JP3015900B2 - Manufacturing method of optical disk memory - Google Patents

Manufacturing method of optical disk memory

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Publication number
JP3015900B2
JP3015900B2 JP63209723A JP20972388A JP3015900B2 JP 3015900 B2 JP3015900 B2 JP 3015900B2 JP 63209723 A JP63209723 A JP 63209723A JP 20972388 A JP20972388 A JP 20972388A JP 3015900 B2 JP3015900 B2 JP 3015900B2
Authority
JP
Japan
Prior art keywords
carbon
film
optical disk
disk memory
manufacturing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP63209723A
Other languages
Japanese (ja)
Other versions
JPH0258744A (en
Inventor
健二 伊藤
修 青柳
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Semiconductor Energy Laboratory Co Ltd
Original Assignee
Semiconductor Energy Laboratory Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Semiconductor Energy Laboratory Co Ltd filed Critical Semiconductor Energy Laboratory Co Ltd
Priority to JP63209723A priority Critical patent/JP3015900B2/en
Publication of JPH0258744A publication Critical patent/JPH0258744A/en
Application granted granted Critical
Publication of JP3015900B2 publication Critical patent/JP3015900B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は光ディスクメモリーの構造に関するものであ
る。
The present invention relates to the structure of an optical disk memory.

〔従来の技術〕[Conventional technology]

光ディスクメモリーの製造方法で一般的に知られてい
るものとしては、ガラス基板にフォトレジストを塗布、
レーザーにより情報パターンを露光し、現像をした後ス
タンパーを作製するマスタリング工程、基板材料をスタ
ンパーで射出成形した後に上記基板上の情報パターンに
反射膜を成膜し、その後その上に樹脂(PMMA等)の保護
膜を形成し、はり合わせるレプリケーション行程に別れ
る。
As a generally known method of manufacturing an optical disk memory, a photoresist is applied to a glass substrate,
A mastering step of exposing and developing an information pattern with a laser, and then producing a stamper. After injection molding the substrate material with a stamper, a reflective film is formed on the information pattern on the substrate, and then a resin (PMMA etc.) ) A protective film is formed, and the process is separated into a bonding replication process.

〔従来技術の問題点〕[Problems of the prior art]

反射膜の上に保護膜を塗布する方法として、スピンコ
ート、吹き付け域いはロールコーターによるものがある
が、いづれも大気中で行う為、反射膜(Al)に若干では
あるが水分、酸素等の吸着があり長期的に反射膜の酸化
等の劣化がおきることが予想される。更に光ディスクメ
モリーの基板としてPMMA等が主に使われるが、吸湿性が
有り長期的に水の拡散による反射膜(Al)の劣化が心配
される。この為、酸素等の劣化がしにくいAuを使う例も
ある。しかし、Auは大変高価な為、コストを引き上げ量
産には不向きである。
As a method of applying a protective film on the reflective film, there is a method of applying a roll coater in a spin-coating or spraying area, but since both are performed in the air, a slight amount of moisture, oxygen, etc. is applied to the reflective film (Al). Therefore, it is expected that deterioration such as oxidation of the reflection film will occur in the long term. Further, although PMMA or the like is mainly used as a substrate of the optical disk memory, it has a hygroscopic property, and there is a concern that the reflection film (Al) may be deteriorated due to water diffusion for a long term. For this reason, there is an example in which Au or the like, which is unlikely to deteriorate such as oxygen, is used. However, since Au is very expensive, it raises the cost and is not suitable for mass production.

又、保護膜を塗布する際、反射膜が大変やわらかい為
取り扱い等の作業性が悪いものであった。
In addition, when the protective film is applied, the workability of handling and the like is poor because the reflective film is very soft.

〔目的〕〔Purpose〕

本発明は以上の従来の問題点を解決する事を目的とし
光ディスクメモリーの長期信頼性を向上させ寿命を延ば
すものである。
SUMMARY OF THE INVENTION An object of the present invention is to improve the long-term reliability of an optical disk memory and prolong its life for the purpose of solving the above-mentioned conventional problems.

〔問題を解決しようとする為の手段〕[Means to solve the problem]

本願発明は上記目的を達成させる為に基板、反射膜及
び保護膜を有する光ディスクメモリーにおいて、反射膜
に密接して炭素または炭素を主成分とする被膜を形成し
たものである。
According to the present invention, in order to achieve the above object, in an optical disc memory having a substrate, a reflective film and a protective film, a film containing carbon or carbon as a main component is formed in close contact with the reflective film.

本発明は基板上の情報記録パターンに反射膜をスパッ
タリング法、蒸着法等で成膜する前後に、真空中で炭素
又は炭素を主成分とする被膜を形成することにより反射
膜に吸着物が付着したり、基板からの水等の反射膜への
拡散を防ぎ長寿命化、長期信頼性を向上させる。更に反
射膜を成膜した後に炭素又は炭素を主成分とする被膜を
成膜することにより、この後の作業に大きなマージンを
与えるものである。
In the present invention, before or after a reflective film is formed on an information recording pattern on a substrate by a sputtering method, a vapor deposition method, or the like, an adsorbed substance adheres to the reflective film by forming a film containing carbon or carbon as a main component in a vacuum. And prevents diffusion of water and the like from the substrate to the reflective film, thereby prolonging the life and improving long-term reliability. Further, by forming a film containing carbon or carbon as a main component after forming the reflection film, a large margin is given to the subsequent work.

本発明において、反射膜に密接させる炭素または炭素
を主成分とする被膜は、反射膜の一方の面に形成されて
も良いし、反射膜を鋏むように形成させても良い。
In the present invention, carbon or a film containing carbon as a main component that is brought into close contact with the reflective film may be formed on one surface of the reflective film, or may be formed so as to scissor the reflective film.

以下に本発明を実施例とともに詳細に説明する。 Hereinafter, the present invention will be described in detail with examples.

〔実施例〕〔Example〕

第1図は本発明の炭素または炭素を主成分とする被膜
を形成するためのプラズマCVD装置の概要を示す。
FIG. 1 shows an outline of a plasma CVD apparatus for forming carbon or a film containing carbon as a main component of the present invention.

図面において、ドーピング系(1)において、添加物
である水素または酸素を(2)より、反応性気体である
炭化水素気体例えばメタン、エチレンを(3)より、II
I価不純物のジボラン(水素希釈)(4)、V価不純物
のアンモニアまたはフォスヒンを(5)よりバルブ
(6)、流量計(7)をへて反応系(8)にノズル
(9)より導入される。このノズルに至る前に、反応性
気体の励起用にマイクロ波エネルギを(10)で加えて予
め活性化させることは有効である。
In the drawing, in the doping system (1), hydrogen or oxygen as an additive is converted from (2) to a hydrocarbon gas as a reactive gas such as methane or ethylene from (3).
Diborane (diluted with hydrogen) (4) as an I-valent impurity and ammonia or phosphorous as a V-valent impurity are introduced into a reaction system (8) from a nozzle (9) through a valve (6) and a flowmeter (7) from (5). Is done. Before reaching the nozzle, it is effective to apply microwave energy (10) to excite the reactive gas to activate it in advance.

反応系(8)には第1の電極(11)、第2の電極(1
2)を設けた。一対の電極(11)、(12)間には高周波
電源(13)、マッチングトランス(14)、直流バイヤス
電源(15)より電気エネルギが加えられ、プラズマが発
生する。排気系(16)は圧力調整バルブ(17)、ターボ
分子ポンプ(18)、ロータリーポンプ(19)をへて不用
気体を排気する。
The reaction system (8) includes a first electrode (11) and a second electrode (1
2) was provided. Electric energy is applied between the pair of electrodes (11) and (12) from a high-frequency power supply (13), a matching transformer (14), and a DC bias power supply (15) to generate plasma. An exhaust system (16) exhausts unnecessary gas through a pressure regulating valve (17), a turbo molecular pump (18), and a rotary pump (19).

反応性気体には、反応空間(20)における圧力が0.00
1〜10torr代表的には0.01〜0.5torrの下で高周波もしく
は直流によるエネルギにより0.1〜5KWのエネルギが加え
られる。
The reactive gas has a pressure in the reaction space (20) of 0.00
An energy of 0.1 to 5 kW is applied by high frequency or direct current energy under 1 to 10 torr, typically 0.01 to 0.5 torr.

特に励起源が1GHz以上、例えば2.45GHzの周波数にあ
っては、C−H結合より水素を分離し、さらに周波数源
が0.1〜50MHz例えば13.56MHzの周波数にあってはC−C
結合、C=C結合を分解して、−C−C−結合を作り、
炭素の不対結合手同志を互いに衝突させて共有結合さ
せ、安定なダイヤモンド構造を局部的に有した構造とさ
せ得る。
In particular, when the excitation source is at a frequency of 1 GHz or more, for example, at a frequency of 2.45 GHz, hydrogen is separated from the CH bond, and when the frequency source is at a frequency of 0.1 to 50 MHz, for example, at 13.56 MHz, CC is used.
Bond, decompose the C = C bond to form a -CC- bond,
Unpaired carbon atoms can collide with each other to form a covalent bond to form a structure locally having a stable diamond structure.

直流バイアスは−200〜600V(実質的には−400〜+40
0V)を加える。なぜなら、直流バイアスが零のときは自
己バイアスが−200V(第2の電極を接地レベルとして)
を有しているためである。
DC bias is -200 to 600V (effectively -400 to +40
0V). Because, when the DC bias is zero, the self-bias is -200V (the second electrode is grounded)
It is because it has.

第1の電極は冷却手段を有しており、波形成面上の温
度を250〜−100℃に保持させた。
The first electrode had a cooling means, and the temperature on the wave forming surface was kept at 250 to -100C.

第2図に実施例で作製した光ディスクメモリーの単板
を示した。
FIG. 2 shows a single plate of the optical disk memory manufactured in the embodiment.

先ず、公知の方法によりマスタリング行程を経て作ら
れたスタンパーにより射出成形された基板(21)(PMM
A)に炭素又は炭素を主成分とする被膜を第1図に示し
た平行平板方式のプラズマCVDにより次の条件で約300Å
成膜した。(22) 使用ガス;CH4100SCCM+H250SCCM 反応圧力;10PaRF電極120W この条件により次の様な炭素又は炭素を主成分とした
被膜が得られた。
First, a substrate (21) (PMM) injection-molded by a stamper made through a mastering process by a known method.
A) Carbon or a coating containing carbon as a main component is formed by a parallel plate type plasma CVD shown in FIG.
A film was formed. (22) using a gas; CH 4 100SCCM + H 2 50SCCM reaction pressure; 10P a RF electrode 120W film mainly containing following such carbon or a carbon This condition is obtained.

ビッカーズ輝度;2000kg/mm以上 透過率;90%(550mm) 汲水率;0% 密度; >2.25g/cm3 この後、スパッタリング法によりAlの反射膜(23)を
約2000Å成膜を行い更に炭素または炭素を主成分とした
被膜(24)を前回と同じ条件で約500Å成膜した。樹脂
系の溶剤型塗料を吹きつけベーキング硬化することによ
り保護膜(25)とした。このようにして光ディスクメモ
リーの単板を作製した。この様にできた物を保護膜(2
5)同志を接着剤により張り合わせて光ディスクメモリ
ーとした。又、(22)、(23)、(24)の各膜はマルチ
チャンバー方式の装置により成膜されており、この間大
気にさらされる事はない。
Vickers luminance: 2000 kg / mm or more Transmittance: 90% (550 mm) Pumping rate: 0% Density:> 2.25 g / cm 3 After that, a reflective film (23) of Al was formed by sputtering to about 2,000 Å, and further subjected to sputtering. A film (24) containing carbon or carbon as a main component was formed to a thickness of about 500 mm under the same conditions as the previous time. A protective film (25) was obtained by spraying a resin-based solvent-type paint and performing baking and curing. Thus, a single plate of the optical disk memory was manufactured. The protective film (2
5) The competitors were bonded together with an adhesive to form an optical disk memory. Further, each of the films (22), (23) and (24) is formed by a multi-chamber type apparatus, and is not exposed to the air during this time.

以上のように作られた光ディスクメモリーを80℃、RH
95%の恒温恒湿層に入れ加速試験をした結果を第3図に
示す。炭素又は炭素を主成分とする被膜が入る事により
長期信頼性が向上する結果が得られた。図中、曲線(2
6)は炭素または炭素を主成分とする被膜を保護膜とし
た光ディスクメモリーについて加速試験をした結果を示
すものであり、曲線(27)は現状の光ディスクメモリー
について加速試験をした結果を示すものである。
The optical disk memory made as above is stored at 80 ° C and RH
Fig. 3 shows the results of an accelerated test in a 95% constant temperature / humidity layer. The result that the long-term reliability was improved by the inclusion of carbon or a coating containing carbon as a main component was obtained. In the figure, the curve (2
6) shows the results of an acceleration test performed on an optical disk memory using carbon or a film containing carbon as a main component as a protective film, and curve (27) shows the results of an acceleration test performed on the current optical disk memory. is there.

また第2図における(22)の炭素または炭素を主成分
とする被膜をなくしても良好な結果が得られた。
In addition, good results were obtained even if the carbon or the coating containing carbon as the main component in (22) in FIG. 2 was omitted.

更に、樹脂系の溶剤型塗料による保護膜がない状態で
ピンセットで引っかく等の外力を与えても炭素又は炭素
を主成分とする被膜の硬度が高く平面平滑性が高い為、
反射膜に傷がつかなかった。
Furthermore, even if an external force such as scratching is applied with tweezers without a protective film made of a resin-based solvent-type paint, the hardness of the film containing carbon or carbon as a main component is high and the surface smoothness is high,
The reflective film was not damaged.

〔効果〕〔effect〕

本発明では、以上の様に光ディスクメモリーの反射膜
に炭素又は炭素を主成分とする被膜を形成したことによ
り保護膜形成時に大気中の水分や酸素等の反射膜への吸
着を防ぐことができ、それと共に反射膜への保護膜から
の水の拡散による反射膜の劣化を防ぐことができ、光デ
ィスクメモリーの長期信頼性を安価で大きく高め、作業
性を大きく向上させることができた。
In the present invention, it is possible to prevent adsorption of moisture or oxygen in the air to the reflective film during the formation of the protective film by forming a film containing carbon or carbon as a main component on the reflective film of the optical disk memory as described above. In addition, the deterioration of the reflection film due to the diffusion of water from the protection film to the reflection film can be prevented, and the long-term reliability of the optical disk memory can be greatly increased at low cost, and the workability can be greatly improved.

【図面の簡単な説明】[Brief description of the drawings]

第1図は本発明の炭素または炭素を主成分とする被膜形
成に使用する装置の概略を示す。 第2図は光ディスクメモリーの単板(張り合わせ前)の
断面図を表す。 第3図は反射膜の初期反射率を1とした時の反射率の経
時変化を示した図である。 (21)基板 (22)炭素又は炭素を主成分とする被膜 (23)反射膜(Al) (24)炭素又は炭素を主成分とする被膜 (25)樹脂系保護膜 (26)炭素または炭素を主成分とする被膜を保護膜とし
た光ディスクメモリー (27)現状の光ディスクメモリー
FIG. 1 shows an outline of an apparatus used for forming a film containing carbon or carbon as a main component of the present invention. FIG. 2 is a sectional view of a single plate (before bonding) of the optical disk memory. FIG. 3 is a diagram showing a change with time of the reflectance when the initial reflectance of the reflection film is set to 1. (21) Substrate (22) Carbon or carbon-based coating (23) Reflective film (Al) (24) Carbon or carbon-based coating (25) Resin-based protective film (26) Carbon or carbon Optical disk memory with a protective film consisting mainly of a coating (27) Current optical disk memory

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】基板上に炭素または炭素を主成分とする第
1の被膜を形成する第1の工程と、 前記第1の被膜に接して反射膜を形成する第2の工程
と、 前記反射膜に接して炭素または炭素を主成分とする第2
の被膜を形成する第3の工程と、 前記第2の被膜上に保護膜を形成する第4の工程と を有する光ディスクメモリーの作製方法であって、 前記第1の工程から第3の工程までを大気に曝さずに行
うことを特徴とする光ディスクメモリーの作製方法。
A first step of forming a first coating mainly composed of carbon or carbon on a substrate; a second step of forming a reflection film in contact with the first coating; A second carbon or carbon-based component in contact with the membrane
And a fourth step of forming a protective film on the second film. A method of manufacturing an optical disc memory, comprising: a first step to a third step; A method for manufacturing an optical disk memory, wherein the method is performed without exposing the optical disk to the atmosphere.
JP63209723A 1988-08-23 1988-08-23 Manufacturing method of optical disk memory Expired - Lifetime JP3015900B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP63209723A JP3015900B2 (en) 1988-08-23 1988-08-23 Manufacturing method of optical disk memory

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63209723A JP3015900B2 (en) 1988-08-23 1988-08-23 Manufacturing method of optical disk memory

Publications (2)

Publication Number Publication Date
JPH0258744A JPH0258744A (en) 1990-02-27
JP3015900B2 true JP3015900B2 (en) 2000-03-06

Family

ID=16577582

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63209723A Expired - Lifetime JP3015900B2 (en) 1988-08-23 1988-08-23 Manufacturing method of optical disk memory

Country Status (1)

Country Link
JP (1) JP3015900B2 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6835523B1 (en) * 1993-05-09 2004-12-28 Semiconductor Energy Laboratory Co., Ltd. Apparatus for fabricating coating and method of fabricating the coating
US5932302A (en) 1993-07-20 1999-08-03 Semiconductor Energy Laboratory Co., Ltd. Method for fabricating with ultrasonic vibration a carbon coating

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61217943A (en) * 1985-03-22 1986-09-27 Matsushita Electric Ind Co Ltd Optical disk
JPS62202629U (en) * 1986-06-11 1987-12-24

Also Published As

Publication number Publication date
JPH0258744A (en) 1990-02-27

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