JP3909212B2

JP3909212B2 - Substrate processing equipment

Info

Publication number: JP3909212B2
Application number: JP2001017381A
Authority: JP
Inventors: 伸夫谷; 芳弘小山; 純渡辺
Original assignee: Screen Holdings Co Ltd; Dainippon Screen Manufacturing Co Ltd
Current assignee: Screen Holdings Co Ltd; Dainippon Screen Manufacturing Co Ltd
Priority date: 2001-01-25
Filing date: 2001-01-25
Publication date: 2007-04-25
Anticipated expiration: 2021-01-25
Also published as: JP2002220114A

Abstract

PROBLEM TO BE SOLVED: To provide a substrate treatment device capable of maintaining opening and closing conditions of a block member (shutter member). SOLUTION: While a rod 321 of an air cylinder 32 is buried in a main body 322, a shutter plate 39 adheres closely to a seal member 12 to block a substrate passing port 11. When the rod 321 of the air cylinder 32 is made to advance from the main body 322 and an end part 351 of a lever 35 is pushed up, an L-shaped member 38 rotates counterclockwise in the drawing 2, and the shutter plate 39 leaves the substrate passing port 11 to open the substrate passing port 11. A metallic balancer 4 for generating a moment for maintaining opening and closing conditions of the substrate passing port 11 in the L-shaped member 38 is embedded in the L-shaped member 38.

Description

【０００１】
【発明の属する技術分野】
この発明は、半導体ウエハ、液晶表示装置用ガラス基板、プラズマディスプレイパネル用ガラス基板および磁気／光ディスク用基板などの各種基板に対して、所定の処理を施すための基板処理装置に関する。
【０００２】
【従来の技術】
半導体装置や液晶表示装置の製造工程では、基板に処理液（薬液または純水）を供給して基板の表面処理を行うための基板処理装置が用いられる。基板を１枚ずつ処理する枚葉型の基板処理装置は、隔壁で区画された処理室を備えており、この処理室内に基板を１枚ずつ搬入して、その基板に処理液による処理を施すようになっている。
【０００３】
処理室を区画している隔壁には、基板を搬入および搬出するための基板通過口が形成されている。この基板通過口に関連して、基板通過口を開閉するためのシャッタ機構が設けられており、基板通過口から処理室内に基板が搬入された後は、シャッタ機構によって基板通過口が閉塞されて、処理室がほぼ密閉された状態で基板に対する処理が行われる。このように基板通過口を閉塞するのは、処理室内の処理液を含む雰囲気が基板通過口を介して流出することを防止するためである。
【０００４】
図７は、従来のシャッタ機構の構成を示す断面図である。従来のシャッタ機構は、ほぼ水平な回動軸９１まわりに回動自在に設けられたシャッタ部材９２と、このシャッタ部材９２にリンク機構９３を介して連結されたエアシリンダ９４とを備えている。
リンク機構９３は、エアシリンダ９４のロッド９５の進出および没入による直線運動をシャッタ部材９２を回動させるための力に変換するものである。このリンク機構９３の働きにより、エアシリンダ９４のロッド９５が進出すると、シャッタ部材９２が図７における反時計回りに回転して、処理室の隔壁９６に形成された基板通過口９７が開放される。一方、エアシリンダ９４のロッド９５が没入すると、シャッタ部材９２が図７における時計回りに回転し、このシャッタ部材９２によって基板通過口９７が閉塞される。なお、図７には、エアシリンダ９４のロッド９５が進出して、基板通過口９７が開放された状態が示されている。
【０００５】
【発明が解決しようとする課題】
基板が基板通過口９７を通過する際には、エアシリンダ９４に駆動用エアが供給されて、エアシリンダ９４のロッド９５が進出状態にされることにより、基板通過口９７が開放される。そして、基板が基板通過口９７を通過し終えるまで、エアシリンダ９４に駆動用エアが供給され続けて、基板通過口９７が開放された状態が維持される。
【０００６】
ところが、上述の従来装置では、基板通過口９７が開放された状態において、シャッタ部材９２に働く重力によってリンク機構９３に生じるモーメントよりも、エアシリンダ９４のロッド９５およびこのロッド９５とリンク機構９３とを連結している連結部材９８に作用する重力によってリンク機構９３に生じるモーメントの方が大きいために、エアシリンダ９４のエアリークが発生すると、シャッタ部材９２が基板通過口９７を閉塞する方向（図７における時計回り）に回転するという問題があった。エアリークの発生時に基板通過口９７を基板が通過していると、その通過中の基板にシャッタ部材９２が衝突して、基板が破壊されるおそれがある。
【０００７】
この問題を解決するために、エアシリンダ９４のロッド９５が進出した状態でシャッタ部材９２によって基板通過口９７が閉塞されるようにリンク機構９３を構成することが考えられる。しかしながら、このような構成を採用した場合、シャッタ部材９２で基板通過口９７が閉塞された状態においてエアリークが発生すると、シャッタ部材９２が基板通過口９７を開放する方向（図７における反時計回り）に回転し、処理室内の処理液を含む雰囲気が外部に流出するという別の問題を生じる。
【０００８】
そこで、この発明の目的は、上述の技術的課題を解決し、閉塞部材（シャッタ部材）による開口部（基板通過口）の開閉状態を維持できる基板処理装置を提供することである。
【０００９】
【課題を解決するための手段および発明の効果】
上記の目的を達成するための請求項１記載の発明は、隔壁（１）に取り囲まれており、基板に対して処理流体を用いた処理が行われる処理室（２）と、上記隔壁に形成されており、基板が通過可能な開口部（１１）と、この開口部を閉塞するための閉塞部材（３９；６２）と、駆動用エアが供給されるエアシリンダ（３２；６１）を駆動源とし、上記閉塞部材によって上記開口部が開閉されるように上記閉塞部材を駆動するための開閉駆動機構（３２，３３，３４，３５，３６，３７，３８；６１）と、上記エアシリンダのエアリークが発生した場合においても、上記開口部が開放されている開状態においてその開状態を維持し、上記閉塞部材によって上記開口部が閉塞されている閉状態においてその閉状態を維持するためのモーメントを発生する開閉維持手段（４；５；６３，６４，７）とを含むことを特徴とする基板処理装置である。
【００１０】
なお、括弧内の英数字は、後述の実施形態における対応構成要素等を表す。以下、この項において同じ。
この発明によれば、閉塞部材による開口部の開閉状態を維持することができる。ゆえに、開口部が処理室に対して基板を搬入および搬出するための基板通過口である場合には、この基板通過口を通過中の基板に閉塞部材が衝突するおそれがなく、閉塞部材の衝突による基板の破損を生じるおそれがない。
【００１１】
また、開口部の閉状態を維持できるので、処理室内の処理流体を含む雰囲気が外部に流出するおそれがない。
なお、請求項２に記載のように、上記開閉駆動機構は、上記シリンダのロッドの進出および没入による直線運動を回転力に変換するリンク機構（３５，３６，３７，３８）を備え、このリンク機構が発生する回転力によって上記閉塞部材を変位させて上記開口部を開閉するものであってもよい。
【００１２】
この場合、上記開閉維持手段は、請求項３に記載のように、上記開口部が開放されている開状態においてその開状態を維持する方向の力が上記リンク機構に作用し、上記閉塞部材によって上記開口部が閉塞されている閉状態においてその閉状態を維持する方向の力が上記リンク機構に作用するように設けられたバランサ（４）を含むものであってもよいし、請求項５に記載のように、上記開口部が開放されている開状態においてその開状態を維持する方向の力を上記リンク機構に作用させ、上記閉塞部材によって上記開口部が閉塞されている閉状態においてその閉状態を維持する方向の力を上記リンク機構に作用させる弾性部材（５）を含むものであってもよい。
上記開閉維持手段が上記バランサを含む場合、請求項４に記載のように、上記リンク機構は、上記閉塞部材の変位に伴って回動する回動部材を含み、上記バランサは、上記回動部材に埋設されていることが好ましい。
また、上記開閉維持手段が上記弾性部材を含む場合、請求項６に記載のように、上記弾性部材は、コイルばねであり、上記リンク機構は、上記閉塞部材の変位に伴って回動する回動部材を含み、上記コイルばねは、上記回動部材の回動軸を支持する支持部材に一端が固定され、上記回動部材に他端が固定され、上記コイルばねの上記一端は、上記回動軸のよりも下方であって、上記コイルばねを含む平面において、上記閉状態における上記コイルばねの上記他端の位置および上記回動軸を通る直線と、上記開状態における上記コイルばねの上記他端の位置および上記回動軸を通る直線との間の領域内に配置されていることが好ましい。
【００１３】
また、請求項７記載のように、上記開閉駆動機構は、上記シリンダのロッドの進出および没入に応じて上記閉塞部材を昇降させるものであってもよい。この場合、上記開閉維持手段は、請求項８に記載のように、上記閉塞部材の昇降に伴って上下動するラック部材（６３）と、このラック部材に形成されているラックギアに噛合したピニオンギア（６４）と、上記開口部が開放されている開状態では上記開口部が閉塞される方向への回転を妨げる力が上記ピニオンギアに作用し、上記開口部が閉塞されている閉状態では上記開口部が開放される方向への回転を妨げる力が上記ピニオンギアに作用するように設けられたバランサ（７）とを含むものであってもよいし、請求項１０に記載のように、上記閉塞部材の昇降に伴って昇降するラック部材（６３）と、このラック部材に形成されているラックギアに噛合したピニオンギア（６４）と、上記開口部が開放されている開状態では上記開口部が閉塞される方向への回転を妨げる力を上記ピニオンギアに作用させ、上記開口部が閉塞されている閉状態では上記開口部が開放される方向への回転を妨げる力を上記ピニオンギアに作用させる弾性部材とを含むものであってもよい。
上記開閉維持手段が上記バランサを含む場合、請求項９に記載のように、上記バランサは、上記開状態において、上記ピニオンギアの回転中心を含む上記隔壁と平行な鉛直面に関して一方側に位置し、上記閉状態において、上記鉛直面に関して上記一方側と反対側に位置することが好ましい。
【００１４】
【発明の実施の形態】
以下では、この発明の実施の形態を、添付図面を参照して詳細に説明する。
図１は、この発明の一実施形態に係る基板処理装置を一部破断して示す正面図である。また、図２および図３は、図１に示す切断面線Ａ−Ａにおける基板処理装置の断面図である。この基板処理装置は、隔壁１で区画された処理室２を有しており、この処理室２内において、基板に対して処理液による処理（たとえば、エッチング液による洗浄処理や純水による水洗処理など）を行うようになっている。
【００１５】
隔壁１には、処理室２に対して基板を搬入および搬出するためのスロット状の基板通過口１１が形成されている。この基板通過口１１の周囲には、その全周にわたってシール部材１２が配置されている。また、基板通過口１１に関連して、処理室２外には、基板通過口１１を開閉するためのシャッタ機構３が設けられている。
シャッタ機構３は、処理室２外の底面に固定されたベース３１と、ベース３１に回動自在に支持されたエアシリンダ３２と、エアシリンダ３２のロッド３２１の先端に連結された水平方向に長い昇降部材３３と、この昇降部材３３の長手方向の両端からそれぞれロッド３２１とほぼ平行に延びた左右一対の連結板３４と、これら一対の連結板３４の先端にそれぞれ回動自在に連結されたレバー３５と、これらのレバー３５，３５を連結する回動軸３６と、この回動軸３６を回動自在に支持する支持部材３７と、回動軸３６に一端が固定された左右一対のＬ字状部材３８と、これら一対のＬ字状部材３８の他端に支持されたシャッタ板３９とを備えている。シャッタ板３９は、基板通過口１１よりも少し大きい略長方形状に形成されていて、処理室２の内側に設けられており、基板通過口１１の周縁に配置されたシール部材１２に密着して基板通過口１１を閉塞することができる。
【００１６】
エアシリンダ３２は、駆動用エアが供給されていない状態で、ロッド３２１が本体３２２内に没入している。このとき、図２に示すように、レバー３５の連結板３４に連結されている側の端部３５１が引き下げられており、Ｌ字状部材３８の回動軸３６に固定されている側の一方片３８１が、回動軸３６を含む鉛直面（一点鎖線で示す。）に関して、隔壁１とは反対側（図２における右側）に位置している。そして、Ｌ字状部材３８の他方の片３８２は、ほぼ水平な状態となって基板通過口１１に挿通されており、このＬ字状部材３８の先端に取り付けられたシャッタ板３９は、シール部材１２に密着して基板通過口１１を閉塞している。
【００１７】
処理室２に対して基板を搬入および搬出する際には、エアシリンダ３２に駆動用エアが供給されて、エアシリンダ３２のロッド３２１が本体３２２から進出させられる。このロッド３２１の進出により、レバー３５の端部３５１が押し上げられて、回動軸３６が図２における反時計回りに回転し、この回動軸３６の回転に伴ってＬ字状部材３８が回転する。その結果、図３に示すように、シャッタ板３９が基板通過口１１から離間して、基板通過口１１が開放される。この状態で、Ｌ字状部材３８の回動軸３６に固定されている側の片３８１は、回動軸３６を含む鉛直面に関して、隔壁１に近い側（図３における左側）に位置している。
【００１８】
なお、この実施形態では、レバー３５、回動軸３６、支持部材３７およびＬ字状部材３８によって、エアシリンダ３２のロッド３２１の進出および没入による直線運動を回転力に変換するリンク機構が構成されている。
基板通過口１１が開放された状態は、処理室２に対して搬入および搬出される基板が基板通過口１１を通過し終えるまで継続される。すなわち、基板が基板通過口１１を通過し終えるまで、エアシリンダ３２への駆動用エアの供給が続けられて、エアシリンダ３２のロッド３２１が進出した状態が保たれる。そして、基板が基板通過口１１を通過し終えると、エアシリンダ３２への駆動用エアの供給が停止されて、エアシリンダ３２のロッド３２１が本体３２２に没入し、Ｌ字状部材３８が図３における時計回りに回転することにより、基板通過口１１がシャッタ板３９によって閉塞された状態に戻される。処理室２内に搬入された基板に対する処理は、基板通過口１１がシャッタ板３９で閉塞されて、処理室２がほぼ密閉された状態で行われる。
【００１９】
Ｌ字状部材３８は、たとえば、耐薬液性を有する樹脂材料で形成されている。そして、その一方片３８１には、金属製のバランサ４が埋設されている。このバランサ４は、シャッタ板３９による基板通過口１１の開閉状態が維持されるようなモーメントを、回動軸３６を中心に回動可能な部材（レバー３５、Ｌ字状部材３８およびシャッタ板３９）に生じさせるためのものである。
すなわち、バランサ４は、図２に示すような基板通過口１１の閉状態では、シャッタ板３９に作用する重力によって生じるモーメントよりも、Ｌ字状部材３８およびバランサ４に作用する重力によって生じるモーメントと、レバー３５の端部３５１に作用するエアシリンダ３２のロッド３２１、昇降部材３３および一対の連結板３４，３４の重力によって生じるモーメントとの和の方が大きくなり、図３に示すような基板通過口１１の開状態では、レバー３５の端部３５１に作用するエアシリンダ３２のロッド３２１、昇降部材３３および一対の連結板３４，３４の重力によって生じるモーメントよりも、シャッタ板３９に作用する重力によって生じるモーメントと、Ｌ字状部材３８およびバランサ４に作用する重力によって生じるモーメントとの和の方が大きくなるような質量を有している。
【００２０】
これにより、基板通過口１１が開成されている状態でエアシリンダ３２のエアリークが発生しても、このとき回動軸３６を中心に回動可能な部材に生じているモーメントによって、その基板通過口１１の開状態が保たれる。ゆえに、基板通過口１１を通過中の基板にシャッタ板３９が衝突するおそれがなく、このシャッタ板３９の衝突による基板の破損を生じるおそれがない。
また、基板通過口１１が閉塞されている状態では、回動軸３６を中心に回動可能な部材を図２における時計回りに回転させる方向の力が作用するから、その基板通過口１１の閉状態が保たれる。よって、エアシリンダ３２に駆動用エアが供給されていない状態でシャッタ板３９が開成するおそれがなく、処理室２内の処理液を含む雰囲気が外部に流出するおそれがない。
