JPH05170457A - Die for forming optical element - Google Patents
Die for forming optical elementInfo
- Publication number
- JPH05170457A JPH05170457A JP35478391A JP35478391A JPH05170457A JP H05170457 A JPH05170457 A JP H05170457A JP 35478391 A JP35478391 A JP 35478391A JP 35478391 A JP35478391 A JP 35478391A JP H05170457 A JPH05170457 A JP H05170457A
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- base material
- optical element
- die
- thin films
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B11/00—Pressing molten glass or performed glass reheated to equivalent low viscosity without blowing
- C03B11/06—Construction of plunger or mould
- C03B11/08—Construction of plunger or mould for making solid articles, e.g. lenses
- C03B11/084—Construction of plunger or mould for making solid articles, e.g. lenses material composition or material properties of press dies therefor
- C03B11/086—Construction of plunger or mould for making solid articles, e.g. lenses material composition or material properties of press dies therefor of coated dies
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2215/00—Press-moulding glass
- C03B2215/02—Press-mould materials
- C03B2215/08—Coated press-mould dies
- C03B2215/10—Die base materials
- C03B2215/11—Metals
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2215/00—Press-moulding glass
- C03B2215/02—Press-mould materials
- C03B2215/08—Coated press-mould dies
- C03B2215/14—Die top coat materials, e.g. materials for the glass-contacting layers
- C03B2215/16—Metals or alloys, e.g. Ni-P, Ni-B, amorphous metals
- C03B2215/17—Metals or alloys, e.g. Ni-P, Ni-B, amorphous metals comprising one or more of the noble meals, i.e. Ag, Au, platinum group metals
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2215/00—Press-moulding glass
- C03B2215/02—Press-mould materials
- C03B2215/08—Coated press-mould dies
- C03B2215/30—Intermediate layers, e.g. graded zone of base/top material
- C03B2215/32—Intermediate layers, e.g. graded zone of base/top material of metallic or silicon material
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は、プレス成形の後工程で
研磨作業を必要とせず、プレス成形のみにより直ちに高
精度の光学素子を得ることができる新規な成形用型に関
する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a novel molding die which can immediately obtain a highly accurate optical element only by press molding without the need for polishing work after the press molding.
【０００２】[0002]
【従来の技術】上記のような高精度の光学素子をプレス
成形するための型は、通常、上下一対の型を主要構成部
材としており、これにはつぎの諸特性が要求されてい
る。 １．光学鏡面研磨が容易なこと。 ２．高温耐酸化性に優れ、繰り返し使用しても光学鏡面
が維持されること。 ３．高温下でもガラスの離型性が良いこと。 ４．引っかき傷の生じにくい高い硬度を有すること。 ５．プレス時の衝撃に耐える高温強度を有すること。 しかし、１種類の材料でこれらの諸特性を全て満たすも
のはみいだし難いため、従来から型母材とこの母材の成
形面に適用する被覆材との組み合わせによって、その要
求に答えようとする試みが種々なされている。例えば、
特開昭６０−２４６２３０号公報等には、ＷＣ系超硬合
金を母材とし、その表面に白金または白金合金からなる
薄膜を被覆した型等が開示されている。2. Description of the Related Art A mold for press-molding a high-precision optical element as described above usually comprises a pair of upper and lower molds as main constituent members, and the following characteristics are required for this. 1. Easy optical mirror polishing. 2. It has excellent high temperature oxidation resistance and maintains the optical mirror surface even after repeated use. 3. Good releasability of glass even at high temperatures. 4. It has a high hardness that does not easily scratch. 5. It must have high-temperature strength to withstand the impact of pressing. However, since it is difficult to find a material that satisfies all of these characteristics with one type of material, we have tried to meet the demand by combining a mold base material and a coating material applied to the molding surface of this base material in the past. Various attempts have been made. For example,
Japanese Unexamined Patent Publication (Kokai) No. 60-246230 discloses a mold in which a WC-based cemented carbide is used as a base material and the surface of which is coated with a thin film of platinum or a platinum alloy.
【０００３】[0003]
【発明が解決しようとする課題】ところで、上記成形用
型の母材の成形面は、予め光学鏡面のレベルまで高精度
に研磨されている必要があるが、上記ＷＣ系超硬合金母
材は、硬度がきわめて大きく、所定の球面あるいは非球
面形状に研削、研磨を行い難く、かつこれらの加工時間
が長くなる欠点がある。また、上記ＷＣ系超硬合金は、
通常種々のバインダーを含有しており、これを母材とす
る成形型を約５００〜６００℃に加熱し、加熱軟化した
ガラスに対しプレス成形を繰り返すと、型母材は再結晶
化してその表面に粒界を生じ、このため被覆された前記
薄膜は、粗面化し易く、かつ密着性を損ない易い。さら
に、ガラスのプレス成形工程の時間を短縮するために
は、型の昇温および降温に時間を要しないことが必要で
あり、そのため型母材は熱伝導率の大きいものが望まれ
るが、ＷＣ系超硬合金は熱伝導率が十分大きいとは云え
ず、このため成形能率は満足すべき水準にはない。本発
明は、光学鏡面を形成するための機械的研削および研磨
が容易であり、また、高温下でガラスのプレス成形を繰
り返しても成形表面の粗面化を生じにくく、そのうえ昇
温および降温の時間を短縮してプレス加工時間を短縮す
ることが可能な光学素子の成形用型を提供することを目
的とする。By the way, the molding surface of the base material of the above-mentioned molding die must be highly accurately polished in advance to the level of an optical mirror surface. However, the WC-based cemented carbide base material is However, the hardness is extremely high, it is difficult to grind and polish into a predetermined spherical or aspherical shape, and the processing time for these is long. Further, the WC-based cemented carbide is
When a mold containing various binders is heated to about 500 to 600 ° C and press-molded repeatedly on the softened glass, the mold base material is recrystallized and its surface is usually contained. Grain boundaries are generated in the thin film, so that the coated thin film is likely to be roughened and the adhesion is likely to be impaired. Furthermore, in order to shorten the time of the glass press-molding process, it is necessary that it does not take time to raise and lower the temperature of the mold. Therefore, it is desirable that the mold base material has a high thermal conductivity. It cannot be said that the thermal conductivity of the cemented carbides is sufficiently high, and therefore the forming efficiency is not at a satisfactory level. INDUSTRIAL APPLICABILITY The present invention is easy to mechanically grind and polish to form an optical mirror surface, and even when press molding of glass is repeated at a high temperature, roughening of the molding surface is less likely to occur, and further, temperature rising and cooling An object of the present invention is to provide a molding die for an optical element, which can shorten the time and the press working time.
【０００４】[0004]
【課題を解決するための手段】上述の実情に鑑み、本発
明者等は、種々試験検討を重ねたところ、型母材とし
て、従来から具体的に未だ開示されたことのないタング
ステン・モリブデン基合金が前記諸特性を総合的に兼ね
そなえている点で一段と優れたものであり、また種々の
材料中からこの合金の表面特性を補い、かつこの合金と
の適合性の点で特に選ばれるべき被覆材料として、貴金
属合金をみいだすことができ、本発明をなすに至った。In view of the above-mentioned circumstances, the inventors of the present invention have conducted various tests and examinations, and as a result, as a mold base material, a tungsten / molybdenum-based material which has not been specifically disclosed in the past has been disclosed. The alloy is much more excellent in that it has all of the above-mentioned properties in total, and it should be selected especially from the viewpoint of complementing the surface properties of this alloy from various materials and compatibility with this alloy. A precious metal alloy can be found as a coating material, and the present invention has been completed.
【０００５】前記目的を達成するための本発明の光学素
子成形用型の特徴は、タングステン・モリブデン基合金
からなる型母材の成形面に、白金（Ｐｔ）を主体とし、
イリジウム（Ｉｒ）、オスミウム（Ｏｓ）、ロジウム
（Ｒｈ）、金（Ａｕ）、パラジウム（Ｐｄ）、ルテニウ
ム（Ｒｕ）およびレニウム（Ｒｅ）からなる群より選ば
れた少なくとも１種類の元素を含有する白金合金の上層
薄膜が被覆されているところにある。The optical element molding die of the present invention for achieving the above object is characterized in that platinum (Pt) is mainly formed on a molding surface of a die base material made of a tungsten-molybdenum-based alloy,
Platinum containing at least one element selected from the group consisting of iridium (Ir), osmium (Os), rhodium (Rh), gold (Au), palladium (Pd), ruthenium (Ru) and rhenium (Re). It is where the upper layer thin film of the alloy is coated.
【０００６】上記本発明の光学素子成形用型は、上記母
材の成形面と上層薄膜との間に主成分としてＮｉおよび
／またはＣｒ元素を含む中間層薄膜が設けられているこ
とが好ましい。この中間層薄膜には、上記型母材および
／または上層薄膜中に含まれる少なくとも１種類の元素
を含ませることもできる。あるいは、この中間層薄膜の
型母材側に型母材中の少なくとも１種類の元素を含ま
せ、またその上層薄膜側に上層薄膜中の少なくとも１種
類の元素を含ませることもできる。上記上層薄膜および
中間層薄膜は、いずれもスパッター法により形成された
ものであることが好ましい。In the optical element molding die of the present invention, it is preferable that an intermediate layer thin film containing Ni and / or Cr element as a main component is provided between the molding surface of the base material and the upper thin film. The intermediate layer thin film may contain at least one element contained in the mold base material and / or the upper layer thin film. Alternatively, the mold base material side of the intermediate layer thin film may contain at least one element in the mold base material, and the upper layer thin film side may contain at least one kind of element in the upper layer thin film. It is preferable that both the upper layer thin film and the intermediate layer thin film are formed by a sputtering method.
【０００７】[0007]
【実施例】本発明の光学素子成形用型の好適な一実施例
について説明する。図１は、本発明の成形用型の主要部
の縦断面図である。図において、型母材部１は、バイン
ダーを含有していないタングステン・モリブデン基合金
からなり、外径２０ｍｍ、厚さ１５ｍｍの円柱形状であ
って、その上部成形面２は、直径１０ｍｍ、深さ０．６
ｍｍ、曲率半径２０ｍｍの球面形状を有している。この
成形面２は、#３００、#６００および#１５００のダイ
ヤモンド砥石により研削され、ついで１．０μｍおよび
０．３μｍのＡｌ2Ｏ3砥粒により研磨されて、表面粗さ
Ｒｍａｘ０．０３μｍの平滑な光学鏡面となっている。
成形面２の上にはマグネトロンスパッタリング法を用い
て１０-3ＴｏｒｒのＡｒ雰囲気中で形成させたＣｒの中
間層薄膜３が設けてある。また、中間層薄膜３の上には
同じくマグネトロンスパッタリング法により１０-3Ｔｏ
ｒｒのＡｒ雰囲気（３００℃）中で形成させたＰｔ：Ｉ
ｒ＝７０：３０（ｗｔ％）の白金・イリジウム合金の上
層薄膜４（厚さ３μｍ）が被覆してある。一方、比較例
として、タングステンカーバイト超硬合金からなる型母
材の成形面を上記実施例と同一寸法形状に同様に研削を
行い、ついでダイヤモンドペーストを用いて研磨して平
滑な光学鏡面とし、またこの表面に同様にしてＣｒの中
間層薄膜を設け、また白金・イリジウム合金の上層薄膜
を被覆して成形用型とした。EXAMPLE A preferred example of the optical element molding die of the present invention will be described. FIG. 1 is a vertical cross-sectional view of the main part of the molding die of the present invention. In the figure, the mold base material part 1 is made of a tungsten-molybdenum-based alloy containing no binder and has a cylindrical shape with an outer diameter of 20 mm and a thickness of 15 mm, and its upper molding surface 2 has a diameter of 10 mm and a depth. 0.6
mm, and a radius of curvature of 20 mm. The molding surface 2 was ground with a # 300, # 600 and # 1500 diamond grindstone and then with Al 2 O 3 abrasive grains of 1.0 μm and 0.3 μm to obtain a smooth surface with a surface roughness Rmax of 0.03 μm. It is an optical mirror surface.
On the molding surface 2, an intermediate thin film 3 of Cr formed by an magnetron sputtering method in an Ar atmosphere of 10 −3 Torr is provided. Further, on the intermediate thin film 3, 10 −3 To is also formed by the magnetron sputtering method.
Pt: I formed in Ar atmosphere (300 ° C.) of rr
An upper layer thin film 4 (thickness 3 μm) of a platinum / iridium alloy of r = 70: 30 (wt%) is coated. On the other hand, as a comparative example, the molding surface of the mold base material made of tungsten carbide cemented carbide was similarly ground to the same size and shape as in the above example, and then polished with a diamond paste to give a smooth optical mirror surface, A Cr intermediate layer thin film was similarly provided on this surface, and a platinum / iridium alloy upper layer thin film was coated to obtain a molding die.
【０００８】上記実施例の型母材は、比較例のものに比
べ、硬度が約１／２であるため、研削、研磨の作業効率
が勝っていた。上記実施例および比較例の成形用型を用
いてＮ2雰囲気中でホウケイ酸バリウムガラスを６００
℃にてプレス成形したところ、実施例の成形用型は、成
形面に粗面化を生ぜず、約１０００回までプレス成形す
ることができ、優れた平滑面を有する所定形状の光学素
子を得ることができた。これに対し、比較例の成形用型
は、約５００回のプレス成形で寿命となった。また、実
施例の型は比較例の型に比べ型材の熱伝導率が約２倍で
あるため、プレス加工時間の大幅な短縮を行うことがで
きた。The mold base material of the above-mentioned embodiment has a hardness of about 1/2 of that of the comparative example, and therefore the working efficiency of grinding and polishing was superior. Using the molding dies of the above Examples and Comparative Examples, 600 barium borosilicate glass was placed in an N 2 atmosphere.
When press-molded at 0 ° C., the molding die of the example does not roughen the molding surface and can be press-molded up to about 1000 times to obtain an optical element with a predetermined shape having an excellent smooth surface. I was able to do it. On the other hand, the molding die of the comparative example reached the end of its life after press molding about 500 times. Further, since the mold of the example has a thermal conductivity of the mold material about twice that of the mold of the comparative example, the press working time could be significantly shortened.
【０００９】なお、本発明の光学素子成形用型の構成
は、上記実施例に限られるものではなく、例えば、上層
薄膜としてマグネトロンスパッタリング法により形成し
たＯｓ、Ｒｈ、Ａｕ、Ｐｄ、ＲｕまたはＲｅとの白金合
金、あるいは金属酸化物等を添加して硬度を高め、粒界
の発生を抑止した白金合金等の薄膜に変更することもで
きる。The structure of the optical element molding die of the present invention is not limited to the above-mentioned embodiment, and for example, Os, Rh, Au, Pd, Ru or Re formed by magnetron sputtering as the upper thin film can be used. The platinum alloy or the metal oxide may be added to increase the hardness, and the thin film may be changed to a platinum alloy or the like in which generation of grain boundaries is suppressed.
【００１０】[0010]
【発明の効果】上述のとおり、本発明の光学素子成形用
型は、その基本構成がタングステン・モリブデン基合金
からなる型母材の成形面に上層薄膜として白金合金材料
を被覆したものであるため、機械的研削および研磨が容
易で比較的短時間に光学鏡面を得ることができ、かつ、
高温下でガラスを繰り返しプレス成形しても成形表面が
粗面化しにくく、被覆薄膜の剥離もないので一段と長寿
命が得られ、そのうえ、プレス加工時間を短縮すること
ができる。As described above, the optical element molding die of the present invention has a basic structure in which the molding surface of a die base material made of a tungsten-molybdenum-based alloy is coated with a platinum alloy material as an upper layer thin film. , Mechanical grinding and polishing are easy, an optical mirror surface can be obtained in a relatively short time, and
Even if the glass is repeatedly press-molded at a high temperature, the molding surface is not likely to be roughened, and the coating thin film is not peeled off, so that a longer life can be obtained and the pressing time can be shortened.
【図１】本発明にかかる光学素子成形用型の主要部を示
す実施例縦断面図である。FIG. 1 is a vertical cross-sectional view of an embodiment showing a main part of an optical element molding die according to the present invention.
１ 型母材 ２ 母材成形面 ３ 中間層薄膜 ４ 上層薄膜 1 type base material 2 base material molding surface 3 intermediate layer thin film 4 upper layer thin film
───────────────────────────────────────────────────── フロントページの続き (72)発明者 渡辺 昭太郎 神奈川県相模原市小山１丁目15番30号 株 式会社オハラ内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Shotaro Watanabe 1-15-30 Koyama, Sagamihara City, Kanagawa Prefecture Ohara, Inc.
Claims (4)
る型母材の成形面に白金（Ｐｔ）を主体とし、イリジウ
ム（Ｉｒ）、オスミウム（Ｏｓ）、ロジウム（Ｒｈ）、
金（Ａｕ）、パラジウム（Ｐｄ）、ルテニウム（Ｒｕ）
およびレニウム（Ｒｅ）からなる群より選ばれた少なく
とも１種類の元素を含有する白金合金の上層薄膜が被覆
されていることを特徴とする光学素子成形用型。1. A platinum base material is used as a main component of a molding base material made of a tungsten-molybdenum-based alloy, and iridium (Ir), osmium (Os), rhodium (Rh),
Gold (Au), Palladium (Pd), Ruthenium (Ru)
And a platinum alloy upper layer thin film containing at least one element selected from the group consisting of rhenium (Re), and an optical element molding die.
分としてＮｉおよび／またはＣｒ元素を含む中間層薄膜
を設けたことを特徴とする請求項１に記載の光学素子成
形用型。2. The optical element molding according to claim 1, wherein an intermediate thin film containing Ni and / or Cr element as a main component is provided between the molding surface of the mold base material and the upper thin film. Type.
れていることを特徴とする請求項１または請求項２に記
載の光学素子成形用型。3. The optical element molding die according to claim 1, wherein the upper thin film is formed by a sputtering method.
されていることを特徴とする請求項２に記載の光学素子
成形用型。4. The optical element molding die according to claim 2, wherein the intermediate thin film is formed by a sputtering method.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP35478391A JPH05170457A (en) | 1991-12-19 | 1991-12-19 | Die for forming optical element |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP35478391A JPH05170457A (en) | 1991-12-19 | 1991-12-19 | Die for forming optical element |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH05170457A true JPH05170457A (en) | 1993-07-09 |
Family
ID=18439879
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP35478391A Pending JPH05170457A (en) | 1991-12-19 | 1991-12-19 | Die for forming optical element |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH05170457A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7232624B2 (en) * | 2002-03-13 | 2007-06-19 | Samsung Sdi Co., Ltd. | Membrane and electrode assembly, production method of the same and fuel cell employing the same |
-
1991
- 1991-12-19 JP JP35478391A patent/JPH05170457A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7232624B2 (en) * | 2002-03-13 | 2007-06-19 | Samsung Sdi Co., Ltd. | Membrane and electrode assembly, production method of the same and fuel cell employing the same |
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