JP2920864B2 - Ultrapure water production equipment - Google Patents

Ultrapure water production equipment

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Publication number
JP2920864B2
JP2920864B2 JP24239993A JP24239993A JP2920864B2 JP 2920864 B2 JP2920864 B2 JP 2920864B2 JP 24239993 A JP24239993 A JP 24239993A JP 24239993 A JP24239993 A JP 24239993A JP 2920864 B2 JP2920864 B2 JP 2920864B2
Authority
JP
Japan
Prior art keywords
water tank
pure water
ultrapure water
primary pure
nitrogen gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP24239993A
Other languages
Japanese (ja)
Other versions
JPH0796273A (en
Inventor
吉則 梶山
健一 牛越
浩二 金澤
平 山本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SHINKO PANTETSUKU KK
Original Assignee
SHINKO PANTETSUKU KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by SHINKO PANTETSUKU KK filed Critical SHINKO PANTETSUKU KK
Priority to JP24239993A priority Critical patent/JP2920864B2/en
Publication of JPH0796273A publication Critical patent/JPH0796273A/en
Application granted granted Critical
Publication of JP2920864B2 publication Critical patent/JP2920864B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は超純水の製造装置、さら
に詳しくは、たとえば半導体工場等に設置される超純水
の製造装置であって、窒素ガスパージを必要とする超純
水の製造装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an apparatus for producing ultrapure water, and more particularly, to an apparatus for producing ultrapure water installed in a semiconductor factory or the like, for producing ultrapure water requiring a nitrogen gas purge. Related to the device.

【0002】[0002]

【従来の技術】一般に、半導体工場においては、超純水
の製造装置が設置されているが、その製造装置に具備さ
れている水槽において、外部からの汚染を防ぐために窒
素ガスパージが行われている。
2. Description of the Related Art Generally, a semiconductor factory is provided with an apparatus for producing ultrapure water, and a water tank provided in the apparatus is purged with nitrogen gas to prevent external contamination. .

【0003】すなわち、従来のこの種の超純水の製造装
置は、図2に示すように、真空脱気,膜脱気等の各種の
脱気装置1aにより得られた1次純水を貯留するための1
次純水槽2aと、該1次純水槽2aに窒素ガスを注入するた
めの窒素ガスパージ装置3aと、殺菌用のUV装置4aと、
1次純水から供給される純水を貯留するための超純水槽
5aと、該超純水槽5aに窒素ガスを注入するための窒素ガ
スパージ装置6aと、超純水槽5a内の純水をリサイクルす
る際に、純化する2次純水装置7aとを具備したものであ
る。
That is, as shown in FIG. 2, a conventional ultrapure water producing apparatus of this type stores primary pure water obtained by various deaerators 1a such as vacuum deaerator and membrane deaerator. 1 to do
A secondary pure water tank 2a, a nitrogen gas purge device 3a for injecting nitrogen gas into the primary pure water tank 2a, and a UV device 4a for sterilization,
Ultrapure water tank for storing pure water supplied from primary pure water
5a, a nitrogen gas purging device 6a for injecting nitrogen gas into the ultrapure water tank 5a, and a secondary pure water device 7a for purifying when the pure water in the ultrapure water tank 5a is recycled. is there.

【0004】そして、このような超純水の製造装置にお
いては、循環流路8aによって1次純水槽2a内の純水を循
環,リサイクルして純化し、また循環流路9a及び循環流
路10a によって超純水槽5a内の超純水を循環,リサイク
ルして純化するものである。
In such an apparatus for producing ultrapure water, the pure water in the primary pure water tank 2a is circulated and recycled to be purified by the circulation flow path 8a, and the circulation flow path 9a and the circulation flow path 10a Thus, the ultrapure water in the ultrapure water tank 5a is circulated and recycled for purification.

【0005】[0005]

【発明が解決しようとする課題】しかし、従来のこのよ
うな超純水の製造装置においては、循環流路8a,9a,10a
によって循環,リサイクルされる純水を、上部から散水
しつつ1次純水槽2a及び超純水槽5aに流入させるため、
その散水により液面が乱れてパージしている窒素ガスが
超純水中に溶解し、その窒素ガスが気泡となり、気泡粒
子に不純物が付着し、これがウエハ洗浄時に悪影響を及
ぼすおそれがあるという問題点があった。
However, in such a conventional apparatus for producing ultrapure water, the circulation channels 8a, 9a, 10a
In order to make the pure water circulated and recycled into the primary pure water tank 2a and ultrapure water tank 5a while sprinkling water from above,
The sprinkling disturbs the liquid surface and dissolves the purged nitrogen gas in the ultrapure water, and the nitrogen gas becomes bubbles, causing impurities to adhere to the bubble particles, which may adversely affect the wafer cleaning. There was a point.

【0006】特に、超純水を加熱した場合には、温度上
昇に伴って気泡の発生も顕著となり、従って上記のよう
な問題点は一層顕著となっていた。
[0006] In particular, when ultrapure water is heated, the generation of bubbles becomes remarkable as the temperature rises, and thus the above-mentioned problems have become more remarkable.

【0007】本発明は、このような問題点を解決するた
めになされたもので、上記のような超純水中での気泡の
発生、特に加熱時における気泡の発生を防止することを
課題とするものである。
[0007] The present invention has been made to solve such problems, and an object of the present invention is to prevent the generation of bubbles in ultrapure water as described above, particularly, the generation of bubbles during heating. Is what you do.

【0008】[0008]

【課題を解決するための手段】本発明は、このような課
題を解決せんとするもので、その課題を解決するための
手段は、各種の脱気手段により得られた1次純水を貯留
するための1次純水槽2と、前記1次純水槽2から供給
される純水を超純水として貯留するための超純水槽5
と、該1次純水槽2及び超純水槽5にそれぞれ窒素ガス
を注入するための窒素ガスパージ装置3,6と、前記1
次純水槽2及び超純水槽5の純水や超純水をそれぞれ循
環させるべく、該1次純水槽2及び超純水槽5に供給部
と排出部を介して連結された循環流路とを具備した超純
水の製造装置において、前記1次純水槽2及び超純水槽
5のそれぞれの循環流路の供給部が、該1次純水槽2及
び超純水槽5の液面より下部に連結されてなることにあ
る。
SUMMARY OF THE INVENTION The present invention has been made to solve the above-mentioned problems, and a means for solving the problems is to store primary pure water obtained by various deaeration means. And a super pure water tank 5 for storing pure water supplied from the primary pure water tank 2 as ultra pure water.
Nitrogen gas purging devices 3 and 6 for injecting nitrogen gas into the primary pure water tank 2 and the ultrapure water tank 5, respectively;
In order to circulate the pure water and the ultrapure water of the secondary pure water tank 2 and the ultrapure water tank 5, respectively, a circulation flow path connected to the primary pure water tank 2 and the ultrapure water tank 5 via a supply unit and a discharge unit is provided. In the apparatus for producing ultrapure water provided, the supply units of the circulation channels of the primary pure water tank 2 and the ultrapure water tank 5 are connected below the liquid levels of the primary pure water tank 2 and the ultrapure water tank 5. It is to be done.

【0009】[0009]

【作用】すなわち、上記のように1次純水槽2及び超純
水槽5のそれぞれの循環流路の供給部が、前記1次純水
槽2及び超純水槽5の液面より下部に連結されてなるた
め、循環時に窒素ガスを超純水中に巻き込むことがな
く、ひいてはパージしている窒素ガスが超純水中に溶解
することもないのである。
That is, as described above, the supply portions of the respective circulation flow paths of the primary pure water tank 2 and the ultrapure water tank 5 are connected to the lower part of the liquid level of the primary pure water tank 2 and the ultrapure water tank 5. Therefore, the nitrogen gas is not entrained in the ultrapure water during the circulation, and the purged nitrogen gas is not dissolved in the ultrapure water.

【0010】[0010]

【実施例】以下、本発明の実施例について説明する。図
1において、1は真空脱気,膜脱気等の各種の脱気を行
う脱気装置、2は該脱気装置1により得られた1次純水
を貯留するための1次純水槽2で、その1次純水槽2に
はレベルゲージ部11及び純水サンプリング部12が接続さ
れ、レベルゲージ部11と純水サンプリング部12間にはバ
ルブ13が配設されている。
Embodiments of the present invention will be described below. In FIG. 1, reference numeral 1 denotes a deaerator for performing various types of deaeration such as vacuum deaeration and film deaeration, and 2 denotes a primary pure water tank 2 for storing the primary pure water obtained by the deaerator 1. A level gauge section 11 and a pure water sampling section 12 are connected to the primary pure water tank 2, and a valve 13 is provided between the level gauge section 11 and the pure water sampling section 12.

【0011】3は、前記1次純水槽2へ窒素ガスをパー
ジするための窒素ガスパージ装置で、該1次純水槽2の
上部に設けられている。
Reference numeral 3 denotes a nitrogen gas purging device for purging nitrogen gas into the primary pure water tank 2, which is provided above the primary pure water tank 2.

【0012】8は、前記1次純水槽2内の純水を循環,
リサイクルすべく、供給部14及び排出部15を介して前記
1次純水槽2に連結された循環流路で、その供給部14が
前記1次純水槽2の液面より下部に側方から連結される
ように配設されている。
8 circulates pure water in the primary pure water tank 2;
A circulation channel connected to the primary deionized water tank 2 via a supply part 14 and a discharge part 15 in order to recycle the supply part 14 from the side below the liquid level of the primary deionized water tank 2 It is arranged to be.

【0013】4は、殺菌用の紫外線装置で、前記循環流
路8の中途部に設けられている。
Reference numeral 4 denotes a sterilizing ultraviolet device, which is provided in the middle of the circulation channel 8.

【0014】5は、前記1次純水槽2から供給される純
水を超純水として貯留するための超純水槽で、流路16を
介して前記循環流路8の中途部に接続されている。
Reference numeral 5 denotes an ultrapure water tank for storing pure water supplied from the primary pure water tank 2 as ultrapure water. The ultrapure water tank 5 is connected to an intermediate portion of the circulation channel 8 via a channel 16. I have.

【0015】6は、前記超純水槽5へ窒素ガスをパージ
するための窒素ガスパージ装置で、該超純水槽2の上部
に設けられている。
Reference numeral 6 denotes a nitrogen gas purging device for purging nitrogen gas into the ultrapure water tank 5, which is provided above the ultrapure water tank 2.

【0016】9,10は、前記超純水槽5内の超純水を循
環,リサイクルすべく、供給部18,19 及び排出部20を介
して前記1次純水槽2に連結された循環流路で、排出部
20は前記両流路9,10で共有されている。
Reference numerals 9 and 10 denote circulation flow paths connected to the primary pure water tank 2 via supply units 18 and 19 and a discharge unit 20 so as to circulate and recycle the ultrapure water in the ultrapure water tank 5. In the discharge section
20 is shared by the two flow paths 9 and 10.

【0017】7は、前記超純水槽5内の純水を循環,リ
サイクルする際に、その純水を純化する2次純水装置
で、前記流路10の中途部に設けられている。そして、こ
の2次純水装置7は、たとえば紫外線照射装置,イオン
交換装置,限外濾過膜等によって構成されている。
Reference numeral 7 denotes a secondary pure water device for purifying the pure water in the ultrapure water tank 5 when circulating and recycling the pure water, and is provided in the middle of the flow passage 10. The secondary pure water device 7 is constituted by, for example, an ultraviolet irradiation device, an ion exchange device, an ultrafiltration membrane and the like.

【0018】21は、超純水サンプリング部で、バルブ22
を介して前記流路10に接続されている。
Reference numeral 21 denotes an ultrapure water sampling unit, and a valve 22
Is connected to the flow path 10 via a.

【0019】そして、上記のような構成からなる超純水
製造装置で超純水を製造する場合について説明すると、
先ず、真空脱気,膜脱気等の各種の脱気装置1により1
次純水を製造し、その1次純水を1次純水槽2へ供給し
て1次純水槽2内で貯留する。
The case where ultrapure water is produced by the ultrapure water production apparatus having the above configuration will be described.
First, a variety of deaerators 1 such as vacuum deaerator and film deaerator 1
The secondary pure water is manufactured, and the primary pure water is supplied to the primary pure water tank 2 and stored in the primary pure water tank 2.

【0020】次に、窒素ガスパージ装置3によって前記
1次純水槽2内に窒素ガスを送り込んで窒素ガスパージ
を行う。
Next, nitrogen gas is sent into the primary pure water tank 2 by the nitrogen gas purging device 3 to perform nitrogen gas purging.

【0021】尚、1次純水槽2内の1次純水は、排出部
15から排出され、循環流路8を循環して供給部14から1
次純水槽2内に供給される。
The primary pure water in the primary pure water tank 2 is supplied to a discharge section.
15 from the supply unit 14
Next, it is supplied into the pure water tank 2.

【0022】この場合において、循環流路8の供給部14
が前記1次純水槽2の純水の液面より下部に側方から連
結されるように配設されているため、循環時に窒素ガス
を純水中に巻き込むことがなく、この循環流路8を循環
する純水に、上記窒素ガスパージ装置3から1次純水槽
2内に注入される窒素ガスが溶解することもないのであ
る。
In this case, the supply section 14 of the circulation flow path 8
Is disposed below the level of pure water in the primary pure water tank 2 so as to be connected from the side, so that nitrogen gas is not involved in pure water during circulation, The nitrogen gas injected into the primary pure water tank 2 from the nitrogen gas purging device 3 does not dissolve in the pure water circulating through.

【0023】また、前記循環流路8の中途部には殺菌用
の紫外線装置4が設けられているため、その紫外線装置
4によって循環する1次純水が殺菌されることとなる。
Further, since the ultraviolet device 4 for sterilization is provided in the middle of the circulation channel 8, the primary pure water circulated by the ultraviolet device 4 is sterilized.

【0024】上述のようにして窒素ガスパージによって
外部からの汚染が防止され、且つ紫外線照射によって殺
菌されつつ循環流路8で循環,リサイクルされた1次純
水槽2側の1次純水が、純化されて超純水として流路16
を介して超純水槽5へ供給され、その超純水槽5で貯留
されることとなる。
As described above, contamination from the outside is prevented by the nitrogen gas purge, and the primary pure water in the primary pure water tank 2 which has been circulated and recycled in the circulation channel 8 while being sterilized by ultraviolet irradiation is purified. Channel 16 as ultrapure water
And supplied to the ultrapure water tank 5 and stored in the ultrapure water tank 5.

【0025】次に、超純水が供給され貯留された超純水
槽5へは、窒素ガスパージ装置6によって窒素ガスが送
り込まれ、前記1次純水槽2側と同様に窒素ガスパージ
が行なわれる。
Next, nitrogen gas is fed into the ultrapure water tank 5 to which the ultrapure water is supplied and stored by the nitrogen gas purging device 6, and the nitrogen gas is purged in the same manner as in the primary pure water tank 2 side.

【0026】そして、超純水槽5内の超純水は、排出部
20から排出され、2つの循環流路9,10 を循環し、それ
ぞれの循環流路9,10 の供給部18,19 から超純水槽5内
に供給される。
The ultrapure water in the ultrapure water tank 5 is supplied to a discharge section.
The water is discharged from the circulation path 20, and circulates through the two circulation paths 9, 10, and is supplied into the ultrapure water tank 5 from the supply portions 18, 19 of the respective circulation paths 9, 10.

【0027】この超純水槽5においても、循環流路9,1
0 の供給部18,19 が超純水槽5の純水の貯留部分に側方
から連結されるように配設されているため、前記1次純
水槽2側と同様に、循環流路9,10 を循環する純水に、
窒素ガスパージ装置6からの窒素ガスが溶解することも
ない。
In the ultrapure water tank 5 as well, the circulation passages 9, 1
0 is disposed so as to be connected to the storage portion of the pure water in the ultrapure water tank 5 from the side, so that the circulation passages 9, 19 are provided similarly to the primary pure water tank 2 side. 10 to pure water circulating,
The nitrogen gas from the nitrogen gas purge device 6 does not dissolve.

【0028】また、2つの循環流路9,10 のうち、循環
流路10の中途部には上記のような紫外線照射装置,イオ
ン交換装置,限外濾過膜等によって構成される二次純水
装置7が設けられているため、その二次純水装置7によ
って超純水が一層純化されることとなる。
In the middle of the circulation channel 10 of the two circulation channels 9, 10, the secondary pure water constituted by the above-described ultraviolet irradiation device, ion exchange device, ultrafiltration membrane and the like is provided. Since the device 7 is provided, the ultrapure water is further purified by the secondary pure water device 7.

【0029】上述のようにして窒素ガスパージによって
外部からの汚染が防止され、且つ二次純水装置7によっ
て純化が促進されつつ、循環流路9,10 で循環,リサイ
クルされた超純水槽5側の超純水が、加熱等の処理を経
た後、半導体工場等に供給されるのである。
As described above, the contamination from the outside is prevented by the nitrogen gas purge, and the ultrapure water tank 5 circulated and recycled in the circulation passages 9 and 10 while the purification is promoted by the secondary pure water device 7. Is supplied to a semiconductor factory or the like after processing such as heating.

【0030】以上のように、本実施例においては、1次
純水槽2及び超純水槽5のいずれの純水槽においても、
純水の循環経路8,9,10の供給部14,18,19が、それぞ
れ1次純水槽2及び超純水槽5の液面より下部に側方か
ら連結されるように配設されているため、両純水槽2,
5の双方ともに窒素ガスの混入が防止されることとな
り、その結果、加熱処理時の気泡の発生が防止されるこ
ととなるのである。
As described above, in this embodiment, in both the primary pure water tank 2 and the ultrapure water tank 5,
The supply sections 14, 18, and 19 of the pure water circulation paths 8, 9, and 10 are provided below the liquid levels of the primary pure water tank 2 and the ultrapure water tank 5 so as to be connected from the side. For both pure water tanks 2,
In both cases, mixing of nitrogen gas is prevented, and as a result, generation of bubbles during the heat treatment is prevented.

【0031】尚、上記のような1次純水槽2や超純水槽
5から純水をサンプリングし、図3に示すような加熱装
置を用いて水を加熱し、発生する気泡量を温度を変えて
測定し、それから溶存ガス量を求めた。また、発生した
ガスを回収し、化学分析も行った。
Incidentally, pure water is sampled from the primary pure water tank 2 or the ultrapure water tank 5 as described above, and the water is heated using a heating device as shown in FIG. And then the dissolved gas amount was determined. In addition, the generated gas was collected and subjected to chemical analysis.

【0032】これをより詳細に説明すると、前記超純水
製造装置における一次純水槽2側の純水サンプリング部
12と、超純水槽5側のサンプリング部21とでサンプリン
グされた純水が、図3のヒータ23で加熱されると、補集
びん24内で気泡を発生し、その気泡がガス分析用サンプ
ル袋25で補集され、その補集されたガスによって溶存ガ
ス量が求められ、また化学分析が行われることとなるの
である。
This will be described in more detail. The pure water sampling unit on the primary pure water tank 2 side in the ultrapure water production apparatus is described below.
When the pure water sampled by the sample 12 and the sampling section 21 on the side of the ultrapure water tank 5 is heated by the heater 23 shown in FIG. 3, bubbles are generated in the collection bottle 24, and the bubbles are generated by the sample for gas analysis. The collected gas is collected in the bag 25, the dissolved gas amount is determined by the collected gas, and the chemical analysis is performed.

【0033】測定温度は、40℃,55℃, 70℃,80℃でそ
れぞれ行った。
The measurement was performed at 40 ° C., 55 ° C., 70 ° C., and 80 ° C., respectively.

【0034】さらに、従来の超純水製造装置でサンプリ
ングした純水,超純水との加熱発生ガス量を比較した。
Further, the amount of gas generated by heating was compared with pure water and ultrapure water sampled by a conventional ultrapure water producing apparatus.

【0035】その結果のグラフを図4に示す。FIG. 4 shows a graph of the result.

【0036】図4において、(イ)は純水槽からサンプ
リングした純水を加熱して発生したガス量に関するもの
で、(ロ)は超純水槽からサンプリングした超純水を加
熱して発生したガス量に関するものである。
In FIG. 4, (a) relates to the amount of gas generated by heating pure water sampled from a pure water tank, and (b) relates to gas generated by heating ultrapure water sampled from an ultrapure water tank. It is about quantity.

【0037】図4(イ)のグラフにおいて、Aは本実施
例の測定結果、B〜Fは従来の装置を備えた複数の工場
でそれぞれ測定した結果を示す。
In the graph of FIG. 4A, A shows the measurement results of the present embodiment, and BF show the results of measurements at a plurality of factories equipped with the conventional apparatus.

【0038】また、図4(ロ)のグラフにおいて、aは
本実施例の測定結果、b〜hは従来の装置を備えた複数
の工場でそれぞれ測定した結果を示す。
Also, in the graph of FIG. 4B, a shows the measurement result of this embodiment, and b to h show the results of measurement at a plurality of factories equipped with the conventional apparatus.

【0039】この図4の結果からも明らかなように、従
来の製造装置でサンプリングしたものは、40℃程度の水
温ではほとんど気泡の発生が認められないものの、温度
が高くなるにつれ発生ガス量も増加し、80℃の温度では
かなりのガスの発生が認められた。
As is clear from the results shown in FIG. 4, in the sample sampled by the conventional manufacturing apparatus, almost no bubbles are generated at a water temperature of about 40 ° C., but the amount of generated gas increases as the temperature increases. At a temperature of 80 ° C., considerable gas evolution was observed.

【0040】これに対して、本実施例では、温度が低い
場合はもちろん、80℃に加熱してもガスの発生はほとん
ど認められなかった。
On the other hand, in the present embodiment, almost no gas was generated even when heated to 80 ° C. as well as when the temperature was low.

【0041】尚、上記実施例では、1次純水槽2側の循
環流路8の途中部に紫外線装置4を設け、超純水槽5側
の循環流路10の途中部に2次純水装置7を設けたため、
1次純水槽2及び超純水槽5でそれぞれ循環,リサイク
ルされる純水や超純水の純度が高まるという好ましい効
果が得られたが、このような紫外線装置4や2次純水装
置7を設けることは本発明に必須の条件ではない。
In the above embodiment, the ultraviolet device 4 is provided in the middle of the circulation flow path 8 on the primary pure water tank 2 side, and the secondary water purification apparatus is provided in the middle of the circulation flow path 10 on the ultrapure water tank 5 side. 7 was provided,
The preferable effect of increasing the purity of pure water and ultrapure water circulated and recycled in the primary pure water tank 2 and the ultrapure water tank 5, respectively, was obtained. Provision is not an essential condition of the present invention.

【0042】また、その他の各構成部分も本発明の意図
する範囲で設計変更自在である。
The design of each of the other components can be freely changed within the range intended by the present invention.

【0043】さらに、上記実施例では、循環流路8,
9,10の供給部14,18,19が、1次純水槽2及び超純水槽
5の貯留部分に側方から連結されているが、これに限ら
ず、たとえば1次純水槽2及び超純水槽5の底部に連結
することも可能である。
Further, in the above embodiment, the circulation flow path 8,
The supply units 14, 18, and 19 of 9, 10 are connected to the storage portions of the primary pure water tank 2 and the ultrapure water tank 5 from the side, but are not limited to this. For example, the primary pure water tank 2 and the ultrapure water tank It is also possible to connect to the bottom of the water tank 5.

【0044】要は、1次純水槽2及び超純水槽5にそれ
ぞれ窒素ガスを注入するための窒素ガスパージ装置3,
6と、1次純水槽2及び超純水槽5に供給部14,18,19と
排出部15,20 を介して連結された循環流路8,9,10と
が具備され、且つその循環流路8,9,10の供給部14,1
8,19が、上記1次純水槽2及び超純水槽5の液面より下
部に連結されていればよいのである。
In short, a nitrogen gas purging device 3 for injecting nitrogen gas into the primary pure water tank 2 and the ultrapure water tank 5, respectively.
6 and circulation paths 8, 9, 10 connected to the primary pure water tank 2 and the ultrapure water tank 5 through supply units 14, 18, 19 and discharge units 15, 20, respectively. Supply section 14,1 of roads 8,9,10
It suffices that 8 and 19 are connected below the liquid levels of the primary pure water tank 2 and the ultrapure water tank 5.

【0045】[0045]

【発明の効果】叙上のように、本発明は、1次純水槽及
び超純水槽のそれぞれの循環流路の供給部は従来のよう
に1次純水槽及び超純水槽の水面の上部に離間しておら
ず、その1次純水槽及び超純水槽の液面より下部に連結
されているため、パージされる窒素ガスは従来のように
散水される超純水等に溶解するようなこともなく、その
窒素ガスの超純水中への不用意な溶解が防止されること
となる。
As described above, according to the present invention, the supply portions of the circulation passages of the primary pure water tank and the ultrapure water tank are located above the water surface of the primary pure water tank and the ultrapure water tank as in the prior art. Since it is not separated and connected below the liquid level of the primary pure water tank and the ultrapure water tank, the purged nitrogen gas must be dissolved in the ultrapure water sprayed as before. Inadvertently dissolving the nitrogen gas in ultrapure water is prevented.

【0046】この結果、加熱処理によって超純水中に気
泡が発生するおそれもなく、従って従来のような気泡粒
子の不純物への付着が防止され、よってウエハ洗浄等に
悪影響を及ぼすおそれがあるという問題点も解決するこ
とが可能となる。
As a result, there is no possibility that bubbles are generated in the ultrapure water by the heat treatment, and therefore, the adhesion of the bubble particles to the impurities as in the prior art is prevented, which may adversely affect wafer cleaning and the like. Problems can be solved.

【図面の簡単な説明】[Brief description of the drawings]

【図1】一実施例の超純水製造装置の概略ブロック図。FIG. 1 is a schematic block diagram of an ultrapure water production apparatus according to one embodiment.

【図2】従来の超純水製造装置の概略ブロック図。FIG. 2 is a schematic block diagram of a conventional ultrapure water production apparatus.

【図3】一試験例の加熱装置の概略ブロック図。FIG. 3 is a schematic block diagram of a heating device of one test example.

【図4】試験結果を示すグラフで、(イ)は純水を加熱
して発生したガス量、(ロ)は超純水を加熱して発生し
たガス量のグラフ。
FIG. 4 is a graph showing test results, in which (a) is a gas amount generated by heating pure water, and (b) is a graph of gas amount generated by heating ultrapure water.

【符号の説明】[Explanation of symbols]

2…1次純水槽 3…窒素ガスパージ装
置 5…超純水槽 6…窒素ガスパージ装
2 Primary water tank 3 Nitrogen gas purging device 5 Ultrapure water tank 6 Nitrogen gas purging device

───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 平2−222769(JP,A) 特開 平2−152589(JP,A) 特開 昭50−86162(JP,A) 特開 平2−222763(JP,A) (58)調査した分野(Int.Cl.6,DB名) C02F 1/00 C02F 1/20 ──────────────────────────────────────────────────続 き Continuation of the front page (56) References JP-A-2-222769 (JP, A) JP-A-2-152589 (JP, A) JP-A-50-86162 (JP, A) JP-A-2- 222763 (JP, A) (58) Field surveyed (Int. Cl. 6 , DB name) C02F 1/00 C02F 1/20

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 各種の脱気手段により得られた1次純水
を貯留するための1次純水槽(2) と、前記1次純水槽
(2) から供給される純水を超純水として貯留するための
超純水槽(5) と、該1次純水槽(2) 及び超純水槽(5) に
それぞれ窒素ガスを注入するための窒素ガスパージ装置
(3),(6) と、前記1次純水槽(2) 及び超純水槽(5) の純
水や超純水をそれぞれ循環させるべく、該1次純水槽
(2) 及び超純水槽(5) に供給部と排出部を介して連結さ
れた循環流路とを具備した超純水の製造装置において、
前記1次純水槽(2) 及び超純水槽(5) のそれぞれの循環
流路の供給部が、該1次純水槽(2) 及び超純水槽(5) の
液面より下部に連結されてなることを特徴とする超純水
の製造装置。
1. A primary pure water tank (2) for storing primary pure water obtained by various deaeration means, and said primary pure water tank
An ultrapure water tank (5) for storing pure water supplied from (2) as ultrapure water, and a nitrogen gas for injecting nitrogen gas into the primary pure water tank (2) and the ultrapure water tank (5), respectively. Nitrogen gas purge device
(3), (6) and the primary pure water tank (2) and the primary pure water tank to circulate the pure water and ultrapure water of the ultrapure water tank (5), respectively.
(2) and the ultrapure water tank (5) in the ultrapure water production apparatus having a circulation path connected via a supply section and a discharge section,
The supply units of the circulation channels of the primary pure water tank (2) and the ultrapure water tank (5) are connected to the lower part of the liquid level of the primary pure water tank (2) and the ultrapure water tank (5). An apparatus for producing ultrapure water.
JP24239993A 1993-09-29 1993-09-29 Ultrapure water production equipment Expired - Fee Related JP2920864B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP24239993A JP2920864B2 (en) 1993-09-29 1993-09-29 Ultrapure water production equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP24239993A JP2920864B2 (en) 1993-09-29 1993-09-29 Ultrapure water production equipment

Publications (2)

Publication Number Publication Date
JPH0796273A JPH0796273A (en) 1995-04-11
JP2920864B2 true JP2920864B2 (en) 1999-07-19

Family

ID=17088570

Family Applications (1)

Application Number Title Priority Date Filing Date
JP24239993A Expired - Fee Related JP2920864B2 (en) 1993-09-29 1993-09-29 Ultrapure water production equipment

Country Status (1)

Country Link
JP (1) JP2920864B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB201210456D0 (en) * 2012-06-13 2012-07-25 Vws Uk Ltd Method and system for providing purified water

Also Published As

Publication number Publication date
JPH0796273A (en) 1995-04-11

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