【００２１】
図４は、この発明の他の実施形態について説明するための断面図である。この図４において、上述の図２および図３に示された各部に相当する部分には、図２および図３の場合と同一の参照符号が付されている。また、以下では、上述した第１の実施形態に係る構成との相違点を中心に説明する。
上述した第１の実施形態では、適当な質量のバランサ４（図２および図３参照）をＬ字状部材３８の一方片３８１に埋設しておくことにより、回動軸３６を中心に回動可能な部材に基板通過口１１の開状態および閉状態を維持するためのモーメントを生じさせるようにしているが、この実施形態では、バランサ４に代えて、回動軸３６を中心に回動可能な部材に基板通過口１１の開状態および閉状態が維持されるようなモーメントを、回動軸３６を中心に回動可能な部材（レバー３５、Ｌ字状部材３８およびシャッタ板３９）に生じさせるコイルばね５が備えられている。
【００２２】
すなわち、コイルばね５は、回動軸３６を含む鉛直面上であって支持部材３７の回動軸３６よりも下方の位置に一端５１が固定され、他端５２がＬ字状部材３８の屈曲部３８３付近に固定されており、上死点が回動軸３６を含む鉛直面上に位置するようになっている。また、基板通過口１１の開状態（二点鎖線で示す状態）および閉状態（実線で示す状態）におけるコイルばね５の長さよりも、シャッタ板３９が開状態と閉状態との間で変位する過程におけるコイルばね５の長さの方が長くなるようになっている。
【００２３】
そして、コイルばね５は、基板通過口１１の閉状態では、シャッタ板３９に作用する重力によって生じるモーメントよりも、Ｌ字状部材３８に作用する重力によって生じるモーメントと、レバー３５の端部３５１に作用するエアシリンダ３２のロッド３２１、昇降部材３３および一対の連結板３４，３４の重力によって生じるモーメントと、コイルばね５の弾性力（ばね力）によって生じるモーメントとの和の方が大きく、基板通過口１１の開状態では、レバー３５の端部３５１に作用するエアシリンダ３２のロッド３２１、昇降部材３３および一対の連結板３４，３４の重力によるモーメントよりも、シャッタ板３９に作用する重力によって生じるモーメントと、Ｌ字状部材３８に作用する重力によって生じるモーメントと、コイルばね５の弾性力によって生じるモーメントとの和の方が大きくなるような弾性力（ばね力）を有している。
【００２４】
したがって、上述の第１の実施形態の構成と同様に、基板通過口１１の開状態でエアシリンダ３２のエアリークが発生しても、シャッタ板３９が開成されている状態（基板通過口１１の開状態）を維持することができる。ゆえに、基板通過口１１を通過中の基板にシャッタ板３９が衝突するおそれがなく、このシャッタ板３９の衝突による基板の破損を生じるおそれがない。また、基板通過口１１の閉状態を維持することができるので、処理室２内の処理液を含む雰囲気が外部に流出するおそれもない。
【００２５】
なお、必ずしもコイルばね５の一端５１が回動軸３６を含む鉛直面上に設けられる必要はなく、上述の効果を達成するためには、図５に示すように、コイルばね５の一端５１は、支持部材３７の回動軸３６よりも下方であって、コイルばね５を含む平面において、シャッタ板３９が開状態のときのコイルばね５の他端５２の位置Ｐ１および回動軸３６を通る直線とシャッタ板３９が閉状態のときのコイルばね５の他端５２の位置Ｐ２および回動軸３６を通る直線との間の領域（図５においてハッチングを付した領域。境界を除く。）Ｓ内にあればよい。
【００２６】
また、コイルばね５を備えたことによってバランサ４を必ず省略しなければならないというわけではなく、バランサ４を備えた第１の実施形態に係る構成にコイルばね５がさらに付加されてもよい。
図６は、この発明のさらに他の実施形態について説明するための図解的な断面図である。図６において、上述の図２および図３に示された各部に相当する部分には、図２および図３の場合と同一の参照符号を付している。
【００２７】
この実施形態に係るシャッタ機構６は、ロッド６１１が鉛直方向に進出および没入するように配置されたエアシリンダ６１と、このエアシリンダ６１の進出および没入によって昇降されるシャッタ板６２と、エアシリンダ６１によるシャッタ板６２の昇降に伴って昇降するラック部材６３と、このラック部材６３に形成されたラックギアに噛合したピニオンギア６４とを備えている。ピニオンギア６４は、耐薬液性を有する樹脂材料で形成されていて、その内部には、適当な質量を有する金属製のバランサ７が埋設されている。
【００２８】
エアシリンダ６１は、駆動用エアが供給されていない状態で、ロッド６１１が本体６１２内に没入している。このとき、図６(a)に示すように、シャッタ板６２が基板通過口１１の下方まで下げられて、基板通過口１１は基板の通過が可能なように開放されている。また、ピニオンギア６４に埋設されているバランサ７は、ピニオンギア６４の回転中心を含む隔壁１と平行な鉛直面に関して、図６における左側に位置している。
【００２９】
処理対象の基板が基板通過口１１を介して処理室２内に搬入されると、エアシリンダ６１に駆動用エアが供給されて、エアシリンダ６１のロッド６１１が本体６１２から進出させられる。このロッド６１１の進出により、シャッタ板６２が上昇されて基板通過口１１に対向し、シャッタ板６２によって基板通過口１１が閉塞される。このとき、シャッタ板６２の上昇に伴ってラック部材６３が上昇し、このラック部材６３の上昇により、ピニオンギア６４が図６における時計回りに回転する。そして、シャッタ板６２によって基板通過口１１が閉塞された状態で、ピニオンギア６４に埋設されているバランサ７は、ピニオンギア６４の回転中心を含む隔壁１と平行な鉛直面に関して、図６における右側に位置するようになっている。処理室２内に搬入された基板に対する処理は、基板通過口１１がシャッタ板６２で閉塞されて、処理室２がほぼ密閉された状態で行われる。
【００３０】
この実施形態の構成によれば、基板通過口１１の開状態においては、ピニオンギア６４に埋設されているバランサ７に作用する重力によって、シャッタ板６２（ラック部材６３）が上昇する方向へのピニオンギア６４の回転が妨げられる。また、基板通過口１１の開状態においては、ピニオンギア６４に埋設されているバランサ７に作用する重力によって、シャッタ板６２が下降する方向へのピニオンギア６４の回転が妨げられる。
【００３１】
これにより、たとえ基板通過口１１の閉状態でエアシリンダ３２のエアリークが発生しても、その基板通過口１１の閉状態を維持することができる。ゆえに、処理室２内の処理液を含む雰囲気が外部に流出するおそれがない。また、基板通過口１１の開状態を維持することができるので、基板通過口１１を通過中の基板にシャッタ板６２が衝突するおそれがなく、このシャッタ板６２の衝突による基板の破損を生じるおそれもない。
【００３２】
なお、この実施形態では、基板通過口１１の開状態および閉状態を維持するための力を付与するバランサ７がピニオンギア６４に埋設されているとしたが、このバランサ７に代えて、基板通過口１１の開状態ではシャッタ板６２によって基板通過口１１が閉塞される方向（ラック部材６３が上昇する方向）への回転を妨げる力をピニオンギア６４に作用させ、基板通過口１１の閉状態では基板通過口１１が開放される方向（ラック部材６３が下降する方向）への回転を妨げる力をピニオンギア６４に作用させるばねが設けられてもよい。また、この実施形態に係る構成（バランサ７を備えた構成）に、上記のような力を作用させるばねがさらに付加されてもよい。
【００３３】
以上、この発明のいくつかの実施形態について説明したが、この発明はさらに他の形態で実施することができ、特許請求の範囲に記載された事項の範囲で種々の設計変更を施すことが可能である。
【図面の簡単な説明】
【図１】この発明の一実施形態に係る基板処理装置を一部破断して示す正面図である。
【図２】図１に示す切断面線Ａ−Ａにおける基板処理装置の断面図であり、シャッタ部材によって基板通過口が閉塞された状態を示す。
【図３】図１に示す切断面線Ａ−Ａにおける基板処理装置の断面図であり、基板通過口が開放された状態を示す。
【図４】この発明の他の実施形態について説明するための断面図である。
【図５】図４に示す基板処理装置の変形例について説明するための図である。
【図６】この発明のさらに他の実施形態について説明するための図解的な断面図である。
【図７】従来の基板処理装置の構成を説明するための断面図である。
【符号の説明】
１隔壁
１１基板通過口
２処理室
３シャッタ機構
３１ベース
３２エアシリンダ
３２１ロッド
３２２本体
３３昇降部材
３４連結板
３５レバー
３６回動軸
３７支持部材
３８Ｌ字状部材
３９シャッタ板
４バランサ
５コイルばね
６シャッタ機構
６１エアシリンダ
６１１ロッド
６１２本体
６２シャッタ板
６３ラック部材
６４ピニオンギア
７バランサ[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a substrate processing apparatus for performing predetermined processing on various substrates such as a semiconductor wafer, a glass substrate for a liquid crystal display device, a glass substrate for a plasma display panel, and a magnetic / optical disk substrate.
[0002]
[Prior art]
In a manufacturing process of a semiconductor device or a liquid crystal display device, a substrate processing apparatus for supplying a processing liquid (chemical solution or pure water) to the substrate and performing a surface treatment of the substrate is used. A single-wafer type substrate processing apparatus that processes substrates one by one includes a processing chamber partitioned by a partition wall. Each substrate is carried into the processing chamber one by one, and the substrate is processed with a processing solution. It is like that.
[0003]
Substrate passage ports for carrying in and out the substrate are formed in the partition walls that define the processing chamber. A shutter mechanism for opening and closing the substrate passage opening is provided in relation to the substrate passage opening. After the substrate is loaded into the processing chamber from the substrate passage opening, the substrate passage opening is blocked by the shutter mechanism. The substrate is processed while the processing chamber is almost sealed. The reason for closing the substrate passage port is to prevent the atmosphere containing the processing liquid in the processing chamber from flowing out through the substrate passage port.
[0004]
FIG. 7 is a cross-sectional view showing a configuration of a conventional shutter mechanism. The conventional shutter mechanism includes a shutter member 92 provided to be rotatable about a substantially horizontal rotation shaft 91, and an air cylinder 94 connected to the shutter member 92 via a link mechanism 93.
The link mechanism 93 converts the linear motion of the rod 95 of the air cylinder 94 due to advancement and immersion into a force for rotating the shutter member 92. When the rod 95 of the air cylinder 94 advances by the function of the link mechanism 93, the shutter member 92 rotates counterclockwise in FIG. 7, and the substrate passage port 97 formed in the partition wall 96 of the processing chamber is opened. . On the other hand, when the rod 95 of the air cylinder 94 is immersed, the shutter member 92 rotates clockwise in FIG. 7, and the substrate passage opening 97 is closed by the shutter member 92. FIG. 7 shows a state in which the rod 95 of the air cylinder 94 has advanced and the substrate passage port 97 is opened.
[0005]
[Problems to be solved by the invention]
When the substrate passes through the substrate passage port 97, driving air is supplied to the air cylinder 94, and the rod 95 of the air cylinder 94 is set in the advanced state, whereby the substrate passage port 97 is opened. Then, the driving air is continuously supplied to the air cylinder 94 until the substrate finishes passing through the substrate passage port 97, and the state where the substrate passage port 97 is opened is maintained.
[0006]
However, in the above-described conventional apparatus, the rod 95 of the air cylinder 94 and the rod 95 and the link mechanism 93 are more than the moment generated in the link mechanism 93 by the gravity acting on the shutter member 92 in a state where the substrate passage opening 97 is opened. In the direction in which the shutter member 92 closes the substrate passage opening 97 when an air leak occurs in the air cylinder 94 because the moment generated in the link mechanism 93 due to the gravity acting on the connecting member 98 connecting the two is larger (FIG. 7). There was a problem of rotating clockwise. If the substrate passes through the substrate passage opening 97 when the air leak occurs, the shutter member 92 may collide with the substrate that is passing therethrough and the substrate may be destroyed.
[0007]
In order to solve this problem, it is conceivable to configure the link mechanism 93 so that the substrate passage opening 97 is closed by the shutter member 92 in a state in which the rod 95 of the air cylinder 94 is advanced. However, when such a configuration is adopted, if an air leak occurs in a state where the substrate passage opening 97 is closed by the shutter member 92, the shutter member 92 opens the substrate passage opening 97 (counterclockwise in FIG. 7). This causes another problem that the atmosphere containing the processing liquid in the processing chamber flows out to the outside.
[0008]
SUMMARY OF THE INVENTION Accordingly, an object of the present invention is to provide a substrate processing apparatus that solves the above technical problem and can maintain the open / closed state of the opening (substrate passage opening) by the closing member (shutter member).
[0009]
[Means for Solving the Problems and Effects of the Invention]
In order to achieve the above object, the invention according to claim 1 is formed in the partition wall (1), the processing chamber (2) in which processing using a processing fluid is performed on the substrate, and the partition wall. The drive source includes an opening (11) through which the substrate can pass, a closing member (39; 62) for closing the opening, and an air cylinder (32; 61) to which driving air is supplied. An opening / closing drive mechanism (32, 33, 34 , 35, 36, 37, 38 ; 61) for driving the closing member so that the opening is opened and closed by the closing member, and an air leak of the air cylinder Even when the opening is opened, the open state is maintained in the open state, and the moment for maintaining the closed state in the closed state in which the opening is closed by the closing member. Departure A substrate processing apparatus which comprises a (63,64,7 4; 5) closing maintaining means.
[0010]
In addition, the alphanumeric characters in parentheses represent corresponding components in the embodiments described later. The same applies hereinafter.
According to this invention, the opening / closing state of the opening by the closing member can be maintained. Therefore, when the opening is a substrate passage port for loading and unloading the substrate with respect to the processing chamber, there is no possibility that the blocking member collides with the substrate passing through the substrate passage port. There is no risk of substrate damage due to
[0011]
Further, since the closed state of the opening can be maintained, the atmosphere containing the processing fluid in the processing chamber does not flow out to the outside.
According to a second aspect of the present invention, the opening / closing drive mechanism includes a link mechanism (35, 36, 37, 38) for converting a linear motion caused by the advancement and immersion of the rod of the cylinder into a rotational force. The opening may be opened and closed by displacing the closing member by a rotational force generated by a mechanism.
[0012]
In this case, as described in claim 3, the open / close maintaining means acts on the link mechanism in a direction in which the opening is maintained in the open state where the opening is open, it force that maintains its closed state in the closed state in which the opening is closed may comprise a balancer (4) provided so as to act on the link mechanism, in claim 5 As described, a force is applied to the link mechanism in the open state in which the opening is open, and the opening is closed in the closed state in which the opening is closed by the closing member. It may include an elastic member (5) that applies a force in a direction to maintain the state to the link mechanism.
When the open / close maintaining means includes the balancer, as described in claim 4, the link mechanism includes a rotating member that rotates in accordance with the displacement of the closing member, and the balancer includes the rotating member. It is preferable that it is embedded in.
When the open / close maintaining means includes the elastic member, as described in claim 6, the elastic member is a coil spring, and the link mechanism is rotated by the displacement of the closing member. One end of the coil spring is fixed to the support member that supports the rotating shaft of the rotating member, the other end is fixed to the rotating member, and the one end of the coil spring is connected to the rotating member. In a plane below the dynamic axis and including the coil spring, the position of the other end of the coil spring in the closed state and a straight line passing through the rotating shaft, and the coil spring in the open state It is preferable to arrange in the region between the position of the other end and the straight line passing through the rotation axis.
[0013]
