JP3006224B2 - Resin composition - Google Patents
Resin compositionInfo
- Publication number
- JP3006224B2 JP3006224B2 JP3-272517A JP27251791A JP3006224B2 JP 3006224 B2 JP3006224 B2 JP 3006224B2 JP 27251791 A JP27251791 A JP 27251791A JP 3006224 B2 JP3006224 B2 JP 3006224B2
- Authority
- JP
- Japan
- Prior art keywords
- weight
- copolymer
- ethylene oxide
- glycidyl
- acrylonitrile
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000011342 resin composition Substances 0.000 title claims description 13
- 229920001577 copolymer Polymers 0.000 claims description 43
- 229920000578 graft polymer Polymers 0.000 claims description 30
- -1 acrylonitrile compound Chemical class 0.000 claims description 29
- 239000000178 monomer Substances 0.000 claims description 20
- IAYPIBMASNFSPL-UHFFFAOYSA-N oxane Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 claims description 12
- 238000001746 injection moulding Methods 0.000 claims description 11
- 229920000122 Acrylonitrile butadiene styrene Polymers 0.000 description 31
- 239000000203 mixture Substances 0.000 description 20
- PPBRXRYQALVLMV-UHFFFAOYSA-N styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 20
- 229920001971 elastomer Polymers 0.000 description 14
- 239000005060 rubber Substances 0.000 description 14
- NLHHRLWOUZZQLW-UHFFFAOYSA-N acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 11
- 238000002156 mixing Methods 0.000 description 10
- 229920000642 polymer Polymers 0.000 description 9
- 239000000463 material Substances 0.000 description 8
- 125000003118 aryl group Chemical group 0.000 description 7
- 150000001875 compounds Chemical class 0.000 description 7
- VLKZOEOYAKHREP-UHFFFAOYSA-N hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 6
- 238000000465 moulding Methods 0.000 description 6
- 229920005989 resin Polymers 0.000 description 6
- 239000011347 resin Substances 0.000 description 6
- IJGRMHOSHXDMSA-UHFFFAOYSA-N nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 5
- 239000000654 additive Substances 0.000 description 4
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 4
- 125000005843 halogen group Chemical group 0.000 description 4
- 238000002347 injection Methods 0.000 description 4
- 239000007924 injection Substances 0.000 description 4
- 239000000314 lubricant Substances 0.000 description 4
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 4
- QYYCPWLLBSSFBW-UHFFFAOYSA-N 2-(naphthalen-1-yloxymethyl)oxirane Chemical compound C=1C=CC2=CC=CC=C2C=1OCC1CO1 QYYCPWLLBSSFBW-UHFFFAOYSA-N 0.000 description 3
- GYCMBHHDWRMZGG-UHFFFAOYSA-N 2-cyanopropene-1 Chemical compound CC(=C)C#N GYCMBHHDWRMZGG-UHFFFAOYSA-N 0.000 description 3
- MVPPADPHJFYWMZ-UHFFFAOYSA-N Chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 3
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N Phthalocyanine Chemical compound N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 3
- 150000001491 aromatic compounds Chemical class 0.000 description 3
- 125000006615 aromatic heterocyclic group Chemical group 0.000 description 3
- KAKZBPTYRLMSJV-UHFFFAOYSA-N butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 150000002118 epoxides Chemical class 0.000 description 3
- 239000008079 hexane Substances 0.000 description 3
- 229920001519 homopolymer Polymers 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 239000000049 pigment Substances 0.000 description 3
- 239000002685 polymerization catalyst Substances 0.000 description 3
- 229920002554 vinyl polymer Polymers 0.000 description 3
- MYRTYDVEIRVNKP-UHFFFAOYSA-N 1,2-bis(ethenyl)benzene Chemical compound C=CC1=CC=CC=C1C=C MYRTYDVEIRVNKP-UHFFFAOYSA-N 0.000 description 2
- VVQNEPGJFQJSBK-UHFFFAOYSA-N 2-methyl-2-propenoic acid methyl ester Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 2
- 239000004709 Chlorinated polyethylene Substances 0.000 description 2
- FQYUMYWMJTYZTK-UHFFFAOYSA-N Phenyl glycidyl ether Chemical class C1OC1COC1=CC=CC=C1 FQYUMYWMJTYZTK-UHFFFAOYSA-N 0.000 description 2
- 150000008360 acrylonitriles Chemical class 0.000 description 2
- 125000005250 alkyl acrylate group Chemical group 0.000 description 2
- 125000000217 alkyl group Chemical group 0.000 description 2
- 125000002947 alkylene group Chemical group 0.000 description 2
- 239000003963 antioxidant agent Substances 0.000 description 2
- UHOVQNZJYSORNB-UHFFFAOYSA-N benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 239000003431 cross linking reagent Substances 0.000 description 2
- 150000001993 dienes Chemical class 0.000 description 2
- 238000010556 emulsion polymerization method Methods 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- 150000002170 ethers Chemical class 0.000 description 2
- 238000010559 graft polymerization reaction Methods 0.000 description 2
- 239000002932 luster Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- 230000000704 physical effect Effects 0.000 description 2
- 229920002285 poly(styrene-co-acrylonitrile) Polymers 0.000 description 2
- 238000006116 polymerization reaction Methods 0.000 description 2
- 229920005604 random copolymer Polymers 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 239000003381 stabilizer Substances 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- AWMVMTVKBNGEAK-UHFFFAOYSA-N styrene oxide Chemical class C1OC1C1=CC=CC=C1 AWMVMTVKBNGEAK-UHFFFAOYSA-N 0.000 description 2
- 150000003440 styrenes Chemical class 0.000 description 2
- 125000001424 substituent group Chemical group 0.000 description 2
- YXFVVABEGXRONW-UHFFFAOYSA-N toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- XYLMUPLGERFSHI-UHFFFAOYSA-N α-Methylstyrene Chemical compound CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 description 2
- RBACIKXCRWGCBB-UHFFFAOYSA-N 1,2-Epoxybutane Chemical compound CCC1CO1 RBACIKXCRWGCBB-UHFFFAOYSA-N 0.000 description 1
- ALTXUIJFJAHUPS-UHFFFAOYSA-N 1,2-epoxy-1,2-dihydrophenanthrene Chemical compound C1=CC=C2C(C=CC3OC43)=C4C=CC2=C1 ALTXUIJFJAHUPS-UHFFFAOYSA-N 0.000 description 1
- OOLJRMACHAVJOO-UHFFFAOYSA-N 1a-ethenyl-7bH-naphtho[1,2-b]oxirene Chemical compound C12=CC=CC=C2C=CC2(C=C)C1O2 OOLJRMACHAVJOO-UHFFFAOYSA-N 0.000 description 1
- CYLVUSZHVURAOY-UHFFFAOYSA-N 2,2-dibromoethenylbenzene Chemical compound BrC(Br)=CC1=CC=CC=C1 CYLVUSZHVURAOY-UHFFFAOYSA-N 0.000 description 1
- ZBBLRPRYYSJUCZ-UHFFFAOYSA-L 2,2-dibutyl-1,3,2-dioxastannepine-4,7-dione Chemical compound CCCC[Sn]1(CCCC)OC(=O)C=CC(=O)O1 ZBBLRPRYYSJUCZ-UHFFFAOYSA-L 0.000 description 1
- OABUMCRYAMBARC-UHFFFAOYSA-N 2-(2,6-dichlorophenyl)oxirane Chemical compound ClC1=CC=CC(Cl)=C1C1OC1 OABUMCRYAMBARC-UHFFFAOYSA-N 0.000 description 1
