JP2958948B2 - Semiconductor device - Google Patents
Semiconductor deviceInfo
- Publication number
- JP2958948B2 JP2958948B2 JP30784393A JP30784393A JP2958948B2 JP 2958948 B2 JP2958948 B2 JP 2958948B2 JP 30784393 A JP30784393 A JP 30784393A JP 30784393 A JP30784393 A JP 30784393A JP 2958948 B2 JP2958948 B2 JP 2958948B2
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- Prior art keywords
- resin
- weight
- parts
- support electrode
- protective resin
- Prior art date
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Description
【0001】[0001]
【産業上の利用分野】本発明は半導体装置、特に電気的
特性に悪影響を与える有害物質の内部への侵入を防止で
きる半導体装置に関連する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor device, and more particularly to a semiconductor device capable of preventing a harmful substance having an adverse effect on electrical characteristics from entering the inside.
【0002】[0002]
【従来の技術】例えば、実公平4−52999号公報に
示されるように、自動車に使用される交流発電機(オル
タネータ)の出力を整流する素子として、軟質樹脂、即
ちラバー状樹脂で半導体チップを封止した樹脂封止ダイ
オードが公知である。この樹脂封止ダイオードを図3に
ついて説明する。2. Description of the Related Art For example, as disclosed in Japanese Utility Model Publication No. 4-52999, a semiconductor chip made of a soft resin, that is, a rubber-like resin, is used as an element for rectifying the output of an AC generator (alternator) used in an automobile. Sealed resin-sealed diodes are known. This resin-sealed diode will be described with reference to FIG.
【0003】ダイオード1は、平坦なベース部2a及び
ベース部2aから屈曲して伸び出す側部2bを有して凹
部2cの形成された椀形の支持電極2と、フランジ状の
ヘッダー3a及びヘッダー3aより小さい横断面を有す
るリード部3bからなるリード電極3と、ベース部2a
とヘッダー3aとの間に接続された半導体チップ4と、
凹部2c内に充填され且つ半導体チップ4を封止するシ
リコン樹脂5とを備えている。半導体チップ4の上面4
a及び下面4bは、それぞれ半田6によりヘッダー3a
の下面3a1及びベース部2aの上面2a1に接着されて
いる。The diode 1 has a flat base portion 2a, a bowl-shaped support electrode 2 having a side portion 2b bent and extending from the base portion 2a and formed with a concave portion 2c, a flange-shaped header 3a and a header 3a. 3a, a lead electrode 3 comprising a lead portion 3b having a smaller cross section, and a base portion 2a.
A semiconductor chip 4 connected between the semiconductor chip 4 and the header 3a;
A silicon resin 5 that fills the recess 2 c and seals the semiconductor chip 4. Upper surface 4 of semiconductor chip 4
a and the lower surface 4b are respectively connected to the header 3a by the solder 6.
It is bonded to the upper surface 2a 1 of the lower surface 3a 1 and the base portion 2a.
【0004】半導体チップ4が作動時に発生する熱を放
熱する椀形の支持電極2のベース部2aは、約1mmの
厚さを有する。また、ベース部2aから屈曲して伸び出
す側部2bは、直径約9.5mm、高さ約2.3mm及び
厚さ約0.5mmの環状である。リード電極3のヘッダ
ー3aは、約5mmの直径と約0.5mmの厚さを有す
る。ヘッダー3aから上方に伸びるリード部3bは、約
1.5mmの直径で約18mmの長さを有する。リード
部3bにはU字形のベンド部3b1が形成される。しか
し、U字形のベンド部3b1を設けずに、リード部3b
を直線状に形成してもよい。The base 2a of the bowl-shaped support electrode 2, which radiates heat generated when the semiconductor chip 4 operates, has a thickness of about 1 mm. The side portion 2b that bends and extends from the base portion 2a is a ring having a diameter of about 9.5 mm, a height of about 2.3 mm, and a thickness of about 0.5 mm. The header 3a of the lead electrode 3 has a diameter of about 5 mm and a thickness of about 0.5 mm. The lead 3b extending upward from the header 3a has a diameter of about 1.5 mm and a length of about 18 mm. The lead portion 3b bends 3b 1 of the U-shaped is formed. However, without providing the bent portions 3b 1 of the U-shaped lead portion 3b
May be formed linearly.
【0005】半導体チップ4の両主面4a、4bにはニ
ッケル電極(図示せず)が形成されている。半田6は、
鉛(Pb)95重量%、錫(Sn)5重量%のPb−S
n系合金である。椀形の支持電極2及びリード電極3
は、ニッケルが被覆された銅材である。シリコン樹脂5
は、椀形の支持電極2の凹部2cから少し盛り上がるよ
うに形成され、半導体チップ4の側面4c、ヘッダー3
aに続くリード部3bの下部及び椀形の支持電極2の凹
部2c側を被覆する。また、シリコン樹脂5は、椀形の
支持電極2に半導体チップ4とリード電極3を固着した
後に椀形の支持電極2の凹部2cに樹脂形成用粘液を注
ぎ、熱処理を施して形成される。A nickel electrode (not shown) is formed on both main surfaces 4a and 4b of the semiconductor chip 4. Solder 6
Pb-S with 95% by weight of lead (Pb) and 5% by weight of tin (Sn)
It is an n-based alloy. Bowl-shaped support electrode 2 and lead electrode 3
Is a copper material coated with nickel. Silicon resin 5
Are formed so as to slightly rise from the concave portion 2c of the bowl-shaped support electrode 2, and the side surface 4c of the semiconductor chip 4 and the header 3
The lower portion of the lead portion 3b following the portion a and the concave portion 2c side of the bowl-shaped support electrode 2 are covered. The silicon resin 5 is formed by fixing the semiconductor chip 4 and the lead electrode 3 to the bowl-shaped support electrode 2 and then pouring a resin-forming mucus into the recess 2 c of the bowl-shaped support electrode 2 and performing a heat treatment.
【0006】[0006]
【発明が解決しようとする課題】ところで、シリコン樹
脂5は支持電極2を形成する金属に対して熱膨張係数及
び硬化収縮が大きいため、支持電極2との接着界面にお
いて剥離が生じ易く、電気的特性を低下させるおそれが
あった。即ち、シリコン樹脂5の支持電極2及びリード
電極3との接着は、酸やアルカリの存在によって分断さ
れやすい。しかも、シリコン樹脂5を固化する熱処理工
程では、シリコン樹脂5に収縮が伴い、矢印A及びBで
示す接着部にストレスが集中する。このため、接着部A
及びBにおいてシリコン樹脂5がリード電極3のリード
部3b又は椀形の支持電極2の上部2b2の表面から剥
離しやすい状態になる。従って、厳しい環境の下でダイ
オード1を長期間使用すると、接着部A及びBを起点と
してリード電極3のリード部3b又は椀形の支持電極2
の側部2bの表面に沿ってシリコン樹脂5の剥離が進行
し、最終的にはヘッダー3aの上面3a2及び側面3a3
又は椀形の支持電極2の側部2bの内面2b1及びベー
ス部2aの上面2a1を経て、半導体チップ4の側面4
cにまでシリコン樹脂5の剥離が達することがある。こ
のように剥離が進行した状態では、ダイオード1は、シ
リコン樹脂5の剥離部から半導体チップ4の側面4cに
侵入する水分やイオン性不純物等の有害物質により、逆
方向電流が増加するなどの特性不良が生じる。However, since the silicon resin 5 has a large thermal expansion coefficient and a large curing shrinkage with respect to the metal forming the support electrode 2, the silicon resin 5 easily peels off at the bonding interface with the support electrode 2, and the electrical connection between the silicon resin 5 and the metal is difficult. There is a possibility that the characteristics are deteriorated. That is, the adhesion of the silicon resin 5 to the support electrode 2 and the lead electrode 3 is easily broken by the presence of an acid or an alkali. In addition, in the heat treatment step of solidifying the silicon resin 5, the silicon resin 5 shrinks, and stress concentrates on the bonded portions indicated by arrows A and B. Therefore, the bonding portion A
And silicone resin 5 becomes easy peel state from the lead part 3b or bowl-shaped upper portion 2b 2 of the surface of the support electrode 2 of the lead electrode 3 in B. Therefore, when the diode 1 is used for a long period of time in a severe environment, the lead portion 3b of the lead electrode 3 or the bowl-shaped support electrode 2 starts from the bonding portions A and B.
Peeling the silicon resin 5 proceeds along the surface of the side 2b of the upper surface 3a of the ultimately header 3a 2 and the side surface 3a 3
Alternatively, the side surface 4 of the semiconductor chip 4 passes through the inner surface 2b 1 of the side portion 2b of the bowl-shaped support electrode 2 and the upper surface 2a 1 of the base portion 2a.
The peeling of the silicon resin 5 may reach c. In the state in which the peeling has progressed, the diode 1 has characteristics such as an increase in the reverse current due to harmful substances such as moisture and ionic impurities penetrating into the side surface 4c of the semiconductor chip 4 from the peeled portion of the silicon resin 5. Failure occurs.
【0007】この問題を解決するためにシリコン樹脂に
シリカ粉末を含有させて熱膨張係数を小さくして、保護
樹脂の熱膨張係数を支持電極の熱膨張係数に近づける方
法が公知になっている。この保護樹脂では、通常の環境
下では剥離が生じない。しかしながら、保護樹脂に水分
が付着した状態で電界中に配置して、電界が印加される
と、剥離防止効果が損なわれることが判明した。[0007] In order to solve this problem, a method has been known in which a silicon resin contains silica powder to reduce the coefficient of thermal expansion so that the coefficient of thermal expansion of the protective resin approaches the coefficient of thermal expansion of the support electrode. With this protective resin, peeling does not occur under a normal environment. However, it has been found that when the protective resin is placed in an electric field in a state where moisture is attached to the protective resin and an electric field is applied, the separation preventing effect is impaired.
【0008】そこで本発明は、厳しい環境下で使用して
も保護樹脂が支持電極から剥離せずに、電気的特性に悪
影響を与える有害物質の内部への侵入を阻止する能力の
大きい半導体装置を提供することを目的とする。Accordingly, the present invention provides a semiconductor device having a high ability to prevent harmful substances having an adverse effect on electrical characteristics from entering into the inside without causing the protective resin to peel off from the support electrode even when used in a severe environment. The purpose is to provide.
【0009】[0009]
【課題を解決するための手段】本発明による半導体装置
は、銅を主成分とする金属により形成され且つ凹部を有
する支持電極(2)と、リード電極(3)と、支持電極(2)の
凹部(2c)の底部とリード電極(3)との間に接続された半
導体チップ(4)と、凹部(2c)内に充填され且つ半導体チ
ップ(4)を被覆する保護樹脂(7)とを備え、自動車用交流
発電機の出力整流素子として使用する。保護樹脂(7)
は、100重量部のシリコン樹脂と、80〜140重量
部のフィラー材とを含有し、フィラー材はシリカ粉末と
アルミナ粉末を有し、シリカ粉末の含有率はシリコン樹
脂100重量部に対して20〜50重量部である。本発
明では、保護樹脂(7)に水分が付着した状態で電界が印
加された場合にも保護樹脂(7)が支持電極(2)から剥離し
ない。A semiconductor device according to the present invention comprises a support electrode (2) formed of a metal containing copper as a main component and having a recess, a lead electrode (3), and a support electrode (2). The semiconductor chip (4) connected between the bottom of the recess (2c) and the lead electrode (3), and the protective resin (7) filling the recess (2c) and covering the semiconductor chip (4). For use as an output rectifier for automotive alternators. Protection resin (7)
Contains 100 parts by weight of a silicone resin and 80 to 140 parts by weight of a filler material, and the filler material has silica powder and alumina powder. 5050 parts by weight. In the present invention, the protection resin (7) does not peel off from the support electrode (2) even when an electric field is applied in a state where moisture is attached to the protection resin (7).
【0010】[0010]
【作用】保護樹脂(7)に含まれるシリカ粉末及びアルミ
ナ粉末はシリコン樹脂よりも熱膨張係数が小さく、保護
樹脂(7)の熱膨張係数を低減して支持電極(2)との熱膨張
係数差を減少する作用がある。保護樹脂(7)は、シリカ
粉末とアルミナ粉末から成るフィラー材をシリコン樹脂
100重量部に対して80〜140重量部の範囲で含有
するので、良好な熱膨張係数と硬化収縮率を備える。ま
た、シリコン樹脂100重量部に対して20重量部以上
の含有割合でフィラー中に混入されるシリカ粉末は保護
樹脂(7)中に均一に分布して、保護樹脂(7)全体が均質に
なる。また、シリコン樹脂100重量部に対して50重
量部以下の含有割合でフィラー中にシリカ粉末を混入す
るので、保護樹脂(7)に水分が付着した状態で電界が印
加されても保護樹脂(7)が支持電極(2)から剥離せず、特
に厳しい環境に曝露される自動車用交流発電機の出力整
流素子として有害物質の侵入を有効に阻止することがで
きる。[Function] The silica powder and the alumina powder contained in the protective resin (7) have a smaller coefficient of thermal expansion than the silicon resin, and the coefficient of thermal expansion of the protective resin (7) is reduced to thereby increase the coefficient of thermal expansion with the support electrode (2). It has the effect of reducing the difference. Since the protective resin (7) contains the filler material composed of silica powder and alumina powder in the range of 80 to 140 parts by weight with respect to 100 parts by weight of the silicon resin, the protective resin (7) has a good coefficient of thermal expansion and a good cure shrinkage. In addition, the silica powder mixed into the filler at a content of 20 parts by weight or more with respect to 100 parts by weight of the silicone resin is uniformly distributed in the protective resin (7), and the entire protective resin (7) becomes homogeneous. . Further, since silica powder is mixed into the filler at a content of 50 parts by weight or less with respect to 100 parts by weight of the silicone resin, even if an electric field is applied while moisture is attached to the protective resin (7), the protective resin (7 ) Does not peel off from the support electrode (2), and can effectively prevent intrusion of harmful substances as an output rectifying element of an automotive alternator exposed to a particularly severe environment.
【0011】[0011]
【実施例】次に、自動車用整流ダイオードに適用した本
発明による半導体装置の実施例を図1について説明す
る。図1では、図2に示す箇所と同一の部分には同一符
号を付し、説明を省略する。FIG. 1 shows an embodiment of a semiconductor device according to the present invention applied to a rectifier diode for an automobile. In FIG. 1, the same portions as those shown in FIG. 2 are denoted by the same reference numerals, and description thereof will be omitted.
【0012】図1に示す本実施例の整流ダイオード10
は、シリカ粒末とアルミナ粉末からなるフィラー材を含
有するシリコン樹脂によって保護樹脂7を構成した点で
図3に示す従来の整流ダイオード1と異なる。A rectifier diode 10 according to the present embodiment shown in FIG.
3 differs from the conventional rectifier diode 1 shown in FIG. 3 in that the protective resin 7 is made of a silicon resin containing a filler material composed of silica powder and alumina powder.
【0013】本実施例の保護樹脂7は、シリコン樹脂1
00重量部に対してフィラー材を110重量部含有す
る。また、フィラー材中のシリカ粉末の割合はシリコン
樹脂100重量部に対して40重量部であり、残部はア
ルミナ粉末である。In this embodiment, the protective resin 7 is made of silicon resin 1
The filler material is contained in an amount of 110 parts by weight based on 00 parts by weight. The ratio of the silica powder in the filler material was 40 parts by weight with respect to 100 parts by weight of the silicone resin, and the balance was alumina powder.
【0014】本発明の硬化を確認するため、図1と同一
の構造を備えシリカ粉末の含有量が相違する多数の整流
ダイオードサンプルを製作して、電界品質試験を行っ
た。各サンプルを塩水中に浸漬した後、恒温槽内に配置
してサンプル中の水分を蒸発させ、支持電極2とリード
電極3との間に所定の電圧を印加して保護樹脂7と支持
電極2との接着状態を検査した。In order to confirm the curing of the present invention, a number of rectifier diode samples having the same structure as in FIG. 1 but having different silica powder contents were manufactured and subjected to an electric field quality test. After each sample is immersed in salt water, the sample is placed in a thermostat to evaporate water in the sample, and a predetermined voltage is applied between the support electrode 2 and the lead electrode 3 to apply the predetermined voltage to the protective resin 7 and the support electrode 2. The state of adhesion with the sample was inspected.
【0015】図2に示すグラフは、フィラー材中のシリ
カ粉末の含有率を変化させた多数の整流ダイオードサン
プルの電界品質試験の結果を示す。シリカ粉末含有率が
シリコン樹脂100重量部に対して50重量部を超える
サンプル及び20重量部に満たないサンプルは8回未満
の試験回数で保護樹脂7と支持電極2の界面に剥離が見
られた。この理由は、シリカ粉末の含有量が50重量%
を超えると、シリカ粉末中に不純物として含まれるSi
O(一酸化けい素)及びSi(けい素)等の未反応物が
悪影響を及ぼし、また、シリカ粉末の含有率が20重量
部に満たないと、シリカ粉末に比べて比重の大きいアル
ミナ粉末の含有率が相対的に増加して、フィラー材が保
護樹脂7中に均一に分布しないためと考えられる。な
お、フィラー材を全てアルミナ粉末としたときはフィラ
ー材の沈降が著しく、剥離防止効果が十分に発揮されな
いことが確認された。The graph shown in FIG. 2 shows the results of an electric field quality test of a number of rectifier diode samples in which the content of the silica powder in the filler material was changed. Samples having a silica powder content of more than 50 parts by weight and less than 20 parts by weight with respect to 100 parts by weight of the silicone resin showed peeling at the interface between the protective resin 7 and the support electrode 2 in less than 8 tests. . The reason is that the content of silica powder is 50% by weight.
Is exceeded, Si contained as impurities in the silica powder
Unreacted substances such as O (silicon monoxide) and Si (silicon) have an adverse effect, and when the content of the silica powder is less than 20 parts by weight, alumina powder having a larger specific gravity than the silica powder is used. It is considered that the content rate is relatively increased and the filler material is not uniformly distributed in the protective resin 7. In addition, when all the filler materials were made of alumina powder, the sedimentation of the filler material was remarkable, and it was confirmed that the effect of preventing peeling was not sufficiently exhibited.
【0016】本発明に基づく保護樹脂7は、100重量
部のシリコン樹脂と、80〜140重量部のフィラー材
とを含有する。シリコン樹脂100重量部に対して、シ
リカ粉末及びアルミナ粉末から構成されるフィラー材を
80〜140重量部含有する保護樹脂は、良好な熱膨張
係数と硬化収縮率を備え、しかも硬化後に支持電極に良
好に密着する。フィラー材の含有率が80重量部に満た
ない場合及び140重量部を超える場合、所望の熱膨張
係数と硬化収縮率が得られない。また、本発明に基づく
フィラー材がシリカ粉末とアルミナ粉末を有し、シリカ
粉末の含有率がシリコン樹脂100重量部に対して20
〜50重量部であるから、水分が付着した状態で電界が
印加されても剥離が生じないし、フィラー材を保護樹脂
中に均一に分布させることができる。The protective resin 7 according to the present invention contains 100 parts by weight of a silicone resin and 80 to 140 parts by weight of a filler material. The protective resin containing 80 to 140 parts by weight of a filler material composed of silica powder and alumina powder with respect to 100 parts by weight of the silicon resin has a good thermal expansion coefficient and a curing shrinkage rate, and furthermore, after curing, is used as a support electrode. Good adhesion. If the content of the filler material is less than 80 parts by weight or more than 140 parts by weight, desired thermal expansion coefficient and curing shrinkage cannot be obtained. Further, the filler material according to the present invention has a silica powder and an alumina powder, and the content of the silica powder is 20 parts by weight with respect to 100 parts by weight of the silicone resin.
Since it is 50 parts by weight, even if an electric field is applied in a state where moisture is attached, no separation occurs, and the filler material can be uniformly distributed in the protective resin.
【0017】本発明の実施態様は前記の実施例に限定さ
れず、変更が可能である。自動車用整流ダイオード以外
の半導体装置にも本発明を適用することができる。ま
た、保護樹脂7中には、フィラー材の外に、本発明の効
果が阻害されない範囲内で、硬化促進剤、軟化剤、接着
剤等他の添加剤を混入させてもよい。The embodiments of the present invention are not limited to the above-described embodiments, but can be modified. The present invention can be applied to semiconductor devices other than rectifier diodes for automobiles. In addition, other additives such as a curing accelerator, a softening agent, and an adhesive may be mixed into the protective resin 7 in addition to the filler material as long as the effects of the present invention are not impaired.
【0018】[0018]
【発明の効果】本発明による半導体装置では、水分が付
着した状態で電界が印加されるような厳しい環境の下で
使用されても、封止樹脂体と電極との剥離が進行し難
く、有害物質の侵入を阻止する能力が強化された信頼性
の高い半導体装置を得ることができる。According to the semiconductor device of the present invention, even if the semiconductor device is used in a severe environment in which an electric field is applied in a state where moisture is attached, peeling between the sealing resin body and the electrode hardly progresses, which is harmful. A highly reliable semiconductor device with an enhanced ability to prevent entry of a substance can be obtained.
【図1】 自動車用整流ダイオードに適用した本発明に
よる半導体装置の断面図FIG. 1 is a cross-sectional view of a semiconductor device according to the present invention applied to an automotive rectifier diode.
【図2】 シリカ粉末の含有量の変化と試験回数との関
係を示すグラフFIG. 2 is a graph showing the relationship between the change in the content of silica powder and the number of tests.
【図3】 従来の自動車用整流ダイオードの断面図FIG. 3 is a cross-sectional view of a conventional rectifier diode for an automobile.
2..支持電極、 2a..ベース部、 2b..側部、
2c..凹部、 3..リード電極、 3a..ヘッダ
ー、 3b..リード部、 4..半導体チップ、
6..半田、7..保護樹脂、2. . Support electrode, 2a. . Base part, 2b. . side,
2c. . Recess, 3. . Lead electrode, 3a. . Header, 3b. . Lead part, 4. . Semiconductor chips,
6. . 6. solder, . Protective resin,
Claims (1)
つ凹部を有する支持電極と、リード電極と、前記支持電
極の凹部の底部と前記リード電極との間に接続された半
導体チップと、前記凹部内に充填され且つ該半導体チッ
プを被覆する保護樹脂とを備え、自動車用交流発電機の
出力整流素子として使用する半導体装置において、 前記保護樹脂は、100重量部のシリコン樹脂と、80
〜140重量部のフィラー材とを含有し、前記フィラー
材はシリカ粉末とアルミナ粉末を有し、前記シリカ粉末
の含有率は前記シリコン樹脂100重量部に対して20
〜50重量部であり、 前記保護樹脂に水分が付着した状態で電界が印加された
場合にも前記保護樹脂が前記支持電極から剥離しないこ
とを特徴とする半導体装置。A support electrode formed of a metal containing copper as a main component and having a recess; a lead electrode; a semiconductor chip connected between a bottom of the recess of the support electrode and the lead electrode; A semiconductor resin used as an output rectifying element of an automotive alternator, comprising a protective resin filled in the recess and covering the semiconductor chip, wherein the protective resin comprises 100 parts by weight of silicone resin;
To 140 parts by weight of a filler material, wherein the filler material has silica powder and alumina powder, and the content of the silica powder is 20 to 100 parts by weight of the silicon resin.
50 parts by weight, wherein the protective resin does not peel off from the support electrode even when an electric field is applied in a state where moisture is attached to the protective resin.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP30784393A JP2958948B2 (en) | 1993-12-08 | 1993-12-08 | Semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP30784393A JP2958948B2 (en) | 1993-12-08 | 1993-12-08 | Semiconductor device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH07161877A JPH07161877A (en) | 1995-06-23 |
JP2958948B2 true JP2958948B2 (en) | 1999-10-06 |
Family
ID=17973863
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP30784393A Expired - Fee Related JP2958948B2 (en) | 1993-12-08 | 1993-12-08 | Semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2958948B2 (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4479577B2 (en) | 2005-04-28 | 2010-06-09 | 株式会社日立製作所 | Semiconductor device |
JP5331322B2 (en) | 2007-09-20 | 2013-10-30 | 株式会社日立製作所 | Semiconductor device |
-
1993
- 1993-12-08 JP JP30784393A patent/JP2958948B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
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JPH07161877A (en) | 1995-06-23 |
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