JP2902404B2 - How to make a light bulb - Google Patents
How to make a light bulbInfo
- Publication number
- JP2902404B2 JP2902404B2 JP63151242A JP15124288A JP2902404B2 JP 2902404 B2 JP2902404 B2 JP 2902404B2 JP 63151242 A JP63151242 A JP 63151242A JP 15124288 A JP15124288 A JP 15124288A JP 2902404 B2 JP2902404 B2 JP 2902404B2
- Authority
- JP
- Japan
- Prior art keywords
- light
- thin film
- scattering
- film
- scattering thin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Description
【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、電球の製造方法に関し、特に放射光に特徴
のある電球の製造方法に関する。Description: BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a light bulb, and more particularly, to a method for manufacturing a light bulb characterized by emitted light.
電球は、一般に種々の分野で用いられているが、例え
ば複写機の露光用光源、その他の光学装置等に用いられ
る電球においては、放射効率の高い良好な分光特性が
得られること、リップルが小さくて照度の均一性が高
いこと、が要求されている。Light bulbs are generally used in various fields.For example, in light bulbs used for light sources for exposure of copiers and other optical devices, good spectral characteristics with high radiation efficiency can be obtained, and ripples are small. Therefore, high uniformity of illuminance is required.
従来、放射効率の高い良好な分光特性を得るための手
段としては、ガラス製発光管の外表面に多層構成の光干
渉膜を設ける手段が知られている。また、リップルが小
さくて照度の均一性が高い放射光を得る手段としては、
ガラス製発光管の外表面を例えばサンドブラスト等によ
りフロスト加工して散光面とする手段が知られている。Conventionally, as means for obtaining good spectral characteristics with high radiation efficiency, means for providing a multi-layered light interference film on the outer surface of a glass arc tube has been known. Also, as means for obtaining radiation with small ripple and high uniformity of illuminance,
Means are known in which an outer surface of a glass arc tube is frosted by, for example, sand blasting to form a light scattering surface.
しかし、ガラス製封体管の外表面に光干渉膜を設けた
うえ、さらにサンドブラスト等によりフロスト加工して
散光面とする場合には、当該光干渉膜が損傷し、光干渉
膜の所期の性能が発揮されない問題がある。However, when an optical interference film is provided on the outer surface of the glass envelope tube and further frosted by sand blasting or the like to form a light diffusing surface, the optical interference film is damaged, and the intended optical interference film is damaged. There is a problem that performance is not exhibited.
本発明は以上の如き事情に基づいてなされたものであ
って、その目的は、光干渉膜の所期の性能が安定に発揮
され、しかもリップルが小さくて照度の均一性が高い放
射光が得られる電球の製造方法を提供することにある。The present invention has been made in view of the above circumstances, and an object of the present invention is to obtain radiation light in which the expected performance of the light interference film is stably exhibited, and the ripple is small and the illuminance uniformity is high. To provide a method for manufacturing a light bulb.
上記目的を達成するため、本発明は、ガラス製封体管
の外表面に多層構成の光干渉膜を設け、当該光干渉膜の
表面にさらに散光性薄膜を設け、この散光性薄膜の表面
にさらに補強用薄膜を形成してなる電球の製造方法であ
って、前記散光性薄膜を、シリコン化合物の溶液にセラ
ミック材料の微粉末を分散してなる被覆液を用いてディ
ッピング法により形成し、前記補強用薄膜を、前記散光
性薄膜の形成に用いたシリコン化合物の溶液と同様の組
成であってセラミック材料の微粉末を含有しない被覆液
を用いてディッピング法により形成することを特徴とす
る。In order to achieve the above object, the present invention provides a multi-layered light interference film on the outer surface of a glass envelope tube, further provides a light-scattering thin film on the surface of the light interference film, The method of manufacturing a light bulb further comprising forming a reinforcing thin film, wherein the light-scattering thin film is formed by a dipping method using a coating solution obtained by dispersing a fine powder of a ceramic material in a solution of a silicon compound, The reinforcing thin film is formed by a dipping method using a coating liquid having the same composition as the solution of the silicon compound used for forming the light-scattering thin film and containing no fine powder of the ceramic material.