According to a seventh aspect of the present invention, the opening / closing drive mechanism may raise or lower the closing member in response to advancement and immersion of the rod of the cylinder. In this case, as described in claim 8 , the open / close maintaining means includes a rack member (63) that moves up and down as the closing member moves up and down, and a pinion gear meshed with the rack gear formed on the rack member. (64) and a force that prevents rotation in the direction in which the opening is closed acts on the pinion gear in the open state in which the opening is open, and in the closed state in which the opening is closed. A balancer (7) provided so that a force that prevents rotation in a direction in which the opening is opened may act on the pinion gear, and as described in claim 10 , A rack member (63) that moves up and down as the closing member moves up and down, a pinion gear (64) that meshes with a rack gear formed on the rack member, and the opening is open when the opening is open. A force that prevents rotation in the closed direction is applied to the pinion gear, and a force that prevents rotation in the direction in which the opening is opened is applied to the pinion gear in the closed state where the opening is closed. An elastic member may be included.
When the open / close maintaining means includes the balancer, the balancer is positioned on one side with respect to a vertical plane parallel to the partition including the rotation center of the pinion gear in the open state. In the closed state, it is preferably located on the opposite side to the one side with respect to the vertical plane.
[0014]
DETAILED DESCRIPTION OF THE INVENTION
Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings.
FIG. 1 is a partially cutaway front view of a substrate processing apparatus according to an embodiment of the present invention. 2 and 3 are cross-sectional views of the substrate processing apparatus taken along section line AA shown in FIG. This substrate processing apparatus has a processing chamber 2 partitioned by a partition wall 1. In this processing chamber 2, a substrate is treated with a treatment liquid (for example, a cleaning treatment with an etching solution or a water washing treatment with pure water). Etc.).
[0015]
The partition wall 1 is formed with a slot-like substrate passage port 11 for carrying the substrate in and out of the processing chamber 2. A sealing member 12 is disposed around the substrate passage opening 11 over the entire circumference. Further, a shutter mechanism 3 for opening and closing the substrate passage opening 11 is provided outside the processing chamber 2 in relation to the substrate passage opening 11.
The shutter mechanism 3 has a base 31 fixed to the bottom surface outside the processing chamber 2, an air cylinder 32 rotatably supported by the base 31, and a horizontal direction coupled to the tip of a rod 321 of the air cylinder 32. The elevating member 33, a pair of left and right connecting plates 34 extending substantially in parallel with the rod 321 from both longitudinal ends of the elevating member 33, and levers rotatably connected to the tips of the pair of connecting plates 34, respectively. 35, a rotation shaft 36 for connecting these levers 35, 35, a support member 37 for rotatably supporting the rotation shaft 36, and a pair of left and right L-shaped members fixed at one end to the rotation shaft 36. And a shutter plate 39 supported on the other end of the pair of L-shaped members 38. The shutter plate 39 is formed in a substantially rectangular shape that is slightly larger than the substrate passage opening 11, is provided inside the processing chamber 2, and is in close contact with the seal member 12 disposed at the periphery of the substrate passage opening 11. The substrate passage port 11 can be closed.
[0016]
In the air cylinder 32, the rod 321 is immersed in the main body 322 in a state where driving air is not supplied. At this time, as shown in FIG. 2, the end 351 of the lever 35 on the side connected to the connecting plate 34 is pulled down, and one end of the L-shaped member 38 on the side fixed to the rotating shaft 36 is pulled down. The piece 381 is located on the side opposite to the partition wall 1 (the right side in FIG. 2) with respect to the vertical plane (indicated by the alternate long and short dash line) including the rotation shaft 36. The other piece 382 of the L-shaped member 38 is inserted into the substrate passage 11 in a substantially horizontal state, and the shutter plate 39 attached to the tip of the L-shaped member 38 is a seal member. 12 is in close contact with the substrate passage opening 11.
[0017]
When the substrate is carried into and out of the processing chamber 2, driving air is supplied to the air cylinder 32, and the rod 321 of the air cylinder 32 is advanced from the main body 322. With the advancement of the rod 321, the end 351 of the lever 35 is pushed up, the rotation shaft 36 rotates counterclockwise in FIG. 2, and the L-shaped member 38 rotates as the rotation shaft 36 rotates. To do. As a result, as shown in FIG. 3, the shutter plate 39 is separated from the substrate passage opening 11 and the substrate passage opening 11 is opened. In this state, the piece 381 on the side fixed to the rotation shaft 36 of the L-shaped member 38 is located on the side close to the partition wall 1 (the left side in FIG. 3) with respect to the vertical plane including the rotation shaft 36. Yes.
[0018]
In this embodiment, the lever 35, the rotation shaft 36, the support member 37, and the L-shaped member 38 constitute a link mechanism that converts the linear motion of the rod 321 of the air cylinder 32 due to advancement and immersion into a rotational force. ing.
The state in which the substrate passage opening 11 is opened is continued until the substrate carried into and out of the processing chamber 2 has passed through the substrate passage opening 11. That is, the supply of driving air to the air cylinder 32 is continued until the substrate finishes passing through the substrate passage port 11, and the rod 321 of the air cylinder 32 is maintained in the advanced state. When the substrate finishes passing through the substrate passage port 11, the supply of driving air to the air cylinder 32 is stopped, the rod 321 of the air cylinder 32 is immersed in the main body 322, and the L-shaped member 38 is shown in FIG. , The substrate passage port 11 is returned to the closed state by the shutter plate 39. The processing for the substrate carried into the processing chamber 2 is performed in a state where the substrate passage port 11 is closed by the shutter plate 39 and the processing chamber 2 is almost sealed.
[0019]
