JP2964367B2 - Mold for optical element molding - Google Patents
Mold for optical element moldingInfo
- Publication number
- JP2964367B2 JP2964367B2 JP3354782A JP35478291A JP2964367B2 JP 2964367 B2 JP2964367 B2 JP 2964367B2 JP 3354782 A JP3354782 A JP 3354782A JP 35478291 A JP35478291 A JP 35478291A JP 2964367 B2 JP2964367 B2 JP 2964367B2
- Authority
- JP
- Japan
- Prior art keywords
- mold
- thin film
- molding
- optical element
- base material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B11/00—Pressing molten glass or performed glass reheated to equivalent low viscosity without blowing
- C03B11/06—Construction of plunger or mould
- C03B11/08—Construction of plunger or mould for making solid articles, e.g. lenses
- C03B11/084—Construction of plunger or mould for making solid articles, e.g. lenses material composition or material properties of press dies therefor
- C03B11/086—Construction of plunger or mould for making solid articles, e.g. lenses material composition or material properties of press dies therefor of coated dies
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2215/00—Press-moulding glass
- C03B2215/02—Press-mould materials
- C03B2215/08—Coated press-mould dies
- C03B2215/10—Die base materials
- C03B2215/12—Ceramics or cermets, e.g. cemented WC, Al2O3 or TiC
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2215/00—Press-moulding glass
- C03B2215/02—Press-mould materials
- C03B2215/08—Coated press-mould dies
- C03B2215/14—Die top coat materials, e.g. materials for the glass-contacting layers
- C03B2215/22—Non-oxide ceramics
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2215/00—Press-moulding glass
- C03B2215/02—Press-mould materials
- C03B2215/08—Coated press-mould dies
- C03B2215/14—Die top coat materials, e.g. materials for the glass-contacting layers
- C03B2215/26—Mixtures of materials covered by more than one of the groups C03B2215/16 - C03B2215/24, e.g. C-SiC, Cr-Cr2O3, SIALON
Description
【０００１】[0001]
【産業上の利用分野】本発明は、プレス成形の後工程で
研磨作業を必要とせず、プレス成形のみにより直ちに高
精度の光学素子を得ることができる新規な成形用型に関
する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a novel molding die capable of immediately obtaining a high-precision optical element only by press molding without requiring a polishing operation in a post-process of press molding.
【０００２】[0002]
【従来の技術】上記のような高精度の光学素子をプレス
成形するための型は、通常、上下一対の型を主要構成部
材としており、これにはつぎの諸特性が要求されてい
る。 １．光学鏡面研磨が容易なこと。 ２．高温耐酸化性に優れ、繰り返し使用しても光学鏡面
が維持されること。 ３．高温下でもガラスの離型性が良いこと。 ４．引っかき傷の生じにくい高い硬度を有すること。 ５．プレス時の衝撃に耐える高温強度を有すること。 しかし、１種類の材料でこれらの諸特性を全て満たすも
のはみいだし難いため、従来から型母材とこの母材の成
形面に適用する被覆材との組み合わせによって、その要
求に答えようとする試みが種々なされている。例えば、
特公昭６３−５９９７１号公報等には、ＷＣ系超硬合金
を母材とし、その表面に炭化チタン、窒化チタンあるい
は炭窒化チタンからなる薄膜を被覆した型等が開示され
ている。2. Description of the Related Art A mold for press-molding a high-precision optical element as described above usually comprises a pair of upper and lower molds as main components, and the following characteristics are required. 1. Easy mirror polishing. 2. Excellent high-temperature oxidation resistance, and the optical mirror surface is maintained even after repeated use. 3. Good release properties of glass even at high temperatures. 4. It must have high hardness to prevent scratches. 5. Have high temperature strength to withstand the impact of pressing. However, since it is difficult to find a material that satisfies all of these characteristics with one kind of material, it has been attempted to meet the demand by combining a mold base material and a coating material applied to the molding surface of the base material. Various attempts have been made. For example,
Japanese Patent Publication No. 63-59971 discloses a mold in which a WC-based cemented carbide is used as a base material and the surface thereof is coated with a thin film made of titanium carbide, titanium nitride or titanium carbonitride.
【０００３】[0003]
【発明が解決しようとする課題】ところで、上記成形用
型の母材の成形面は、予め光学鏡面のレベルまで高精度
に研磨されている必要があるが、上記ＷＣ系超硬合金母
材は、硬度がきわめて大きく、所定の球面あるいは非球
面形状に研削、研磨を行い難く、かつこれらの加工時間
が長くなる欠点がある。また、上記ＷＣ系超硬合金は、
通常種々のバインダーを含有しており、これを母材とす
る成形型を約５００〜６００℃に加熱し、加熱軟化した
ガラスに対しプレス成形を繰り返すと、型母材は再結晶
化してその表面に粒界を生じ、このため被覆された前記
薄膜は、粗面化し易く、かつ密着性を損ない易い。さら
に、ガラスのプレス成形工程の時間を短縮するために
は、型の昇温および降温に時間を要しないことが必要で
あり、そのため型母材は熱伝導率の大きいものが望まれ
るが、ＷＣ系超硬合金は熱伝導率が十分大きいとは云え
ず、このため成形能率は満足すべき水準にはない。本発
明は、光学鏡面を形成するための機械的研削および研磨
が容易であり、また、高温下でガラスのプレス成形を繰
り返しても成形表面の粗面化を生じにくく、そのうえ昇
温および降温の時間を短縮してプレス加工時間を短縮す
ることが可能な光学素子の成形用型を提供することを目
的とする。By the way, the molding surface of the base material of the molding die needs to be polished with high precision up to the level of the optical mirror surface in advance. It has the disadvantage that the hardness is extremely high, grinding and polishing into a predetermined spherical or aspherical shape are difficult, and the processing time is long. Further, the WC-based cemented carbide,
Usually, various binders are contained, and a mold using the base material as a base material is heated to about 500 to 600 ° C., and press molding is repeated for the heat-softened glass. Thus, the coated thin film is liable to be roughened and the adhesion is easily impaired. Further, in order to shorten the time of the glass press forming step, it is necessary that the time for raising and lowering the temperature of the mold does not need to be long. Therefore, it is desired that the mold base material has high thermal conductivity. The cemented carbide cannot be said to have a sufficiently high thermal conductivity, so that the molding efficiency is not at a satisfactory level. The present invention is easy to mechanically grind and polish to form an optical mirror surface, and hardly causes roughening of the forming surface even if press molding of glass is repeated at high temperature, and furthermore, the temperature rise and temperature fall An object of the present invention is to provide a mold for forming an optical element capable of shortening time and shortening press working time.
【０００４】[0004]
【課題を解決するための手段】上述の実情に鑑み、本発
明者等は、種々試験検討を重ねたところ、型母材とし
て、従来から具体的に未だ開示されたことのないタング
ステン・モリブデン基合金が前記諸特性を総合的に兼ね
そなえている点で一段と優れたものであり、また種々の
材料中からこの合金の表面特性を補い、かつこの合金と
の適合性の点で特に選ばれるべき被覆材料として炭素、
窒素および炭窒素のチタン化合物をみいだすことがで
き、本発明をなすに至った。In view of the above-mentioned circumstances, the present inventors have conducted various tests and studies, and as a mold base material, have found that a tungsten-molybdenum-based material which has not been specifically disclosed in the past has been used. The alloy is much more excellent in that it has all of the above-mentioned properties comprehensively, and it should be particularly selected from the viewpoint of compatibility with the alloy and supplementing the surface properties of the alloy from various materials. Carbon as coating material,
Titanium compounds of nitrogen and carbon nitrogen could be found, which led to the present invention.
【０００５】前記目的を達成するための本発明の光学素
子成形用型の特徴は、タングステン・モリブデン基合金
からなる型母材の成形面に炭化チタン、窒化チタンまた
は炭窒化チタンからなる上層薄膜が被覆され、前記タン
グステン・モリブデン基合金は、実質的にタングステン
とモリブデンからなるところにある。A feature of the optical element molding die of the present invention for achieving the above object is that an upper thin film made of titanium carbide, titanium nitride or titanium carbonitride is formed on a molding surface of a mold base material made of a tungsten-molybdenum base alloy. Coated with said tongue
Gusten-molybdenum based alloy is substantially tungsten
And molybdenum .
【０００６】上記本発明の光学素子成形用型は、上記母
材の成形面と上層薄膜との間にＮｉおよび／またはＣｒ
元素を含む中間層薄膜が設けられていることが好まし
い。また、上記上層薄膜および中間層薄膜は、いずれも
イオンプレーティング法により形成されたものであるこ
とが好ましい。In the optical element molding die of the present invention, Ni and / or Cr may be provided between the molding surface of the base material and the upper thin film.
Preferably, an intermediate thin film containing an element is provided. Further, it is preferable that both the upper thin film and the intermediate thin film are formed by an ion plating method.
【０００７】[0007]
【実施例】本発明の光学素子成形用型の好適な一実施例
について説明する。図１は、本発明の成形用型の主要部
の縦断面図である。図において、型母材部１は、バイン
ダーを含有していないタングステン・モリブデン基合金
からなり、外径２０ｍｍ、厚さ１５ｍｍの円柱形状であ
って、その上部成形面２は、直径１０ｍｍ、深さ０．６
ｍｍ、曲率半径２０ｍｍの球面形状を有している。この
成形面２は、#３００、#６００および#１５００のダイ
ヤモンド砥石により研削され、また１．０μｍおよび
０．３μｍのＡｌ2Ｏ3砥粒により研磨されて、表面粗さ
Ｒｍａｘ０．０３μｍの平滑な光学鏡面となっており、
その上部には厚さ２μｍのＴｉＮ上層薄膜が被覆してあ
る。この薄膜は、Ｔｉを蒸発源としてＮ2ガス中にてイ
オンプレーティング法により形成したものである。一
方、比較例として、タングステンカーバイト超硬合金か
らなる型母材の成形面を上記実施例と同一寸法形状に同
様に研削を行い、ついでダイヤモンドペーストを用いて
研磨して平滑な光学鏡面とし、またこの表面に同様にイ
オンプレーティング法により厚さ２μｍのＴｉＮ上層薄
膜を被覆して成形用型とした。DESCRIPTION OF THE PREFERRED EMBODIMENTS A preferred embodiment of the optical element molding die of the present invention will be described. FIG. 1 is a longitudinal sectional view of a main part of a molding die of the present invention. In the figure, a mold base 1 is made of a tungsten-molybdenum-based alloy containing no binder, has a cylindrical shape with an outer diameter of 20 mm and a thickness of 15 mm, and an upper molding surface 2 having a diameter of 10 mm and a depth of 0.6
mm and a spherical shape with a curvature radius of 20 mm. This molding surface 2 is ground with diamond wheels # 300, # 600 and # 1500, and polished with Al 2 O 3 abrasive grains of 1.0 μm and 0.3 μm to form a smooth surface with a surface roughness Rmax of 0.03 μm. It is an optical mirror surface,
The upper part is covered with a 2 μm thick TiN upper thin film. This thin film is formed by ion plating in N 2 gas using Ti as an evaporation source. On the other hand, as a comparative example, the molding surface of a mold base material made of tungsten carbide cemented carbide was ground in the same size and shape as in the above embodiment, and then polished with a diamond paste to obtain a smooth optical mirror surface, This surface was similarly coated with a 2 μm-thick TiN upper layer thin film by an ion plating method to form a molding die.
【０００８】上記実施例の型母材は、比較例のものに比
べ、硬度が約１／２であるため、研削、研磨の作業効率
が勝っていた。上記実施例および比較例の成形用型を用
いてＮ2雰囲気中でホウケイ酸バリウムガラスを６００
℃にてプレス成形したところ、実施例の成形用型は、成
形面に粗面化を生ぜず、約１０００回までプレス成形す
ることができ、優れた平滑面を有する所定形状の光学素
子を得ることができた。これに対し、比較例の成形用型
は、約５００回のプレス成形で寿命となった。また、実
施例の型は比較例の型に比べ型材の熱伝導率が約２倍で
あるため、プレス加工時間の大幅な短縮を行うことがで
きた。[0008] Since the hardness of the mold base material of the above example is about 1/2 compared with that of the comparative example, the work efficiency of grinding and polishing was superior. The barium borosilicate glass was placed in an N 2 atmosphere by using the molds of the above Examples and Comparative Examples.
When pressed at ℃, the forming mold of the example can be pressed up to about 1000 times without causing roughening on the forming surface to obtain an optical element of a predetermined shape having an excellent smooth surface. I was able to. On the other hand, the molding die of the comparative example had a life of about 500 press moldings. In addition, since the thermal conductivity of the mold material of the mold of the example was about twice that of the mold of the comparative example, the press working time could be significantly reduced.
【０００９】なお、本発明の光学素子成形用型の構成
は、上記実施例に限られるものではなく、例えば、上層
薄膜として、イオンプレーティング法により形成したＴ
ｉＣ膜またはＴｉＣＮ膜に変更してもよい。これらのイ
オンプレーティング処理に際しては、ＴｉＣの場合は上
記Ｎ2ガスの代わりにＣＨ4ガスを用い、ＴｉＣＮの場合
にはＣＨ4：Ｎ2＝１：１の混合ガスを用いて約４×１０
-4Ｔｏｒｒの圧力下で行えばよい。また、上記型母材の
成形面と上層薄膜との間に中間層としてＮｉまたはＣｒ
金属あるいはこれらの合金の薄膜をイオンプレーティン
グ法により形成させておくこともできる。また、この中
間層薄膜には、型母材中の成分元素の一部および／また
は上層薄膜中の成分元素の一部を含有させることができ
る。The construction of the mold for molding an optical element of the present invention is not limited to the above embodiment. For example, a T-layer formed by an ion plating method as an upper thin film is used.
It may be changed to an iC film or a TiCN film. At the time of these ion plating treatments, in the case of TiC, a CH 4 gas is used instead of the above-mentioned N 2 gas, and in the case of TiCN, a mixed gas of CH 4 : N 2 = 1: 1 is used and about 4 × 10
It may be performed under a pressure of -4 Torr. Further, Ni or Cr is used as an intermediate layer between the molding surface of the mold base material and the upper thin film.
A thin film of a metal or an alloy thereof can be formed by an ion plating method. Further, this intermediate layer thin film can contain a part of the component elements in the mold base material and / or a part of the component elements in the upper layer thin film.
【００１０】[0010]
【発明の効果】上述のとおり、本発明の光学素子成形用
型は、その基本構成がタングステン・モリブデン基合金
からなる型母材の成形面に上層薄膜としてＴｉＮ、Ｔｉ
ＣまたはＴｉＣＮ材料を被覆したものであるため、機械
的研削および研磨が容易で比較的短時間に光学鏡面を得
ることができ、かつ、高温下でガラスを繰り返しプレス
成形しても成形表面が粗面化しにくく、被覆薄膜の剥離
もないので一段と長寿命が得られ、そのうえ、プレス加
工時間を短縮することができる。As described above, the optical element molding die of the present invention has a basic structure of TiN or Ti as an upper layer thin film on the molding surface of a mold base material made of a tungsten-molybdenum base alloy.
Because it is coated with C or TiCN material, mechanical grinding and polishing are easy, and an optical mirror surface can be obtained in a relatively short time. Since the surface is not easily formed and the coating thin film does not peel off, a longer service life can be obtained, and furthermore, the press working time can be shortened.
【図１】本発明にかかる光学素子成形用型の主要部を示
す実施例縦断面図である。FIG. 1 is a longitudinal sectional view of an embodiment showing a main part of an optical element molding die according to the present invention.
１ 型母材 ２ 母材成形面 ３ 上層薄膜 1 mold base material 2 base material forming surface 3 upper layer thin film
───────────────────────────────────────────────────── フロントページの続き (72)発明者 渡辺 昭太郎 神奈川県相模原市小山１丁目15番30号 株式会社オハラ内 (56)参考文献 特開 平２−26842（ＪＰ，Ａ) 特開 平３−50127（ＪＰ，Ａ) 特開 平３−146428（ＪＰ，Ａ) 特公 昭63−59971（ＪＰ，Ｂ２) (58)調査した分野(Int.Cl.6，ＤＢ名) C03B 11/00 ──────────────────────────────────────────────────続 き Continuation of the front page (72) Inventor Shotaro Watanabe 1-15-30 Koyama, Sagamihara-shi, Kanagawa Pref. Ohara Co., Ltd. (56) References JP-A-2-26842 (JP, A) JP-A-3-3 50127 (JP, A) JP-A-3-146428 (JP, A) JP-B-63-59971 (JP, B2) (58) Fields investigated (Int. Cl. 6 , DB name) C03B 11/00
Claims (4)
る型母材の成形面に炭化チタン、窒化チタンまたは炭窒
化チタンからなる上層薄膜が被覆され、前記タングステ
ン・モリブデン基合金は、実質的にタングステンとモリ
ブデンからなることを特徴とする光学素子成形用型。An upper thin film made of titanium carbide, titanium nitride or titanium carbonitride is coated on a molding surface of a mold base material made of a tungsten-molybdenum-based alloy ,
Molybdenum-based alloys are essentially tungsten and
A mold for molding an optical element, which is made of butene .
および／またはＣｒ元素を含む中間層薄膜を設けたこと
を特徴とする請求項１に記載の光学素子成形用型。2. The method according to claim 1, further comprising the step of providing Ni
The optical element molding die according to claim 1, wherein an intermediate layer thin film containing a Cr element and / or a Cr element is provided.
より形成されていることを特徴とする請求項１または請
求項２に記載の光学素子成形用型。3. The mold for molding an optical element according to claim 1, wherein the upper thin film is formed by an ion plating method.
により形成されていることを特徴とする請求項２に記載
の光学素子成形用型。4. The mold for molding an optical element according to claim 2, wherein the intermediate layer thin film is formed by an ion plating method.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3354782A JP2964367B2 (en) | 1991-12-19 | 1991-12-19 | Mold for optical element molding |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3354782A JP2964367B2 (en) | 1991-12-19 | 1991-12-19 | Mold for optical element molding |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH05170459A JPH05170459A (en) | 1993-07-09 |
| JP2964367B2 true JP2964367B2 (en) | 1999-10-18 |
Family
ID=18439871
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3354782A Expired - Fee Related JP2964367B2 (en) | 1991-12-19 | 1991-12-19 | Mold for optical element molding |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2964367B2 (en) |
-
1991
- 1991-12-19 JP JP3354782A patent/JP2964367B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH05170459A (en) | 1993-07-09 |
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|---|---|---|---|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| LAPS | Cancellation because of no payment of annual fees |