JPS6188449A - Protective film for reflector - Google Patents

Abstract

(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

Detailed Description of the Invention [Technical Field of the Invention] The present invention provides a protective film for a reflector that improves the durability of a multi-purpose optical fB7 that is temporarily attached to the reflector of, for example, a high-output halogen light bulb. do.

[Technical background of the invention and its problems] Conventionally, reflectors for halogen light bulbs, for example, have a central f-shaped structure that effectively reflects the visible light from a high-pressure lamp and that also absorbs heat. For example, ZnS-AlgF, or ZnS-
8in! A multilayer film is deposited in which a high refractive index vapor-deposited H material and a low refractive index vapor-deposited material are alternately deposited. However, due to the high heat generated by the multi-layer B portion when the lamp is lit, there are rumors that measures such as the 17C2 lower cover were adopted to prevent this. ing.

(1) Extend heat treatment to the multilayer film after the steaming process.

(2) Japanese Patent Publication No. 58-5958. As disclosed in No. C2, after vacuum steaming, the reflector is melted with Si02, or after spraying a solution, it is turned into stone and the multilayer film is protected with a hard 8i02 layer. .

However, the above means of fil, +21 is n
Although it is effective against low output halogen lamps, such as 12V and 50W, it reduces the durability of the multilayer film when used against high output halogen lamps, such as 100V and 360W. The following are the main points.

1. When the lamp is turned on, the temperature of the reflector rises to a maximum of about 580℃ in L minutes, and the temperature of the multilayer film 4' + In, l' increases.
This causes J-cracks, clouding of the film surface, and other phenomena.

2. M1j In the method (2) mentioned above, the reflector is exposed to the atmosphere after vacuum deposition, and after seven seconds, S10! Since the treatment is carried out, the multi-layered crotch may attract dust and pinholes may occur. In addition, TiO2-810, or ZrO, -Sin! has recently been used as a constituent material for multilayer films. A reflector for halogen light bulbs using a highly durable multi-layer film has not yet been developed, but even this one has the disadvantages described below (2). If the concave surface of the reflector to be applied is deep, it is difficult to apply the coating in the opposite direction because the coating does not wrap around the reflector.

2. ZnS-MgF2. ZnS-Sin, system ratio F3 L TE [F18 (film thickness) 1.3 to 1
, 5 times is required, resulting in an increase in flight stability.

3T10□, ZrO, depending on the smoking conditions etc., may cause film-absorption or become a lower grade oxide film and overlap =
It impairs the stability as a characteristic.

4. It is not possible to remove the l's and use it as a recycled board.

[Purpose of the invention]

Provides a protective film for reflectors that enables high durability without causing peeling of multilayer films, film cracks, or surface cloudiness, and that can be obtained simply and inexpensively. The purpose is to

[Summary of the invention]

One side (on the multilayer film of the reflector coated with the two-layer film C: In the temporarily attached protective film for the reflector, the protective film is 8i0!8
0 to 85 weight whisper 1 person/2O31.5 to 4.0
% and has a coefficient of thermal expansion of 20 to 30
IF”/℃, refractive index 1.46 to 1.47 (
1] This is a reflector material WL film formed by depositing silicate glass and then subjecting it to heat treatment at 270° C. at a temperature of 350° C. or more and below the transition point.

[Embodiments of the invention]

DETAILED DESCRIPTION OF THE INVENTION Hereinafter, details of the present invention will be explained with reference to one embodiment and two drawings. (1) is a reflector, for example, a glass substrate for a reflector for a /%l O-gen lamp, and the negative surface is formed with a concave surface +21 (:) in the shape of a paraboloid of revolution. (3) is a concave surface +2
1C: Overlapping multi-iM film, ZnS-MgF'1
ball! i ZnS-810, an alternate layer with an optical thickness of 1/4λ consisting of 21 shields (λ1~1s = 600 n
m, λ1. ~n = 450 nm).

That is, if (H) is a high refractive index material made of ZnS, M
A low refractive index material consisting of gF2 or 5in2 (L
), these (H) and (L) are weighed 26 times, weighed in 2 layers, and further added with 1 layer of pomelo (:(H) for a total of 131
1! I.

Further, C (L) and (H) were laminated 4 times, a total of 8 layers, and the outermost layer C2 became the protective film (4).
It is coated with pith glass. And these?
8! All films are formed by vacuum evaporation.

Steam @ vacuum degree s x 10-' to 1Xl as conditions
(The substrate temperature is 100 to 300℃ at J” Torr.
Met.

The borosilicate glass to be set to form the protective film (4) is as follows ζ;
It has the composition and physical properties shown.

Composition Physical properties 8i02...84 Heavy weight Le5 Swelling rate α=
25Xlυ 7℃B2O3・・・・・・11〃
Optical refractive index N=1.47AllO3... 3
Transition point Tg = 590℃N EyoO... 2〃 The above borosilicate glass has an optical thickness of 1/2λ', u' = 55
Qnm was deposited using an electron gun under the above-mentioned deposition conditions. After the vapor deposition is completed, heat treatment is performed. Namely.

The reflector (1) was heat treated for 1 hour at 450°C by two people in an electric furnace to complete the adhesion.

The following table shows the durability of the multilayer film (3) (with respect to protection 11m (4)
) Comparative experimental data of various tests of a conventional one not having one and one related to the present invention are shown.

(Leaving space below) Table 1 Evaluation symbol 0 - No change
, Evaluation after a total of 100 hours had elapsed by attaching a 360 W no-halogen light bulb (5) and repeating lighting for 10 minutes.

(2) Thermal Shock Test Evaluation was performed when the reflector +1 was placed in an electric furnace in a neutral atmosphere at 600° C. for 25 minutes and then exposed to a ζ2X apparatus in the atmosphere.

(3) Boiling test Evaluation after immersing the reflector (1) in city water at 100°C for 10 minutes.

(4) Tensile test Protective film f4) Evaluation when scotch tape of 0600 t: 1/2 inch width and 10% length was applied and suddenly peeled off (two times).

As is clear from Table 1, the present invention has a protective film (4) on which borosilicate glass containing 1itOs is deposited as the outermost layer I of the multilayer Hi31 as the preservation film (4). 8i0. In comparison to the conventional one coated with the same material, four times better results were achieved through each test.

This is because the structure of C8 and the protective film (4) is an amorphous layer unique to glass, so 8i0. I think this is because the structure is more dense than the layers.

(Composition of Ni-silicate glass, and ≦2 physical properties C:
Reasons for limitation regarding
or 85. AI! ys 1.5 to 4.
Type 0 plate% and limited cy = Kotoha multifamily system (ZnS −
mgF', ZnS-8i0. ) in order to obtain appropriate thermal stress and silent expansion coefficient,
Further C: Since it is necessary to introduce an embrittlement treatment process after breaking, it is necessary to introduce a special C'4 r-resistant protective layer. Further, within the above composition, the weekly allowance is that the thermal elongation rate α=1 to 3 oqO-17°C. That is, α is 20
If it is less than J-'/T:, it will be difficult to create the desired glass itself, and at the same time, it will be difficult to create the desired glass itself. invite Also, if α exceeds 30XIO'/℃, 8i0
．． ,Man! ,0. Since the glass mainly contains alkali (soda lime) and BzOs as other glass constituents, the moisture resistance is poor, and film abnormalities and surface clouding occur in tensile tests and boiling tests.

It should be noted that the Hagiwa glass used is preferably vitrified T5, and sintered crystal glass is not preferred because it is poorly compatible with the electron gun. In addition, the reasons for limiting the %C of the human tzos to 1.5 to 4.0 weight are as follows: ・1 Not only is it related to the expansion rate, but also the processing process [22] This is to gain improvement.

In addition, as is clear from Table 1, it has been found that in the heat treatment step C2, a temperature coefficient of 7 to 7.degree. C. within the transition temperature of 350.degree. That is, 35
Below 0°C, Rule 7. ．． 5 <j7
Although it is good, it is insufficient for high output lamps. May:
@: If the temperature exceeds the transition point, the protective film (4) may lose its deformation and cracks may occur, and C2 is ZnS.
is 7. noO) X-ray diffraction (because it is clearly arched from 2), the optical T and T properties are shifted to the shorter wavelength side, causing interference unevenness. LX t, :: Color y, (Il,) j& Refractive index N Ha1.46fx IL 1.47-Cj'e Since it is stable, it is suitable for the optical properties of poly'11:i> system. It has no effect.

〔Effect of the invention〕

As described in detail above, the present invention provides a protective film 1-18!0.80 to 85 times H"L (y,,
Human 7t031.5 to 4.0 Contains 2% salt, thermal expansion number 20 to 30 υ-7/, refractive index 1.46
This borosilicate glass is made of borosilicate glass with a molecular weight of 1.47 to 1.47, and the borosilicate glass is heat-treated at a temperature of 350°C or higher and below the transition point (with a protective film for a reflector so that it is formed from two layers). because there is.

When this reflector C2 is lit, for example, Takabatake's herogen lamp, the multilayer film C2 has the immediate advantage of being able to maintain high efficiency lighting without causing any change in temperature due to its high heat (2). has.

In addition, the two-layer protective film is said to be very durable.

It also has the advantage of being very simple and can be obtained at low cost. In addition, 1 will not be implemented? In +1, vapor deposition using an electron gun was used as a method for depositing the protective film, but the present invention is not limited to this method, but sputtering.

Means such as ion blating may also be used.

4 Snake a! ] Re :) 1) Single 〒r LH61
and IA- are the parts of the present invention, and are a partially cut-out surface X applied to a reflector for the Heroge/λ sphere.

ill...Reflector) 3)・Multilayer film, 4)
...(Aghast 1."i 6';<.

Claims (1)

[Claims] In a reflector protective film coated on a multilayer film of a reflector having a multilayer film coated on one side, the protective film is made of SiO_280
85% by weight, Al_2O_31.5 to 4.0
% by weight and a thermal expansion coefficient of 20 to 30×1
It is characterized by being formed by depositing borosilicate glass with a refractive index of 0^-^7/°C and a refractive index of 1.46 to 1.47, and then heat-treating the borosilicate glass at a temperature of 350°C or higher and below the transition point. Protective film for reflectors.