JP2952957B2 - Continuous surface treatment equipment - Google Patents
Continuous surface treatment equipmentInfo
- Publication number
- JP2952957B2 JP2952957B2 JP10644790A JP10644790A JP2952957B2 JP 2952957 B2 JP2952957 B2 JP 2952957B2 JP 10644790 A JP10644790 A JP 10644790A JP 10644790 A JP10644790 A JP 10644790A JP 2952957 B2 JP2952957 B2 JP 2952957B2
- Authority
- JP
- Japan
- Prior art keywords
- processing
- processing chamber
- surface treatment
- chamber
- continuous surface
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Description
【発明の詳細な説明】 〔産業上の利用分野〕 本発明は不活性ガスで満たした処理室内を布等の被処
理材を通過させつつ表面蒸着処理を行う連続表面処理装
置に関する。Description: BACKGROUND OF THE INVENTION The present invention relates to a continuous surface treatment apparatus that performs a surface vapor deposition treatment while passing a material such as a cloth through a treatment chamber filled with an inert gas.
一対の処理電極を収納した容器（処理室）内に不活性
ガスを充満させ、上記処理電極間でグロー放電を発生さ
せて、両処理電極間を通過する布等の被処理材表面に蒸
着処理を行う装置では、処理室内の大気を真空排気装置
で排気したのち、上記不活性ガスを送給してガス置換す
る。A container (processing chamber) containing a pair of processing electrodes is filled with an inert gas, a glow discharge is generated between the processing electrodes, and a deposition process is performed on a surface of a material to be processed such as a cloth passing between the processing electrodes. After the atmosphere in the processing chamber is evacuated by a vacuum exhaust device, the inert gas is supplied to replace the gas.
このため、従来は、第５図に示す如く、処理室10の被
処理材導入口11、被処理材送出口12をロール対41A、41B
で塞ぐようにしているが、処理室内全体の圧力を所定の
圧力になるまで真空排気しなくてはならない上、被処理
材導入口11、被処理材送出口12からの真空漏れ分も排気
しなくてはならないので、、真空排気装置として、かな
り大形のものを必要とし、高価になるという問題があっ
た。For this reason, conventionally, as shown in FIG. 5, the processing material inlet 11 and the processing material outlet 12 of the processing chamber 10 are connected to the roll pair 41A, 41B.
It is necessary to evacuate the entire pressure of the processing chamber to a predetermined pressure, and also evacuate the vacuum leakage from the processing material introduction port 11 and the processing material delivery port 12. Since it has to be indispensable, a considerably large-sized evacuation device is required, and there is a problem that it becomes expensive.
本発明は上記問題を解消するためになされたもので、
真空排気時には、完全真空シール状態で排気することが
でき、処理室内全体の真空排気を必要とせず、従来に比
し小型の真空排気装置を用いることができる連続表面処
理装置を提供することを目的とする。The present invention has been made to solve the above problems,
An object of the present invention is to provide a continuous surface treatment apparatus that can be evacuated in a completely vacuum sealed state during vacuum evacuation, does not require evacuation of the entire processing chamber, and can use a smaller evacuation apparatus than before. And
本発明は上記目的を達成するため、処理室内を真空排
気して処理ガスと置換し、被処理材を、大気圧以上の処
理ガスで満たされた上記処理室を通過させつつ該被処理
材の表面処理を行う表面処理装置において、 端面相互対接して処理室内に副室を区画可能な一対の
筒状可動体と、両可動体を同軸に支持する支持装置を設
け、一方の可動体は、上記処理室の被処理材導入口を真
空シール性を確保して摺動可能に貫通して外部に伸び、
他の可動体は上記処理室の被処理材送出口を真空シール
性を確保して摺動可能に貫通して外部に伸びる構造と
し、上記両可動体は、通常運転時、上記端面相互が所定
間隔を隔てる第１位置へ位置決めされ、真空排気時に
は、上記端面が真空シール性を確保して相互対接する第
２位置へ駆動される構成としたものである。In order to achieve the above object, the present invention evacuates the processing chamber and replaces the processing gas with a processing gas, and passes the processing target material through the processing chamber filled with the processing gas at atmospheric pressure or higher. In a surface treatment apparatus for performing surface treatment, a pair of cylindrical movable bodies capable of partitioning a sub-chamber in a processing chamber by mutually contacting end surfaces, and a support device for coaxially supporting both movable bodies are provided. The material introduction port of the processing chamber is slidably penetrated through the material introduction port of the processing chamber to secure the vacuum sealing property and extends to the outside,
The other movable body has a structure in which the processing material feed port of the processing chamber is slidably penetrated and extends to the outside while securing vacuum sealing property, and the two movable bodies have a predetermined mutual end face during normal operation. The end faces are positioned at a first position with an interval therebetween, and are driven to a second position where they are in contact with each other during vacuum evacuation while ensuring vacuum sealing.
