JP2933427B2 - Semiconductor device manufacturing equipment - Google Patents
Semiconductor device manufacturing equipmentInfo
- Publication number
- JP2933427B2 JP2933427B2 JP26981391A JP26981391A JP2933427B2 JP 2933427 B2 JP2933427 B2 JP 2933427B2 JP 26981391 A JP26981391 A JP 26981391A JP 26981391 A JP26981391 A JP 26981391A JP 2933427 B2 JP2933427 B2 JP 2933427B2
- Authority
- JP
- Japan
- Prior art keywords
- tape
- semiconductor device
- tension
- manufacturing equipment
- device manufacturing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Landscapes
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Description
【0001】[0001]
【産業上の利用分野】本発明は、半導体装置にかかり、
特に半導体ウェーハの表面を保護するテープの貼付け装
置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor device,
In particular, the present invention relates to a tape sticking device for protecting the surface of a semiconductor wafer.
【0002】[0002]
【従来の技術】従来のかかる半導体装置の製造装置は、
図4に示すように、搬送されたウェーハ1にテープ2を
貼り付けるテープ取付け軸3,剥離フィルム巻取り軸
4,貼付ローラー5,テープ巻取り軸6からなるテープ
貼付け部と、ウェーハの外周にならってテープを切るカ
ッター7を持つカッティング部とを有している。ウェー
ハが搬送され、貼付けローラー5に来たとき、テープ剥
離付軸3,剥離フィルム巻取り軸4,テープ巻取り軸6
が作動し、テープが送り出され、剥離付けローラーの圧
力によって、テープとウェーハ1が剥離付き、テーブル
8に移動し、下からカッター7が出て、テープを切る。
全体の動作は全てコントローラ部11で制御している。2. Description of the Related Art A conventional semiconductor device manufacturing apparatus is
As shown in FIG. 4, a tape attaching portion including a tape attaching shaft 3 for attaching the tape 2 to the transferred wafer 1, a peeling film winding shaft 4, a sticking roller 5, and a tape winding shaft 6, and an outer periphery of the wafer. And a cutting section having a cutter 7 for cutting the tape. When the wafer is transported and arrives at the application roller 5, the tape peeling shaft 3, the peeling film winding shaft 4, the tape winding shaft 6
Is operated, the tape is fed out, and the tape and the wafer 1 are peeled off by the pressure of the peeling roller.
All operations are controlled by the controller unit 11.
【0003】テープの張力は剥離フィルム巻取軸4とテ
ープ巻取り軸6の回転スピードだけで決定する。テープ
剥離付軸は、一定の負荷が加っているがモーターは付い
ていない。The tension of the tape is determined only by the rotation speed of the peeling film winding shaft 4 and the tape winding shaft 6. The shaft with tape peeling has a certain load but no motor.
【0004】[0004]
【発明が解決しようとする課題】従来の半導体製造装置
では、剥離フィルム巻取軸とテープ巻取軸の回転スピー
ドだけでテープの著力を決めるため、テープの張力は測
定されずにテープがウェーハに貼付けられる為、テープ
の張力が大きいとテープが収縮して、ウェーハの直径よ
りも小さくなり、テープの張力が小さいと、ウェーハの
表面にたわみ、しわが発生しウェーハ表面を完全に保護
できないという問題点があった。In a conventional semiconductor manufacturing apparatus, the strength of the tape is determined only by the rotation speed of the peeling film winding shaft and the tape winding shaft. Because the tape is attached, if the tape tension is large, the tape shrinks and becomes smaller than the diameter of the wafer. There was a point.
【0005】[0005]
【課題を解決するための手段】本発明の半導体装置の製
造装置は、テープの張力を測定するためのテープ厚さ測
定部と、テープ厚さのデータからテープの張力を制御す
るコントロール部とを備えている。The semiconductor device manufacturing apparatus of the present invention comprises a tape thickness measuring section for measuring the tape tension and a control section for controlling the tape tension based on the tape thickness data. Have.
【0006】[0006]
【実施例】次に本発明について図面を参照して説明す
る。DESCRIPTION OF THE PREFERRED EMBODIMENTS Next, the present invention will be described with reference to the drawings.
【0007】図1は本発明の一実施例の装置概略図であ
る。FIG. 1 is a schematic view of an apparatus according to an embodiment of the present invention.
【0008】テープの張力を調整するための第1のテー
プチャック13と、第2のテープチャック14とをガイ
ドローラー16と落し込みローラー12との間に設け、
テープを掴む。テープの張力を測定する静電容量型厚さ
測定部11が半導体ウェーハ1の中央部付近にくるよう
に移動し、4つのテープチャックに囲まれた領域の厚さ
を1点以上測定し、所定のテープ厚さ、テープ張力にな
るようにコントローラ部でテープの厚さのデータのフィ
ールドバックを行い、4つのテープチャックをコントロ
ールする。(図1および図2の(a))。次に半導体ウ
ェーハ1がテープ貼付部に搬送され(図2の(b))、
半導体ウェーハ1とテープ2の密着度を上げるため、テ
ープおさえローラー17で半導体ウェーハ上をなぞり
(図2の(c))半導体ウェーハ1とテープが貼付いた
ところでカッター7が下降し、テープをカットする(図
2の(d))。[0008] A first tape chuck 13 for adjusting the tension of the tape and a second tape chuck 14 are provided between the guide roller 16 and the dropping roller 12,
Grab the tape. The capacitance-type thickness measuring unit 11 for measuring the tension of the tape is moved so as to be near the center of the semiconductor wafer 1, and the thickness of the area surrounded by the four tape chucks is measured at one or more points. The controller unit performs field-back of the data of the tape thickness so that the tape thickness and the tape tension become the same, and controls the four tape chucks. (FIGS. 1 and 2A). Next, the semiconductor wafer 1 is conveyed to the tape attaching part ((b) of FIG. 2),
In order to increase the degree of adhesion between the semiconductor wafer 1 and the tape 2, the tape is traversed on the semiconductor wafer by the tape holding roller 17 ((c) in FIG. 2). ((D) of FIG. 2).
【0009】図3は上記の動作の流れ図である。FIG. 3 is a flowchart of the above operation.
【0010】[0010]
【発明の効果】以上説明したように本発明は、テープの
張力をテープ厚さとして測定し、このテープからテープ
の張力を制御するコントロール部があるため、使用する
テープがウェーハ表面を完全に覆いかつ、収縮しないテ
ープ厚さを指定することにより、常に一定の張力でテー
プ貼付けを行うことができ、ウェーハ表面保護を確実に
行うことが出来るという効果を有している。As described above, according to the present invention, since the tape tension is measured as the tape thickness and there is a control unit for controlling the tape tension from the tape, the tape used completely covers the wafer surface. In addition, by specifying the tape thickness that does not shrink, the tape can always be stuck with a constant tension, and the wafer surface can be reliably protected.
【図1】本発明の一実施例を示す概略図。FIG. 1 is a schematic diagram showing one embodiment of the present invention.
【図2】本発明の一実施例の動作を説明する図面であ
り、そのうち(a)と(b)は平面図、(c)と(d)
は正面図。FIGS. 2A and 2B are diagrams for explaining the operation of one embodiment of the present invention, in which FIGS. 2A and 2B are plan views, and FIGS.
Is a front view.
【図3】動作の流れ図。FIG. 3 is a flowchart of the operation.
【図4】従来の製造装置を示す概略図。FIG. 4 is a schematic view showing a conventional manufacturing apparatus.
1 半導体ウェーハ 2 テープ 3 テープ貼付け軸 4 剥離フィルム巻取り軸 5 貼付けローラー 6 テープ巻取軸 7 カッター 8 テーブル 9 テープセパレータくさび 10 剥離フィルム 11 コントローラ部 12 落とし込みローラー 13 第1のテープチャック 14 第2のテープチャック 15 厚さ測定部 16 ガイドローラー 17 テープおさえローラー DESCRIPTION OF SYMBOLS 1 Semiconductor wafer 2 Tape 3 Tape sticking axis 4 Peeling film winding shaft 5 Sticking roller 6 Tape winding shaft 7 Cutter 8 Table 9 Tape separator wedge 10 Peeling film 11 Controller part 12 Dropping roller 13 First tape chuck 14 Second Tape chuck 15 Thickness measuring unit 16 Guide roller 17 Tape holding roller
Claims (1)
の貼り付け装置に、テープの張力を測定するためのテー
プ厚さ測定部と、テープの張力を制御する機構と有する
ことを特徴とする半導体装置の製造装置。1. A semiconductor device, comprising: a tape attaching device for protecting a surface of a semiconductor wafer, a tape thickness measuring unit for measuring a tape tension, and a mechanism for controlling the tape tension. Manufacturing equipment.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP26981391A JP2933427B2 (en) | 1991-10-18 | 1991-10-18 | Semiconductor device manufacturing equipment |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP26981391A JP2933427B2 (en) | 1991-10-18 | 1991-10-18 | Semiconductor device manufacturing equipment |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH05109595A JPH05109595A (en) | 1993-04-30 |
JP2933427B2 true JP2933427B2 (en) | 1999-08-16 |
Family
ID=17477533
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP26981391A Expired - Fee Related JP2933427B2 (en) | 1991-10-18 | 1991-10-18 | Semiconductor device manufacturing equipment |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2933427B2 (en) |
-
1991
- 1991-10-18 JP JP26981391A patent/JP2933427B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JPH05109595A (en) | 1993-04-30 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 19990506 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
LAPS | Cancellation because of no payment of annual fees |