The L-shaped member 38 is formed of a resin material having chemical resistance, for example. A metal balancer 4 is embedded in the one piece 381. The balancer 4 is a member (a lever 35, an L-shaped member 38, and a shutter plate 39) that can turn a moment that maintains the open / close state of the substrate passage 11 by the shutter plate 39 around the rotation shaft 36. ).
That is, the balancer 4 has a moment generated by the gravity acting on the L-shaped member 38 and the balancer 4 rather than a moment caused by the gravity acting on the shutter plate 39 in the closed state of the substrate passage opening 11 as shown in FIG. The sum of the moment generated by the gravity of the rod 321 of the air cylinder 32 acting on the end portion 351 of the lever 35, the elevating member 33, and the pair of connecting plates 34, 34 becomes larger and passes through the substrate as shown in FIG. In the open state of the mouth 11, the gravity acting on the shutter plate 39 is more than the moment generated by the gravity of the rod 321 of the air cylinder 32 acting on the end portion 351 of the lever 35, the elevating member 33 and the pair of connecting plates 34, 34. Moment generated by the moment generated and the gravity acting on the L-shaped member 38 and the balancer 4 And a mass, such as towards the sum increases with.
[0020]
Thus, even if an air leak occurs in the air cylinder 32 in a state where the substrate passage opening 11 is opened, the substrate passage opening is caused by a moment generated in a member that can rotate around the rotation shaft 36 at this time. 11 open state is maintained. Therefore, there is no possibility that the shutter plate 39 collides with the substrate passing through the substrate passage port 11, and there is no possibility that the substrate is damaged due to the collision of the shutter plate 39.
Further, in the state where the substrate passage opening 11 is closed, a force in the direction of rotating the member that can turn around the turning shaft 36 in the clockwise direction in FIG. State is maintained. Therefore, there is no possibility that the shutter plate 39 is opened in a state where the driving air is not supplied to the air cylinder 32, and there is no possibility that the atmosphere containing the processing liquid in the processing chamber 2 flows out to the outside.
[0021]
FIG. 4 is a cross-sectional view for explaining another embodiment of the present invention. In FIG. 4, the same reference numerals as those in FIGS. 2 and 3 are assigned to the portions corresponding to the respective parts shown in FIGS. In the following description, differences from the configuration according to the first embodiment will be mainly described.
In the first embodiment described above, the balancer 4 (see FIGS. 2 and 3) having an appropriate mass is embedded in the one piece 381 of the L-shaped member 38, thereby rotating around the rotation shaft 36. Although a moment for maintaining the open state and the closed state of the substrate passage port 11 is generated in the possible member, in this embodiment, it can be rotated around the rotation shaft 36 instead of the balancer 4. A moment is generated in the members (lever 35, L-shaped member 38, and shutter plate 39) that can rotate about the rotation shaft 36 so that the open state and the closed state of the substrate passage port 11 are maintained in such a member. A coil spring 5 is provided.
[0022]
In other words, the coil spring 5 has one end 51 fixed on a vertical plane including the rotation shaft 36 and below the rotation shaft 36 of the support member 37, and the other end 52 bent by the L-shaped member 38. The top dead center is positioned on the vertical plane including the rotation shaft 36. Further, the shutter plate 39 is displaced between the open state and the closed state rather than the length of the coil spring 5 in the open state (state indicated by the two-dot chain line) and the closed state (state indicated by the solid line) of the substrate passage opening 11. The length of the coil spring 5 in the process is longer.
[0023]
In the closed state of the substrate passage opening 11, the coil spring 5 is applied to the moment generated by the gravity acting on the L-shaped member 38 and the end 351 of the lever 35 rather than the moment generated by the gravity acting on the shutter plate 39. The sum of the moment generated by the gravity of the rod 321 of the acting air cylinder 32, the elevating member 33 and the pair of connecting plates 34 and 34 and the moment generated by the elastic force (spring force) of the coil spring 5 is larger, and passes through the substrate. In the open state of the mouth 11, it is generated by the gravity acting on the shutter plate 39 rather than the moment due to the gravity of the rod 321 of the air cylinder 32 acting on the end 351 of the lever 35, the elevating member 33 and the pair of connecting plates 34, 34. The moment, the moment generated by the gravity acting on the L-shaped member 38, and the coil spring 5 It has elastic force as it is increased to the sum of the moment generated by the elastic force (spring force).
[0024]
Therefore, as in the configuration of the first embodiment described above, even if an air leak of the air cylinder 32 occurs when the substrate passage opening 11 is open, the shutter plate 39 is still open (opening of the substrate passage opening 11). State) can be maintained. Therefore, there is no possibility that the shutter plate 39 collides with the substrate passing through the substrate passage port 11, and there is no possibility that the substrate is damaged due to the collision of the shutter plate 39. Further, since the closed state of the substrate passage port 11 can be maintained, there is no possibility that the atmosphere containing the processing liquid in the processing chamber 2 flows out to the outside.
[0025]
The one end 51 of the coil spring 5 does not necessarily have to be provided on the vertical plane including the rotation shaft 36. To achieve the above-described effect, the one end 51 of the coil spring 5 is as shown in FIG. In the plane below the rotation shaft 36 of the support member 37 and including the coil spring 5, the position P1 of the other end 52 of the coil spring 5 and the rotation shaft 36 when the shutter plate 39 is in the open state are passed. A region between the straight line and the position P2 of the other end 52 of the coil spring 5 when the shutter plate 39 is in the closed state and a straight line passing through the rotation shaft 36 (a hatched region in FIG. 5, excluding the boundary) S. It only has to be inside.
[0026]
In addition, the balancer 4 is not necessarily omitted due to the provision of the coil spring 5, and the coil spring 5 may be further added to the configuration according to the first embodiment including the balancer 4.
FIG. 6 is a schematic cross-sectional view for explaining still another embodiment of the present invention. 6, parts corresponding to the respective parts shown in FIGS. 2 and 3 are given the same reference numerals as those in FIGS.
[0027]
The shutter mechanism 6 according to this embodiment includes an air cylinder 61 arranged so that a rod 611 moves up and down in the vertical direction, a shutter plate 62 moved up and down by the air cylinder 61 moving up and down, and an air cylinder 61. A rack member 63 that moves up and down as the shutter plate 62 moves up and down, and a pinion gear 64 that meshes with a rack gear formed on the rack member 63 are provided. The pinion gear 64 is formed of a resin material having chemical resistance, and a metal balancer 7 having an appropriate mass is embedded therein.
[0028]
In the air cylinder 61, the rod 611 is immersed in the main body 612 in a state where driving air is not supplied. At this time, as shown in FIG. 6A, the shutter plate 62 is lowered to below the substrate passage opening 11, and the substrate passage opening 11 is opened so that the substrate can pass therethrough. Further, the balancer 7 embedded in the pinion gear 64 is located on the left side in FIG. 6 with respect to a vertical plane parallel to the partition 1 including the rotation center of the pinion gear 64.
[0029]
When a substrate to be processed is loaded into the processing chamber 2 via the substrate passage port 11, driving air is supplied to the air cylinder 61 and the rod 611 of the air cylinder 61 is advanced from the main body 612. The advancement of the rod 611 raises the shutter plate 62 to face the substrate passage opening 11, and the substrate passage opening 11 is closed by the shutter plate 62. At this time, the rack member 63 rises as the shutter plate 62 rises, and the pinion gear 64 rotates clockwise in FIG. 6 as the rack member 63 rises. The balancer 7 embedded in the pinion gear 64 with the substrate passage opening 11 closed by the shutter plate 62 is located on the right side in FIG. 6 with respect to the vertical plane parallel to the partition wall 1 including the rotation center of the pinion gear 64. It is supposed to be located in. The processing on the substrate carried into the processing chamber 2 is performed in a state where the substrate passage port 11 is closed by the shutter plate 62 and the processing chamber 2 is almost sealed.
[0030]
According to the configuration of this embodiment, in the open state of the substrate passage opening 11, the pinion in the direction in which the shutter plate 62 (rack member 63) rises due to the gravity acting on the balancer 7 embedded in the pinion gear 64. The rotation of the gear 64 is prevented. In the open state of the substrate passage opening 11, the gravity acting on the balancer 7 embedded in the pinion gear 64 prevents the rotation of the pinion gear 64 in the direction in which the shutter plate 62 descends.
[0031]
Thereby, even if the air leak of the air cylinder 32 occurs when the substrate passage opening 11 is closed, the closed state of the substrate passage opening 11 can be maintained. Therefore, there is no possibility that the atmosphere containing the processing liquid in the processing chamber 2 flows out to the outside. Further, since the open state of the substrate passage opening 11 can be maintained, there is no possibility that the shutter plate 62 will collide with the substrate passing through the substrate passage opening 11, and the substrate may be damaged due to the collision of the shutter plate 62. Nor.
[0032]
In this embodiment, the balancer 7 for applying a force for maintaining the open state and the closed state of the substrate passage opening 11 is embedded in the pinion gear 64. In the open state of the opening 11, a force that prevents the rotation in the direction in which the substrate passage opening 11 is closed by the shutter plate 62 (the direction in which the rack member 63 moves up) is applied to the pinion gear 64, and in the closed state of the substrate passage opening 11. A spring may be provided that causes the pinion gear 64 to exert a force that prevents rotation in the direction in which the substrate passage opening 11 is opened (the direction in which the rack member 63 descends). Moreover, the spring which makes the above force act may be further added to the structure (structure provided with the balancer 7) which concerns on this embodiment.
[0033]
Although several embodiments of the present invention have been described above, the present invention can be implemented in other forms, and various design changes can be made within the scope of the matters described in the claims. It is.
[Brief description of the drawings]
FIG. 1 is a front view of a substrate processing apparatus according to an embodiment of the present invention, partially broken away.
2 is a cross-sectional view of the substrate processing apparatus taken along a section line AA shown in FIG. 1, showing a state where a substrate passage opening is closed by a shutter member.
3 is a cross-sectional view of the substrate processing apparatus taken along a section line AA shown in FIG. 1, showing a state in which a substrate passage opening is opened.
FIG. 4 is a cross-sectional view for explaining another embodiment of the present invention.
FIG. 5 is a diagram for explaining a modification of the substrate processing apparatus shown in FIG. 4;
FIG. 6 is a schematic cross-sectional view for explaining still another embodiment of the present invention.
FIG. 7 is a cross-sectional view for explaining the configuration of a conventional substrate processing apparatus.
[Explanation of symbols]
DESCRIPTION OF SYMBOLS 1 Partition 11 Substrate passage port 2 Processing chamber 3 Shutter mechanism 31 Base 32 Air cylinder 321 Rod 322 Main body 33 Lifting member 34 Connecting plate 35 Lever 36 Rotating shaft 37 Support member 38 L-shaped member 39 Shutter plate 4 Balancer 5 Coil spring 6 Shutter mechanism 61 Air cylinder 611 Rod 612 Body 62 Shutter plate 63 Rack member 64 Pinion gear 7 Balancer

Claims

A processing chamber surrounded by a partition wall, in which processing using a processing fluid is performed on the substrate;
Formed in the partition, an opening through which the substrate can pass, and a closing member for closing the opening;
An opening / closing drive mechanism for driving the closing member so that the opening is opened and closed by the closing member, using an air cylinder to which driving air is supplied as a driving source;
Even when an air leak occurs in the air cylinder , the open state is maintained in the open state in which the opening is opened, and the closed state is maintained in the closed state in which the opening is closed by the closing member. And an opening / closing maintaining means for generating a moment for generating the substrate processing apparatus.

The opening / closing drive mechanism includes a link mechanism that converts a linear motion caused by the advancement and immersion of the rod of the cylinder into a rotational force, and displaces the closing member by the rotational force generated by the link mechanism to open and close the opening. The substrate processing apparatus according to claim 1, wherein the substrate processing apparatus is one.

The open / close maintaining means has a force in a direction in which the opening is maintained in the open state in which the opening is open, and acts on the link mechanism, and in the closed state in which the opening is closed by the closing member. The substrate processing apparatus according to claim 2, further comprising a balancer provided so that a force in a direction to maintain the closed state acts on the link mechanism.

The link mechanism includes a rotating member that rotates in accordance with the displacement of the closing member,
The substrate processing apparatus according to claim 3, wherein the balancer is embedded in the rotating member.

The open / close maintaining means acts on the link mechanism in a direction in which the opening is maintained in the open state in which the opening is open, and in the closed state in which the opening is closed by the closing member. the substrate processing apparatus according to any one of claims 2, characterized in that the force maintaining the closed state is intended to include elastic members to act on the link mechanism 4.

  The elastic member is a coil spring,
  The link mechanism includes a rotating member that rotates in accordance with the displacement of the closing member,
  One end of the coil spring is fixed to the support member that supports the rotation shaft of the rotation member, and the other end is fixed to the rotation member.
  The one end of the coil spring is below the rotating shaft, and on the plane including the coil spring, the position of the other end of the coil spring in the closed state and a straight line passing through the rotating shaft 6. The substrate processing apparatus according to claim 5, wherein the substrate processing apparatus is disposed in a region between the position of the other end of the coil spring in the open state and a straight line passing through the rotation shaft.

2. The substrate processing apparatus according to claim 1, wherein the opening / closing drive mechanism raises and lowers the closing member in accordance with advancement and immersion of the rod of the cylinder.

The open / close maintaining means includes a rack member that moves up and down as the closing member moves up and down, a pinion gear that meshes with a rack gear formed on the rack member, and the opening in the open state where the opening is open. The force that prevents rotation in the direction in which the opening is closed acts on the pinion gear, and in the closed state in which the opening is closed, the force that prevents rotation in the direction in which the opening is opened is applied to the pinion gear. The substrate processing apparatus according to claim 7 , further comprising a balancer provided to act.

The balancer is positioned on one side with respect to a vertical plane parallel to the partition including the rotation center of the pinion gear in the open state, and is positioned on the opposite side to the one side with respect to the vertical plane in the closed state. The substrate processing apparatus according to claim 8.

The open / close maintaining means includes a rack member that moves up and down as the closing member moves up and down, a pinion gear that meshes with a rack gear that is formed on the rack member, and the opening in the open state where the opening is open. A force that prevents rotation in the direction in which the opening is closed is applied to the pinion gear. In a closed state in which the opening is closed, a force that prevents rotation in the direction in which the opening is opened is applied to the pinion gear. the substrate processing apparatus according to claim 8, wherein it is intended to include an elastic member which.