請求項２では、通常運転時、被処理材が通過する間隙
を隔てて対向する一対の放電用処理電極を有する場合
に、両電極を、処理室外に設けた昇降装置により個別昇
降可能に支持する構成とした。According to the second aspect, in a normal operation, when a pair of discharge processing electrodes facing each other with a gap through which the material passes is provided, both electrodes are supported so as to be individually liftable by a lifting device provided outside the processing chamber. The configuration was adopted.
請求項３では、支持装置は、ローラ列からなる構成と
し、請求項４では、支持装置がローラ列とレール体から
なり、可動体の一方端部に該レール体上を転動する車輪
が設けられている構成とした。According to a third aspect of the present invention, the support device is configured by a row of rollers. In a fourth aspect, the support device is configured by a row of rollers and a rail body, and a wheel that rolls on the rail body is provided at one end of the movable body. Configuration.
〔作用〕 本発明では、一対の可動体は、端面相互対接状態に位
置決めされると、処理室内に副室を区画するので、処理
室内全体の空間からこの副室分を除いた空間が真空排気
の対象となり、その分、排気すべき空気量が低減し、ま
た、処理室外部とは、完全に真空シールされた状態とな
るので、前記した真空漏れ分を排気する必要がないの
で、小型の真空排気装置で済ませることができる。[Operation] In the present invention, when the pair of movable bodies are positioned so as to be in contact with each other, the sub-chamber is partitioned in the processing chamber. Therefore, the space excluding the sub-chamber from the entire space of the processing chamber is evacuated. Since it becomes a target of exhaustion, the amount of air to be exhausted is reduced by that amount, and since the outside of the processing chamber is completely vacuum-sealed, it is not necessary to exhaust the above-mentioned vacuum leakage, so that the size is small. Can be completed by the vacuum exhaust device.
以下、本発明の１実施例を図面を参照して説明する。 Hereinafter, an embodiment of the present invention will be described with reference to the drawings.
第１図および第２図において、Ａは被処理材、10は処
理室、11は処理室10の被処理材導入口、12は処理室10の
被処理材送出口である。13は所定長さを有する筒状の可
動体であって、処理室10の被処理材導入口11側外部に設
けられたローラ列14Aおよび処理室10の内部に設けられ
たローラ列14Bからなる支持装置14上に支持されて、被
処理材導入口11に全周で密に摺動可能に嵌合して該被処
理材導入口11を貫通している。被処理材導入口11は該導
入口11と可動体13との間に良好な真空シール性を持たせ
るために充分な巾Ｗを持たせてある。15は所定長さを有
する筒状の可動体であって、処理室10の被処理材送出口
12側外部に設けられたローラ列16Aおよび処理室10の内
部に設けられたローラ列16Bからなる支持装置16上に支
持されて、被処理材送出口12に全周で密に、摺動可能に
嵌合して該被処理材送出口12を貫通している。被処理材
導入口12は該導入口12と可動体15との間に良好な真空シ
ール性を持たせるために充分な巾Ｗを持たせてある。In FIGS. 1 and 2, A is a material to be processed, 10 is a processing chamber, 11 is an inlet for the material to be processed in the processing chamber 10, and 12 is an outlet for the material to be processed in the processing chamber 10. Reference numeral 13 denotes a cylindrical movable body having a predetermined length, which includes a roller row 14A provided outside the processing material introduction port 11 side of the processing chamber 10 and a roller row 14B provided inside the processing chamber 10. It is supported on the support device 14 and fits slidably and tightly around the workpiece inlet 11 on the entire circumference and penetrates the workpiece inlet 11. The material inlet 11 has a sufficient width W between the inlet 11 and the movable body 13 to provide a good vacuum seal. Reference numeral 15 denotes a cylindrical movable body having a predetermined length, and
It is supported on a support device 16 composed of a roller row 16A provided on the outside of the 12 side and a roller row 16B provided inside the processing chamber 10, and can be densely slid around the workpiece feeding port 12 all around. , And penetrates through the workpiece outlet 12. The material inlet 12 has a sufficient width W between the inlet 12 and the movable body 15 to provide good vacuum sealing.
21Pおよび21Nは互いに対向する板状の処理電極であっ
て、処理電極21Pは支持ロッド22で支持され、この支持
ロッド22は処理室10の天井に設けた絶縁ブロック23内を
密に、摺動可能に貫通して処理室10外に伸び、上端に形
成された係合部22Aを絶縁物24を介して昇降機構29に連
結されている。この係合部22Aは受電部を兼ねており、
給電線25を介して高周波電源31に接続されている。処理
電極21Nも支持ロッド26に支持され、この支持ロッド26
は処理室10の床に設けたガイド筒部27を密に、摺動可能
に貫通して下に伸び、下端に形成された係合部26Aを昇
降機構30に連結されている。この係合部26Aは接地線28
でアースされている。21P and 21N are plate-shaped processing electrodes facing each other, and the processing electrode 21P is supported by a support rod 22, and the support rod 22 slides tightly in an insulating block 23 provided on the ceiling of the processing chamber 10. It penetrates as much as possible and extends out of the processing chamber 10, and an engaging portion 22 A formed at the upper end is connected to an elevating mechanism 29 via an insulator 24. This engagement part 22A also serves as a power receiving part,
The power supply line 25 is connected to the high-frequency power supply 31. The processing electrode 21N is also supported by the support rod 26.
Is extended densely and slidably through a guide tube portion 27 provided on the floor of the processing chamber 10, and an engaging portion 26 A formed at the lower end is connected to the elevating mechanism 30. This engagement portion 26A is
Grounded.
この構成において、処理電極21Pと21N間にグロー放電
を生起させて、両電極間を通過する被処理材Ａの表裏に
蒸着処理を行う通常進展時は、可動体13と15は第１図に
示す第１位置に位置決められ、図示しない係止機構で該
位置に保持される。即ち、可動体13と15は各々の一方端
部13B、15Bが被処理材導入口11、被処理材送出口12近傍
に臨む位置まで退避しており、処理電極21P、21Nは各々
下降、上昇駆動された所要の放電間隙Ｇを隔てている。
本実施例では、この放電間隙Ｇは可動体13、15の外径よ
り大きくない値となっている。In this configuration, during normal development in which a glow discharge is generated between the processing electrodes 21P and 21N and vapor deposition processing is performed on the front and back surfaces of the processing target material A passing between the two electrodes, the movable bodies 13 and 15 are as shown in FIG. 1 and is held at this position by a locking mechanism (not shown). That is, the movable bodies 13 and 15 are retracted to positions where one end portions 13B and 15B of the movable members 13 and 15 face the vicinity of the processing material introduction port 11 and the processing material delivery port 12, respectively, and the processing electrodes 21P and 21N are respectively lowered and raised. A required discharge gap G driven is separated.
In this embodiment, the discharge gap G has a value not larger than the outer diameter of the movable bodies 13 and 15.
処理室10内を不活性ガスで置換する作業工程において
は、第２図に示す如く、処理電極21P、21Nを各々上昇、
下降させて、両者の対向間隔を可動体13、15の外径より
充分に大きくしたのち、可動体13、15を、両者の一方端
面13B、15Bが相互に圧接して真空シール性が確保される
第２位置まで、処理室10内へ押し込み、図示しない上記
係止機構でこの位置に保持する。可動体13と15の肉厚は
上記圧接により真空シール性を確保するに充分な肉厚を
持たせてある。これにより、処理室10内は該処理室内面
と可動体13、15の外周面とで囲まれ、外部に対して実質
上完全に真空シールされた室Ｘと、可動体13、15が作る
筒状の室（以下、副室という）Ｙに区分される。この可
動体13と15の第２位置への位置決めが終わると、図示し
ない真空排気装置を駆動して、室Ｘ内の大気を排気し、
該室Ｘ内の圧力が所定圧力まで低下すると、図示しない
不活性ガスタンクから室Ｘ内に送給する。室Ｘ内の不活
性ガスのガス圧が大気圧以上の所定圧力まで上昇する
と、不活性ガスの送給を継続しながら、可動体13、15を
前記した第１位置へ向けて、徐々に移動させ、処理電極
21P、21Nも放電間隙Ｇを隔てる位置まで移動させる。か
くして、処理室10内を不活性ガスで置換する。In the working process of replacing the inside of the processing chamber 10 with an inert gas, as shown in FIG.
After lowering and making the facing distance between them both sufficiently larger than the outer diameter of the movable bodies 13 and 15, the movable bodies 13 and 15 are pressed against each other at one end surfaces 13B and 15B to ensure vacuum sealing. To the second position, and is held at this position by the above-mentioned locking mechanism (not shown). The thickness of the movable bodies 13 and 15 is sufficient to secure the vacuum sealing property by the above-mentioned press contact. As a result, the processing chamber 10 is surrounded by the processing chamber surface and the outer peripheral surfaces of the movable bodies 13 and 15, and a chamber X substantially completely vacuum-sealed to the outside, and a cylinder formed by the movable bodies 13 and 15. (Hereinafter, referred to as a sub-chamber) Y. When the positioning of the movable bodies 13 and 15 at the second position is completed, a vacuum exhaust device (not shown) is driven to exhaust the air in the chamber X,
When the pressure in the chamber X decreases to a predetermined pressure, the pressure is supplied into the chamber X from an inert gas tank (not shown). When the gas pressure of the inert gas in the chamber X rises to a predetermined pressure equal to or higher than the atmospheric pressure, the movable bodies 13 and 15 are gradually moved toward the first position while continuing to supply the inert gas. Let the processing electrode
21P and 21N are also moved to the position separating the discharge gap G. Thus, the inside of the processing chamber 10 is replaced with the inert gas.
このように、本実施例では、可動体13と15で副室Ｙを
区画し、室Ｘを外部に対して完全真空シール状態にして
真空排気を行うので、真空排気装置は、前記した従来の
真空漏れ分を範囲しなくても済み、かつ排気対象は室Ｘ
だけてなる。As described above, in the present embodiment, the sub chamber Y is partitioned by the movable bodies 13 and 15, and the chamber X is evacuated with the chamber X completely vacuum-sealed to the outside. It is not necessary to limit the amount of vacuum leakage, and the exhaust target is chamber X
Just
第３図および第４図は本発明の他の実施例を示したも
ので、ローラ列14Aに代えて、レール体14Cを用いるとと
もに可動体13の外側端部にフランジ13Aを形成して該フ
ランジ13Aの下側にレール体14Cに係合する車輪32を持つ
車輪機構を設け、また、ローラ列16Aに代えて、レール
体16Cを用いるとともに可動体15の外側端部にフランジ1
5Aを形成して該フランジ15Aの下側にレール体16Cに係合
する車輪33を持つ車輪機構を設けている点において、第
１図および第２図の構成と相違する。FIGS. 3 and 4 show another embodiment of the present invention, in which a rail body 14C is used in place of the roller row 14A, and a flange 13A is formed at the outer end of the movable body 13. A wheel mechanism having wheels 32 engaging with the rail body 14C is provided below 13A, and a rail body 16C is used in place of the roller row 16A and a flange 1 is provided at the outer end of the movable body 15.
1 and 2 in that a wheel mechanism having wheels 33 which engages with the rail body 16C is provided below the flange 15A to form 5A.
この構成においては、可動体13のフランジ13Aと被処
理材導入口とが圧接し、可動体15のフランジ15Aと導入
口12とが圧接する位置で、可動体13と15の一方端面13
B、15Bが相互に圧接する構成として、真空シール性を確
保するようにしている。In this configuration, at a position where the flange 13A of the movable body 13 is pressed against the material introduction port and the flange 15A of the movable body 15 is pressed against the introduction port 12, one end surface 13 of the movable bodies 13 and 15 is pressed.
The structure in which B and 15B are pressed against each other ensures vacuum sealing.
なお、上記各実施例はグロー放電を利用して被処理材
Ａの連続表面処理を行うものについて説明したが、本発
明は、被処理材導入口と送出口を有する処理室内をガス
置換して、連続表面処理を例えば化学的に行う他の装置
に実施して同様の効果を得ることができる。Although each of the above embodiments has been described with reference to the case where the surface of the workpiece A is subjected to continuous surface treatment using glow discharge, the present invention employs a method in which a processing chamber having a workpiece inlet and an outlet is gas-replaced. The same effect can be obtained by performing the continuous surface treatment, for example, on another apparatus that performs chemical treatment.
4.発明の効果 本発明は以上説明した通り、被処理材導入口と送出口
を貫通して伸び、処理室内で端面相互を接離可能な一対
の可動体を設けたことにより、真空排気時、この一対の
可動体で処理室内を区分して、実質上、完全な真空シー
ル状態で真空排気を行うことができ、しかも真空排気が
必要な空間が従来の場合に比べて大幅に狭くなるので、
真空排気装置として大形のものを使用しなくても済む利
点がある。4. Effects of the Invention As described above, the present invention provides a pair of movable bodies that extend through the material introduction port and the delivery port and that can separate and separate the end faces in the processing chamber. Since the processing chamber is divided by the pair of movable bodies, vacuum evacuation can be performed in a substantially completely vacuum-sealed state, and the space required for vacuum evacuation is significantly narrower than in the conventional case. ,
There is an advantage that it is not necessary to use a large evacuation device.
第１図は本発明の実施例の通常運転時の状態を示す縦断
面図、第２図は上記実施例の真空排気時の状態を示す縦
断面図、第３図は本発明の他の実施例の通常運転時の状
態を示す縦断面図、第４図は第３図の実施例の真空排気
時の状態を示す縦断面図、第５図は従来の表面処理装置
のシール構造を説明するための縦断面図である。 10……処理室、11……被処理材導入口、12……被処理材
送出口、13、15……可動体、14A、14B、16A、16B……ロ
ーラ列、14C、16C……レール体、21P、21N……処理電
極、29、30……昇降機構。32、33……車輪、FIG. 1 is a longitudinal sectional view showing a state during normal operation of an embodiment of the present invention, FIG. 2 is a longitudinal sectional view showing a state during evacuation of the above embodiment, and FIG. 3 is another embodiment of the present invention. FIG. 4 is a longitudinal sectional view showing a state during normal operation of the example, FIG. 4 is a longitudinal sectional view showing a state at the time of evacuation of the embodiment of FIG. 3, and FIG. 5 illustrates a seal structure of a conventional surface treatment apparatus. FIG. 10 processing chamber, 11 material inlet, 12 material outlet, 13, 15 movable body, 14A, 14B, 16A, 16B roller row, 14C, 16C rail Body, 21P, 21N ... Processing electrode, 29, 30 ... Lifting mechanism. 32, 33 ... wheels
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.6 識別記号 ＦＩ Ｆ２７Ｄ 7/06 Ｆ２７Ｄ 7/06 Ｂ (58)調査した分野(Int.Cl.6，ＤＢ名) C23C 14/00 - 14/58 C23C 16/00 - 16/56 D06B 5/02 D06B 19/00 F27B 9/00 - 9/40 F27D 7/00 - 7/06 ──────────────────────────────────────────────────の Continued on the front page (51) Int.Cl. 6 identification code FI F27D 7/06 F27D 7/06 B (58) Field surveyed (Int. Cl. 6 , DB name) C23C 14/00-14 / 58 C23C 16/00-16/56 D06B 5/02 D06B 19/00 F27B 9/00-9/40 F27D 7/00-7/06
Claims (4)
し、被処理材を、大気圧以上の処理ガスで満たされた上
記処理室を通過させつつ該被処理材の表面処理を行う表
面処理装置において、 端面相互対接して上記処理室内に副室を区画可能一対の
筒状可動体と、両可動体を同軸に支持する支持装置を有
し、一方の可動体は、上記処理室の被処理材導入口を真
空シール性を確保して摺動可能に貫通して外部に伸び、
他方の可動体は上記処理室の被処理材送出口を真空シー
ル性を確保して摺動可能に貫通して外部に伸び、上記両
可動体は、通常運転時、上記端面相互が所定間隔を隔て
る第１位置へ位置決めされ、上記真空排気時には、上記
端面が真空シール性を確保して相互対接する第２位置へ
駆動されることを特徴とする連続表面処理装置。1. A surface for performing a surface treatment on a material to be processed while passing the material to be processed through the processing chamber filled with a processing gas having a pressure higher than the atmospheric pressure by evacuating the processing chamber and replacing the processing gas with the processing gas. In the processing apparatus, a pair of cylindrical movable bodies capable of partitioning the sub-chamber in the processing chamber by mutually contacting the end surfaces, and a supporting device for coaxially supporting the two movable bodies, one movable body of the processing chamber The workpiece inlet is slidably penetrated to the outside while ensuring vacuum sealability,
The other movable body extends slidably through the material-to-be-processed outlet of the processing chamber while ensuring vacuum sealing, and extends to the outside. A continuous surface treatment apparatus, wherein the end face is positioned at a first position to be separated, and is driven to a second position where the end faces are in contact with each other while ensuring vacuum sealing during the evacuation.
てて対向する一対の放電用処理電極を有する場合におい
て、両処理電極が、処理室外に設けた昇降機構により個
別昇降可能に支持されていることを特徴とする請求項１
記載の連続表面処理装置。2. In normal operation, when a pair of discharge processing electrodes facing each other across a gap through which a material passes is provided, both processing electrodes are supported by a lifting mechanism provided outside the processing chamber so that they can be individually raised and lowered. 2. The method according to claim 1, wherein
The continuous surface treatment apparatus as described in the above.
出口外部に設けたローラ列と被処理材導入口・送出口内
部に設けたローラ列からなることを特徴とする請求項１
または２記載の連続表面処理装置。3. The apparatus according to claim 1, wherein the support device comprises a row of rollers provided outside the material inlet / outlet of the processing chamber and a row of rollers provided inside the material inlet / outlet of the material to be processed. 1
Or the continuous surface treatment apparatus according to 2.
出口内部に設けたローラ列と、処理室の被処理材導入口
・送出口外部に設けたレール体からなり、可動体の一方
端部に該レール体上を転動可能な車輪を持つ車輪機構を
有することを特徴とする請求項１または２記載の連続表
面処理装置。4. The support device comprises a row of rollers provided inside the processing material introduction port / outlet of the processing chamber, and a rail body provided outside the processing material introduction port / delivery port of the processing chamber. 3. The continuous surface treatment apparatus according to claim 1, further comprising a wheel mechanism having a wheel that can roll on the rail at one end of the continuous surface treatment apparatus.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10644790A JP2952957B2 (en) | 1990-04-24 | 1990-04-24 | Continuous surface treatment equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10644790A JP2952957B2 (en) | 1990-04-24 | 1990-04-24 | Continuous surface treatment equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH046273A JPH046273A (en) | 1992-01-10 |
| JP2952957B2 true JP2952957B2 (en) | 1999-09-27 |
Family
ID=14433873
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10644790A Expired - Fee Related JP2952957B2 (en) | 1990-04-24 | 1990-04-24 | Continuous surface treatment equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2952957B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101468373B1 (en) * | 2013-05-01 | 2014-12-03 | 주식회사 뉴파워 프라즈마 | Heat treatment apparatus for carbon fiber manufacture and carbon fiber manufacture system with the same |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8361229B2 (en) * | 2010-04-22 | 2013-01-29 | Primestar Solar, Inc. | Seal configuration for a system for continuous deposition of a thin film layer on a substrate |
-
1990
- 1990-04-24 JP JP10644790A patent/JP2952957B2/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101468373B1 (en) * | 2013-05-01 | 2014-12-03 | 주식회사 뉴파워 프라즈마 | Heat treatment apparatus for carbon fiber manufacture and carbon fiber manufacture system with the same |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH046273A (en) | 1992-01-10 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |