JP2983480B2 - Spin processing device - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

[0001] The present invention relates to a spin processing apparatus for rotating a substrate.

[0002]

2. Description of the Related Art For example, in a semiconductor manufacturing apparatus or a liquid crystal manufacturing apparatus, a spin processing apparatus is generally used in order to wash the substrate (semiconductor wafer or glass substrate for liquid crystal) and to dry the washed substrate in a manufacturing process. Used.

In this spin processing apparatus, the substrate is held on a rotating body, the substrate is rotated at a high speed together with the rotating body, and processing such as washing and drying of the substrate is performed by utilizing the centrifugal force generated by the rotation.

Hereinafter, a configuration of a conventional spin processing apparatus will be described with reference to FIGS. A chamber 2 is provided in the spin processing apparatus 1, and a cup 3 is housed inside the chamber 2. A through hole 4 is formed in the center of the bottom surface of the cup body 3, and a rotary shaft 5 is inserted through the through hole 4. The rotating body 6 is connected to the upper end of the rotating shaft 5 so as to be housed inside the cup body 3. A support pin 7 and an engagement pin 8 are attached to the outer peripheral position of the upper surface of the rotating body 6 so that the substrate 9 can be held.

The lower end of the rotating shaft 5 has a first motor 1
0 is connected to rotate the rotating body 6. Above the rotator 6 holding the substrate 9, a processing liquid supply unit 1 for discharging a processing liquid to the substrate 9 is provided.
1 is provided. The processing liquid supply means 11 includes a support shaft 1 protruding upward from an outer side of the cup body 3.
An arm 13 having a predetermined length is formed so as to protrude horizontally from the upper end of the support shaft 12. At the lower end of the support shaft 12, a second motor 14 for rotating and swinging the support shaft 12 at a predetermined speed is attached.

[0006] A predetermined position of the arm body 13 is
A nozzle body 15 for supplying a processing liquid to the nozzle is attached. The processing liquid is supplied to the nozzle body 15 through a tube or the like by supply means (not shown) provided outside.

[0007]

However, the spin processing apparatus 1 having the above configuration has the following problems. That is, the processing liquid supply unit 11 as described above has a problem that the processing with the processing liquid on the substrate 9 cannot be performed well. This is because the rotating speed of the rotating substrate 9 increases as the distance from the center of rotation increases.
With the swing of the processing liquid supply means 11 for supplying the processing liquid to the surface, the processing liquid is not evenly supplied in accordance with the rotation speed of the surface of the substrate 9 which is being rotationally driven.

As a result, the processing of the surface of the substrate 9 cannot be performed uniformly, causing a problem that the processing of the substrate 9 becomes uneven. Further, in the spin processing apparatus 1 as described above, when the processing liquid is sprayed by the rotation of the arm body 13 as described above, it is not possible to uniformly spray the stationary substrate 9 due to the circular motion of the arm body 13. In addition, since the substrate 9 is rotated, the amount of the processing liquid to be jetted by the rotation with respect to the substrate 9 is not further uniform, so that the processing of the substrate 9 becomes uneven.

The present invention has been made based on the above circumstances, and an object of the present invention is to provide a spin processing apparatus capable of relatively uniformly supplying a processing liquid to a substrate surface. It is.

[0010]

According to a first aspect of the present invention, there is provided a spin processing apparatus for rotating a substrate to perform processing by rotating a substrate. A rotating body that holds and rotates the substrate, a first driving unit that rotationally drives the rotating body, an arm body provided above the rotating body, and a predetermined interval at a predetermined position of the arm body Injection of a processing liquid provided with a nozzle and injecting the processing liquid to different positions in the radial direction of the substrate
And a plurality of nozzle bodies whose amounts can be adjusted .

According to a second aspect of the present invention, there is provided the spin processing apparatus according to the first aspect, further comprising second driving means for rotating the arm body on the substrate. According to a third aspect of the present invention, there is provided the spin processing apparatus according to the first aspect, further comprising a second driving unit that linearly drives the arm body or the nozzle body along a radial direction of the substrate. is there.

According to the first aspect of the present invention, the injection amount of the processing liquid for jetting the processing liquid to different positions in the radial direction of the substrate can be adjusted at predetermined positions of the arm body at predetermined intervals. Since a plurality of nozzles are provided, it is possible to adjust and supply the processing liquid relatively uniformly to the surface of the substrate, so that unevenness in the processing of the substrate hardly occurs.

According to the second aspect of the present invention, since there is provided the second driving means for rotating the arm body on the substrate,
The processing time in which the substrate and the processing liquid come into contact with each other near the outer periphery of the substrate and near the rotation center of the substrate can be relatively equal.

According to the third aspect of the present invention, since there is provided the second driving means for driving the arm body or the nozzle body in the radial direction of the substrate, the plurality of nozzle bodies are moved in the radial direction. By this movement, the processing liquid is jetted to a position having a different diameter from the rotation center of the substrate. for that reason,
The processing on the substrate surface can be performed uniformly.

[0015]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS One embodiment of the present invention will be described below with reference to FIGS. The spin processing apparatus 20 has a chamber 21 having an open upper surface, and a substrate 22 can be inserted from the upper surface of the chamber 21 by, for example, a substrate transfer unit (not shown). The chamber 21 has a cylindrical shape, and a side wall 21a having a predetermined height is provided so as to cover the outer periphery.

The lower surface of the chamber 21 is an open portion 21b which is largely open. A discharge path 25 and a rotating shaft 28 which will be described later are provided so as to communicate with the inside of the chamber 21 through the open portion 21b. I have.

Inside the chamber 21, a cup 23 is provided.
Is provided. The cup body 23 is composed of a bottomed lower cup 23a having an open upper surface, and an upper cup 23b which is detachably held at an upper end of the lower cup 23a and is formed so as to decrease its inner diameter as it goes upward. Have been. In the present embodiment, the upper cup 23b
Is provided so as to be vertically drivable with respect to the lower cup 23a.
b may be simply placed on the upper end of the lower cup 23a, and may be configured to be detachable.

The cup body 23 is attached to the bottom surface of the chamber 21 via a support 24. A discharge path 25 for discharging the processing liquid sprayed on the substrate 22 to the outside is formed at a bottom position on the outer peripheral side of the lower cup 23a. A through hole 2 is formed at the center of the bottom surface of the lower cup 23a.
6 are formed. A flange portion 27 is formed on an outer peripheral portion on the upper surface side of the through hole 26 so as to protrude upward, so that the processing liquid does not easily enter the inside through the through hole 26. A rotary shaft 28 is inserted through the through hole 26, and an upper end of the rotary shaft 28 projects into the cup body 23 and is connected to a lower surface of the rotary body 29 at a central position.

Inside the cup body 23, a rotating body 29 on which the substrate 22 is placed is housed. In the present embodiment, the rotating body 29 is a flat plate formed in a rectangular shape,
A rotating shaft 28 is attached to the lower surface of the diagonal center of the flat plate.

On the outer peripheral side of the upper surface of the rotating body 29, the substrate 2
A support pin 30 and an engagement pin 31 which are holding means for holding the holding member 2 are attached. This support pin 30
Is made of a synthetic resin, for example, and has a columnar shape, and its upper end is a pointed portion having a slight flat surface at the top. For this reason, even if the substrate 22 is placed on the support pins 30, the substrate 22 is not damaged.

The engagement pin 31 is provided at a position on the outer side of the support pin 30 and close to the support pin 30. Engagement pin 31
Abuts on the outer peripheral side of the substrate 22 to hold the substrate 22,
It is possible to rotate at high speed together with the rotating body 29.

The lower end of the rotary shaft 28 protruding from the through hole 26 below the lower cup 23a is connected to a first motor 32.
It is connected to. Therefore, when the first motor 32 operates, the rotating body 29 is driven to rotate together with the substrate 22. This first motor 32
Are attached to fixing means (not shown).

A support shaft 33 is provided inside the chamber 21 and outside the cup body 23. The support shaft 33 has an axis in a substantially vertical direction, and has a cylindrical shape. The bottom of the chamber 21 has an insertion hole 34.
Is formed, and the lower end of the support shaft 33 is
1 is provided so as to protrude therefrom. This support shaft 33
A second motor 35 is connected via a coupling 36 to the lower end of the motor. The second motor 35 rotates the support shaft 33 about the axis of the support shaft 33.

At the upper end of the support shaft 33, an arm 37
Are connected so as to project in the horizontal direction. The arm 37 is provided so as to pass above the rotation center of the substrate 22 placed on the rotating body 29 by the rotation of the arm 37. At a predetermined position of the arm body 37, a first nozzle body 38 for injecting the processing liquid to the substrate 22 and a second nozzle body 38 at a predetermined interval from the first nozzle body 38 are provided. Have been.

In the present embodiment, when the arm 37 is rotated, the first nozzle 38 attached to the arm 37 is attached to the arm 37 at the position where the first nozzle 38 is attached to the arm 37. It is provided so as to be located at the rotation center of the substrate 22. For this reason, the first nozzle body 38 supplies the processing liquid to the center side of the substrate 22 in the radial direction.

A second nozzle body 39 is mounted on the center side in the rotation direction of the arm body 37 separated from the first nozzle body 38 by a predetermined distance. This second nozzle body 3
The substrate 9 is provided so as to spray the processing liquid to the outer peripheral side of the substrate 22. Therefore, the substrate 22 is rotated by the first nozzle body 38 on the rotation center side of the substrate 22 and the second nozzle body 39.
Thus, it is possible to simultaneously perform processing on the outer side of a predetermined diameter from the rotation center of the substrate 22.

In this case, in the first nozzle body 38 and the second nozzle body 39, the range of spraying the processing liquid to the substrate 22 by the rotational driving of the arm body 37 is determined. By adjusting the amount of the processing liquid ejected from the nozzle 39 and the interval between the nozzle bodies 38 and 39, the processing of the substrate 22 can be performed well.

The first nozzle body 38 and the second nozzle body 39 are connected to a processing liquid supply source (not shown) provided outside through, for example, a tube or the like. It is provided so that a liquid can be supplied.

The operation of the spin processing apparatus having the above configuration will be described below. After holding the substrate 22 on the rotating body 29, the rotating body 29 is driven to rotate at a predetermined speed. Then, the second motor 35 is driven to rotate the arm body 37 by a predetermined angle. here,
First nozzle body 38 attached to the arm body 37
Is located at the rotation center of the substrate 22 at first, and sprays the processing liquid toward the substrate 22 from this position. The second nozzle body 39 is located radially outward of the first nozzle body 38, and simultaneously ejects the processing liquid at this position.

When the second motor 35 is operated to rotate the arm body 37 at a predetermined speed, the first nozzle body 38 gradually moves radially outward from the rotation center of the substrate 22. The processing liquid is jetted to the substrate 22 while the second nozzle body 39 is also jetted while gradually moving outward in the radial direction.

The processing liquid is sprayed onto the substrate 22 up to the outer peripheral end of the substrate 22, and the first nozzle body 38 is again positioned at the center of rotation of the substrate 22 from the outer peripheral end. The body 37 is rotated in the reverse direction.

This operation is repeated, and processing of the substrate 22 is performed while swinging the arm body 37. According to the spin processing device 20 having such a configuration, the first nozzle body 38 and the second nozzle body 3
Since the arm members 37 are provided at predetermined intervals, if the arm body 37 is driven to rotate by the second motor 35, the processing liquid can be ejected from the rotation center of the substrate 22 to positions having different diameters. Can be.

Therefore, the first nozzle body 38 and the second
By adjusting the distance between the nozzle bodies 39 and the injection amount of each processing liquid, the time when the center side and the outer peripheral side of the substrate 22 rotating at different speeds are in contact with the processing liquid is made equal. Therefore, the processing of the substrate 22 can be made relatively uniform without unevenness.

While the embodiment of the present invention has been described above, the present invention can be variously modified in addition to the above. This is described below. In the above embodiment, the arm 37 is rotated by the second motor 35. In addition, for example, the arm 37 or the nozzles 38 and 39 may be moved in the radial direction of the substrate 22. It is good also as composition which moves linearly along. Again,
By adjusting the attachment positions of the first nozzle body 38 and the second nozzle body 39 to the arm body 37, the substrate 2
2 can be processed relatively uniformly without unevenness.
The number of nozzle bodies attached to the arm body 37 is not limited to the number described above, and may be any number as long as the processing of the substrate 22 can be performed well.

[0035]

As described above, according to the first aspect of the present invention, the processing liquid is sprayed at different positions in the radial direction of the substrate at predetermined positions of the arm body at predetermined intervals.
Since the injection amount of the processing liquid is a plurality of nozzles body adjustable is provided, regulating the relatively uniform treatment liquid to the surface of the substrate
Thus, the substrate can be supplied in a regulated manner , and therefore, unevenness in the processing of the substrate hardly occurs.

According to the second aspect of the present invention, since the second driving means for rotating the arm body on the substrate is provided, the substrate and the processing liquid are separated in the vicinity of the periphery of the substrate and in the vicinity of the center of rotation of the substrate. The processing time in contact can be relatively equal.

According to the third aspect of the present invention, since there is provided the second driving means for driving the arm body or the nozzle body in the radial direction of the substrate, the plurality of nozzle bodies can be moved in the radial direction. The processing liquid is ejected to a position having a different diameter from the rotation center of the substrate. Therefore, it is possible to uniformly perform the processing on the substrate surface.

[Brief description of the drawings]

FIG. 1 is a side sectional view showing a configuration of a spin processing device according to an embodiment of the present invention.

FIG. 2 is a plan view showing a configuration of a spin processing device according to the embodiment.

FIG. 3 is a side sectional view showing a configuration of a conventional spin processing device.

FIG. 4 is a plan view showing a configuration of a conventional spin processing device.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 20 ... Spin processing apparatus 21 ... Chamber 22 ... Substrate 23 ... Cup body 29 ... Rotating body 32 ... 1st motor 33 ... Support shaft 35 ... 2nd motor 37 ... Arm body 38 ... 1st nozzle body 39 ... 2nd Nozzle body

──────────────────────────────────────────────────続 き Continued on the front page (72) Inventor Akira Hara 1000-1, Kasama-cho, Sakae-ku, Yokohama-shi, Kanagawa Prefecture Inside Ofuna Plant of Shibaura Works Co., Ltd. (72) Inventor Hisaaki Miyasako 1000-1, Kasama-cho, Sakae-ku, Yokohama-shi, Kanagawa Stock (72) Inventor of the Ofuna Factory, Shibaura Seisakusho Co., Ltd. (72) Inventor Jinichi Hirose 1000, Kasama-cho, Sakae-ku, Yokohama-shi, Kanagawa Prefecture Inside of Ofuna Factory, Shibaura Seisakusho Co., Ltd. (56) References JP-A-4-44227 (JP, A) (58) Fields investigated (Int. Cl. ⁶ , DB name) H01L 21/304

Claims (3)

(57) [Claims] 1. A spin processing apparatus for performing a process by driving a substrate to rotate, comprising: a cup; a rotator housed inside the cup, holding the substrate and driving the rotator; A first driving unit for causing the arm to be disposed above the rotating body; and a processing liquid provided at a predetermined position on the arm with a predetermined interval to inject the processing liquid to different positions in the radial direction of the substrate. Processing liquid
And a plurality of nozzle bodies whose injection amount can be adjusted . 2. The spin processing apparatus according to claim 1, further comprising second driving means for rotating said arm body on said substrate. 3. The spin processing apparatus according to claim 1, further comprising a second driving unit that linearly drives the arm body or the nozzle body along a radial direction of the substrate.