JP2959581B2 - Developing device and cleaning method thereof - Google Patents
Developing device and cleaning method thereofInfo
- Publication number
- JP2959581B2 JP2959581B2 JP25188990A JP25188990A JP2959581B2 JP 2959581 B2 JP2959581 B2 JP 2959581B2 JP 25188990 A JP25188990 A JP 25188990A JP 25188990 A JP25188990 A JP 25188990A JP 2959581 B2 JP2959581 B2 JP 2959581B2
- Authority
- JP
- Japan
- Prior art keywords
- developing
- tank
- developing device
- developer
- cleaning
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Description
【発明の詳細な説明】 〔概 要〕 半導体装置を製造するときのリソグラフィ工程におい
て、レジストを現像するディップ型現像装置及びその洗
浄方法に関し、 パーティクルによる現像不良を防止することを目的と
し、レジストを現像するディップ型現像装置において、
その現像槽の液面レベル周囲の複数箇所に超音波発生器
を配設してなるように構成する。DETAILED DESCRIPTION OF THE INVENTION [Summary] The present invention relates to a dip type developing apparatus for developing a resist and a method of cleaning the same in a lithography process when manufacturing a semiconductor device. In a dip type developing device for developing,
An ultrasonic generator is provided at a plurality of locations around the liquid level of the developing tank.
また上記現像槽に洗浄液を満し、複数の超音波発生器
を１個ずつ順次作動させて該現像槽を洗浄するように構
成する。Further, the developing tank is filled with a cleaning liquid, and a plurality of ultrasonic generators are sequentially operated one by one to wash the developing tank.
また現像槽内面の液面レベル周囲に洗浄液を噴射でき
るノズルを回転可能に、且つ槽外に退避可能に設けるよ
うに構成する。Further, a nozzle capable of spraying a cleaning liquid around the liquid level inside the developing tank is rotatably provided and retractable outside the tank.
〔産業上の利用分野〕 本発明は半導体装置を製造するときのリソグラフィ工
程において、レジストを現像するディップ型現像装置及
びその洗浄方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a dip-type developing device for developing a resist in a lithography process when manufacturing a semiconductor device, and a cleaning method thereof.
従来のディップ型現像装置は第３図に示すように現像
槽１に有機溶剤からなる現像液２を満たしておき、露光
済の被現像材３をディッピングして現像するようになっ
ている。なお現像液２はフィルタ及びポンプ４を通して
循環して使用される。また被現像材３は現像槽に浸漬さ
れる前にエアーガンなどを使用してパーティクルを除去
して現像液２にパーティクルが混入するのを防止してい
る。As shown in FIG. 3, the conventional dip type developing device is configured such that a developing tank 1 is filled with a developing solution 2 made of an organic solvent, and the exposed material 3 is dipped and developed. The developer 2 is circulated through a filter and a pump 4 for use. Before the material 3 to be developed is immersed in the developing tank, the particles are removed by using an air gun or the like to prevent the particles from being mixed into the developer 2.
上記従来のディップ型現像装置では、寸法制御性に優
れているが、パーティクルの付着による現像不良が多い
という問題があった。このパーティクルは外部から混入
するものよりも現像液中に溶けだしたレジストがカップ
内壁に付着、乾燥したものが再付着することで発生す
る、レジスト残渣不良のものの方が多い。The above-mentioned conventional dip type developing device is excellent in dimensional controllability, but has a problem that there are many defective developments due to adhesion of particles. These particles are more likely to be defective in resist residue, caused by the resist dissolved in the developer adhering to the inner wall of the cup and re-adhering to the dried ones than the particles mixed in from the outside.
本発明は上記従来の問題点に鑑み、パーティクルによ
る現像不良を防止した現像装置及びその洗浄方法を提供
することを目的とする。SUMMARY OF THE INVENTION The present invention has been made in consideration of the above-described conventional problems, and has as its object to provide a developing device and a method of cleaning the same in which defective development due to particles is prevented.
上記目的を達成するため本発明の現像装置では、レジ
ストを現像するディップ型現像装置において、その現像
槽10の液面レベル周囲の複数個所に超音波発生器12−１
〜12−４を配設してなることを特徴とする。In the developing device of the present invention for achieving the above object, in a dip type developing device for developing the resist, an ultrasonic generator at a plurality of peripheral edge of the liquid surface level thereof developer tank 10 12- 1
～12- 4, characterized in that formed by disposing.