- SLHJJBZBHQIKBB-UHFFFAOYSA-N 2-(2-chloroethoxymethyl)oxirane Chemical compound ClCCOCC1CO1 SLHJJBZBHQIKBB-UHFFFAOYSA-N 0.000 description 1
- RTPJBMWUVSTBPC-UHFFFAOYSA-N 2-(2-chlorophenyl)oxirane Chemical compound ClC1=CC=CC=C1C1OC1 RTPJBMWUVSTBPC-UHFFFAOYSA-N 0.000 description 1
- XMNIXWIUMCBBBL-UHFFFAOYSA-N 2-(2-phenylpropan-2-ylperoxy)propan-2-ylbenzene Chemical compound C=1C=CC=CC=1C(C)(C)OOC(C)(C)C1=CC=CC=C1 XMNIXWIUMCBBBL-UHFFFAOYSA-N 0.000 description 1
- HIXDQWDOVZUNNA-UHFFFAOYSA-N 2-(3,4-dimethoxyphenyl)-5-hydroxy-7-methoxychromen-4-one Chemical compound C=1C(OC)=CC(O)=C(C(C=2)=O)C=1OC=2C1=CC=C(OC)C(OC)=C1 HIXDQWDOVZUNNA-UHFFFAOYSA-N 0.000 description 1
- NNINSLOEPXEZOZ-UHFFFAOYSA-N 2-(4-bromophenyl)oxirane Chemical compound C1=CC(Br)=CC=C1C1OC1 NNINSLOEPXEZOZ-UHFFFAOYSA-N 0.000 description 1
- IBWLXNDOMYKTAD-UHFFFAOYSA-N 2-(4-chlorophenyl)oxirane Chemical compound C1=CC(Cl)=CC=C1C1OC1 IBWLXNDOMYKTAD-UHFFFAOYSA-N 0.000 description 1
- YSUQLAYJZDEMOT-UHFFFAOYSA-N 2-(butoxymethyl)oxirane Chemical compound CCCCOCC1CO1 YSUQLAYJZDEMOT-UHFFFAOYSA-N 0.000 description 1
- HQCSZRIVJVOYSU-UHFFFAOYSA-N 2-(ethoxymethyl)oxirane Chemical compound CCOCC1CO1 HQCSZRIVJVOYSU-UHFFFAOYSA-N 0.000 description 1
- BKYSFVJCBRHGMA-UHFFFAOYSA-N 2-(naphthalen-2-yloxymethyl)oxirane Chemical compound C=1C=C2C=CC=CC2=CC=1OCC1CO1 BKYSFVJCBRHGMA-UHFFFAOYSA-N 0.000 description 1
- QDVMLVVBSRDWNK-UHFFFAOYSA-N 2-(oxiran-2-ylmethyl)-1H-indole Chemical compound C=1C2=CC=CC=C2NC=1CC1CO1 QDVMLVVBSRDWNK-UHFFFAOYSA-N 0.000 description 1
- MYBWNWNBXBBZKW-UHFFFAOYSA-N 2-(phenylsulfanylmethyl)oxirane Chemical group C1OC1CSC1=CC=CC=C1 MYBWNWNBXBBZKW-UHFFFAOYSA-N 0.000 description 1
- LSWYGACWGAICNM-UHFFFAOYSA-N 2-(prop-2-enoxymethyl)oxirane Chemical compound C=CCOCC1CO1 LSWYGACWGAICNM-UHFFFAOYSA-N 0.000 description 1
- MEZPWBYCBRLHIC-UHFFFAOYSA-N 2-[(1-bromonaphthalen-2-yl)oxymethyl]oxirane Chemical compound C1=CC2=CC=CC=C2C(Br)=C1OCC1CO1 MEZPWBYCBRLHIC-UHFFFAOYSA-N 0.000 description 1
- HDJGFOFLBOOAML-UHFFFAOYSA-N 2-[(2,4,6-trichlorophenoxy)methyl]oxirane Chemical compound ClC1=CC(Cl)=CC(Cl)=C1OCC1OC1 HDJGFOFLBOOAML-UHFFFAOYSA-N 0.000 description 1
- NFWLWLQSZIJYFR-UHFFFAOYSA-N 2-[(2,4-dibromophenoxy)methyl]oxirane Chemical compound BrC1=CC(Br)=CC=C1OCC1OC1 NFWLWLQSZIJYFR-UHFFFAOYSA-N 0.000 description 1
- YSPFJENXLLHFCH-UHFFFAOYSA-N 2-[(2,4-dichloronaphthalen-1-yl)oxymethyl]oxirane Chemical compound ClC1=CC(Cl)=C2C=CC=CC2=C1OCC1CO1 YSPFJENXLLHFCH-UHFFFAOYSA-N 0.000 description 1
- AFJIABXHZXGHAY-UHFFFAOYSA-N 2-[(2-bromo-1H-naphthalen-2-yl)oxymethyl]oxirane Chemical compound C1C2=CC=CC=C2C=CC1(Br)OCC1CO1 AFJIABXHZXGHAY-UHFFFAOYSA-N 0.000 description 1
- NTAZNKBNQLZJAP-UHFFFAOYSA-N 2-[(2-chlorophenyl)sulfanylmethyl]oxirane Chemical compound ClC1=CC=CC=C1SCC1OC1 NTAZNKBNQLZJAP-UHFFFAOYSA-N 0.000 description 1
- DNVXWIINBUTFEP-UHFFFAOYSA-N 2-[(2-phenylphenoxy)methyl]oxirane Chemical group C1OC1COC1=CC=CC=C1C1=CC=CC=C1 DNVXWIINBUTFEP-UHFFFAOYSA-N 0.000 description 1
- DBKAISGEIQPDSR-UHFFFAOYSA-N 2-[(4-benzylphenoxy)methyl]oxirane Chemical group C1OC1COC(C=C1)=CC=C1CC1=CC=CC=C1 DBKAISGEIQPDSR-UHFFFAOYSA-N 0.000 description 1
- ROMPTBQYHBEQFU-UHFFFAOYSA-N 2-[(4-chloronaphthalen-1-yl)oxymethyl]oxirane Chemical compound C12=CC=CC=C2C(Cl)=CC=C1OCC1CO1 ROMPTBQYHBEQFU-UHFFFAOYSA-N 0.000 description 1
- HWHFDMXXUUGIMA-UHFFFAOYSA-N 2-[(4-chlorophenyl)-[(4-chlorophenyl)-(oxiran-2-yl)methoxy]methyl]oxirane Chemical compound C1=CC(Cl)=CC=C1C(C1OC1)OC(C=1C=CC(Cl)=CC=1)C1OC1 HWHFDMXXUUGIMA-UHFFFAOYSA-N 0.000 description 1
- GOLBZWJZSUDMKP-UHFFFAOYSA-N 2-[(4-chlorophenyl)sulfanylmethyl]oxirane Chemical compound C1=CC(Cl)=CC=C1SCC1OC1 GOLBZWJZSUDMKP-UHFFFAOYSA-N 0.000 description 1
- GXANCFOKAWEPIS-UHFFFAOYSA-N 2-[(4-phenylphenoxy)methyl]oxirane Chemical group C1OC1COC(C=C1)=CC=C1C1=CC=CC=C1 GXANCFOKAWEPIS-UHFFFAOYSA-N 0.000 description 1
- MHTUIBIYJWEQKA-UHFFFAOYSA-N 2-[[4-(2-phenylpropan-2-yl)phenoxy]methyl]oxirane Chemical compound C=1C=C(OCC2OC2)C=CC=1C(C)(C)C1=CC=CC=C1 MHTUIBIYJWEQKA-UHFFFAOYSA-N 0.000 description 1
- WROUWQQRXUBECT-UHFFFAOYSA-N 2-ethylacrylic acid Chemical compound CCC(=C)C(O)=O WROUWQQRXUBECT-UHFFFAOYSA-N 0.000 description 1
- MRXPNWXSFCODDY-UHFFFAOYSA-N 2-methyl-2-phenyloxirane Chemical compound C=1C=CC=CC=1C1(C)CO1 MRXPNWXSFCODDY-UHFFFAOYSA-N 0.000 description 1
- HXIQYSLFEXIOAV-UHFFFAOYSA-N 2-tert-butyl-4-(5-tert-butyl-4-hydroxy-2-methylphenyl)sulfanyl-5-methylphenol Chemical compound CC1=CC(O)=C(C(C)(C)C)C=C1SC1=CC(C(C)(C)C)=C(O)C=C1C HXIQYSLFEXIOAV-UHFFFAOYSA-N 0.000 description 1
- CTWQPSSVUYPWOM-UHFFFAOYSA-N 4-(oxiran-2-ylmethoxy)-1H-indole Chemical compound C=1C=CC=2NC=CC=2C=1OCC1CO1 CTWQPSSVUYPWOM-UHFFFAOYSA-N 0.000 description 1
- SLJFKNONPLNAPF-UHFFFAOYSA-N 4-ethenyl-7-oxabicyclo[4.1.0]heptane Chemical compound C1C(C=C)CCC2OC21 SLJFKNONPLNAPF-UHFFFAOYSA-N 0.000 description 1
- YRKCREAYFQTBPV-UHFFFAOYSA-N Acetylacetone Chemical compound CC(=O)CC(C)=O YRKCREAYFQTBPV-UHFFFAOYSA-N 0.000 description 1
- 229920000800 Acrylic rubber Polymers 0.000 description 1
- UCWPYXBIEDJHTR-UHFFFAOYSA-N C(C1CO1)OC1=C(CC(C=C1)(C)Br)Br Chemical compound C(C1CO1)OC1=C(CC(C=C1)(C)Br)Br UCWPYXBIEDJHTR-UHFFFAOYSA-N 0.000 description 1
- MCXJNPSSNVLIFK-UHFFFAOYSA-N C=C.CCCCCCCCCCCCCCCCCC[N-]CCCCCCCCCCCCCCCCCC Chemical compound C=C.CCCCCCCCCCCCCCCCCC[N-]CCCCCCCCCCCCCCCCCC MCXJNPSSNVLIFK-UHFFFAOYSA-N 0.000 description 1
- ZWAJLVLEBYIOTI-UHFFFAOYSA-N Cyclohexene oxide Chemical compound C1CCCC2OC21 ZWAJLVLEBYIOTI-UHFFFAOYSA-N 0.000 description 1
- 229940052296 Esters of benzoic acid for local anesthesia Drugs 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- VOZRXNHHFUQHIL-UHFFFAOYSA-N Glycidyl methacrylate Chemical compound CC(=C)C(=O)OCC1CO1 VOZRXNHHFUQHIL-UHFFFAOYSA-N 0.000 description 1
- 230000036499 Half live Effects 0.000 description 1
- 239000004609 Impact Modifier Substances 0.000 description 1
- PZUGJLOCXUNFLM-UHFFFAOYSA-N N-ethenylaniline Chemical class C=CNC1=CC=CC=C1 PZUGJLOCXUNFLM-UHFFFAOYSA-N 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000005062 Polybutadiene Substances 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- STCOOQWBFONSKY-UHFFFAOYSA-N Tributyl phosphate Chemical compound CCCCOP(=O)(OCCCC)OCCCC STCOOQWBFONSKY-UHFFFAOYSA-N 0.000 description 1
- SBYMUDUGTIKLCR-VOTSOKGWSA-N [(E)-2-chloroethenyl]benzene Chemical compound Cl\C=C\C1=CC=CC=C1 SBYMUDUGTIKLCR-VOTSOKGWSA-N 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- HGINCPLSRVDWNT-UHFFFAOYSA-N acrylaldehyde Chemical compound C=CC=O HGINCPLSRVDWNT-UHFFFAOYSA-N 0.000 description 1
- 230000000996 additive Effects 0.000 description 1
- 150000008055 alkyl aryl sulfonates Chemical class 0.000 description 1
- 229920005603 alternating copolymer Polymers 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 230000000111 anti-oxidant Effects 0.000 description 1
- 230000003078 antioxidant Effects 0.000 description 1
- 239000002216 antistatic agent Substances 0.000 description 1
- 125000003710 aryl alkyl group Chemical group 0.000 description 1
- 125000005418 aryl aryl group Chemical group 0.000 description 1
- 229920001400 block copolymer Polymers 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- IJDNQMDRQITEOD-UHFFFAOYSA-N butane Chemical compound CCCC IJDNQMDRQITEOD-UHFFFAOYSA-N 0.000 description 1
- 239000001273 butane Substances 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000007334 copolymerization reaction Methods 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- JGFBRKRYDCGYKD-UHFFFAOYSA-N dibutyl(oxo)tin Chemical compound CCCC[Sn](=O)CCCC JGFBRKRYDCGYKD-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- GKIPXFAANLTWBM-UHFFFAOYSA-N epibromohydrin Chemical compound BrCC1CO1 GKIPXFAANLTWBM-UHFFFAOYSA-N 0.000 description 1
- BRLQWZUYTZBJKN-UHFFFAOYSA-N epichlorohydrin Chemical compound ClCC1CO1 BRLQWZUYTZBJKN-UHFFFAOYSA-N 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- BHBPJIPGXGQMTE-UHFFFAOYSA-N ethane-1,2-diol;2-methylprop-2-enoic acid Chemical compound OCCO.CC(=C)C(O)=O.CC(=C)C(O)=O BHBPJIPGXGQMTE-UHFFFAOYSA-N 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 1
- STVZJERGLQHEKB-UHFFFAOYSA-N ethylene glycol dimethacrylate Substances CC(=C)C(=O)OCCOC(=O)C(C)=C STVZJERGLQHEKB-UHFFFAOYSA-N 0.000 description 1
- 238000001125 extrusion Methods 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 150000002334 glycols Chemical class 0.000 description 1
- 125000000623 heterocyclic group Chemical group 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 238000004898 kneading Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000003801 milling Methods 0.000 description 1
- IMNFDUFMRHMDMM-UHFFFAOYSA-N n-heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- ZILGYSPZZLPUSM-UHFFFAOYSA-N oxiran-2-ylmethyl 2,4-dichlorobenzoate Chemical compound ClC1=CC(Cl)=CC=C1C(=O)OCC1OC1 ZILGYSPZZLPUSM-UHFFFAOYSA-N 0.000 description 1
- GMPFAEJESJAWMR-UHFFFAOYSA-N oxiran-2-ylmethyl 2,5-dichlorobenzoate Chemical compound ClC1=CC=C(Cl)C(C(=O)OCC2OC2)=C1 GMPFAEJESJAWMR-UHFFFAOYSA-N 0.000 description 1
- CRAVHLBMADRFSG-UHFFFAOYSA-N oxiran-2-ylmethyl 2-bromobenzoate Chemical compound BrC1=CC=CC=C1C(=O)OCC1OC1 CRAVHLBMADRFSG-UHFFFAOYSA-N 0.000 description 1
- KDAAUMCUYWXTBC-UHFFFAOYSA-N oxiran-2-ylmethyl 2-chlorobenzoate Chemical compound ClC1=CC=CC=C1C(=O)OCC1OC1 KDAAUMCUYWXTBC-UHFFFAOYSA-N 0.000 description 1
- XNKCZLOAZIAGSG-UHFFFAOYSA-N oxiran-2-ylmethyl 3-chlorobenzoate Chemical compound ClC1=CC=CC(C(=O)OCC2OC2)=C1 XNKCZLOAZIAGSG-UHFFFAOYSA-N 0.000 description 1
- JKXONPYJVWEAEL-UHFFFAOYSA-N oxiran-2-ylmethyl acetate Chemical compound CC(=O)OCC1CO1 JKXONPYJVWEAEL-UHFFFAOYSA-N 0.000 description 1
- XRQKARZTFMEBBY-UHFFFAOYSA-N oxiran-2-ylmethyl benzoate Chemical class C=1C=CC=CC=1C(=O)OCC1CO1 XRQKARZTFMEBBY-UHFFFAOYSA-N 0.000 description 1
- YEARBAZDKOUUAM-UHFFFAOYSA-N oxiran-2-ylmethyl naphthalene-1-carboxylate Chemical compound C=1C=CC2=CC=CC=C2C=1C(=O)OCC1CO1 YEARBAZDKOUUAM-UHFFFAOYSA-N 0.000 description 1
- ISKBXKAIAHCBHL-UHFFFAOYSA-N oxiran-2-ylmethyl naphthalene-2-carboxylate Chemical compound C=1C=C2C=CC=CC2=CC=1C(=O)OCC1CO1 ISKBXKAIAHCBHL-UHFFFAOYSA-N 0.000 description 1
- QNAJAJLBHMMOJB-UHFFFAOYSA-N oxiran-2-ylmethyl propanoate Chemical compound CCC(=O)OCC1CO1 QNAJAJLBHMMOJB-UHFFFAOYSA-N 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- MYMOFIZGZYHOMD-UHFFFAOYSA-N oxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
- 239000008188 pellet Substances 0.000 description 1
- 238000005453 pelletization Methods 0.000 description 1
- OFBQJSOFQDEBGM-UHFFFAOYSA-N pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 1
- 235000021317 phosphate Nutrition 0.000 description 1
- 229920000233 poly(alkylene oxides) Polymers 0.000 description 1
- 229920000058 polyacrylate Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 239000011528 polyamide (building material) Substances 0.000 description 1
- 229920002857 polybutadiene Polymers 0.000 description 1
- 229920001707 polybutylene terephthalate Polymers 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 229920002959 polymer blend Polymers 0.000 description 1
- 229920001955 polyphenylene ether Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- ZUZSFMQBICMDEZ-UHFFFAOYSA-N prop-1-enylbenzene;styrene Chemical compound C=CC1=CC=CC=C1.CC=CC1=CC=CC=C1 ZUZSFMQBICMDEZ-UHFFFAOYSA-N 0.000 description 1
- VNNBZUFJRRODHO-UHFFFAOYSA-N prop-2-enenitrile;prop-1-en-2-ylbenzene Chemical compound C=CC#N.CC(=C)C1=CC=CC=C1 VNNBZUFJRRODHO-UHFFFAOYSA-N 0.000 description 1
- HJWLCRVIBGQPNF-UHFFFAOYSA-N prop-2-enylbenzene Chemical compound C=CCC1=CC=CC=C1 HJWLCRVIBGQPNF-UHFFFAOYSA-N 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- GOOHAUXETOMSMM-UHFFFAOYSA-N propylene oxide Chemical compound CC1CO1 GOOHAUXETOMSMM-UHFFFAOYSA-N 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- 238000007151 ring opening polymerisation reaction Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 150000003460 sulfonic acids Chemical class 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N tin hydride Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- BZHJMEDXRYGGRV-UHFFFAOYSA-N vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 1
- IPCXNCATNBAPKW-UHFFFAOYSA-N zinc;hydrate Chemical compound O.[Zn] IPCXNCATNBAPKW-UHFFFAOYSA-N 0.000 description 1
Description
【0001】[0001]
【産業上の利用分野】本発明は、優れた永久制電性を有
し、且つ改良された成型物表面外観を有する射出成型用
制電性樹脂組成物に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an antistatic resin composition for injection molding having excellent permanent antistatic properties and an improved surface appearance of a molded product.
【0002】[0002]
【従来の技術】ABSグラフト共重合体は優れた機械的
特性を有するので広範な分野で使用されているが、帯電
防止性に欠けるため静電気による障害を防止したいOA
機器や各種防塵分野への応用は制限されている。ABS
グラフト共重合体に帯電防止性を付与する方法として、
界面活性剤等を樹脂表面に塗布するか或いは樹脂中に練
り込む等の方法があるが、その帯電防止効果の耐久性に
難点がある。就中水洗する様な場合に耐久性は悪くな
る。2. Description of the Related Art ABS graft copolymers have been used in a wide range of fields because of their excellent mechanical properties.
Application to equipment and various dustproof fields is limited. ABS
As a method of imparting antistatic properties to the graft copolymer,
Although there are methods such as applying a surfactant or the like to the surface of the resin or kneading it into the resin, there is a problem in the durability of the antistatic effect. The durability deteriorates especially when washing with water.
【0003】この点を改良することを目的としてエピハ
ロヒドリン共重合体を混合する方法(特開昭61−18
5557号,特開昭62−25164号,特開昭62−
273247号)や他のエチレンオキシド共重合体を混
合する方法(特開昭64−26674号公報)、更には
第3成分としてアクリレートポリマーを添加する方法
(特開昭64−1748号公報),特定の変性ビニル重
合体を添加する方法(特開平2−269147号公報)
が提案されている。しかしながら、これらの方法によっ
ては、永久制電性が改善される一方で、射出成型によっ
て得られる製品の表面にウェルド・ライン,パ−ル光沢
等の外観不良が生ずるという問題点が指摘されている。
このことは、OA機器,家電製品のハウジング,内装材
等特に美的外観を要求される分野に使用され、且つ射出
成型によって製造される場合が多いABS樹脂の商品価
値を損ない、その用途を限定することにつながるもので
ある。[0003] In order to improve this point, a method of mixing an epihalohydrin copolymer (JP-A-61-18)
5557, JP-A-62-25164, JP-A-62-264.
No. 273247) and a method of mixing other ethylene oxide copolymers (Japanese Patent Application Laid-Open No. 64-26674), a method of adding an acrylate polymer as a third component (Japanese Patent Application Laid-Open No. 64-1748), and the like. Method of adding a modified vinyl polymer (JP-A-2-269147)
Has been proposed. However, it has been pointed out that while these methods improve the permanent antistatic property, the surface of a product obtained by injection molding has poor appearance such as weld lines and pearl gloss. .
This impairs the commercial value of ABS resin, which is often used in fields requiring aesthetic appearance, such as OA equipment, housing for home electric appliances and interior materials, and is often manufactured by injection molding, and limits its use. It leads to things.
【0004】[0004]
【発明が解決しようとする課題】本発明は、優れた表面
外観を与えるABS樹脂をベースとした射出成型用制電
性樹脂組成物の提供を目的とするものである。SUMMARY OF THE INVENTION An object of the present invention is to provide an antistatic resin composition for injection molding based on an ABS resin, which gives an excellent surface appearance.
【0005】[0005]
【課題を解決するための手段】上記課題を解決するた
め、本発明者らは鋭意研究の結果、単量体成分として5
0%以上のエチレンオキシドを含み、且つ屈折率(nD
20)が1.50以上であるエチレンオキシド共重合体を
ABS樹脂に配合することにより上記目的を充分達成し
得ることを見出し、本発明に到達したものである。即
ち、本発明は、(A)単量体成分であるアクリロニトリ
ル系化合物とビニル芳香族系化合物との重量比が10:
90から50:50であるABSグラフト共重合体10
0重量部に対して、(B)単量体成分として50重量%
以上のエチレンオキシドを含み、且つ屈折率(nD 20)
が1.50以上であるエチレンオキシド共重合体5〜3
0重量部を配合したことを特徴とする成型物表面外観の
優れた射出成型用制電性樹脂組成物を提供するものであ
る。Means for Solving the Problems In order to solve the above problems, the present inventors have conducted intensive studies and as a result, have found that 5
0% or more of ethylene oxide and a refractive index (n D
The present inventors have found that the above object can be sufficiently achieved by blending an ethylene oxide copolymer having 20 ) of 1.50 or more with an ABS resin, and have reached the present invention. That is, in the present invention, the weight ratio of the acrylonitrile compound (A) monomer component to the vinyl aromatic compound is 10:
ABS graft copolymer 10 having a ratio of 90 to 50:50
50% by weight as a monomer component (B) based on 0 parts by weight
Containing the above ethylene oxide and having a refractive index (n D 20 )
Is an ethylene oxide copolymer having a molecular weight of 1.50 or more
An object of the present invention is to provide an antistatic resin composition for injection molding excellent in surface appearance of a molded product, characterized by containing 0 parts by weight.
【0006】本発明に用いるABSグラフト共重合体は
ビニル芳香族系化合物とアクリロニトリル系化合物との
組合せを少くとも40重量%とゴム質基材60重量%以
下とよりなるものである。“ABS”という用語は、本
来アクリロニトリル,ブタジエン,スチレンより主とし
て構成される共重合体を表わすものであるが、近年にな
ってこの定義は拡大され、これらの成分の全部又は一部
分がこれに類縁性の大きい化合物で置換された共重合体
であって、成型加工性,剛性,耐衝撃性,光沢度,耐熱
性等の基礎的諸特性に関していわゆるABS樹脂の特性
を本質的に示す共重合体をも包含して用いられている。
本発明に用い得るビニル芳香族系化合物はビニルアニリ
ン類,スチレン,α−メチルスチレンのようなビニル芳
香族系化合物、クロロスチレンやジブロモスチレンのよ
うなハロゲン化スチレン、ビニルトルエンのようなアル
キルスチレン等のような種々の共重合性ビニル芳香族系
化合物である。異種のビニル芳香族系化合物の混合物も
使用可能である。しかし、好ましいのは、スチレン,ハ
ロゲン化スチレン類,α−メチルスチレン類,アルキル
スチレン類又はこれらの混合物である。最も好ましい実
施態様においてはグラフト共重合体中に少なくとも若干
のスチレンを含有している。The ABS graft copolymer used in the present invention comprises at least 40% by weight of a combination of a vinyl aromatic compound and an acrylonitrile compound and 60% by weight or less of a rubber base material. The term "ABS" refers to a copolymer that is primarily composed of acrylonitrile, butadiene, and styrene, but in recent years this definition has been expanded to include all or some of these components as analogs. Is a copolymer substituted with a compound having a large size, which essentially exhibits the characteristics of a so-called ABS resin with respect to basic properties such as moldability, rigidity, impact resistance, glossiness and heat resistance. Is also used.
Vinyl aromatic compounds usable in the present invention include vinyl anilines, vinyl aromatic compounds such as styrene and α-methylstyrene, halogenated styrenes such as chlorostyrene and dibromostyrene, and alkylstyrenes such as vinyltoluene. And various copolymerizable vinyl aromatic compounds. Mixtures of different vinyl aromatic compounds can also be used. However, preference is given to styrene, halogenated styrenes, α-methylstyrenes, alkylstyrenes or mixtures thereof. In a most preferred embodiment, the graft copolymer contains at least some styrene.
【0007】本発明に用い得るアクリロニトリル系化合
物はアクリロニトリル,ハロゲン化アクリロニトリル,
メタクリロニトリル,エタクリロニトリル,更にアルキ
ルアクリロニトリル誘導体又はこれらの誘導体である。
メチルメタクリレート,エタクリレート及びアクロレイ
ンのようなその他の非ニトリル系アクリロ化合物はAB
Sグラフト共重合体中に20重量%以下、好ましくは1
0重量%以下の比較的少量で存在していてもよい。好適
な化合物はアクリロニトリル及び/又はメタクリロニト
リルである。更に最も好適なABSグラフト共重合体は
アクリロニトリルを主なアクリロ化合物として含有し、
少量のメタクリロニトリルを含有するものである。これ
ら本発明に用いるABSグラフト共重合体において、単
量体成分であるアクリロニトリル系化合物とビニル芳香
族系化合物との重量比は10:90から50:50の範
囲であることが必要である。アクリロニトリル系化合物
の重量比がこの範囲未満であると、本発明の目的の1つ
である射出成型物の優れた表面外観を得ることが困難に
なる。一方この範囲を上回るとABSグラフト共重合体
自身の成型時の流動性,熱安定性が低下して好ましくな
いことは、当業界において周知である。Acrylonitrile compounds usable in the present invention include acrylonitrile, halogenated acrylonitrile,
Methacrylonitrile, ethacrylonitrile, and further alkyl acrylonitrile derivatives or derivatives thereof.
Other non-nitrile acryloyl compounds such as methyl methacrylate, ethacrylate and acrolein are AB
20% by weight or less, preferably 1% by weight in the S-graft copolymer
It may be present in relatively small amounts up to 0% by weight. A preferred compound is acrylonitrile and / or methacrylonitrile. Furthermore, the most preferred ABS graft copolymer contains acrylonitrile as the main acrylo compound,
It contains a small amount of methacrylonitrile. In the ABS graft copolymer used in the present invention, the weight ratio of the acrylonitrile-based compound as the monomer component to the vinyl aromatic-based compound needs to be in the range of 10:90 to 50:50. When the weight ratio of the acrylonitrile-based compound is less than this range, it is difficult to obtain an excellent surface appearance of an injection-molded product, which is one of the objects of the present invention. On the other hand, it is well known in the art that if the ratio exceeds this range, the fluidity and thermal stability during molding of the ABS graft copolymer itself decrease, which is not preferable.
【0008】ゴム質基材としては公知の種々のゴム質基
材を何れも使用し得る。しかし好ましいゴム質基材はジ
エン系ゴムよりなるものである。特に好ましいゴム質は
ポリブタジエン系ゴム及びブタジエン共重合ゴムであっ
て、例えば35%以下のアクリロニトリル,アルキルア
クリレート,アルキルメタクリレート等の共重合性単量
体又はスチレン等のビニル芳香族系単量体を含有するブ
タジエン共重合体である。また、ジエン系ゴム程好まし
くはないが、その他のゴム質基材も使用することが出来
る。その例としてはアルキルアクリレート単独重合体又
は共重合体から誘導したアクリルゴムあるいはエチレン
プロピレン非共役ジエン共重合体ゴム、半結晶性ないし
非結晶性塩素化ポリエチレン等が挙げられる。As the rubber substrate, any of various known rubber substrates can be used. However, a preferred rubbery substrate is made of a diene rubber. Particularly preferred rubber materials are polybutadiene rubber and butadiene copolymer rubber, for example, containing 35% or less of a copolymerizable monomer such as acrylonitrile, alkyl acrylate, alkyl methacrylate or a vinyl aromatic monomer such as styrene. Butadiene copolymer. Further, although not as preferable as the diene rubber, other rubber base materials can be used. Examples include acrylic rubber or ethylene derived from alkyl acrylate homopolymers or copolymers.