ガスラ製封体管の外表面に多層構成の光干渉膜を設
け、この光干渉膜の外面に、特定の被覆液を用いてディ
ッピング法により散光性薄膜を形成すると、光干渉膜を
なんら損傷することなく十分な散光性を有する散光性薄
膜が形成される。If an optical interference film having a multilayer structure is provided on the outer surface of the envelope made of gasla and a light-scattering thin film is formed on the outer surface of the optical interference film by a dipping method using a specific coating solution, the optical interference film is damaged at all. Thus, a light-scattering thin film having sufficient light-scattering properties is formed.
しかも、この散光性薄膜の表面にさらに補強用薄膜を
形成するので、散光性薄膜の付着強度が高まる。In addition, since the reinforcing thin film is further formed on the surface of the light-scattering thin film, the adhesive strength of the light-scattering thin film is increased.
以下、本発明の構成を具体的に説明する。 Hereinafter, the configuration of the present invention will be specifically described.
第１図は、本発明に係る電球の製造方法によって光干
渉膜と散光性薄膜が形成された状態の電球の一例を示す
説明図である。同図において、10はガラス性発光管、11
はフィラメント、20は多層構成の光干渉膜、30は散光性
薄膜、40は口金である。ガラス製発光管10は例えば石英
ガラス製であり、その内部には例えばハロゲンが封入さ
れている。そして、散光性薄膜30の表面にはさらに後述
する補強用薄膜が形成される。FIG. 1 is an explanatory view showing an example of a light bulb in a state where an optical interference film and a light-scattering thin film are formed by the method for manufacturing a light bulb according to the present invention. In the figure, 10 is a glass arc tube, 11
Is a filament, 20 is an optical interference film having a multilayer structure, 30 is a light-scattering thin film, and 40 is a base. The glass arc tube 10 is made of, for example, quartz glass, and has, for example, a halogen enclosed therein. Then, a reinforcing thin film described later is further formed on the surface of the light-scattering thin film 30.
本発明においては、以下のようにして電球を製造す
る。In the present invention, a light bulb is manufactured as follows.
（１）ガラス製封体管10の外表面に多層構成の光干渉膜
20を設ける。この光干渉膜20は、特定波長域の光の透過
率または反射率を制御して所望の分光特性を得るための
ものである。具体的には、高屈折率層と、低屈折率層と
を交互に積層して構成することができる。(1) Multi-layered optical interference film on the outer surface of glass envelope tube 10
20 are provided. The light interference film 20 is for controlling the transmittance or reflectance of light in a specific wavelength range to obtain desired spectral characteristics. Specifically, a high refractive index layer and a low refractive index layer can be alternately laminated.
例えば赤外域の光を主として反射する赤外線反射膜と
しての機能を有する光干渉膜20は、酸化チタン（Ti
O2）、二酸化ケイ素（SiO2）等よりなる２種以上の層を
交互に積層して形成することができる。For example, the light interference film 20 having a function as an infrared reflection film that mainly reflects light in the infrared region is made of titanium oxide (Ti
It can be formed by alternately laminating two or more layers composed of O 2 ), silicon dioxide (SiO 2 ), and the like.
光干渉膜20は、例えば蒸着法、ディッピング法等の薄
膜形成手段により形成することができ、その形成手段は
特に限定されない。The light interference film 20 can be formed by a thin film forming means such as a vapor deposition method and a dipping method, and the forming means is not particularly limited.
（２）以上のようにしてガラス製封体管10の外表面に光
干渉膜20を形成した後、シリコン化合物の溶液にセラミ
ック材料の微粉末を分散してなる被覆液を用いてディッ
ピング法により、上記光干渉膜20の表面にさらに散光性
薄膜30を形成する。(2) After forming the light interference film 20 on the outer surface of the glass envelope tube 10 as described above, a dipping method is performed using a coating solution obtained by dispersing a fine powder of a ceramic material in a solution of a silicon compound. Then, a light-scattering thin film 30 is further formed on the surface of the light interference film 20.
シリコン化合物の溶液としては、例えばシリコンアル
コレートに、エタノール、酢酸、塩酸等を加え、これら
を反応させて得られる溶液を好ましく用いることができ
る。As the solution of the silicon compound, for example, a solution obtained by adding ethanol, acetic acid, hydrochloric acid, or the like to silicon alcoholate and reacting them is preferably used.
特に、シリコンアルコレートを用いて調製すると、散
光性薄膜30の光干渉膜20に対する付着性が向上する。In particular, when prepared using silicon alcoholate, the adhesion of the light-scattering thin film 30 to the light interference film 20 is improved.
また、シリコン化合物の溶液には、さらに必要に応じ
て五酸化リン等の特性改良剤を添加してもよい。この五
酸化リンは、散光性薄膜30の膜強度を高めるうえで好ま
しいものである。Further, a property improving agent such as phosphorus pentoxide may be further added to the solution of the silicon compound, if necessary. This phosphorus pentoxide is preferable in increasing the film strength of the light-scattering thin film 30.
セラミック材料の微粉末としては、例えば二酸化ケイ
素（SiO2）の微粉末を主成分とし、これに必要に応じて
例えば酸化アルミニウム（Al2O3）、酸化チタン（Ti
O2）、酸化ジルコニウム（ZrO2）等の微粉末を加えたも
のを好ましく用いることができる。斯かる微粉末の粒子
径は0.1μｍ〜数μｍ程度がよい。As the fine powder of the ceramic material, for example, a fine powder of silicon dioxide (SiO 2 ) is used as a main component, and if necessary, for example, aluminum oxide (Al 2 O 3 ), titanium oxide (Ti
A material to which fine powders such as O 2 ) and zirconium oxide (ZrO 2 ) are added can be preferably used. The particle size of such fine powder is preferably about 0.1 μm to several μm.
散光性薄膜30は、上記被覆液を用いてディッピング法
で形成する。すなわち、第２図〜第４図に示すように、
被覆液50中に、外表面に光干渉膜20が形成されたガラス
製封体管10をほぼ垂直に下降させて浸漬した後、当該ガ
ラス製封体管10を上方にほぼ垂直に引上げる。次いで、
このガラス製封体管10を加熱して表面のディッピング膜
を乾燥し、さらに乾燥した膜を例えば電気炉等により加
熱して焼成し、もって第５図に示すように、セラミック
材料の微粉末が分散含有されてなる散光性薄膜30を得
る。この散光性薄膜30の厚さは例えば0.5〜10μｍ程度
である。The light-scattering thin film 30 is formed by a dipping method using the coating liquid. That is, as shown in FIGS. 2 to 4,
After the glass envelope tube 10 having the light interference film 20 formed on the outer surface is dipped and immersed in the coating liquid 50 substantially vertically, the glass envelope tube 10 is pulled upward substantially vertically. Then
The glass envelope tube 10 is heated to dry the dipping film on the surface, and the dried film is heated and baked, for example, in an electric furnace or the like, so that the fine powder of the ceramic material is removed as shown in FIG. The light-scattering thin film 30 dispersed and contained is obtained. The thickness of the light scattering thin film 30 is, for example, about 0.5 to 10 μm.
散光性薄膜30は、上記の薄膜形成工程を１回だけ遂行
して単層構成としてもよいし、さらには必要に応じて上
記の薄膜形成工程を複数回繰返して遂行して２層以上の
積層構成としてもよい。２層以上の積層構成とする場合
には、散光性薄膜30の厚さを相当大きな自由度で調整す
ることができる。The light-scattering thin film 30 may be formed into a single-layer structure by performing the above-described thin-film forming process only once, or may be performed by repeating the above-described thin-film forming process a plurality of times as needed. It may be configured. In the case of a laminated structure of two or more layers, the thickness of the light-scattering thin film 30 can be adjusted with a considerable degree of freedom.
（３）次に、第６図に示すように、上記の散光性薄膜30
の表面にさらに例えば二酸化ケイ素等よりなる補強用薄
膜60を設ける。この補強用薄膜60は、散光性薄膜の形成
に用いた上記シリコン化合物の溶液と同様の溶液であっ
てセラミック材料の微粉末を含有しないものを被覆液と
して用いて、ディッピング法により形成する。(3) Next, as shown in FIG.
Is further provided with a reinforcing thin film 60 made of, for example, silicon dioxide. The reinforcing thin film 60 is formed by a dipping method using a solution similar to the above-mentioned silicon compound solution used for forming the light-scattering thin film and not containing fine powder of a ceramic material as a coating solution.
この補強用薄膜60を形成することにより、散光性薄膜
30の付着強度を高めることができる。By forming the reinforcing thin film 60, the light-scattering thin film
30 can increase the adhesion strength.