また本発明の洗浄方法では、上記現像槽10を用い、該
現像槽10に洗浄液13を満たし、複数の超音波発生器12−
１〜12−４を１個ずつ順次作動させて該現像槽10を洗浄
することを特徴とする。Further, in the cleaning method of the present invention, the developing tank 10 is used, the developing tank 10 is filled with a cleaning liquid 13, and a plurality of ultrasonic generators 12- are used.
1 ～12- 4 are sequentially operated one by one, characterized by washing the developing tank 10.
さらに本発明の現像装置では、レジストを現像する現
像装置において、その現像槽10内面の液面レベル周囲に
洗浄液13を噴射できるノズル14を回転可能に且つ槽外に
退避可能に設けたことを特徴とする。Further, in the developing device of the present invention, in a developing device for developing a resist, a nozzle 14 capable of spraying a cleaning liquid 13 around a liquid level of an inner surface of the developing tank 10 is provided rotatably and retractable outside the tank. And
液面レベル周囲の複数個所に超音波発生器12−１〜12
−４を設けた現像槽10に洗浄液13を満し、複数個の超音
波発生器12−１〜12−４を１個ずつ順次作動させること
により、複数の超音波発生器12−１〜12−４から発生す
る超音波が互いに干渉することなく、液面レベル付近に
付着しているレジスト残渣を効率良く除去し洗浄するこ
とができる。Ultrasonic generator at a plurality of ambient liquid level 12- 1-12
- 4 a cleaning liquid 13 is fully in the developing tank 10 provided with, by sequentially operating a plurality of ultrasonic generator 12 1 ～12- 4 one by one, a plurality of ultrasonic generators 12 1 to 12 - 4 without ultrasonic waves interfere with each other generated from, can resist residues adhering in the vicinity of the liquid level efficiently removed and washed.
また現像槽10に、液面レベル周囲に洗浄液13を噴射で
きるノズル14を回転可能に且つ槽外に退避可能に設ける
ことにより、現像槽10の液面レベル周囲に付着するレジ
スト残渣を洗浄でき、且つ現像液を入れて被現像材を現
像するときはノズル14を槽外に退避させることができる
ため、被現像材の出し入れに邪魔になることはない。In addition, by providing the developing tank 10 with a nozzle 14 capable of spraying the cleaning liquid 13 around the liquid level so as to be rotatable and retractable outside the tank, it is possible to wash the resist residue adhering around the liquid level of the developing tank 10, In addition, when the developing solution is charged and the developing material is developed, the nozzle 14 can be retracted out of the tank, so that there is no hindrance to taking the developing material in and out.
〔実施例〕 第１図は本発明の現像装置の第１の実施例を示す図で
あり、（ａ）は平面図、（ｂ）はａ図のｂ−ｂ線におけ
る断面図である。Embodiment FIG. 1 is a view showing a first embodiment of the developing device of the present invention, wherein (a) is a plan view and (b) is a cross-sectional view taken along the line bb of FIG.
同図において、10は現像槽、11は現像液、12−１〜12
−４は振動板及び超音波振動素子からなる超音波発生器
である。In the figure, the developing tank 10, 11 developer, 12- 1-12
Reference numeral 4 denotes an ultrasonic generator including a diaphragm and an ultrasonic vibration element.
本実施例は同図に示すように、現像槽10に複数個の超
音波発生器12−１〜12−４を設けたもので、該超音波発
生器12−１〜12−４は現像槽10に所定量の現像液11を満
たしたときの液面レベルの周囲にほぼ等間隔に配置され
ている。This embodiment, as shown in the figure, a plurality of ultrasonic generators in the developing tank 10 12 1 ～12- 4 in which the provided, ultrasonic generator 12 1 ～12- 4 developing tank They are arranged at substantially equal intervals around the liquid level when 10 is filled with a predetermined amount of developer 11.
次に、このように構成された本実施例の現像装置を用
いた本発明の洗浄方法を第１図により説明する。Next, a cleaning method of the present invention using the developing apparatus of the present embodiment having the above-described configuration will be described with reference to FIG.
先ず使用済の現像液11を抜き取った後洗浄液（例えば
有機溶剤又はアルカリ溶液）13を二点鎖線で示すように
現像液11の液面より高い位置まで満たす。次に超音波発
生器12−１〜12−４を１個ずつ順次作動させる。First, after the used developer 11 is removed, a cleaning solution (for example, an organic solvent or an alkaline solution) 13 is filled up to a position higher than the liquid level of the developer 11 as shown by a two-dot chain line. Then sequentially actuating the ultrasonic generator 12 1 ～12- 4 one by one.
このように洗浄することにより、超音波作用により現
像槽内の付着物を除去することができる。現像槽におい
て、レジスト残渣は特に現像液の液面レベル付近に付着
し易いが、本実施例では超音波発生器の位置をレジスト
残渣の付着し易い部分に対向させているため効率良く付
着物を除去することができる。なお超音波発生器を１個
ずつ順次作用させるのは、２個以上の超音波発生器を同
時に作用させると、洗浄液内で２つの超音波が干渉して
その勢力が弱まるのを防止するためである。By performing the washing in this manner, the deposits in the developing tank can be removed by the ultrasonic action. In the developing tank, the resist residue easily adheres particularly in the vicinity of the liquid level of the developer, but in this embodiment, the position of the ultrasonic generator is opposed to the portion where the resist residue easily adheres, so that the adhering matter can be efficiently removed. Can be removed. The reason why the ultrasonic generators are sequentially operated one by one is to prevent two ultrasonic waves from being simultaneously actuated in the cleaning liquid to prevent the ultrasonic waves from weakening when two or more ultrasonic generators are simultaneously operated. is there.
第２図は本発明の現像装置の第２の実施例を示す図で
あり、（ａ）は平面図、（ｂ）はａ図のｂ−ｂ線におけ
る断面図である。FIG. 2 is a view showing a second embodiment of the developing device of the present invention, in which (a) is a plan view and (b) is a cross-sectional view taken along the line bb in FIG.
同図において、10は現像槽、14は洗浄液噴射ノズルで
あり、該噴射ノズル14は噴射する洗浄液13が現像槽10の
現像液々面レベル周囲に当るような角度で設けられ、且
つ可動アーム15の一端に回転可能に支持され、ウォーム
ギア16とモータ17により垂直軸回りに回転されるように
なっている。また該ノズル14は回転管接手18を介して洗
浄液供給用ホース19に接続されている。アーム15は他端
を円形断面の支柱20に回動可能に支持されており、該支
柱20に固定ねじ21で固定された固定アーム22にエアシリ
ンダー23で連結され、該エアシリンダー23を動作するこ
とにより回動されるようになっている。In FIG. 1, reference numeral 10 denotes a developing tank, and 14 denotes a cleaning liquid injection nozzle. The injection nozzle 14 is provided at an angle such that the cleaning liquid 13 to be injected hits the surface of the developer in the developing tank 10 at each surface level. Is rotatably supported at one end thereof, and is rotated about a vertical axis by a worm gear 16 and a motor 17. The nozzle 14 is connected to a cleaning liquid supply hose 19 via a rotary pipe joint 18. The other end of the arm 15 is rotatably supported by a column 20 having a circular cross section. The arm 15 is connected to a fixed arm 22 fixed to the column 20 with a fixing screw 21 by an air cylinder 23 to operate the air cylinder 23. Thus, it is rotated.
このように構成された本実施例の作用は、先ず使用済
の現像液11を抜き取った後、モータ17を作動させてウォ
ームギア16を回転させることによりノズル14を回転させ
ながら洗浄液供給用ホース19から洗浄液を供給し、ノズ
ル14から洗浄液13を噴射する。噴射された洗浄液13は現
像槽10の現像液々面レベル付近に付着したレジスト残渣
を効率良く除去し洗浄することができる。洗浄後はエア
シリンダー23を作動させ、可動アーム15と共にノズル14
を現像槽10外に退避させる。これにより次回の現像の際
の被現像材の出し入れの邪魔とならない。本実施例によ
れば前実施例に比し洗浄液の使用量が少量で良い。The operation of the present embodiment having the above-described structure is as follows. First, the used developer 11 is extracted, and then the motor 17 is operated to rotate the worm gear 16 to rotate the nozzle 14 from the cleaning liquid supply hose 19 while rotating. The cleaning liquid is supplied, and the cleaning liquid 13 is jetted from the nozzle 14. The jetted cleaning liquid 13 can efficiently remove and wash the resist residue attached near the level of each developer in the developing tank 10. After cleaning, the air cylinder 23 is operated, and the nozzle 14 is
Out of the developing tank 10. This does not hinder the loading and unloading of the developing material in the next development. According to this embodiment, the amount of the cleaning liquid used may be smaller than that of the previous embodiment.
以上説明した様に、本発明によれば、現像槽の現像液
々面レベル付近に付着したレジスト残渣を効率良く除去
でき、被現像材の歩留り向上に寄与することができる。As described above, according to the present invention, it is possible to efficiently remove the resist residue attached near the level of the developer in the developing tank and to contribute to the improvement of the yield of the developing material.
第１図は本発明の現像装置の第１の実施例を示す図、 第２図は本発明の現像装置の第２の実施例を示す図、 第３図は従来のディップ型現像装置を示す図である。 図において、 10は現像槽、 11は現像液、 12-1〜12-4は超音波発生器、 13は洗浄液、 14はノズル、 15は可動アーム、 16はウォームギア、 17はモータ、 18は回転管接手 19は洗浄液供給ホース、 20は支柱、 21は固定ねじ、 22は固定アーム、 23はエアシリンダー を示す。FIG. 1 is a diagram showing a first embodiment of the developing device of the present invention, FIG. 2 is a diagram showing a second embodiment of the developing device of the present invention, and FIG. 3 is a conventional dip type developing device. FIG. In the figure, 10 is a developing tank, 11 is a developing solution, 12 -1 to 12 -4 are ultrasonic generators, 13 is a cleaning liquid, 14 is a nozzle, 15 is a movable arm, 16 is a worm gear, 17 is a motor, and 18 is rotating. The pipe joint 19 is a cleaning liquid supply hose, 20 is a column, 21 is a fixing screw, 22 is a fixing arm, and 23 is an air cylinder.
───────────────────────────────────────────────────── フロントページの続き (58)調査した分野(Int.Cl.6，ＤＢ名) H01L 21/027 G03F 7/30 501 ──────────────────────────────────────────────────続 き Continued on front page (58) Field surveyed (Int.Cl. 6 , DB name) H01L 21/027 G03F 7/30 501
Claims (3)
おいて、 その現像槽（10）の液面レベル周囲の複数個所に超音波
発生器（12−１〜12−４）を配設してなることを特徴と
する現像装置。1. A dipping type developing device for developing the resist, to become by disposing an ultrasonic generator in a plurality of locations around the liquid level (12 1 ～12- 4) of the developer tank (10) A developing device.
槽（10）に洗浄液（13）を満たし、複数の超音波発生器
（12−１〜12−４）を１個ずつ順次作動させて該現像槽
（10）を洗浄することを特徴とする洗浄方法。Wherein using the developing apparatus according to claim 1, wherein said filled with washing liquid (13) to the developer tank (10), sequentially operating a plurality of ultrasonic generators (12 1 ～12- 4) one by one Cleaning the developing tank (10).
おいて、その現像槽（10）内面の液面レベル周囲に洗浄
液（13）を噴射できるノズル（14）を回転可能に且つ槽
外に退避可能に設けたことを特徴とする現像装置。3. A dip type developing apparatus for developing a resist, wherein a nozzle (14) capable of spraying a cleaning liquid (13) around a liquid level inside an inner surface of a developing tank (10) is rotatable and retractable out of the tank. A developing device, comprising:
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP25188990A JP2959581B2 (en) | 1990-09-25 | 1990-09-25 | Developing device and cleaning method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP25188990A JP2959581B2 (en) | 1990-09-25 | 1990-09-25 | Developing device and cleaning method thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH04132209A JPH04132209A (en) | 1992-05-06 |
| JP2959581B2 true JP2959581B2 (en) | 1999-10-06 |
Family
ID=17229456
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP25188990A Expired - Fee Related JP2959581B2 (en) | 1990-09-25 | 1990-09-25 | Developing device and cleaning method thereof |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2959581B2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6691719B2 (en) * | 2001-01-12 | 2004-02-17 | Applied Materials Inc. | Adjustable nozzle for wafer bevel cleaning |
-
1990
- 1990-09-25 JP JP25188990A patent/JP2959581B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH04132209A (en) | 1992-05-06 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |