JP2854210B2 - Spinner device - Google Patents

Spinner device

Info

Publication number
JP2854210B2
JP2854210B2 JP34987392A JP34987392A JP2854210B2 JP 2854210 B2 JP2854210 B2 JP 2854210B2 JP 34987392 A JP34987392 A JP 34987392A JP 34987392 A JP34987392 A JP 34987392A JP 2854210 B2 JP2854210 B2 JP 2854210B2
Authority
JP
Japan
Prior art keywords
coated
spinner
annular projection
guard ring
liquid substance
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP34987392A
Other languages
Japanese (ja)
Other versions
JPH06170316A (en
Inventor
今朝男 安藤
俊雄 柏木
正彦 琴寄
勝美 山口
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ORIJIN DENKI KK
Original Assignee
ORIJIN DENKI KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
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Priority to JP34987392A priority Critical patent/JP2854210B2/en
Publication of JPH06170316A publication Critical patent/JPH06170316A/en
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  • Coating Apparatus (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【産業上の利用分野】本発明は,被塗布体の上面に液状
物質の塗布を行うスピンナ装置の改良に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an improvement in a spinner apparatus for applying a liquid substance on an upper surface of an object to be coated.

【従来の技術】試料に液状物質を塗布する方法として,
回転する試料例えばガラス基板やディスク基板の上面に
紫外線硬化型等の液状物質を滴下または噴霧して,試料
の全面に液状物質を均一に施す方法が知られている。こ
の方法を実施する装置として,図8に示すようなスピン
ナ装置がある。同図において,1は被塗布体,2は被塗
布体1が載置されるスピンナヘッド,3はスピンナヘッ
ド2の外側近傍に取り付けられた円錐傘,4はこれらを
収容するコーターハウス,5はモータ(図示せず)の回
転をスピンナヘッド2に伝達する回転軸であり,コータ
ーハウス4の底面中央を貫通して導出され,真空装置
(図示せず)に接続されている。コーターハウス4の底
面周辺部には排気口6が設けられている。コーターハウ
ス4内のスピンナヘッド2の周囲には,そのスピンナヘ
ッド2を囲むように,ガードリング7とそれを支える円
筒8とが,スピンナヘッド2の回転軸5と同軸的に且つ
ガードリング7の上面と被塗布体1の下面とがエア吹き
出し口9としての所定の間隔,例えば1mm程度のほぼ
均一な間隔をなすように配置されている。また,上記円
筒8の側面には,1個所或いは数個所のエア供給口10
を設け,そのエア供給口10からエアを供給し,エア吹
き出し口9からエアを吹き出させる。以上説明したスピ
ンナ装置を用いて被塗布体1上面へ液状物質の塗布を行
うに際しては,先ず真空装置を作動させて,被塗布体1
をスピンナヘッド2の上面に吸引固定すると共に,エア
供給口10から供給されたエアを被塗布体1の下面の通
路を通って,エア吹き出し口9から被塗布体1の下面全
周にわたりほぼ均一且つ高速に吹き出させる。ついで,
スピンナヘッド2を回転させ,排気口6からコーターハ
ウス4内を排気しつつ,被塗布体1の上面に液状物質を
滴下または噴霧し,しかる後,被塗布体1を高速回転さ
せる。その結果,液状物質は被塗布体1の全面に均一に
塗布される。
2. Description of the Related Art As a method for applying a liquid substance to a sample,
2. Description of the Related Art There is known a method in which a liquid material such as an ultraviolet curable type is dropped or sprayed on the upper surface of a rotating sample such as a glass substrate or a disk substrate, and the liquid material is uniformly applied to the entire surface of the sample. As an apparatus for performing this method, there is a spinner apparatus as shown in FIG. In FIG. 1, reference numeral 1 denotes an object to be coated, 2 denotes a spinner head on which the object to be coated 1 is placed, 3 denotes a conical umbrella attached near the outside of the spinner head 2, 4 denotes a coater house for accommodating these, and 5 denotes It is a rotating shaft that transmits the rotation of a motor (not shown) to the spinner head 2, extends through the center of the bottom surface of the coater house 4, and is connected to a vacuum device (not shown). An exhaust port 6 is provided around the bottom surface of the coater house 4. A guard ring 7 and a cylinder 8 supporting the guard ring 7 are provided around the spinner head 2 in the coater house 4 so as to surround the spinner head 2. The upper surface and the lower surface of the object 1 are arranged so as to form a predetermined space as the air outlet 9, for example, a substantially uniform space of about 1 mm. One or several air supply ports 10 are provided on the side of the cylinder 8.
The air is supplied from the air supply port 10 and the air is blown out from the air blowout port 9. When applying the liquid substance to the upper surface of the object 1 using the spinner device described above, first, the vacuum device is operated to operate the object 1
Is suction-fixed to the upper surface of the spinner head 2, and the air supplied from the air supply port 10 passes through a passage on the lower surface of the object 1, and is substantially uniform from the air outlet 9 to the entire lower surface of the object 1. And blow it out at high speed. Then
While rotating the spinner head 2 and exhausting the interior of the coater house 4 from the exhaust port 6, a liquid substance is dropped or sprayed on the upper surface of the object 1 to be coated, and then the object 1 is rotated at a high speed. As a result, the liquid substance is uniformly applied to the entire surface of the object 1.

【発明が解決しようとする課題】しかしながら,このよ
うな従来のスピンナ装置にあっては,ガードリングから
吹き出すエアにより,数十μm程度の比較的粒径の小さ
な液状物質の被塗布体1下面への浸入を防止することが
できるが,被塗布体1の回転の立ち上がり時に,液状物
質に遠心力が加わり被塗布体1の外周に飛び出す際の液
状物質の固まりから発生する百μm程度以上の比較的粒
径の大きな液状物質の被塗布体1下面への浸入について
は,その浸入を防止することができない。この被塗布体
1の下面に付着した液状物質は,汚れの原因となるため
後で除去しなければならないが,液状物質の種類によっ
ては除去は非常に困難であり,また被塗布体1の傷の発
生にもつながり,生産性が低下する。また,液状物質の
付着した部分は利用できないため,被塗布体1の利用率
も低下するという問題があった。
However, in such a conventional spinner device, the air blown out from the guard ring causes the liquid material having a relatively small particle size of about several tens of μm to be applied to the lower surface of the object 1 to be coated. Can prevent the infiltration of the liquid material, but the centrifugal force is applied to the liquid material at the start of the rotation of the object 1 and the liquid material is ejected to the outer periphery of the object 1. However, it is not possible to prevent the liquid material having a large target particle size from penetrating into the lower surface of the body 1 to be coated. The liquid substance adhering to the lower surface of the object 1 must be removed later because it causes dirt. However, depending on the type of the liquid substance, it is very difficult to remove the liquid substance. This also leads to the occurrence of the phenomenon, and the productivity decreases. In addition, since the portion to which the liquid substance adheres cannot be used, there is a problem that the utilization rate of the object 1 is also reduced.

【課題を解決するための手段】本発明は以上の欠点を除
去するために,被塗布体の上面に液状物質を滴下または
噴霧して,被塗布体の上面に均一な塗膜を形成するスピ
ンナ装置において,上記被塗布体の下面に上記液状物質
が浸入しないように,少なくとも上記被塗布体の外周側
面の下部が近接して囲まれていることを特徴とするスピ
ンナ装置を提供するものである。
SUMMARY OF THE INVENTION In order to eliminate the above-mentioned drawbacks, the present invention provides a spinner for forming a uniform coating film on the upper surface of an object by dropping or spraying a liquid substance on the upper surface of the object. In a spinner device, at least a lower part of an outer peripheral side surface of the object to be coated is closely surrounded so as to prevent the liquid substance from entering the lower surface of the object to be coated. .

【実施例】図1乃至図3は,本発明の一実施例を説明す
るための図であり,図2及び図3は図1に示すガードリ
ング7の詳細を示す図である。これらの図において,ガ
ードリング7の上面には,一周にわたって溝7aが形成
されており,溝7aの外周部が内周部よりも高くなるよ
うに,溝7aの外周部には環状突起部7bが設けられて
いる。また,溝7aの底部には外部に貫通するようにド
レイン孔7cが数カ所形成されている。環状突起部7b
は,被塗布体1の外周側面の下部を囲むように,被塗布
体の外周に近接して設けられている。また,環状突起部
7bの上面のレベルは,被塗布体1の上面のレベルより
も低いことが望ましい。例えば,環状突起部7bは,被
塗布体1の外周より水平方向に1〜3mm程度離れた位
置に,被塗布体の外周側面の下部を0.1〜0.5mm
程度囲むように設けられている。このように構成された
スピンナ装置において,被塗布体1の上面に液状物質を
滴下または噴霧し,被塗布体1を高速回転させると,被
塗布体1の上面に吐出された液状物質は,被塗布体1が
回転することにより遠心力が加わり,被塗布体1の上面
に膜を形成しながら被塗布体の外周より飛び出す。その
飛び出し初めは液状物質11が大量に飛び出すため,図
4に示すように膜を張って下方向に飛び出す。飛び出し
た液膜が切れる際,液状物質11が四方八方へ飛び散る
が,被塗布体1の外周側面の下部が環状突起部7bによ
り近接して囲まれているので,液状物質11が直接被塗
布体1の下面へ衝突することはない。また,図5に示す
ように,液状物質の飛び出す方向は,遠心力による液の
飛び出し速度ベクトルAと,被塗布体1の回転による液
の飛び出し速度ベクトルBとの合成速度ベクトルCの方
向となるが,被塗布体1が環状突起部7bに近くから囲
まれている場合の環状突起部7bに液状物質の衝突する
角度αは,被塗布体1が環状突起部7bに遠方から囲ま
れている場合の環状突起部7bに液状物質の衝突する角
度βに比較して小さく,しかも実際上,速度ベクトルB
は速度ベクトルAに比較して10倍以上と著しく大きい
ので,環状突起部7bを被塗布体の外周に極力近づけて
設けると,被塗布体の回転の初めに大量に飛び出す液状
物質を環状突起部7bの側面にほぼ平行に当てることと
なるため,環状突起部7bによる跳ね返りの液状物質も
被塗布体1の下面へ衝突しない。また,被塗布体1の回
転中に被塗布体1の上面及び下面に発生する気流の流れ
は,環状突起部7bにより図2に示すように上昇方向に
変化するので,液状物質が被塗布体1の下面に浸入する
のを妨げる。このようなことが相まって,液状物質が被
塗布体1の下面に浸入するのを防止することができる。
このようにして,被塗布体1の下面へ浸入しないで溝7
a内に捕集された液状物質は,ドレイン孔7cより円錐
傘3とコーターハウス4とで構成されるエアの通路を介
して外部へ排出される。尚,この実施例においては,エ
ア供給口10からエアを供給し,エア吹き出し口9から
エアを吹き出させる構成のものについて述べたが,例え
ばコンパクトディスク等のような被塗布体の場合には,
数十μm程度の比較的粒径の小さな液状物質については
その読み取りに支障をきたさないので,エアを吹き出さ
せる構成のものでなくても同様に実施することができ
る。図6及び図7は本発明の他の一実施例を説明するた
めの図であり,図7は図6に示すスピンナヘッドの詳細
を示す図である。前述した実施例が環状突起部が回転し
ない構造のものであるのに対して,この実施例は環状突
起部が回転する構造のものである。これらの図におい
て,スピンナヘッド2の上面の外周部には,一周にわた
って網目,例えばステンレスメッシュからなる環状突起
部2aが設けられている。この環状突起部2aは,被塗
布体1の外周側面の下部を囲むように,被塗布体の外周
に近接して設けられている。また,環状突起部2aの上
面のレベルは,被塗布体1の上面のレベルよりも低いこ
とが望ましい。例えば,環状突起部2aは,被塗布体1
の外周より水平方向に1〜3mm程度離れた位置に,被
塗布体の外周側面の下部を0.1〜0.5mm程度囲む
ように設けられている。このように構成されたスピンナ
装置において,被塗布体1の上面に液状物質を滴下また
は噴霧し,被塗布体1を高速回転させると,被塗布体1
の上面に吐出された液状物質は,被塗布体1が回転する
ことにより遠心力が加わり,被塗布体1の上面に膜を形
成しながら被塗布体の外周より飛び出す。このように被
塗布体の外周より飛び出した液状物質は前述した実施例
と同様にして,被塗布体1の下面に浸入することなく,
環状突起部2aによって捕捉される。環状突起部2aに
よって捕捉された液状物質は,環状突起部2aも被塗布
体1と一緒に回転しているため,遠心力により環状突起
部2aの網目を介して外部に放出される。尚,この実施
例においては,環状突起部2aが網目からなるものにつ
いて説明したが,網目に限定されることなく,環状突起
部2に液状物質放出用の孔を数カ所設ければ同様に実施
することができる。
1 to 3 are views for explaining an embodiment of the present invention, and FIGS. 2 and 3 are views showing details of the guard ring 7 shown in FIG. In these figures, a groove 7a is formed over the circumference of the upper surface of the guard ring 7, and an annular projection 7b is formed on the outer periphery of the groove 7a so that the outer periphery of the groove 7a is higher than the inner periphery. Is provided. Several drain holes 7c are formed at the bottom of the groove 7a so as to penetrate outside. Annular projection 7b
Is provided near the outer periphery of the object to be coated so as to surround the lower part of the outer peripheral side surface of the object to be coated 1. It is desirable that the level of the upper surface of the annular projection 7b be lower than the level of the upper surface of the object 1 to be coated. For example, the annular protruding portion 7b is positioned at a distance of about 1 to 3 mm in the horizontal direction from the outer periphery of the coating object 1 and the lower portion of the outer peripheral side surface of the coating object is 0.1 to 0.5 mm.
It is provided so as to surround it. In the spinner device thus configured, when the liquid material is dropped or sprayed on the upper surface of the object 1 and the object 1 is rotated at a high speed, the liquid material discharged on the upper surface of the object 1 is The centrifugal force is applied by the rotation of the applied body 1, and the applied body 1 jumps out of the outer periphery of the coated body while forming a film on the upper surface of the coated body 1. Since a large amount of the liquid substance 11 jumps out at the beginning of the jump, the liquid substance 11 jumps out downward with a film as shown in FIG. When the protruding liquid film is cut, the liquid substance 11 scatters in all directions. However, since the lower part of the outer peripheral side of the object 1 is closely surrounded by the annular projection 7b, the liquid substance 11 is directly applied to the object. 1 does not collide with the lower surface. Further, as shown in FIG. 5, the direction in which the liquid substance jumps out is the direction of the composite speed vector C of the jumping speed vector A of the liquid due to the centrifugal force and the jumping speed vector B of the liquid due to the rotation of the object 1. However, the angle α at which the liquid material collides with the annular protrusion 7b when the object 1 is surrounded by the annular protrusion 7b from near is such that the object 1 is surrounded by the annular protrusion 7b from a distance. Is smaller than the angle β at which the liquid substance collides with the annular projection 7b in the case, and the velocity vector B
Is significantly larger than the velocity vector A by 10 times or more. Therefore, if the annular projection 7b is provided as close to the outer periphery of the object as possible, a large amount of liquid substance that jumps out at the beginning of the rotation of the object to be applied can be removed. Since the liquid material is applied almost in parallel to the side surface of the object 7b, the liquid material rebounded by the annular projection 7b does not collide with the lower surface of the object 1 to be coated. Further, the flow of the air current generated on the upper and lower surfaces of the object 1 during rotation of the object 1 changes in the upward direction as shown in FIG. 2 by the annular projections 7b. 1 to prevent intrusion into the lower surface. Together with such a situation, it is possible to prevent the liquid substance from penetrating into the lower surface of the object 1 to be coated.
In this manner, the grooves 7 do not enter the lower surface of the object 1
The liquid substance trapped in a is discharged from the drain hole 7c to the outside through an air passage formed by the conical umbrella 3 and the coater house 4. In this embodiment, a configuration in which air is supplied from the air supply port 10 and air is blown out from the air blowout port 9 has been described. However, in the case of an object to be coated such as a compact disc, for example,
Since the reading of a liquid material having a relatively small particle size of about several tens of μm does not hinder the reading, the same operation can be performed without using a structure that blows air. 6 and 7 are views for explaining another embodiment of the present invention, and FIG. 7 is a view showing details of the spinner head shown in FIG. In contrast to the above-described embodiment in which the annular protrusion does not rotate, this embodiment has a structure in which the annular protrusion rotates. In these figures, an annular projection 2a made of a mesh, for example, a stainless mesh, is provided on the outer periphery of the upper surface of the spinner head 2 over one circumference. The annular protrusion 2 a is provided close to the outer periphery of the object to be coated so as to surround the lower part of the outer peripheral side surface of the object to be coated 1. Further, it is desirable that the level of the upper surface of the annular projection 2a be lower than the level of the upper surface of the coated object 1. For example, the annular projection 2a is
The lower portion of the outer peripheral side surface of the object to be coated is provided at a position spaced apart from the outer periphery by about 1 to 3 mm in the horizontal direction by about 0.1 to 0.5 mm. In the spinner device configured as described above, when the liquid material is dropped or sprayed on the upper surface of the object 1 and the object 1 is rotated at a high speed, the object 1 is rotated.
The liquid substance discharged onto the upper surface of the substrate 1 is subjected to centrifugal force due to the rotation of the substrate 1 and jumps out of the outer periphery of the substrate while forming a film on the upper surface of the substrate 1. In this manner, the liquid substance which has protruded from the outer periphery of the object to be coated does not enter the lower surface of the object to be coated 1 in the same manner as in the above-described embodiment.
It is captured by the annular projection 2a. The liquid substance caught by the annular projection 2a is discharged to the outside through the mesh of the annular projection 2a by centrifugal force because the annular projection 2a is also rotating together with the object 1. In this embodiment, the case where the annular projection 2a is formed of a mesh has been described. However, the present invention is not limited to the mesh, and the same can be achieved by providing several holes for discharging the liquid substance in the annular projection 2. be able to.

【発明の効果】以上述べたように本発明は,被塗布体の
上面に液状物質を滴下または噴霧して,被塗布体の上面
に均一な塗膜を形成するスピンナ装置において,上記被
塗布体の下面に上記液状物質が浸入しないように,少な
くとも上記被塗布体の外周側面の下部が近接して囲まれ
ていることを特徴とするスピンナ装置である。本発明は
このような特徴を有するので,上記液状物質が上記被塗
布体の下面に浸入し,付着するのを防止することができ
る。従って,従来のスピンナ装置に比べ付着物を除去す
る必要がないため,生産性が著しく向上する。また,被
塗布体上面の全面が利用できるので,被塗布体の利用率
が向上する。
As described above, the present invention relates to a spinner apparatus for forming a uniform coating film on an upper surface of an object by dropping or spraying a liquid substance on the upper surface of the object. A spinner device characterized in that at least a lower portion of the outer peripheral side surface of the object to be coated is closely surrounded so that the liquid substance does not enter the lower surface of the substrate. Since the present invention has such characteristics, it is possible to prevent the liquid substance from infiltrating and adhering to the lower surface of the object to be coated. Therefore, there is no need to remove extraneous matter as compared with the conventional spinner device, so that productivity is remarkably improved. Further, since the entire upper surface of the object to be coated can be used, the utilization rate of the object to be coated is improved.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の一実施例を説明するための図である。FIG. 1 is a diagram for explaining an embodiment of the present invention.

【図2】本発明の一実施例を説明するための図である。FIG. 2 is a diagram for explaining an embodiment of the present invention.

【図3】本発明の一実施例を説明するための図である。FIG. 3 is a diagram for explaining an embodiment of the present invention.

【図4】本発明の一実施例を説明するための図である。FIG. 4 is a diagram for explaining one embodiment of the present invention.

【図5】本発明の一実施例を説明するための図である。FIG. 5 is a diagram for explaining one embodiment of the present invention.

【図6】本発明の一実施例を説明するための図である。FIG. 6 is a diagram for explaining one embodiment of the present invention.

【図7】本発明の一実施例を説明するための図である。FIG. 7 is a diagram for explaining an embodiment of the present invention.

【図8】従来例を説明するための図である。FIG. 8 is a diagram for explaining a conventional example.

【符号の説明】[Explanation of symbols]

1…被塗布体 2…スピンナヘ
ッド 2a…環状突起部 3…円錐傘 4…コーターハウス 5…回転軸 6…排気口 7…ガードリン
グ 7a…溝 7b…環状突起
部 8…円筒 9…エア吹き出
し口 10…エア供給口 11…液状物質
DESCRIPTION OF SYMBOLS 1 ... Coated object 2 ... Spinner head 2a ... Annular protrusion 3 ... Conical umbrella 4 ... Coater house 5 ... Rotating shaft 6 ... Exhaust port 7 ... Guard ring 7a ... Groove 7b ... Annular protrusion 8 ... Cylinder 9 ... Air outlet 10 ... Air supply port 11 ... Liquid substance

───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 平4−197468(JP,A) 特開 平1−215374(JP,A) 特開 昭61−287123(JP,A) 特開 昭59−120270(JP,A) 特開 昭63−250123(JP,A) 特開 昭60−143870(JP,A) 実開 平2−95232(JP,U) (58)調査した分野(Int.Cl.6,DB名) B05C 7/00 - 21/00 G03F 7/16 502 H01L 21/027──────────────────────────────────────────────────続 き Continuation of the front page (56) References JP-A-4-197468 (JP, A) JP-A-1-215374 (JP, A) JP-A-61-287123 (JP, A) JP-A-59-1987 120270 (JP, A) JP-A-63-250123 (JP, A) JP-A-60-143870 (JP, A) JP-A-2-95232 (JP, U) (58) Fields investigated (Int. Cl. 6 , DB name) B05C 7/00-21/00 G03F 7/16 502 H01L 21/027