Propylene non-conjugated diene copolymer rubber, semi-crystalline or
Amorphous chlorinated polyethylene and the like can be mentioned.
【0009】本発明のグラフト共重合体は樹脂の性質を
改善するために公知の種々の添加物を重合時に少量含ん
でいてもよい。このような添加物としてはジビニルベン
ゼン,エチレングリコ−ルジメタクリレート等の架橋性
単量体を挙げることができる。本発明に用いる上記グラ
フト共重合体の多くは市場で広範囲に入手することが出
来、或いは種々の公知のグラフト重合技術によって製造
することができる。その方法の一つはアクリロニトリル
単量体とビニル芳香族単量体とを予め生成したゴム質基
材に共重合する方法である。米国特許第3,238,2
75号明細書にはスチレンとアクリロニトリルから伝統
的なABSグラフト共重合体を製造する代表的な方法が
記載されている。更に同明細書には、ゴム質基材の含有
率が大きいグラフト共重合体と、スチレン−アクリロニ
トリル共重合体(SAN),アクリロニトリル−α−メ
チルスチレン,スチレン共重合体等の予め形成された剛
性の共重合体とを配合してABS型樹脂を製造する方法
も記載されている。[0009] The graft copolymer of the present invention may contain small amounts of various known additives during the polymerization in order to improve the properties of the resin. Examples of such additives include crosslinkable monomers such as divinylbenzene and ethylene glycol dimethacrylate. Many of the above graft copolymers used in the present invention are commercially available in a wide range, or can be produced by various known graft polymerization techniques. One of the methods is a method in which an acrylonitrile monomer and a vinyl aromatic monomer are copolymerized with a rubber base material that has been formed in advance. U.S. Pat. No. 3,238,2
No. 75 describes a representative method for producing a traditional ABS graft copolymer from styrene and acrylonitrile. Further, the same specification discloses a graft copolymer having a high rubber base material content and a preformed rigidity such as styrene-acrylonitrile copolymer (SAN), acrylonitrile-α-methylstyrene, and styrene copolymer. And a method of producing an ABS resin by blending with a copolymer of the formula (1).
【0010】ビニル芳香族化合物,アクリロニトリル系
化合物及びゴム質基材の割合は一部は熱可塑性樹脂の所
望の特性によって異なる。しかし、成型性,剛性,耐衝
撃性,光沢度,耐熱性等の特性バランスを保持する観点
からは、ABSグラフト共重合体が少くとも40重量%
のビニル芳香族系化合物とアクリロニトリル系化合物と
の組合せよりなり、ゴム質基材が60重量%以下である
ことが好ましい。更に好ましい割合はABSグラフト共
重合体中のビニル芳香族系化合物とアクリロニトリル系
化合物との組合せが少くとも50重量%でゴム質基材が
50重量%以下である。ABSグラフト共重合体の一部
が他のポリマーに置換されたポリマーブレンド物もまた
該ABSグラフト共重合体の特性が付与される限りにお
いて使用可能である。好ましいブレンドとして例えば塩
化ビニルポリマー,スチレンポリマー,耐衝撃性スチレ
ンポリマー,メチルメタクリレートポリマー,ポリウレ
タン,ポリカーボネート,ポリアミド,ポリブチレンテ
レフタレート等のポリエステル,ポリフェニレンエーテ
ル,ポリグルタルイミド,塩素化ポリエチレン等とのブ
レンドを挙げることができる。ブレンド物中にはABS
グラフト共重合体が通常少くとも30重量%以上、好ま
しくは50重量%以上含まれる。[0010] The proportions of the vinyl aromatic compound, acrylonitrile compound and rubbery substrate depend in part on the desired properties of the thermoplastic resin. However, from the viewpoint of maintaining the balance of properties such as moldability, rigidity, impact resistance, glossiness, and heat resistance, at least 40% by weight of the ABS graft copolymer is used.
Of a vinyl aromatic compound and an acrylonitrile compound, and the rubber base material is preferably 60% by weight or less. More preferably, the combination of the vinyl aromatic compound and the acrylonitrile compound in the ABS graft copolymer is at least 50% by weight and the rubber base material is 50% by weight or less. A polymer blend in which a part of the ABS graft copolymer is replaced by another polymer can also be used as long as the properties of the ABS graft copolymer are imparted. Preferred blends include, for example, blends with vinyl chloride polymer, styrene polymer, impact-resistant styrene polymer, methyl methacrylate polymer, polyurethane, polycarbonate, polyamide, polyester such as polybutylene terephthalate, polyphenylene ether, polyglutarimide, chlorinated polyethylene and the like. be able to. ABS in the blend
The content of the graft copolymer is usually at least 30% by weight or more, preferably 50% by weight or more.
【0011】本発明に用いるエチレンオキシド共重合体
においては、単量体成分としてエチレンオキシドが50
重量%以上含まれることによって優れた制電性を有する
樹脂組成物を得ることができる。また、他の特定の単量
体と共重合して該共重合体の屈折率(nD 20)を1.5
0以上とすることにより、樹脂組成物を射出成型して得
られた製品の表面外観が著しく改良される。ここでいう
製品の表面外観の不良とは、いわゆるパール光沢と、ウ
ェルドライン,即ち射出成型時に金型内で樹脂組成物が
合流して生じる線状のマークを指している。ABS樹脂
は主要な単量体として芳香族化合物を含んでいるので比
較的高い屈折率を有し、その共重合組成にもよるがおよ
そ1.55以上である。ABS樹脂と他のポリマーを混
合して用いる場合両者の屈折率を可及的に近似させるこ
とによって透明度の高い樹脂組成物を得ることはよく知
られている。しかしながら、ウェルドラインは、例え
ば、単一の樹脂を含む樹脂組成物を射出成型する場合に
も生じることがあり、本発明組成物の如くABS系樹脂
とエチレンオキシド共重合体との混合物を含む組成物に
おいて、両者の屈折率が近似することによってウェルド
ラインによる外観不良が改善されることは全く予期し得
ないことである。In the ethylene oxide copolymer used in the present invention, 50% of ethylene oxide is contained as a monomer component.
A resin composition having excellent antistatic properties can be obtained by being contained in an amount of not less than% by weight. Further, the copolymer is copolymerized with another specific monomer so that the refractive index (n D 20 ) of the copolymer is 1.5.
By setting it to 0 or more, the surface appearance of a product obtained by injection molding the resin composition is remarkably improved. The term “defective surface appearance of the product” as used herein refers to a so-called pearl luster and a weld line, that is, a linear mark generated by merging of resin compositions in a mold during injection molding. The ABS resin contains an aromatic compound as a main monomer and therefore has a relatively high refractive index, and is about 1.55 or more, depending on its copolymer composition. When an ABS resin and another polymer are mixed and used, it is well known that a resin composition having high transparency is obtained by approximating the refractive indices of both as much as possible. However, a weld line may also occur when, for example, a resin composition containing a single resin is injection-molded, and a composition containing a mixture of an ABS resin and an ethylene oxide copolymer like the composition of the present invention. In this case, it is completely unexpected that the appearance defect due to the weld line is improved by approximating the refractive indices of the two.
【0012】本発明で使用されるエチレンオキシド共重
合体を構成する単量体成分としてはエチレンオキシドの
ほか、単量体の屈折率(nD 20)が1.54以上、好ま
しくは1.55以上のものから選ばれる。その様な単量
体は下記一般式で表わされる化合物から選ばれる。The monomer component constituting the ethylene oxide copolymer used in the present invention is, in addition to ethylene oxide, a monomer having a refractive index (n D 20 ) of 1.54 or more, preferably 1.55 or more. Selected from things. Such a monomer is selected from compounds represented by the following general formula.
【0013】[0013]
【化1】 Embedded image
【0014】但し該一般式において、Arは少なくとも
1個のハロゲン原子、及び又はアリール基、及び又はア
ラルキル基で置換された単環の炭素系芳香族基又は複素
環系芳香族基、或いは置換基を有していてもよい縮合し
た炭素系芳香族基又は複素環系芳香族基を表わし、nは
0又は1の整数を、XはO(酸素),S(硫黄)又は−
O−CO−基を表わす。これを具体的に例示すれば、2
−クロロフェニルグリシジルエーテル,4−クロロフェ
ニルグリシジルエーテル,2,4,6−トリクロロフェ
ニルグリシジルエーテル,2,4−ジブロモフェニルグ
リシジルエーテル,2,4−ジブロモクレジルグリシジ
ルエーテルの様なフェニル基がハロゲン原子で置換され
たフェニルグリシジルエーテル類、2−フェニルフェニ
ルグリシジルエーテル,4−フェニルフェニルグリシジ
ルエーテル,4−ベンジルフェニルグリシジルエーテ
ル,4−クミルフェニルグリシジルエーテルの様なフェ
ニル基が更に芳香族基を含む置換基で置換されたフェニ
ルグリシジルエーテル類、1−ナフチルグリシジルエー
テル,2−ナフチルグリシジルエーテル,9−フェナン
トリルグリシジルエーテルの様なアリール基が縮合芳香
族基であるアリールグリシジルエーテル類、However, in the general formula, Ar is at least
One halogen atom, and / or an aryl group, and / or
It represents a single ring carbon aromatic group or heterocyclic aromatic group, or may have a substituent group fused carbon-based aromatic group or heterocyclic aromatic group substituted with aralkyl radical, n Is an integer of 0 or 1, X is O (oxygen), S (sulfur) or-
Represents an O-CO- group. To illustrate this specifically, 2
Phenyl groups such as -chlorophenyl glycidyl ether, 4-chlorophenyl glycidyl ether, 2,4,6-trichlorophenyl glycidyl ether, 2,4-dibromophenyl glycidyl ether, and 2,4-dibromocresyl glycidyl ether are substituted with halogen atoms Phenyl glycidyl ethers, 2-phenylphenyl glycidyl ether, 4-phenylphenyl glycidyl ether, 4-benzylphenyl glycidyl ether
Phenyl glycidyl ethers in which a phenyl group such as phenyl , 4-cumylphenyl glycidyl ether is further substituted with a substituent containing an aromatic group, 1-naphthyl glycidyl ether, 2-naphthyl glycidyl ether, 9-phenanthryl glycidyl Aryl glycidyl ethers in which an aryl group such as an ether is a condensed aromatic group,
【0015】4−クロロ−1−ナフチルグリシジルエー
テル,2,4−ジクロロ−1−ナフチルグリシジルエー
テル,1−ブロモ−2−ナフチルグリシジルエーテル,
2−ブロモ−2−ナフチルグリシジルエーテル,1,6
−ジブロモ−2−ナフチルグリシジルエーテルの様なア
リール基がハロゲン原子で置換された縮合芳香族基であ
るアリールグリシジルエーテル類、4−クロロフェニル
グリシジルチオエーテル,2−クロロフェニルグリシジ
ルチオエーテルの様なフェニルグリシジルチオエーテル
類、4−クロロスチレンオキシド,2−クロロスチレン
オキシド,2,6−ジクロロスチレンオキシド,4−ブ
ロモスチレンオキシドの様なフェニル基がハロゲン原子
で置換されたスチレンオキシド類、2−ビニルナフタレ
ンオキシド,9−ビニルフェナントレンオキシドの様な
ビニル基で置換された縮合芳香族化合物のエポキシド
類、4−(2,3−エポキシプロポキシ)インドールの
様な縮合した複素環系芳香族化合物のグリシジルエーテ
ル類、グリシジル−2−クロロベンゾエート,グリシジ
ル−3−クロロベンゾエート,グリシジル−2,4−ジ
クロロベンゾエート,グリシジル−2,5−ジクロロベ
ンゾエート,グリシジル−2−ブロモベンゾエート,グ
リシジル−4−ブロモベンゾエートの様なハロゲン原子
で置換された安息香酸のグリシジルエステル類、グリシ
ジル−1−ナフトエート,グリシジル−2−ナフトエー
トの様な縮合芳香族カルボン酸のグリシジルエステル類
等が挙げられる。上記一般式の他、グリシジルカルバゾ
ール,グリシジルインドール,グリシジルフェノチアジ
ンの様なグリシジル基で置換された、縮合した複素環系
芳香族化合物も、エチレンオキシド共重合体を構成する
単量体成分として使用することができる。 4-chloro-1-naphthyl glycidyl ether, 2,4-dichloro-1-naphthyl glycidyl ether, 1-bromo-2-naphthyl glycidyl ether,
2-bromo-2-naphthyl glycidyl ether, 1,6
Aryl glycidyl ethers such as -dibromo-2-naphthyl glycidyl ether, which are condensed aromatic groups in which aryl groups are substituted with halogen atoms, phenyl glycidyl thioethers such as 4-chlorophenyl glycidyl thioether, 2-chlorophenyl glycidyl thioether; Styrene oxides in which a phenyl group is substituted with a halogen atom, such as 4-chlorostyrene oxide, 2-chlorostyrene oxide, 2,6-dichlorostyrene oxide, and 4-bromostyrene oxide, 2-vinylnaphthalene oxide, 9-vinyl Epoxides of condensed aromatic compounds substituted with a vinyl group such as phenanthrene oxide, 4- (2,3-epoxypropoxy) indole
Gurishijiruete of such condensation was heterocyclic aromatic compounds
Le ethers, glycidyl-2-chlorobenzoate, glycidyl-3-chlorobenzoate, glycidyl-2,4-dichloro-benzoate, glycidyl-2,5-dichloro-benzoate, glycidyl-2-bromobenzoate, as glycidyl-4-bromobenzoate Glycidyl esters of benzoic acid substituted with various halogen atoms, and glycidyl esters of condensed aromatic carboxylic acids such as glycidyl-1-naphthoate and glycidyl-2-naphthoate. In addition to the above general formula, glycidyl carbazo
, Glycidyl indole, glycidyl phenothiazi
Fused heterocyclic systems substituted with glycidyl groups such as
Aromatic compounds also make up the ethylene oxide copolymer
It can be used as a monomer component.
【0016】また、エチレンオキシド及び上記単量体の
ほか、エチレンオキシド成分が50重量%以上で,得ら
れた共重合体の屈折率(nD 20)が1.50以上となる
範囲において、他の単量体をも共重合成分として併用す
ることができる。その様な他モノマー成分としては、プ
ロピレンオキシド,1−ブテンオキシドの様なアルキレ
ンオキシド、シクロヘキセンオキシド,ビニルシクロヘ
キセンモノオキシドの様なシクロアルキルエポキシド、
スチレンオキシド,α−メチルスチレンオキシドの様な
芳香族置換エポキシド、エピクロロヒドリン,エピブロ
モヒドリンの様なハロゲン置換アルキレンオキシド、エ
チルグリシジルエーテル,ブチルグリシジルエーテル,
クロロエチルグリシジルエーテルの様なアルキルグリシ
ジルエーテル、アリルグリシジルエーテルの様なアルケ
ニルグリシジルエーテル、フェニルグリシジルエーテル
の様な芳香族グリシジルエーテル、酢酸グリシジル,プ
ロピオン酸グリシジル,メタクリル酸グリシジル,安息
香酸グリシジルの様なグリシジルエステル等が挙げられ
る。本発明に用いるエチレンオキシド共重合体は、50
重量%以上のエチレンオキシド,単量体の屈折率が1.
54以上、好ましくは1.55以上のエポキシド単量体
及び必要に応じて他のエポキシド単量体とを組合わせて
開環重合することによって得られる。In addition to ethylene oxide and the above monomers, other monomers may be used as long as the ethylene oxide component is 50% by weight or more and the refractive index (n D 20 ) of the obtained copolymer is 1.50 or more. A monomer can also be used in combination as a copolymer component. Such other monomer components include alkylene oxides such as propylene oxide and 1-butene oxide, cycloalkyl epoxides such as cyclohexene oxide and vinylcyclohexene monoxide,
Aromatic-substituted epoxides such as styrene oxide and α-methylstyrene oxide, halogen-substituted alkylene oxides such as epichlorohydrin and epibromohydrin, ethyl glycidyl ether, butyl glycidyl ether,
Alkyl glycidyl ethers such as chloroethyl glycidyl ether, alkenyl glycidyl ethers such as allyl glycidyl ether, aromatic glycidyl ethers such as phenyl glycidyl ether, glycidyl acetate, glycidyl propionate, glycidyl methacrylate, glycidyl benzoate Esters and the like. The ethylene oxide copolymer used in the present invention is 50
% By weight or more of ethylene oxide, and the refractive index of the monomer is 1.
It is obtained by ring-opening polymerization in combination with an epoxide monomer of 54 or more, preferably 1.55 or more, and if necessary, another epoxide monomer.
【0017】エチレンオキシド共重合体の分子量は0.
1g/d1のモノクロロベンゼン溶液を用い、80℃で
測定した還元粘度で0.5〜10、好ましくは1〜5の
範囲が望ましい。この範囲をを下回ると本発明組成物の
機械的諸特性が低下し、一方上回ると成型加工性,就中
成型流動性が低下して好ましくない。重合触媒は公知の
ジアルキル亜鉛−水,トリアルキルアルミニウム−水−
アセチルアセトン,有機スズとリン酸エステルの熱縮合
物等のいずれでも用いることが出来る。The molecular weight of the ethylene oxide copolymer is 0.1.
Using a 1 g / d1 monochlorobenzene solution, the reduced viscosity measured at 80 ° C. is in the range of 0.5 to 10, preferably 1 to 5. If the ratio is below this range, the mechanical properties of the composition of the present invention decrease, while if it exceeds this range, molding processability, especially molding fluidity, is unfavorably reduced. The polymerization catalyst is a known dialkyl zinc-water, trialkyl aluminum-water-
Any of acetylacetone, a thermal condensate of an organic tin and a phosphoric ester, and the like can be used.
【0018】共重合反応の溶媒としてはブタン,ペンタ
ン,ヘキサン,ヘプタン,ベンゼン,トルエン,クロル
ベンゼン等が挙げられる。又は、必要に応じて無溶媒で
行なうことも可能である。反応温度は0〜60℃の範囲
が望ましい。また該共重合体はブロック共重合体,グラ
フト共重合体,ランダム共重合体又は交互共重合体のい
ずれでもよいが、優れた制電性を得るためにはランダム
共重合体であるのが特に望ましい。The solvent for the copolymerization reaction includes butane, pentane, hexane, heptane, benzene, toluene, chlorobenzene and the like. Alternatively, the reaction can be performed without a solvent, if necessary. The reaction temperature is desirably in the range of 0 to 60 ° C. The copolymer may be any of a block copolymer, a graft copolymer, a random copolymer or an alternating copolymer, but is preferably a random copolymer in order to obtain excellent antistatic properties. desirable.
【0019】これら本発明に用いるエチレンオキシド共
重合体は、ABSグラフト共重合体100重量部に対し
て5〜30重量部含まれることによって本発明の目的が
達成される。この範囲を下回ると本発明の1つの目的で
ある制電性を得ることが困難となり、一方この範囲を上
回るとABS樹脂本来の機械的諸特性が低下して好まし
くない。また、これらのエチレンオキシド共重合体は、
エチレンオキシド単独重合体又は他のエチレンオキシド
共重合体と組合わせて使用されることが、本発明の樹脂
組成物の特性を付与し得る範囲で可能である。好適に
は、エチレンオキシド単独重合体及び共重合体の合計量
に対して本発明における共重合体が少なくとも30重量
%、好ましくは50重量%以上含まれる。The object of the present invention is achieved when the ethylene oxide copolymer used in the present invention is contained in an amount of 5 to 30 parts by weight based on 100 parts by weight of the ABS graft copolymer. Below this range, it is difficult to obtain the antistatic property, which is one object of the present invention. On the other hand, above this range, the mechanical properties inherent in the ABS resin are undesirably reduced. Also, these ethylene oxide copolymers,
It can be used in combination with an ethylene oxide homopolymer or another ethylene oxide copolymer as long as the properties of the resin composition of the present invention can be imparted. Suitably, the copolymer of the present invention is contained in an amount of at least 30% by weight, preferably 50% by weight or more, based on the total amount of the ethylene oxide homopolymer and the copolymer.
【0020】本発明の制電性樹脂組成物は上記ABSグ
ラフト共重合体とエチレンオキシド共重合体を、バンバ
リーミキサー内での混合,溶融混合,押出し及びミル粉
砕等の既知の各種技術の何れかにより混合して得られ
る。本発明に用いるエチレンオキシド共重合体とABS
グラフト共重合体の一部を特開平2−269147号公
報で開示されている如き成分、即ちカルボキシル基,エ
ポキシ基,アミノ基,ヒドロキシル基,ポリアルキレン
オキシド基又はその誘導体から選ばれた少なくとも1種
の官能基を含有する変性ビニル系重合体とブレンドして
置き換えることも、ABSグラフト共重合体の特性が付
与される範囲の量で可能である。好適な範囲は選ばれる
変性ビニル重合体の性質にもよるがABSグラフト共重
合体が通常少なくとも30重量%、好ましくは50重量
%以上である。The antistatic resin composition of the present invention is prepared by mixing the ABS graft copolymer and ethylene oxide copolymer by any of various known techniques such as mixing in a Banbury mixer, melt mixing, extrusion and milling. Obtained by mixing. Ethylene oxide copolymer and ABS used in the present invention
A part of the graft copolymer is a component as disclosed in JP-A-2-269147, that is, at least one selected from a carboxyl group, an epoxy group, an amino group, a hydroxyl group, a polyalkylene oxide group or a derivative thereof. Can be replaced by blending with a modified vinyl polymer having a functional group of (1) as long as the properties of the ABS graft copolymer are imparted. The suitable range depends on the properties of the modified vinyl polymer selected, but the ABS graft copolymer is usually at least 30% by weight, preferably 50% by weight or more.
【0021】更に、過酸化ジクミル等の架橋剤を少量含
めてもよい。もっとも、適当な組成物を得るのに、架橋
剤は必ずしも必要ではない。その他既知の添加剤例えば
衝撃性改良剤,潤滑剤,安定剤,充填剤,酸化防止剤,
紫外線吸収剤及び難燃剤等を添入することが出来る。ま
た、他の既知の帯電防止剤、例えば長鎖アミン,エーテ
ル及びエステル,アミド,四級アンモニウム塩及びスル
ホン酸並びにスルホン酸アルキル,アリール又はアルキ
ルアリール及びリン酸,リン酸アルキル,アリール又は
アラルキル,特にこれらのエトキシル酸塩誘導体及び低
分子量ポリエーテルグリコール等を添入することも出来
る。添加剤はエチレンオキシド共重合体及び/又はAB
Sグラフト共重合体に別々に添入しても、或いはエチレ
ンオキシド共重合体と樹脂成分との混合時若しくは混合
後に添入してもよい。Further, a small amount of a crosslinking agent such as dicumyl peroxide may be included. However, a crosslinking agent is not always necessary to obtain a suitable composition. Other known additives such as impact modifiers, lubricants, stabilizers, fillers, antioxidants,
An ultraviolet absorber and a flame retardant can be added. Also, other known antistatic agents, such as long-chain amines, ethers and esters, amides, quaternary ammonium salts and sulfonic acids and alkyl, aryl or alkylaryl sulfonates and phosphoric acid, alkyl, aryl or aralkyl phosphates, especially These ethoxylate derivatives and low molecular weight polyether glycols can be added. The additive is ethylene oxide copolymer and / or AB
It may be separately added to the S-graft copolymer, or may be added during or after mixing the ethylene oxide copolymer and the resin component.
【0022】[0022]
【実施例】以下実施例によって本発明を具体的に詳細説
明する。 参考例1 a)重合触媒の調製 攪拌機、窒素導入管、低沸点物放出管及び温度計を備え
た11の四ツ口フラスコにジブチルスズオキシド37.
6gとリン酸トリブチル80.3gを入れ器内を窒素置
換した後撹拌しながら250℃で20分間加熱し得られ
た固体を重合触媒として用いた。 b)エチレンオキシド共重合体の製造 攪拌機、窒素導入管、温度計及び試料導入管を備えた2
01のステンレス反応器に窒素雰囲気下ヘキサン420
0g,エチレンオキシド823g,1−ナフチルグリシ
ジルエーテル282g及び上記調製した触媒15gを入
れ撹拌下20℃で8時間反応させる。反応終了後水5m
l及び老化防止剤として4,4’−チオビス(3−メチ
ル−6−ターシャリ−ブチルフェノール)5.5gを入
れ室温で15分撹拌する。次いで、ポリマーを濾取し、
ヘキサンで洗浄後50℃で一昼夜乾燥し、共重合体を得
た(1060g)。得られた共重体の組成はNMR法に
よるとエチレンオキシド:1−ナフチルグリシジルエー
テル=75:25(重量比)であった。またこのポリマ
ーの屈折率(nD 20)は1.508であった。また前
記の方法でこのポリマーの還元粘度を測定したところ
4.0であった。 参考例2〜7 上記参考例1と同様にしてエチレンオキシド共重合体を
製造した結果を表1,表2に示した。The present invention will be described in detail below with reference to examples. Reference Example 1 a) Preparation of Polymerization Catalyst Dibutyltin oxide was placed in an 11-neck four-necked flask equipped with a stirrer, a nitrogen inlet tube, a low boiling point discharge tube, and a thermometer.
After 6 g and 80.3 g of tributyl phosphate were charged and the inside of the vessel was replaced with nitrogen, the mixture was heated with stirring at 250 ° C. for 20 minutes, and the obtained solid was used as a polymerization catalyst. b) Production of ethylene oxide copolymer 2 equipped with a stirrer, nitrogen introduction tube, thermometer and sample introduction tube
Hexane 420 in a nitrogen atmosphere in a stainless steel reactor 01
0 g, 823 g of ethylene oxide, 282 g of 1-naphthyl glycidyl ether and 15 g of the catalyst prepared above are added and reacted at 20 ° C. for 8 hours with stirring. 5m water after reaction
l and 5.5 g of 4,4'-thiobis (3-methyl-6-tert-butylphenol) as an antioxidant are added and stirred at room temperature for 15 minutes. Then the polymer is filtered off,
After washing with hexane, the resultant was dried at 50 ° C. for a whole day and night to obtain a copolymer (1060 g). According to the NMR method, the composition of the obtained copolymer was ethylene oxide: 1-naphthyl glycidyl ether = 75: 25 (weight ratio). The refractive index (n D 20 ) of this polymer was 1.508. Again before
The reduced viscosity of this polymer was measured by the method described above.
4.0. Reference Examples 2 to 7 Tables 1 and 2 show the results of producing an ethylene oxide copolymer in the same manner as in Reference Example 1.
【0023】[0023]
【表1】 [Table 1]
【0024】[0024]
【表2】 [Table 2]
【0025】実施例1,2 比較例1,2 公知の乳化重合法及びグラフト重合法により、アクリロ
ニトリル成分30重量%,スチレン成分55重量%及び
ブタジエン成分15重量%からなるABSグラフト共重
合体(I)を製造した。この共重合体(I)100重量
部に潤滑剤としてエチレンビスステアリルアミド0.5
重量部,顔料としてフタロシアニンブルー0.5重量部
を配合したもの、参考例1で調製したエチレンオキシド
共重合体を各々10又は20重量部配合したもの及び参
考例4で調製した共重合体20重量部を配合したものを
夫々以下の方法に従ってペレット化,射出成型し、得ら
れた成型品の表面外観及び物性を表3に示した。 ペレット化:各配合物を容量1.7lのバンバリーミキ
サーで混練後、表面温度170℃の2本ロールでシート
化し、冷却後ペレタイザーにて約4mm角にペレット化
した。 射出成型:得られたペレットを90℃で4時間棚段乾燥
機で乾燥後、射出成型に供した。成型機はアーブルグ社
製,オールラウンダーA170H(90−200)を用
いた。成型条件は以下の通りである。 スクリュー径 :22mmφ 金型温度:60℃ シリンダー温度:220℃ 型締力 :18トン 射出圧力 :2000Kg/cm2 冷却時間:10秒 射出時間 :0.5秒 保圧 :1500Kg/cm2 保圧時間 :7秒Examples 1 and 2 Comparative Examples 1 and 2 An ABS graft copolymer (I) comprising 30% by weight of an acrylonitrile component, 55% by weight of a styrene component and 15% by weight of a butadiene component was obtained by a known emulsion polymerization method and a known graft polymerization method. ) Manufactured. 100 parts by weight of the copolymer (I) was mixed with 0.5 parts of ethylenebisstearylamide as a lubricant.
Parts by weight, 0.5 parts by weight of phthalocyanine blue as a pigment, 10 or 20 parts by weight of the ethylene oxide copolymer prepared in Reference Example 1, and 20 parts by weight of the copolymer prepared in Reference Example 4. Were pelletized and injection molded according to the following methods, and the surface appearance and physical properties of the obtained molded product are shown in Table 3. Pelletization: Each mixture was kneaded with a 1.7 liter Banbury mixer, formed into a sheet with two rolls having a surface temperature of 170 ° C., cooled, and then pelletized into about 4 mm square with a pelletizer. Injection molding: The obtained pellet was dried with a tray dryer at 90 ° C. for 4 hours and then subjected to injection molding. The molding machine used was Allrounder A170H (90-200) manufactured by Ahburg. The molding conditions are as follows. Screw diameter: 22Mmfai Mold temperature: 60 ° C. cylinder temperature: 220 ° C. mold clamping force 18 ton injection pressure: 2,000 Kg / cm 2 Cooling time: 10 sec injection time: 0.5 seconds holding pressure: between 1500 Kg / cm 2 dwell time : 7 seconds
【0026】金型概要:81mm×87mm×厚み2m
mの平板状キャビティーを有し、ランナ(内径4mm
φ)が2つに分枝し、2ヵ所のゲートよりキャビティー
に樹脂が充填される。平板のほぼ中央にウェルドライン
が発生するように設計されている。ゲートランド2m
m,幅2mm,厚み1mm、ゲート間隔51mm。この
金型を用いて射出成型された試験片の平面及び断面を夫
々図1及び図2に示した。 表面外観 ウェルドライン,パール光沢は目視により判定し、その
結果を記号で示した。 物性 制電性 帯電圧半減期(秒):オネストメーター(シシド静電気
社製)による。印加電圧10KV。 表面抵抗率測定(Ω):JISK6911による。試験
条件23℃,50% RH 機械的特性 降伏点応力(Kg/cm2 ) ASTM D−63
8,50mm/分 破断時伸び(%) ASTM D−63
8,50mm/分 アイゾット衝撃強度(Kg・cm/cm)ASTM D
−256−56A(1/2インチノッチ付き) 曲げ弾性率(Kg/cm2 ) ASTM D−790Outline of mold: 81 mm x 87 mm x 2 m thick
m with a flat cavity and a runner (4 mm inner diameter)
φ) branches into two, and the cavity is filled with resin from two gates. It is designed so that a weld line is generated almost at the center of the flat plate. Gateland 2m
m, width 2 mm, thickness 1 mm, gate interval 51 mm. The plane and cross section of a test piece injection molded using this mold are shown in FIGS. 1 and 2, respectively. Surface appearance Weld line and pearl luster were visually determined, and the results were indicated by symbols. Physical properties Antistatic Charging voltage half-life (seconds): Measured by Honestometer (manufactured by Shisido Electrostatic Co., Ltd.). Applied voltage 10KV. Surface resistivity measurement (Ω): according to JIS K6911. Test conditions 23 ° C, 50% RH Mechanical properties Yield point stress (Kg / cm 2 ) ASTM D-63
8,50 mm / min Elongation at break (%) ASTM D-63
8,50 mm / min Izod impact strength (Kg · cm / cm) ASTM D
-256-56A (with 1/2 inch notch) Flexural modulus (Kg / cm 2 ) ASTM D-790
【0027】[0027]
【表3】 [Table 3]
【0028】実施例3,4 比較例3〜6 実施例1で用いたABSグラフト共重合体(I)及び別
途公知の乳化重合法で製造したABSグラフト共重合体
(II)(アクリロニトリル5重量%,ブタジエン15
重量%及びスチレン80重量%から成る)との合計量1
00重量部に対して、潤滑剤としてエチレンビスステア
リルアミド0.5重量部及び顔料としてフタロシアニン
ブルーを配合したもの、更に参考例1,2,5,6及び
7で調製した共重合体を配合したものについて実施例1
と同様に成型し試験した結果を表4に示した。Examples 3 and 4 Comparative Examples 3 to 6 The ABS graft copolymer (I) used in Example 1 and the ABS graft copolymer (II) produced by a separately known emulsion polymerization method (acrylonitrile 5% by weight) , Butadiene 15
% Of styrene and 80% by weight of styrene)
A mixture of 0.5 parts by weight of ethylenebisstearylamide as a lubricant and phthalocyanine blue as a pigment , and the copolymers prepared in Reference Examples 1 , 2 , 5 , 6 and 7 were added to 00 parts by weight. Example 1
Table 4 shows the results of molding and testing in the same manner as described above.
【0029】[0029]
【表4】 [Table 4]
【0030】実施例5,6 比較例7〜9 実施例1で用いたABSグラフト共重合体(I)と同一
のもの90重量部,重合度800のポリ塩化ビニル10
重量部に滑剤としてエチレンビスステアリルアミド0.
5重量部,顔料としてフタロシアニンブルー0.5重量
部及び安定剤としてジブチルスズマレート0.5重量
部,更に参考例3で調製した共重合体を配合したものに
ついて実施例1と同様に成型し試験した結果を表5に示
した。Examples 5 and 6 Comparative Examples 7 to 9 90 parts by weight of the same ABS graft copolymer (I) used in Example 1 and polyvinyl chloride 10 having a polymerization degree of 800
Ethylene bisstearylamide as a lubricant in parts by weight
5 parts by weight, 0.5 part by weight of phthalocyanine blue as a pigment, 0.5 part by weight of dibutyltin maleate as a stabilizer, and a copolymer prepared in Reference Example 3 were molded and tested in the same manner as in Example 1. The results are shown in Table 5.
【0031】[0031]
【表5】 [Table 5]
【0032】[0032]
【発明の効果】本発明の樹脂組成物は優れた永久制電性
を有し、且つ表面外観が著しく改善されたものであっ
て、工業的価値が大きいものということができる。Industrial Applicability The resin composition of the present invention has excellent permanent antistatic properties, has a remarkably improved surface appearance, and is of great industrial value.
【0033】[0033]
【図1】本発明の試験のために射出成型して得られた試
験片の平面図。FIG. 1 is a plan view of a test piece obtained by injection molding for a test of the present invention.
【図2】同A−A断面図。FIG. 2 is a sectional view taken along the line AA in FIG.
【符号の説明】 1 ランナに直交するスプル(根元の径5mmφ)を示
す。[Description of Signs] 1 Indicates a sprue (root diameter 5 mmφ) orthogonal to the runner.
───────────────────────────────────────────────────── フロントページの続き 審査官 内田 靖恵 (58)調査した分野(Int.Cl.7,DB名) C08L 55/02 C08L 71/02 ──────────────────────────────────────────────────続 き Continued on front page Examiner Yasue Uchida (58) Field surveyed (Int. Cl. 7 , DB name) C08L 55/02 C08L 71/02
Claims (1)
ル系化合物とビニル芳香族系化合物との重量比が10:
90から50:50であるABSグラフト共重合体10
0重量部に対して、(B)単量体成分として50重量%
以上のエチレンオキシドを含み、且つ屈折率(nD 20)
が1.50以上であるエチレンオキシド共重合体5〜3
0重量部を配合したことを特徴とする成型物表面外観の
優れた射出成型用制電性樹脂組成物。1. A weight ratio of an acrylonitrile compound as a monomer component to a vinyl aromatic compound is 10:
ABS graft copolymer 10 having a ratio of 90 to 50:50
50% by weight as a monomer component (B) based on 0 parts by weight
Containing the above ethylene oxide and having a refractive index (n D 20 )
Is an ethylene oxide copolymer having a molecular weight of 1.50 or more
An antistatic resin composition for injection molding having excellent surface appearance of a molded product, characterized by containing 0 parts by weight.
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3-272517A JP3006224B2 (en) | 1991-10-21 | Resin composition | |
TW81110523A TW242648B (en) | 1991-10-21 | 1992-12-31 | |
EP93300069A EP0605937B1 (en) | 1991-10-21 | 1993-01-06 | Antistatic resin composition |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3-272517A JP3006224B2 (en) | 1991-10-21 | Resin composition | |
EP93300069A EP0605937B1 (en) | 1991-10-21 | 1993-01-06 | Antistatic resin composition |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH05148404A JPH05148404A (en) | 1993-06-15 |
JP3006224B2 true JP3006224B2 (en) | 2000-02-07 |
Family
ID=
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