───────────────────────────────────────────────────── フロントページの続き (58)調査した分野(Int.Cl.7,DB名) H01L 21/304,21/302,21/203 B08B 3/00 - 3/14 ──────────────────────────────────────────────────続 き Continued on the front page (58) Field surveyed (Int.Cl. 7 , DB name) H01L 21 / 304,21 / 302,21 / 203 B08B 3/00-3/14

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 減圧式の基板処理槽と、この基板処理槽
の上部開口をシール部材を介して開閉自在に閉止する開
閉蓋と、この開閉蓋を上部開口の上側に位置する前進位
置と上部開口から外れた後退位置との間でガイド手段に
沿って進退駆動する駆動手段と、上記開閉蓋を前進位置
において開閉操作する開閉手段とを備える減圧式基板処
理槽の蓋開閉装置において、 上記ガイド手段及び上記開閉手段を上記基板処理槽の左
右両側面にそれぞれ一対固設し、 上記開閉蓋を支持する一対の支持枠と当該開閉蓋を閉止
するための一対の閉蓋枠とを当該開閉蓋の左右両側部に
設け、 上記一対の支持枠は、それぞれ上記一対のガイド手段に
沿って進退可能に設けられ、上記開閉蓋を開蓋浮上可能
に付勢する弾発バネを介して当該開閉蓋を支持して成
り、 上記一対の閉蓋枠は、上記開閉蓋の前進位置において上
記開閉手段と係合して押し下げられる係合部を有し、弾
発バネの弾発力に抗して当該開閉蓋を押し下げ可能に構
成したことを特徴とする減圧式基板処理槽の蓋開閉装
置。
1. A decompression type substrate processing tank, an opening / closing lid for opening and closing an upper opening of the substrate processing tank via a seal member, and an advance position and an upper position where the opening / closing lid is located above the upper opening. A lid opening / closing device for a decompression type substrate processing tank, comprising: a driving means for driving forward / backward along a guide means between a retreat position deviated from the opening; and an opening / closing means for opening / closing the opening / closing lid at a forward position. Means and the opening / closing means are fixedly provided on both left and right side surfaces of the substrate processing tank, respectively, and a pair of support frames for supporting the opening / closing lid and a pair of closing frames for closing the opening / closing lid are provided. The pair of support frames are provided so as to be able to advance and retreat along the pair of guide means, respectively, and the opening / closing lid is provided via a resilient spring which urges the opening / closing lid so that the lid can float. In support of The pair of lid frames have an engaging portion that is pushed down by being engaged with the opening / closing means at the forward position of the lid, so that the lid can be pushed down against the elastic force of the elastic spring. A lid opening / closing device for a decompression type substrate processing tank, comprising:
JP6128426A 1994-06-10 1994-06-10 Lid opening / closing device for decompression type substrate processing tank Expired - Fee Related JP3044333B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6128426A JP3044333B2 (en) 1994-06-10 1994-06-10 Lid opening / closing device for decompression type substrate processing tank

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6128426A JP3044333B2 (en) 1994-06-10 1994-06-10 Lid opening / closing device for decompression type substrate processing tank

Publications (2)

Publication Number Publication Date
JPH07335605A JPH07335605A (en) 1995-12-22
JP3044333B2 true JP3044333B2 (en) 2000-05-22

Family

ID=14984466

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6128426A Expired - Fee Related JP3044333B2 (en) 1994-06-10 1994-06-10 Lid opening / closing device for decompression type substrate processing tank

Country Status (1)

Country Link
JP (1) JP3044333B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6120761A (en) 1996-04-26 2000-09-19 Chugai Seiyaku Kabushiki Kaisha Erythropoietin solution preparation
WO2021081722A1 (en) * 2019-10-28 2021-05-06 江西虔研科技咨询有限公司 Plated circuit board cleaning device specifically applied for electric vehicle

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6120761A (en) 1996-04-26 2000-09-19 Chugai Seiyaku Kabushiki Kaisha Erythropoietin solution preparation
WO2021081722A1 (en) * 2019-10-28 2021-05-06 江西虔研科技咨询有限公司 Plated circuit board cleaning device specifically applied for electric vehicle

Also Published As

Publication number Publication date
JPH07335605A (en) 1995-12-22

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