JP2873413B2 - Exposure method for photosensitive glass - Google Patents
Exposure method for photosensitive glassInfo
- Publication number
- JP2873413B2 JP2873413B2 JP3303444A JP30344491A JP2873413B2 JP 2873413 B2 JP2873413 B2 JP 2873413B2 JP 3303444 A JP3303444 A JP 3303444A JP 30344491 A JP30344491 A JP 30344491A JP 2873413 B2 JP2873413 B2 JP 2873413B2
- Authority
- JP
- Japan
- Prior art keywords
- photosensitive glass
- exposure
- light source
- transmittance
- laser
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C4/00—Compositions for glass with special properties
- C03C4/04—Compositions for glass with special properties for photosensitive glass
Description
【０００１】[0001]
【産業上の利用分野】本発明は、感光性ガラスの露光方
法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for exposing photosensitive glass.
【０００２】[0002]
【従来の技術】従来、感光性ガラスにエッチングにより
加工を施し、インクジェットプリンタヘッドなど微細な
形状を形成する方法がある。この方法は、紫外線ランプ
の照射により感光性ガラスの所望の部分を露光し（露光
工程）、感光性ガラスを５００〜７００℃に加熱して露
光部を結晶化させ（熱現像工程）、結晶化した露光部を
エッチング液（フッ化水素酸溶液）により溶解させて除
去する（エッチング工程）方法である。なお、紫外線ラ
ンプとしては、高圧水銀ランプなどが用いられている。2. Description of the Related Art Conventionally, there has been a method of forming a fine shape such as an ink jet printer head by processing a photosensitive glass by etching. In this method, a desired portion of the photosensitive glass is exposed to light from an ultraviolet lamp (exposure step), and the photosensitive glass is heated to 500 to 700 ° C. to crystallize the exposed portion (heat development step). This is a method of dissolving and removing the exposed portion with an etching solution (hydrofluoric acid solution) (etching step). Note that a high-pressure mercury lamp or the like is used as the ultraviolet lamp.
【０００３】[0003]
【発明が解決しようとする課題】従来の方法では、感光
性ガラス板を露光し熱現像して形成した結晶部をエッチ
ングして、溝などを加工する時のエッチング深さの制御
は、エッチング時間やエッチング液の温度や濃度などエ
ッチング条件で行っていた。そして結晶部をエッチング
するときのエッチング速度は、エッチング条件だけでな
く、熱現像によって形成された結晶の状態で左右され
る。そしてこの結晶部の結晶の状態は、露光状態と熱現
像によって決定する。In the conventional method, when a photosensitive glass plate is exposed to light and thermally developed, a crystal part formed is etched, and the etching depth when processing a groove or the like is controlled by the etching time. And etching conditions such as temperature and concentration of the etching solution. The etching rate for etching the crystal part depends on not only the etching conditions but also the state of the crystal formed by thermal development. The state of the crystal in this crystal part is determined by the exposure state and thermal development.
【０００４】特に露光は、感光性ガラスのロットによる
露光感度の変動や、光源の発光強度や、発光波長変動に
よる影響を受け、適切な露光状態であったかどうかは、
熱現像後の結晶の状態を見て初めて判るのが現状であっ
た。しかも、結晶部を目で見て、その色や濃度や板厚を
貫通しているか否か等から判断しているが、この目によ
る判断によって最適の露光状態を判断することは不可能
であり、露光状態を判断しながら露光できないため感光
性ガラスの加工の歩留りを悪くしていた。[0004] In particular, exposure is affected by fluctuations in exposure sensitivity depending on the lot of photosensitive glass, light emission intensity of light source, and light emission wavelength fluctuation.
At present, it was only possible to understand the state of the crystals after thermal development. Moreover, the crystal part is visually checked to determine whether or not the crystal part penetrates the color, density, or plate thickness. However, it is impossible to determine the optimum exposure state based on this determination. However, since the exposure cannot be performed while judging the exposure state, the yield of the processing of the photosensitive glass is deteriorated.
【０００５】そこで本発明の目的は、感光性ガラスの露
光に際して、熱現像を待たないで、しかも目に頼らない
で最適の露光状態を容易に実現し、感光性ガラスの加工
の歩留りを向上させることにある。Accordingly, an object of the present invention is to easily realize an optimum exposure state without waiting for heat development and without relying on eyes when exposing a photosensitive glass, and to improve the yield of photosensitive glass processing. It is in.
【０００６】[0006]
【課題を解決するための手段】上記目的を達成するため
に、本発明の感光性ガラスの加工方法は、感光性ガラス
の感度波長域を含む発振波長を持つ光源で感光性ガラス
板を露光し、上記の露光は、露光した光が感光性ガラス
板を透過する透過率を測定しながら行い、所定の露光状
態に対応する透過率が得られた時に露光を停止すること
を特徴としている。In order to achieve the above object, a method for processing a photosensitive glass according to the present invention comprises exposing a photosensitive glass plate to a light source having an oscillation wavelength including a sensitivity wavelength range of the photosensitive glass. The exposure is performed while measuring the transmittance of the exposed light through the photosensitive glass plate, and the exposure is stopped when a transmittance corresponding to a predetermined exposure state is obtained.
【０００７】上記の光源は、レーザー、特にＸｅＣｌエ
キシマレーザーが望ましい。The light source is preferably a laser, particularly a XeCl excimer laser.
【０００８】本発明者は、感光性ガラスを、感光性ガラ
スの感度波長域を含む発振波長を持つ光源で露光する
と、その透過分光特性が変化すること、及び所定の透過
率では所定の露光状態が得られることを発見した。The inventor of the present invention has found that, when photosensitive glass is exposed to a light source having an oscillation wavelength including the sensitivity wavelength range of the photosensitive glass, its transmission spectral characteristics change. Was obtained.
【０００９】図４に示す実験データでは、露光装置とし
て、キャノン製マスクアライナである「キャノンＰＬ
Ａ」（製品名）を用い、出力２５０ｗの高圧水銀灯で露
光を行った。露光する感光性ガラスとして、板厚ｔ＝
１．６mmのものを用いた。感光性ガラスの感度波長域３
００〜３２０nmを含むように、光源の発振波長を２００
nmから７００nmまで変化させ、露光時間を５分，１０
分，３０分，１時間，２時間，３時間，４時間，６時間
としてそれぞれ透過率（％）を測定した。このデータか
ら発振波長が２４０〜３４０nmの波長域で透過率の変化
が大きいことが判る。また２時間から３時間の露光時間
で、透過率約２５〜２０％となった時が、極めてエッチ
ングされやすい結晶部が形成でき、具体的にはエッチン
グ速度１０〜１９μm ／min の結晶部が形成でき、最適
の露光状態であることが判った。According to the experimental data shown in FIG. 4, the mask aligner “Cannon PL” manufactured by Canon was used as the exposure apparatus.
A "(product name) was used for exposure with a high-pressure mercury lamp having an output of 250 w. The photosensitive glass to be exposed has a thickness t =
A 1.6 mm one was used. Sensitivity wavelength range of photosensitive glass 3
The oscillation wavelength of the light source is set to 200 so as to include 00 to 320 nm.
from 700 nm to 700 nm, and the exposure time is 5 minutes, 10
The transmittance (%) was measured for minutes, 30 minutes, 1 hour, 2 hours, 3 hours, 4 hours, and 6 hours. From this data, it can be seen that the change in transmittance is large in the wavelength range where the oscillation wavelength is 240 to 340 nm. When the transmittance is about 25 to 20% with an exposure time of 2 to 3 hours, a crystal part which is extremely easily etched can be formed. Specifically, a crystal part having an etching rate of 10 to 19 μm / min is formed. It was found that it was possible and that the exposure condition was optimal.
【００１０】このことから、上記の波長域での透過率を
測定すれば、露光状態が判明することが明らかとなっ
た。[0010] From this, it has been clarified that the exposure state can be determined by measuring the transmittance in the above wavelength range.
【００１１】光源としては、高圧水銀ランプの他にも、
ＸｅＣｌエキシマレーザーやＫｒＦエキシマレーザーが
使用できる。As a light source, besides a high-pressure mercury lamp,
XeCl excimer laser and KrF excimer laser can be used.
【００１２】[0012]
【実施例】以下、図面を参照し、インクジェットプリン
タヘッドのインク流路を形成する本発明の実施例につい
て説明する。図１に示すように、露光工程では、板厚１
mmの感光性ガラス板１０の表面１０ａを研磨し、上方に
光源１を配置して、光源からの光１ａを露光マスク２を
介して感光性ガラス板の表面１０ａに照射する。露光マ
スク２には感光性ガラス板１０の表面に形成されるイン
ク流路となる溝などの形状の露光パターン２ａ…と、そ
の他の部分に遮光部２ｂ…とが形成してある。感光性ガ
ラス板１０を挾んで露光パターン２ａの１つと対向する
位置に、透過率を測定する手段であるフォトセンサ３が
配設してある。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention for forming an ink flow path of an ink jet printer head will be described below with reference to the drawings. As shown in FIG. 1, in the exposure step,
The surface 10 a of the photosensitive glass plate 10 mm is polished, the light source 1 is disposed above, and light 1 a from the light source is applied to the surface 10 a of the photosensitive glass plate via the exposure mask 2. The exposure mask 2 has an exposure pattern 2a in the form of a groove or the like serving as an ink flow path formed on the surface of the photosensitive glass plate 10, and a light-shielding portion 2b in other portions. At a position facing one of the exposure patterns 2a with the photosensitive glass plate 10 interposed therebetween, a photosensor 3, which is a means for measuring transmittance, is provided.
【００１３】使用される光源１としては、感光性ガラス
の感度波長域２４０〜３４０nmをその発振波長に含む高
圧水銀ランプを使用し、２４０〜３４０nmの発振波長域
を用いる。またフォトセンサ３としては、感光性ガラス
の透過分光特性が変化する範囲の透過率を測定できるも
のであれば良く、ＧａＰ，ＧａＡｓＰなどのフォトダイ
オード等が好適である。As the light source 1 to be used, a high-pressure mercury lamp having an oscillation wavelength including a sensitivity wavelength range of 240 to 340 nm of the photosensitive glass is used, and an oscillation wavelength range of 240 to 340 nm is used. The photosensor 3 may be any sensor that can measure the transmittance in a range where the transmission spectral characteristics of the photosensitive glass change, and a photodiode such as GaP or GaAsP is suitable.
【００１４】光源１からの光１ａを照射して感光性ガラ
ス板１０を露光しながら、感光性ガラス板１０を透過し
た光をフォトセンサ３で受け、フォトセンサ３の出力変
化によって透過率を測定してゆく。最適の露光状態とし
て、この例ではエッチング速度約１０μm ／min の結晶
部を得るために、約２時間露光して透過率が約２５％に
なった時に露光を停止した。この露光により露光部１１
…が形成される。While exposing the photosensitive glass plate 10 by irradiating the light 1a from the light source 1, the light transmitted through the photosensitive glass plate 10 is received by the photo sensor 3, and the transmittance is measured by the output change of the photo sensor 3. I will do it. As an optimum exposure state, in this example, in order to obtain a crystal part having an etching rate of about 10 μm / min, the exposure was stopped when the transmittance reached about 25% after exposure for about 2 hours. The exposure unit 11
Are formed.
【００１５】図２に示すように、感光性ガラス板１０を
５００〜７００℃程度の高温に加熱し、露光部１１…を
結晶化する熱現像を行って、結晶部１１ａ…を形成す
る。As shown in FIG. 2, the photosensitive glass plate 10 is heated to a high temperature of about 500 to 700 ° C., and is subjected to thermal development for crystallizing the exposed portions 11 to form crystal portions 11a.
【００１６】次に図３に示すように、この感光性ガラス
板１０にフッ化水素酸（ＨＦ）６％溶液を２５℃の液温
に保ったエッチング液を用いて、シャワー圧力３kgｆ／
cm2で１０分間エッチングを行ったところ、感光性ガラ
ス板１０の両面に、エッチング深さが１００μm の溝部
１２…が形成できた。即ち、上記の露光，現像により形
成された結晶部１１ａは、エッチング速度が約１０μm
／min であり、最適の露光状態であった。この溝部１２
をインク流路としてインクジェットプリンタヘッドを構
成する。Next, as shown in FIG. 3, a shower pressure of 3 kgf / h is applied to the photosensitive glass plate 10 by using an etching solution in which a 6% solution of hydrofluoric acid (HF) is maintained at a liquid temperature of 25 ° C.
When etching was performed at cm 2 for 10 minutes, grooves 12 having an etching depth of 100 μm were formed on both surfaces of the photosensitive glass plate 10. That is, the crystal part 11a formed by the above exposure and development has an etching rate of about 10 μm.
/ Min, which is an optimal exposure state. This groove 12
Is used as an ink flow path to form an ink jet printer head.
【００１７】上記実施例においては、光源として高圧水
銀ランプを用いているが、その他にもＸｅＦ（発振波長
３５１nm），ＸｅＣｌ（発振波長３０８nm），ＫｒＦ
（発振波長２４８nm），ＡｒＦ（発振波長１９３nm）エ
キシマレーザーまたはＮ2 レーザー（発振波長３３７n
m）を用いてもよく、またＮｄ +とＹＡＧ（イットリウ
ム・アルミニウム・ガーネット）とを混合したレーザ
ー，色素レーザー，Ｋｒイオンレーザー，Ａｒイオンレ
ーザーまたは銅蒸気レーザーの基本発振波長光を非線形
光学素子などにより紫外域に変換したレーザーを用いて
もよく、またエキシマランプを用いてもよい。In the above embodiment, a high-pressure mercury lamp is used as a light source, but other than that, XeF (oscillation wavelength 351 nm), XeCl (oscillation wavelength 308 nm), KrF
(Oscillation wavelength 248 nm), ArF (oscillation wavelength 193 nm) excimer laser or N 2 laser (oscillation wavelength 337 n
m) may be used, and a laser, a dye laser, a Kr ion laser, an Ar ion laser or an Ar ion laser or a copper vapor laser mixed with Nd + and YAG (yttrium aluminum garnet) may be used as a nonlinear optical element. May be used, or an excimer lamp may be used.
【００１８】[0018]
【発明の効果】以上に説明したように、本発明では、感
光性ガラスの感度波長域を含む発振波長を持つ光源で感
光性ガラスを露光し、露光した光が感光性ガラスを透過
する透過率を測定しながら露光を行い、所望の透過率が
得られた時に露光を停止するので、常に最適の露光状態
を実現でき、その後の熱現像，エッチングにより溝が形
成された際には、常に均一な形状となり、歩留りが向上
する。したがってインクジェットプリンタヘッドのイン
ク流路やマイクロマシーン等の微細加工の応用分野にお
いて極めて有効である。As described above, according to the present invention, the photosensitive glass is exposed with a light source having an oscillation wavelength including the sensitivity wavelength range of the photosensitive glass, and the transmittance at which the exposed light passes through the photosensitive glass. Exposure is performed while measuring and the exposure is stopped when the desired transmittance is obtained, so that the optimum exposure state can always be realized, and when the groove is formed by subsequent thermal development and etching, it is always uniform. And the yield is improved. Therefore, the present invention is extremely effective in application fields of fine processing such as an ink flow path of an ink jet printer head and a micro machine.
【図１】本発明の露光工程を示す正面図である。FIG. 1 is a front view showing an exposure step of the present invention.
【図２】同上の熱現像工程後の感光性ガラスの正面図で
ある。FIG. 2 is a front view of the photosensitive glass after a heat development step according to the first embodiment.
【図３】同上のエッチング工程後の感光性ガラスの正面
図である。FIG. 3 is a front view of the photosensitive glass after the above-described etching step.
【図４】感光性ガラスの露光による透過分光特性の変化
を示す特性図である。FIG. 4 is a characteristic diagram showing a change in transmission spectral characteristics due to exposure of a photosensitive glass.
１ 光源 ３ 透過率を測定する手段 １０ 感光性ガラス板 Reference Signs List 1 light source 3 means for measuring transmittance 10 photosensitive glass plate
フロントページの続き (56)参考文献 特開 昭49−133782（ＪＰ，Ａ) 特開 平４−59628（ＪＰ，Ａ) 特開 平４−349132（ＪＰ，Ａ) 特開 平４−357133（ＪＰ，Ａ) 特開 平５−78146（ＪＰ，Ａ) 特開 平５−105485（ＪＰ，Ａ) (58)調査した分野(Int.Cl.6，ＤＢ名) C03C 15/00 G03F 7/20 505 Continuation of front page (56) References JP-A-49-133372 (JP, A) JP-A-4-59628 (JP, A) JP-A-4-349132 (JP, A) JP-A-4-357133 (JP) JP-A-5-78146 (JP, A) JP-A-5-105485 (JP, A) (58) Fields investigated (Int. Cl. 6 , DB name) C03C 15/00 G03F 7/20 505
Claims (3)
長を持つ光源で感光性ガラス板を露光し、 上記露光は、露光した光が上記感光性ガラス板を透過す
る透過率を測定しながら行い、所定の露光状態に対応す
る透過率が得られた時に露光を停止することを特徴とす
る感光性ガラスの露光方法。1. A photosensitive glass plate is exposed to a light source having an oscillation wavelength including a sensitivity wavelength range of the photosensitive glass, and the exposure is performed while measuring a transmittance of the exposed light through the photosensitive glass plate. A method of exposing a photosensitive glass, wherein the exposure is stopped when a transmittance corresponding to a predetermined exposure state is obtained.
ーであることを特徴とする感光性ガラスの露光方法。2. The method according to claim 1, wherein the light source is a laser.
ｌエキシマレーザーであることを特徴とする感光性ガラ
スの露光方法。3. The laser according to claim 2, wherein the laser is Xe C
(1) A method for exposing a photosensitive glass, which is an excimer laser.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3303444A JP2873413B2 (en) | 1991-11-19 | 1991-11-19 | Exposure method for photosensitive glass |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3303444A JP2873413B2 (en) | 1991-11-19 | 1991-11-19 | Exposure method for photosensitive glass |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH05139788A JPH05139788A (en) | 1993-06-08 |
| JP2873413B2 true JP2873413B2 (en) | 1999-03-24 |
Family
ID=17921071
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3303444A Expired - Fee Related JP2873413B2 (en) | 1991-11-19 | 1991-11-19 | Exposure method for photosensitive glass |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2873413B2 (en) |
-
1991
- 1991-11-19 JP JP3303444A patent/JP2873413B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH05139788A (en) | 1993-06-08 |
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