Claims (6)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 被塗布体の上面に液状物質を滴下または
噴霧して,被塗布体の上面に均一な塗膜を形成するスピ
ンナ装置において, 上記被塗布体の下面に上記液状物質が浸入しないよう
に,少なくとも上記被塗布体の外周側面の下部近接し
て囲むガードリングを備えたことを特徴とするスピンナ
装置。
1. A spinner device for forming a uniform coating film on an upper surface of an object by dropping or spraying a liquid material on an upper surface of the object, wherein the liquid material does not enter the lower surface of the object. as such, spinner apparatus characterized by comprising at least the enclose guard ring adjacent the bottom of the outer peripheral surface of the member to be coated.
【請求項2】 被塗布体の上面に液状物質を滴下または
噴霧して,被塗布体の上面に均一な塗膜を形成するスピ
ンナ装置において, ガードリングが,スピンナヘッドの周囲に該スピンナヘ
ッドの回転軸と同軸的に配置されていると共に,上記ガ
ードリングの上面に上記被塗布体の外周側面の下部を囲
むように該被塗布体の外周に近接して環状突起部が設け
られていることを特徴とするスピンナ装置。
2. A spinner apparatus in which a liquid material is dropped or sprayed on an upper surface of an object to be coated to form a uniform coating film on an upper surface of the object, wherein a guard ring is provided around the spinner head. An annular projection is provided coaxially with the rotation axis, and an annular protrusion is provided on the upper surface of the guard ring and close to the outer periphery of the coated object so as to surround a lower portion of the outer peripheral side surface of the coated object. A spinner device.
【請求項3】 被塗布体の上面に液状物質を滴下または
噴霧して,被塗布体の上面に均一な塗膜を形成するスピ
ンナ装置において, ガードリングが,スピンナヘッドの周囲に該スピンナヘ
ッドの回転軸と同軸的に,且つ上記ガードリングの上面
と被塗布体の下面とがエア吹き出し口としての所定の間
隔をなすように配置されていると共に,上記ガードリン
グの上面に上記被塗布体の外周側面の下部を囲むように
該被塗布体の外周に近接して環状突起部が設けられてい
ることを特徴とするスピンナ装置。
3. A spinner apparatus in which a liquid substance is dropped or sprayed on an upper surface of an object to be coated to form a uniform coating film on the upper surface of the object, wherein a guard ring is provided around the spinner head. The upper surface of the guard ring and the lower surface of the object to be coated are arranged coaxially with the rotation axis so as to form a predetermined space as an air outlet, and the surface of the object to be coated is placed on the upper surface of the guard ring. A spinner device, wherein an annular projection is provided near the outer periphery of the object to be coated so as to surround a lower portion of the outer peripheral side surface.
【請求項4】 被塗布体の上面に液状物質を滴下または
噴霧して,被塗布体の上面に均一な塗膜を形成するスピ
ンナ装置において, スピンナヘッドの上面に上記被塗布体の外周側面の下部
を囲むように該被塗布体の外周に近接して環状突起部が
設けられていることを特徴とするスピンナ装置。
4. A spinner apparatus for dropping or spraying a liquid substance on an upper surface of an object to be coated to form a uniform coating film on the upper surface of the object to be coated. A spinner device, wherein an annular projection is provided near the outer periphery of the object to be coated so as to surround a lower part.
【請求項5】 上記環状突起部が網目になっていること
を特徴とする請求項4に記載のスピンナ装置。
5. The spinner device according to claim 4, wherein said annular projection is meshed.
【請求項6】 上記環状突起部の上面のレベルは,上記
被塗布体の上面のレベルよりも低いことを特徴とする請
求項2乃至5のいずれかの1に記載のスピンナ装置。
6. The spinner device according to claim 2, wherein the level of the upper surface of the annular projection is lower than the level of the upper surface of the object to be coated.
JP34987392A 1992-12-02 1992-12-02 Spinner device Expired - Fee Related JP2854210B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP34987392A JP2854210B2 (en) 1992-12-02 1992-12-02 Spinner device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP34987392A JP2854210B2 (en) 1992-12-02 1992-12-02 Spinner device

Publications (2)

Publication Number Publication Date
JPH06170316A JPH06170316A (en) 1994-06-21
JP2854210B2 true JP2854210B2 (en) 1999-02-03

Family

ID=18406694

Family Applications (1)

Application Number Title Priority Date Filing Date
JP34987392A Expired - Fee Related JP2854210B2 (en) 1992-12-02 1992-12-02 Spinner device

Country Status (1)

Country Link
JP (1) JP2854210B2 (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7018943B2 (en) 1994-10-27 2006-03-28 Asml Holding N.V. Method of uniformly coating a substrate
US7030039B2 (en) 1994-10-27 2006-04-18 Asml Holding N.V. Method of uniformly coating a substrate
KR100370728B1 (en) * 1994-10-27 2003-04-07 실리콘 밸리 그룹, 인크. Method of uniformly coating a substrate and device therefor
US6977098B2 (en) 1994-10-27 2005-12-20 Asml Holding N.V. Method of uniformly coating a substrate
JPH0945611A (en) * 1995-07-27 1997-02-14 Dainippon Screen Mfg Co Ltd Spin coater of substrate
US6068881A (en) * 1998-05-29 2000-05-30 International Business Machines Corporation Spin-apply tool having exhaust ring

Also Published As

Publication number Publication date
JPH06170316A (en) 1994-06-21

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