以下、本発明の実施例を具体的に説明するが、本発明
がこれらの実施例に限定されるものではない。Hereinafter, examples of the present invention will be specifically described, but the present invention is not limited to these examples.
（光干渉膜の形成） 長さ30cm、外径0.6cmの石英ガラス製封体管の外表面
に、蒸着法により、酸化チタン層と二酸化ケイ素層とを
交互に積層してなる多層構成の赤外線反射特性を有する
光干渉膜を形成した。(Formation of Optical Interference Film) A multilayer infrared ray composed of a titanium oxide layer and a silicon dioxide layer alternately laminated by vapor deposition on the outer surface of a quartz glass envelope tube having a length of 30 cm and an outer diameter of 0.6 cm. An optical interference film having reflection characteristics was formed.
（散光性薄膜の形成） シリコンアルコレート（Si(OC2H5)4)）と、エタノー
ル（C2H5OH）と、酢酸（CH3COOH）と、塩酸（HCl）と
を、1:13:3:0.007（モル比）となる割合で混合し、これ
を還流下で24時間反応させた後、さらに五酸化リン（P2
O5）をSiO2換算濃度で15重量％となる割合で添加し、も
って被覆液用の溶液を得た。(Formation of light-scattering thin film) Silicon alcoholate (Si (OC 2 H 5 ) 4 )), ethanol (C 2 H 5 OH), acetic acid (CH 3 COOH), and hydrochloric acid (HCl) were mixed in a ratio of 1: After mixing at a ratio of 13: 3: 0.007 (molar ratio) and reacting the mixture under reflux for 24 hours, phosphorus pentoxide (P 2
O 5 ) was added at a ratio of 15% by weight in terms of SiO 2, thereby obtaining a solution for a coating solution.
この被覆液用の溶液500mlに、それぞれ後記第１表に
示すセラミック材料の微粉末を添加し、これを分散して
各被覆液を得た。Fine powders of ceramic materials shown in Table 1 below were added to 500 ml of the solution for the coating solution, respectively, and dispersed to obtain each coating solution.
これらの被覆液を用いてディッピング法による薄膜形
成工程を後記第１表に示す回数遂行して、上記光干渉膜
の表面に単層構成または積層構成の散光性薄膜を形成し
た。Using these coating liquids, a thin film forming step by a dipping method was performed the number of times shown in Table 1 below to form a light-scattering thin film having a single-layer structure or a laminated structure on the surface of the light interference film.
なお、ディッピング条件および焼成条件は次の通りで
ある。The dipping conditions and firing conditions are as follows.
（１）ディッピング条件 引上げ雰囲気を温度10℃，相対湿度30％とし、引上げ
速度を11mm/secとした。(1) Dipping conditions The pulling atmosphere was 10 ° C. and the relative humidity was 30%, and the pulling speed was 11 mm / sec.
（２）焼成条件 ドライオーブンにより120℃で５分間乾燥した後、電
気炉により600℃で10分間焼成した。(2) Firing conditions After drying in a dry oven at 120 ° C. for 5 minutes, firing was performed in an electric furnace at 600 ° C. for 10 minutes.
（補強用薄膜の形成） さらに、上記散光性薄膜の形成に用いた被覆液用の溶
液と同様の組成を有するがセラミック材料の微粉末を含
有しないものを被覆液として用い、引上げ速度を8.9mm/
secとしたほかは上記散光性薄膜の形成と同様の条件で
薄膜形成工程を後記第１表に示す回数遂行し、もって上
記散光性薄膜の表面に二酸化ケイ素よりなる補強用薄膜
を形成した。(Formation of Reinforcement Thin Film) Further, a material having the same composition as the solution for the coating solution used for forming the light-scattering thin film but containing no fine powder of the ceramic material was used as the coating solution, and the pulling speed was 8.9 mm. /
A thin film forming process was performed the same number of times as shown in Table 1 below under the same conditions as in the formation of the light-scattering thin film except for the sec, thereby forming a reinforcing thin film made of silicon dioxide on the surface of the light-scattering thin film.
以上のようにして製造された各電球について、散光性
薄膜の性能および付着強度を評価した。結果を後記第１
表に併せて示す。The performance and adhesion strength of the light-scattering thin film were evaluated for each of the light bulbs manufactured as described above. Result 1
It is also shown in the table.
なお、散光性薄膜の付着強度は、次のようにして評価
した。すなわち、粘着テープを散光性薄膜または補強用
薄膜の上から貼付した後、当該粘着テープをゆっくりと
引き剥がす試験を行い、散光性薄膜の剥離が生ずるか否
かを目視により調べた。評価は、散光性薄膜の剥離が生
ぜず十分な付着強度を有していた場合を「○」、「○」
より若干劣るが実用上問題のない場合は「△」、実用的
には問題のある場合を「×」とした。In addition, the adhesive strength of the light-scattering thin film was evaluated as follows. That is, after the pressure-sensitive adhesive tape was stuck on the light-scattering thin film or the reinforcing thin film, a test was performed in which the pressure-sensitive adhesive tape was slowly peeled off, and it was visually examined whether or not the light-scattering thin film was peeled off. The evaluation was "○", "○" when the light-scattering thin film had sufficient adhesion strength without peeling
“△” indicates that it is slightly inferior but has no practical problem, and “×” indicates that it has practical problem.
〔発明の効果〕 以上説明したように、本発明によれば、ガラス製封体
管の外表面に多層構成の光干渉膜を設け、この光干渉膜
の外面に、特定の被覆液を用いてディッピング法により
散光性薄膜を形成するので、光干渉膜の所期の性能を確
実に発揮させることができるうえ散光性薄膜により優れ
た散光特性が発揮される電球を製造することができる。 [Effects of the Invention] As described above, according to the present invention, a multi-layered light interference film is provided on the outer surface of a glass envelope, and a specific coating liquid is used on the outer surface of the light interference film. Since the light-scattering thin film is formed by the dipping method, it is possible to reliably produce the desired performance of the light interference film and to manufacture a light bulb exhibiting excellent light-scattering characteristics by the light-scattering thin film.
そして、被覆液がシリコン化合物の溶液にセラミック
材料の微粉末を分散してなるので、散光性薄膜の光干渉
膜に対する付着性を高めることができる。Further, since the coating liquid is obtained by dispersing the fine powder of the ceramic material in the solution of the silicon compound, the adhesion of the light scattering thin film to the light interference film can be enhanced.
また、散光性薄膜の表面にさらに補強用薄膜を形成す
ることにより、散光性薄膜の付着強度を高めることがで
きて耐久性の優れた電球を製造することができる。そし
て、補強用薄膜を形成するための溶液として、散光性薄
膜の形成のための溶液と同様の組成のものを用いること
により、両者の一体性が良好となり、また用意する溶液
が１種でもよく、これにセラミック材料の微粉末を含有
させれば散光性薄膜用の被覆液が得られ、またそのまま
で補強用薄膜のための被覆液として用いることができる
ので、有利である。Further, by forming a reinforcing thin film further on the surface of the light-scattering thin film, it is possible to increase the adhesion strength of the light-scattering thin film and to manufacture a light bulb having excellent durability. By using a solution having the same composition as the solution for forming the light-diffusing thin film as the solution for forming the reinforcing thin film, the integration of the two becomes good, and only one solution may be prepared. It is advantageous to add a fine powder of a ceramic material to this, since a coating liquid for a light-scattering thin film can be obtained and used as it is as a coating liquid for a reinforcing thin film.
なお、本発明の方法により製造された電球は、光源と
して各種の分野に利用することができ、その用途は特に
限定されない。The light bulb manufactured by the method of the present invention can be used as a light source in various fields, and its use is not particularly limited.
第１図は本発明の方法により光干渉膜と散光性薄膜が形
成された状態の電球の一例の概略を示す説明用断面図、
第２図〜第４図はディッピング法の説明図、第５図は散
光性薄膜の説明用断面図、第６図は補強用薄膜の説明用
断面図である。 10…ガラス製発光管、11…フィラメント 20…光干渉膜、30…散光性薄膜 40…口金、50…被覆液 60…補強用薄膜FIG. 1 is an explanatory cross-sectional view schematically showing an example of a bulb in which a light interference film and a light-scattering thin film are formed by the method of the present invention;
2 to 4 are explanatory views of the dipping method, FIG. 5 is a cross-sectional view for explaining the light-scattering thin film, and FIG. 6 is a cross-sectional view for explaining the reinforcing thin film. 10: glass arc tube, 11: filament 20: light interference film, 30: light-scattering thin film 40: base, 50: coating liquid 60: thin film for reinforcement
───────────────────────────────────────────────────── フロントページの続き (58)調査した分野(Int.Cl.6，ＤＢ名) H01K 1/00 - 3/32 ──────────────────────────────────────────────────続 き Continued on the front page (58) Field surveyed (Int.Cl. 6 , DB name) H01K 1/00-3/32
Claims (1)
渉膜を設け、当該光干渉膜の表面にさらに散光性薄膜を
設け、この散光性薄膜の表面にさらに補強用薄膜を形成
してなる電球の製造方法であって、 前記散光性薄膜を、シリコン化合物の溶液にセラミック
材料の微粉末を分散してなる被覆液を用いてディッピン
グ法により形成し、 前記補強用薄膜を、前記散光性薄膜の形成に用いたシリ
コン化合物の溶液と同様の組成であってセラミック材料
の微粉末を含有しない被覆液を用いてディッピング法に
より形成することを特徴とする電球の製造方法。An optical interference film having a multilayer structure is provided on the outer surface of a glass envelope tube, a light-scattering thin film is further provided on the surface of the light interference film, and a reinforcing thin film is further formed on the surface of the light-scattering thin film. The method for manufacturing a light bulb, wherein the light-scattering thin film is formed by a dipping method using a coating solution obtained by dispersing a fine powder of a ceramic material in a solution of a silicon compound. A method for manufacturing a light bulb, comprising forming a light-emitting thin film by a dipping method using a coating liquid having a composition similar to that of a silicon compound solution used for forming a light-scattering thin film and not containing fine powder of a ceramic material.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63151242A JP2902404B2 (en) | 1988-06-21 | 1988-06-21 | How to make a light bulb |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63151242A JP2902404B2 (en) | 1988-06-21 | 1988-06-21 | How to make a light bulb |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH01319244A JPH01319244A (en) | 1989-12-25 |
| JP2902404B2 true JP2902404B2 (en) | 1999-06-07 |
Family
ID=15514366
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP63151242A Expired - Fee Related JP2902404B2 (en) | 1988-06-21 | 1988-06-21 | How to make a light bulb |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2902404B2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005108685A (en) * | 2003-09-30 | 2005-04-21 | Harison Toshiba Lighting Corp | Bulb |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59221968A (en) * | 1983-05-31 | 1984-12-13 | 東芝ライテック株式会社 | Method of forming scattering membrane |
| JPS6188449A (en) * | 1984-10-08 | 1986-05-06 | 東芝硝子株式会社 | Protective film for reflector |
-
1988
- 1988-06-21 JP JP63151242A patent/JP2902404B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH01319244A (en) | 1989-12-25 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4701663A (en) | Lamp having interference film | |
| US10580944B2 (en) | Wavelength conversion member, light-emitting device, and method for manufacturing wavelength conversion member | |
| JPH0786569B2 (en) | Bulb | |
| KR890004639B1 (en) | Lamp | |
| JPH06347618A (en) | Article with light scattering coating film, lamp, reflector and formation of coating film thereof | |
| JP2007520040A (en) | lighting equipment | |
| KR930009240B1 (en) | Optical interference film and lamp having the same | |
| CN1066287C (en) | Lamp with IR reflecting film and light-scattering coating | |
| JPH07109758B2 (en) | Bulb | |
| JP2902404B2 (en) | How to make a light bulb | |
| US5219606A (en) | Method of manufacturing phosphor screen for intensifier | |
| JPH0479104B2 (en) | ||
| JPS5823161A (en) | Incandescent bulb | |
| JP3438289B2 (en) | Light bulbs and lighting equipment | |
| JP2928784B2 (en) | Multilayer reflector | |
| JPH0629882B2 (en) | Multilayer film mirror | |
| JP2626062B2 (en) | Incandescent light bulb | |
| JPH03208253A (en) | Light interference membrane and tube bulb using same | |
| JP2790468B2 (en) | Manufacturing method of halogen bulb | |
| JP2702720B2 (en) | Fluorescent lamp | |
| JPH0381932A (en) | Phosphor screen, manufacture thereof and x-ray image tube | |
| JPS58135565A (en) | Incandescent bulb | |
| JP3400053B2 (en) | Interference filter and method of manufacturing the same | |
| JP2623071B2 (en) | Tube ball | |
| JPS61198546A (en) | Manufacture of electric bulb |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |